JP6142612B2 - Anisotropic conductive film - Google Patents
Anisotropic conductive film Download PDFInfo
- Publication number
- JP6142612B2 JP6142612B2 JP2013065959A JP2013065959A JP6142612B2 JP 6142612 B2 JP6142612 B2 JP 6142612B2 JP 2013065959 A JP2013065959 A JP 2013065959A JP 2013065959 A JP2013065959 A JP 2013065959A JP 6142612 B2 JP6142612 B2 JP 6142612B2
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- JP
- Japan
- Prior art keywords
- anisotropic conductive
- conductive film
- terminal
- mass
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000007717 exclusion Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- BLFCMWSFOJQYLW-UHFFFAOYSA-N methyl 2-[(1,2-dimethoxy-1-oxopropan-2-yl)diazenyl]-2-methoxypropanoate Chemical compound COC(C(C)(OC)N=NC(C(=O)OC)(C)OC)=O BLFCMWSFOJQYLW-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- BUGISVZCMXHOHO-UHFFFAOYSA-N n-[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]-2-[[1-[[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]amino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCC(CO)(CO)NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC(CO)(CO)CO BUGISVZCMXHOHO-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- ZXQPRTUUOOOZAS-UHFFFAOYSA-N oxiran-2-yl(oxiran-2-ylmethoxy)methanamine Chemical compound C1OC1C(N)OCC1CO1 ZXQPRTUUOOOZAS-UHFFFAOYSA-N 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
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- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- GAMLUOSQYHLFCT-UHFFFAOYSA-N triethoxy-[3-[(3-ethyloxetan-3-yl)methoxy]propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1(CC)COC1 GAMLUOSQYHLFCT-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/10—Adhesives in the form of films or foils without carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/202—Conductive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/202—LCD, i.e. liquid crystal displays
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/02—Ingredients treated with inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/124—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present on both sides of the carrier, e.g. double-sided adhesive tape
- C09J2301/1242—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present on both sides of the carrier, e.g. double-sided adhesive tape the opposite adhesive layers being different
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/314—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive layer and/or the carrier being conductive
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2463/00—Presence of epoxy resin
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
- H05K3/323—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
Description
本発明は、基板の端子と電子部品の端子とを異方性導電接続させるための異方性導電フィルム、その異方性導電フィルムを用いた接続構造体の製造方法、及びその製造方法により得られる接続構造体に関する。 The present invention provides an anisotropic conductive film for anisotropic conductive connection between a terminal of a substrate and a terminal of an electronic component, a manufacturing method of a connection structure using the anisotropic conductive film, and a manufacturing method thereof. Connection structure.
ICチップ、液晶パネル等の電子部品を基板に電気的に接続する際に異方性導電フィルムが広く用いられており、このような異方性導電フィルムとして、膜形成成分、エポキシ系硬化成分、イミダゾール系潜在性硬化剤及び導電性粒子を均一に混合してベースフィルム上に成膜したものが広く使用されている(特許文献1)。このような異方性導電フィルムは、通常、使用時の利便性を考慮してリールに巻かれて保管されている。 When electrically connecting electronic components such as IC chips and liquid crystal panels to a substrate, anisotropic conductive films are widely used. As such anisotropic conductive films, film forming components, epoxy-based curing components, A film in which an imidazole-based latent curing agent and conductive particles are uniformly mixed and formed on a base film is widely used (Patent Document 1). Such an anisotropic conductive film is usually stored wound on a reel in consideration of convenience during use.
ところで、このような異方性導電フィルムで異方性導電接続されるべき基板や電子部品の表面が、熱圧着時に使用するシリコーンシート中の不純分として存在している環状シリコーンオリゴマーで汚染される場合がある。このような汚染が存在したまま熱圧着により異方性導電接続を行った場合、熱圧着時又はその後の高温高湿の信頼性試験の際に、圧着界面に、導通信頼性を低下させかねない「浮き」が発生することがある。このため、異方性導電接続されるべき基板や電子部品については、溶剤洗浄やプラズマ洗浄などの手法でその表面を清浄化することが行われている。 By the way, the surface of a substrate or electronic component to be anisotropically conductively connected with such an anisotropic conductive film is contaminated with a cyclic silicone oligomer present as an impurity in a silicone sheet used during thermocompression bonding. There is a case. When anisotropic conductive connection is performed by thermocompression bonding in the presence of such contamination, conduction reliability may be reduced at the crimping interface during thermocompression bonding or subsequent high temperature and high humidity reliability tests. “Float” may occur. For this reason, the surface of a substrate or an electronic component to be anisotropically connected is cleaned by a technique such as solvent cleaning or plasma cleaning.
しかしながら、基板や電子部品の汚染状態によっては、通常の清浄化処理では不十分な場合があり、そのような場合には、異方性導電フィルムを使用した異方性導電接続界面に「浮き」が発生するリスクの増大が避けられない。このため、通常の清浄化処理では清浄化が不十分となるような基板や電子部品を使用した場合でも、「浮き」を発生させない異方性導電フィルムが求められている。また、リールに巻かれて保管されている異方性導電フィルムは、巻き締められると、ベースフィルムから異方性導電フィルムが剥がれにくくなったり、ブロッキングが生じたりすることがあるため、ベースフィルムから剥がれ易く、ブロッキングも抑制された異方性導電フィルムも求められている。 However, depending on the state of contamination of the substrate and electronic components, the normal cleaning process may not be sufficient. In such a case, “floating” at the anisotropic conductive connection interface using the anisotropic conductive film. Increased risk of occurrence of inevitability. For this reason, there is a demand for an anisotropic conductive film that does not cause “floating” even when a substrate or electronic component that is not sufficiently cleaned by a normal cleaning process is used. In addition, the anisotropic conductive film that is wound and stored on a reel may be difficult to peel off from the base film or may be blocked from being peeled off from the base film. There is also a need for an anisotropic conductive film that can be easily peeled off and blocking is also suppressed.
本発明は、従来の課題を解決しようとするものであり、基板の端子と電子部品の端子とを異方性導電接続させるための異方性導電フィルムに対し、異方性導電接続に適用した際に「浮き」を発生させず、また、リールに巻いた際に、ベースフィルムから剥がれ易くし、ブロッキングも抑制されるようにすることを目的とする。 The present invention is intended to solve the conventional problems, and is applied to anisotropic conductive connection for anisotropic conductive film for anisotropic conductive connection between a terminal of a substrate and a terminal of an electronic component. It is an object of the present invention to prevent “floating” from occurring at the same time, and to easily peel off from a base film when wound on a reel, and to suppress blocking.
本発明者は、異方性導電フィルムを異方性導電層と絶縁性樹脂層との2層から構成し、しかも、異方性導電層における残留溶剤量を所定の範囲に設定することにより、上述の目的を達成できることを見出し、本発明を完成させるに至った。 The inventor comprises an anisotropic conductive film composed of two layers, an anisotropic conductive layer and an insulating resin layer, and by setting the residual solvent amount in the anisotropic conductive layer within a predetermined range, The inventors have found that the above object can be achieved and have completed the present invention.
即ち、本発明は、基板の端子と電子部品の端子とを異方性導電接続させるための異方性導電フィルムであって、
膜形成成分、重合成分、重合開始剤及び導電性粒子を含有する異方性導電層と、膜形成成分を含有する絶縁性樹脂層とが積層された2層構造を有し、
該異方性導電層における残留溶剤量が2〜8質量%であり、
該重合開始剤が残留溶剤により実質的にその重合開始特性が影響を受けないものである異方性導電フィルムを提供する。
That is, the present invention is an anisotropic conductive film for anisotropic conductive connection between the terminal of the substrate and the terminal of the electronic component,
It has a two-layer structure in which an anisotropic conductive layer containing a film forming component, a polymerization component, a polymerization initiator and conductive particles and an insulating resin layer containing a film forming component are laminated,
The residual solvent amount in the anisotropic conductive layer is 2 to 8% by mass,
Provided is an anisotropic conductive film in which the polymerization initiator is substantially unaffected by the residual solvent.
また、本発明は、基板の端子と電子部品の端子とが異方性導電フィルムで異方性導電接続された接続構造体の製造方法であって、以下の工程(A)〜(C)を有する製造方法、並びにその製造方法により製造された接続構造体を提供する。 Moreover, this invention is a manufacturing method of the connection structure by which the terminal of the board | substrate and the terminal of the electronic component were anisotropically conductive-connected by the anisotropic conductive film, Comprising: The following processes (A)-(C) The manufacturing method which has, and the connection structure manufactured by the manufacturing method are provided.
<工程(A)>
基板の端子上に上述の本発明の異方性導電フィルムを、異方性導電層側から仮貼りする仮貼り工程;
<工程(B)>
仮貼りされた異方性導電フィルム上に電子部品を、その端子が基板の端子と対向するように載置する載置工程; 及び
<工程(C)>
載置された電子部品を加熱押圧部材により加熱及び押圧することにより、基板の端子と電子部品の端子とを異方性導電接続させて接続構造体を得る接続工程。
<Process (A)>
Temporary sticking step of temporarily sticking the above-mentioned anisotropic conductive film of the present invention on the terminal of the substrate from the anisotropic conductive layer side;
<Process (B)>
A placing step of placing the electronic component on the temporarily attached anisotropic conductive film so that the terminal faces the terminal of the substrate; and <Step (C)>
A connecting step of obtaining a connection structure by anisotropically connecting the terminals of the substrate and the terminals of the electronic component by heating and pressing the placed electronic component with a heating pressing member.
本発明の異方性導電フィルムは、膜形成成分、重合成分、重合開始剤及び導電性粒子を含有する異方性導電層と、膜形成成分を含有する絶縁性樹脂層とが積層された2層構造を有し、異方性導電層における残留溶剤量が2〜8質量%に調整され、重合開始剤として、残留溶剤により実質的にその重合開始特性が影響を受けないものが使用されているものである。よって、本発明の異方性導電フィルムは、異方性導電接続に適用した際に「浮き」を発生させず、また、リールに巻いた際に、ベースフィルムから剥がれ易く、ブロッキングも抑制されたものとなる。 The anisotropic conductive film of the present invention comprises an anisotropic conductive layer containing a film forming component, a polymerization component, a polymerization initiator, and conductive particles, and an insulating resin layer containing a film forming component. It has a layer structure, the amount of residual solvent in the anisotropic conductive layer is adjusted to 2 to 8% by mass, and a polymerization initiator that does not substantially affect the polymerization initiation characteristics by the residual solvent is used. It is what. Therefore, the anisotropic conductive film of the present invention does not generate “float” when applied to anisotropic conductive connection, and is easily peeled off from the base film when wound on a reel, and blocking is also suppressed. It will be a thing.
本発明の異方性導電フィルムは、基板の端子と電子部品の端子とを異方性導電接続させるためのものであり、膜形成成分、重合成分、重合開始剤、及び導電性粒子を含有する異方性導電層と、膜形成成分を含有する絶縁性樹脂層とが積層された2層構造を有する。更に、異方性導電層における残留溶剤量が2〜8質量%に調整され、重合開始剤として、残留溶剤により実質的にその重合開始特性が影響を受けないものが使用されているものである。 The anisotropic conductive film of the present invention is for anisotropically conductively connecting a terminal of a substrate and a terminal of an electronic component, and contains a film forming component, a polymerization component, a polymerization initiator, and conductive particles. It has a two-layer structure in which an anisotropic conductive layer and an insulating resin layer containing a film-forming component are laminated. Furthermore, the amount of residual solvent in the anisotropic conductive layer is adjusted to 2 to 8% by mass, and a polymerization initiator that does not substantially affect the polymerization initiation characteristics by the residual solvent is used. .
<異方性導電層>
前述したとおり、異方性導電層における残留溶剤量が2〜8質量%、好ましくは5%超〜8質量%に調整されている。このため、異方性導電フィルムで基板や電子部品を接合した場合に、異方性導電層に接した側の基板又は電子部品の表面の環状シリコーンオリゴマー等の汚染物質をその表面から排除することができる。排除の機構は明確ではないが、比較的多量に含まれている残留溶剤により、環状シリコーンオリゴマー等の汚染物質が表面から洗い流されたり、異方性導電フィルム中に取り込まれ、更に、外部へ拡散して排除されているのではないかと推察される。
<Anisotropic conductive layer>
As described above, the residual solvent amount in the anisotropic conductive layer is adjusted to 2 to 8% by mass, preferably more than 5% to 8% by mass. For this reason, when a substrate or electronic component is bonded with an anisotropic conductive film, contaminants such as cyclic silicone oligomers on the surface of the substrate or electronic component on the side in contact with the anisotropic conductive layer should be excluded from the surface. Can do. Although the mechanism of exclusion is not clear, contaminants such as cyclic silicone oligomers are washed away from the surface by the residual solvent contained in a relatively large amount or taken into the anisotropic conductive film and further diffused to the outside. It is speculated that it has been excluded.
なお、残留溶剤量が少ないと環状シリコーンオリゴマー等の汚染物質の排除効果が不十分となることが懸念され、多いと異方性導電フィルムに対するベースフィルムの剥離性が低下し、異方性導電フィルムをリールに巻き回したときにブロッキングの発生が懸念されるが、残留溶剤量が2〜8質量%であればそのような懸念が生じない。 If the amount of residual solvent is small, there is a concern that the effect of eliminating contaminants such as cyclic silicone oligomers will be insufficient, and if the amount is large, the peelability of the base film from the anisotropic conductive film is reduced, and the anisotropic conductive film. However, when the amount of residual solvent is 2 to 8% by mass, such a concern does not occur.
異方性導電層における残留溶剤量を2〜8質量%に調整するには、異方性導電層形成用組成物に使用する溶剤の種類、量、異方性導電層形成時の塗布条件、乾燥条件を調整することにより行うことができる。例えば乾燥時間に関し、短くすれば残留溶剤量を高くすることができ、長くすれば残留溶剤量を低くすることができる。 In order to adjust the residual solvent amount in the anisotropic conductive layer to 2 to 8% by mass, the type and amount of the solvent used for the composition for forming the anisotropic conductive layer, the coating conditions when forming the anisotropic conductive layer, This can be done by adjusting the drying conditions. For example, with respect to the drying time, the amount of residual solvent can be increased if the time is short, and the amount of residual solvent can be decreased if the time is long.
ここで、残留溶剤としては、使用する膜形成成分や重合成分の種類等に応じ、溶解力、沸点等を勘案し、公知の溶剤の中から適宜選択することできる。好ましい溶剤としては、プロピレングリコールモノメチルエーテルアセテート、ポリエチレングリコールモノメチルエーテルアセテート、トルエン、酢酸エチル、メチルエチルケトンなどが挙げられる。中でも、異方性導電層形成用組成物を塗布する際の作業性の低下(例えば、塗布膜の過度の乾燥により生ずる不具合)を防止する共に良好なフィルム特性を得るという観点からプロピレングリコールモノメチルエーテルアセテートを好ましく使用することができる。 Here, the residual solvent can be appropriately selected from known solvents in consideration of dissolving power, boiling point, and the like according to the type of film forming component and polymerization component to be used. Preferred solvents include propylene glycol monomethyl ether acetate, polyethylene glycol monomethyl ether acetate, toluene, ethyl acetate, methyl ethyl ketone and the like. Among them, propylene glycol monomethyl ether from the viewpoint of preventing deterioration in workability when applying the composition for forming an anisotropic conductive layer (for example, problems caused by excessive drying of the coating film) and obtaining good film properties. Acetate can be preferably used.
(膜形成成分)
本発明の異方性導電フィルムの異方性導電層で使用する膜形成成分としては、従来の異方性導電フィルムにおいて使用されている膜形成成分の中から、異方性導電フィルムの適用対象やセルロースエステル誘導体との相溶性等を考慮して適宜選択することができる。例えば、フェノキシ樹脂、エポキシ樹脂、不飽和ポリエステル樹脂、飽和ポリエステル樹脂、ウレタン樹脂、ブタジエン樹脂、ポリイミド樹脂、ポリアミド樹脂、ポリオレフィン樹脂などが挙げられる。これらは2種以上を併用してもよい。これらの中でも、成膜性、加工性、接続信頼性の点からフェノキシ樹脂を好ましく採用することができる。
(Film forming component)
As the film forming component used in the anisotropic conductive layer of the anisotropic conductive film of the present invention, among the film forming components used in the conventional anisotropic conductive film, the application target of the anisotropic conductive film And the compatibility with cellulose ester derivatives can be selected as appropriate. For example, phenoxy resin, epoxy resin, unsaturated polyester resin, saturated polyester resin, urethane resin, butadiene resin, polyimide resin, polyamide resin, polyolefin resin, and the like can be given. Two or more of these may be used in combination. Among these, a phenoxy resin can be preferably employed in terms of film formability, processability, and connection reliability.
膜形成成分の異方性導電層中の含有量は、膜強度と異方性導電性とを良好に保つために、質量基準で好ましくは15〜55質量%、より好ましくは30〜40質量%である。 The content of the film-forming component in the anisotropic conductive layer is preferably 15 to 55% by mass, more preferably 30 to 40% by mass on a mass basis in order to maintain good film strength and anisotropic conductivity. It is.
(重合成分)
本発明の異方性導電フィルムの異方性導電層で使用する重合成分としては、従来の異方性導電フィルムにおいて使用されている重合成分の中から異方性導電フィルムの適用対象や重合した重合成分との相溶性等を考慮して適宜選択することができる。重合開始剤がラジカル重合開始剤である場合には、ラジカル重合性アクリル系モノマー又はオリゴマーを好ましく使用することができる。具体的には、メチル(メタ)アクリレート、エチル(メタ)アクリレート、イソプロ(メタ)ピルアクリレート、イソブチル(メタ)アクリレート、リン酸基含有(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ジメチロールトリシクロデカンジ(メタ)アクリレート、テトラメチレングリコールテトラ(メタ)アクリレート、2−ヒドロキシ−1,3−ジアクリロキシプロパン、2,2−ビス[4−((メタ)アクリロキシメトキシ)フェニル]プロパン、2,2−ビス[4−((メタ)アクリロキシエトキシ)フェニル]プロパン、ジシクロペンテニル(メタ)アクリレート、トリシクロデカニル(メタ)アクリレート、トリス(アクリロキシエチル)イソシアヌレート、ウレタン(メタ)アクリレート、エポキシ(メタ)アクリレートなどが挙げられる。これらは、2種以上を併用してもよい。ここで、“(メタ)アクリレート”は、アクリレートとメタクリレートの双方を包含する。
(Polymerization component)
As the polymerization component used in the anisotropic conductive layer of the anisotropic conductive film of the present invention, the application target of the anisotropic conductive film or polymerized from the polymerization components used in the conventional anisotropic conductive film It can be appropriately selected in consideration of compatibility with the polymerization component. When the polymerization initiator is a radical polymerization initiator, a radical polymerizable acrylic monomer or oligomer can be preferably used. Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) pyr acrylate, isobutyl (meth) acrylate, phosphoric acid group-containing (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di ( (Meth) acrylate, trimethylolpropane tri (meth) acrylate, dimethyloltricyclodecane di (meth) acrylate, tetramethylene glycol tetra (meth) acrylate, 2-hydroxy-1,3-diaacryloxypropane, 2,2- Bis [4-((meth) acryloxymethoxy) phenyl] propane, 2,2-bis [4-((meth) acryloxyethoxy) phenyl] propane, dicyclopentenyl (meth) acrylate, tricyclodecanyl (meta Acry Chromatography, tris (acryloxyethyl) isocyanurate, urethane (meth) acrylate, epoxy (meth) acrylate. Two or more of these may be used in combination. Here, “(meth) acrylate” includes both acrylate and methacrylate.
また、重合開始剤がカチオン系重合開始剤である場合には、エポキシ系化合物やオキセタン系化合物を好ましく使用することができる。 In addition, when the polymerization initiator is a cationic polymerization initiator, an epoxy compound or an oxetane compound can be preferably used.
エポキシ系化合物としては、分子内に1つまたは2つ以上のエポキシ基を有する化合物、オリゴマー、ポリマーが好ましく挙げられる。これらは液状であっても、固体状であってもよい。具体的には、ビスフェノールA、ビスフェノールF、ビスフェノールS、ヘキサヒドロビスフェノールA、テトラメチルビスフェノールA、ジアリールビスフェノールA、ハイドロキノン、カテコール、レゾルシン、クレゾール、テトラブロモビスフェノールA、トリヒドロキシビフェニル、ベンゾフェノン、ビスレゾルシノール、ビスフェノールヘキサフルオロアセトン、テトラメチルビスフェノールA、テトラメチルビスフェノールF、トリス(ヒドロキシフェニル)メタン、ビキシレノール、フェノールノボラック、クレゾールノボラックなどの多価フェノールとエピクロルヒドリンとを反応させて得られるグリシジルエーテル、またはグリセリン、ネオペンチルグリコール、エチレングリコール、プロピレングリコール、チレングリコール、ヘキシレングリコール、ポリエチレングリコール、ポリプロピレングリコールなどの脂肪族多価アルコールとエピクロルヒドリンとを反応させて得られるポリグリシジルエーテル;
p−オキシ安息香酸、β−オキシナフトエ酸のようなヒドロキシカルボン酸とエピクロルヒドリンとを反応させて得られるグリシジルエーテルエステル、あるいはフタル酸、メチルフタル酸、イソフタル酸、テレフタル酸、テトラハイドロフタル酸、ヘキサハイドロフタル酸、エンドメチレンテトラハイドロフタル酸、エンドメチレンヘキサハイドロフタル酸、トリメリット酸、重合脂肪酸のようなポリカルボン酸から得られるポリグリシジルエステル;
アミノフェノール、アミノアルキルフェノールから得られるグリシジルアミノグリシジルエーテル;
アミノ安息香酸から得られるグリシジルアミノグリシジルエステル;
アニリン、トルイジン、トリブロムアニリン、キシリレンジアミン、ジアミノシクロヘキサン、ビスアミノメチルシクロヘキサン、4,4′−ジアミノジフェニルメタン、4,4′−ジアミノジフェニルスルホンなどから得られるグリシジルアミン;
エポキシ化ポリオレフィン等の公知のエポキシ樹脂類が挙げられる。また、3,4−エポキシシクロヘキセニルメチル-3′4′−エポキシシクロヘキセンカルボキシレート等の脂環式エポキシ化合物も使用することができる。
Preferred examples of the epoxy compound include compounds, oligomers, and polymers having one or more epoxy groups in the molecule. These may be liquid or solid. Specifically, bisphenol A, bisphenol F, bisphenol S, hexahydrobisphenol A, tetramethylbisphenol A, diaryl bisphenol A, hydroquinone, catechol, resorcin, cresol, tetrabromobisphenol A, trihydroxybiphenyl, benzophenone, bisresorcinol, Glycidyl ether obtained by reacting polychlorophenol and epichlorohydrin such as bisphenol hexafluoroacetone, tetramethylbisphenol A, tetramethylbisphenol F, tris (hydroxyphenyl) methane, bixylenol, phenol novolak, cresol novolak, or glycerin, Neopentyl glycol, ethylene glycol, propylene glycol, tylene glycol Lumpur, hexylene glycol, polyethylene glycol, polyglycidyl ethers obtained by reacting an aliphatic polyhydric alcohol and epichlorohydrin such as polypropylene glycol;
Glycidyl ether ester obtained by reacting hydroxycarboxylic acid such as p-oxybenzoic acid and β-oxynaphthoic acid with epichlorohydrin, or phthalic acid, methylphthalic acid, isophthalic acid, terephthalic acid, tetrahydrophthalic acid, hexahydro Polyglycidyl esters obtained from polycarboxylic acids such as phthalic acid, endomethylenetetrahydrophthalic acid, endomethylenehexahydrophthalic acid, trimellitic acid, polymerized fatty acids;
Glycidyl aminoglycidyl ether obtained from aminophenol, aminoalkylphenol;
Glycidylaminoglycidyl ester obtained from aminobenzoic acid;
Glycidylamine obtained from aniline, toluidine, tribromoaniline, xylylenediamine, diaminocyclohexane, bisaminomethylcyclohexane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylsulfone, etc .;
Known epoxy resins such as epoxidized polyolefins can be mentioned. In addition, alicyclic epoxy compounds such as 3,4-epoxycyclohexenylmethyl-3'4'-epoxycyclohexenecarboxylate can also be used.
オキセタン系化合物としては、ビス(3−エチル−3−オキセタニルメチル)エーテル、3−エチル−3−ヒドロキシメチルオキセタン、1,4−ビス{[(3−エチル−3−オキセタニル)メトキシ]メチル}ベンゼン、4,4´−ビス[(3−エチル−3−オキセタニル)メトキシメチル]ビフェニル、1,4−ベンゼンジカルボン酸 ビス[(3−エチル−3−オキセタニル)]メチルエステル、3−エチル−3−(フェノキシメチル)オキセタン、3−エチル−3−(2−エチルヘキシロキシメチル)オキセタン、3−エチル−3−{[3−(トリエトキシシリル)プロポキシ]メチル}オキセタン、オキセタニルシルセスキオキサン、フェノールノボラックオキセタン等を挙げることができる。 Examples of the oxetane compound include bis (3-ethyl-3-oxetanylmethyl) ether, 3-ethyl-3-hydroxymethyloxetane, 1,4-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} benzene. 4,4′-bis [(3-ethyl-3-oxetanyl) methoxymethyl] biphenyl, 1,4-benzenedicarboxylic acid bis [(3-ethyl-3-oxetanyl)] methyl ester, 3-ethyl-3- (Phenoxymethyl) oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3-{[3- (triethoxysilyl) propoxy] methyl} oxetane, oxetanylsilsesquioxane, phenol And novolak oxetane.
重合成分の異方性導電層中の含有量は、膜強度と異方性導電性とを良好に保つ等のために、好ましくは15〜65質量%、より好ましくは30〜50質量%である。 The content of the polymerization component in the anisotropic conductive layer is preferably 15 to 65% by mass, more preferably 30 to 50% by mass in order to keep the film strength and anisotropic conductivity favorable. .
(重合開始剤)
重合開始剤としては、重合成分の種類に応じて公知の重合開始剤の中から適宜選択して使用することができるが、残留溶剤により実質的にその重合開始特性が影響を受けないものを使用する必要がある。これは、残留溶剤により重合開始特性が影響を受けてしまうと、意図した重合反応を実現することが困難になるからである。例えば、アニオン系重合開始剤の一例であるイミダゾール系潜在性硬化剤の場合、マイクロカプセルが残留溶剤で侵されてしまう場合があり、その場合には潜在性が低下し、その結果、意図した重合反応が実現できず、保存安定性も低下する。ここで、「実質的」とは、本願発明の効果が得られるのであれば、残留溶剤により重合開始特性がわずかに影響を受けても本願発明の範囲から外れるものではないことを意味している。
(Polymerization initiator)
As the polymerization initiator, it can be used by appropriately selecting from known polymerization initiators according to the kind of the polymerization component, but the polymerization initiator is not substantially affected by the residual solvent. There is a need to. This is because if the polymerization initiation characteristics are affected by the residual solvent, it is difficult to realize the intended polymerization reaction. For example, in the case of an imidazole-based latent curing agent which is an example of an anionic polymerization initiator, the microcapsule may be attacked by the residual solvent, in which case the potential is lowered, and as a result, the intended polymerization is performed. The reaction cannot be realized, and the storage stability is also lowered. Here, “substantially” means that the polymerization initiation characteristics are not significantly deviated from the scope of the present invention as long as the effects of the present invention can be obtained, even if the polymerization initiation characteristics are slightly affected by the residual solvent. .
以上のような制約の中で、重合成分がラジカル重合性アクリル系モノマー又はオリゴマーである場合には、熱又は光によって遊離ラジカルを発生する重合開始剤を好ましく使用することができ、有機過酸化物やアゾ化合物を例示することできる。中でも、有機過酸化物を好ましく使用することができる。有機過酸化物の具体例としては、過酸化ベンゾイル、ターシャリーブチルパーオキシド、ジ−2−エチルヘキシルペルオキシジカーボネート、ジラウロイルパーオキサイド、1,1−ジ(t−ブチルパーオキシ)シクロへキサン等が挙げられる。アゾ化合物としては、2,2’−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)、2,2’−アゾビス(2,4−ジメチルバレロニトリル)(V−65)、2,2’−アゾビスイソブチロニトリル(AIBN)、2,2’−アゾビス(2−メチルブチロニトリル)、1,1−アゾビス(シクロヘキサン−1−カルボニトリル)、2,2’−アゾビス〔2−メチル−N−[1,1−ビス(ヒドロキシメチル)−2−ヒドロキシエチル]プロピオンアミド〕、ジメチル2,2’−アゾビス(2−メトキシプロピオネート)等が挙げられる。その他、アルキルフェノン、ベンゾイン、ベンゾフェノン、ジカルボニル化合物、チオキサントン、アシルホスフィンオキサイド、これらの誘導体等も重合開始剤として使用することができる。 In the above constraints, when the polymerization component is a radical polymerizable acrylic monomer or oligomer, a polymerization initiator that generates free radicals by heat or light can be preferably used. And azo compounds. Among these, organic peroxides can be preferably used. Specific examples of the organic peroxide include benzoyl peroxide, tertiary butyl peroxide, di-2-ethylhexyl peroxydicarbonate, dilauroyl peroxide, 1,1-di (t-butylperoxy) cyclohexane, and the like. Is mentioned. As the azo compound, 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 2,2′-azobis (2,4-dimethylvaleronitrile) (V-65), 2,2 ′ -Azobisisobutyronitrile (AIBN), 2,2'-azobis (2-methylbutyronitrile), 1,1-azobis (cyclohexane-1-carbonitrile), 2,2'-azobis [2-methyl -N- [1,1-bis (hydroxymethyl) -2-hydroxyethyl] propionamide], dimethyl 2,2′-azobis (2-methoxypropionate) and the like. In addition, alkylphenone, benzoin, benzophenone, dicarbonyl compound, thioxanthone, acylphosphine oxide, derivatives thereof and the like can also be used as a polymerization initiator.
また、重合成分がエポキシ系化合物やオキセタン系化合物である場合、光や熱の作用、好ましくは熱の作用で重合開始するカチオン系重合開始剤を好ましく使用することができる。このようなカチオン系重合開始剤としては、公知のものを使用することができ、例えば、アリールジアゾニウム塩系重合開始剤、アリールヨードニウム塩系重合開始剤、アリールスルホニウム塩系重合開始剤、アレン−イオン錯体系重合開始剤、金属(例えば、アルミニウム、チタン、亜鉛、錫など)とアセト酢酸エステルまたはジケトン類とのキレート系重合開始剤等を使用することができる。特に、低温での反応性に優れ、ポットライフが長い点から、アリールスルホニウム塩系重合開始剤を使用することが好ましい。 When the polymerization component is an epoxy compound or an oxetane compound, a cationic polymerization initiator that initiates polymerization by the action of light or heat, preferably by the action of heat, can be preferably used. As such cationic polymerization initiators, known ones can be used, for example, aryldiazonium salt polymerization initiators, aryliodonium salt polymerization initiators, arylsulfonium salt polymerization initiators, allene ions. A complex polymerization initiator, a chelate polymerization initiator of a metal (for example, aluminum, titanium, zinc, tin, etc.) and an acetoacetate ester or a diketone can be used. In particular, it is preferable to use an arylsulfonium salt polymerization initiator from the viewpoint of excellent reactivity at low temperatures and a long pot life.
本発明で使用し得る市販されているカチオン系重合開始剤の具体例としては、例えば、アリールジアゾニウム塩[例えば、PP−33((株)ADEKA製)]、アリールヨードニウム塩、アリールスルホニウム塩[例えば、FC−509、FC−540(3M社製)、UVE1014(G.E.社製)、UVI−6974、UVI−6970、UVI−6990、UVI−6950(ユニオン・カーバイド社製)、SP−170、SP−150、CP−66、CP−77など((株)ADEKA製)]、SI−60L、SI−80L、SI−100L、SI−110L(三新化学工業(株)社製)、アレン−イオン錯体[例えば、CG−24−61(チバガイギー社製)]が挙げられる。 Specific examples of commercially available cationic polymerization initiators that can be used in the present invention include, for example, aryldiazonium salts [for example, PP-33 (manufactured by ADEKA)], aryliodonium salts, arylsulfonium salts [for example, , FC-509, FC-540 (manufactured by 3M), UVE1014 (manufactured by GE), UVI-6974, UVI-6970, UVI-6990, UVI-6950 (manufactured by Union Carbide), SP-170 , SP-150, CP-66, CP-77, etc. (manufactured by ADEKA Corporation)], SI-60L, SI-80L, SI-100L, SI-110L (manufactured by Sanshin Chemical Industry Co., Ltd.), Allen -Ion complex [for example, CG-24-61 (made by Ciba-Geigy)] is mentioned.
これらの重合開始剤の異方性導電層中の含有量は、異方性導電層の硬化率を向上させ且つ粒子捕捉率の低下を抑制するために、重合成分100質量部に対し、好ましくは1〜20質量部、より好ましくは3〜10質量部である。 The content of these polymerization initiators in the anisotropic conductive layer is preferably based on 100 parts by mass of the polymerization component in order to improve the curing rate of the anisotropic conductive layer and suppress the decrease in the particle capture rate. It is 1-20 mass parts, More preferably, it is 3-10 mass parts.
(導電性粒子)
本発明の異方性導電フィルムの異方性導電層が含有する導電性粒子としては、異方性導電接続に適用されている公知の導電性粒子の中から、異方性導電フィルムの使用目的に応じて適宜選択使用することができる。このような導電性粒子としては、金属粒子、金属被覆樹脂粒子などが挙げられる。金属粒子としては、ニッケル粒子、コバルト粒子、銀粒子、銅粒子、金粒子、パラジウム粒子などが挙げられる。金属被覆樹脂粒子としては、スチレン−ジビニルベンゼン共重合体粒子、ベンゾグアナミン樹脂粒子、架橋ポリスチレン樹脂粒子、アクリル樹脂粒子、スチレン−シリカ複合樹脂粒子などのコア樹脂粒子の表面を、ニッケル、銅、金、及びパラジウム等の金属で被覆したものが挙げられる。これらの金属粒子や金属被覆樹脂粒子の表面には、必要に応じて、金やパラジウムの薄膜や、異方性導電接続時には破れてしまうような絶縁樹脂薄膜を形成してもよい。
(Conductive particles)
As the conductive particles contained in the anisotropic conductive layer of the anisotropic conductive film of the present invention, among the known conductive particles applied to anisotropic conductive connection, the intended use of the anisotropic conductive film It can be appropriately selected and used depending on. Examples of such conductive particles include metal particles and metal-coated resin particles. Examples of the metal particles include nickel particles, cobalt particles, silver particles, copper particles, gold particles, and palladium particles. As the metal-coated resin particles, the surface of core resin particles such as styrene-divinylbenzene copolymer particles, benzoguanamine resin particles, crosslinked polystyrene resin particles, acrylic resin particles, styrene-silica composite resin particles, nickel, copper, gold, And those coated with a metal such as palladium. On the surface of these metal particles and metal-coated resin particles, a thin film of gold or palladium, or an insulating resin thin film that is torn during anisotropic conductive connection may be formed as necessary.
導電性粒子の平均粒子径は、異方性導電フィルムの使用目的に応じた確実な異方性導電接続を実現するために、好ましくは1〜10μm、より好ましくは2〜5μmである。 The average particle diameter of the conductive particles is preferably 1 to 10 μm, more preferably 2 to 5 μm, in order to realize reliable anisotropic conductive connection according to the purpose of use of the anisotropic conductive film.
異方性導電フィルムの異方性導電層中における導電性粒子の含有量は、異方性導電フィルムの使用目的に応じた確実な異方性導電接続を実現するために、質量基準で好ましくは5〜50%、より好ましくは10〜35%である。 The content of the conductive particles in the anisotropic conductive layer of the anisotropic conductive film is preferably on a mass basis in order to realize a reliable anisotropic conductive connection according to the purpose of use of the anisotropic conductive film. 5 to 50%, more preferably 10 to 35%.
(シランカップリング剤)
本発明の異方性導電フィルムの異方性導電層は、ガラス基板等の特に無機基板への密着性を向上させるために公知のシランカップリング剤を含有することができる。例えば、エポキシ系シランカップリング剤、アクリル系シランカップリング剤、チオール系シランカップリング剤、アミン系シランカップリング剤等の中から、異方性導電フィルムの使用目的等に応じて適宜選択することができる。
(Silane coupling agent)
The anisotropic conductive layer of the anisotropic conductive film of the present invention can contain a known silane coupling agent in order to improve adhesion to a particularly inorganic substrate such as a glass substrate. For example, an epoxy-based silane coupling agent, an acrylic silane coupling agent, a thiol-based silane coupling agent, an amine-based silane coupling agent, and the like are appropriately selected according to the purpose of use of the anisotropic conductive film. Can do.
異方性導電フィルムの異方性導電層中のシランカップリング剤の含有量は、シランカップリング剤の確実な添加効果を実現するために、膜形成成分と硬化成分との合計100質量部に対し、好ましくは0.5〜5質量部、より好ましくは1〜3質量部である。 The content of the silane coupling agent in the anisotropic conductive layer of the anisotropic conductive film is set to 100 parts by mass in total of the film-forming component and the curing component in order to achieve a reliable addition effect of the silane coupling agent. On the other hand, Preferably it is 0.5-5 mass parts, More preferably, it is 1-3 mass parts.
(その他の成分)
本発明の異方性導電フィルムの異方性導電層は、必要に応じて、着色剤、酸化防止剤、防錆剤等の各種添加剤を含有することができる。
(Other ingredients)
The anisotropic conductive layer of the anisotropic conductive film of this invention can contain various additives, such as a coloring agent, antioxidant, and a rust inhibitor, as needed.
(異方性導電層の厚さ)
異方性導電層の厚さは、導電性粒子の粒径との関係から好ましくは3〜12μm、より好ましくは4〜6μmである。また、異方性導電層の厚さは、厚過ぎると異方性導電接続させるべき端子間に導電性粒子が捕捉され難くなる傾向があり、薄すぎると異方性導電フィルム中の導電性粒子の分散状態が不均一となり易く、また、異方性導電層形成用組成物の塗布性が低下する傾向があるので、異方性導電フィルムの全厚の好ましくは10〜40%、より好ましくは20〜30%である。
(Thickness of anisotropic conductive layer)
The thickness of the anisotropic conductive layer is preferably 3 to 12 μm, more preferably 4 to 6 μm, in relation to the particle size of the conductive particles. Further, if the thickness of the anisotropic conductive layer is too thick, there is a tendency that the conductive particles are not easily captured between the terminals to be anisotropically conductive, and if it is too thin, the conductive particles in the anisotropic conductive film The dispersion state of the film tends to be non-uniform, and the applicability of the composition for forming an anisotropic conductive layer tends to decrease. Therefore, the total thickness of the anisotropic conductive film is preferably 10 to 40%, more preferably 20-30%.
<絶縁性樹脂層>
(膜形成成分)
本発明の異方性導電フィルムを構成する絶縁性樹脂層は、接続させるべき基板と電子部品との間の接着と配線間の絶縁性を担保するための層であり、膜形成成分を少なくとも含有する。膜形成成分としては、異方性導電層に適用可能なものの中から選択して使用することができる。また、絶縁性樹脂層は、膜形成成分に加え、必要に応じて、異方性導電層と同様な重合成分、重合開始剤、シランカップリング剤、着色剤、酸化防止剤、防錆剤、溶剤等の各種添加剤を含有することができる。好ましくは、導電性粒子を含有しないこと以外は、異方性導電層と同様の配合成分から構成する。
<Insulating resin layer>
(Film forming component)
The insulating resin layer constituting the anisotropic conductive film of the present invention is a layer for ensuring the adhesion between the substrate to be connected and the electronic component and the insulation between the wirings, and contains at least a film forming component To do. The film forming component can be selected from those applicable to the anisotropic conductive layer. In addition to the film-forming component, the insulating resin layer includes, if necessary, the same polymerization component as the anisotropic conductive layer, a polymerization initiator, a silane coupling agent, a colorant, an antioxidant, a rust inhibitor, Various additives such as a solvent can be contained. Preferably, it is comprised from the same compounding component as an anisotropic conductive layer except not containing electroconductive particle.
なお、絶縁性樹脂層の残留溶剤量は、異方性導電フィルムをリールに巻いた際のリール側面への樹脂成分のはみ出しによる不具合の発生を抑制する観点から好ましくは0.1〜10質量%、より好ましくは0.1〜5質量%である。 The amount of residual solvent in the insulating resin layer is preferably 0.1 to 10% by mass from the viewpoint of suppressing the occurrence of problems due to the protrusion of the resin component on the side surface of the reel when the anisotropic conductive film is wound around the reel. More preferably, it is 0.1-5 mass%.
(絶縁性樹脂層の厚さ)
絶縁性樹脂層の厚さは、異方性導電接続させるべき基板と電子部品との間に接着に十分な量の絶縁性樹脂を充填するという観点から、好ましくは5〜25μm、より好ましくは10〜20μmである。
(Insulating resin layer thickness)
The thickness of the insulating resin layer is preferably 5 to 25 μm, more preferably 10 from the viewpoint of filling a sufficient amount of insulating resin for adhesion between the substrate to be anisotropically conductive and the electronic component. ˜20 μm.
<異方性導電フィルムの製造>
本発明の異方性導電フィルムは、以下のように製造することができる。まず、膜形成成分と必要に応じて他の成分とをプロピレングリコールモノメチルエーテルアセテート等の溶剤と共に、公知の混合手法により均一に混合して絶縁性樹脂層形成用組成物を調製し、公知のコート手法により剥離シート上に所定の乾燥厚み(通常、8〜20μmの厚み)となるように塗布し、60〜80℃に調整された乾燥炉中で2〜8分乾燥することにより絶縁性樹脂層を形成する。次に、上述の膜形成成分、重合成分、重合開始剤、導電性粒子、更に必要に応じてシランカップリング剤などの他の添加成分とを、プロピレングリコールモノメチルエーテルアセテート等の溶剤と共に、公知の混合手法により均一に混合して異方性導電層形成用組成物を調製し、この組成物を公知のコート手法により、別の剥離シート上に、所定の乾燥厚み(通常、4〜10μmの厚み)となるように塗布し、60〜80℃に調整された乾燥炉中で乾燥することにより異方性導電層を形成する。得られた異方性導電層と絶縁性樹脂層とを公知の手法・条件で貼り合わせることにより本発明の異方性導電フィルムを得ることができる。
<Manufacture of anisotropic conductive film>
The anisotropic conductive film of the present invention can be produced as follows. First, an insulating resin layer forming composition is prepared by uniformly mixing a film-forming component and other components as necessary with a solvent such as propylene glycol monomethyl ether acetate by a known mixing method, Insulating resin layer by applying to a predetermined dry thickness (usually 8 to 20 μm) on the release sheet by a technique and drying in a drying oven adjusted to 60 to 80 ° C. for 2 to 8 minutes Form. Next, the above-described film-forming component, polymerization component, polymerization initiator, conductive particles, and other optional components such as a silane coupling agent, if necessary, together with a solvent such as propylene glycol monomethyl ether acetate are known. A composition for forming an anisotropic conductive layer is prepared by uniformly mixing by a mixing method, and this composition is coated on another release sheet by a known coating method to a predetermined dry thickness (usually a thickness of 4 to 10 μm). ) And drying in a drying oven adjusted to 60 to 80 ° C. to form an anisotropic conductive layer. The anisotropic conductive film of the present invention can be obtained by laminating the obtained anisotropic conductive layer and insulating resin layer by a known method and conditions.
このように得られる本発明の異方性導電フィルムは、例えば、ITOガラス基板、フレキシブル基板、リジッド基板、ICモジュール、マザーボードなどの基板に、ICチップ、TABテープ、液晶パネル、各種基板などの電子部品を異方性導電接続して接続構造体を製造する際に好ましく適用することができる。本発明の接続構造体の製造方法について以下に説明する。 The anisotropic conductive film of the present invention thus obtained can be applied to substrates such as an ITO glass substrate, a flexible substrate, a rigid substrate, an IC module, and a mother board, and an electronic device such as an IC chip, a TAB tape, a liquid crystal panel, and various substrates. This can be preferably applied when manufacturing a connection structure by anisotropically connecting parts. The manufacturing method of the connection structure of this invention is demonstrated below.
<接続構造体の製造方法>
本発明の接続構造体の製造方法は、基板の端子と電子部品の端子とが異方性導電フィルムで異方性導電接続された接続構造体の製造方法であって、以下の工程(A)〜(C)を有する。
<Method for manufacturing connection structure>
The method for manufacturing a connection structure of the present invention is a method for manufacturing a connection structure in which a terminal of a substrate and a terminal of an electronic component are anisotropically conductively connected by an anisotropic conductive film, and includes the following step (A): ~ (C).
(工程(A)の仮貼り工程)
まず、既に説明したような基板の端子上に本発明の異方性導電フィルムを、異方性導電層側から仮貼りする。仮貼りの手法と条件は、公知の手法と条件の中から適宜選択することができる。通常は、異方性導電フィルムが本硬化しない程度に加熱加圧することで仮貼りする。
(Temporary sticking step of step (A))
First, the anisotropic conductive film of the present invention is temporarily attached on the terminal of the substrate as described above from the anisotropic conductive layer side. The temporarily pasting technique and conditions can be appropriately selected from known techniques and conditions. Usually, temporary sticking is carried out by heating and pressurizing to such an extent that an anisotropic conductive film does not fully cure.
(工程(B)の載置工程)
次に、仮貼りされた異方性導電フィルム上に電子部品を、その端子が基板の端子と対向するように載置する。載置の手法としては、公知の手法を採用することができる。通常は、異方性導電フィルムが本硬化しない程度に加熱加圧することで基板と電子部品を一時的に固定する。
(Placement step of step (B))
Next, the electronic component is placed on the temporarily attached anisotropic conductive film so that the terminal faces the terminal of the substrate. As a mounting method, a known method can be employed. Usually, a board | substrate and an electronic component are temporarily fixed by heat-pressing so that an anisotropic conductive film may not fully cure.
(工程(C)の接続工程)
工程(B)の載置工程を経て、基板に載置された電子部品を加熱押圧部材により加熱及び押圧することにより、基板の端子と電子部品の端子とを異方性導電接続させて接続構造体を得る。このようにして得られる接続構造体も本発明の一部である。ここで、加熱及び押圧するための手法としては、異方性導電接続の際に従来より用いられている加熱加圧装置を用いて行うことができる。また、加熱条件、押圧条件も、異方性導電フィルムに使用した材料の種類などに応じて適宜設定することができる。
(Connection process of process (C))
A connection structure in which the terminals of the substrate and the terminals of the electronic component are anisotropically conductively connected by heating and pressing the electronic component placed on the substrate through the heat pressing member through the placing step of the step (B). Get the body. The connection structure thus obtained is also part of the present invention. Here, as a method for heating and pressing, it can be performed using a heating and pressing apparatus conventionally used in anisotropic conductive connection. Moreover, a heating condition and a pressing condition can also be appropriately set according to the type of material used for the anisotropic conductive film.
以下、本発明を実施例により具体的に説明するが、本発明は、これらの実施例に何ら限定されるものではない。 EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples. However, the present invention is not limited to these examples.
参考例1(異方性導電層形成用組成物の調製)
膜形成成分としてフェノキシ樹脂(YP50、新日鐵化学(株)製)40質量部と、重合成分としてビスフェノールA型液状エポキシ樹脂(EP828、ジャパンエポキシレジン(株))40質量部と、カチオン系重合開始剤としてアリールスルホニウム塩化合物(SI−60L、三新化学工業(株))5質量部と、導電性粒子(平均粒径3μmの樹脂コアにNiメッキしたもの、積水化学工業社製)40質量部と、溶剤としてプロピレングリコールモノメチルエーテルアセテート(PMA)85質量部とを、ミキサーを用いて均一に混合することにより異方性導電フィルムの異方性導電層形成用組成物を得た。
Reference Example 1 (Preparation of composition for forming anisotropic conductive layer)
40 parts by mass of a phenoxy resin (YP50, manufactured by Nippon Steel Chemical Co., Ltd.) as a film forming component, 40 parts by mass of a bisphenol A type liquid epoxy resin (EP828, Japan Epoxy Resin Co., Ltd.) as a polymerization component, and cationic polymerization As an initiator, 5 parts by mass of an arylsulfonium salt compound (SI-60L, Sanshin Chemical Industry Co., Ltd.) and conductive particles (Ni-plated resin core with an average particle size of 3 μm, manufactured by Sekisui Chemical Co., Ltd.) 40 masses Part and 85 parts by mass of propylene glycol monomethyl ether acetate (PMA) as a solvent were uniformly mixed using a mixer to obtain a composition for forming an anisotropic conductive layer of an anisotropic conductive film.
参考例2(絶縁性樹脂層形成用組成物の調製)
膜形成成分としてフェノキシ樹脂(YP50、新日鐵化学(株)製)40質量部と、重合成分としてビスフェノールA型液状エポキシ樹脂(EP828、ジャパンエポキシレジン(株))40質量部と、カチオン系重合開始剤としてアリールスルホニウム塩化合物(SI−60L、三新化学工業(株))5質量部と、溶剤としてプロピレングリコールモノメチルエーテルアセテート(PMA)85質量部とを、ミキサーを用いて均一に混合することにより、異方性導電フィルムの絶縁性樹脂層形成用組成物を得た。
Reference Example 2 (Preparation of insulating resin layer forming composition)
40 parts by mass of a phenoxy resin (YP50, manufactured by Nippon Steel Chemical Co., Ltd.) as a film forming component, 40 parts by mass of a bisphenol A type liquid epoxy resin (EP828, Japan Epoxy Resin Co., Ltd.) as a polymerization component, and cationic polymerization Mix 5 parts by mass of an arylsulfonium salt compound (SI-60L, Sanshin Chemical Industry Co., Ltd.) as an initiator and 85 parts by mass of propylene glycol monomethyl ether acetate (PMA) as a solvent using a mixer. Thus, an insulating resin layer forming composition for an anisotropic conductive film was obtained.
参考例3(異方性導電層の作成)
参考例1で得られた異方性導電層形成用組成物を、バーコータを用いて、表1の乾燥厚と残留溶剤量となるように、25μm厚のベースフィルム(剥離処理したポリエチレンテレフタレートフィルム)に塗布し、70℃のオーブン中で乾燥することにより異方性導電層を得た。なお、異方性導電層の厚さの調整は、塗布時のバーコータのギャップを調整することで行い、残留溶剤量の調整は、最長6分間という制約の中で乾燥時間を変更することで行った。
Reference Example 3 (Creation of anisotropic conductive layer)
Using a bar coater, the anisotropic conductive layer forming composition obtained in Reference Example 1 is a 25 μm-thick base film (a polyethylene terephthalate film subjected to a release treatment) so as to have the dry thickness and residual solvent amount shown in Table 1. An anisotropic conductive layer was obtained by applying to an oven and drying in an oven at 70 ° C. The thickness of the anisotropic conductive layer is adjusted by adjusting the gap of the bar coater at the time of coating, and the residual solvent amount is adjusted by changing the drying time within the constraint of a maximum of 6 minutes. It was.
なお、残留溶剤量の測定は、得られた異方性導電層をベースフィルムから引き剥がし、単体の異方性導電層の重量[W0]を測定した後、異方性導電層を135℃のオーブン中に5分間投入して揮発成分を除去した後、再び重量[W1]を測定し、以下の式に従って算出した。 The residual solvent amount was measured by peeling the obtained anisotropic conductive layer from the base film, measuring the weight [W 0 ] of the single anisotropic conductive layer, and then measuring the anisotropic conductive layer at 135 ° C. After removing the volatile components by putting them in the oven for 5 minutes, the weight [W 1 ] was measured again and calculated according to the following formula.
参考例4(絶縁性樹脂層の作成)
参考例2で得られた絶縁性樹脂層形成用組成物を、バーコータを用いて、表1の乾燥厚と残留溶剤量となるように、50μm厚のベースフィルム(剥離処理したポリエチレンテレフタレートフィルム)に塗布し乾燥することにより絶縁性樹脂層を得た。なお、絶縁性樹脂層の厚さと残留溶剤量のそれぞれの調整は、異方性導電層と同様に行った。
Reference example 4 (creation of an insulating resin layer)
Using a bar coater, the composition for forming an insulating resin layer obtained in Reference Example 2 was applied to a 50 μm-thick base film (peeled polyethylene terephthalate film) so as to have the dry thickness and residual solvent amount shown in Table 1. The insulating resin layer was obtained by applying and drying. In addition, each adjustment of the thickness of an insulating resin layer and the amount of residual solvents was performed similarly to the anisotropic conductive layer.
実施例1〜5,比較例1〜4(異方性導電フィルムの作成)
表1に示す異方性導電層と絶縁性樹脂層とを、ロール式ラミネーターを用いて、温度45℃で圧力0.2MPa(エア圧)という条件で貼り合わせ、異方性導電層側のベースフィルム(剥離PETフィルム)を取り除くことにより絶縁樹脂層側にベースフィルムが配置された異方性導電フィルムを作成した。
Examples 1-5, Comparative Examples 1-4 (creation of anisotropic conductive film)
The anisotropic conductive layer and the insulating resin layer shown in Table 1 were bonded together using a roll laminator at a temperature of 45 ° C. and a pressure of 0.2 MPa (air pressure). By removing the film (peeled PET film), an anisotropic conductive film having a base film disposed on the insulating resin layer side was prepared.
(評価)
得られた実施例及び比較例の異方性導電フィルムについて、「圧着外観」、「汚染物質の残量」、「ベースフィルム剥離性」、及びリール巻きの際の「ブロッキング特性」の各項目を以下に説明するように試験・評価した。得られた結果を表1に示す。
(Evaluation)
About the anisotropic conductive films of the obtained Examples and Comparative Examples, each item of “crimp appearance”, “remaining amount of contaminants”, “base film peelability”, and “blocking characteristics” at the time of reel winding Testing and evaluation were performed as described below. The obtained results are shown in Table 1.
「圧着外観」
アセトンで表面の汚染物質が除去された液晶パネル用のガラス基板を、80℃に設定されたホットプレート上に裏面側から載置し、表面のITO配線面に400μm厚のシリコーンゴムシート(HC−30A、信越化学工業(株))を重ね、ハンドローラを用いて60秒間圧接した。このガラス基板の表面上に、異方性導電フィルムを異方性導電層側から仮貼りし、更に異方性導電フィルム上にフリップチップ接続用ICチップ(1.8mm×2.0mm×0.5mm厚)を載置し、圧着温度170℃、圧着圧力125N/IC、圧着時間5秒という条件でフリップチップボンダ(TBX、パナソニックファクトリーソリューション(株))で熱圧着した。熱圧着したICチップとガラス基板との界面の「浮き」を観察し、以下の基準で評価した。
"Crimping appearance"
A glass substrate for a liquid crystal panel from which surface contaminants have been removed with acetone is placed on a hot plate set at 80 ° C. from the back side, and a 400 μm thick silicone rubber sheet (HC−) is placed on the front ITO wiring surface. 30A, Shin-Etsu Chemical Co., Ltd.) was stacked and pressed with a hand roller for 60 seconds. On the surface of this glass substrate, an anisotropic conductive film was temporarily attached from the side of the anisotropic conductive layer, and further an IC chip for flip chip connection (1.8 mm × 2.0 mm × 0. 5 mm thickness) was placed, and thermocompression bonding was performed with a flip chip bonder (TBX, Panasonic Factory Solution Co., Ltd.) under the conditions of a pressure bonding temperature of 170 ° C., a pressure bonding pressure of 125 N / IC, and a pressure bonding time of 5 seconds. The “floating” of the interface between the thermocompression bonded IC chip and the glass substrate was observed and evaluated according to the following criteria.
ランク 評価判断基準
○: 「浮き」が全く観察されない場合
△: ICチップの異方性導電フィルム側表面の全面積の1%未満の面積にしか、「浮き」が観察されなかった場合
×: ICチップの異方性導電フィルム側表面の全面積の1%以上の面積に、「浮き」が観察された場合
Rank Evaluation criteria ○: When “floating” is not observed at all Δ: When “floating” is observed only in an area of less than 1% of the total area of the anisotropic conductive film side surface of the IC chip ×: IC When “floating” is observed in an area of 1% or more of the total area of the chip's anisotropic conductive film side surface
「汚染物質の残量」
圧着外観の試験を行ったガラス基板上のICチップを、ダイシェア試験機(Dage2400、デイジ社製)で剥離し、ICチップの剥離面にマイクロシリンジからn−ヘキサン5μlを適用し、直ちにマイクロシリンジでそのn−ヘキサンを回収した。回収したn−ヘキサンをプレート状の支持体に垂らし、乾燥させた。乾燥終了後、支持体に残存した残留物をFT−IR装置(品番FT/IR−4100、日本分光社製)を用いて分析し、汚染物質として環状シリコーンオリゴマー特有の吸収波長ピーク(特有ピーク)(800cm−1、1260cm−1)が観測されたか否かを判定し、以下の基準で評価した。
"Residual amount of pollutants"
The IC chip on the glass substrate on which the appearance of the crimping appearance was tested was peeled off with a die shear tester (Dage 2400, manufactured by Daisy), and 5 μl of n-hexane was applied from the microsyringe to the peeling surface of the IC chip. The n-hexane was recovered. The collected n-hexane was hung on a plate-like support and dried. After completion of drying, the residue remaining on the support is analyzed using an FT-IR apparatus (Part No. FT / IR-4100, manufactured by JASCO Corporation), and the absorption wavelength peak (specific peak) peculiar to the cyclic silicone oligomer as a contaminant. Whether or not (800 cm −1 , 1260 cm −1 ) was observed was determined and evaluated according to the following criteria.
ランク 評価判断基準
◎: ピークが全く観察されない場合
○: 内部標準ピーク(スチレン)に対する特有ピークの検出強度が5%未満である場合
×: 内部標準ピーク(スチレン)に対する特有ピークの検出強度が5%以上である場合
Rank Evaluation criteria ◎: When no peak is observed ○: When the detected intensity of the specific peak with respect to the internal standard peak (styrene) is less than 5% ×: The detected intensity of the specific peak with respect to the internal standard peak (styrene) is 5% If it is above
「ベースフィルム剥離性」
異方性導電フィルムを5cm幅にカットし、引っ張り試験機(テンシロン、オリエンテック(株))を用いて異方性導電フィルムとベースフィルム(剥離PETフィルム)との間の剥離力を測定した。実用上0.1N/5cm以下であることが望ましい。
"Base film peelability"
The anisotropic conductive film was cut into a width of 5 cm, and the peel force between the anisotropic conductive film and the base film (peeled PET film) was measured using a tensile tester (Tensilon, Orientec Co., Ltd.). It is desirable that it is 0.1N / 5cm or less practically.
「ブロッキング特性」
異方性導電フィルムを1.5mm幅にスリットし、プラリールに100m巻き取り、1.5mm幅×100mのリール品を作成した。このリール品の中央に中心軸を貫通させ、その中心軸に対し、その周りに回転しないようにリール品を固定した後、最外周の異方性導電フィルムに50gの重りを取り付け、30℃の室内に3時間放置した。放置後、リール品から異方性導電フィルムを引き出し、ブロッキングの発生の有無を調べ、以下の基準で評価した。
"Blocking characteristics"
The anisotropic conductive film was slit to a width of 1.5 mm, and wound about 100 m on a plastic reel to produce a reel product having a width of 1.5 mm × 100 m. After the central axis is passed through the center of the reel product and the reel product is fixed so as not to rotate around the central axis, a 50 g weight is attached to the outermost anisotropic conductive film, Left in the room for 3 hours. After leaving, the anisotropic conductive film was pulled out from the reel product, checked for the presence of blocking, and evaluated according to the following criteria.
ランク 評価判断基準
○: ブロッキングが発生しない場合
△: 長さ1m未満のブロッキングが発生した場合
×: 長さ1m以上のブロッキングが発生した場合
Rank Evaluation criteria ○: When blocking does not occur △: When blocking less than 1 m in length occurs ×: When blocking of 1 m or more in length occurs
(考察)
実施例1〜5の異方性導電フィルムは、「圧着外観」、「汚染物質の残量」、「ベースフィルム剥離性」、「ブロッキング特性」の各評価項目について、良好な結果を示した。それに対し、比較例1の異方性導電フィルムは、残留溶剤量の多い異方性導電層が単層で且つ厚いため、「ベースフィルム剥離性」及び「ブロッキング特性」の評価結果が実施例に比べ劣っていた。比較例2及び3の異方性導電フィルムの場合、異方性導電層の残留溶剤量が少ないため、「圧着外観」及び「汚染物質の残量」の評価結果が、実施例に比べ劣っていた。比較例4の異方性導電フィルムの場合、絶縁性樹脂層の残留溶剤量は多いものの、ガラス基板に接している異方性導電層の残留溶剤量が少ないため、比較例2及び3と同様に、「圧着外観」及び「汚染物質の残量」の評価結果が、実施例に比べ劣っていた。
(Discussion)
The anisotropic conductive films of Examples 1 to 5 showed good results for each evaluation item of “crimp appearance”, “residual amount of contaminants”, “base film peelability”, and “blocking characteristics”. On the other hand, since the anisotropic conductive film of Comparative Example 1 has a single layer and a thick anisotropic conductive layer with a large amount of residual solvent, the evaluation results of “base film peelability” and “blocking characteristic” are examples. It was inferior compared. In the case of the anisotropic conductive films of Comparative Examples 2 and 3, since the amount of residual solvent in the anisotropic conductive layer is small, the evaluation results of “crimped appearance” and “residual amount of contaminants” are inferior to those of Examples. It was. In the case of the anisotropic conductive film of Comparative Example 4, although the amount of residual solvent in the insulating resin layer is large, the amount of residual solvent in the anisotropic conductive layer in contact with the glass substrate is small, so that the same as in Comparative Examples 2 and 3 In addition, the evaluation results of “crimp appearance” and “remaining amount of contaminants” were inferior to those of the examples.
本発明の異方性導電フィルムは、異方性導電接続に適用した際に「浮き」を発生させず、また、リールに巻いてもベースフィルムから剥がれ易く、ブロッキングも抑制されたものとなる。よって、本発明の異方性導電フィルムは、各種基板と電子部品との異方性導電接続に有用である。 The anisotropic conductive film of the present invention does not generate “float” when applied to anisotropic conductive connection, and is easily peeled off from the base film even when wound on a reel, and blocking is also suppressed. Therefore, the anisotropic conductive film of the present invention is useful for anisotropic conductive connection between various substrates and electronic components.
Claims (10)
膜形成成分、重合成分、重合開始剤及び導電性粒子を含有する異方性導電層と、膜形成成分を含有する絶縁性樹脂層とが積層された2層構造を有し、
該異方性導電層における残留溶剤量が2質量%以上8質量%以下であり、
該重合開始剤が残留溶剤によりその重合開始特性が影響を受けないものである異方性導電フィルム。 An anisotropic conductive film for anisotropic conductive connection between a terminal of a substrate and a terminal of an electronic component,
It has a two-layer structure in which an anisotropic conductive layer containing a film forming component, a polymerization component, a polymerization initiator and conductive particles and an insulating resin layer containing a film forming component are laminated,
The amount of residual solvent in the anisotropic conductive layer is 2 % by mass or more and 8% by mass or less ,
ACF polymerization initiator is one that polymerization initiation properties of resources by the residual solvent is not affected.
(A) 基板の端子上に請求項1ないし8のいずれかに記載の異方性導電フィルムを、異方性導電層側から仮貼りする仮貼り工程;
(B) 仮貼りされた異方性導電フィルム上に電子部品を、その端子が基板の端子と対向するように載置する載置工程; 及び
(C) 載置された電子部品を加熱押圧部材により加熱及び押圧することにより、基板の端子と電子部品の端子とを異方性導電接続させて接続構造体を得る接続工程
を有する製造方法。 A method for manufacturing a connection structure in which a terminal of a substrate and a terminal of an electronic component are anisotropically conductively connected by an anisotropic conductive film, the following steps (A) to (C):
(A) Temporary sticking step of temporarily sticking the anisotropic conductive film according to any one of claims 1 to 8 on the terminal of the substrate from the anisotropic conductive layer side;
(B) a placing step of placing an electronic component on the temporarily attached anisotropic conductive film such that the terminal faces the terminal of the substrate; and (C) a heating pressing member for placing the electronic component The manufacturing method which has the connection process of obtaining the connection structure by making the terminal of a board | substrate and the terminal of an electronic component carry out anisotropic conductive connection by heating and pressing by.
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