JP6037157B2 - Printing mask cleaning method and apparatus - Google Patents

Description

  The present invention relates to a method for cleaning a lower surface of a printing mask soiled with a flux or the like with a wiping device and an improvement of the device.

  Conventionally, in flux printing, cream solder printing, and ball mounting in a ball mounter, the lower surface of a printing mask soiled with flux or cream solder has been wiped with a cleaning cloth for cleaning. The cleaning method generally includes a wet cleaning method in which a cleaning solution is dipped in a clean part of the cleaning cloth, a dry cleaning method in which the cleaning liquid is wiped with a dry clean cleaning cloth, or a cleaning method employing both wet and dry methods. It was.

  For example, in the wet cleaning method, the cleaning unit 1 is used, and the cleaning head 10 is lifted at the position a of the forward wiping start as shown in FIG. The part is brought into contact with the lower surface (rear surface) of the printing mask 3 and the flux adhering to the lower surface of the printing mask 3 is melted, and the wiping end position b in the forward path of FIG. Wiping was performed by bringing the cleaning cloth 2 into contact with the lower surface of the print mask 3 and moving it from one start position a to the other end position b on the lower surface of the print mask 3.

  When the wiping of the forward path reaches the moving end, that is, the wiping end position b, the cleaning head 10 of the cleaning unit 1 is lowered, the used cleaning cloth 2 is wound up, and the contact surface is changed to an unused cleaning cloth 2. The cleaning head 10 was raised again, and the clean part of the cleaning cloth 2 was brought into contact with the lower surface of the printing mask 3 again as shown in FIG.

  Here, the flux on the lower surface of the printing mask 3 that cannot be wiped off with the cleaning cloth 2 is left as dirt in a state where it gathers at the position “b” on the lower surface of the printing mask 3 where wiping is completed. Therefore, after changing to the clean cleaning cloth 2 at the position b as it is, if the cleaning head 10 of the cleaning unit 1 is lifted, the cleaning cloth 2 comes into contact with the remaining dirt, and the cleaning is performed at a corner clean state. The cloth 2 gets dirty from the beginning. If the wiping operation is started in a dirty state, the cleaning cloth 2 will stain the lower surface of the printing mask 3 only by extending the flux.

  In such a state, the wiping operation had to be performed a plurality of times until there was no flux attached to the lower surface of the printing mask 3. Therefore, the consumption of the cleaning cloth 2 is severe, and the productivity is lowered due to the cleaning time.

  Patent Document 1 discloses a cleaning device for the back side of a printing plate as a cleaning method for avoiding adhesion of flux collected at a moving end by a wiping operation in an outward path. This cleaning device presses the belt-like cloth soaked with the solvent against the back of the printing plate and slides it to wipe off the dirt, so that the dirt-attached cloth is sequentially wound one step at a time. The dirt on the back of the printing plate is wiped off.

  In the wiping operation, first, the cleaning device is raised, and the cloth of the wiping roller is pressed against the back surface of the printing plate. Next, the cleaning device is moved from one side of the back side of the printing plate to the other side. At that time, the pressed cloth slides on the back side of the printing plate and wipes off dirt. Next, the cleaning device is lowered. At this time, the cloth is wound up by one step by the winding roller. Further, the cleaning device is moved in the lowered state and returned to the original position.

  In this cleaning device, the pressed cloth slides on the back side of the printing plate and wipes off the dirt only when the cleaning device is moved forward from one side of the back side of the printing plate to the other side. At the time of movement from the other side of the printing plate toward the other side, that is, when returning, the cleaning is not performed, and the cleaning device only returns to the original position. It was a wasteful return trip and was not an efficient cleaning task.

Japanese Utility Model Publication No. 60-85931

  The present invention is intended to solve the above-described problems. The cleaning end position and the start position are separated from each other so that the flux remaining at the cleaning end position is not wiped off at the start of the next wiping operation. The purpose is to start cleaning with the cleaning cloth in the state, reduce the frequency of wiping off the flux under the printing mask with the cleaning cloth, reduce the cost by reducing the consumption of the cleaning cloth, and increase the productivity by improving the tact. To do.

In order to solve the above-mentioned problems, the first invention employs the following means as a printing mask cleaning method.
First, after disposing a wiping device that can move in the horizontal direction below the printing mask and moving the wiping device horizontally from one side to the other side in contact with the lower surface of the printing mask , Lowering the wiping device to make the part used for wiping clean, and then moving the wiping device back to the other side horizontally from the other side in contact with the lower surface of the printing mask. A cleaning method for cleaning the lower surface of the printing mask is provided.
Second, the wiping start position in the inward movement of the wiping device is shifted from the wiping end position in the outward movement toward the start position in the outward movement so as not to entrap dirt remaining in the wiping end position in the outward movement. Start wiping.
Third, the wiping start position in the forward movement of the wiping device is shifted from the wiping end position in the backward movement toward the start position in the backward movement so as not to entrap dirt remaining at the wiping end position in the backward movement. Start wiping.

The second invention employs the following means for the printing mask cleaning device.
1stly, the wiping apparatus arrange | positioned under the printing mask, the moving mechanism which moves this wiping apparatus, and the control means which controls this moving mechanism are provided.
Second, with the wiping device in contact with the lower surface of the printing mask, the moving mechanism moves downward from one side to the other side in a horizontal direction and then descends to clean the part used for wiping. A cleaning device that cleans the lower surface of the print mask by moving the return mechanism horizontally from the other side to the one side in a state where the wiping device formed as a part is in contact with the lower surface of the print mask.
Third, the control means sets the wiping start position in the backward movement of the wiping device as a position shifted from the wiping end position in the forward movement toward the start position in the forward movement, and dirt remaining at the wiping end position in the forward movement is obtained. wipe off so as not to get involved is Ru is started.
Fourth, the control means sets the wiping start position in the outward movement of the wiping device as a position shifted from the wiping end position in the backward movement toward the start position in the backward movement, and dirt remaining at the wiping end position in the backward movement is detected. wipe off so as not to get involved is Ru is started.

  In the method and apparatus according to the present invention, the wiping start position in the backward movement is set to a position shifted from the wiping end position in the forward movement toward the start position of the forward movement, and the next position is not entrained with the dirt remaining at the end position. The wiping operation can be started. In addition, the wiping start position in the next forward movement is shifted to the start position direction in the backward movement on the near side from the wiping end position in the backward movement, and the next wiping operation is performed without entraining dirt remaining at the end position. .

Thus, by entering the wiping operation while avoiding the dirt remaining at the end position, the wiping operation of the dirt such as flux becomes efficient and effective, and the overall number of wiping operations can be reduced, and the cleaning cloth is consumed. with joint wants to reduce costs by reducing the were tethered therefore improve productivity by reducing the number of times of cleaning.

In the cleaning method by the cleaning unit which concerns on this invention, it is explanatory drawing which shows from an outward movement to the start of an outward movement, (1) shows the state which the cleaning head fell in the starting position of an outward movement, (2) is the start position Shows the state where the cleaning head is raised and the cleaning cloth is in contact with the lower surface of the print mask, (3) shows the state where the cleaning head is moved to the end position of the forward movement, and (4) shows the state where the cleaning head is lowered at the end position. (5) shows a state in which the cleaning head has moved below the start position of the return path movement, and (6) shows a state in which the cleaning head has moved up at the start position and the cleaning cloth has come into contact with the lower surface of the print mask. In the cleaning method, it is explanatory drawing which shows from the return path movement to the start of the subsequent outward movement, (1) shows a state where the cleaning head is lowered below the start position of the return path movement, and (2) shows the cleaning head at the same start position. Shows a state where the cleaning cloth is in contact with the lower surface of the print mask, (3) shows a state where the cleaning cloth has moved to the end position of the backward movement, and (4) shows a state where the cleaning head is lowered at the end position, (5) shows a state in which the cleaning head has moved below the start position of the forward movement, and (6) shows a state in which the cleaning head has moved up at the start position and the cleaning cloth has come into contact with the lower surface of the printing mask. Cross-sectional explanatory drawing showing the cleaning unit It is explanatory drawing which shows the conventional cleaning method, (1) shows the wiping operation | movement in an outward path | route, (2) shows the wiping operation | movement in a return path | route.

Hereinafter, embodiments will be described together with illustrated examples.
The printing mask cleaning method and apparatus using the same according to the present invention is a ball mounter, and more specifically, a work supply unit such as a substrate on which solder balls are mounted, a printing unit for flux to the electrodes on the substrate, a flux A solder ball mounting device having a ball mounting portion for mounting a solder ball on the printed electrode. The embodiment is a printing mask cleaning device in a flux printing section of a solder ball mounting device.

  Reference numeral 3 in the figure is a printing mask, and the printing mask 3 in the embodiment is a printing mask in a flux printing unit. The solder balls are dropped into a ball printing mask installed on the substrate, and the flux is printed. The ball printing mask in the ball mounting portion where the solder balls are arranged on the electrodes of the substrate is also a printing mask in the present invention. Furthermore, not only the combination of flux and solder ball, but also a solder paste print mask in an apparatus having a solder paste transfer portion for applying a solder paste to an electrode of a substrate is a print mask in the present invention, and other combinations Can also be used as appropriate.

  The cleaning apparatus according to the present invention includes a cleaning unit 1 disposed below the printing mask 3, a moving mechanism that moves the cleaning unit 1, and a control unit that controls the moving mechanism. As shown in FIG. 3, the cleaning unit 1 serving as a wiping device according to the present invention includes a cleaning cloth 2, a supply roller 11 and a take-up roller 12 for the cleaning cloth 2, and a cleaning liquid supply for supplying a cleaning liquid to the cleaning cloth 2. A pipe 13, a cleaning liquid supply cloth 14, and a cleaning head 10 that presses the cleaning cloth 2 against the lower surface of the array mask 3 are provided.

  The cleaning head 10 has an elevating mechanism that can be raised and lowered to a height at which the cleaning cloth 2 can be pressed against the wiping position on the lower surface (back surface) of the printing mask 3. A suction chamber 16 connected to a suction device is provided inside the cleaning head 10, and a suction hole 15 is opened on the upper end surface. Here, during the wiping operation, the suction device is operated to suck the flux adhering to the printing mask 3 to the cleaning cloth 2 from the suction hole 15.

  The cleaning head 10 rises not only to press the cleaning cloth 2 against the printing mask 3 but also descends to separate the cleaning cloth 2 from the printing mask 3 and includes a cleaning liquid supplied from the cleaning liquid supply pipe 13. The cleaning cloth 2 is pressed against the cleaning liquid supply cloth 14 to be supplied, and the cleaning liquid is supplied to the cleaning cloth 2.

  The cleaning unit 1 includes a moving mechanism that can move in the horizontal direction. The cleaning unit 1 is configured such that the range from the wiping start position A to the wiping end position B and the wiping end position from the wiping start position C in a state where the cleaning cloth 2 is in contact with the lower surface of the printing mask 3 by the action of the cleaning head 10. In the state where the reciprocating movement is possible in the range up to D, and the cleaning cloth 2 is separated from the lower surface of the printing mask 3, the next wiping from the wiping end position B to the next wiping start position C and the next wiping end position D is performed. It can move within the range of the start position A.

  Note that the forward movement start position A, the backward movement start position C, the forward movement end position B, and the backward movement end position D in the printing mask 3 are workpieces installed below the printing mask 3, that is, flux. It is preferable to be outside the range where the work to be printed is installed. Therefore, even if the flux remains unwiped at these positions, the workpiece is not directly touched and the workpiece is not contaminated.

The procedure of the cleaning method will be described below with reference to FIGS.
FIG. 1 is an explanatory diagram showing the process from the forward movement to the start of the backward movement in the cleaning method by the cleaning unit 1.

  As shown in FIG. 1A, first, the cleaning head 10 stands by at a position below the starting position A of the forward movement with the cleaning head 10 lowered. The starting position A may be the same as the wiping start position a in the conventional cleaning method. At this time, the cleaning cloth 2 existing on the cleaning head 10 is an unused clean portion supplied from the supply roller 11, and the cleaning liquid supplied from the cleaning liquid supply pipe 13 immediately before the cleaning head 10. Is supplied via a cleaning liquid supply cloth 14.

  Next, as shown in FIG. 1 (2), the cleaning head 10 is raised at the start position A, the cleaning cloth 2 is brought into contact with the lower surface of the printing mask 3, and the cleaning cloth 2 is moved by the force of the cleaning head 10. Press against the bottom of the. At this time, since the cleaning cloth 2 existing above the cleaning head 10 is supplied with the cleaning liquid, the cleaning liquid is supplied to the lower surface of the print mask 3 by the pressing operation.

  Subsequently, the cleaning unit 1 moves the forward movement end position B as shown by the arrow in FIG. 1B in a state where the cleaning head 10 is raised, that is, in a state where the cleaning cloth 2 is in contact with the lower surface of the printing mask 3. Then, the flux existing on the lower surface of the printing mask 3 is wiped off while being dissolved with a cleaning liquid. The end position B in the print mask 3 is preferably outside the range of the substrate installation position as described above.

  When the amount of flux due to the wiping operation is large, a suction chamber 16 that is separately connected to the suction device is provided in the cleaning head 10, and the suction device is operated so that the flux is sucked and accommodated in the suction chamber 16. May be.

  While performing such a wiping operation, the cleaning unit 1 moves to the end position B of the forward movement shown in FIG. At this end position B, as shown in FIG. 1 (4), the cleaning head 10 is lowered to separate the cleaning cloth 2 from the lower surface of the printing mask 3.

  In a state where the cleaning cloth 2 is separated from the lower surface of the printing mask 3, the winding roller 12 in the cleaning unit 1 is operated to wind up the portion used for wiping the cleaning cloth 2, and the upper portion of the cleaning head 10 is cleaned into the cleaning cloth. 2 is an unused clean part.

  Simultaneously with or subsequent to the winding operation of the cleaning cloth 2, the cleaning unit 1 is controlled by the control means with the cleaning head 10 lowered, as shown in FIG. It moves so as to be located below the start position C of the backward movement. The starting position C of the backward movement is a position shifted from the ending position B of the outward movement in the direction of the starting position A of the outward movement.

  In this way, the start position C of the backward movement following the forward movement is not set to the end position B of the forward movement, but is shifted to the portion where the flux has already been wiped off, so that the flux remaining as dirt at the end position B can be cleaned. 2 is prevented from being caught. The remaining flux is wiped off by the wiping operation at the end position B of the next forward movement.

  In the state where the cleaning head 10 is lowered below the return path start position C, the cleaning liquid supply operation is performed as in the forward path start position A. Subsequently, as shown in FIG. 1 (6), the cleaning head 10 is raised at the starting position C of the backward movement, and the cleaning cloth 2 comes into contact with and presses the lower surface of the printing mask 3.

  Thereafter, as indicated by the arrow in FIG. 1 (6), the cleaning unit 1 performs the backward movement toward the end position D of the wiping operation by the backward movement that is far from the start position A of the next forward movement. The start position A of the next forward movement is a position shifted from the end position D of the backward movement in the direction of the starting position C of the backward movement.

  FIG. 2 is an explanatory view showing the cleaning method from the return path movement to the start of the subsequent forward path movement. (1) and (2) in FIG. 2 show the same state as (5) and (6) in FIG. That is, (1) in FIG. 2 shows a state where the cleaning head 10 is lowered below the starting position C of the backward movement, and (2) in FIG. The cloth 2 is in contact with the lower surface of the printing mask 3.

  As shown in FIG. 2C, the cleaning unit 1 moves to the return path end position D and stops. As shown in FIG. 2 (4), the cleaning head 10 descends at the return path end position D and moves the cleaning cloth 2 away from the lower surface of the print mask 3 in the same manner as the operation at the end path movement end position B.

  In a state where the cleaning cloth 2 is separated from the lower surface of the printing mask 3, the winding roller 12 in the cleaning unit 1 is operated to wind up the portion used for wiping the cleaning cloth 2, and the upper portion of the cleaning head 10 is cleaned into the cleaning cloth. 2 is an unused clean part. This is the same as the operation at the end position B of the forward movement.

  Simultaneously with or subsequent to the winding operation of the cleaning cloth 2, the cleaning unit 1 is controlled by the control means with the cleaning head 10 lowered as shown in FIG. 2 (5). It moves so as to be positioned below the starting position A of the subsequent forward movement. The forward movement start position A is a position shifted from the backward movement end position D in the direction of the backward movement start position C. The flux remaining as dirt at the end position D of the backward movement is prevented from being caught in the cleaning cloth 2. Thereafter, the same method as the cleaning method by the forward movement is repeated.

DESCRIPTION OF SYMBOLS 1 ... Cleaning unit 2 ... Cleaning cloth 3 ... Printing mask 10 ... Cleaning head 11 ...・ Supply roller 12 ・ ・ ・ ・ ・ ・ Take-up roller 13 ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ Cleaning liquid supply pipe 14 ・ ・ ・ ・ ・ ・ Cleaning liquid supply cloth 15 ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ Suction hole 16 ・.... Suction chamber

Claims (2)

A wiping device that is movable in the horizontal direction is disposed below the printing mask, and the wiping device is moved horizontally from one side to the other side in a state where the wiping device is in contact with the lower surface of the printing mask, and then the wiping device the is lowered, after the portion of the clean part used in wiping, the printing mask lower surface horizontally moved backward from the other side to one side in a state that the wiping device is brought into contact with the lower surface of the printing mask In the cleaning method for cleaning
The wiping start position in the backward movement of the wiping device is shifted from the wiping end position in the forward movement toward the start position in the forward movement, and wiping is started so as not to entrap dirt remaining at the wiping end position in the forward movement. ,
The wiping start position in the forward movement of the wiping device is shifted from the wiping end position in the backward movement toward the start position in the backward movement, and wiping is started so as not to entrap dirt remaining at the wiping end position in the backward movement. A method for cleaning a printing mask.
A wiping device disposed below the printing mask, a moving mechanism for moving the wiping device, and a control means for controlling the moving mechanism,
With the wiping device in contact with the lower surface of the printing mask, the moving mechanism is moved horizontally from one side to the other side and then lowered to make the part used for wiping a clean part. In the cleaning device for cleaning the lower surface of the printing mask by moving the return mechanism horizontally from the other side to the one side while the wiping device is in contact with the lower surface of the printing mask,
The control means sets the wiping start position in the backward movement of the wiping device as a position shifted from the wiping end position in the forward movement toward the start position in the forward movement so that dirt remaining at the wiping end position in the forward movement is not caught. wiping is started Rutotomoni,
The wiping start position in the forward movement of the wiping device is shifted from the wiping end position in the backward movement toward the start position in the backward movement, and wiping is started so that dirt remaining at the wiping end position in the backward movement is not caught. by cleaning apparatus for a printing mask, wherein Rukoto.

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