JP6019952B2 - COLOR FILTER FORMED SUBSTRATE, DISPLAY DEVICE, AND COLOR FILTER FORMED BOARD MANUFACTURING METHOD - Google Patents

Description

  The present invention relates to a color filter forming substrate for a display device and a display device, and in particular, for a color filter in a region partitioned by a pixel partitioning light-shielding portion (also referred to as a black matrix) on one side of a base material made of a transparent substrate. A color filter forming substrate comprising a colored layer of each color to form a display region, and a light-shielding frame portion as a non-display region outside the display region; and The present invention relates to a color filter forming substrate used in a display unit of a mobile electronic device, with the other side that is not one side being the outermost side (observer side).

In recent years, display devices such as liquid crystal display devices have been widely used as flat display panels, while the spread of display devices is remarkable.
For example, a liquid crystal display device generally includes a color filter forming substrate in which a black matrix layer composed of a light-shielding colored layer and a colored layer of each color are disposed on one surface of a transparent substrate, and a counter electrode substrate (also referred to as a TFT substrate). With a predetermined gap, and a structure in which the liquid crystal is sealed in the gap, and the light transmittance of the pixels of the colored layer of each color is controlled electrically by controlling the orientation of the liquid crystal As a result, a color image is displayed.
In such a display device, high display quality is required.

On the other hand, recently, mobile laptop computers and multifunction terminal devices (also referred to as high-function terminal devices) have become widespread, and tablet-type multifunction terminal devices such as those shown in FIG. Rapid spread is expected, and the display portion of these terminal devices (hereinafter referred to as mobile electronic devices) is required to have better design in addition to high display quality.
In mobile electronic devices that have recently become popular, efforts have been made to achieve high added value, such as high definition, energy saving, and miniaturization (lightening).
The environment where mobile electronic devices are used is not limited to indoors, and the frequency of outdoor use is much higher, so visibility improvements (contrast improvement) under sunlight have been implemented.
However, almost no efforts have been made for improvement from the viewpoint of design.

  Conventionally, as a display device for these mobile electronic devices, a light-shielding black frame for forming a non-display area over the entire periphery of the display area is formed on one side of a transparent substrate as a base material. There is a form in which the non-display area is formed by using the provided cover glass and the base material side is arranged on the outermost side (observer side). In response to the demand for weight reduction of these mobile electronic devices, Without using a cover glass, a transparent substrate is used as a base material, and a colored layer of each color for color filters is arranged in the display area on the one side, and for the non-display over the entire periphery of the display area A non-display area is formed by using a color filter forming substrate with a light-shielding black frame to form an area, and placing the other side of the base material on the outermost side (observer side). There is also a form to do. However, in any case of the display device, the frame portion as the non-display region and the reflection by the external light in the display region do not look good, particularly in the frame portion, indoors / outdoors, under room light, sunlight Below, the black-tightening of the light-shielding frame portion is not good, and it is difficult to finish a high-quality product in terms of design, which has been a problem.

In the case of a display device for a mobile electronic device that does not use a cover glass, for example, if a simplified cross-sectional configuration is shown, as shown in FIG. The color filter forming substrate 110 and the TFT substrate 150 in this order.
In the case of a display device for a mobile electronic device using a cover glass, a simplified cross-sectional configuration shows the cover glass with the cover glass 130 on the outside (observer side) as shown in FIG. 9B. 130, the color filter forming substrate 110, and the TFT substrate 150 in this order.
In the case of a display device for an in-cell touch panel type mobile electronic device that does not use a cover glass, for example, when a simplified cross-sectional configuration is shown, as shown in FIG. The base material side 111 of the TFT substrate 150 and the TFT substrate 150 are arranged in this order, with the color filter forming substrate 110 and the touch panel 140 integrated.
On the other hand, in the case of a display device of a touch panel type mobile electronic device using a cover glass, as shown in a simplified cross-sectional configuration, the cover glass is on the outside (observer side) as shown in FIG. The cover glass 130 and the touch panel 140 are integrated, and the color filter forming substrate 110 and the TFT substrate 150 are arranged in this order.
Note that FIGS. 9A, 9B, 10A, and 10B are simplified and show only the positional relationship between the above-described parts.

And the color filter formation board | substrate used for the display apparatus of the mobile electronic device shown to Fig.9 (a) and FIG.10 (a) which does not use a cover glass has the form as shown in FIG. 11 normally.
11A is a plan view of the color filter forming substrate. FIGS. 11B and 11C are directions of arrows in E1-E2 and E3-E4 in FIG. 11A, respectively. 11D is an enlarged view of a portion E5 in FIG. 11A, and FIG. 11E is an enlarged view of a portion E6 in FIG. 11A.
Usually, the color layers 113R, 113G, and 113B for each color for the color filter, the color layer for the pixel classification light-shielding portion (also referred to as a black matrix) 113M, and the color layer for the frame are formed by a photolithography process. A predetermined colored layer was similarly formed by a photolithography process on the light-shielding frame portion 112 as a non-display region over the entire periphery of the display region. Usually, the frame portion 112 and the pixel-partitioning light-shielding portion (also referred to as a black matrix) 113M are formed together in the same photolithography process. However, in some cases, the frame portion 112 and the pixel-partitioning light-shielding portion are the same photolithography. It is not necessary to form together in a process.

WO2010-150668 gazette JP 2009-053893 A

As mentioned above, recently, notebook PCs and multifunction terminal devices (also called high-end devices), which are mobile models, have become popular, and tablet-type multifunction terminal devices have rapidly spread. Although liquid crystal display devices are used as the display units of these mobile electronic devices, better design is required in addition to high display quality.
Under such circumstances, in the mobile electronic device, each color for the color filter is formed on one side of the base material made of a transparent substrate without using a cover glass as shown in FIGS. 9 (a) and 10 (a). A color filter forming substrate in which a colored layer is disposed in a display region and a light-shielding black frame portion is disposed in order to form a non-display region over the entire periphery of the display region, and the base material In the case where the non-display area is formed by arranging the other side, not the one side, on the outermost side (observer side), the frame portion as the non-display area or the reflection by external light in the display area The appearance is not good, especially in indoor / outdoor, indoor light, under sunlight, there is a problem that the black-tightness of the light-shielding frame is not good, and the product is not high-quality, and this countermeasure was required .
This invention respond | corresponds, arrange | positions the colored layer of each color for color filters in the display area on the one surface side of the base material which consists of a transparent substrate, without using a cover glass, and for this display Use a color filter forming substrate with a black frame part with a light-shielding property to form a non-display area around the entire periphery of the area, and use the other side of the substrate as the outermost side (observer side) In a display device for a mobile electronic device in which a non-display area is formed by arranging the display area in the frame), the frame portion as the non-display area and the appearance of reflection by external light in the display area are improved. Therefore, an object of the present invention is to provide a color filter forming substrate capable of improving the blackness of a light-shielding frame portion under indoor light and sunlight, and giving a product a high-class feeling.
At the same time, an object of the present invention is to provide a display device using such a color filter forming substrate.

The color filter forming substrate of the present invention is displayed by arranging a colored layer of each color for a color filter in a region separated by a pixel-shading light-shielding portion (also referred to as a black matrix) on one side of a base material made of a transparent substrate. A color filter forming substrate having a light-shielding frame portion as a non-display region outside the display region, and the other surface side that is not one surface side of the base material A color filter forming substrate used for a display part of a mobile electronic device as an outer side (observer side), and the substrate side is low-reflective in order from the base material side to the pixel section light shielding part or the frame part. It is characterized by having a laminated structure in which a low-reflection film mainly composed of chromium and a black light-shielding resin light-shielding film capable of ensuring optical density are laminated.
And it is said color filter formation board | substrate, Comprising: The said black resin light-shielding film is what contains carbon black disperse | distributing in resin.
Further, in any one of the color filter forming substrates, the width of the black resin light-shielding film of the laminated structure is larger than the width of the low reflection film.
Further, in any one of the above color filter forming substrates, the frame portion is, in order from the base material side, the low reflection film, the black resin light-shielding film, the colored layer for the color filter, the black film It has a laminated structure in which resin light shielding films are laminated.
Alternatively, in any one of the color filter forming substrates, the frame portion is formed by laminating the color filter coloring layer, the low reflection film, and the black resin light-shielding film in order from the base material side. The light-shielding part for pixel division of the display region is also a layered structure, and the color filter colored layer, the low-reflection film, and the black reflective layer are also arranged in order from the base material side. It has a laminated structure in which resin light shielding films are laminated.
Here, when used in a display device, an area that becomes a display area is a display area, and an area that is not a display area is a non-display area.
Alternatively, in the color filter forming substrate of the present invention, a colored layer of each color for the color filter is arranged in a region divided by a pixel-dividing light-shielding portion (also referred to as a black matrix) on one side of the base material made of a transparent substrate. Forming a display region, and a color filter forming substrate having a light-shielding frame portion as a non-display region outside the display region, and the other side which is not one side of the base material The outermost (observer side) is a color filter forming substrate used in a display unit of a mobile electronic device, wherein the pixel-segmenting light-shielding part or the frame part is composed mainly of chromium in order from the base material side. A laminated structure in which one or more low-reflective layers, a pure chrome layer, and one or more low-reflective layers mainly composed of chromium are laminated, and the pure chromium Layer is characterized in that a film thickness that can ensure the optical density.

  The display device of the present invention is characterized in that a display portion is formed using any of the color filter forming substrates described above.

  A method for producing a color filter forming substrate according to the present invention is a method for producing a color filter forming substrate according to any one of claims 1 to 6, wherein chromium is used as a main component in the order that the substrate side is a low reflection layer. Using the photosensitive composition for forming the black light-shielding resin light-shielding film on the low-reflection film formed by the film-forming process Then, patterning is performed by a photolithographic method to form a pattern of the black light-shielding resin light-shielding film, and a resin light-shielding film pattern forming process and an etching process of etching and removing the exposed low-reflection film are performed from the substrate side. A laminated structure in which a low-reflective film mainly composed of chromium whose base material side is low-reflective and a black light-shielding resin light-shielding film capable of ensuring optical density are sequentially obtained. Is.

(Function)
The color filter forming substrate according to the first aspect of the present invention has such a structure, and without using a cover glass, a colored layer for each color filter color is displayed on one side of a substrate made of a transparent substrate. A color filter forming substrate provided with a light-shielding black frame portion is used to form a non-display region over the entire periphery of the display region and not on one side of the base material. In a display device of a mobile electronic device in which the other surface side is arranged on the outermost side (observer side) to form a non-display area, the frame portion as the non-display area and the reflection by external light in the display area Providing a color filter-formed substrate that improves the appearance and improves the quality of the product by improving the blackness of the light-shielding frame, especially indoors and outdoors, under indoor light, and even under sunlight. Is possible.
In particular, it is used indoors and outdoors like a mobile electronic device, and is effective for a display portion that requires high quality and design.
Specifically, a low-reflection film mainly composed of chromium having a low-reflective property on the base material side and a black light-shielding light that can secure an optical density in order from the base material side to the light-shielding portion or frame portion for pixel classification. This is achieved by having a laminated structure in which a transparent resin light-shielding film is laminated.
By using a low-reflective film with chromium as the main component that has low reflectivity on the base material side, reflection of external light can be suppressed, and the appearance of reflection by external light in the frame area and display area as a non-display area Is improving.
The low reflection film preferably has a reflectance of specularly reflected light of 10% or less in the range of 400 nm to 700 nm, and has a very low diffuse reflectance in the range of 400 nm to 700 nm or almost no diffuse reflection. Is preferred.
For example, a two-layer structure in which a low-reflective chromium oxynitride (CrOxNy) layer and a pure chromium layer are stacked is exemplified, but the present invention is not limited thereto.
The low-reflective layer can be adjusted according to the degree of oxidation of chromium, the degree of oxynitridation, the degree of carbonization of oxycarbon, etc. A low-reflection film whose side has low reflectivity may be used.
For example, the chromium oxynitride (CrOxNy) layer can be formed by sputtering argon gas with chromium oxynitride as a target, or sputtering using a gas obtained by mixing oxygen gas and nitrogen gas with argon gas. .
Moreover, as a black resin light-shielding film, what contains carbon black disperse | distributed in resin is mentioned.
The black resin light-shielding film is preferably one that can ensure the required optical density (usually 4 or more) and has less internal reflection that causes malfunction of the TFT when used in a display device. It is preferable to use a material having a small particle diameter or a material obtained by coating a resin on rare carbon black as a pigment dispersed in the resin.
The thickness is adjusted to the optical density.

The low-reflective layer can be adjusted according to the degree of oxidation, the degree of oxynitridation or the degree of carbonization of oxide, such as a layer of chromium oxynitride (CrOxNy) containing chromium as a main component. When used, the diffuse reflection of the external light from the observer side can be almost eliminated, and the reflectance of the regular reflection light from the observer side can be easily made 10% or less in the range of 400 nm to 700 nm. Paying attention to this, the low reflection film is provided on the base material side and laminated with the resin light-shielding film to secure the scholarly density, thereby securing the optical density and the appearance of the external light reflection. It was found that it can be improved, and formed the color filter forming substrate of the present invention.
Conventionally, the pixel-shading light-shielding film and the frame portion have been formed of a black resin light-shielding film containing carbon black dispersed in the resin as a pigment, and therefore due to the influence of diffuse reflection of external light due to reflection from the carbon black. The appearance of external light reflection from the observer side when used in a display device was not good.
As shown in FIG. 5, the spectrocolorimeter uses a specular reflection light removal method (special components exclusive method (hereinafter abbreviated as SCE method)) that can detect diffuse reflection components to reflect the reflectance of the reflected light of outside light. The smaller the value of brightness Y in the XYZ color system of JISZ8701 obtained by calculation from the measurement results of the characteristics, the better. As an appearance evaluation method by external light reflection, the evaluation of the Y value by the measurement by the SCE method is visually observed. It is used as being close to evaluation.
When the color filter-formed substrate of the present invention is used for a display device, the Y value (D65 light source) measured by the SCE method shown in FIG.
In FIG. 5, the thick solid line arrow indicates the incident light 62L from the light source 62, the dotted line arrow indicates the direction of light from each point, and the thin solid line arrow indicates the detection light 63L incident on the detector 63. Show.
The spectrocolorimeter also has a measurement method that can detect the sum of specular reflection light and diffuse reflection light, and is generally referred to as an SCI method (abbreviation of Special Components Include method).
The SCI method is widely used when measuring an object color.

  Also, since the width of the black resin light-shielding film is larger than the width of the low-reflection film, the region of the resin light-shielding film having a high resistance value is widened, so that improvement in electrical reliability can be expected.

Moreover, as a frame part, the laminated structure which laminated | stacked the low reflection film, the black resin light-shielding film, the colored layer for color filters, and the black resin light-shielding film in order from the base material side is mentioned.
Alternatively, as the frame portion, in order from the base material side, a layered structure in which a colored layer for a color filter, a low reflection film, and a black resin light shielding film are laminated, or in addition to this, a display area The pixel-shading light-shielding portion is also in order from the base material side, the color layer for the color filter, the low-reflection film (a chromium film mainly composed of Cr with the base-material side as a low-reflection layer), and the black resin light-shielding part. The thing made into the laminated structure which laminated | stacked the film | membrane is mentioned.

According to a seventh aspect of the present invention, the pixel section light-shielding portion or the frame portion includes, in order from the base material side, one or more low-reflective layers mainly composed of chromium, a pure chromium layer, and chromium. It has a laminated structure in which one or more low-reflective layers as components are laminated, and the pure chrome layer of the laminated structure has a film thickness that can secure an optical density. Without using, a colored layer of each color for the color filter is arranged in the display area on one side of the base material made of a transparent substrate, and a non-display area is formed over the entire periphery of the display area. Therefore, a non-display area is formed by using a color filter forming substrate provided with a light-shielding black frame portion and arranging the other surface side, not the one surface side, on the outermost side (observer side). Forehead as non-display area in mobile electronic device display devices Improves the appearance of reflections from outside light in the screen and display area, and improves the quality of the product by improving the blackness of the light-shielding frame, especially indoors, indoors and under sunlight. It is possible to provide a color filter forming substrate that can be provided.
In particular, it is used indoors and outdoors like a mobile electronic device, and is effective for a display portion that requires high quality and design.
The low-reflective layer here also preferably has a reflectance of specularly reflected light of 10% or less in the range of 400 nm to 700 nm, and has very little diffuse reflectance in the range of 400 nm to 700 nm, or diffuse reflection. Those having almost no are preferred.
Examples of the low-reflective layer include, but are not limited to, a two-layer structure in which a low-reflective chromium oxynitride (CrOxNy) layer and a pure chromium layer are stacked.
In addition, the low-reflective layer can be adjusted according to the degree of oxidation of chromium, the degree of oxynitridation, the degree of oxycarbonization, etc., and the adjusted layer is arranged on the substrate side and laminated with the pure chromium layer, A low reflective film in which the substrate side has low reflectivity may be used.

  By adopting such a configuration, the display device of the present invention improves the appearance of reflection due to external light in the frame portion as a non-display region and the display region. Even under light, it is possible to provide a display device having a display portion that can enhance the blackness of the light-shielding frame portion and give a product a high-class feeling.

In this way, the present invention is such that, without using a cover glass, a transparent substrate is used as a base material and a colored layer of each color for color filters is arranged on the display area on the one side, and the periphery of the display area Use a color filter forming substrate with a light-shielding black frame to form a non-display area over the entire circumference, and arrange the other side that is not one side of the base material on the outermost side (observer side) In the display device of the mobile electronic device in the form of forming the non-display area, the frame portion as the non-display area and the appearance of reflection by the external light in the display area are improved. Even under sunlight, it is possible to provide a color filter forming substrate that can enhance the blackness of the light-shielding frame portion and give the product a high-class feeling.
At the same time, using such a color filter forming substrate, a base device side of the color filter forming substrate is arranged on the outermost side (observer side) to form a non-display area. It was possible to provide.

FIG. 1A is a plan view of a first example of an embodiment of a color filter forming substrate according to the present invention. FIGS. 1B and 1C are respectively A1-A2 and A3-A4. FIG. 1D is an enlarged view of a portion A6 in FIG. 1A, and FIG. 1E is an enlarged cross-sectional view of a pixel section light shielding portion in A7 in FIG. FIG. 1 (f) is an enlarged cross-sectional view of the frame portion A5 in FIG. 1 (a). It is an expanded sectional view of the pixel classification light shielding part of the 2nd example of embodiment of the color filter formation board | substrate of this invention. FIG. 3A is an enlarged cross-sectional view of a pixel classification light-shielding portion of the third example of the embodiment of the color filter forming substrate of the present invention, and FIG. 3B is an enlarged cross-sectional view of the frame portion of the third example. FIG. FIG. 4A is an enlarged cross-sectional view of the pixel-partitioning light-shielding portion of the fourth example of the embodiment of the color filter forming substrate of the present invention, and FIG. 4B is an enlarged cross-sectional view of the frame portion of the fourth example. is there. It is a figure for demonstrating how to measure by the SCE system which can detect a diffuse reflection component with a spectrocolorimeter. It is a figure for demonstrating the laminated structure of the low reflection film 13Mb. FIGS. 7A to 7D are process cross-sectional views showing a method for manufacturing a pixel-segment light-shielding portion of the color filter forming substrate of the first example shown in FIG. FIGS. 7E to 7H are process cross-sectional views illustrating a method of manufacturing the pixel-segmenting light-shielding portion in the second example illustrated in FIG. It is a top view of a tablet type multifunction terminal. 9 (a) is a cross-sectional configuration diagram showing the positional relationship of each part of a mobile electronic device that is not a touch panel without using a cover glass in an easy-to-understand manner. FIG. 9 (b) uses a cover glass. It is the cross-sectional block diagram which simplified and showed easily the positional relationship of each part of the mobile electronic device which is not a touch panel. FIG. 10A is a cross-sectional configuration diagram illustrating the positional relationship of each part of the mobile electronic device that is a touch panel without using a cover glass in an easy-to-understand manner. FIG. 10B uses a cover glass. It is the cross-sectional block diagram which simplified and showed easily the positional relationship of each part of the mobile electronic device which is a touch panel. 11A is a plan view of a conventional color filter forming substrate, and FIGS. 11B and 11C are directions of arrows in E1-E2 and E3-E4 of FIG. 11A, respectively. 11 (d) is an enlarged view of a portion E5 of FIG. 11 (a), and FIG. 11 (e) is an enlarged view of a portion E6 of FIG. 11 (a).

First, the 1st example of embodiment of the color filter formation board | substrate of this invention is demonstrated based on FIG.
The color filter forming substrate of the first example is a color filter forming substrate used for a display unit (liquid crystal display device) of a mobile electronic device such as a mobile notebook computer or a multi-function terminal device (also referred to as a high-function terminal device). As shown in FIG. 1A, a transparent substrate made of a glass substrate is used as a base material 11, and on one surface side of the base material 11, a colored layer (13R, 13G) for each color filter is provided in a display region 13S. 13B) and a pixel classification light shielding portion (also referred to as a black matrix) 13M, and a light-shielding frame portion 12 is provided as a non-display region outside the display region 13S. As shown in FIG. 1C, a protective layer (also referred to as an overcoat layer or an OC layer) 14 is provided in a flat shape so as to cover the colored layer 13 of the display region 13S and the frame portion 12. There.
And the other surface side which is not the said one surface of the base material 11 is made into the outermost side (observer side), and the display part of the mobile electronic device of the form shown to Fig.9 (a) or the form shown to Fig.10 (a) ( Used in display devices).
In particular, as shown in FIGS. 1 (e) and 1 (f), the pixel-shading light-shielding portion 13M and the frame portion 12 are made to have a low reflectivity in order from the base material 11 side. The laminated structure is formed by laminating the low-reflection film 13Mb mainly composed of chromium and the black light-shielding resin light-shielding film 13Ma capable of ensuring optical density.
Here, the low reflection film 13Mb has a structure in which a layer of a chromium oxynitride film (also referred to as a low reflection layer) 13MC1 and a pure chromium layer 13MC2 are laminated on the base 11 side.
Here, the low reflection film 13Mb preferably has a reflectance of specular reflection light on the substrate 11 side of 10% or less in the range of 400 nm to 700 nm, and diffuse reflection on the substrate 11 side in the range of 400 nm to 700 nm. Those having a very low rate or little diffuse reflection are preferred. In this example, the low-reflection film 13Mb and the light-shielding resin light-shielding film 13Ma in the pixel-segmenting light-shielding part 13M are formed in the same size.
Here, the thicknesses of the chromium oxynitride film (CrOxNy) layer 13C1 and the pure chromium layer 13C2 are 810 mm and 800 mm, respectively, and the spectral reflectance of the reflected light obtained from the SCE measurement shown in FIG. The brightness Y in the XYZ color system of JIS Z8701 calculated from the characteristics is set to 0.01 or less.
The chromaticity coordinates (x, y) in the XYZ color system of JIS Z8701 under the D65 light source are (0.313, 0.329).
The black light-shielding resin light-shielding film 13Ma is made of a light-shielding resin layer in which carbon black particles are dispersed as a pigment in the resin component, and is adjusted to an optical density that can ensure the required optical density (usually 4 or more). The film thickness is as follows.
Here, in order to reduce internal reflection that causes malfunction of the TFT when used in a display device, the side that becomes the TFT side is made of a resin light-shielding film.

In this example, as described above, the brightness Y in the XYZ color system of JIS Z8701 is controlled, so that a transparent substrate made of a glass substrate is used as a base material, and a display region is provided on one side of the base material. A colored region for each color filter is arranged to form a display region, a light-shielding frame portion is formed outside the display region, and the substrate side is the outermost side (observer side), When used in a display unit (display device) of a mobile electronic device, it is possible to improve the appearance by suppressing reflection due to external light in a frame part as a non-display area or a display area. Even under light and sunlight, it is possible to improve the blackness of the light-shielding frame and give the product a high-class feeling.
In particular, it is used indoors and outdoors, and is effective for display units that require high quality and design.

Here, CM-2500d manufactured by Konica Minolta Co., Ltd. was used as the spectrocolorimeter, and the reflectance was measured in the wavelength range of 320 nm to 740 nm as shown in FIG.
The following description is based on an optical system of d / 8 ° (d is diffused light) as expressed in JIS Z 8722 (irradiation angle / light reception angle), but other optical systems may be used.
Here, the angle θ in FIG. 5 is 8 °.
Based on the results obtained from these measurements, JIS was measured using a D65 light source.
This is represented by chromaticity coordinates (x, y) and brightness Y in the XYZ color system of Z8701.

In addition, here, when used in a display device, an area that becomes a display area is a display area 13S, which means an area inside the frame portion 12 in FIG.
Further, a region of the frame portion 12 that does not become a display region is set as a non-display region.
The colored portion 13 is a generic name for the colored layers 13R, 13G, and 13B for color filters and the pixel-partitioning light-shielding portion 13M.
In the display area, as shown in FIG. 1D, the colored layers 13R, 13G, and 13B for red, green, and blue for the color filter are separated by the pixel-partitioning light shielding portion 13M. Are formed in a predetermined arrangement.
The opening pattern shape of the pixel-partitioning light-shielding portion 13M and the arrangement of the colored layers of each color are not limited to the form shown in FIG.
There are also examples in which the shape of the opening pattern of the pixel-partitioning light-shielding portion 13M is a stripe shape, a shape in which the shape of the colored layer is changed, such as a dogleg shape or a delta arrangement.

Next, the material of each part will be described.
<Substrate 11>
As the base material 11 made of the transparent substrate used in the first example, those conventionally used for color filters can be used, and flexible such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. Non-transparent transparent inorganic substrate, and a transparent resin substrate having flexibility such as a transparent resin film and an optical resin plate. In particular, it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate.
Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates.
The alkali-free type glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and does not contain an alkali component in the glass. Therefore, it is suitably used for a color filter for an active matrix type color liquid crystal display device. Because it can.
As the substrate, a transparent transparent substrate is usually used.

<Pixel section light shielding portion 13M and frame portion 12>
(Light shielding resin light shielding film 13Ma)
As the light-shielding resin light-shielding film 13Ma, for example, here, carbon black coated with a resin such as an epoxy resin is used as a pigment (pigment) dispersed in a binder resin.
In the case where carbon black is dispersed as a pigment (pigment) in a binder resin, the light-shielding resin layer can be formed with a relatively thin film thickness.
Here, the film thickness is set such that an optical density (usually 4.0 or more) can be secured.
Here, the light-blocking resin light-shielding film 13Ma in the pixel-segmenting light-shielding portion 13M and the frame portion 12 is formed by a photolithography method. In this case, examples of the binder resin include acrylate-based, methacrylate-based, A photosensitive resin having a reactive vinyl group such as vinyl cinnamate or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a black matrix containing a black colorant and a photosensitive resin, and further, if necessary, a sensitizer, a coatability improver, A development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added.
In some cases, both the black matrix and the light-shielding colored layer in the frame portion, or only one of them may be formed by using a printing method or an inkjet method. In this case, as the binder resin, for example, Methyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, A maleic acid resin, a polyamide resin, etc. are mentioned.
(Low reflective film 13Mb)
As the low-reflection film 13Mb mainly composed of chromium whose base material side has low reflectivity, the low-reflection chromium oxynitride (CrOxNy) 13MC1 in order from the base material 11 side shown in FIG. A two-layer structure in which a layer and a layer of pure chromium 13MC2 are stacked is mentioned as the stacked structure of the first example, but is not limited thereto.
Low reflectivity can be adjusted by the degree of oxidation of chromium, the degree of oxynitridation, the degree of oxycarbonization, etc., and a plurality of adjusted layers may be laminated.
For example, as shown in FIG. 6B, the low-reflective layers 13MD1 and 13MD2 are laminated in two layers and a pure chrome layer 13MD3, and the refractive index of the substrate 11 is ns, and the low-reflective layer 13MD1. , 13MD2, and the pure chrome layer 13MD3, where the real part of the complex refractive index is n1, n2, and n3, respectively, the relationship of ns <n1 <n2 <n3 may be satisfied.
As a low reflection film, even a small amount of a component containing components other than oxygen and nitrogen can be applied as long as the substrate side satisfies the function of low reflection.
For example, the chromium oxynitride (CrOxNy) layer can be formed by sputtering argon gas with chromium oxynitride as a target, or sputtering using a gas obtained by mixing oxygen gas and nitrogen gas with argon gas. .
By making the substrate 11 side a low-reflection film mainly composed of chromium with low reflectivity, reflection of outside light can be suppressed, and reflection by outside light in the frame portion as a non-display area or in the display area can be prevented. It looks good.

<Colored layers 13R, 13G, 13B>
In this example, the colored layers for forming the color filters are the three colored layers of the red colored layer 13R, the green colored layer 13G, and the blue colored layer 13B.
The colored layer of each color is obtained by dispersing or dissolving a colorant such as a pigment or dye of each color in a binder resin, and is formed by a photolithography method (also referred to as a photolithography method).
As the binder resin used in the colored layer, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a colored part containing a colorant and a photosensitive resin, and further, a sensitizer, a coating property improver, and a development as necessary. You may add an improving agent, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc.
The thickness of the colored layer of each color is usually set to about 1 μm to 5 μm.
The color of the colored layer is not particularly limited as long as it includes at least three colors of red, green, and blue. For example, three colors of red, green, and blue, or red, green, blue, and yellow Or five colors such as red, green, blue, yellow, and cyan.
Examples of the colorant used in the red (also referred to as R) colored layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. Can be mentioned.
These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green (also referred to as G) colored layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, and isoindoline pigments. Examples thereof include pigments and isoindolinone pigments.
These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue (also referred to as B) coloring layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. .
These pigments may be used alone or in combination of two or more.

<Protective layer 14>
Examples of the material for the protective layer include a thermosetting resin composition and a photocurable resin composition.
The photo-curable resin composition is preferable for cutting into pieces after imposing the color filter-formed substrate on the surface.
The photo-curable resin composition for the protective layer is the same as the binder resin used for the colored layers for forming the color filters, for example, acrylate-based, methacrylate-based, polyvinyl cinnamate-based, or cyclized A photosensitive resin having a reactive vinyl group such as rubber is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
In the first example, the color filter forming substrate is impositioned and the red, green, and blue colored layers 13R, 13G, and 13B, the pixel-segmenting light-shielding portion 13M, and the frame portion 12 are formed. The resin composition is applied by a spin coating method. A protective layer cut is provided between each color filter substrate, and the resin composition for the protective layer is optically separated. The curable resin composition is formed by coating and drying, selectively irradiating only a predetermined region with light, and developing. However, the method for forming the protective layer is not limited thereto.
Examples of the thermosetting resin composition for the protective layer include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

Next, an example of a method for manufacturing the color filter forming substrate of the first example will be briefly described with reference to FIG.
After the low reflection film 13Mb is formed by sputtering on the entire surface of the substrate 11 (FIG. 7A), a light-shielding resin light-shielding film 13Ma is formed on the low-reflection film 13Mb. 13Ma1 is applied and formed (FIG. 7B), and the resin light-shielding film 13Ma is formed in accordance with the shape of the pixel-segmenting light-shielding film 13M to be formed by photolithography, and further, the patterned resin light-shielding film is formed. The exposed low-reflection film 13Mb is etched using 13Ma as an etching resistant resist to form a pixel-partitioning light-shielding film 13M (FIG. 7C).
Next, red, green, and blue colored layers 13R, 13G, and 13B for color filters are formed by a photolithography method using a photosensitive curable resin composition, respectively. (Fig. 7 (d))
Here, the formation of each part in the display area 13S is shown in FIG. 7, but the formation of the frame part 12 in the non-display area is basically the same as in FIGS. 7 (a) to 7 (c). This is performed simultaneously with the formation of the pixel-partitioning light-shielding portion 13M.

Next, the 2nd example of embodiment of the color filter formation board | substrate of this invention is given.
The second example is the same as the first example, except that the width of the light-shielding resin light-shielding film 13Ma in the pixel-partitioning light-shielding portion 13M is larger than that of the low-reflection film 13Mb, and the light-shielding resin light-shielding film 13Ma is a low-reflection film. It is the form which covered 13Mb.
Other than that, it is the same as the first example. Also in the case of the second example, it is possible to improve the appearance by suppressing reflection by external light in the frame portion and the display region as the non-display region. Even under indoor light or sunlight, the black color of the light-shielding frame can be improved to give the product a high-class feeling.
In particular, it is used indoors and outdoors, and is effective for display units that require high quality and design.
The formation of the pixel classification light-shielding portion 13M in the second example is different from that in the first example. First, the low reflection film 13Mb is formed by sputtering on the entire surface of the substrate 11 (FIG. 7A). (FIG. 7 (e)), a photosensitive resist on the formed low reflection film 13Mb is applied and formed, an etching resistant resist is formed into a predetermined shape by a photolithographic method, and the low reflection film is etched. 13Mb is formed in accordance with the shape of the pixel-segmenting light-shielding film 13M to be formed. (FIG. 7F) Next, a photosensitive curable resin composition 13Ma1 for forming a light-shielding resin light-shielding film 13Ma is applied and formed on the entire surface of the low-reflection film 13Mb, and the resin light-shielding film 13Ma is formed by photolithography. Are formed in accordance with the shape of the pixel-segmenting light-shielding film 13M to be formed. (FIG. 7 (g)) Next, red, green, and blue colored layers 13R, 13G, and 13B for color filters are respectively formed by a photolithography method using a photosensitive curable resin composition. (Fig. 7 (h))
The production of the second example takes more time than the production of the first example.

Next, the 3rd example of embodiment of the color filter formation board | substrate of this invention is given.
In the third example, the display area 13S has the same structure as that of the first example, and the laminated structure of the frame portion 12 is changed. Otherwise, the display area 13S is the same as the first example.
The frame portion 12 of the third example is obtained by arranging a light-shielding resin light-shielding film 13Ma on the same structure as the display region 13S in the entire frame region.
Also in the case of the third example, it is possible to improve the appearance by suppressing the reflection by the external light in the frame portion as the non-display area or the display area, and in particular, the light-shielding property even in the indoor / outdoor, indoor light and sunlight. It is possible to improve the blackness of the picture frame part to give the product a high-class feeling.
In particular, it is used indoors and outdoors, and is effective for display units that require high quality and design.
In the case of the third example, similarly to the display area up to the frame area, after forming the pixel-segmenting light-shielding film 13M and the colored layers 13R, 13G, and 13B for each color, the light-shielding resin light-shielding film is further formed. It can be obtained by coating the entire surface using a photosensitive curable composition for forming 13Ma and forming a light-shielding resin light-shielding film 13Ma only in the frame region by photolithography.

Next, the 4th example of embodiment of the color filter formation board | substrate of this invention is given.
The fourth example is different from the first example in that the laminated structure of the pixel-segmenting light-shielding part 13M and the frame part 12 is changed so as to cover the whole with colored layers of each color. Otherwise, the first example Is the same.
As shown in FIGS. 4 (a) and 4 (b), the cross sections of the pixel-segmenting light-shielding portion 13M and the frame portion 12 are respectively colored layers (13R) for color filters in order from the substrate 11 side. 13G, 13B), a low reflection film 13Mb, and a black resin light shielding film 13Ma.
In the case of the fourth example as well, it is possible to improve the appearance by suppressing the reflection by the external light in the frame portion as the non-display area and the display area. It is possible to improve the blackness of the picture frame part to give the product a high-class feeling.
In particular, it is used indoors and outdoors, and is effective for display units that require high quality and design.
As a modification, as shown in FIG. 4A1, in the fourth example, the width of the low reflection film 13Mb and the black resin light-shielding film 13Ma is changed in the pixel-partitioning light-shielding portion (FIG. 4A). In other words, a mode in which the width of the black resin light-shielding film 13Ma is made larger than the width of the low-reflection film 13Mb can be cited.

The color filter forming substrate of the present invention is not limited to the above form.
For example, in each of the first to fourth examples and modifications, the display area on the protective layer 14 may further include a plurality of spacers having a predetermined height.
The liquid crystal display device includes a color filter forming substrate in which a black matrix layer made of a light-shielding colored layer and a colored layer of each color are disposed on one surface of a transparent substrate, and a counter electrode substrate (also referred to as a TFT substrate). Are arranged facing each other with a predetermined gap, and the liquid crystal is sealed in the gap, and the light transmittance of the pixels of the colored layer of each color is electrically controlled by controlling the orientation of the liquid crystal. In order to control the color filter forming substrate and the counter electrode substrate (also referred to as TFT substrate) to a predetermined gap, a plurality of spacers having a predetermined height are arranged on the protective layer 14 of the color filter forming substrate.
In each example, a mode in which the low-reflection film containing chromium as a main component and having a base material side having low reflectivity as a main component is formed of three or more chromium-based layers is also included.
Each example and modification of the first to fourth examples is for a liquid crystal display device, but is not limited thereto.
For example, an organic EL display device is also included.
Moreover, in each example and modification of the first example to the fourth example, a quadrangular shape is used, but in some cases, a corner portion may be rounded.
In the first example, the pixel-segmenting light-shielding portion 13M or the frame portion 12 is, in order from the base material 11 side, one or more low-reflective layers mainly composed of chromium, a pure chromium layer, chromium A layered structure in which one or more low-reflective layers having a main component is laminated, and the pure chrome layer having the laminated structure has a thickness that can ensure an optical density. Can do.

[Example]
The present invention will be further described with reference to examples.
Example 1
Example 1 was prepared by preparing the color filter forming substrate of the first example shown in FIG. 1, and preparing and preparing a photocurable curable resin composition A as follows. Using the curable resin composition A, a red curable resin composition for forming a color filter, a green curable resin composition, a blue curable resin composition, a light-shielding resin light-shielding in a pixel-partitioning light-shielding part and a frame part A curable resin composition for film formation was prepared, and using these, a photolithography method was performed for each curable resin composition to form each colored layer for a color filter, a light-blocking portion for pixel division, and a frame portion. Thing.
Here, after forming the pixel-segmenting light-shielding portion 13M and the frame portion 12, the red colored layer 13R, the green colored layer 13G, and the blue colored layer 13B for the color filter in the display region 13S are respectively subjected to a photolithography process. Formed.
The width of the low-reflection film 13Mb of the light-shielding portion for pixel division in the display area 13S is 22 μm, the width of the resin light-shielding film 13Ma is 22 μm, and the aperture ratio is 60%.

(Preparation of curable resin composition A)
The polymerization tank is charged with 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG). After stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly.
Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour.
7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399)
: 24 parts by weight-Orthocresol novolak type epoxy resin (Epicoat Shell Epoxy Co., Ltd. Epicoat 180S70): 4 parts by weight-2-Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 weights Parts ・ Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of the pixel-shading light-shielding portion 13M and the frame portion 12)
First, a structure in which a low-reflective chromium oxynitride (CrOxNy) layer 13MC1 and a pure chromium layer 13MC2 are sequentially laminated on a glass substrate (Asahi Glass Co., Ltd., AN material) in order from the base material 11 side by sputtering. The low reflection film 13Mb is prepared.
Using a chromium target, a low-reflective chromium oxynitride (CrOxNy) layer 13MC1 is formed by sputtering using a gas obtained by mixing oxygen gas and nitrogen gas in argon gas, and further, by sputtering in an argon gas atmosphere, A pure chrome layer 13MC2 was formed to obtain a low reflective film 13Mb.
The low-reflection chromium oxynitride layer 13MC1 is manufactured by the following process.
First, a film formed by a reactive direct current sputtering method using a mixed gas of argon gas and nitrogen gas. The atomic percentage is a film of about 45% chromium and 55% oxygen, and has a wavelength of 550 nm and is complex. A translucent film having a real part n1 = 2.2 of refractive index and an extinction coefficient k1 = 0.1 which is an imaginary part is formed, and the film thickness is 430 mm.
Second, it is a film formed by a reactive direct current sputtering method using a mixed gas of argon gas and nitrogen gas. The atomic percentage is a film of about 60% chromium and about 40% nitrogen, and has a wavelength of 550 nm. A semi-light-shielding film having a real part n2 = 2.8 of complex refractive index and an extinction coefficient k2 = 1.1 is formed. The film thickness is 380 mm.
The film thickness of the low reflection chromium oxynitride layer 13MC1 is 810 mm.
Subsequently, the pure chrome layer 13MC2 is a light-shielding film formed using argon gas and having a wavelength of 550 nm and a real part n1 = 3.3 of a complex refractive index and an extinction coefficient k3 = 2.5. The film thickness is 800 mm.
Here, the composition analysis was performed by the usual Auger electron analysis method. The spectral refractive index was measured using a spectroscopic ellipsometer MOSSES-4G manufactured by SOPRA (France) by depositing each film on a silicon wafer substrate by the same method as described above.
Further, the brightness Y in the XYZ color system of JIS Z8701 calculated from the spectral reflectance characteristics of the reflected light obtained from the SCE measurement was 0.01.
Next, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (Mitsubishi Chemical Corporation MS18E): 20 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight The components were sufficiently mixed to obtain a light-shielding composition for forming a resin light-shielding film.
-Black pigment dispersion: 43 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight On the low-reflection film 13Mb formed on the substrate 11, the light-shielding resin light-shielding film The forming composition 13Ma1 was applied by a spin coater and dried at 100 ° C. for 3 minutes to form a light-shielding colored resin layer.
A photomask is placed on the light-shielding colored resin layer at a distance of 100 μm from the coating film and exposed to a light-shielding pattern with a 2.0 kW ultra-high pressure mercury lamp by a proximity aligner, and then a 0.05 wt% potassium hydroxide aqueous solution Then, the substrate is left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment, and the exposed low reflection film 13Mb is etched to form the pixel-segmenting light-shielding portion 13M and the frame portion 12. did.
The film thickness of the resin light-shielding film in the pixel-partitioning light-shielding part 13M and the frame part 12 was 1.3 μm.
The resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation) has an average particle size of 25 nm.
The particle size is, for example, a laser Doppler scattered light analysis particle size analyzer (trade name “Microtrac 934UPA”) manufactured by Nikkiso Co., Ltd. The particle diameter in which the cumulative pigment particle diameter of the product occupies 50% is defined as 50% average particle diameter, and the value is measured and determined.

(Formation of red colored layer 13R)
On the black matrix, a red curable resin composition having the following composition was applied by spin coating, and then dried in an oven at 70 ° C. for 3 minutes.
Next, a photomask is placed at a distance of 100 μm from the coating film of the red curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed.
Thereafter, the substrate was left in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment, thereby forming a red pixel pattern in the display region 13S.
The formed film thickness was 2.0 μm.
<Composition of red curable resin composition>
C. I. Pigment Red 177: 3 parts by weight C.I. I. Pigment Red 254: 4 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 23 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of green colored layer 13G)
Next, using the green curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. A relief pattern composed of a green colored layer was formed in the display area.
<Composition of green curable resin composition>
C. I. Pigment Green 58: 7 parts by weight C.I. I. Pigment Yellow 138: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 22 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of blue colored layer 13B)
Further, using the blue curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. A blue relief pattern was formed.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 5 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of protective film 14)
On the board | substrate in which the colored layer 13 was formed as mentioned above, the above-mentioned curable resin composition A was apply | coated and dried by the spin coating method, and the coating film of 2 micrometers of dry coating films was formed.
A photomask is placed at a distance of 100 μm from the coating film of the curable resin composition A, and an ultraviolet ray is applied only to the region corresponding to the protective layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner for 10 seconds. Irradiated.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid 23 degreeC) for 1 minute, and alkali image development was carried out, and only the uncured part of the coating film of curable resin composition was removed.
Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment to form a protective film.
Thus, the color filter forming substrate 10 of the first example shown in FIG. 1 was produced.

Next, a spacer having a predetermined height was disposed on the protective layer 14 of the color filter forming substrate 10 of the first example manufactured as described below to manufacture a liquid crystal display device.
(Spacer formation)
On the protective layer 14 of the color filter forming substrate 10 on which the colored layer and the protective layer were formed as described above, the curable resin composition A was applied by a spin coating method and dried to form a coating film.
A photomask was placed at a distance of 100 μm from the coating film of the curable resin composition A, and only a spacer formation region was irradiated with ultraviolet rays for 10 seconds using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of the curable resin composition A was removed.
Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 30 minutes to perform a heat treatment to form a predetermined number density.
(Creation of liquid crystal display device)
An alignment film (SE-6210, manufactured by Nissan Chemical Industries, Ltd.) was formed on the surface of the color filter forming substrate obtained as described above on the colored layer forming side.
Next, a necessary amount of IPS liquid crystal is dropped on the glass substrate (TFT substrate) on which the TFT is formed, the color filters are overlaid, and a UV curable resin (Three Bond Co., Ltd., Three Bond 3025) is used as a sealing material. A cell was assembled by exposing at a dose of 400 mJ / cm ² while applying a pressure of ³ kgf / cm ² to form a cell, and a polarizing plate, a backlight unit, and a cover were installed to obtain a liquid crystal display device.

(Example 2)
In Example 2, the color filter forming substrate of the second example shown in FIG. 2 was produced, and basically the same material as that of Example 1 was used, and FIGS. 7A and 7E to FIG. It was produced in the step (h).
The patterning of the low reflection film 13Mb is the same as in Example 1 except that a commercially available photoresist (ip-3500 manufactured by Tokyo Ohka) was used.
The width of the low reflection film 13Mb of the light shielding portion 13M for pixel classification in the display region 13S is 22 μm, the width of the resin light shielding film 13Ma is 23 μm, and the aperture ratio is 59%.

(Example 3)
In Example 3, the color filter forming substrate of the third example shown in FIG. 3 was produced, and basically produced by the same material and method as in Example 1.
Similarly to Example 1, the width of the pixel-partitioning light-shielding portion in the display region 13S (same as the width of the low reflective film 13Mb) was 22 μm, and the aperture ratio was 60%.

(Comparative Example 1)
In Example 1, the material of the black pigment dispersion was changed as follows to obtain a black pigment dispersion.
Carbon black (R-1060 Colombian Co., Ltd.): 30 parts by weight Polymer dispersing agent (Big Chemie Japan, Ltd. Disperbyk 163): 7 parts by weight Solvent (diethylene glycol dimethyl ether): 63 parts by weight Mixing to obtain a light-shielding colored composition Using the obtained light-shielding colored composition, a pixel-partitioned light-shielding portion and a frame portion were formed by photolithography.
Other than that, a color filter forming substrate was produced in the same manner as in Example 1.
-Black pigment dispersion: 39 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 42 parts by weight The carbon black (R-1060 manufactured by Colombian) has an average particle size of 30 nm. .
Similarly to Example 1, the width of the pixel-partitioning light-shielding portion in the display region 13S (same as the width of the low reflective film 13Mb) was 22 μm, and the aperture ratio was 60%.

(Comparative Example 2)
Using the same light-shielding resin light-shielding film forming composition (light-shielding colored composition) as in Example 1, the pixel-partitioning light-shielding part and the frame part were formed by photolithography.
Other than that, a color filter forming substrate was produced in the same manner as in Example 1.
Similarly to Example 1, the width of the pixel-partitioning light-shielding portion in the display region 13S (same as the width of the low reflective film 13Mb) was 22 μm, and the aperture ratio was 60%.

(Comparative Example 3)
In Example 1, the material of the black pigment dispersion was changed as follows to obtain a black pigment dispersion.
-Titanium black (Mitsubishi Chemical Co., Ltd.): 60 parts by weight-Polymer dispersion (Big Chemie Japan Co., Ltd. Disperbyk 163): 7 parts by weight-Solvent (diethylene glycol dimethyl ether): 33 parts by weight Thus, a light-shielding coloring composition was obtained.
Using the obtained light-shielding coloring composition, a pixel-segmenting light-shielding portion and a frame portion were formed by photolithography.
Other than that, a color filter forming substrate was produced in the same manner as in Example 1.
-Black pigment dispersion: 40 parts by weight-Curable resin composition A: 22 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight As in Example 1, the width of the light-shielding part for pixel division in the display area 13S (low reflection film) The same as the width of 13 Mb) was 22 μm, and the aperture ratio was 60.

The color filter-formed substrates prepared as in Examples 1 to 3 and Comparative Examples 1 to 3 are referred to as Samples S1 to S6, respectively, and are opposite to the side on which the light shielding portion is formed for each sample. The spectral reflectance is measured in the wavelength range of 320 nm to 740 nm by the SCE measurement method and SCI measurement using the spectrocolorimeter shown in FIG. The chromaticity (x, y) and brightness Y of the frame portion in the XYZ color system of JIS Z8701 in the D65 light source were obtained as shown in Table 1.
Note that CM-2500d manufactured by Konica Minolta Co., Ltd. was used as the spectrocolorimeter.
<Measurement conditions: microspectrophotometer>
Measuring instrument: OLYMPUS Co., Ltd., microspectrophotometric device Illumination range: circular with a diameter of 60 μm <Measuring condition: spectrophotometer>
Measuring instrument: Konica Minolta Co., Ltd., spectral colorimeter "CM-2500d"
Light reception condition: d / 8 ° (JIS Z8722 condition c)
First irradiation area: circular with measurement diameter = 11 mm diameter Second irradiation area: same measurement diameter as first irradiation area = circular with diameter 11 mm Measurement area: circular with 8 mm in the irradiation area (the center of gravity is the irradiation area, (Same as a circle with a diameter of 11 mm)

And about the color filter formation board | substrate (S1-S6) produced like the said Examples 1- Example 3 and the comparative examples 1- Comparative example 3, the pass / fail judgment of visibility is performed about the black tightening of a frame part. It was.
The determination results are shown in Table 1.

In addition, the visibility of the black tightening of the frame part is evaluated by irradiating GENTOS SuperFire X (manufactured by Saint-Germain Co., Ltd.) as a light source from the side of the glass substrate opposite to the side where the light-shielding part is formed. The scattered light is visually observed, and the black tightening of the frame portion is judged by visual visibility, and those that are considered good are indicated by ◯ and those that are not good are indicated by ×.
The light source is not limited to the above, and any light source can be used as long as the same result as that obtained under sunlight is obtained.
The brightness Y in the XYZ color system determined from the spectral characteristics of the reflectance obtained by measuring the light-shielding frame portion from the glass surface side with a spectrocolorimeter using the SCE method (diffuse reflection measurement method) is 0. .01 or less and the brightness Y in the XYZ color system obtained from the spectral characteristics of the reflectance obtained by measuring with the SCI method is 5.5 or less. Judged to be good.
In Comparative Example 2, the value of brightness Y in the XYZ color system obtained from the spectral characteristics of reflectance obtained by measurement using the SCE method is 0.01. Since the value of the brightness Y in the XYZ color system obtained from the spectral characteristics of the reflectance obtained is greater than 5.5, black tightening is poor in visual evaluation.

10 Color filter forming substrate 11 Base material (transparent substrate)
12 Frame portion 13 Colored portion 13R Red colored layer 13G Green colored layer 13B Blue colored layer 13M Pixel division light shielding portion (also referred to as black matrix)
13Ma Resin light shielding film 13Mb Low reflection film 13MC1 Layer of chromium oxynitride film (also referred to as low reflection layer)
13MC2 Pure chrome layer 13MD1 Low reflective layer 13MD2 Low reflective layer 13MD3 Pure chrome layer 13S Display region 13A (for measurement) Film part 14 Protective tank (also referred to as overcoat layer or OC layer)
15 Light shielding layer 15a Chrome film 15b Chromium oxynitride film 20 Refractive index adjusting oil 30 Black plate 40 Detector 45 Inspection light 61 Integrating sphere 62 Light source 62L Incident light 63 Detector 63L Detection light 64 Trap θ Angle 110 Color filter formation Substrate 110a (frame portion of color filter forming substrate)
111 Base material (transparent substrate)
112 Frame portion 113 Color layer 113R Red color layer 113G Green color layer 113B Blue color layer 113M Pixel division light-shielding portion (also referred to as black matrix)
113S Display area 114 Protection tank (also referred to as overcoat layer or OC layer)
130 cover glass 130a (cover glass) frame part 140 touch panel 150 TFT substrate

Claims (7)

On one side of the base material made of a transparent substrate, a colored layer for each color filter is arranged in a region divided by the pixel-dividing light-shielding portion to form a display region. A color filter forming substrate having a light-shielding frame portion as a display area, and the other surface side which is not one surface side of the base material being the outermost side (observer side) on the display portion of the mobile electronic device A color filter forming substrate to be used, wherein a low-reflection film mainly composed of chromium having a low-reflectivity on the base material side in order from the base material side to the light-shielding portion for pixel division or the frame portion, and an optical and a light shielding resin light shielding film of black that ensures concentration, have a laminated layered structure,
The color filter forming substrate , wherein a width of the black resin light-shielding film of the laminated structure is larger than a width of the low reflection film .   2. The color filter forming substrate according to claim 1, wherein the black resin light-shielding film contains carbon black dispersed in the resin. 3. The color filter forming substrate according to claim 1 , wherein the frame portion includes, in order from the base material side, the low-reflection film, the black resin light-shielding film, and the color filter-use substrate. A color filter forming substrate having a laminated structure in which a colored layer and a black resin light-shielding film are laminated. It is a color filter formation board | substrate of any one of Claim 1 thru | or 2 , Comprising: The said frame part is the colored layer for the said color filter, the said low reflection film, and the said black reflective film in order from the said base material side. A color filter forming substrate having a laminated structure in which resin light shielding films are laminated. A color filter formation substrate of claim 4, the pixel-division-shielding portion of the display region, from the substrate side, in order, a colored layer for the color filter, the low reflective layer, the black A color filter forming substrate having a laminated structure in which resin light shielding films are laminated. 6. A display device, wherein a display unit is formed using the color filter forming substrate according to claim 1 . 6. The method for producing a color filter forming substrate according to claim 1 , wherein a low-reflection film mainly composed of chromium having the base material side as a low-reflection layer is sequentially formed on the entire surface. Forming a film on the low-reflection film formed by the film forming step, using the photosensitive composition for forming the black light-shielding resin light-shielding film, and patterning by a photolithography method, Perform a resin light-shielding film pattern forming process to pattern a black light-shielding resin light-shielding film and an etching process to remove the exposed low-reflection film by etching. A method for producing a color filter forming substrate, comprising: obtaining a laminated structure in which a low-reflective film containing chromium as a main component and a black light-shielding resin light-shielding film capable of ensuring optical density are laminated.

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