JP6165771B2 - 懸濁液プラズマ溶射プロセス用の反応性ガス・シュラウド又はフレーム・シース - Google Patents
懸濁液プラズマ溶射プロセス用の反応性ガス・シュラウド又はフレーム・シース Download PDFInfo
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- JP6165771B2 JP6165771B2 JP2014547500A JP2014547500A JP6165771B2 JP 6165771 B2 JP6165771 B2 JP 6165771B2 JP 2014547500 A JP2014547500 A JP 2014547500A JP 2014547500 A JP2014547500 A JP 2014547500A JP 6165771 B2 JP6165771 B2 JP 6165771B2
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- 239000000725 suspension Substances 0.000 title claims description 75
- 238000000034 method Methods 0.000 title claims description 72
- 239000007921 spray Substances 0.000 title claims description 54
- 230000008569 process Effects 0.000 title description 50
- 239000007789 gas Substances 0.000 claims description 109
- 239000006194 liquid suspension Substances 0.000 claims description 94
- 239000002245 particle Substances 0.000 claims description 94
- 238000000576 coating method Methods 0.000 claims description 81
- 239000011248 coating agent Substances 0.000 claims description 76
- 239000000758 substrate Substances 0.000 claims description 49
- 238000013467 fragmentation Methods 0.000 claims description 19
- 238000006062 fragmentation reaction Methods 0.000 claims description 19
- 239000011261 inert gas Substances 0.000 claims description 11
- 238000007751 thermal spraying Methods 0.000 claims 2
- 239000007924 injection Substances 0.000 description 42
- 238000002347 injection Methods 0.000 description 42
- 239000007788 liquid Substances 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000002485 combustion reaction Methods 0.000 description 14
- 238000009826 distribution Methods 0.000 description 14
- 238000000151 deposition Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 230000008021 deposition Effects 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 230000009977 dual effect Effects 0.000 description 10
- 230000003993 interaction Effects 0.000 description 10
- 238000007750 plasma spraying Methods 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000010419 fine particle Substances 0.000 description 7
- 239000000446 fuel Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- 239000012080 ambient air Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N carbon dioxide Natural products O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002355 dual-layer Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- -1 hydrogen carbon dioxide Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012092 media component Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000009919 sequestration Effects 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000012720 thermal barrier coating Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
- Nozzles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Plasma Technology (AREA)
Description
Claims (18)
- 液体懸濁液から基板上にコーティングを施すための溶射システムであって、
プラズマを発生させるための溶射トーチと、
サブミクロンの粒子を有する前記液体懸濁液の流れを配送するための液体懸濁液配送サブシステムと、
プラズマ放出物を生成するために、前記溶射トーチから前記液体懸濁液に前記プラズマを配送するノズル・アセンブリであって、前記プラズマ放出物を実質的に囲む反応性ガス・シュラウドを提供するように構成されたノズル・アセンブリとを備え、
前記反応性ガス・シュラウドは、前記プラズマ放出物中に前記サブミクロンの粒子の同伴を実質的に維持し、外気が前記プラズマ放出物に進入して前記プラズマ放出物と反応するのを実質的に阻止するように構成され、
前記反応性ガス・シュラウドは、前記懸濁液の液滴の断片化を助長し、前記プラズマ放出物内で前記サブミクロンの粒子の気化種を生成するように、前記プラズマ放出物と反応する、溶射システム。 - 前記シュラウドは、前記基板表面から前記ノズル・アセンブリまで延在する、請求項1に記載の溶射システム。
- 前記シュラウドは、層状に流れるシールドである、請求項1に記載の溶射システム。
- 前記シュラウドは、前記ノズルから前記基板表面までの距離よりも短い軸方向距離を有する、請求項1に記載の溶射システム。
- 前記反応性ガス・シュラウドの周囲に配設された不活性ガス・シュラウドをさらに備える、請求項1に記載の溶射システム。
- 第1の反応性ガス・シュラウド及び第2の反応性ガス・シュラウドをさらに備える、請求項1に記載の溶射システム。
- 前記液体懸濁液の前記流れを囲むフレーム外被を提供するように構成されたインジェクタをさらに備える、請求項1に記載の溶射システム。
- 前記液体懸濁液配送サブシステムは、前記ノズルの内部に構成される、請求項1に記載の溶射システム。
- 前記液体懸濁液配送サブシステムは、前記液体懸濁液の軸方向流れを配送するように前記ノズルの内部に構成される、請求項1に記載の溶射システム。
- 前記液体懸濁液配送サブシステムは、前記ノズルの外部に構成される、請求項1に記載の溶射システム。
- サブミクロンの粒子が中に分散した液体懸濁液を使用して基板上にコーティングを施す方法であって、
溶射トーチからプラズマを発生させるステップと
プラズマ放出物の流れを提供するために、サブミクロンの粒子が中に分散された液体懸濁液の流れを前記プラズマまで又はその近傍まで配送するステップと、
前記サブミクロンの粒子を前記プラズマ放出物内に巻き込まれた状態に維持し、周囲ガスの前記プラズマ放出物中への巻き込みを実質的に防止するために、前記プラズマ放出物を反応性ガス・シュラウドで囲むステップと、
前記懸濁液の液滴の断片化を助長し、前記プラズマ放出物内で前記サブミクロンの粒子の気化種を生成するために、前記シュラウド・ガスを前記プラズマ放出物と反応させるステップと、
前記基板を被覆するために、前記サブミクロンの粒子を中に含んだ前記シュラウドされたプラズマ放出物を前記基板の方向に向けるステップとを含む、方法。 - 前記シュラウドされた放出物中へのガスの巻き込みを実質的に防止するステップをさらに含む、請求項11に記載の方法。
- 前記反応性シュラウドのいたるところで前記液体懸濁液の液滴を断片化するステップをさらに含む、請求項11に記載の方法。
- 前記放出物を実質的に囲む不活性ガス・シュラウドを導入するステップをさらに含む、請求項11に記載の方法。
- 前記放出物を実質的に囲む第2の反応性ガス・シュラウドを導入するステップをさらに含む、請求項11に記載の方法。
- 前記液体懸濁液を囲むフレーム外被を導入するステップをさらに含む、請求項11に記載の方法。
- 前記ノズルの外部において前記液体懸濁液を噴射するステップをさらに含む、請求項11に記載の方法。
- 前記ノズルの内部において前記液体懸濁液を噴射するステップをさらに含む、請求項11に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161570532P | 2011-12-14 | 2011-12-14 | |
US201161570516P | 2011-12-14 | 2011-12-14 | |
US61/570,532 | 2011-12-14 | ||
US61/570,516 | 2011-12-14 | ||
PCT/US2012/069807 WO2013090754A2 (en) | 2011-12-14 | 2012-12-14 | Reactive gas shroud or flame sheath for suspension plasma spray processes |
Publications (3)
Publication Number | Publication Date |
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JP2015507691A JP2015507691A (ja) | 2015-03-12 |
JP2015507691A5 JP2015507691A5 (ja) | 2015-12-17 |
JP6165771B2 true JP6165771B2 (ja) | 2017-07-19 |
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Application Number | Title | Priority Date | Filing Date |
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JP2014547500A Active JP6165771B2 (ja) | 2011-12-14 | 2012-12-14 | 懸濁液プラズマ溶射プロセス用の反応性ガス・シュラウド又はフレーム・シース |
Country Status (12)
Country | Link |
---|---|
US (1) | US20130156968A1 (ja) |
EP (1) | EP2791381B1 (ja) |
JP (1) | JP6165771B2 (ja) |
KR (1) | KR102106179B1 (ja) |
CN (1) | CN104114738B (ja) |
CA (1) | CA2859040C (ja) |
MX (1) | MX360218B (ja) |
PL (1) | PL2791381T3 (ja) |
RU (1) | RU2014128544A (ja) |
SG (1) | SG11201403108RA (ja) |
TR (1) | TR201819010T4 (ja) |
WO (1) | WO2013090754A2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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US9752223B2 (en) * | 2014-03-10 | 2017-09-05 | United Technologies Corporation | Equipment for plasma spray with liquid injection |
CA2924476A1 (en) * | 2015-04-01 | 2016-10-01 | Rolls-Royce Corporation | Vacuum plasma sprayed coating including oxide dispersions |
WO2016210336A1 (en) * | 2015-06-24 | 2016-12-29 | Khalifa University of Science, Technology & Research | Electrostatically manipulated flames for compact heat generation |
US20180166311A1 (en) * | 2016-12-12 | 2018-06-14 | Applied Materials, Inc. | New repair method for electrostatic chuck |
KR20220048033A (ko) * | 2019-08-23 | 2022-04-19 | 램 리써치 코포레이션 | 저온 플라즈마 제트들을 사용하는 네트 유사 형상 (near netshape) 애디티브 제작 (additive manufacturing) |
CN114086107B (zh) * | 2021-12-28 | 2023-07-14 | 河北复朗施纳米科技有限公司 | 一种纳米抑菌涂层装置 |
US20230366074A1 (en) * | 2022-05-16 | 2023-11-16 | Andrei V. Ivanov | Oxygen Interception for Air Plasma Spray Processes |
Family Cites Families (10)
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US5087434A (en) * | 1989-04-21 | 1992-02-11 | The Pennsylvania Research Corporation | Synthesis of diamond powders in the gas phase |
US5372857A (en) * | 1992-12-17 | 1994-12-13 | Browning; James A. | Method of high intensity steam cooling of air-cooled flame spray apparatus |
US5486383A (en) * | 1994-08-08 | 1996-01-23 | Praxair Technology, Inc. | Laminar flow shielding of fluid jet |
US6106903A (en) * | 1999-03-01 | 2000-08-22 | Plasma Technology, Inc. | Thermal spray forming of molybdenum disilicide-silicon carbide composite material |
DE19958474A1 (de) * | 1999-12-04 | 2001-06-21 | Bosch Gmbh Robert | Verfahren zur Erzeugung von Funktionsschichten mit einer Plasmastrahlquelle |
US20030049384A1 (en) * | 2001-09-10 | 2003-03-13 | Liu Jean H. | Process and apparatus for preparing transparent electrically conductive coatings |
US8748785B2 (en) * | 2007-01-18 | 2014-06-10 | Amastan Llc | Microwave plasma apparatus and method for materials processing |
US20110003084A1 (en) * | 2008-02-25 | 2011-01-06 | National Research Council Of Canada | Process of Making Ceria-Based Electrolyte Coating |
DE102008050184B4 (de) * | 2008-10-01 | 2011-04-21 | Technische Universität Chemnitz | Verfahren und Vorrichtung zum Hochgeschwindigkeitsflammspritzen |
WO2013074961A1 (en) * | 2011-11-18 | 2013-05-23 | Hitemco Medical Application Inc. | Porous coatings for orthopedic implants |
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2012
- 2012-12-14 KR KR1020147018567A patent/KR102106179B1/ko active IP Right Grant
- 2012-12-14 RU RU2014128544A patent/RU2014128544A/ru not_active Application Discontinuation
- 2012-12-14 PL PL12812461T patent/PL2791381T3/pl unknown
- 2012-12-14 MX MX2014007179A patent/MX360218B/es active IP Right Grant
- 2012-12-14 SG SG11201403108RA patent/SG11201403108RA/en unknown
- 2012-12-14 CN CN201280069723.6A patent/CN104114738B/zh active Active
- 2012-12-14 US US13/715,361 patent/US20130156968A1/en not_active Abandoned
- 2012-12-14 WO PCT/US2012/069807 patent/WO2013090754A2/en active Application Filing
- 2012-12-14 EP EP12812461.7A patent/EP2791381B1/en active Active
- 2012-12-14 TR TR2018/19010T patent/TR201819010T4/tr unknown
- 2012-12-14 CA CA2859040A patent/CA2859040C/en active Active
- 2012-12-14 JP JP2014547500A patent/JP6165771B2/ja active Active
Also Published As
Publication number | Publication date |
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CA2859040C (en) | 2018-01-02 |
WO2013090754A3 (en) | 2013-08-08 |
KR102106179B1 (ko) | 2020-04-29 |
CN104114738B (zh) | 2017-05-17 |
WO2013090754A2 (en) | 2013-06-20 |
JP2015507691A (ja) | 2015-03-12 |
CA2859040A1 (en) | 2013-06-20 |
US20130156968A1 (en) | 2013-06-20 |
KR20140106655A (ko) | 2014-09-03 |
CN104114738A (zh) | 2014-10-22 |
EP2791381B1 (en) | 2018-10-17 |
EP2791381A2 (en) | 2014-10-22 |
RU2014128544A (ru) | 2016-02-10 |
SG11201403108RA (en) | 2014-09-26 |
MX2014007179A (es) | 2014-11-25 |
TR201819010T4 (tr) | 2019-01-21 |
MX360218B (es) | 2018-10-25 |
PL2791381T3 (pl) | 2019-09-30 |
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