JP6025265B2 - 透明基板における欠陥を定量化する方法 - Google Patents
透明基板における欠陥を定量化する方法 Download PDFInfo
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- JP6025265B2 JP6025265B2 JP2014095980A JP2014095980A JP6025265B2 JP 6025265 B2 JP6025265 B2 JP 6025265B2 JP 2014095980 A JP2014095980 A JP 2014095980A JP 2014095980 A JP2014095980 A JP 2014095980A JP 6025265 B2 JP6025265 B2 JP 6025265B2
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- defect
- defects
- glass substrate
- mura
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
Claims (8)
- 平面状の透明なガラス基板におけるムラ欠陥を定量化する方法であって、
上面及び底面を有する平面状の透明なガラス基板を供給する工程と、
サブナノメートルレベルの精度を有する三次元上面プロファイルを取得するために、前記平面状の透明なガラス基板の前記上面の少なくとも一部の表面トポグラフィーを光干渉法により測定する工程と、
前記平面状の透明なガラス基板の前記上面における1つ以上のムラ欠陥を定量化するために、前記三次元上面プロファイルにおける、5nm〜100nmの範囲の高さを有する1つ以上の前記ムラ欠陥を識別する工程と、
を備え、
1つ以上の前記ムラ欠陥を識別する前記工程の前に、まず、前記三次元上面プロファイルを横断する選択された距離に対する前記表面トポグラフィーの変化率に対応する、前記三次元上面プロファイルの第1の導関数および第2の導関数が計算され、該決定された第1および第2の導関数のプロファイルから、前記識別される1つ以上の前記ムラ欠陥の表面の高さ方向における位置の最大値、最小値、およびこれらの値の差から求められる前記ムラ欠陥の表面の前記高さ方向における位置に関する最大偏差である高さが決定され、その際、前記第1の導関数を計算するために、前記表面トポグラフィーの測定から得られたプロファイルデータに第1の移動窓が適用され、前記第2の導関数を計算するために、前記第1の導関数の計算から得られたプロファイルデータに第2の移動窓が適用されることを特徴とする方法。 - 前記平面状の透明なガラス基板が、ダウンドロー装置で製造されたもの、かつ、液晶ディスプレイに用いられるものであることを特徴とする請求項1記載の方法。
- 前記ムラ欠陥は、ストリーク状欠陥、すじ状欠陥、または表面不連続性欠陥を含むものであり、液晶ディスプレイのセルギャップの厚さを不均一にさせると共に、前記ディスプレイ装置に目に見える光の強度のばらつきを生じさせるものであることを特徴とする請求項2記載の方法。
- 前記ムラ欠陥が、ストリーク及び/又は表面不連続性を含むことを特徴とする請求項1記載の方法。
- 前記識別されたムラ欠陥が、前記ガラス基板中のシリカ及び/又は白金の内包物を含む表面不連続性欠陥であることを特徴とする請求項4記載の方法。
- 前記識別されたムラ欠陥がストリーク状欠陥であり、前記ダウンドロー装置によるガラス延伸方向へ延びる、面の突出及び/又は窪みを含むことを特徴とする請求項2記載の方法。
- 前記ガラス基板の前記上面の前記1つ以上のムラ欠陥の識別が、前記ガラス基板の前記底面による影響を受けずに行われることを特徴とする請求項1記載の方法。
- 前記第1の移動窓の幅が4mmであることを特徴とする請求項1記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90361607P | 2007-02-27 | 2007-02-27 | |
US60/903,616 | 2007-02-27 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009551671A Division JP2010519559A (ja) | 2007-02-27 | 2008-02-13 | 透明基板における欠陥を定量化する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014167485A JP2014167485A (ja) | 2014-09-11 |
JP6025265B2 true JP6025265B2 (ja) | 2016-11-16 |
Family
ID=39715494
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009551671A Pending JP2010519559A (ja) | 2007-02-27 | 2008-02-13 | 透明基板における欠陥を定量化する方法 |
JP2014095980A Expired - Fee Related JP6025265B2 (ja) | 2007-02-27 | 2014-05-07 | 透明基板における欠陥を定量化する方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009551671A Pending JP2010519559A (ja) | 2007-02-27 | 2008-02-13 | 透明基板における欠陥を定量化する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080204741A1 (ja) |
JP (2) | JP2010519559A (ja) |
KR (1) | KR101436666B1 (ja) |
CN (1) | CN101663574B (ja) |
TW (1) | TWI442048B (ja) |
WO (1) | WO2008106015A2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5250871B2 (ja) * | 2008-12-24 | 2013-07-31 | インターナショナル・ビジネス・マシーンズ・コーポレーション | ムラ評価装置、ムラ評価方法、ディスプレイ検査装置、およびプログラム |
US8260028B2 (en) | 2009-10-28 | 2012-09-04 | Corning Incorporated | Off-axis sheet-handling apparatus and technique for transmission-mode measurements |
US8210001B2 (en) * | 2010-11-10 | 2012-07-03 | Corning Incorporated | Method of producing uniform light transmission fusion drawn glass |
US20120180527A1 (en) * | 2011-01-13 | 2012-07-19 | Lawrence Livermore National Security, Llc | Method and System for Mitigation of Particulate Inclusions in Optical Materials |
US8780097B2 (en) | 2011-10-20 | 2014-07-15 | Sharp Laboratories Of America, Inc. | Newton ring mura detection system |
KR101657429B1 (ko) * | 2014-04-18 | 2016-09-13 | 아반스트레이트 가부시키가이샤 | 플랫 패널 디스플레이용 유리 기판 및 그 제조 방법, 및 액정 디스플레이 |
JP6067777B2 (ja) * | 2015-04-27 | 2017-01-25 | AvanStrate株式会社 | フラットパネルディスプレイ用ガラス基板及びその製造方法、ならびに液晶ディスプレイ |
KR102166471B1 (ko) * | 2017-09-20 | 2020-10-16 | 주식회사 엘지화학 | 유리 기판의 제조 방법 및 제조 장치 |
US11385039B2 (en) * | 2018-09-19 | 2022-07-12 | Corning Incorporated | Methods of measuring a size of edge defects of glass sheets using an edge defect gauge and corresponding edge defect gauge |
CN113272633A (zh) * | 2018-11-14 | 2021-08-17 | 康宁股份有限公司 | 对用于双折射缺陷的玻璃基基板进行自动化评估的系统与方法 |
CN116934746B (zh) * | 2023-09-14 | 2023-12-01 | 常州微亿智造科技有限公司 | 划伤缺陷检测方法、系统、设备及其介质 |
Family Cites Families (12)
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JPH02105044A (ja) * | 1988-10-14 | 1990-04-17 | Mitsubishi Metal Corp | ディスク外周部検査装置 |
JPH08500898A (ja) * | 1992-04-16 | 1996-01-30 | ザ ダウ ケミカル カンパニー | 複合データを解釈して異常な器機または処理挙動を検出する改良法 |
JPH09210657A (ja) * | 1996-02-05 | 1997-08-12 | Asahi Glass Co Ltd | 外壁材の凹凸模様評価方法及びその装置 |
US6154561A (en) * | 1997-04-07 | 2000-11-28 | Photon Dynamics, Inc. | Method and apparatus for detecting Mura defects |
US6909500B2 (en) * | 2001-03-26 | 2005-06-21 | Candela Instruments | Method of detecting and classifying scratches, particles and pits on thin film disks or wafers |
US6452677B1 (en) * | 1998-02-13 | 2002-09-17 | Micron Technology Inc. | Method and apparatus for detecting defects in the manufacture of an electronic device |
KR100767378B1 (ko) * | 2001-10-25 | 2007-10-17 | 삼성전자주식회사 | 액정공정불량 검사장치 및 검사방법 |
WO2003078925A2 (en) * | 2002-03-14 | 2003-09-25 | Taylor Hobson Limited | Surface profiling apparatus |
US7142295B2 (en) * | 2003-03-05 | 2006-11-28 | Corning Incorporated | Inspection of transparent substrates for defects |
US20050018199A1 (en) * | 2003-07-24 | 2005-01-27 | Leblanc Philip R. | Fiber array interferometer for inspecting glass sheets |
TWI335417B (en) * | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
JP2006153509A (ja) * | 2004-11-25 | 2006-06-15 | Sharp Corp | 表面形状測定装置、表面形状測定方法、表面形状測定プログラム及び記録媒体 |
-
2008
- 2008-02-13 WO PCT/US2008/001919 patent/WO2008106015A2/en active Application Filing
- 2008-02-13 KR KR1020097019915A patent/KR101436666B1/ko active IP Right Grant
- 2008-02-13 CN CN2008800130898A patent/CN101663574B/zh not_active Expired - Fee Related
- 2008-02-13 JP JP2009551671A patent/JP2010519559A/ja active Pending
- 2008-02-22 US US12/072,014 patent/US20080204741A1/en not_active Abandoned
- 2008-02-25 TW TW097106551A patent/TWI442048B/zh not_active IP Right Cessation
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2014
- 2014-05-07 JP JP2014095980A patent/JP6025265B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101663574A (zh) | 2010-03-03 |
KR101436666B1 (ko) | 2014-09-01 |
CN101663574B (zh) | 2011-09-28 |
WO2008106015A2 (en) | 2008-09-04 |
US20080204741A1 (en) | 2008-08-28 |
KR20090113910A (ko) | 2009-11-02 |
JP2014167485A (ja) | 2014-09-11 |
WO2008106015A3 (en) | 2008-10-23 |
TW200902961A (en) | 2009-01-16 |
TWI442048B (zh) | 2014-06-21 |
JP2010519559A (ja) | 2010-06-03 |
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