JP6151138B2 - 荷電粒子顕微鏡内において試料の断層撮像を実行する方法 - Google Patents
荷電粒子顕微鏡内において試料の断層撮像を実行する方法 Download PDFInfo
- Publication number
- JP6151138B2 JP6151138B2 JP2013188123A JP2013188123A JP6151138B2 JP 6151138 B2 JP6151138 B2 JP 6151138B2 JP 2013188123 A JP2013188123 A JP 2013188123A JP 2013188123 A JP2013188123 A JP 2013188123A JP 6151138 B2 JP6151138 B2 JP 6151138B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- image
- detector
- charged particle
- spectral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
- G01N23/046—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T11/00—2D [Two Dimensional] image generation
- G06T11/003—Reconstruction from projections, e.g. tomography
- G06T11/005—Specific pre-processing for tomographic reconstruction, e.g. calibration, source positioning, rebinning, scatter correction, retrospective gating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/419—Imaging computed tomograph
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/226—Image reconstruction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24485—Energy spectrometers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2611—Stereoscopic measurements and/or imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2802—Transmission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2807—X-rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
Landscapes
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Pulmonology (AREA)
- Radiology & Medical Imaging (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP12184099.5 | 2012-09-12 | ||
| EP12184099.5A EP2708874A1 (en) | 2012-09-12 | 2012-09-12 | Method of performing tomographic imaging of a sample in a charged-particle microscope |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014056820A JP2014056820A (ja) | 2014-03-27 |
| JP2014056820A5 JP2014056820A5 (cg-RX-API-DMAC7.html) | 2017-02-02 |
| JP6151138B2 true JP6151138B2 (ja) | 2017-06-21 |
Family
ID=46801373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013188123A Active JP6151138B2 (ja) | 2012-09-12 | 2013-09-11 | 荷電粒子顕微鏡内において試料の断層撮像を実行する方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9618460B2 (cg-RX-API-DMAC7.html) |
| EP (2) | EP2708874A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6151138B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN103681189B (cg-RX-API-DMAC7.html) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2916342A1 (en) | 2014-03-05 | 2015-09-09 | Fei Company | Fabrication of a lamella for correlative atomic-resolution tomographic analyses |
| CZ306268B6 (cs) * | 2014-06-02 | 2016-11-09 | Delong Instruments A.S. | Způsob měření energiového rozdělení emise elektronů z katod s malým virtuálním zdrojem a energiový spektrometr pro provádění tohoto způsobu |
| CZ2014852A3 (cs) * | 2014-12-03 | 2016-05-18 | Advacam S.R.O. | Způsob rentgenové nanoradiografie a nanotomografie a zařízení k provádění tohoto způsobu |
| TWI573165B (zh) * | 2014-12-09 | 2017-03-01 | 財團法人工業技術研究院 | 電子顯微鏡、讀取器以及擷取元素頻譜之方法 |
| WO2016141226A1 (en) * | 2015-03-04 | 2016-09-09 | Decision Sciences International Corporation | Active charged particle tomography |
| US9627176B2 (en) | 2015-07-23 | 2017-04-18 | Fei Company | Fiducial formation for TEM/STEM tomography tilt-series acquisition and alignment |
| US10078057B2 (en) | 2015-09-02 | 2018-09-18 | Fei Company | Data processing in a tomographic imaging apparatus |
| US10103002B1 (en) * | 2016-05-20 | 2018-10-16 | Carl Zeiss Microscopy Gmbh | Method for generating an image of an object and particle beam device for carrying out the method |
| JP6640057B2 (ja) * | 2016-09-14 | 2020-02-05 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡装置及びそれを用いた傾斜ホールの測定方法 |
| JP2019533819A (ja) * | 2016-11-09 | 2019-11-21 | アイメック・ヴェーゼットウェーImec Vzw | 組み合わされたstemとedsの断層撮影のための装置 |
| JP6876418B2 (ja) * | 2016-12-05 | 2021-05-26 | 日本電子株式会社 | 画像取得方法および電子顕微鏡 |
| EP3552223A4 (en) * | 2016-12-06 | 2020-11-11 | Brandeis University | FREEZING FLUID CELL FOR CRYO-ELECTRONIC MICROSCOPY |
| GB201711621D0 (en) | 2017-07-19 | 2017-08-30 | Oxford Instr Nanotechnology Tools Ltd | Improved navigation for electron microscopy |
| WO2019066802A1 (en) * | 2017-09-27 | 2019-04-04 | Intel Corporation | ELECTRON BEAM SURFING FOR CHIP DEBUGGING AND DEFAULT ISOLATION |
| EP3726206B1 (en) * | 2019-03-26 | 2022-11-02 | FEI Company | Methods and systems for inclusion analysis |
| KR20220082802A (ko) * | 2019-06-07 | 2022-06-17 | 칼 짜이스 에스엠테 게엠베하 | 개선된 3d 체적 이미지 재구성 정확도를 갖는 단면 이미징 |
| EP3751595A1 (en) * | 2019-06-14 | 2020-12-16 | FEI Company | A method of examining a sample using a charged particle microscope, wherein an electron energy-loss spectroscopy (eels) spectrum is acquired |
| WO2021018643A1 (en) * | 2019-07-26 | 2021-02-04 | Asml Netherlands B.V. | Multiple landing energy scanning electron microscopy systems and methods |
| CN110687138B (zh) * | 2019-09-05 | 2022-08-05 | 长江存储科技有限责任公司 | 半导体结构的测量与边界特征提取方法及其装置 |
| US11152189B2 (en) * | 2020-03-18 | 2021-10-19 | Fei Company | Method and system for plasma assisted low vacuum charged-particle microscopy |
| DE102021101982A1 (de) * | 2021-01-28 | 2022-07-28 | ebm-papst neo GmbH & Co. KG | Vorrichtung und Verfahren zur Erfassung einer Konzentration von vorbestimmten Partikeln anhand ihrer morphologischen Eigenschaften in Luft |
| JP2025504235A (ja) * | 2022-02-10 | 2025-02-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 半導体試料を層ごとに検査するための方法およびそのような方法を実行するための検査装置 |
| US12456600B2 (en) * | 2023-05-29 | 2025-10-28 | Applied Materials Israel Ltd. | Scanning electron microscopy-based tomography of specimens |
| EP4471820A1 (en) | 2023-06-01 | 2024-12-04 | FEI Company | Methods for three-dimensional tomography of elongated samples |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4006165B2 (ja) * | 2000-04-21 | 2007-11-14 | 株式会社日立製作所 | 元素分析装置及び走査透過型電子顕微鏡並びに元素分析方法 |
| JP2005538344A (ja) * | 2002-07-08 | 2005-12-15 | シデック テクノロジーズ アーベー | 画像化装置および方法 |
| JP2005058428A (ja) * | 2003-08-11 | 2005-03-10 | Hitachi Ltd | 病巣位置特定システム及び放射線検査装置 |
| JP3863873B2 (ja) * | 2003-09-30 | 2006-12-27 | 株式会社日立製作所 | 放射線検査装置 |
| JP4299208B2 (ja) | 2004-08-20 | 2009-07-22 | 日本電子株式会社 | 3次元像構築方法 |
| WO2006062132A1 (ja) * | 2004-12-07 | 2006-06-15 | The University Of Tokyo | 立体画像再構成装置、立体画像再構成方法、及び立体画像再構成プログラム |
| US7671342B2 (en) * | 2005-01-11 | 2010-03-02 | Siemens Medical Solutions Usa, Inc. | Multi-layer detector and method for imaging |
| EP2063450A1 (en) | 2007-11-21 | 2009-05-27 | FEI Company | Method for obtaining a scanning transmission image of a sample in a particle-optical apparatus |
| US8080791B2 (en) | 2008-12-12 | 2011-12-20 | Fei Company | X-ray detector for electron microscope |
| EP2309459A1 (en) | 2009-09-20 | 2011-04-13 | Universiteit Antwerpen | Methods and systems for tomographic reconstruction of coherent radiation images |
| JP5517559B2 (ja) * | 2009-10-26 | 2014-06-11 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び荷電粒子線装置における三次元情報の表示方法 |
| EP2534667A2 (en) * | 2010-02-10 | 2012-12-19 | Mochii, Inc. (d/b/a Voxa) | Aberration-correcting dark-field electron microscopy |
| JP5764380B2 (ja) | 2010-04-29 | 2015-08-19 | エフ イー アイ カンパニFei Company | Sem画像化法 |
| EP2388796A1 (en) | 2010-05-21 | 2011-11-23 | FEI Company | Simultaneous electron detection |
| CN103477346A (zh) * | 2011-03-08 | 2013-12-25 | 霍洛吉克公司 | 用于筛查、诊断和活检的双能和/或造影增强乳房成像的系统和方法 |
| EP2525385A1 (en) | 2011-05-16 | 2012-11-21 | Fei Company | Charged-particle microscope |
| US8704176B2 (en) | 2011-08-10 | 2014-04-22 | Fei Company | Charged particle microscope providing depth-resolved imagery |
| EP2557584A1 (en) | 2011-08-10 | 2013-02-13 | Fei Company | Charged-particle microscopy imaging method |
| MX2014003968A (es) * | 2011-10-14 | 2014-08-27 | Ingrain Inc | Metodo de imagen doble y sistema para generar una imagen multidimensional de una muestra. |
| DE102012200715B4 (de) * | 2012-01-19 | 2014-06-05 | Siemens Aktiengesellschaft | Verfahren zur Aufnahme und Darstellung wenigstens zweier 3-D-Subtraktionsbilddatensätze sowie C-Bogen-Röntgenvorrichtung hierfür |
| WO2013148632A1 (en) * | 2012-03-29 | 2013-10-03 | Ingrain, Inc. | A method and system for estimating properties of porous media such as fine pore or tight rocks |
| US8933401B1 (en) * | 2013-10-25 | 2015-01-13 | Lawrence Livermore National Security, Llc | System and method for compressive scanning electron microscopy |
-
2012
- 2012-09-12 EP EP12184099.5A patent/EP2708874A1/en not_active Withdrawn
-
2013
- 2013-09-09 US US14/021,886 patent/US9618460B2/en active Active
- 2013-09-10 EP EP13183631.4A patent/EP2708875B1/en active Active
- 2013-09-11 JP JP2013188123A patent/JP6151138B2/ja active Active
- 2013-09-12 CN CN201310414456.8A patent/CN103681189B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2708874A1 (en) | 2014-03-19 |
| US20140070095A1 (en) | 2014-03-13 |
| CN103681189B (zh) | 2018-05-11 |
| EP2708875A1 (en) | 2014-03-19 |
| CN103681189A (zh) | 2014-03-26 |
| JP2014056820A (ja) | 2014-03-27 |
| US9618460B2 (en) | 2017-04-11 |
| EP2708875B1 (en) | 2016-08-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6151138B2 (ja) | 荷電粒子顕微鏡内において試料の断層撮像を実行する方法 | |
| US8912491B2 (en) | Method of performing tomographic imaging of a sample in a charged-particle microscope | |
| US8093556B2 (en) | Device and method for analyzing a sample | |
| US9991087B2 (en) | Spectroscopy in a transmission charged-particle microscope | |
| JP6162187B2 (ja) | 透過型荷電粒子顕微鏡内で分光を実行する方法 | |
| US9535020B2 (en) | Analyzing an object using a particle beam apparatus | |
| US20110278451A1 (en) | Simultaneous Electron Detection | |
| US9620331B1 (en) | Method for analyzing an object and charged particle beam device for carrying out the method | |
| KR102687322B1 (ko) | 전자 현미경의 eels 검출 기술 | |
| US10522323B2 (en) | Electron energy loss spectroscopy with adjustable energy resolution | |
| CN111627787B (zh) | 多射束扫描透射带电粒子显微镜 | |
| JP7426192B2 (ja) | 調節可能なビームエネルギー広がりを有する透過荷電粒子顕微鏡 | |
| JP2019533819A (ja) | 組み合わされたstemとedsの断層撮影のための装置 | |
| US10559448B2 (en) | Transmission charged particle microscope with improved EELS/EFTEM module | |
| CN111189857B (zh) | 带电粒子显微镜中的共焦成像的方法和系统 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160908 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161219 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20161219 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20170202 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170214 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170419 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170509 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170524 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6151138 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |