JP6147554B2 - 疎水性無機酸化物粉末及びその製造方法 - Google Patents

疎水性無機酸化物粉末及びその製造方法 Download PDF

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JP6147554B2
JP6147554B2 JP2013093488A JP2013093488A JP6147554B2 JP 6147554 B2 JP6147554 B2 JP 6147554B2 JP 2013093488 A JP2013093488 A JP 2013093488A JP 2013093488 A JP2013093488 A JP 2013093488A JP 6147554 B2 JP6147554 B2 JP 6147554B2
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inorganic oxide
oxide powder
hydrophobic inorganic
particles
hydrophobic
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JP2014214061A (ja
JP2014214061A5 (enExample
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謙一 石津
謙一 石津
陽平 近重
陽平 近重
胆治 小松原
胆治 小松原
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Tokuyama Corp
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Tokuyama Corp
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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP2013093488A 2013-04-26 2013-04-26 疎水性無機酸化物粉末及びその製造方法 Active JP6147554B2 (ja)

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JP2013093488A JP6147554B2 (ja) 2013-04-26 2013-04-26 疎水性無機酸化物粉末及びその製造方法

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JP2014214061A5 JP2014214061A5 (enExample) 2014-12-25
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Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
WO2018096876A1 (ja) * 2016-11-24 2018-05-31 株式会社トクヤマ ゾルゲルシリカ粉末、およびその製造方法
KR102184427B1 (ko) * 2018-12-27 2020-11-30 주식회사 케이씨텍 소수성이 개선된 분산액 조성물, 분산액 조성물의 소수성 평가 방법 및 경화성 조성물
JP7239346B2 (ja) * 2019-02-21 2023-03-14 日揮触媒化成株式会社 フィッシャー・トロプシュ合成用触媒酸化物の製造方法
JP6746025B1 (ja) 2020-03-31 2020-08-26 株式会社アドマテックス 表面改質粒子材料及びスラリー組成物
JP7491081B2 (ja) * 2020-06-22 2024-05-28 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
TW202436225A (zh) * 2022-10-31 2024-09-16 日商日產化學股份有限公司 疏水化低介電損耗正切之二氧化矽溶膠及其製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4615952B2 (ja) * 2004-09-30 2011-01-19 株式会社トクヤマ 改質疎水化シリカ及びその製造方法
JP5253125B2 (ja) * 2008-12-10 2013-07-31 日揮触媒化成株式会社 多孔質シリカ粒子、その製造方法及び該多孔質シリカ粒子からなるコンポジット材料
US9000202B2 (en) * 2010-02-19 2015-04-07 Tokuyama Corporation Method for producing inorganic oxide particles

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