TW201301333A - 包括百葉窗之背景減少系統 - Google Patents

包括百葉窗之背景減少系統 Download PDF

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Publication number
TW201301333A
TW201301333A TW101120789A TW101120789A TW201301333A TW 201301333 A TW201301333 A TW 201301333A TW 101120789 A TW101120789 A TW 101120789A TW 101120789 A TW101120789 A TW 101120789A TW 201301333 A TW201301333 A TW 201301333A
Authority
TW
Taiwan
Prior art keywords
charged particles
charged
angle
louver structure
background reduction
Prior art date
Application number
TW101120789A
Other languages
English (en)
Chinese (zh)
Inventor
Mehran Nasser-Ghodsi
Christopher Sears
Robert Haynes
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of TW201301333A publication Critical patent/TW201301333A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2511—Auger spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2516—Secondary particles mass or energy spectrometry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW101120789A 2011-06-30 2012-06-08 包括百葉窗之背景減少系統 TW201301333A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/174,020 US8633457B2 (en) 2011-06-30 2011-06-30 Background reduction system including louver

Publications (1)

Publication Number Publication Date
TW201301333A true TW201301333A (zh) 2013-01-01

Family

ID=47389602

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101120789A TW201301333A (zh) 2011-06-30 2012-06-08 包括百葉窗之背景減少系統

Country Status (6)

Country Link
US (1) US8633457B2 (cg-RX-API-DMAC10.html)
EP (1) EP2726906A4 (cg-RX-API-DMAC10.html)
JP (1) JP6026527B2 (cg-RX-API-DMAC10.html)
CN (1) CN103748483A (cg-RX-API-DMAC10.html)
TW (1) TW201301333A (cg-RX-API-DMAC10.html)
WO (1) WO2013002993A1 (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2682978B1 (en) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135388A (cg-RX-API-DMAC10.html) * 1974-09-20 1976-03-25 Hitachi Ltd
SU693487A1 (ru) 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
FR2591036A1 (fr) * 1985-12-04 1987-06-05 Balteau Dispositif de detection et de localisation de particules neutres, et applications
SU1814427A1 (ru) 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
JPH10256136A (ja) * 1997-03-14 1998-09-25 Nikon Corp 荷電ビーム露光装置
JP3603779B2 (ja) * 2000-11-01 2004-12-22 株式会社日立製作所 電子検出装置，荷電粒子ビーム装置，半導体集積回路装置、および半導体集積回路装置の加工，観察，検査方法
US7394053B2 (en) * 2004-09-09 2008-07-01 Beth Israel Deaconess Medical Center, Inc. Systems and methods for multi-modal imaging having a spatial relationship in three dimensions between first and second image data
US7476876B2 (en) * 2005-12-21 2009-01-13 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging
US8304751B2 (en) * 2008-05-12 2012-11-06 Mitsubishi Electric Corporation Charged particle beam irradiation apparatus
JP5694317B2 (ja) * 2009-07-17 2015-04-01 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 荷電粒子エネルギー分析器装置および方法

Also Published As

Publication number Publication date
US20130001417A1 (en) 2013-01-03
JP6026527B2 (ja) 2016-11-16
EP2726906A4 (en) 2015-07-01
EP2726906A1 (en) 2014-05-07
WO2013002993A1 (en) 2013-01-03
CN103748483A (zh) 2014-04-23
US8633457B2 (en) 2014-01-21
JP2014521192A (ja) 2014-08-25

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