JP6130450B2 - ポリアリーレン材料 - Google Patents
ポリアリーレン材料 Download PDFInfo
- Publication number
- JP6130450B2 JP6130450B2 JP2015160117A JP2015160117A JP6130450B2 JP 6130450 B2 JP6130450 B2 JP 6130450B2 JP 2015160117 A JP2015160117 A JP 2015160117A JP 2015160117 A JP2015160117 A JP 2015160117A JP 6130450 B2 JP6130450 B2 JP 6130450B2
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- JP
- Japan
- Prior art keywords
- monomer
- oligomer
- alkyl
- aryl
- independently
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 title claims description 9
- 229920000412 polyarylene Polymers 0.000 title description 23
- 239000000178 monomer Substances 0.000 claims description 104
- 125000000217 alkyl group Chemical group 0.000 claims description 47
- 239000000203 mixture Substances 0.000 claims description 40
- -1 aliphatic carboxylate Chemical class 0.000 claims description 34
- 125000003118 aryl group Chemical group 0.000 claims description 33
- 239000003960 organic solvent Substances 0.000 claims description 32
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 28
- 125000003545 alkoxy group Chemical group 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 22
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 239000003989 dielectric material Substances 0.000 claims description 14
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 13
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical group COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 claims description 10
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims description 8
- FQQOMPOPYZIROF-UHFFFAOYSA-N cyclopenta-2,4-dien-1-one Chemical group O=C1C=CC=C1 FQQOMPOPYZIROF-UHFFFAOYSA-N 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims description 6
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims description 6
- 125000000524 functional group Chemical group 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 claims description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 claims description 4
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 4
- UORVCLMRJXCDCP-UHFFFAOYSA-N propynoic acid Chemical compound OC(=O)C#C UORVCLMRJXCDCP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- IOSGANIYBODQTB-UHFFFAOYSA-N 2-ethynylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C#C IOSGANIYBODQTB-UHFFFAOYSA-N 0.000 claims description 3
- 238000005698 Diels-Alder reaction Methods 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 229940116333 ethyl lactate Drugs 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 3
- XNERWVPQCYSMLC-UHFFFAOYSA-N phenylpropiolic acid Chemical compound OC(=O)C#CC1=CC=CC=C1 XNERWVPQCYSMLC-UHFFFAOYSA-N 0.000 claims description 3
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 claims description 3
- UORVCLMRJXCDCP-UHFFFAOYSA-M propynoate Chemical compound [O-]C(=O)C#C UORVCLMRJXCDCP-UHFFFAOYSA-M 0.000 claims description 3
- QGLVWTFUWVTDEQ-UHFFFAOYSA-N 2-chloro-3-methoxyphenol Chemical compound COC1=CC=CC(O)=C1Cl QGLVWTFUWVTDEQ-UHFFFAOYSA-N 0.000 claims description 2
- VCJUSEFXUWAMHH-UHFFFAOYSA-N 4-ethynyl-2-benzofuran-1,3-dione Chemical compound C1=CC=C(C#C)C2=C1C(=O)OC2=O VCJUSEFXUWAMHH-UHFFFAOYSA-N 0.000 claims description 2
- SFOPWTGIYVGTRL-UHFFFAOYSA-N 4-ethynylisoindole-1,3-dione Chemical compound C1=CC=C(C#C)C2=C1C(=O)NC2=O SFOPWTGIYVGTRL-UHFFFAOYSA-N 0.000 claims description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 2
- STDKKAMEWZIDAA-UHFFFAOYSA-N n-ethynylbenzamide Chemical compound C#CNC(=O)C1=CC=CC=C1 STDKKAMEWZIDAA-UHFFFAOYSA-N 0.000 claims description 2
- 125000001475 halogen functional group Chemical group 0.000 claims 3
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 claims 1
- OBOSIGICWQKDEC-UHFFFAOYSA-N 3-ethynylphthalic acid Chemical compound OC(=O)C1=CC=CC(C#C)=C1C(O)=O OBOSIGICWQKDEC-UHFFFAOYSA-N 0.000 claims 1
- 241000238558 Eucarida Species 0.000 claims 1
- 230000003796 beauty Effects 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 20
- 239000002904 solvent Substances 0.000 description 20
- 125000000304 alkynyl group Chemical group 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- 125000005843 halogen group Chemical group 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 239000007810 chemical reaction solvent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 125000001153 fluoro group Chemical group F* 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 239000002318 adhesion promoter Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 150000001555 benzenes Chemical class 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 150000005215 alkyl ethers Chemical class 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- AMOYMEBHYUTMKJ-UHFFFAOYSA-N 2-(2-phenylethoxy)ethylbenzene Chemical compound C=1C=CC=CC=1CCOCCC1=CC=CC=C1 AMOYMEBHYUTMKJ-UHFFFAOYSA-N 0.000 description 4
- 150000008378 aryl ethers Chemical class 0.000 description 4
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 4
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical compound C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- NIEHEMAZEULEKB-UHFFFAOYSA-N ortho-ethylanisole Natural products CCC1=CC=CC=C1OC NIEHEMAZEULEKB-UHFFFAOYSA-N 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 125000003107 substituted aryl group Chemical group 0.000 description 4
- QPVQFZLCDHZWSJ-UHFFFAOYSA-N 1,3-diethynylbenzene;1,4-diethynylbenzene Chemical compound C#CC1=CC=C(C#C)C=C1.C#CC1=CC=CC(C#C)=C1 QPVQFZLCDHZWSJ-UHFFFAOYSA-N 0.000 description 3
- MXJJMQSKDPNPSX-UHFFFAOYSA-N 1-ethynyl-4-(4-ethynylphenyl)benzene Chemical group C1=CC(C#C)=CC=C1C1=CC=C(C#C)C=C1 MXJJMQSKDPNPSX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 2
- OYEDTTNTNYKSFX-UHFFFAOYSA-N 1,3-bis(2-phenylethynyl)benzene Chemical compound C1=CC=CC=C1C#CC1=CC=CC(C#CC=2C=CC=CC=2)=C1 OYEDTTNTNYKSFX-UHFFFAOYSA-N 0.000 description 2
- KJMJERORSUULRM-UHFFFAOYSA-N 1-(2-phenylethynyl)-4-[4-(2-phenylethynyl)phenyl]benzene Chemical group C1=CC=CC=C1C#CC1=CC=C(C=2C=CC(=CC=2)C#CC=2C=CC=CC=2)C=C1 KJMJERORSUULRM-UHFFFAOYSA-N 0.000 description 2
- BLMBNEVGYRXFNA-UHFFFAOYSA-N 1-methoxy-2,3-dimethylbenzene Chemical compound COC1=CC=CC(C)=C1C BLMBNEVGYRXFNA-UHFFFAOYSA-N 0.000 description 2
- DTFKRVXLBCAIOZ-UHFFFAOYSA-N 2-methylanisole Chemical compound COC1=CC=CC=C1C DTFKRVXLBCAIOZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- AAQDYYFAFXGBFZ-UHFFFAOYSA-N Tetrahydrofurfuryl acetate Chemical compound CC(=O)OCC1CCCO1 AAQDYYFAFXGBFZ-UHFFFAOYSA-N 0.000 description 2
- DPZVDLFOAZNCBU-UHFFFAOYSA-N Tetrahydrofurfuryl butyrate Chemical compound CCCC(=O)OCC1CCCO1 DPZVDLFOAZNCBU-UHFFFAOYSA-N 0.000 description 2
- FMKCDSXOYLTWBR-UHFFFAOYSA-N Tetrahydrofurfuryl propionate Chemical compound CCC(=O)OCC1CCCO1 FMKCDSXOYLTWBR-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 150000001345 alkine derivatives Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001601 aromatic carbocyclic compounds Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229940007550 benzyl acetate Drugs 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- NEEDEQSZOUAJMU-UHFFFAOYSA-N but-2-yn-1-ol Chemical compound CC#CCO NEEDEQSZOUAJMU-UHFFFAOYSA-N 0.000 description 2
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 description 2
- LUEHNHVFDCZTGL-UHFFFAOYSA-N but-2-ynoic acid Chemical compound CC#CC(O)=O LUEHNHVFDCZTGL-UHFFFAOYSA-N 0.000 description 2
- OTJZCIYGRUNXTP-UHFFFAOYSA-N but-3-yn-1-ol Chemical compound OCCC#C OTJZCIYGRUNXTP-UHFFFAOYSA-N 0.000 description 2
- GKPOMITUDGXOSB-UHFFFAOYSA-N but-3-yn-2-ol Chemical compound CC(O)C#C GKPOMITUDGXOSB-UHFFFAOYSA-N 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- KINULKKPVJYRON-PVNXHVEDSA-N n-[(e)-[10-[(e)-(4,5-dihydro-1h-imidazol-2-ylhydrazinylidene)methyl]anthracen-9-yl]methylideneamino]-4,5-dihydro-1h-imidazol-2-amine;hydron;dichloride Chemical compound Cl.Cl.N1CCN=C1N\N=C\C(C1=CC=CC=C11)=C(C=CC=C2)C2=C1\C=N\NC1=NCCN1 KINULKKPVJYRON-PVNXHVEDSA-N 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 238000006053 organic reaction Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- ZDRMMTYSQSIGRY-UHFFFAOYSA-N 1,3,5-triethynylbenzene Chemical compound C#CC1=CC(C#C)=CC(C#C)=C1 ZDRMMTYSQSIGRY-UHFFFAOYSA-N 0.000 description 1
- WQZCBZYXTUHAST-UHFFFAOYSA-N 1,3-diethynyl-5-(2-phenylethynyl)benzene Chemical compound C(#C)C1=CC(=CC(=C1)C#CC1=CC=CC=C1)C#C WQZCBZYXTUHAST-UHFFFAOYSA-N 0.000 description 1
- PNXLPYYXCOXPBM-UHFFFAOYSA-N 1,3-diethynylbenzene Chemical compound C#CC1=CC=CC(C#C)=C1 PNXLPYYXCOXPBM-UHFFFAOYSA-N 0.000 description 1
- FPVSTPLZJLYNMB-UHFFFAOYSA-N 1,4-bis(2-phenylethynyl)benzene Chemical compound C1=CC=CC=C1C#CC1=CC=C(C#CC=2C=CC=CC=2)C=C1 FPVSTPLZJLYNMB-UHFFFAOYSA-N 0.000 description 1
- MVLGANVFCMOJHR-UHFFFAOYSA-N 1,4-diethynylbenzene Chemical group C#CC1=CC=C(C#C)C=C1 MVLGANVFCMOJHR-UHFFFAOYSA-N 0.000 description 1
- 150000000190 1,4-diols Chemical class 0.000 description 1
- FWAGYANFBMIHFQ-UHFFFAOYSA-N 1-ethynyl-2-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1C#C FWAGYANFBMIHFQ-UHFFFAOYSA-N 0.000 description 1
- XNNLEMUSWLWGMY-UHFFFAOYSA-N 1-ethynyl-4-(4-ethynylphenoxy)benzene Chemical compound C1=CC(C#C)=CC=C1OC1=CC=C(C#C)C=C1 XNNLEMUSWLWGMY-UHFFFAOYSA-N 0.000 description 1
- GDKOYYDQISQOMH-UHFFFAOYSA-N 1-ethynylcyclohexan-1-amine Chemical compound C#CC1(N)CCCCC1 GDKOYYDQISQOMH-UHFFFAOYSA-N 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- SLVLLNWPHDEVTB-UHFFFAOYSA-N 2,3,4-triphenylcyclopenta-2,4-dien-1-one Chemical compound O=C1C=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 SLVLLNWPHDEVTB-UHFFFAOYSA-N 0.000 description 1
- DSUAJFIEKRKPEE-UHFFFAOYSA-N 2-aminobut-3-ynoic acid Chemical compound C#CC(N)C(O)=O DSUAJFIEKRKPEE-UHFFFAOYSA-N 0.000 description 1
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- KUZBIUTZPWIHSI-UHFFFAOYSA-N 3,5-diethynylbenzoic acid Chemical compound OC(=O)C1=CC(C#C)=CC(C#C)=C1 KUZBIUTZPWIHSI-UHFFFAOYSA-N 0.000 description 1
- UNDXPKDBFOOQFC-UHFFFAOYSA-N 4-[2-nitro-4-(trifluoromethyl)phenyl]morpholine Chemical compound [O-][N+](=O)C1=CC(C(F)(F)F)=CC=C1N1CCOCC1 UNDXPKDBFOOQFC-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- NHBNROZQHPVWRD-UHFFFAOYSA-N C#Cc1cc(cc(c1)-c1ccccc1)C#C Chemical group C#Cc1cc(cc(c1)-c1ccccc1)C#C NHBNROZQHPVWRD-UHFFFAOYSA-N 0.000 description 1
- MEIZKKPXGDWBPF-UHFFFAOYSA-N C(N)(=O)C1=C(C(=O)O)C=C(C=C1)C#C Chemical compound C(N)(=O)C1=C(C(=O)O)C=C(C=C1)C#C MEIZKKPXGDWBPF-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- JRXXLCKWQFKACW-UHFFFAOYSA-N biphenylacetylene Chemical compound C1=CC=CC=C1C#CC1=CC=CC=C1 JRXXLCKWQFKACW-UHFFFAOYSA-N 0.000 description 1
- XRGPFNGLRSIPSA-UHFFFAOYSA-N butyn-2-one Chemical compound CC(=O)C#C XRGPFNGLRSIPSA-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
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- 239000011737 fluorine Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
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- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
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- 239000007788 liquid Substances 0.000 description 1
- GQKZBCPTCWJTAS-UHFFFAOYSA-N methoxymethylbenzene Chemical compound COCC1=CC=CC=C1 GQKZBCPTCWJTAS-UHFFFAOYSA-N 0.000 description 1
- RQGNSKOYEKUEED-UHFFFAOYSA-N n-(2-ethynylphenyl)acetamide Chemical compound CC(=O)NC1=CC=CC=C1C#C RQGNSKOYEKUEED-UHFFFAOYSA-N 0.000 description 1
- VMXAIJCDNKFKPO-UHFFFAOYSA-N n-ethynylaniline Chemical compound C#CNC1=CC=CC=C1 VMXAIJCDNKFKPO-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- JKANAVGODYYCQF-UHFFFAOYSA-N prop-2-yn-1-amine Chemical compound NCC#C JKANAVGODYYCQF-UHFFFAOYSA-N 0.000 description 1
- HCJTYESURSHXNB-UHFFFAOYSA-N propynamide Chemical compound NC(=O)C#C HCJTYESURSHXNB-UHFFFAOYSA-N 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- XYKWNRUXCOIMFZ-UHFFFAOYSA-N tepoxalin Chemical compound C1=CC(OC)=CC=C1N1C(C=2C=CC(Cl)=CC=2)=CC(CCC(=O)N(C)O)=N1 XYKWNRUXCOIMFZ-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
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Description
Claims (11)
- 2つのシクロペンタジエノン部分を含む第1のモノマーと、式(1)を有する第2のモノマーと、式(2)を有する第3のモノマーとをDiels−Alder反応重合単位として含むオリゴマーであって、
- 前記極性部分が、1〜20個の炭素原子と、−C(O)−、−OH、及び−NR9R10から選択される1つ以上の官能基とを有するヒドロカルビル部分であり、式中、R9及びR10が独立して、H、C1−10アルキル、C7−16アラルキル、及びC6−10アリールから選択される、請求項1に記載のオリゴマー。
- 前記極性部分が、カルボキシル、C2−12脂肪族カルボン酸塩、ヒドロキシC1−10アルキル、ヒドロキシC6−10アリール、C7−20アリールカルボン酸、C8−20アリールカルボン酸無水物、C7−20アリールカルボン酸塩、C7−20アリールアミド、及びC8−20アリールイミドから選択される、請求項1または2に記載のオリゴマー。
- 前記第3のモノマーが、プロピオル酸、アセチレンジカルボン酸、フェニルプロピオル酸、エチニル安息香酸、エチニルフタル酸、プロパルギルアルコール、2−メチル−3−ブチン−2−オール、キシリチルプロピオレート(xylityl propiolate)、エチニル無水フタル酸、エチニルフタルイミド、エチニルベンズアミド、及びこれらの混合物から選択される、請求項1〜3のいずれかに記載のオリゴマー。
- 前記第1のモノマー及び前記第2のモノマーが、1:1.001〜1:1.95のモル比で存在する、請求項1〜4のいずれかに記載のオリゴマー。
- Ar 1 が式(4):
- b=1である、請求項1〜6のいずれかに記載のオリゴマー。
- b=2である別の第2のモノマーを更に含む、請求項7に記載のオリゴマー。
- 請求項1〜8のいずれかに記載のオリゴマー及び有機溶媒を含む、組成物。
- 前記有機溶媒が、プロピレングリコールメチルエーテル、プロピレングリコールメチルエーテルアセテート、3−メトキシプロピオン酸メチル、乳酸エチル、アニソール、N−メチルピロリドン、γ−ブチロラクトン、エトキシベンゼン、プロピオン酸ベンジル、及びこれらの混合物から選択される、請求項9に記載の組成物。
- 誘電体材料層を形成する方法であって、請求項9に記載の組成物の層を、基板表面上に堆積させることと、前記有機溶媒を除去することと、前記オリゴマーを硬化させて誘電体材料層を形成することと、を含む、前記方法。
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US10790146B2 (en) | 2016-12-05 | 2020-09-29 | Rohm And Haas Electronic Materials Llc | Aromatic resins for underlayers |
US20180162992A1 (en) | 2016-12-14 | 2018-06-14 | Rohm And Haas Electronic Materials Llc | Polyarylene compositions and methods |
US10894848B2 (en) | 2016-12-14 | 2021-01-19 | Rohm And Haas Electronic Materials Llc | Polyarylene resins |
US20180162967A1 (en) | 2016-12-14 | 2018-06-14 | Rohm And Haas Electronic Materials Llc | Polyarylene resin compositions |
US20180171069A1 (en) * | 2016-12-19 | 2018-06-21 | Rohm And Haas Electronic Materials Llc | Polyarylene resins |
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US20030165625A1 (en) * | 2002-02-15 | 2003-09-04 | So Ying Hung | Method of making a nanoporous film |
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