JP6194112B2 - 金属酸化物膜構造物 - Google Patents
金属酸化物膜構造物 Download PDFInfo
- Publication number
- JP6194112B2 JP6194112B2 JP2016525291A JP2016525291A JP6194112B2 JP 6194112 B2 JP6194112 B2 JP 6194112B2 JP 2016525291 A JP2016525291 A JP 2016525291A JP 2016525291 A JP2016525291 A JP 2016525291A JP 6194112 B2 JP6194112 B2 JP 6194112B2
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- JP
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- Prior art keywords
- film structure
- metal oxide
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- oxide film
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910044991 metal oxide Inorganic materials 0.000 title claims description 62
- 150000004706 metal oxides Chemical class 0.000 title claims description 62
- 239000002245 particle Substances 0.000 claims description 75
- 239000000758 substrate Substances 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 26
- 230000032258 transport Effects 0.000 claims description 24
- 239000011248 coating agent Substances 0.000 claims description 23
- 239000000843 powder Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000007790 solid phase Substances 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 16
- 125000004429 atom Chemical group 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000002105 nanoparticle Substances 0.000 claims description 8
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 8
- 239000012528 membrane Substances 0.000 claims description 6
- 239000011148 porous material Substances 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 229910052752 metalloid Inorganic materials 0.000 claims description 3
- 150000002738 metalloids Chemical class 0.000 claims description 3
- 229910052755 nonmetal Inorganic materials 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 239000010408 film Substances 0.000 description 71
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 43
- 238000000034 method Methods 0.000 description 39
- 230000008569 process Effects 0.000 description 34
- 238000001228 spectrum Methods 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 238000004627 transmission electron microscopy Methods 0.000 description 7
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 229910052727 yttrium Inorganic materials 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 238000011065 in-situ storage Methods 0.000 description 4
- 238000004549 pulsed laser deposition Methods 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 238000002524 electron diffraction data Methods 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229940098458 powder spray Drugs 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011066 ex-situ storage Methods 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000007751 thermal spraying Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 fluorine nitride Chemical class 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
- C04B41/4515—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application application under vacuum or reduced pressure
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
- C04B41/4545—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a powdery material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structural Engineering (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Paints Or Removers (AREA)
- Drying Of Semiconductors (AREA)
Description
1.半導体等の製造、処理工程において、基材表面に付着するパーティクルを画期的に減少させる。
2.半導体等の製造、処理工程を連続的かつ安定的に進行させることにより、工程歩留まり及び生産性を向上させる。
3.半導体等の製造、処理工程後、製品不良率を減少させる。
4.消耗性基材及び交替部品の外部洗浄の周期を延長させることができる。
5.多様な素材(セラミック、金属、非金属、半金属、ポリマー等)の基材にイットリア膜構造物を形成させることができ、多様な製品の製造、処理工程に用いられる。
Claims (6)
- 基材表面に形成された金属酸化物膜構造物であって、
X a Y b で示される金属酸化物(X:金属元素、Y:酸素元素、a:金属元素の原子数、b:酸素元素の原子数)が膜構造物で形成されるとき、前記金属酸化物膜構造物の金属元素の原子%が、{a/(a+b)}×100(%)よりも大きく、非化学量論的特性を有し、
前記膜構造物が、金属酸化物パウダーが前記基材表面に噴射コートされて形成されることにより、
前記膜構造物は、ナノ結晶質粒子とナノ非晶質粒子とで構成されるが、前記膜構造物を構成する粒子は、熱による成長及び熱による結晶質への変化を伴わず、
亀裂及び気孔のないことを特徴とする金属酸化物膜構造物。 - 前記膜構造物の密度が、コーティング前の金属酸化物の密度の90%〜100%であることを特徴とする請求項1に記載の金属酸化物膜構造物。
- 前記ナノ結晶質粒子とナノ非晶質粒子が、粒径が2nm〜500nmであることを特徴とする請求項1に記載の金属酸化物膜構造物。
- 前記基材が、セラミック、金属、非金属、半金属、ポリマーのいずれか一つであることを特徴とする請求項1に記載の金属酸化物膜構造物。
- 前記膜構造物が、酸化イットリウム(Y2O3)で形成されたものであって、イットリウム原子の重量%が60%〜97%であり、酸素原子の重量%が3%〜40%であることを特徴とする請求項1に記載の金属酸化物膜構造物。
- 前記膜構造物は、輸送管の末端に噴射ノズルを収容するコーティングチャンバの内部の負圧により、前記輸送管に吸入される吸入気体と、気体供給装置から前記輸送管に供給された供給気体とが混合された輸送気体が、前記輸送管内に流入した固相パウダーを輸送し、前記噴射ノズルから噴射され、前記固相パウダーを、真空状態のコーティングチャンバの内部に設けられた基材に噴射コートさせることで形成されたことを特徴とする請求項1乃至5のいずれか一項に記載の金属酸化物膜構造物の製造方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2013-0082217 | 2013-07-12 | ||
KR1020130082217A KR101350294B1 (ko) | 2013-07-12 | 2013-07-12 | 균열이 없는 금속산화물 막 구조물 |
KR10-2013-0133053 | 2013-11-04 | ||
KR1020130133053A KR101500517B1 (ko) | 2013-06-27 | 2013-11-04 | 이트리아 구조물 |
PCT/KR2014/006276 WO2015005735A1 (ko) | 2013-07-12 | 2014-07-11 | 금속산화물 막 구조물 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016532006A JP2016532006A (ja) | 2016-10-13 |
JP6194112B2 true JP6194112B2 (ja) | 2017-09-06 |
Family
ID=50145262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016525291A Active JP6194112B2 (ja) | 2013-07-12 | 2014-07-11 | 金属酸化物膜構造物 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10081871B2 (ja) |
JP (1) | JP6194112B2 (ja) |
KR (1) | KR101350294B1 (ja) |
CN (1) | CN105392922B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102082602B1 (ko) * | 2018-03-08 | 2020-04-23 | 토토 가부시키가이샤 | 복합 구조물 및 복합 구조물을 구비한 반도체 제조 장치 그리고 디스플레이 제조 장치 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004509048A (ja) | 2000-09-15 | 2004-03-25 | ルーセント テクノロジーズ インコーポレーテッド | 等方性、負熱膨張セラミックスおよび製造方法 |
CN100569656C (zh) * | 2001-10-30 | 2009-12-16 | 日挥触媒化成株式会社 | 管状氧化钛颗粒及其制备方法和用途 |
FR2835534B1 (fr) | 2002-02-06 | 2004-12-24 | Saint Gobain | CIBLE CERAMIQUE NiOx NON STOECHIOMETRIQUE |
US6759085B2 (en) * | 2002-06-17 | 2004-07-06 | Sulzer Metco (Us) Inc. | Method and apparatus for low pressure cold spraying |
RU2212934C1 (ru) * | 2002-06-27 | 2003-09-27 | Институт катализа им. Г.К. Борескова СО РАН | Катализатор получения закиси азота и способ |
RU2211087C1 (ru) * | 2002-06-27 | 2003-08-27 | Институт катализа им. Г.К. Борескова СО РАН | Катализатор получения закиси азота и способ |
KR20040034923A (ko) | 2002-10-17 | 2004-04-29 | 옵토켐 (주) | 중성 지질 억제 조성물 및 이를 포함하는 기능성 식품 |
AU2005286168B2 (en) * | 2004-09-23 | 2012-01-19 | Element Six (Pty) Ltd | Polycrystalline abrasive materials and method of manufacture |
SE529144C2 (sv) * | 2005-04-18 | 2007-05-15 | Sandvik Intellectual Property | Skär belagt med kompositoxidskikt |
EP1840245A1 (de) * | 2006-03-27 | 2007-10-03 | Siemens Aktiengesellschaft | Matrix und Schichtsystem mit unstöchiometrischen Teilchen |
US20100272982A1 (en) * | 2008-11-04 | 2010-10-28 | Graeme Dickinson | Thermal spray coatings for semiconductor applications |
US8840800B2 (en) * | 2011-08-31 | 2014-09-23 | Kabushiki Kaisha Toshiba | Magnetic material, method for producing magnetic material, and inductor element |
CN103132002B (zh) * | 2011-12-02 | 2015-04-15 | 中国科学院微电子研究所 | 一种黑色y2o3陶瓷涂层的制备方法 |
-
2013
- 2013-07-12 KR KR1020130082217A patent/KR101350294B1/ko active IP Right Grant
-
2014
- 2014-07-11 CN CN201480038097.3A patent/CN105392922B/zh active Active
- 2014-07-11 US US14/903,239 patent/US10081871B2/en active Active
- 2014-07-11 JP JP2016525291A patent/JP6194112B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR101350294B1 (ko) | 2014-01-13 |
US10081871B2 (en) | 2018-09-25 |
JP2016532006A (ja) | 2016-10-13 |
CN105392922A (zh) | 2016-03-09 |
US20160160358A1 (en) | 2016-06-09 |
CN105392922B (zh) | 2018-04-10 |
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