JP6140493B2 - 光学デバイスの製造方法 - Google Patents

光学デバイスの製造方法 Download PDF

Info

Publication number
JP6140493B2
JP6140493B2 JP2013061195A JP2013061195A JP6140493B2 JP 6140493 B2 JP6140493 B2 JP 6140493B2 JP 2013061195 A JP2013061195 A JP 2013061195A JP 2013061195 A JP2013061195 A JP 2013061195A JP 6140493 B2 JP6140493 B2 JP 6140493B2
Authority
JP
Japan
Prior art keywords
transparent member
metal film
member wafer
mask
forming step
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013061195A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014186174A5 (enrdf_load_stackoverflow
JP2014186174A (ja
Inventor
古堅　由紀子
由紀子 古堅
若林　小太郎
小太郎 若林
真吾 石内
真吾 石内
明則 伊東
明則 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2013061195A priority Critical patent/JP6140493B2/ja
Priority to CN201410109777.1A priority patent/CN104060221B/zh
Priority to US14/223,651 priority patent/US9579858B2/en
Publication of JP2014186174A publication Critical patent/JP2014186174A/ja
Publication of JP2014186174A5 publication Critical patent/JP2014186174A5/ja
Application granted granted Critical
Publication of JP6140493B2 publication Critical patent/JP6140493B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Spectrometry And Color Measurement (AREA)
  • Optical Filters (AREA)
  • Micromachines (AREA)
JP2013061195A 2013-03-23 2013-03-23 光学デバイスの製造方法 Expired - Fee Related JP6140493B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013061195A JP6140493B2 (ja) 2013-03-23 2013-03-23 光学デバイスの製造方法
CN201410109777.1A CN104060221B (zh) 2013-03-23 2014-03-21 光学器件制造方法
US14/223,651 US9579858B2 (en) 2013-03-23 2014-03-24 Method of manufacturing optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013061195A JP6140493B2 (ja) 2013-03-23 2013-03-23 光学デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2014186174A JP2014186174A (ja) 2014-10-02
JP2014186174A5 JP2014186174A5 (enrdf_load_stackoverflow) 2015-12-24
JP6140493B2 true JP6140493B2 (ja) 2017-05-31

Family

ID=51833817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013061195A Expired - Fee Related JP6140493B2 (ja) 2013-03-23 2013-03-23 光学デバイスの製造方法

Country Status (1)

Country Link
JP (1) JP6140493B2 (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5370246B2 (ja) * 2009-05-27 2013-12-18 セイコーエプソン株式会社 光フィルター、光フィルター装置、分析機器、および光フィルターの製造方法
JP5381884B2 (ja) * 2010-04-16 2014-01-08 セイコーエプソン株式会社 波長可変干渉フィルターの製造方法
JP2012150263A (ja) * 2011-01-19 2012-08-09 Seiko Epson Corp 光フィルター、光モジュール、および分析装置

Also Published As

Publication number Publication date
JP2014186174A (ja) 2014-10-02

Similar Documents

Publication Publication Date Title
CN113363402B (zh) 显示装置
JP2020109214A5 (ja) 蒸着マスク、および、蒸着マスクの製造方法
TWI714782B (zh) 壓電振動元件及壓電振動元件的製造方法
CN101738668A (zh) 偏振立方体及其制造方法
CN113498463A (zh) 负热膨胀部件的制造方法
JP5477478B2 (ja) 圧電素子の製造方法及び電極付きマザー圧電基板
JP6140493B2 (ja) 光学デバイスの製造方法
JP5543525B2 (ja) 光学デバイスおよびその製造方法
JP6267432B2 (ja) 光学デバイスの製造方法
JP2019053163A (ja) ２面コーナーリフレクタアレイ及びその製造方法
US9579858B2 (en) Method of manufacturing optical device
JP6251048B2 (ja) エタロンフィルタ及びその製造方法
CN209327599U (zh) 光元件用窗部件
JP5098743B2 (ja) 電子部品の製造方法
JP2014167508A (ja) エタロン及びエタロン装置
JP2010228029A (ja) Ｍｅｍｓデバイスの実装構造
JP2017194535A (ja) 結像素子の製造方法
JP6504978B2 (ja) サブマウントの製造方法
JP6833574B2 (ja) パッケージ及びパッケージの製造方法
JP2018017799A (ja) 光学フィルタ及びその製造方法
CN107093487B (zh) 高密度光栅的制作方法
JP2011054791A (ja) 電子デバイス及びその製造方法
JP2016103564A (ja) 基板および基板の製造方法
JP2005344203A (ja) 薄膜形成体の製造方及びその装置
JP2017049487A (ja) 光学素子およびその製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151104

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160729

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20161004

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161031

TRDD Decision of grant or rejection written
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20170403

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170425

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170501

R150 Certificate of patent or registration of utility model

Ref document number: 6140493

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees