JP6026527B2 - ルーバを含むバックグラウンド低減システム - Google Patents

ルーバを含むバックグラウンド低減システム Download PDF

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Publication number
JP6026527B2
JP6026527B2 JP2014518593A JP2014518593A JP6026527B2 JP 6026527 B2 JP6026527 B2 JP 6026527B2 JP 2014518593 A JP2014518593 A JP 2014518593A JP 2014518593 A JP2014518593 A JP 2014518593A JP 6026527 B2 JP6026527 B2 JP 6026527B2
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JP
Japan
Prior art keywords
charged particle
reduction system
angle
background reduction
target substrate
Prior art date
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Active
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JP2014518593A
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English (en)
Japanese (ja)
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JP2014521192A5 (cg-RX-API-DMAC10.html
JP2014521192A (ja
Inventor
メヘラーン ナセル−ゴドスィ
メヘラーン ナセル−ゴドスィ
クリストファ シアーズ
クリストファ シアーズ
ロバート ヘインズ
ロバート ヘインズ
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KLA Corp
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KLA Corp
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Publication of JP2014521192A5 publication Critical patent/JP2014521192A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2511—Auger spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2516—Secondary particles mass or energy spectrometry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2014518593A 2011-06-30 2012-06-07 ルーバを含むバックグラウンド低減システム Active JP6026527B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/174,020 US8633457B2 (en) 2011-06-30 2011-06-30 Background reduction system including louver
US13/174,020 2011-06-30
PCT/US2012/041343 WO2013002993A1 (en) 2011-06-30 2012-06-07 Background reduction system including louver

Publications (3)

Publication Number Publication Date
JP2014521192A JP2014521192A (ja) 2014-08-25
JP2014521192A5 JP2014521192A5 (cg-RX-API-DMAC10.html) 2015-07-16
JP6026527B2 true JP6026527B2 (ja) 2016-11-16

Family

ID=47389602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014518593A Active JP6026527B2 (ja) 2011-06-30 2012-06-07 ルーバを含むバックグラウンド低減システム

Country Status (6)

Country Link
US (1) US8633457B2 (cg-RX-API-DMAC10.html)
EP (1) EP2726906A4 (cg-RX-API-DMAC10.html)
JP (1) JP6026527B2 (cg-RX-API-DMAC10.html)
CN (1) CN103748483A (cg-RX-API-DMAC10.html)
TW (1) TW201301333A (cg-RX-API-DMAC10.html)
WO (1) WO2013002993A1 (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2682978B1 (en) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135388A (cg-RX-API-DMAC10.html) * 1974-09-20 1976-03-25 Hitachi Ltd
SU693487A1 (ru) 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
FR2591036A1 (fr) * 1985-12-04 1987-06-05 Balteau Dispositif de detection et de localisation de particules neutres, et applications
SU1814427A1 (ru) 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
JPH10256136A (ja) * 1997-03-14 1998-09-25 Nikon Corp 荷電ビーム露光装置
JP3603779B2 (ja) * 2000-11-01 2004-12-22 株式会社日立製作所 電子検出装置，荷電粒子ビーム装置，半導体集積回路装置、および半導体集積回路装置の加工，観察，検査方法
US7394053B2 (en) * 2004-09-09 2008-07-01 Beth Israel Deaconess Medical Center, Inc. Systems and methods for multi-modal imaging having a spatial relationship in three dimensions between first and second image data
US7476876B2 (en) * 2005-12-21 2009-01-13 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging
US8304751B2 (en) * 2008-05-12 2012-11-06 Mitsubishi Electric Corporation Charged particle beam irradiation apparatus
JP5694317B2 (ja) * 2009-07-17 2015-04-01 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 荷電粒子エネルギー分析器装置および方法

Also Published As

Publication number Publication date
TW201301333A (zh) 2013-01-01
US20130001417A1 (en) 2013-01-03
EP2726906A4 (en) 2015-07-01
EP2726906A1 (en) 2014-05-07
WO2013002993A1 (en) 2013-01-03
CN103748483A (zh) 2014-04-23
US8633457B2 (en) 2014-01-21
JP2014521192A (ja) 2014-08-25

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