JP5263436B2 - Color filter for transflective horizontal electric field drive type liquid crystal display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high-quality color filter for transflective in-plane switching liquid crystal display device capable of preventing such malfunction that fine particles exposed on the surface of a tapered part in a light scattering layer are stripped from occurring upon rubbing. <P>SOLUTION: The color filter for transflective in-plane switching liquid crystal display device includes a transparent substrate and a colored layer which is formed on the transparent substrate and has an opening part formed therein, wherein a region where the colored layer having the opening part is superimposed on the transparent substrate is used as a region for reflection light and a region where the colored layer having no opening part is superimposed on the transparent substrate is used as a region for transmission light, wherein a light scattering layer made by dispersing the fine particles into the transparent resin is formed on the colored layer in the region for reflection light, and a cover layer with which the tapered part is covered is formed on the tapered part of the light scattering layer, wherein no electrode is formed on the light scattering layer. <P>COPYRIGHT: (C)2013,JPO&amp;INPIT

Description

  The present invention relates to a transflective horizontal electric field drive type liquid crystal display device capable of reducing manufacturing problems such as mixing of foreign substances when manufacturing a horizontal electrolysis drive type transflective liquid crystal display device such as an IPS method. The present invention relates to a color filter and a method for manufacturing the same.

  In recent years, a transflective liquid crystal display device utilizing external light reflection and backlight transmitted light has been developed as a liquid crystal display device. The transflective liquid crystal display device uses external light to display. The conventional reflective color liquid crystal display device is advantageous in that it also has a backlight and can perform display (transmission display) using the backlight even when the surroundings are dark. However, in the color filter used in such a transflective liquid crystal display device, since the external light passes through the colored layer twice as incident light and reflected light, the color of the reflected light region where display is performed by the external light. In some cases, there is a problem that the characteristics and the color characteristics of the transmitted light region where the display is performed by the backlight light are different.

  In order to solve such a problem, for example, a method of forming a thick colored layer in the transmitted light region and forming a thin colored layer in the reflected light region, etc. A method of forming a layer has been adopted. However, in this method, when forming a color filter having colored layers of three colors (red (R), green (G), and blue (B)), for example, a photolithography method or the like must be repeated six times. The process was complicated.

  Therefore, for example, a method has been proposed in which the thickness of the colored layer in the transmitted light region and the reflected light region is uniform, and a portion where the colored layer is not formed in the reflected light region, that is, a hole is provided. (See Patent Document 1). According to this method, the area of the colored layer in the reflected light region can be adjusted by adjusting the area of the hole in the reflected light region, and the color characteristics of the reflected light region can be adjusted. Become.

  On the other hand, in many cases, a color filter for a transflective liquid crystal display device is provided with a light scattering layer in which, for example, fine particles are dispersed only in a reflected light region (see Patent Document 2). By forming a light scattering layer only in the reflected light region, the problem is that the metallic reflector provided in the reflected light region causes a mirror reflection and the light source is reflected on the reflector, making it difficult to see the display. Because it becomes possible to do. In addition, there are other advantages in that the viewing angle in the reflected light region can be increased, brightness can be improved, and high contrast can be realized.

However, when a light scattering layer containing such fine particles is formed by a photolithography method, ultraviolet rays are usually irradiated to areas that should not be exposed by the diffraction of the ultraviolet rays irradiated during exposure. End up. Since the region is a region that is insufficiently exposed, the edge portion of the formed light scattering layer is formed in a tapered shape. The taper-shaped portion has a thin film thickness, so that the fine particles are easily exposed on the surface, and the problem that the exposed fine particles are peeled off and become foreign matters at the time of subsequent rubbing occurs. Had.
In addition, since the resin is not completely cured at a portion exposed by ultraviolet diffraction or the like, there is a problem that fine particles are more easily peeled off during rubbing.

JP 2002-333622 A JP 2004-233399 A

  The present invention has been made in view of the above-described problems, and can prevent a problem that fine particles exposed on the surface of the tapered portion of the light scattering layer are peeled off during rubbing. The main object is to provide a color filter for an electric field drive type liquid crystal display device.

  The present invention includes a transparent substrate and a colored layer formed on the transparent substrate and having an opening, and the region where the transparent substrate and the colored layer having the opening are laminated. A color filter for a transflective horizontal electric field drive type liquid crystal display device, which is used as a region for reflected light and uses a region in which the transparent substrate and the colored layer having no opening are laminated as a region for transmitted light. In addition, a light scattering layer in which fine particles are dispersed in a transparent resin is formed on the colored layer in the reflected light region, and a coating layer that covers the tapered portion is formed on the tapered portion of the light scattering layer. A color filter for a transflective horizontal electric field drive type liquid crystal display device is provided.

In the present invention, since the tapered portion of the light scattering layer is covered with the coating layer, it is possible to prevent the fine particles exposed on the surface of the tapered portion of the light scattering layer from peeling off during the subsequent rubbing. . Therefore, it is possible to prevent manufacturing problems such as the generation of foreign matter, and a high-quality color filter for a transflective horizontal electric field drive type liquid crystal display device can be obtained.
Further, according to the present invention, it is possible to adjust the cell gap by using the film thickness of the light scattering layer by forming the light scattering layer in the reflected light region.

  In the above invention, the coating layer may be formed over the entire area of the reflected light region and the transmitted light region. Thereby, the surface of the colored layer in the transmitted light region is also protected, so that when the transflective horizontal electric field driving type liquid crystal display device is formed, the eluate from the colored layer surface can be prevented. It is also possible to ensure the flatness of each of the reflected light region and the transmitted light region.

  Moreover, in the said invention, the said coating layer may be formed only in the edge part containing the taper part of the said light-scattering layer, and the flat part between the said edge parts. This is because the flatness of the reflected light region can be ensured.

  Furthermore, in the said invention, the said coating layer may be formed only in the edge part containing the taper part of the said light-scattering layer. When the coating layer is formed only on the edge portion, for example, the coating layer can be used in combination with a black matrix, and the number of manufacturing steps can be reduced.

  In the present invention, an overcoat layer may be formed between the colored layer and the light scattering layer. Thereby, it is possible to protect the colored layers in the reflected light region and the transmitted light region and to ensure flatness.

  Furthermore, in the present invention, the light scattering layer may be formed directly on the colored layer having the opening. Thereby, the opening of the colored layer is filled with the light scattering layer, and a deeper light scattering layer can be formed, and thus a higher scattering effect is exhibited.

  Further, the present invention includes a transparent substrate and a colored layer formed on the transparent substrate and having an opening, and the transparent substrate and the colored layer having the opening are stacked. A color filter for a transflective horizontal electric field drive system liquid crystal display device using a region where the transparent substrate and the colored layer having no opening are laminated as a region for transmitted light, using the region as a region for reflected light A light scattering layer formed by dispersing fine particles in a transparent resin is formed on the colored layer in the reflected light region, and exposed fine particles are formed on the surface of the tapered portion of the light scattering layer. The present invention provides a color filter for a transflective horizontal electric field drive type liquid crystal display device characterized by being absent.

According to the present invention, since there are no exposed fine particles on the surface of the tapered portion of the light scattering layer, there is no risk that the fine particles will peel off from the surface of the tapered portion and cause foreign matters when rubbing. A color filter for a transflective horizontal electric field drive type liquid crystal display device can be obtained.
Further, according to the present invention, it is possible to further provide a cell gap adjusting function to the light scattering layer by forming the light scattering layer in the reflected light region.

  Furthermore, the present invention provides a transparent substrate, a colored layer formed on the transparent substrate and having an opening, and a light formed by patterning on the colored layer and having fine particles dispersed in the transparent resin. A region where the transparent substrate, the colored layer having the opening, and the light scattering layer are stacked is used as a reflected light region, and the transparent substrate and the opening are provided. Method of manufacturing a color filter for a transflective horizontal electric field drive type liquid crystal display device for manufacturing a color filter for a transflective horizontal electric field drive method liquid crystal display device using a region where the colored layer is not laminated as a transmitted light region A light scattering layer forming step of forming a light scattering layer on the colored layer in the reflected light region by a photolithography method, wherein the light scattering layer forming step includes a step of forming a tapered portion of the light scattering layer. Exposed on the surface Microparticles, to provide a semi-transmissive-type lateral electric field drive system manufacturing method of a color filter for a liquid crystal display device which is a process comprising the reinforcing development step of removing by enhancing development.

  In the present invention, by performing the strengthening development step, it is possible to make the fine particles exposed on the surface of the tapered portion of the light scattering layer not exist, so that the fine particles are peeled off from the surface of the tapered portion during rubbing. Can be without. Therefore, it is possible to manufacture a high-quality transflective horizontal electric field drive type liquid crystal display color filter without causing problems such as contamination of foreign matters caused by the fine particles that have been peeled off.

  According to the present invention, a color filter for a high-quality transflective horizontal electric field drive type liquid crystal display device capable of preventing the problem of peeling of exposed fine particles existing in the tapered portion of the light scattering layer during rubbing. There is an effect that it can be.

It is a schematic sectional drawing which shows an example of the color filter for transflective horizontal electric field drive system liquid crystal display devices of this invention. It is a schematic sectional drawing which shows the other example of the color filter for transflective horizontal type electric field drive system liquid crystal display devices of this invention. It is a schematic sectional drawing which shows the other example of the color filter for transflective horizontal type electric field drive system liquid crystal display devices of this invention. It is a schematic sectional drawing which shows the other example of the color filter for transflective horizontal type electric field drive system liquid crystal display devices of this invention. It is a top view for demonstrating the color filter for transflective type horizontal electric field drive system liquid crystal display devices formed in the Example in this invention. It is a top view for demonstrating the color filter for transflective type horizontal electric field drive system liquid crystal display devices formed in the Example in this invention.

  The present invention relates to a color filter for a transflective horizontal electric field drive type liquid crystal display device (hereinafter sometimes simply referred to as a color filter) and a method for manufacturing the same. Hereinafter, these will be described.

A. First, a color filter for a transflective horizontal electric field drive type liquid crystal display device according to the present invention will be described. There are two embodiments of the color filter for a transflective horizontal electric field drive type liquid crystal display device according to the present invention due to the difference in the configuration.
Hereinafter, each embodiment of the color filter for a transflective horizontal electric field drive type liquid crystal display device of the present invention will be described.

1. First Embodiment A first embodiment of a color filter for a transflective horizontal electric field drive type liquid crystal display device according to the present invention comprises a transparent substrate and a colored layer formed on the transparent substrate and having an opening. The transparent substrate and the colored layer having the opening are laminated as a reflected light region, and the transparent substrate and the colored layer not having the opening are laminated. A color filter for a transflective horizontal electric field drive type liquid crystal display device using a region as a region for transmitted light, wherein a light scattering layer in which fine particles are dispersed in a transparent resin on the colored layer in the region for reflected light And a coating layer for covering the tapered portion is formed on the tapered portion of the light scattering layer.

  FIG. 1 is a schematic cross-sectional view showing an example of a color filter for a transflective horizontal electric field drive type liquid crystal display device according to this embodiment. The color filter for a transflective horizontal electric field drive type liquid crystal display device according to this embodiment is divided into two regions, a reflected light region r and a transmitted light region t, as shown in FIG. In the light region r, a transparent substrate 1, a colored layer 2 having an opening a, and a light scattering layer 3 in which fine particles X are dispersed in a transparent resin are laminated, and in the transmitted light region t The transparent substrate 1 and the colored layer 2 not having the opening a are laminated, and the tapered portion b of the light scattering layer 3 is covered over the entire area of the reflected light region r and the transmitted light region t. A covering layer 4 is formed. A black matrix 5 is usually formed on the transparent substrate 1.

  In general, when a light scattering layer is formed in a reflected light region of a color filter for a transflective horizontal electric field drive type liquid crystal display device, a photolithography method is often used. However, the influence of diffraction of ultraviolet rays at the time of exposure is used. Thus, the edge portion is formed in a tapered shape. The tapered portion has a thin film thickness, and the fine particles dispersed in the light scattering layer are easily exposed on the surface. Therefore, there is a problem that the fine particles are easily peeled off during rubbing. Further, since this tapered portion is not a portion that should be exposed originally, it is a portion where the exposure is insufficient, and therefore, there has been a problem that exposed fine particles are more easily peeled off during rubbing. .

  On the other hand, in this embodiment, since the tapered portion of the light scattering layer is covered and protected by the coating layer, it is possible to prevent the fine particles exposed on the surface of the tapered portion of the light scattering layer from peeling off during rubbing. It becomes. Therefore, it is possible to prevent problems in the manufacturing process such as the generation of foreign matters, and a high-quality color filter for a transflective horizontal electric field drive system liquid crystal display device can be obtained.

  In this embodiment, by forming the light scattering layer only in the reflected light region, the cell gap can be adjusted simultaneously using the thickness of the light scattering layer. Therefore, it is not necessary to separately form a cell gap adjusting layer or the like in the reflected light region, and the manufacturing process can be simplified.

  The color filter of this embodiment is divided into three modes depending on the difference in the formation region of the coating layer. Each aspect will be described below.

(1) First Aspect In the first aspect of the color filter of the present embodiment, the coating layer is formed over the entire area of the reflected light region and the transmitted light region. As a result, the surface of the colored layer in the transmitted light region is protected together with the tapered portion of the light scattering layer. Therefore, when the transflective horizontal electric field drive type liquid crystal display device is formed, the elution from the colored layer surface is prevented. be able to. It is also possible to ensure the flatness of each of the reflected light region and the transmitted light region. In addition, as such a color filter of this aspect, a color filter as shown, for example in FIG. 1 can be mentioned.

  Here, in this embodiment, the light scattering layer may be formed immediately above the colored layer, and an overcoat layer may be formed between the light scattering layer and the colored layer. It is preferable that the layer is formed directly on the colored layer. Thereby, since the inside of the opening part which a colored layer has is filled with the light scattering layer, and the film thickness of the light scattering layer can be increased, the content of the fine particles contained in the light scattering layer is increased. This is because a high light scattering effect can be obtained.

Further, in this embodiment, the coating layer is formed over the entire area for the reflected light region and the transmitted light region, and as described above, the colored layer in the transmitted light region can be protected. There may be no need to provide an overcoat layer between the light scattering layer and the colored layer. That is, the coating layer also has a function as an overcoat layer.
Hereinafter, a color filter having a configuration in which a light scattering layer is formed immediately above a colored layer, which is a preferable configuration of this embodiment, will be described in detail for each member.

a. Coating Layer The coating layer used in this embodiment covers a tapered portion of the light scattering layer described later, and is formed over the entire area for the reflected light and the transmitted light.

  The film thickness of the coating layer used in this embodiment is not particularly limited as long as it can coat the fine particles on the surface of the tapered portion of the light scattering layer. Cells in the reflected light region and the transmitted light region are not limited. It is determined appropriately in consideration of a gap or the like. Therefore, the thickness of the coating layer in the reflected light region and the thickness of the coating layer in the transmitted light region may be different or the same.

  For example, the thickness of the coating layer in the reflected light region is preferably in the range of 0.2 μm to 2.0 μm, more preferably in the range of 0.4 μm to 1.5 μm, particularly 0.5 μm to 1. It is preferable to be in the range of 0 μm. For example, the film thickness of the coating layer in the transmitted light region is preferably in the range of 0.5 μm to 3.0 μm, and more preferably in the range of 0.5 μm to 2.0 μm, particularly 0.8 μm to 1 μm. It is preferable to be within the range of 5 μm.

  The material for forming the coating layer used in this embodiment is not particularly limited as long as it is a material capable of forming a transparent coating layer. For example, the coating layer is formed by a photolithography method. In this case, a transparent photosensitive resin or the like can be used. In this case, a photopolymerization initiator and various additives are usually used together with the photosensitive resin.

  The said photosensitive resin shows the monomer component and polymer component which can be polymerized by photopolymerization reaction. Such monomer component and polymer component may be the same as those conventionally used for forming a colored layer in a color filter.

  For example, the polymer components include ethylene-vinyl acetate copolymer, ethylene-vinyl chloride copolymer, ethylene vinyl copolymer, polystyrene, acrylonitrile-styrene copolymer, ABS resin, polymethacrylic acid resin, ethylene methacrylic acid resin , Polyvinyl chloride resin, chlorinated vinyl chloride, polyvinyl alcohol, polyethylene terephthalate, polybutylene terephthalate, polycarbonate, polyvinyl acetal, polyether ether ketone, polyether sulfone, polyphenylene sulfide, polyarylate, polyvinyl butyral, epoxy resin, phenoxy resin , Polyimide resins, polyamideimide resins, polyamic acid resins, polyetherimide resins, phenol resins, urea resins, and polymerizable monomers A certain methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, sec-butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, n -Pentyl (meth) acrylate, n-hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, n-decyl (meth) acrylate, styrene, α-methylstyrene, N-vinyl- 2-pyrrolidone, glycidyl (meth) acrylate, cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate One or more of the rate, dimer of acrylic acid, methacrylic acid, acrylic acid (for example, M-5600 manufactured by Toa Gosei Chemical Co., Ltd.), itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, these And a polymer or copolymer comprising at least one of acid anhydrides and the like. Moreover, although the polymer etc. which added the ethylenically unsaturated compound which has a glycidyl group or a hydroxyl group to said copolymer are mentioned, it is not limited to these.

  Among the above polymer components, from the viewpoint of compatibility with the monomer components used together, polymethyl methacrylate resin, polyethyl methacrylate resin, polymethyl methacrylate resin and polyethyl methacrylate resin copolymer Phenoxy resin, epoxy resin, polycarbonate resin, polystyrene resin, ethyl hydroxyethyl cellulose, cellulose triacetate and the like can be preferably used. Particularly preferably, polymethyl methacrylate resin, polyethyl methacrylate resin, polystyrene resin, methacrylic acid and styrene, glycidyl (meth) acrylate, cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, benzyl (meth) acrylate These two or more types of copolymers, phenoxy resins, epoxy resins, and modified products thereof can be used.

  Specific examples of monomer components include allyl (meth) acrylate, benzyl (meth) acrylate, butoxyethyl (meth) acrylate, butoxyethylene glycol (meth) acrylate, cyclohexyl (meth) acrylate, and dicyclopentanyl (meth) ) Acrylate, 2-ethylhexyl (meth) acrylate, glycerol (meth) acrylate, glycidyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, isobornyl (meth) acrylate, isodexyl (meth) ) Acrylate, isooctyl (meth) acrylate, lauryl (meth) acrylate, 2-methoxyethyl (meth) acrylate, methoxyethylene glycol (meth) acrylate, Enoxyethyl (meth) acrylate, stearyl (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,5-pentanediol di (meth) acrylate 1,6-hexanediol di (meth) acrylate, 1,3-propanediol (meth) acrylate, 1,4-cyclohexanediol di (meth) acrylate, 2,2-dimethylolpropane di (meth) acrylate, glycerol Di (meth) acrylate, tripropylene glycol di (meth) acrylate, glycerol tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, polyoxyethylated trimethylolpropane tri ( Acrylate), pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, triethylene glycol di (meth) acrylate, polyoxypropyltrimethylolpropane tri (meth) acrylate, butylene glycol di (meth) acrylate, 1 , 2,4-butanetriol tri (meth) acrylate, 2,2,4-trimethyl-1,3-pentanediol di (meth) acrylate, diallyl fumarate, 1,10-decanediol dimethyl (meth) acrylate, di Pentaerythritol hexa (meth) acrylate, γ-methacryloxypropyltrimethoxysilane, 1-vinyl-2-pyrrolidone, 2-hydroxyethylacryloyl phosphate, tetrahydrofurfuryl (meta Acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, 3-butanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, hydroxypivalic acid Ester neopentyl glycol di (meth) acrylate, phenol-ethylene oxide modified (meth) acrylate, phenol-propylene oxide modified (meth) acrylate, N-vinyl-2-pyrrolidone, bisphenol A-ethylene oxide modified di (meth) acrylate, Pentaerythritol di (meth) acrylate monostearate, tetraethylene glycol di (meth) acrylate, polypropylene glycol di (meth) a Relate, trimethylolpropane propylene oxide modified tri (meth) acrylate, isocyanuric acid ethylene oxide modified tri (meth) acrylate, trimethylolpropane ethylene oxide modified tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipenta Erythritol hexa (meth) acrylate, pentaerythritol tetra (meth) acrylate, urethane (meth) acrylate oligomer in which (meth) acrylate group is bonded to oligomer having polyurethane structure, (meth) acrylate group is bonded to oligomer having polyester structure Polyester (meth) acrylate oligomer and epoxy (meth) in which (meth) acrylate group is bonded to oligomer having epoxy group Examples include acrylate oligomers, polyurethane (meth) acrylates having (meth) acrylate groups, polyester (meth) acrylates having (meth) acrylate groups, and epoxy (meth) acrylate resins having (meth) acrylate groups.

  In this embodiment, (meth) acrylate means either an acrylate group or a methacrylate group.

  As the polymerization initiator, acetophenone series, benzophenone series, Michler ketone series, benzyl series, benzoin series, benzoin ether series, benzyl dimethyl ketal, benzoin benzoate series, carbonyl compounds such as α-acyloxime ester, tetramethylthiuram monosulfide, Examples thereof include sulfur compounds such as thioxanthones, and phosphorus compounds such as 2,4,6-trimethylbenzoyldiphenylphosphinoxide.

  Examples of the various additives include sensitizers, antistatic agents, storage stabilizers, antifoaming agents, polymerization inhibitors, plasticizers, leveling agents, adhesion assistants, various adjusting agents, surfactants, and the like. These can be used as needed. These various additives can be the same as those used when forming a colored layer in a general color filter.

  As a method for forming a coating layer used in this embodiment, for example, when forming by a photolithography method, a method of applying a coating layer forming coating solution containing the photosensitive resin, and performing exposure, development, and baking, etc. Can be mentioned.

b. Light-scattering layer The light-scattering layer used in this embodiment is formed by dispersing fine particles in a transparent resin, and is formed on a colored layer having an opening in a region for reflected light to be described later. Moreover, the taper part of the said light-scattering layer is coat | covered with the coating layer mentioned above. Here, the taper portion of the light scattering layer in this embodiment is a portion where the film thickness is 0.8 or less when the average film thickness of the central portion of the light scattering layer is 1. Since the part where the film thickness of the light scattering layer is not more than the above value is easily exposed to fine particles on the surface and is considered to be insufficiently cured due to insufficient exposure, it is assumed that the fine particles are easily peeled off. It is.

  The fine particles used in the light scattering layer of the present embodiment are not particularly limited as long as the refractive index is different from that of the transparent resin described later and has transparency. For example, inorganic substances such as silicon oxide and aluminum oxide, Organic substances such as acrylic resins, divinylbenzene resins, benzoguanamine resins, styrene resins, melamine resins, acrylic-styrene resins, polycarbonate resins, polyethylene resins, polyvinyl chloride resins, polymethyl methacrylate resins Alternatively, fine particles such as a mixture of two or more of these may be mentioned.

  In this aspect, among the above-mentioned, melamine resin, benzoguanamine resin, polymethyl methacrylate resin, and mixed resins and copolymers thereof are preferable. This is because it has transparency capable of improving the total light transmittance and the diffuse light transmittance.

  The average particle size of the fine particles used in the light scattering layer of this embodiment is preferably in the range of 0.4 μm to 2 μm, and more preferably in the range of 0.8 μm to 1.5 μm, particularly 1.0 μm to It is preferable to be in the range of 1.4 μm. This is because when the average particle size is within the above range, a high haze value can be achieved, and excellent light scattering characteristics can be obtained. In addition, if the average particle diameter of the fine particles is too large, the light scattering layer may not fit within the range of the film thickness. If the average particle diameter of the fine particles is too small, it is difficult to obtain a good scattering effect. .

  Here, the average particle diameter is generally used to indicate the particle size of the particles, and in this embodiment, is a value measured by a laser method. The laser method is a method of measuring an average particle size, a particle size distribution, and the like by dispersing particles in a solvent and thinning and calculating scattered light obtained by applying a laser beam to the dispersion solvent. The average particle size is a value measured using a particle size analyzer Microtrac UPA Model-9230 manufactured by Leeds & Northrup as a particle size measuring device by a laser method.

  Further, the shape of the fine particles used in the light scattering layer is not particularly limited, but is preferably spherical.

  The transparent resin used for the light scattering layer is appropriately selected in consideration of the difference in refractive index from the fine particles, the transparency of the light scattering layer, the adhesion to the transparent substrate and the colored layer, and the like. Examples of such a transparent resin include a photosensitive resin used for the above-described coating layer.

  In this embodiment, the fine particles and the transparent resin have different refractive indexes, and the difference in refractive index is preferably in the range of 0.05 to 0.40. It is preferable to be within a range of 10 to 0.40, particularly within a range of 0.20 to 0.30. The difference in refractive index can be obtained by calculating from the literature values of the fine particles to be used and the transparent resin.

  Further, the content of the fine particles in the light scattering layer is not particularly limited as long as it is an amount capable of scattering light, and specifically, is in the range of 5% by mass to 30% by mass. In particular, it is preferable to be in the range of 10% by mass to 25% by mass, particularly in the range of 15% by mass to 20% by mass. This is because if the content of the fine particles is too small, it may be difficult to obtain the light scattering effect. Moreover, it is because there exists a possibility that it may become difficult to maintain the intensity | strength of a light-scattering layer when there is too much content of microparticles | fine-particles.

  Further, the film thickness of the light scattering layer used in this embodiment is not particularly limited as long as it can obtain the light scattering effect, but it is not limited to the colored layer in the region where the opening is not formed. Specifically, the thickness of the light scattering layer formed in the above is preferably in the range of 0.5 μm to 4.0 μm, more preferably in the range of 1.0 μm to 2.5 μm, Specifically, the film thickness of the formed light scattering layer is preferably in the range of 1.5 μm to 6.0 μm, and more preferably in the range of 3.5 μm to 4.5 μm.

  The light scattering layer used in this embodiment can be formed by a photolithography method using, for example, a coating liquid for forming a light scattering layer containing the fine particles and the transparent resin. Specifically, the light scattering layer forming coating solution is applied, pattern exposure is performed through a photomask, and then development and baking are performed.

c. Colored layer The colored layer used in this embodiment is formed on a transparent substrate, which will be described later, and has an opening in the reflected light region and no opening in the transmitted light region.

  The ratio of the formation area of the opening is appropriately determined so that the colored layer in the reflected light region exhibits a desired color characteristic, and specifically, with respect to the entire colored layer in the reflected light region. It is about in the range of 10% to 90%, preferably in the range of 35% to 65%.

  Moreover, as the shape of the opening, the shape of the opening formed in a general coloring layer is used, and examples thereof include a stripe shape and a dot shape.

  Moreover, the colored layer used in this embodiment is usually formed of three colors of red (R), green (G), and blue (B). The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set.

  The thickness of the colored layer used in this embodiment is appropriately selected depending on the type of the colored layer and the like, but is usually in the range of 1.0 μm to 2.5 μm, particularly 1.5 μm to 2. It is preferable to be in the range of 0 μm. Note that the thickness of the colored layer referred to here is the thickness of the colored layer in a flat region where no opening is formed.

  The colored layer can be formed by a photolithography method using a general pigment dispersion method. Specifically, a pattern in which openings are formed by applying a pigment-dispersed resist in which an organic pigment or an inorganic pigment is dispersed on a transparent substrate, pattern exposure through a photomask, development and baking. A colored layer is formed.

d. Transparent substrate The transparent substrate used in this embodiment is not particularly limited as long as it is capable of forming the colored layer and is transparent to visible light, and is a general color for a transflective liquid crystal display device. It can be the same as the transparent substrate used for the filter.

  Specific examples of the transparent substrate include a non-flexible transparent rigid material such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plate, or a flexible resin film or optical resin plate. The transparent flexible material etc. which have are mentioned.

e. Black matrix In this embodiment, a black matrix is usually formed between the colored patterns on the transparent substrate. Such a black matrix can be formed of a light shielding resin or a metal such as chromium.

f. Others In this embodiment, an alignment film may be formed on the coating layer. Note that the material of the alignment film can be the same as that of a general material, and the description thereof is omitted here.

(2) Second Aspect In the second aspect of the color filter of the present embodiment, the coating layer is formed only on the edge part including the tapered part of the light scattering layer and the flat part between the edge parts. It is what. Thereby, it is possible to secure the flatness of the reflected light region as well as protecting the tapered portion of the light scattering layer. For example, as shown in FIG. 2, the color filter of this embodiment is formed only in the edge portion c including the tapered portion b of the light scattering layer 3 and the flat portion d between the edge portions c. It is what.

In this embodiment, a light scattering layer may be formed immediately above the colored layer, and an overcoat layer 6 is formed between the colored layer 2 and the light scattering layer 3 as shown in FIG. Also good. When a light scattering layer is formed immediately above the colored layer, the light scattering layer is also formed in the opening of the colored layer, and the thickness of the light scattering layer in that portion can be increased. The content of fine particles contained in the layer is increased, and a higher light scattering function can be imparted. However, in this case, since the colored layer in the transmitted light region is exposed, there is a possibility that the effluent from the colored layer may migrate into the liquid crystal. Therefore, in this embodiment, it is particularly preferable that an overcoat layer is formed between the colored layer and the light scattering layer. By forming the overcoat layer, it is possible to prevent contamination of the liquid crystal due to the elution from the colored layer surface in the transmitted light region, and further to flatten the colored layer in the transmitted light region and the reflected light region. Because it becomes.
Hereinafter, a color filter in which an overcoat layer is formed between a colored layer and a light scattering layer, which is a preferred configuration of this embodiment, will be described in detail for each member. Since the light scattering layer, the colored layer, the transparent substrate, and the black matrix used in this embodiment are the same as those in the first embodiment described above, description thereof is omitted here.

a. Covering layer The covering layer used in this embodiment covers the tapered portion of the light scattering layer, and is formed only on the edge portion including the tapered portion of the light scattering layer and the flat portion between the edge portions. Is. Here, the edge part of the light scattering layer is an end region including at least a tapered part.

  The film thickness of the coating layer used in this embodiment is appropriately determined in consideration of the cell gap between the reflected light region and the transmitted light region. For example, the thickness of the coating layer on the flat portion of the light scattering layer The film thickness is preferably in the range of 0.3 μm to 2.0 μm, and more preferably in the range of 0.5 μm to 1.0 μm.

  In addition, since the forming material and forming method of the coating layer used in this embodiment are the same as those described in the first embodiment, description thereof is omitted here.

b. Overcoat layer The overcoat layer used in this embodiment is formed between the colored layer and the light-scattering layer and has transparency.

  The material used for the overcoat layer is not particularly limited as long as it is generally used as a material for the overcoat layer. For example, acrylic resin, epoxy resin, vinyl ether resin, polyimide resin And propynyl-based resins.

  The film thickness of the overcoat layer is not particularly limited as long as the flatness of the colored layer in the transmitted light region can be secured and the colored layer can be protected. It can be the same as the overcoat layer provided in the color filter for the liquid crystal display device.

c. Others In this embodiment, an alignment film may be formed on the coating layer. Note that the material of the alignment film can be the same as that of a general material, and a description thereof will be omitted here.

(3) 3rd aspect The 3rd aspect in the color filter of this embodiment is that the coating layer is formed only in the edge part containing the taper part of a light-scattering layer. Since the coating layer is formed only on the edge portion, the taper portion of the light scattering layer is coated, and at the same time, for example, the coating layer can be used in combination with the black matrix. Therefore, it is necessary to separately form a black matrix. The number of manufacturing steps can be reduced. In such a color filter of this aspect, for example, as shown in FIG. 3, the coating layer 4 is formed only on the edge portion c including the tapered portion b of the light scattering layer 3.

In this embodiment, a light scattering layer may be formed immediately above the colored layer, and an overcoat layer 6 is formed between the colored layer 2 and the light scattering layer 3 as shown in FIG. Also good. When the light scattering layer is formed immediately above the colored layer, the light scattering layer is filled in the opening of the colored layer, and the thickness of the light scattering layer in that portion can be increased. It can be contained and higher light scattering can be obtained. However, in this case, since the surface of the colored layer is exposed in the transmitted light region, there is a possibility that the liquid crystal is contaminated by the effluent from the colored layer. Therefore, in this embodiment, it is particularly preferable that an overcoat layer is formed between the colored layer and the light scattering layer. By forming the overcoat layer, the colored layer surface of the transmitted light region can be protected, so that the liquid crystal is prevented from being contaminated, and further, the transmitted light region and the reflected light region are colored. This is because the flatness of the layer can be ensured.
Hereinafter, a color filter in which an overcoat layer is formed between a colored layer and a light scattering layer, which is a preferred configuration of this embodiment, will be described in detail for each member. Note that the light scattering layer, the colored layer, and the transparent substrate used in the present embodiment are the same as those in the first embodiment described above, and thus the description thereof is omitted here. Further, the overcoat layer can be the same as that of the second aspect described above, and therefore the description thereof is omitted here.

a. Covering layer The covering layer used in this embodiment covers the tapered portion of the light scattering layer, and is formed only on the edge portion including the tapered portion of the light scattering layer. Here, the edge part of the light scattering layer is an end region including at least a tapered part.

  The coating layer used in this embodiment may be formed of a resin having transparency, or may be formed of a resin having a light shielding property. In this embodiment, the coating layer is particularly formed of a resin having a light shielding property. It is preferable that Thereby, the coating layer can be used also as a black matrix, and the number of manufacturing steps can be reduced.

  Further, only the coating layer formed at the boundary between the reflected light region and the transmitted light region may have transparency, and the coating layer formed between the colored patterns may have light shielding properties.

  As the light-shielding resin, a resin obtained by adding a light-shielding material to a transparent resin is usually used. Examples of the light-shielding material include light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments. The transparent resin may be the same as the transparent resin material of the first aspect described above. Further, as the light-shielding resin, a material used for forming the black matrix may be used as it is.

  In addition, the film thickness of the coating layer used in this embodiment is not particularly limited as long as it can coat the fine particles exposed on the surface of the tapered portion of the light scattering layer. For example, the surface of the overcoat layer The maximum film thickness from the surface of the coating layer to the surface of the coating layer is preferably in the range of 1.5 μm to 5.0 μm, more preferably in the range of 2.0 μm to 4.0 μm, particularly in the range of 2.5 μm to 3.5 μm. It is preferable that

b. Others In this embodiment, an alignment film may be formed on the coating layer. Note that the material of the alignment film can be the same as that of a general material, and a description thereof will be omitted here.

2. Second Embodiment A second embodiment of the color filter for a transflective horizontal electric field drive type liquid crystal display device of the present invention comprises a transparent substrate and a colored layer formed on the transparent substrate and having an opening. The transparent substrate and the colored layer having the opening are laminated as a reflected light region, and the transparent substrate and the colored layer not having the opening are laminated. A color filter for a transflective horizontal electric field drive type liquid crystal display device using a region as a transmitted light region, wherein light scattering is performed by dispersing fine particles in a transparent resin on the colored layer in the reflected light region. A layer is formed, and exposed fine particles are not present on the surface of the tapered portion of the light scattering layer.

  FIG. 4 is a schematic cross-sectional view showing an example of a color filter for a transflective horizontal electric field drive type liquid crystal display device according to this embodiment. The color filter for a transflective horizontal electric field drive type liquid crystal display device according to this embodiment is divided into two regions, a reflected light region r and a transmitted light region t, as shown in FIG. In the light region r, a transparent substrate 1, a colored layer 2 in which an opening a is formed, an overcoat layer 6, and a light scattering layer 3 in which fine particles X are dispersed in a transparent resin are laminated, Further, in the transmitted light region t, a transparent substrate 1, a colored layer 2 having no opening a, and an overcoat layer 6 are laminated, and on the surface of the tapered portion b of the light scattering layer 3, The exposed fine particles X are not present. A black matrix 5 is usually formed on the transparent substrate 1.

  According to this embodiment, since there are no exposed fine particles on the surface of the tapered portion of the light scattering layer, when manufacturing a liquid crystal display device, the fine particles are peeled off from the surface of the tapered portion during rubbing. Thus, a color filter for a transflective horizontal electric field drive type liquid crystal display device can be obtained.

  Further, according to this embodiment, by forming the light scattering layer only in the reflected light region, the light scattering layer can be provided with a cell gap adjustment function. Therefore, a separate cell gap adjustment layer is formed. It can be unnecessary.

  Here, the absence of fine particles exposed on the surface of the tapered portion of the light scattering layer means that there are no fine particles exposed by 50% or more of the diameter of the fine particles.

  In the present embodiment, as means for eliminating the exposed fine particles on the surface of the tapered portion of the light scattering layer, for example, when the light scattering layer is formed by a photolithography method, the concentration of the developer at the time of development is used. It is possible to use means for enhancing development such as increasing the development time, increasing the development time, raising the temperature of the developer, or increasing the development pressure. The details of these means are described in the section of the strengthening development step in “B. Method for producing color filter for transflective horizontal electric field drive type liquid crystal display device” to be described later. .

  In this embodiment, a light scattering layer may be formed immediately above the colored layer. For example, as shown in FIG. 4, an overcoat layer 6 is formed between the colored layer 2 and the light scattering layer 3. May be. When a light scattering layer is formed immediately above the colored layer, the light scattering layer is also formed in the opening of the colored layer, and the thickness of the light scattering layer in that portion can be increased. The content of fine particles contained in the layer is increased, and a higher light scattering function can be imparted. In addition, when an overcoat layer is formed between the colored layer and the light scattering layer, the transmitted light region can be prevented from being contaminated by the effluent from the colored layer surface, and further, the transmitted light region and the reflective layer can be prevented. The colored layer in the light region can be flattened.

  The light scattering layer, overcoat layer, colored layer, transparent substrate and black matrix used in this embodiment are the same as those described in the first aspect of the first embodiment described above. Description of is omitted.

  In this embodiment, an alignment film may be formed on the light scattering layer. Since the material of the alignment film can be the same as that of a general material, description thereof is omitted here.

B. Next, a method for manufacturing a color filter for a transflective horizontal electric field drive type liquid crystal display device according to the present invention will be described. The method for producing a color filter for a transflective horizontal electric field drive type liquid crystal display device according to the present invention includes a transparent substrate, a colored layer formed on the transparent substrate and having an opening, and a pattern on the colored layer. A light scattering layer formed by dispersing fine particles in a transparent resin, and reflecting a region where the transparent substrate, the colored layer having the opening, and the light scattering layer are laminated A color filter for a transflective horizontal electric field drive type liquid crystal display device is manufactured that uses a region in which the transparent substrate and the colored layer having no opening are laminated as a region for transmitted light. A method for producing a color filter for a transflective horizontal electric field drive type liquid crystal display device, comprising a light scattering layer forming step of forming a light scattering layer on the colored layer in the reflected light region by a photolithography method, the above Scattering layer forming step, the fine particles exposed on the surface of the tapered portion of the light-scattering layer, is characterized in that a step comprising reinforcing development step of removing by enhancing development.

  In the present invention, fine particles exposed on the surface of the tapered portion of the light scattering layer are removed by performing a strengthening development process performed using development conditions that are strengthened compared to development conditions used in a general photolithography method. Therefore, the fine particles can be prevented from peeling off from the surface of the tapered portion during rubbing performed when manufacturing the liquid crystal display device. Therefore, it is possible to manufacture a high-quality transflective horizontal electric field drive type liquid crystal display device color filter without causing problems such as generation of foreign matters due to fine particles that have been peeled off during manufacturing. .

  The color filter produced according to the present invention may have a light scattering layer formed immediately above the colored layer. For example, as shown in FIG. 4, an overcoat is provided between the colored layer 2 and the light scattering layer 3. The layer 6 may be formed. When the light scattering layer is formed immediately above the colored layer, the thickness of the light scattering layer formed in the opening of the colored layer is increased, so that the content of fine particles in the entire light scattering layer is increased. A high light scattering function can be exhibited. In addition, in the case where an overcoat layer is formed between the colored layer and the light scattering layer, the surface of the colored layer is not exposed in the transmitted light region. Furthermore, it is possible to flatten the colored layers in the transmitted light region and the reflected light region.

By using the color filter manufacturing method of the present invention, it is possible to form the color filter of the second embodiment of the above-mentioned “A. Color filter for transflective horizontal electric field drive type liquid crystal display device”. .
Hereinafter, the manufacturing method of the color filter of this invention is demonstrated in detail.

1. Light scattering layer forming step The light scattering layer forming step used in the present invention is a step of forming a light scattering layer by photolithography on the overcoat layer in the reflected light region, and the tapered portion of the light scattering layer. This is a process including a strengthening development process for removing fine particles exposed on the surface of the film by strengthening development.

Such a light scattering layer forming step is not particularly limited as long as photolithography is used and includes the above-described enhanced development step, and other steps are appropriately included as necessary. be able to. For example, before the strengthening development step, a light scattering layer forming coating solution is applied on the overcoat layer to form a light scattering layer forming coating solution, and a light scattering layer formation. And an exposure step of exposing the coating film of the coating liquid through a photomask, and a baking step of baking the light scattering layer after the above-described strengthening development step.
Hereafter, each process used for this invention is demonstrated in detail.

(1) Coating film forming process The coating film forming process used in the present invention is a general application of a light scattering layer forming coating solution containing a photosensitive resin and fine particles, such as spin coating or die coating. It can be set as the process of using the method etc. which apply | coat on an overcoat layer by a method. Moreover, you may pre-bake the apply | coated coating liquid for light-scattering layer formation as needed.

  In addition, about the photosensitive resin and microparticles | fine-particles used for this process, it is the same as that of what was described in the 1st aspect of 1st embodiment of "A. Color filter for transflective type horizontal electric field drive system liquid crystal display devices" mentioned above. Therefore, the description here is omitted.

(2) Exposure process The exposure process used for this invention can be set as the process exposed to pattern shape, for example using the method etc. which irradiate optical energy, such as an ultraviolet-ray, through a photomask. About the light energy irradiated by this process, the irradiation method of light energy, etc., it is determined according to the kind of the photosensitive resin contained in the coating liquid for forming the light scattering layer, and is a general color filter. It can be the same as when forming the light scattering layer.

(3) Reinforced development step The enhanced development step used in the present invention is a taper of the light scattering layer along with the removal of the removed portion corresponding to the exposure pattern by performing development using the enhanced development conditions after the exposure step. This is a step of removing fine particles exposed on the surface of the part.

  In this step, the development is not particularly limited as long as it is a method capable of removing fine particles exposed on the surface of the tapered portion of the light scattering layer. For example, the developer concentration is increased. And a method of increasing the developing time, increasing the temperature of the developer, and increasing the developing pressure. These methods can also be used in combination.

  When increasing the concentration of the developing solution, the specific concentration of the developing solution is appropriately selected according to the type of the developing solution. For example, when a KOH aqueous solution is used, 0.05% by mass to 0% is used. It is preferably within the range of 50% by mass, more preferably within the range of 0.10% by mass to 0.40% by mass, and particularly preferably within the range of 0.10% by mass to 0.20% by mass. This is because if the concentration of the developer is too low, it may be difficult to remove the fine particles from the surface of the tapered portion of the light scattering layer. Moreover, if the concentration of the developer is too high, not only the fine particles on the surface of the tapered portion of the light scattering layer but also the transparent resin on the surface of the tapered portion, the fine particles on the flat portion, etc. may be removed.

  When the development time is lengthened, the specific development time is appropriately selected according to the type of the developer, but is preferably in the range of 30 seconds to 150 seconds, for example, 60 seconds to 120 seconds. It is preferably within the range of seconds, particularly within the range of 80 seconds to 100 seconds. This is because if the development time is too short, exposed fine particles may remain on the surface of the tapered portion of the light scattering layer. Further, if the development time is too long, there is a possibility that the removal of the portion to be left may be performed.

  Furthermore, when raising the temperature of a developing solution, as a specific temperature, the inside of the range of 23 to 35 degreeC is preferable, and the inside of the range of 25 to 30 degreeC is especially preferable. This is because if the temperature is too low, removal of fine particles exposed on the surface of the tapered portion of the light scattering layer may be insufficient. In addition, if the temperature is too high, there is a possibility that portions other than the purpose of the light scattering layer may be removed.

Furthermore, when increasing the development pressure, specific ^pressure, preferably in the range of ^{1.5kgf / cm 2 ~4.0kgf / cm 2} , particularly 2.0kgf ^/ cm ² ~3.0kgf ^/ cm 2 Within the range of is preferable. If the development pressure is too low, it is difficult to remove the exposed fine particles on the surface of the tapered portion of the light scattering layer, and problems during rubbing cannot be avoided. Further, if the development pressure is too high, the transparent resin in the portion that should remain in the light scattering layer may be removed.

  The light scattering layer obtained by this step can be the same as that described in the second embodiment of the above-mentioned “A. Color filter for transflective horizontal electric field drive type liquid crystal display device”. The description here is omitted.

(4) Firing step The firing step used in the present invention is a step of firing the light-scattering layer after the above-described strengthening development step. As firing conditions, a general color filter for a transflective liquid crystal display device is used. The conditions can be the same as the post-baking (firing) conditions in the manufacturing method.

2. Other Steps The method for producing a color filter for a transflective horizontal electric field drive type liquid crystal display device of the present invention may have other steps as necessary before and after the light scattering layer forming step.

Other processes include, for example, a black matrix forming process for forming a black matrix on a transparent substrate, a colored layer forming process for forming a colored layer on the transparent substrate and the black matrix, and a columnar spacer for forming a columnar spacer at a predetermined position. Examples of the forming process include an alignment film forming process for forming an alignment film on the outermost surface of the color filter. Moreover, when forming an overcoat layer, there may be a step of forming an overcoat layer on the colored layer.
Each of these steps can be the same as that in the manufacture of a general color filter for a transflective liquid crystal display device of a horizontal electric field driving method, and the description thereof is omitted here.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  The following examples illustrate the present invention more specifically.

[Example 1]
(Formation of black matrix)
As a transparent substrate, a glass substrate (Corning Corporation 1317 glass) having a size of 300 mm × 400 mm and a thickness of 0.7 mm was prepared. This transparent substrate is washed according to a conventional method, a photosensitive resist (DN83 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is applied on the transparent substrate, exposed through a predetermined mask, then developed and baked, and FIG. As shown, a lattice-shaped resin black matrix having an aperture size of 35 × 120 μm (e × f) of one pixel was formed. The film thickness of the black matrix was 1.3 μm, the line width was 15 μm (width indicated by g in FIG. 5), and 30 μm (width indicated by h in FIG. 5).

(Formation of red colored layer)
On the transparent substrate and the black matrix, a coating solution for forming a colored layer (negative photosensitive resin composition) for the red colored layer having the following composition was applied by a spin coating method. Subsequently, exposure and development were performed using the red pattern photomask. Thereafter, a red colored layer having a film thickness of 1.8 μm and an opening line width of 30 μm (width indicated by i in FIG. 5) was formed by firing.

<Red colored layer forming coating solution>
・ Red pigment (Chromophthal red A2B manufactured by Ciba Specialty Chemicals) ・ ・ ・ 4.8 parts by weight ・ Yellow pigment (Pariotor Yellow D1819 manufactured by BASF) ・ 1.2 parts by weight ・ Dispersant (Bic Chemie) Dispersic 161) ... 3.0 parts by weight / monomer (SR399 manufactured by Sartomer) ... 4.0 parts by weight / polymer I ... 5.0 parts by weight / Irgacure 907 (Ciba Specialty Chemicals) 1.4 parts by weight. (2,2'-bis (o-chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) ... 0. 6 parts by weight-propylene glycol monomethyl ether acetate 80.0 parts by weight * Polymer I is benzyl methacrylate: styrene: acrylic acid: 2-hydride A product obtained by adding 16.9 mol% of 2-methacryloyloxyethyl isocyanate to 100 mol% of a copolymer of xylethyl methacrylate = 15.6: 37.0: 30.5: 16.9 (molar ratio). The weight average molecular weight is 42500.

(Formation of green colored layer)
On the transparent substrate on which the red colored layer is formed, by using a coloring layer forming coating liquid (negative photosensitive resin composition) for the green colored layer having the following composition, by the same method as the red colored layer, A green colored layer having a thickness of 1.8 μm and an opening line width of 30 μm (width indicated by i in FIG. 5) was formed.

<Coating liquid for forming green colored layer>
Green pigment (Avisia Monastral Green θY-C) ... 4.2 parts by weight Yellow pigment (BASF Pariotor Yellow D1819) 1.8 parts by weight Dispersant (by Big Chemie Disper) BIC 161) ... 3.0 parts by weight / monomer (SR399, manufactured by Sartomer) ... 4.0 parts by weight / polymer I ... 5.0 parts by weight / Irgacure 907 (manufactured by Ciba Specialty Chemicals)・ ・ ・ 1.4 parts by weight ・ (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) ・ ・ ・ 0.6 weight Parts ・ Propylene glycol monomethyl ether acetate ・ ・ ・ 80.0 parts by weight

(Formation of blue colored layer)
Similar to the red colored layer on the transparent substrate on which the red colored layer and the green colored layer are formed, using a colored layer forming coating liquid (negative photosensitive resin composition) for the blue colored layer having the following composition: By this method, a blue colored layer having a film thickness of 1.8 μm and an opening line width of 30 μm (width indicated by i in FIG. 5) was formed.

<Blue colored layer forming coating solution>
-Blue pigment (BASF Heiogen Blue L6700F)-6.0 parts by weight-Pigment derivative (Avisia Solsperse 6000)-0.6 parts by weight-Dispersant (Bic Chemie Dispersic 161) 2.4 parts by weight / monomer (SR399, manufactured by Sartomer) ... 4.0 parts by weight, Polymer I ... 5.0 parts by weight, Irgacure 907 (Ciba Specialty Chemicals) ... 1.4 Parts by weight · (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole)... 0.6 parts by weight propylene glycol monomethyl ether Acetate: 80.0 parts by weight

(Formation of light scattering layer)
On the colored layer of each color, a light scattering layer forming coating liquid (negative photosensitive resin composition) having the following composition was applied by spin coating. Subsequently, exposure and development were performed using the photomask for the light scattering layer pattern. Then, the light-scattering layer was formed only in the area | region for reflected light by baking. In addition, the average film thickness of the center part of the light scattering layer formed in the opening of the colored layer is 4.2 μm, and the line width of the light scattering layer including the tapered part is 60 μm (width indicated by j in FIG. 5). It was.

<Light scattering layer coating solution>
・ Acrylic resin (Nippon Kayaku Co., Ltd. KAYARAD PET.30) 21 parts by weight Melamine beads (average particle size 1.3 μm) 5 parts by weight Irgacure 184 (Ciba Specialty Chemicals)・ ・ ・ 4 parts by weight ・ Polyethylene glycol monoethyl acetate ・ ・ ・ 70 parts by weight

(Formation of coating layer)
A coating liquid for forming a coating layer (negative photosensitive resin composition) having the following composition was applied onto the light scattering layer and the colored layer by a spin coating method. Then, it exposed and developed using the photomask for the said coating layer pattern. Thereafter, the coating layer was formed over the entire surface of the reflected light region and the transmitted light region by firing. The thickness of the coating layer in the reflected light region is 0.8 μm, the thickness of the coating layer in the transmitted light region is 1.2 μm, and the step between the reflected light region and the transmitted light region is 2.0 μm. there were.

<Coating layer forming coating solution>
· Methyl methacrylate-styrene-methacrylic acid copolymer ··· 42 parts by weight · Epicoat 180s70 (Mitsubishi Yuka Shell Co., Ltd.) ··· 18 parts by weight · Pentaerythritol pentaacrylate ··· 32 parts by weight · Irgacure 907 (Ciba Specialty Chemicals) ·· 8 parts by weight · Propylene glycol monomethyl ether acetate ··· 300 parts by weight

[Example 2]
(Formation of black matrix and colored layer)
In the same manner as in Example 1, as shown in FIG. 5, a grid-like black matrix and a colored layer were formed.

(Formation of overcoat layer)
On the colored layer, an overcoat layer-forming coating solution (negative photosensitive resin composition) having the following composition was applied by spin coating. Subsequently, exposure and development were performed using the photomask for the overcoat layer pattern. Thereafter, an overcoat layer having a thickness of 1.5 μm was formed on the entire surface of the colored layer by firing.

<Coating liquid for overcoat layer formation>
· Methyl methacrylate-styrene-methacrylic acid copolymer ··· 42 parts by weight · Epicoat 180s70 (Mitsubishi Yuka Shell Co., Ltd.) ··· 18 parts by weight · Pentaerythritol pentaacrylate ··· 32 parts by weight · Irgacure 907 (Ciba Specialty Chemicals) ·· 8 parts by weight · Propylene glycol monomethyl ether acetate ··· 300 parts by weight

<Formation of light scattering layer>
Using the same method as in Example 1, a light scattering layer having a thickness of 1.5 μm and a line width of 60 μm (width indicated by j in FIG. 5) was formed only in the reflected light region.

<Formation of coating layer>
Using the same method as in Example 1, only the edge portion including the tapered portion of the light scattering layer and the flat portion between the edge portions have a film thickness of 0.5 μm and the line width of 60 μm on the flat portion of the light scattering layer. A coating layer (width indicated by j in FIG. 5) was formed. The step between the reflected light region and the transmitted light region was 2.0 μm.

[Example 3]
<Formation of colored layer and overcoat layer>
After forming a colored layer having a line width of 30 μm (width indicated by i in FIG. 6) on the transparent substrate in the same manner as in Example 1 except that the black matrix was not formed, Example In the same manner as in 2, an overcoat layer was formed on the colored layer.

<Formation of light scattering layer>
Using the same method as in Example 1, a light scattering layer having a thickness of 2.0 μm and a line width of 60 μm (width indicated by j in FIG. 6) was formed only in the reflected light region.

<Formation of coating layer>
On the light scattering layer and the overcoat layer, the black matrix forming material (DN83 manufactured by Tokyo Ohka Kogyo Co., Ltd.) used in Example 1 was applied, exposed through a predetermined mask, and then developed and baked. A coating layer having a thickness of 3.0 μm was formed only on the edge portion including the tapered portion of the light scattering layer. Further, as shown in FIG. 6, the line width of the coating layer is 15 μm in width indicated by g, 30 μm in width indicated by h, and a width indicated by k (reflected light region and transmitted light region). ) Was 10 μm. Moreover, the opening size of one pixel partitioned by this coating layer was set to 35 × 120 μm (e × f shown in FIG. 6).

[Example 4]
(Formation of black matrix and colored layer)
It formed in the same manner as Example 1.

(Formation of light scattering layer)
A film thickness of 3.8 μm (light scattering layer formed in the opening of the colored layer) was formed only in the reflected light region using the same method as in Example 1 except that the development conditions were changed to the conditions shown below. The light scattering layer having a line width of 60 μm (width indicated by j in FIG. 5) was formed.
<Development conditions>
・ Concentration of developer (KOH aqueous solution): 0.15% by mass
・ Development time: 100 seconds ・ Developer temperature: 30 ° C.
Development pressure: 3.0 kgf / cm ²

[Comparative example]
(Formation of black matrix and colored layer)
It formed in the same manner as Example 1.

(Formation of light scattering layer)
Except that the development conditions were changed to the conditions shown below, a film thickness of 3.8 μm (only the light scattering layer formed in the opening of the colored layer) was formed only in the reflected light region using the same method as in Example 1. A light scattering layer having an average thickness at the center) and a line width of 60 μm (width indicated by j in FIG. 5) was formed.
<Development conditions>
-Concentration of developer (KOH aqueous solution): 0.03% by mass
・ Developing time: 20 seconds ・ Developer temperature: 20 ° C.
Development pressure: 1.0 kgf / cm ²

[Evaluation]
After the alignment film was formed on the color filters prepared in Examples 1 to 4 and the comparative example, rubbing was performed. As a result, peeling of fine particles did not occur in the color filters produced in Examples 1 to 4, but peeling of fine particles occurred in the color filters produced in Comparative Examples.

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 2 ... Colored layer 3 ... Light-scattering layer 4 ... Covering layer a ... Opening part b ... Tapered part X ... Fine particle r ... Area for reflected light t ... Area for transmitted light

Claims (4)

An area for reflecting light, which includes a transparent substrate and a colored layer formed on the transparent substrate and having an opening, and the transparent substrate and the colored layer having the opening are laminated; A color filter for a transflective horizontal electric field drive type liquid crystal display device using a region in which the transparent substrate and the colored layer having no opening are stacked as a region for transmitted light,
A light scattering layer in which fine particles are dispersed in a transparent resin is formed on the colored layer in the reflected light region, and a coating layer that covers the tapered portion is formed on the tapered portion of the light scattering layer. And
An electrode is not formed on the light scattering layer. A color filter for a transflective horizontal electric field drive type liquid crystal display device.   2. The color filter for a transflective horizontal electric field driving type liquid crystal display device according to claim 1, wherein the coating layer is formed over the entire area of the reflected light region and the transmitted light region.   The color filter for a transflective horizontal electric field drive type liquid crystal display device according to claim 1, wherein an overcoat layer is formed between the colored layer and the light scattering layer.   3. The color filter for a transflective horizontal electric field drive type liquid crystal display device according to claim 1, wherein the light scattering layer is formed immediately above the colored layer having the opening.

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