JP6180779B2 - 分析方法 - Google Patents

分析方法 Download PDF

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Publication number
JP6180779B2
JP6180779B2 JP2013089059A JP2013089059A JP6180779B2 JP 6180779 B2 JP6180779 B2 JP 6180779B2 JP 2013089059 A JP2013089059 A JP 2013089059A JP 2013089059 A JP2013089059 A JP 2013089059A JP 6180779 B2 JP6180779 B2 JP 6180779B2
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Japan
Prior art keywords
primary ion
primary
ion source
sample
ions
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JP2013089059A
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English (en)
Japanese (ja)
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JP2013242302A (ja
JP2013242302A5 (enExample
Inventor
木村　肇
肇 木村
俊介 清村
俊介 清村
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2013089059A priority Critical patent/JP6180779B2/ja
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Publication of JP2013242302A5 publication Critical patent/JP2013242302A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/40—Time-of-flight spectrometers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biochemistry (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
JP2013089059A 2012-04-24 2013-04-22 分析方法 Expired - Fee Related JP6180779B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013089059A JP6180779B2 (ja) 2012-04-24 2013-04-22 分析方法

Applications Claiming Priority (3)

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JP2012099032 2012-04-24
JP2012099032 2012-04-24
JP2013089059A JP6180779B2 (ja) 2012-04-24 2013-04-22 分析方法

Publications (3)

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JP2013242302A JP2013242302A (ja) 2013-12-05
JP2013242302A5 JP2013242302A5 (enExample) 2016-03-10
JP6180779B2 true JP6180779B2 (ja) 2017-08-16

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JP2013089059A Expired - Fee Related JP6180779B2 (ja) 2012-04-24 2013-04-22 分析方法

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US (1) US8772712B2 (enExample)
JP (1) JP6180779B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201308505D0 (en) * 2013-05-13 2013-06-19 Ionoptika Ltd Use of a gas cluster ion beam containing hydrocarbon for sample analysis
US10354851B2 (en) * 2015-09-11 2019-07-16 Iontof Technologies Gmbh Secondary ion mass spectrometer and secondary ion mass spectrometric method
JP6645379B2 (ja) * 2016-08-09 2020-02-14 住友電気工業株式会社 質量分析方法
EP3290913B1 (de) 2016-09-02 2022-07-27 ION-TOF Technologies GmbH Sekundärionenmassenspektrokopisches verfahren, system und verwendungen hiervon
CA3047693C (en) 2016-12-19 2020-06-16 Perkinelmer Health Sciences Canada, Inc. Inorganic and organic mass spectrometry systems and methods of using them
JP7185620B2 (ja) * 2017-04-04 2022-12-07 株式会社半導体エネルギー研究所 有機半導体素子の分析方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887743A (ja) * 1981-11-17 1983-05-25 Shimadzu Corp 二次イオン質量分析計
US4851669A (en) * 1988-06-02 1989-07-25 The Regents Of The University Of California Surface-induced dissociation for mass spectrometry
US5087815A (en) * 1989-11-08 1992-02-11 Schultz J Albert High resolution mass spectrometry of recoiled ions for isotopic and trace elemental analysis
US5527731A (en) * 1992-11-13 1996-06-18 Hitachi, Ltd. Surface treating method and apparatus therefor
JP3658397B2 (ja) * 2002-06-28 2005-06-08 キヤノン株式会社 飛行時間型二次イオン質量分析法による素子の情報取得方法、および、情報取得装置
WO2005001869A2 (en) * 2003-06-06 2005-01-06 Ionwerks Gold implantation/deposition of biological samples for laser desorption three dimensional depth profiling of tissues
DE102005027937B3 (de) 2005-06-16 2006-12-07 Ion-Tof Gmbh Verfahren zur Analyse einer Festkörperprobe
CA2640254A1 (en) * 2006-01-12 2007-07-19 Ionics Mass Spectrometry Group High sensitivity mass spectrometer interface for multiple ion sources
JP5142580B2 (ja) * 2006-06-29 2013-02-13 キヤノン株式会社 表面解析方法および表面解析装置
JP2008175654A (ja) 2007-01-17 2008-07-31 Asahi Kasei Corp Ｔｏｆ−ｓｉｍｓを用いた混合有機化合物の組成割合の特定方法
EP2056333B1 (de) * 2007-10-29 2016-08-24 ION-TOF Technologies GmbH Flüssigmetallionenquelle, Sekundärionenmassenspektrometer, sekundärionenmassenspektrometisches Analyseverfahren sowie deren Verwendungen
US7825389B2 (en) * 2007-12-04 2010-11-02 Tel Epion Inc. Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture
WO2009131022A1 (ja) * 2008-04-23 2009-10-29 株式会社アルバック 分析方法
GB2460855B (en) * 2008-06-11 2013-02-27 Kratos Analytical Ltd Electron spectroscopy
US9515277B2 (en) 2008-08-13 2016-12-06 Mitsubishi Chemical Corporation Organic electroluminescent element, organic EL display device and organic EL illumination
JP2011029043A (ja) 2009-07-27 2011-02-10 Hyogo Prefecture 質量分析器および質量分析方法
US8651048B2 (en) * 2010-04-21 2014-02-18 University Of North Texas Controlled deposition of metal and metal cluster ions by surface field patterning in soft-landing devices
EP2560576B1 (en) * 2010-04-22 2018-07-18 Micell Technologies, Inc. Stents and other devices having extracellular matrix coating
JP5031066B2 (ja) * 2010-05-26 2012-09-19 兵庫県 クラスタービーム発生装置、基板処理装置、クラスタービーム発生方法及び基板処理方法
WO2011156499A1 (en) * 2010-06-08 2011-12-15 Ionwerks, Inc. Nanoparticulate assisted nanoscale molecular imaging by mass spectrometery

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US20130277549A1 (en) 2013-10-24
JP2013242302A (ja) 2013-12-05
US8772712B2 (en) 2014-07-08

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