JP6134013B2 - Waste liquid circulation type plate cleaning apparatus and method for implementing the same - Google Patents

Waste liquid circulation type plate cleaning apparatus and method for implementing the same Download PDF

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JP6134013B2
JP6134013B2 JP2015563139A JP2015563139A JP6134013B2 JP 6134013 B2 JP6134013 B2 JP 6134013B2 JP 2015563139 A JP2015563139 A JP 2015563139A JP 2015563139 A JP2015563139 A JP 2015563139A JP 6134013 B2 JP6134013 B2 JP 6134013B2
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wiping
plate
liquid
waste liquid
spray nozzle
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JP2016531015A (en
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▲欒▼建▲寧▼
▲馬▼立▲項▼
章小▲進▼
▲張▼▲強▼勇
高▲衛▼
▲呉▼金平
曹光▲輝▼
▲鄭▼云建
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Nanjing Mint Co Ltd
China Banknote Printing and Minting Corp
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Nanjing Mint Co Ltd
China Banknote Printing and Minting Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F9/00—Rotary intaglio printing presses
    • B41F9/06—Details
    • B41F9/08—Wiping mechanisms
    • B41F9/10—Doctors, scrapers, or like devices
    • B41F9/1018—Doctors, scrapers, or like devices using a wiping cylinder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2235/00—Cleaning
    • B41P2235/10—Cleaning characterised by the methods or devices
    • B41P2235/14—Cleaning characterised by the methods or devices using ultrasonic energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2235/00—Cleaning
    • B41P2235/10—Cleaning characterised by the methods or devices
    • B41P2235/26—Spraying devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2235/00—Cleaning
    • B41P2235/30—Recovering used solvents or residues

Description

本発明は、彫刻凹版印刷装置、特に、廃液循環式版拭浄装置およびその実施方法に関するものである。   The present invention relates to an engraving intaglio printing apparatus, and more particularly to a waste liquid circulation type plate wiping apparatus and a method for carrying out the same.

有価証券や紙幣の偽造防止印刷用の彫刻凹版印刷機に用いられる版拭浄装置には、従来から主に次の２種類がある。その１は、版拭浄ローラ表面の廃インクを綿布または紙類を用いて拭き取るドライ拭浄法であるが、この方法では、綿布または紙類の消耗量が大きいためコストがかさむ。その２は、適宜の洗浄液で洗浄し、そしてさらなる洗浄ユニットにより廃インクを洗浄液とともに流し洗う水洗法であるが、この方式では、環境を汚染するだけでなく水処理のコストを増大させ、貴重な水資源を大きく浪費してしまう。現在、主な彫刻凹版印刷機の版拭浄システムには、国内外ともに水洗法を用いるのが一般的であるが、水洗法については、エネルギーと水を消耗し、後期の廃液処理のコストが高く、環境もかなり汚染してしまうことが以前より彫刻凹版印刷で悩まれてきた難題であった。現今、技術的に凹版印刷の「水洗法」を根本的に廃棄できかねる状況では、水資源の浪費を低減し、また後処理の負担が彫刻凹版印刷業界の検討課題とならないよう、版拭浄プロセスによる水資源消耗の問題を最大限抑えなければならない。   Conventionally, there are mainly the following two types of plate wiping apparatuses used for engraving intaglio printing presses for anti-counterfeit printing of securities and banknotes. The first is a dry wiping method in which the waste ink on the surface of the plate wiping roller is wiped with a cotton cloth or paper. However, this method is costly because the amount of consumption of the cotton cloth or paper is large. The second is a water washing method in which the ink is washed with an appropriate washing liquid, and the waste ink is washed with the washing liquid by a further washing unit, but this method not only pollutes the environment but also increases the cost of water treatment. Water resources are greatly wasted. Currently, it is common to use the water washing method for major engraving intaglio printing presses both in Japan and overseas. However, the water washing method consumes energy and water, and the cost of waste liquid treatment in the latter period is low. High and environmental pollution is a difficult problem that has been plagued by engraving intaglio printing. At present, in the situation where the “washing method” of intaglio printing can not be fundamentally discarded, the wiping of the plate is reduced so that waste of water resources is reduced and the burden of post-processing is not an issue for the engraving intaglio printing industry. The problem of water resource consumption due to the process must be minimized.

国内で従来よく見られる彫刻凹版印刷機の版拭浄システムには、スプレー式の版拭浄構造が用いられていて、７セットの洗浄液、４セットのブラシ、および２セットのスクレーパーを用いて、版拭浄ローラ表面のインクを乳化させて、拭き取り、洗浄している。当該構造では、２セットのスクレーパーと版拭浄ローラとの間の圧力の制御が難しく、版拭浄ローラが非常に損傷しやすいため、版拭浄の効果に悪影響を及ぼしてしまう。また、７セットの洗浄液を使い、洗浄液の消耗量が平均１〜１．２トン/時間と多いため、後期の水処理に負担をかけ、水とエネルギーを消耗してしまう。   In the plate wiping system of engraving intaglio printing machines often seen in Japan, a spray type plate wiping structure is used, using 7 sets of cleaning liquid, 4 sets of brushes, and 2 sets of scrapers, The ink on the surface of the plate wiping roller is emulsified and wiped and washed. In this structure, it is difficult to control the pressure between the two sets of the scraper and the plate wiping roller, and the plate wiping roller is very easily damaged, which adversely affects the plate wiping effect. In addition, since seven sets of cleaning liquid are used and the amount of consumption of the cleaning liquid is as large as 1 to 1.2 tons / hour on average, it imposes a burden on the later water treatment and consumes water and energy.

某社が新しく登場させた配線式凹版印刷機は、研磨パッドでの事前拭浄とスプレー洗浄とを組み合わせた版拭浄システムを用いている。その版拭浄システムは、基材を丸ごとの研磨パッドで洗浄するため、拭浄する巻付角度と面積を増加させている。また、新型の版拭浄液を２つのそれぞれ単独のルートで前後のスプレーノズルに供給し、版拭浄ローラに付着するインクの乳化、拭浄および洗浄を行う。当該版拭浄システムは、構造が簡単で、新型の版拭浄液の消耗量が平均０．６〜０．８トン/時間程度となり、水の消耗量が従来のスプレー式の版拭浄システムより顕著に減少している。   A newly developed wire-type intaglio printing machine uses a plate cleaning system that combines pre-cleaning with a polishing pad and spray cleaning. Since the plate wiping system cleans the substrate with the entire polishing pad, the wrapping angle and area for wiping are increased. Also, a new type of wiping liquid is supplied to the front and rear spray nozzles by two independent routes, and the ink adhering to the wiping roller is emulsified, wiped and washed. The plate wiping system has a simple structure, and the new plate wiping solution consumes an average of about 0.6 to 0.8 tons / hour, and the water consumption is a conventional spray-type plate wiping system. It has decreased more remarkably.

今まで様々なタイプの彫刻凹版印刷機の「水洗法」の版拭浄装置においても、印刷物の品質を保つために、版拭浄液の消耗量が比較的多くなるのが一般的である。現在閲覧できる彫刻凹版印刷機の関連文献資料には、洗浄後のローラ洗浄液を再び繰り返し循環利用できるものは公にされていない。   Until now, in various types of engraving intaglio printing presses, the “washing method” plate wiping apparatus generally consumes a relatively large amount of wiping liquid for maintaining the quality of printed matter. There is no public literature available on the engraving intaglio printing presses that can be browsed at present.

本発明は、従来技術における欠点を解消し、前記水洗法が水とエネルギーを浪費するという技術的課題について、彫刻凹版印刷の版拭浄装置を提供することを目的とするものである。すなわち、事前拭浄後の汚い混合版拭浄液と洗浄後の比較的きれいなロール洗浄液とを効果的に仕切って、きれいな洗浄液を収集し、繰り返し循環再利用することで、水とエネルギーの節約をさらに達成できる廃液循環式版拭浄装置およびその実施方法を提供する。   An object of the present invention is to provide a plate cleaning apparatus for engraving intaglio printing on the technical problem that the disadvantages of the prior art are solved and the water washing method wastes water and energy. In other words, the dirty mixed plate wiping solution after pre-wiping and the relatively clean roll cleaning solution after cleaning are effectively partitioned, and the clean cleaning solution is collected and reused repeatedly to save water and energy. Furthermore, the waste liquid circulation type plate wiping apparatus which can be achieved, and its implementation method are provided.

本発明が上記の目的を実現するために採用する技術的解決手段は、版拭浄ローラと、少なくとも１つの洗浄基材と、前後２段のスプレーノズルと、遮水デバイスと、新旧液仕切デバイスと、廃液循環デバイスと、液位検出デバイスと、新版拭浄液バックフラッシュデバイスと、軟水バックフラッシュデバイスと、を有し、前記版拭浄ローラの左側に前段廃液循環用スプレーノズルが設けられ、前記版拭浄ローラの底部に中段洗浄用スプレーノズルが設けられ、版拭浄ローラの外円周表面に洗浄基材を有し、前記洗浄基材がメッシュプレートの上に取り付けられ、前記遮水デバイスと前記新旧液仕切デバイスがそれぞれメッシュプレートに接続され、前記中段スプレーノズルがメッシュプレートに接続され、前記新版拭浄液が洗浄管路を介して中段スプレーノズルに連通され、前記中段スプレーノズルからスプレーされる版拭浄液が遮水デバイスや新旧液仕切デバイスを介して廃液タンクに連通され、前記廃液タンク中の版拭浄液が廃液循環デバイスを経由して前段スプレーノズルに通され、前記廃液循環デバイスが補水管路を介して新版拭浄液デバイスに接続され、前記廃液循環デバイスと洗浄デバイスがそれぞれ新版拭浄液バックフラッシュデバイスと軟水バックフラッシュデバイスに接続される廃液循環式版拭浄装置である。   The technical solution that the present invention adopts in order to realize the above-mentioned object is as follows: a plate wiping roller, at least one cleaning substrate, two front and rear spray nozzles, a water shielding device, and an old and new liquid partition device A waste liquid circulation device, a liquid level detection device, a new version wiping liquid backflush device, and a soft water backflush device, and a spray nozzle for circulating a front-stage waste liquid is provided on the left side of the plate wiping roller, A spray nozzle for middle stage cleaning is provided at the bottom of the plate wiping roller, has a cleaning base on the outer circumferential surface of the plate wiping roller, the cleaning base is mounted on a mesh plate, The device and the old and new liquid partition device are connected to the mesh plate, the middle spray nozzle is connected to the mesh plate, and the new version of the wiping liquid is passed through the washing line. The plate wiping liquid sprayed from the middle spray nozzle is communicated to the waste liquid tank via the water shielding device and the old and new liquid partitioning devices, and the plate wiping liquid in the waste liquid tank is connected to the waste liquid circulation device. The waste liquid circulation device is connected to the new version wiping liquid cleaning device via a water refilling line, and the waste liquid circulation device and the cleaning device are respectively connected to the new version wiping liquid backflush device and soft water bag. It is a waste liquid circulation type plate wiping device connected to a flash device.

本発明が上記の目的を実現するために採用するもう一つの技術的解決手段は、次のとおりである。
Ａ、版拭浄装置が本体とロックオン、合体したとき、補水管路中の電磁弁が開かれ、新版拭浄液が収集タンクに入り、液位が超音波検出の所定位置に達したとき、電磁弁が閉鎖するよう作動する。
Ｂ、本体が開かれたとき、廃液循環管路中の循環ポンプが開かれ、収集タンク中の液体が前段スプレーノズルに搬送されて、版拭浄ローラの表面に噴射され、その表面のインクを乳化させるとともに、洗浄管路中の電磁弁が開かれ、新版拭浄液が洗浄管路に入って、版拭浄ローラが中段スプレーノズルにより洗浄される。
Ｃ、乳化されたインクが洗浄基材により拭浄された後、生じたインクと版拭浄液との混合液が遮水テープにより阻隔され、メッシュプレートと遮水板外板を介して廃液漏斗に流される。
Ｄ、ステップＣ〜Ｄで版拭浄ローラを洗浄する際に生じた比較的きれいなロール洗浄液が遮水テープにより阻隔され、メッシュプレートと遮水板内板を介して、収集タンクに流されて収集され、さらに、循環ポンプにより前段スプレーノズルに繰り返し利用されて、版拭浄ローラ表面のインクが循環乳化される。
Ｅ、廃液タンクに回収されステップＣ〜Ｄで洗浄されたロール洗浄液に、微細なインク顆粒が含まれていて、長時間に渡り回収されると、廃液タンクにおけるインク顆粒濃度が常に上昇して、洗浄管路中と廃液循環管路中のスプレーノズルが詰まりやすくなる。 Another technical solution adopted by the present invention to achieve the above object is as follows.
A, When the plate wiping device is locked on and united with the main body, when the solenoid valve in the water refilling line is opened, the new plate wiping liquid enters the collection tank, and the liquid level reaches the predetermined position for ultrasonic detection The solenoid valve operates to close.
B. When the main body is opened, the circulation pump in the waste liquid circulation pipe is opened, the liquid in the collection tank is transported to the pre-stage spray nozzle and sprayed onto the surface of the plate wiping roller, and the ink on the surface is removed. While emulsifying, the solenoid valve in the cleaning line is opened, the new plate wiping liquid enters the cleaning line, and the plate wiping roller is cleaned by the middle spray nozzle.
C, after the emulsified ink is wiped by the cleaning substrate, the resulting mixed liquid of the ink and the plate wiping liquid is blocked by the water shielding tape, and the waste liquid funnel is passed through the mesh plate and the water shielding plate outer plate. Washed away.
D, the relatively clean roll cleaning liquid generated when cleaning the plate wiping roller in Steps C to D is blocked by the water shielding tape, and flows to the collection tank through the mesh plate and the inner plate of the water shielding plate for collection. Further, the ink on the surface of the plate wiping roller is circulated and emulsified by being repeatedly used for the pre-stage spray nozzle by the circulation pump.
E, The roll cleaning liquid collected in the waste liquid tank and washed in Steps C to D contains fine ink granules, and when collected for a long time, the concentration of ink granules in the waste liquid tank always increases, The spray nozzles in the cleaning line and the waste liquid circulation line are easily clogged.

上記廃液循環式版拭浄装置の実施方法においては、ステップＥで、収集タンク中の液体に含まれるインクの濃度が高くなりすぎないよう、ボール弁が半開き状態にされ、ロール洗浄液が部分的に排出される。   In the method of implementing the waste liquid circulation type plate cleaning apparatus, in step E, the ball valve is half-opened so that the concentration of ink contained in the liquid in the collection tank does not become too high, and the roll cleaning liquid is partially Discharged.

上記廃液循環式版拭浄装置の実施方法においては、廃液が循環され、排出されるロール洗浄液の量がステップＣ〜Ｄにおけるロール洗浄液の回収量より大きいとき、タンク内の液位が下がるが、液位が超音波検出の所定位置まで下がったとき、補水管路中の電磁弁が開くように作動することで、新版拭浄液が収集タンクに流れ込んで、タンク内の元のロール洗浄液の濃度が希釈され、循環管路が確実に詰まることなく通じるようにされる。   In the implementation method of the waste liquid circulation type plate cleaning apparatus, when the waste liquid is circulated and the amount of the roll cleaning liquid discharged is larger than the recovered amount of the roll cleaning liquid in Steps C to D, the liquid level in the tank is lowered. When the liquid level drops to a predetermined position for ultrasonic detection, the solenoid valve in the supplementary water conduit is operated to open, so that the new wiping liquid flows into the collection tank and the concentration of the original roll cleaning liquid in the tank. Is diluted to ensure that the circulation line passes through without clogging.

上記廃液循環式版拭浄装置の実施方法においては、さらに、版拭浄システムが所定時間まで稼動した後、バックフラッシュ電磁弁が開かれ、バックグラウンドにより提供される新版拭浄液の圧力が循環ポンプの出力圧力より大きく高いため、廃液循環管路中の逆止弁が閉じられ、より高い圧力の新版拭浄液が直接にスプレーノズルに入って、管路とスプレーノズルが洗浄され、洗浄時間が設定可能であるというステップＦを有する。   In the implementation method of the waste liquid circulation type plate wiping device, after the plate wiping system is operated until a predetermined time, the back flush solenoid valve is opened and the pressure of the new plate wiping solution provided by the background circulates. Since the output pressure of the pump is higher than the pump output pressure, the check valve in the waste liquid circulation pipe is closed, and the higher-pressure new wiping solution enters the spray nozzle directly, and the pipe and the spray nozzle are washed. Has step F that can be set.

上記廃液循環式版拭浄装置の実施方法においては、さらに、版拭浄システムが稼動を停止したとき、軟水電磁弁が開かれ、軟水で前後２段のスプレーノズルが再び洗浄されるというステップＧを有する。   In the implementation method of the waste liquid circulation type plate wiping device, when the plate wiping system stops operating, the soft water solenoid valve is opened, and the front and rear two-stage spray nozzles are washed again with soft water. Have

上記廃液循環式版拭浄装置の実施方法において、前記廃液循環デバイスの循環ポンプは、単方向モータにより羽根車がドライブされ、混合版拭浄液が羽根車に吸い込まれ、直径の変化する空胴体を介するため差圧が形成される液体は、前段スプレーノズルに搬送される。   In the method for implementing the waste liquid circulation type plate wiping apparatus, the circulation pump of the waste liquid circulation device is a hollow body in which the impeller is driven by a unidirectional motor, the mixed plate wiping liquid is sucked into the impeller, and the diameter changes. The liquid in which the differential pressure is formed is transferred to the front spray nozzle.

上記廃液循環式版拭浄装置の実施方法においては、収集タンク内の液位の高さを自動検出するために、前記液位検出デバイスに超音波液位が設けられ、補水システムにより循環ポンプが適宜の液位で確実に連続して循環使用するようにする。   In the method of implementing the waste liquid circulation type plate cleaning apparatus, in order to automatically detect the height of the liquid level in the collection tank, an ultrasonic liquid level is provided in the liquid level detection device, and a circulation pump is provided by the water replenishment system. Ensure that it is continuously circulated at an appropriate liquid level.

上記の技術的解決手段を採用すると、本発明は次の積極的な効果を有する。
（１）本発明における彫刻凹版印刷装置は、事前拭浄とスプレー洗浄とを組み合わせた版拭浄システムを基礎として、「仕切−収集−循環−再利用」という方式で作り出された新型の廃液循環式版拭浄装置である。版拭浄装置のそれぞれに、１つの版拭浄ローラと、少なくとも１つの洗浄基材と、２段のスプレーノズルと、１つの遮水デバイスと、新旧液仕切デバイスと、１つの廃液循環デバイスと、１つの液位検出デバイスと、１つの新版拭浄液バックフラッシュデバイスと、１つの軟水バックフラッシュデバイスと、を有する。
（２）本発明の装置は、既に紙幣印刷の凹版印刷による大量生産に使われて、１０００万製品の印刷を通して、システムとして安定し、信頼できることが分かっている。実験データによれば、廃液循環式版拭浄システムは、水の消耗量が０．２トン/時間程度と安定しており、従来の「水洗法」による版拭浄システムより６０〜７０％程度を節水していて、水とエネルギーを節約するという目的が達成され、高い社会経済効果を有している。 When the above technical solution is adopted, the present invention has the following positive effects.
(1) The engraving intaglio printing apparatus according to the present invention is a new type of waste liquid circulation created by a method of “partition-collection-circulation-reuse” based on a plate wiping system that combines pre-wiping and spray cleaning. It is a ceremony wiping device. Each of the plate wiping apparatuses includes one plate wiping roller, at least one cleaning substrate, two stages of spray nozzles, one water shielding device, old and new liquid partition devices, and one waste liquid circulation device. It has one liquid level detection device, one new version cleaning liquid backflush device, and one soft water backflush device.
(2) The apparatus of the present invention has already been used for mass production by intaglio printing of banknote printing, and has been found to be stable and reliable as a system through printing of 10 million products. According to the experimental data, the waste liquid circulation type plate wiping system has a stable water consumption of about 0.2 tons / hour, which is about 60-70% than the conventional “water washing method” plate wiping system. The purpose of saving water and energy is achieved, and it has a high socio-economic effect.

本発明の内容をより明確に理解しやすくするため、以下、発明を実施するための形態に基づいて、図面と関連付けつつ本発明についてさらに詳細に説明する。   In order to make the content of the present invention clearer and easier to understand, the present invention will be described in more detail below with reference to the drawings based on embodiments for carrying out the invention.

本発明の構造のイメージ図。The image figure of the structure of this invention.

（実施例１）
図１に示されるとおり、本発明の廃液循環式版拭浄装置は、版拭浄ローラ７と、少なくとも１つの洗浄基材６と、前後２段のスプレーノズルと、遮水デバイスと、新旧液仕切デバイスと、廃液循環デバイスと、液位検出デバイスと、新版拭浄液バックフラッシュデバイスと、軟水バックフラッシュデバイスと、を有する。前記版拭浄ローラ７の左側に前段スプレーノズル５ａが設けられ、前記版拭浄ローラの底部に中段洗浄用スプレーノズル５ｂが設けられ、版拭浄ローラ７の外円周表面に洗浄基材６を有し、前記洗浄基材がメッシュプレート４の上に取り付けられ、前記遮水デバイス２と前記新旧液仕切デバイス３がそれぞれメッシュプレートに接続され、前記中段スプレーノズル５ｂがメッシュプレート４に接続され、前記新版拭浄液が洗浄管路を介して中段スプレーノズルに連通され、前記中段スプレーノズルからスプレーされる版拭浄液が遮水デバイスや新旧液仕切デバイスを介して廃液タンク１３に連通され、前記廃液タンク中の版拭浄液が廃液循環デバイスを経由して前段スプレーノズルに通され、前記廃液循環デバイスが補水管路を介して新版拭浄液デバイスに接続され、前記廃液循環デバイスと洗浄デバイスがそれぞれ新版拭浄液バックフラッシュデバイスと軟水バックフラッシュデバイスに接続される。 Example 1
As shown in FIG. 1, the waste liquid circulation type plate wiping apparatus of the present invention includes a plate wiping roller 7, at least one cleaning substrate 6, front and rear two-stage spray nozzles, a water shielding device, and old and new liquids. It has a partition device, a waste liquid circulation device, a liquid level detection device, a new version wiping liquid backflush device, and a soft water backflush device. A front spray nozzle 5 a is provided on the left side of the plate wiping roller 7, a middle stage cleaning spray nozzle 5 b is provided at the bottom of the plate wiping roller 7, and a cleaning substrate 6 is provided on the outer circumferential surface of the plate wiping roller 7. The cleaning substrate is mounted on the mesh plate 4, the water shielding device 2 and the old and new liquid partition device 3 are connected to the mesh plate, and the middle spray nozzle 5 b is connected to the mesh plate 4. The new wiping liquid is communicated with the middle spray nozzle through the cleaning conduit, and the wiping liquid sprayed from the middle spray nozzle is communicated with the waste liquid tank 13 through the water shielding device and the old and new liquid partitioning devices. The plate cleaning liquid in the waste liquid tank is passed through the waste liquid circulation device to the upstream spray nozzle, and the waste liquid circulation device is passed through the water replenishment pipe to the new plate wipe. Is connected to the liquid device, the waste liquid circulating device and the cleaning device is connected to the new edition wiping liquid backflush device and soft water backflush device, respectively.

版拭浄装置が本体とロックオン、合体したとき、補水管路中の電磁弁９ａが開かれ、新版拭浄液が収集タンク１３に入り、液位が超音波検出１１の所定位置に達したとき、電磁弁９ａが閉鎖するよう作動する。本体が開かれたとき、廃液循環管路中の循環ポンプが開かれ、収集タンク中の液体が前段スプレーノズル５ａに搬送されて、版拭浄ローラの表面に噴射され、その表面のインクを乳化させる。それとともに、洗浄管路中の電磁弁９ｂが開かれ、新版拭浄液が洗浄管路に入って、版拭浄ローラが中段スプレーノズル５ｂにより洗浄される。乳化されたインクが洗浄基材６により拭浄された後、生じたインクと版拭浄液との混合液が遮水テープ３により阻隔され、メッシュプレート４と遮水板２外板を介して廃液漏斗１４に流される。ステップＣ〜Ｄで版拭浄ローラを洗浄する際に生じた比較的きれいなロール洗浄液が遮水テープ３により阻隔され、メッシュプレート４と遮水板２内板を介して、収集タンク１３に流されて収集され、さらに、循環ポンプ１２により前段スプレーノズル５ａに繰り返し利用されて、版拭浄ローラ表面のインクが循環乳化される。廃液タンクに回収されステップＣ〜Ｄで洗浄されたロール洗浄液に、微細なインク顆粒が含まれていて、長時間に渡り回収されると、廃液タンクにおけるインク顆粒濃度が常に上昇し、さらに循環して前段スプレーノズル５ａに搬送すれば、スプレーノズルが詰まりやすくなる。収集タンク中の液体に含まれるインクの濃度が高くなりすぎないよう、ボール弁１０が半開き状態にされ、ロール洗浄液が部分的に排出される。廃液が循環され、排出されるロール洗浄液の量がステップＣ〜Ｄにおけるロール洗浄液の回収量より大きいとき、タンク内の液位が下がるが、液位が超音波検出１１の所定位置まで下がったとき、補水管路中の電磁弁９ａが開くように作動することで、新版拭浄液が収集タンクに流れ込んで、タンク内の元のロール洗浄液の濃度が希釈され、循環管路が確実に詰まることなく通じるようにされる。システムの長時間稼動後、循環再利用され微量なインク顆粒が含まれるロール洗浄液は、循環管路やスプレーノズル５ａに微量なインクの堆積を形成して、スプレーノズルの正常な稼動に影響を与えてしまう。システムには新版拭浄液によるバックフラッシュ機能が追加されており、すなわち、版拭浄システムが所定時間まで稼動した後、バックフラッシュ電磁弁９ｃが開かれ、バックグラウンドにより提供される新版拭浄液の圧力が循環ポンプ１２の出力圧力より大きく高いため、廃液循環管路中の逆止弁１が閉じられ、より高い圧力の新版拭浄液が直接にスプレーノズル５ａに入って、管路とスプレーノズルが洗浄され、洗浄時間が設定可能である。バックフラッシュの自動制御によって、版拭浄システムが途切れなく稼動することや循環システムがスムーズであることを確実にしている。版拭浄液が弱アルカリ性混合液であるため、マシンが長時間停止すると、２段のスプレーノズル（５ａ、５ｂ）に凝固される版拭浄液が結晶してしまい、時間が長くなると、スプレーノズルが詰まってしまう。そのため、版拭浄システムが稼動を停止したとき、軟水電磁弁９ｄが開かれ、軟水で前後２段のスプレーノズルが再び洗浄される。   When the plate wiping device is locked on and united with the main body, the electromagnetic valve 9a in the water refilling line is opened, the new plate wiping liquid enters the collection tank 13, and the liquid level reaches a predetermined position of the ultrasonic detection 11. When the solenoid valve 9a is closed. When the main body is opened, the circulation pump in the waste liquid circulation pipe is opened, the liquid in the collection tank is transported to the pre-stage spray nozzle 5a, and sprayed onto the surface of the plate wiping roller to emulsify the ink on the surface. Let At the same time, the electromagnetic valve 9b in the cleaning line is opened, the new plate wiping liquid enters the cleaning line, and the plate wiping roller is cleaned by the middle spray nozzle 5b. After the emulsified ink is wiped by the cleaning substrate 6, the resulting mixed liquid of the ink and the plate wiping liquid is blocked by the water shielding tape 3, and passes through the mesh plate 4 and the water shielding plate 2 outer plate. It flows into the waste liquid funnel 14. The relatively clean roll cleaning liquid generated when the plate wiping roller is cleaned in Steps C to D is blocked by the water shielding tape 3 and flows to the collection tank 13 through the mesh plate 4 and the inner plate of the water shielding plate 2. Furthermore, the ink on the surface of the plate wiping roller is circulated and emulsified by being repeatedly used for the pre-stage spray nozzle 5a by the circulation pump 12. When the roll cleaning liquid collected in the waste liquid tank and washed in Steps C to D contains fine ink granules and is collected over a long period of time, the concentration of ink granules in the waste liquid tank always increases and further circulates. If it is conveyed to the pre-stage spray nozzle 5a, the spray nozzle is easily clogged. In order to prevent the concentration of ink contained in the liquid in the collection tank from becoming too high, the ball valve 10 is opened halfway, and the roll cleaning liquid is partially discharged. When the amount of roll cleaning liquid circulated and discharged is larger than the amount of roll cleaning liquid recovered in Steps C to D, the liquid level in the tank is lowered, but the liquid level is lowered to a predetermined position of the ultrasonic detection 11. By operating so that the solenoid valve 9a in the water refilling line is opened, the new wiping cleaning liquid flows into the collection tank, the concentration of the original roll cleaning liquid in the tank is diluted, and the circulation line is surely blocked. It is made to communicate without. After the system has been operating for a long time, the roll cleaning liquid that is recycled and contains a small amount of ink granules forms a small amount of ink deposits on the circulation line and spray nozzle 5a, affecting the normal operation of the spray nozzle. End up. The system is backflushed with a new version of the wiping solution, that is, after the plate wiping system has been operated for a predetermined time, the backflush solenoid valve 9c is opened and the new version of the wiping solution provided by the background. Is higher than the output pressure of the circulation pump 12, the check valve 1 in the waste liquid circulation line is closed, and a new wiping solution having a higher pressure directly enters the spray nozzle 5 a, and the line and spray. The nozzle is cleaned and the cleaning time can be set. Automatic backflush control ensures that the plate cleaning system operates seamlessly and the circulation system is smooth. Since the plate wiping solution is a weakly alkaline mixed solution, when the machine is stopped for a long time, the plate wiping solution solidified on the two-stage spray nozzles (5a, 5b) will crystallize, and if the time becomes longer, the spray The nozzle is clogged. Therefore, when the plate wiping system stops operating, the soft water solenoid valve 9d is opened, and the front and rear two-stage spray nozzles are washed again with soft water.

廃液循環のコアユニットである循環ポンプ１２は、耐食で、微細なインク顆粒を含んでいて温度４０度の混合版拭浄液に適応しなければならず、その稼働環境は厳しい。液体の運搬や循環ポンプの詰まり防止のため、循環ポンプ１２は、単方向モータにより羽根車がドライブされ、混合版拭浄液が羽根車に吸い込まれ、直径の変化する空胴体を介するため差圧が形成される液体は、管路を介して前段スプレーノズル５ａに搬送される。   The circulation pump 12 which is a core unit for waste liquid circulation is corrosion-resistant, contains fine ink granules, and must be adapted to a mixed plate wiping liquid at a temperature of 40 degrees, and its operating environment is severe. In order to prevent liquid clogging and clogging of the circulating pump, the circulating pump 12 is driven by a unidirectional motor, and the mixed plate wiping liquid is sucked into the impeller and passes through a cavity whose diameter changes. The liquid in which is formed is conveyed to the pre-stage spray nozzle 5a through the pipe line.

収集タンク内の液位の高さを自動検出するために、前記液位検出デバイスに超音波液位１１が設けられ、補水システムにより循環ポンプが適宜の液位で連続して循環使用するようにする。   In order to automatically detect the height of the liquid level in the collection tank, an ultrasonic liquid level 11 is provided in the liquid level detection device so that the circulation pump continuously circulates at an appropriate liquid level by the water replenishment system. To do.

以上に述べた具体的な実施例は、本発明の目的、技術的解決手段および有益な効果についてさらに詳細に説明するためのものである。以上に述べたところは、本発明の具体的な実施例にすぎないものであって、本発明について限定をするものではなく、本発明の趣旨および原則の範囲で行ういかなる修正、均等な置換および改変などもすべて本発明の保護範囲に含まれると解すべきものである。   The specific embodiments described above are intended to explain in further detail the objects, technical solutions and beneficial effects of the present invention. The foregoing is merely a specific example of the present invention, and is not intended to limit the present invention. Any modifications, equivalent substitutions and modifications made within the spirit and principle of the present invention are described above. It should be understood that all modifications are included in the protection scope of the present invention.

Claims (8)

版拭浄ローラと、
少なくとも１つの洗浄基材と、
前後２段のスプレーノズルと、
遮水板と、
遮水テープと、
循環ポンプと、
液位検出デバイスと、
第１電磁弁と、
第２電磁弁と、
を有し、
前記版拭浄ローラの左側に前段スプレーノズルが設けられ、前記版拭浄ローラの底部に後段スプレーノズルが設けられ、版拭浄ローラの外円周表面に洗浄基材を有し、前記洗浄基材がメッシュプレートの上に取り付けられ、前記遮水板と前記遮水テープがそれぞれメッシュプレートに接続され、前記後段スプレーノズルがメッシュプレートに接続され、第１新版拭浄液供給路が洗浄管路を介して前記後段スプレーノズルに連通され、前記後段スプレーノズルからスプレーされる版拭浄液が遮水板及び前記遮水テープを介して廃液タンクに連通され、前記廃液タンク中の液体が前記循環ポンプを経由して前記前段スプレーノズルに通され、前記廃液タンクが補水管路に設けられた第３電磁弁を介して前記第１新版拭浄液供給路に接続され、前記前段スプレーノズルは前記第１電磁弁を介して第２新版拭浄液供給路に接続され、かつ、前記第２電磁弁を介して軟水供給路に接続され、前記後段スプレーノズルは前記第１電磁弁を介して第２新版拭浄液供給路に接続され、かつ、前記第２電磁弁を介して前記軟水供給路に接続されること、
を特徴とする、廃液循環式版拭浄装置。 Plate wiper roller,
At least one cleaning substrate;
Two front and rear spray nozzles,
A water shield,
Water shielding tape,
A circulation pump;
A liquid level detection device;
A first solenoid valve;
A second solenoid valve;
Have
A pre-stage spray nozzle is provided on the left side of the plate wiping roller, a post-stage spray nozzle is provided at the bottom of the plate wiping roller, and a cleaning substrate is provided on the outer circumferential surface of the plate wiping roller. The material is mounted on the mesh plate, the water shielding plate and the water shielding tape are connected to the mesh plate, the rear spray nozzle is connected to the mesh plate, and the first new wiping liquid supply path is the washing pipe line The plate cleaning liquid sprayed from the rear spray nozzle is communicated with the waste liquid tank through the water shielding plate and the water shielding tape, and the liquid in the waste liquid tank is circulated through the circulation nozzle. The waste liquid tank is connected to the first wiping liquid supply path through the third solenoid valve provided in the water refilling line through the front spray nozzle via a pump, Stage spray nozzle is connected to the second new plate wiping liquid supply path through the first solenoid valve, and the second is connected to a soft water supply path through the solenoid valve, the subsequent spray nozzle the first electromagnetic Connected to the second new wiping liquid supply path via a valve, and connected to the soft water supply path via the second electromagnetic valve ;
A waste liquid circulation type plate cleaning device. Ａ、前記補水管路中の前記第３電磁弁が開かれ、前記第１新版拭浄液供給路から新版拭浄液が前記廃液タンクに入り、前記液位検出デバイスにより検出された液位が所定位置に達したとき、前記第３電磁弁が閉鎖するよう作動し、
Ｂ、前記循環ポンプにより前記廃液タンク中の新版拭浄液が前記前段スプレーノズルに搬送されて、前記版拭浄ローラの表面に噴射され、その表面のインクを乳化させるとともに、洗浄管路中の第４電磁弁が開かれ、前記第１新版拭浄液供給路から新版拭浄液が前記洗浄管路に入って、前記版拭浄ローラが前記後段スプレーノズルにより洗浄され、
Ｃ、前記前段スプレーノズルから噴射された新版拭浄液により乳化されたインクが洗浄基材により拭浄された後、生じたインクと版拭浄液との混合液が前記遮水テープにより阻隔され、前記メッシュプレートと前記遮水板の外側を介して廃液漏斗に流され、
Ｄ、前記後段スプレーノズルからの新版拭浄液により前記版拭浄ローラを清浄する際に生じた比較的きれいな版拭浄液が前記遮水テープにより阻隔され、前記メッシュプレートと前記遮水板の内側を介して、前記廃液タンクに流されて収集され、さらに、前記循環ポンプにより前記前段スプレーノズルに繰り返し利用されて、版拭浄ローラ表面のインクが循環乳化され、
ることを特徴とする、請求項１に記載の廃液循環式版拭浄装置の実施方法。 A, the third solenoid valve in the replenishment conduit is opened, a new wiping liquid enters the waste liquid tank from the first new wiping liquid supply path, and the liquid level detected by the liquid level detection device is When the predetermined position is reached, the third solenoid valve operates to close,
B, the new plate wiping liquid in the waste liquid tank is conveyed to the preceding spray nozzle by the circulation pump, and sprayed onto the surface of the plate wiping roller, emulsifying the ink on the surface, and in the washing line A fourth solenoid valve is opened, a new wiping liquid enters the washing line from the first new wiping liquid supply path, and the wiping roller is washed by the rear spray nozzle;
C, after the ink emulsified by the new wiping liquid sprayed from the previous spray nozzle is wiped by the cleaning substrate, the mixed liquid of the generated ink and the wiping liquid is blocked by the water shielding tape. , And flowed to the waste funnel through the mesh plate and the outside of the water shielding plate,
D, a relatively clean plate wiping solution generated when the plate wiping roller is cleaned by the new plate wiping solution from the rear spray nozzle is blocked by the water shielding tape, and the mesh plate and the water shielding plate Through the inside, it is flowed to the waste liquid tank and collected, and further, repeatedly used for the front spray nozzle by the circulation pump, and the ink on the surface of the plate wiping roller is circulated and emulsified,
The method of implementing the waste liquid circulation type plate wiping apparatus according to claim 1, wherein: 前記廃液タンク中の版拭浄液に含まれるインクの濃度が高くなりすぎないよう、前記廃液タンク中の液体が部分的に排出されることを特徴とする、請求項２に記載の廃液循環式版拭浄装置の実施方法。 The waste liquid circulation system according to claim 2, wherein the liquid in the waste liquid tank is partially discharged so that the concentration of ink contained in the plate cleaning liquid in the waste liquid tank does not become too high. Implementation method of plate wiping device. 前記廃液タンクから排出される前記版拭浄液の量が前記廃液タンクへの版拭浄液の回収量より大きく、前記廃液タンク内の液位が所定位置まで下がったとき、前記第３電磁弁が開くように作動することで、前記第１新版拭浄液供給路から新版拭浄液が前記廃液タンクに供給されることを特徴とする、請求項３に記載の廃液循環式版拭浄装置の実施方法。 Greater than the recovery amount of the plate wiping solution to the plate wiping liquid quantities the waste liquid tank is discharged from the waste liquid tank, when the liquid level in the waste liquid tank is lowered to a predetermined position, the third solenoid valve The waste liquid circulation type plate wiping apparatus according to claim 3, wherein a new version wiping liquid is supplied to the waste liquid tank from the first new version wiping liquid supply path by operating so as to open. Implementation method. 前記廃液循環式版拭浄装置が所定時間まで稼動した後、前記第１電磁弁が開かれて前記循環ポンプの出力圧力より大きい圧力を有する新版拭浄液が、前記第２新版拭浄液供給路から前記前段スプレーノズルに供給されるとともに、
前記循環ポンプの出力圧力より大きい圧力を有する新版拭浄液により、前記循環ポンプと前記前段スプレーノズルの間に設けられた逆止弁が閉じられて、前記廃液タンクからの版拭浄液の前記前段スプレーノズルへの供給が停止されることで、前記前段スプレーノズルが洗浄され、
洗浄時間が設定可能である、
ことを特徴とする、請求項３に記載の廃液循環式版拭浄装置の実施方法。 After the waste liquid circulation type plate wiping device has been operated for a predetermined time, the first solenoid valve is opened, and a new version wiping solution having a pressure larger than the output pressure of the circulation pump is supplied to the second new version wiping solution. While being supplied from the road to the previous spray nozzle,
With a new plate wiping liquid having a pressure larger than the output pressure of the circulation pump, a check valve provided between the circulation pump and the preceding spray nozzle is closed, and the plate wiping liquid from the waste liquid tank is closed. By stopping the supply to the pre-stage spray nozzle, the pre-stage spray nozzle is washed,
The cleaning time can be set,
The implementation method of the waste liquid circulation type plate wiping apparatus of Claim 3 characterized by the above-mentioned. 前記廃液循環式版拭浄装置が稼動を停止したとき、前記第２電磁弁が開かれて前記軟水供給路から供給される軟水により、前記前段スプレーノズル及び前記後段スプレーノズルが洗浄されることを特徴とする、請求項５に記載の廃液循環式版拭浄装置の実施方法。   When the operation of the waste liquid circulation type plate wiping device is stopped, the front spray nozzle and the rear spray nozzle are washed by the soft water supplied from the soft water supply path by opening the second electromagnetic valve. The method for carrying out the waste liquid circulation type plate cleaning apparatus according to claim 5, wherein 前記循環ポンプは単方向モータにより羽根車がドライブされ、前記廃液タンク中の版拭浄液が前記羽根車に吸い込まれ、直径の変化する空胴体を介するため、前記羽根車に吸い込まれた版拭浄液と前記前段スプレーノズルとの間に生ずる差圧により、前記羽根車に吸い込まれた版拭浄液が、前記前段スプレーノズルに搬送されることを特徴とする、請求項６に記載の廃液循環式版拭浄装置の実施方法。 The circulation pump impeller is driven by a unidirectional motor, the plate wiping solution in the waste liquid tank is sucked into the impeller, because through the empty body of varying diameter, the plate was sucked into the impeller wiping The waste liquid according to claim 6, wherein the plate wiping liquid sucked into the impeller is transported to the front spray nozzle by a differential pressure generated between the clean liquid and the front spray nozzle. Implementation method of circulation type plate wiping device. 前記廃液タンク内の液位の高さを自動検出するために、前記液位検出デバイスに超音波検出器が設けられ、補水システムにより循環ポンプが適宜の液位で確実に連続して循環使用するようにすることを特徴とする、請求項７に記載の廃液循環式版拭浄装置の実施方法。

In order to automatically detect the height of the liquid level in the waste liquid tank, an ultrasonic detector is provided in the liquid level detection device, and the circulation pump reliably and continuously circulates at an appropriate liquid level by the water replenishment system. The waste liquid circulation type plate wiping apparatus implementation method according to claim 7, characterized by:

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