JP4985261B2 - Color filter for transflective liquid crystal display device and manufacturing method thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter for transflective liquid crystal display device, capable of improving the luminance of a reflected light area. <P>SOLUTION: The color filter for transflective liquid crystal display device includes a transparent substrate having irregularities formed thereon, and a colored layer formed on the transparent substrate so as to cover the transparent substrate, the transparent substrate and the colored layer formed in a recess of the transparent substrate being used as a transmitted light area, and the transparent substrate and the colored layer formed on a protrusion of the transparent substrate being used as a reflected light area. The protrusion of the transparent substrate has an optical path difference adjusting function. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention relates to a color filter for a transflective liquid crystal display device used in a transflective liquid crystal display device or the like.

  In recent years, a transflective liquid crystal display device utilizing external light reflection and backlight transmitted light has been developed as a liquid crystal display device. The transflective liquid crystal display device uses external light to display. The conventional reflective color liquid crystal display device is advantageous in that it also has a backlight and can perform display (transmission display) using the backlight even when the surroundings are dark.

  However, in the color filter used in such a transflective liquid crystal display device, since the external light passes through the colored layer twice as incident light and reflected light, the color of the reflected light region that is displayed by the external light In some cases, there is a problem that the characteristics and the color characteristics of the transmitted light region where the display is performed by the backlight light are different.

  In order to solve such a problem, for example, a method of forming a thick colored layer in the transmitted light region and forming a thin colored layer in the reflected light region, etc. A method of forming a layer has been adopted. However, in this method, when forming a color filter having colored layers of three colors (red (R), green (G), and blue (B)), for example, a photolithography method or the like must be repeated six times. The process was complicated.

  Therefore, a method has been proposed in which a transparent resin layer is formed on a transparent substrate in the reflected light region, and a colored layer is formed so as to cover the transparent resin layer (Patent Document 1). According to this method, the thickness of the colored layer formed on the transparent resin layer can be reduced, the thickness of the colored layer in the reflected light region, and the thickness of the colored layer in the transmitted light region. Therefore, the color characteristics of each region can be adjusted. Further, at this time, the cell gap when the color filter is disposed facing the counter substrate is adjusted by the step generated on the colored layer surface between the reflected light region and the transmitted light region, and the reflected light region and the transmitted light are adjusted. There is also an advantage that the optical path difference of light in the service area can be adjusted.

  However, in the above method, when the brightness decreases in the reflected light region due to reflection at the interface between the transparent resin layer and the transparent substrate, or the adhesion between the transparent resin layer and the transparent substrate is poor, Problems such as peeling of the transparent resin occurred.

JP 2004-102243 A

  The present invention has been made to solve the above-described problems, and has as its main object to provide a color filter for a transflective liquid crystal display device having a high brightness in the reflected light region and a method for manufacturing the same.

  In order to achieve the above object, the present invention has a transparent substrate on which irregularities are formed, and a colored layer formed on the transparent substrate so as to cover the transparent substrate, the concave portion of the transparent substrate, and the above Transflective liquid crystal using a colored layer formed on a concave portion of a transparent substrate as a region for transmitted light, and using a convex portion of the transparent substrate and a colored layer formed on a convex portion of the transparent substrate as a region for reflected light Provided is a color filter for a display device, wherein the convex portion of the transparent substrate has an optical path difference adjusting function.

According to the present invention, since the convex portion of the transparent substrate has an optical path difference adjusting function, the light transmittance is better than that of an optical path difference adjusting layer formed using a transparent resin or the like, and the reflected light is reflected. A color filter for a transflective liquid crystal display device having a high luminance in the use area can be obtained.
In addition, the transparent substrate can be easily regenerated.

  In the said invention, it is preferable that the height of the convex part of the said transparent substrate exists in the range of 0.5 micrometer-5.0 micrometers. When the height of the convex portion of the transparent substrate is within the above range, the optical path difference between the reflected light region and the transmitted light region can be made desired.

  Moreover, in the said invention, you may have a functional part on the upper surface of the convex part of the said transparent substrate. This is because a color filter for a transflective liquid crystal display device that can easily give various functions to the reflected light region can be obtained.

  In the above invention, the functional part may be a liquid repellent part. This is because the thickness of the colored layer in the reflected light region can be further reduced because the functional part is a liquid repellent part.

  Moreover, in the said invention, the said function part may be a light-scattering part. Since the functional unit is a light scattering unit, in the liquid crystal display device using this color filter, when using a reflection mode using outside light, the reflection rate of outside scenes and the incidence of rainbow interference colors can be reduced. This is because it can be suppressed.

  The present invention has a transparent substrate on which irregularities are formed and a colored layer formed on the transparent substrate so as to cover the transparent substrate, and is formed on the concave portion of the transparent substrate and the concave portion of the transparent substrate. The color filter for a transflective liquid crystal display device using the colored layer as a region for transmitted light and the convex portion of the transparent substrate and the colored layer formed on the convex portion of the transparent substrate as a region for reflected light, A method for producing a color filter for a transflective liquid crystal display device, wherein the convex portion of the transparent substrate has an optical path difference adjusting function and a liquid repellent portion is provided on the upper surface of the convex portion of the transparent substrate. , A photoresist layer forming step of forming a photoresist layer made of a photoresist having transparency and liquid repellency on the transparent substrate, an exposure step of exposing the photoresist layer, and developing the photoresist layer And developing the pattern into a pattern, and forming a concavo-convex portion of the transparent substrate by etching the transparent substrate, and using the photoresist layer remaining in the concavo-convex formation step, the transparent layer Provided is a method for producing a color filter for a transflective liquid crystal display device, wherein a liquid repellent function is imparted on the upper surface of the convex portion of the liquid crystal display device.

  According to the present invention, since the convex portion having the optical path difference adjusting function can be formed by the transparent substrate forming step, it is possible to form a color filter having high light transmittance in the reflected light region. Further, since the liquid repellent function is imparted using the photoresist used in the unevenness forming step, it is not necessary to separately form a liquid repellent portion, and the process is easy.

  Moreover, this invention has a transparent substrate in which the unevenness | corrugation was formed, and the colored layer formed so that the said transparent substrate might be covered on the said transparent substrate, On the recessed part of the said transparent substrate, and the recessed part of the said transparent substrate A color filter for a transflective liquid crystal display device using a formed colored layer as a region for transmitted light, and using a convex portion of the transparent substrate and a colored layer formed on the convex portion of the transparent substrate as a region for reflected light The method for producing a color filter for a transflective liquid crystal display device, wherein the convex portion of the transparent substrate has an optical path difference adjusting function and has a light scattering portion on the upper surface of the convex portion of the transparent substrate. A photoresist layer forming step of forming a photoresist layer on the transparent substrate; an exposure step of exposing the photoresist layer; a developing step of developing the photoresist layer into a pattern; and the transparent An unevenness forming step for etching the plate to form the unevenness of the transparent substrate, a peeling step for peeling the photoresist layer, and a polishing step for imparting a light scattering function to the upper surface of the convex portion of the transparent substrate by polishing A method of manufacturing a color filter for a transflective liquid crystal display device is provided.

  According to the present invention, since the convex portion having the optical path difference adjusting function can be formed by the transparent substrate forming step, it is possible to form a color filter having high light transmittance in the reflected light region. In the polishing step, the light scattering effect can be adjusted according to the degree of polishing the upper surface of the convex portion of the transparent substrate.

In the present invention, it is possible to provide a color filter for a transflective liquid crystal display device that can improve the luminance of the reflected light region because the convex portion formed on the transparent substrate has an optical path difference adjusting function. There is an effect.
In addition, since the functional portion is provided on the upper surface of the convex portion of the transparent substrate, it is possible to provide a color filter for a transflective liquid crystal display device that can easily provide various functions to the reflected light region.

  The present invention relates to a color filter for a transflective liquid crystal display device and a manufacturing method thereof.

A. First, a color filter for a transflective liquid crystal display device according to the present invention will be described.
The color filter for a transflective liquid crystal display device according to the present invention includes a transparent substrate on which irregularities are formed, and a colored layer formed on the transparent substrate so as to cover the transparent substrate, and a concave portion of the transparent substrate. And the colored layer formed on the concave portion of the transparent substrate is used as a region for transmitted light, and the translucent surface using the convex portion of the transparent substrate and the colored layer formed on the convex portion of the transparent substrate as a region for reflected light. Type liquid crystal display device, wherein the convex portion of the transparent substrate has an optical path difference adjusting function.

According to this invention, since the convex part of the said transparent substrate has an optical path difference adjustment function, compared with the optical path difference adjustment layer formed using transparent resin etc., a light transmittance becomes a favorable thing.
Moreover, since the convex part of the said transparent substrate has an optical path difference adjustment function, the problem of peeling of the optical path difference adjustment layer from the transparent substrate which arises when an optical path difference adjustment layer is formed from transparent resin is also solved.
In addition, the transparent substrate can be easily regenerated.

FIG. 1 is a schematic sectional view showing an example of a color filter for a transflective liquid crystal display device of the present invention. As shown in FIG. 1, the color filter for a transflective liquid crystal display device of the present invention includes a transparent substrate 1 on which irregularities are formed, and a colored layer 2 formed on the transparent substrate 1 so as to cover the transparent substrate 1. And using the colored layer 2 formed on the concave portion of the transparent substrate 1 and the concave portion of the transparent substrate 1 as the transmitted light region t, the convex portion of the transparent substrate 1 and the convex portion of the transparent substrate 1 The colored layer 2 formed thereon is used as the reflected light region r.
Below, each structure of the color filter for transflective liquid crystal displays of this invention is demonstrated.

1. Transparent substrate The transparent substrate used in the present invention is provided with irregularities, and the convex portions of the transparent substrate have a function of adjusting the optical path difference of the reflected light region.

  The material of the transparent substrate can form irregularities and should be transparent to the external light incident on the color filter for the transflective liquid crystal display device and the reflected light from which the external light is reflected. For example, specifically, a non-flexible transparent rigid material such as alkali-free glass, quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, or transparent resin film. Examples thereof include a transparent flexible material having flexibility such as an optical resin plate, and general alkali-free glass used for a liquid crystal display device is particularly preferable in terms of reliability, transparency, and cost.

  The height of the convex portion of the transparent substrate is not particularly limited as long as it can have an optical path difference adjusting function, but is preferably in the range of 0.5 μm to 5.0 μm, and more preferably 1.0 μm to 4.0 μm. It is preferably in the range of 0 μm, particularly in the range of 1.5 μm to 3.0 μm. When the height of the convex portion of the transparent substrate is within the above range, the optical path difference between the reflected light region and the transmitted light region can be made desired.

  As the shape of the convex portion of the transparent substrate, the color filter for the transflective liquid crystal display device is arranged to face the counter substrate due to the step generated on the colored layer surface in the reflected light region and the transmitted light region. The shape or the like is not particularly limited as long as the cell gap can be adjusted and the optical path difference of light in the reflected light region and the transmitted light region can be adjusted. For example, the cross-sectional shape can be rectangular or trapezoidal.

  Further, the line width of the convex portion of the transparent substrate is appropriately determined according to the use of the transflective liquid crystal display device or the like. In the present invention, the line width is within the range of 10 μm to 150 μm, particularly 15 μm to It is preferably in the range of 80 μm, particularly in the range of 20 μm to 60 μm.

  The method for forming the unevenness of the transparent substrate is not particularly limited as long as the unevenness having a height that provides an optical path difference adjusting function can be formed. Usually, the transparent substrate is formed by etching. The details will be described in “B. Manufacturing method of color filter for transflective liquid crystal display device” described later.

2. Colored layer The colored layer in the present invention is formed in each region of the reflected light region and the transmitted light region.

Although the number of colors of the colored layer in the present invention is not particularly limited, it is composed of a plurality of colors, and is generally composed of a red color pattern, a green color pattern, and a blue color pattern.
The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set.

  The color pattern of each color is obtained by dispersing or dissolving a colorant such as a pigment or dye of each color in a photosensitive resin.

Examples of the colorant used in the red pattern include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green pattern include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinone pigments. Etc. These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue pattern include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. These pigments may be used alone or in combination of two or more.

  In addition, as the photosensitive resin, either a negative photosensitive resin or a positive photosensitive resin can be used, but a negative photosensitive resin is usually used. Examples of the negative photosensitive resin include those having reactive vinyl groups such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber.

  A photopolymerization initiator may be added to the photosensitive resin composition for the colored layer containing the colorant and the photosensitive resin, and further, if necessary, a sensitizer, a coating property improver, and a development improver. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.

3. Functional part In this invention, you may have a functional part on the upper surface of the convex part of the said transparent substrate. This is because various functions can be imparted to the reflected light region.

Examples of the functional part include various functional parts such as a liquid repellent part and a light scattering part.
Each will be described below.

(1) Liquid repellent part The liquid repellent part in this invention is formed on the upper surface of the convex part of the said transparent substrate.

  Here, the liquid repellent portion in the present invention refers to a layered portion formed of a liquid repellent transparent material on the upper surface of the convex portion of the transparent substrate.

  FIG. 2 is a schematic sectional view showing an example of a color filter for a transflective liquid crystal display device in which a liquid repellent portion is formed in the present invention. As shown in FIG. 2, the color filter for a transflective liquid crystal display device according to the present invention includes a transparent substrate 1 on which irregularities are formed, and a colored layer 2 formed on the transparent substrate 1 so as to cover the transparent substrate 1. And the colored layer 2 formed on the concave portion of the transparent substrate 1 and the concave portion of the transparent substrate is used as the transmitted light region t, on the convex portion of the transparent substrate 1 and the convex portion of the transparent substrate. The formed colored layer 2 is used as the reflected light region r. A liquid repellent portion 3 is formed on the upper surface of the convex portion of the transparent layer.

  In the present invention, the liquid repellency portion is formed on the upper surface of the convex portion of the transparent substrate, so that the liquid repellency on the upper surface of the convex portion of the transparent substrate is When the colored layer is formed, when the colored layer forming coating solution is applied onto the transparent substrate, the colored layer forming coating solution on the convex portion of the transparent substrate is Since the coating film of the colored layer forming coating solution on the convex portion of the transparent substrate is greatly reduced in thickness, the thickness of the colored layer in the reflected light region can be reduced.

  The liquid repellency of the liquid repellent part is preferably such that the contact angle with water is in the range of 10 ° to 60 °, and in particular, the contact angle with water is in the range of 15 ° to 50 °, particularly with water. Is preferably in the range of 20 ° to 40 °. When the contact angle with water in the liquid repellent portion is less than the above range, the flow of the colored layer forming coating liquid is not promoted, so the colored layer in the reflected light region cannot be made to a desired film thickness, This is because when the contact angle with water exceeds the above range in the liquid repellent portion, the colored layer forming coating solution does not sufficiently wet and spread, and it is difficult to form a colored layer.

  In addition, the contact angle with water here is 30 by measuring the contact angle with water using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.). Seconds later), and from the result or the result is obtained as a graph.

  The thickness of the liquid repellent part is appropriately selected depending on the material of the liquid repellent part used, but is preferably in the range of 0.1 μm to 2.0 μm, and more preferably in the range of 0.2 μm to 1.5 μm. In particular, the range of 0.4 μm to 1.0 μm is preferable. If it is less than the above range, it is difficult to form the liquid repellent part in a uniform layer, and if it exceeds the above range, the side surface of the convex part of the transparent substrate is also given liquid repellency. This is because white spots are likely to occur when the colored layer is formed.

The material of the liquid repellent part is not particularly limited as long as it is transparent and liquid repellent, does not turn yellow upon firing, and can form the liquid repellent part. May or may not have photosensitivity, but those having normal photosensitivity, ie, photoresist properties, are preferred. This is because patterning can be performed when the irregularities are formed on the transparent substrate.
Moreover, what has chemical resistance, such as an etching agent, in an etching process is preferable. This is because by having chemical resistance such as an etchant, the remaining photoresist can be used as the liquid repellent part, thereby forming irregularities of the transparent substrate and forming the liquid repellent part at a time.

  Specific examples of the photoresist used for the material of the liquid repellent portion include a resist containing a silicon resin and a fluorine resin.

  Moreover, even if it does not have liquid repellency as long as it can perform liquid repellency treatment by irradiating with plasma using a fluorine compound, or if it can have liquid repellency by adding a surfactant or the like, A photoresist having transparency and resistance to an etching agent can be used.

  In addition, the surfactant as described above is not particularly limited as long as it is a surfactant used for an optical path difference adjusting layer in a general color filter, and is a nonionic surfactant, an anionic surfactant, Any of a fluorine-based surfactant, a silicon-based surfactant, a cationic surfactant, and an amphoteric surfactant can be used, and one or a mixture of two or more of these can be used. In this step, it is particularly preferable to use a fluorine-based surfactant.

  The photoresist is not particularly limited as long as the liquid repellent portion can be formed, but is preferably a liquid repellent dry film resist having liquid repellent properties. This is because, when the liquid repellent portion is formed on the transparent substrate, the liquid repellent portion can be easily and uniformly formed as compared with the case where a liquid photoresist is applied.

  Specific examples of the liquid-repellent dry film resist used for the material of the liquid-repellent part include any one of a fluorine compound and a silicon compound, an acrylic resin, an imide resin, a polyimide resin, a cardo resin, an epoxy resin, and a novolac resin. And a resist containing these. In particular, acrylic resin, epoxy resin, cardo resin and the like are particularly preferable from the viewpoint of transparency. The dry film resist is applied on a transparent substrate by applying it on a carrier such as a PET film in advance and transferring it to a transparent substrate.

  The “upper surface of the convex portion of the transparent substrate” refers to the upper surface of the convex portion of the transparent substrate and does not include the side surface.

(2) Light-scattering part The light-scattering part in this invention is formed on the upper surface of the convex part of the said transparent substrate.

  The light scattering portion is not particularly limited as long as it can provide a desired light scattering function on the upper surface of the convex portion of the transparent substrate, and is formed from a transparent material having a light scattering function. However, in the present invention, the convex portions of the transparent substrate may be formed by polishing the upper surface of the convex portions of the transparent substrate. It is preferable that the upper surface is polished to form fine irregularities. This is because it is easy to adjust the light scattering function depending on the degree of polishing.

  FIG. 3 is a schematic cross-sectional view showing an example of a color filter for a transflective liquid crystal display device having a light scattering portion on the upper surface of the convex portion of the transparent substrate in the present invention. As shown in FIG. 3, the color filter for a transflective liquid crystal display device according to the present invention includes a transparent substrate 1 on which irregularities are formed, and a colored layer 2 formed on the transparent substrate 1 so as to cover the transparent substrate 1. And the colored layer 2 formed on the concave portion of the transparent substrate 1 and the concave portion of the transparent substrate is used as the transmitted light region t, on the convex portion of the transparent substrate 1 and the convex portion of the transparent substrate. The formed colored layer 2 is used as the reflected light region r. A light scattering portion 4 is formed by polishing on the upper surface of the convex portion of the transparent layer.

  In this aspect, by having a light scattering function on the upper surface of the convex portion of the transparent substrate, the reflection of an outside scene in the reflected light region of the liquid crystal display device using this color filter, It is possible to suppress the incidence of rainbow interference colors.

  The total light transmittance of the light scattering portion used in the present invention is preferably in the range of 90% to 100%. This is because if the total light transmittance is too small, the luminance of the reflected light region may be lowered when used in a liquid crystal display device using the color filter of this embodiment.

Moreover, it is preferable that the haze value of the said light-scattering part is 40 or more, especially 50 or more,
In particular, it is preferably 60 or more. This is because if the haze value is less than the above range, a sufficient light scattering effect may not be obtained.

  In addition, said total light transmittance and haze value are the values measured with the direct reading haze meter by Toyo Seisakusho Co., Ltd. using the integrating sphere.

  The surface roughness of the light scattering portion is not particularly limited as long as it has a light scattering function, but has a surface average surface roughness of 200 nm or more in order to satisfy the haze value. Is preferred.

(3) Other functional units As the functional units of the color filter for the transflective liquid crystal display device of the present invention, various functional units as shown in FIGS. 4 to 6 are included in addition to the liquid repellent unit and the light scattering unit. Can be mentioned.

  FIG. 4 is a schematic cross-sectional view showing an example in which the functional part of the color filter for a transflective liquid crystal display device of the present invention is a luminance enhancement functional part for improving the luminance of the reflected light region. As shown in FIG. 4, it has the transparent substrate 1 in which the unevenness | corrugation was formed, and the colored layer 2 formed so that the said transparent substrate 1 might be covered on the said transparent substrate 1, The recessed part of the said transparent substrate 1, and the said The colored layer 2 formed on the concave portion of the transparent substrate is used as the transmission light region t, and the convex portion of the transparent substrate 1 and the colored layer 2 formed on the convex portion of the transparent substrate are used as the reflected light region r. Use. Moreover, the projection-like brightness enhancement function part 11 is provided on the upper surface of the convex part of the transparent substrate, and this reduces the average film thickness of the colored layer in the entire reflected light region, thereby improving the brightness. It becomes possible.

FIG. 5 is a schematic cross-sectional view showing an example in which the functional part of the color filter for a transflective liquid crystal display device of the present invention is a thinning function part that promotes thinning of the thickness of the colored layer in the reflected light region. . As shown in FIG. 5, it has a thinning function part 12 formed by providing a slope on the convex part of the transparent substrate, and when this forms a colored layer, the colored layer in the reflected light region is formed. Since the forming coating solution easily flows into the transmitted light region, it is possible to promote the reduction in the thickness of the colored layer.
5 that are the same as those in FIG. 4 are the same as those in FIG.

FIG. 6 is a schematic cross-sectional view showing an example in which the functional part of the color filter for a transflective liquid crystal display device according to the present invention is a color mixing prevention function part for preventing color mixing due to reflected light of external light. As shown in FIG. 6, the transparent substrate has a color mixing prevention function unit 13 formed so that the convex surface of the transparent substrate has a convex lens shape, whereby reflected light passing through both ends of the convex portion of the transparent substrate is a convex lens. As a result of being refracted to the center by the effect, it is possible to prevent color mixing due to reflected light of outside light.
6 that are the same as those in FIG. 4 are the same as those in FIG.

4). Others The color filter for a transflective liquid crystal display device of the present invention includes, for example, a light shielding part, an overcoat layer, a transparent electrode layer, an alignment film, a columnar spacer, etc. in addition to the transparent substrate, the colored layer, and the functional part. It may be formed.

B. Next, a method for manufacturing a color filter for a transflective liquid crystal display device according to the present invention will be described.
As a method for producing a color filter for a transflective liquid crystal display device of the present invention, a method for producing a liquid repellent part on the upper surface of a convex part of a transparent substrate (hereinafter referred to as the first aspect), and transparent. There is a manufacturing method (hereinafter referred to as a second embodiment) having a light scattering portion on the upper surface of the convex portion of the substrate. Each aspect will be described below.

1. 1st aspect The manufacturing method of the color filter for transflective liquid crystal display devices of this aspect has the transparent substrate in which the unevenness | corrugation was formed, and the colored layer formed so that the said transparent substrate might be covered on the said transparent substrate. Then, using the concave portion of the transparent substrate and the colored layer formed on the concave portion of the transparent substrate as a region for transmitted light, the colored layer formed on the convex portion of the transparent substrate and the convex portion of the transparent substrate is reflected light. In the color filter for a transflective liquid crystal display device used as an area, the convex portion of the transparent substrate has an optical path difference adjusting function, and a liquid repellent portion is provided on the upper surface of the convex portion of the transparent substrate. A method for producing a color filter for a transflective liquid crystal display device, comprising: forming a photoresist layer comprising a photoresist having transparency and liquid repellency on the transparent substrate; At least an exposure step for exposing the dyst layer, a development step for developing the photoresist layer into a pattern, and an irregularity forming step for etching the transparent substrate to form irregularities on the transparent substrate, A liquid repellent function is imparted on the upper surface of the convex portion of the transparent layer using the photoresist layer remaining in the irregularity forming step.

  FIG. 7 is a process diagram showing an example of a method for manufacturing a color filter for a transflective liquid crystal display device according to this embodiment. As shown in FIG. 7, the method for manufacturing a color filter for a transflective liquid crystal display device according to this aspect is a method of forming a photoresist layer 3 ′ made of a photoresist having transparency and liquid repellency on a transparent substrate 1. A resist layer forming step (FIG. 7A), an exposure step of exposing the photoresist layer 3 ′ with exposure light 6 using, for example, a photomask 5 or the like (FIG. 7B), and the photoresist layer It has at least a development step (FIG. 7 (c)) that develops and forms a pattern, and a concavo-convex formation step (FIG. 7 (d)) that forms the concavo-convex of the transparent substrate 1 by etching the transparent substrate 1. The liquid-repellent portion 3 is formed on the upper surface of the convex portion of the transparent layer 1 using the photoresist layer 3 ′ remaining in the convex portion forming step of the transparent substrate. Hereinafter, each process will be described.

(1) Photoresist layer forming step This step is a step of forming a photoresist layer made of a photoresist having transparency and liquid repellency on the transparent substrate.

  The method for imparting liquid repellency to the photoresist in this step is not particularly limited as long as it can impart the desired liquid repellency to the photoresist. For example, the photoresist has liquid repellency. It may be a method using a photoresist material, or a method in which a photoresist material that does not have liquid repellency is made to have liquid repellency by lyophobic treatment.

  In this step, in particular, a method of forming a liquid repellent portion by performing a liquid repellent treatment by irradiating a photoresist layer patterned on a transparent substrate with plasma using a fluorine compound (hereinafter referred to as the first implementation). And a method of forming a liquid repellent portion using a photoresist having a liquid repellent material (hereinafter referred to as a second embodiment). This is because these methods make it possible to easily form the liquid repellent portion. Hereinafter, each of the above embodiments will be described.

(First embodiment)
First, the first embodiment of the liquid repellent portion forming method will be described. As a method for forming a liquid repellent portion in this embodiment, a method of forming a liquid repellent portion by performing a liquid repellent treatment by irradiating a photoresist layer patterned on a transparent substrate with plasma using a fluorine compound. It is.

  When plasma irradiation is performed using a fluorine compound as an introduction gas, fluorine can be introduced into an organic substance. Therefore, by irradiating the photoresist layer with the plasma, fluorine can be introduced into the photoresist layer, and a liquid repellent portion having liquid repellency can be obtained. At this time, by using a material made of an inorganic material as the transparent substrate, fluorine can be prevented from being introduced into the transparent substrate. Thereby, the liquid repellent part can be a liquid repellent area, and the area where the transparent substrate is exposed can be a lyophilic area. It can be formed thinner than the thickness of the transmitted light region.

Here, the photoresist layer does not need to have liquid repellency, and can be the same as the photoresist layer in a general color filter. Also, the method for forming the photoresist layer is also common. The formation method can be the same as the formation method of the photoresist layer in a simple color filter. For example, a method of forming by a coating method such as a spin coating method, a method of forming using a dry film resist, and the like can be mentioned. In this embodiment, it is particularly preferable to use a dry film resist.
Since the method for forming a photoresist layer using a dry film resist does not include a reduced pressure drying process, the process can be simplified and the manufacturing cost can be reduced.

  The method for forming the photoresist layer using the dry film resist is the same as the method used in a general method for producing a color filter, and therefore description thereof is omitted here.

  The material used for forming the photoresist layer is not particularly limited as long as it has transparency and does not change color due to liquid repellent treatment or the like. Specifically, since it is the same as that described in the section “A. Color filter for transflective liquid crystal display device”, description thereof is omitted here.

  The material used for the transparent substrate can be the same as that used for a general color filter. For details, see the material described in the section “A. Color filter for transflective liquid crystal display device”. Since it is the same, description here is abbreviate | omitted, However, In this embodiment, what consists of inorganic materials is especially preferable. As described above, by using an inorganic material as the transparent substrate, it is possible to prevent fluorine from being introduced even by plasma irradiation using a fluorine compound as an introduction gas. This is because it can be used as a new liquid region.

  The method of irradiating the photoresist layer with plasma using a fluorine compound as an introduction gas is not particularly limited as long as it is a method capable of introducing fluorine into the photoresist layer. The plasma irradiation method may be used, or the plasma irradiation method may be performed under atmospheric pressure. Further, for example, only the photoresist layer may be irradiated with plasma, or the photoresist layer and the exposed transparent substrate may be irradiated with plasma.

Examples of the fluorine compound of the introduced gas used when the plasma is irradiated include carbon fluoride (CF ₄ ), fluorine nitride (NF ₃ ), sulfur fluoride (SF ₆ ), C ₂ Cl ₃ F ₃ , and C _{2. F 6, C} 3 F _6, and the like. Further, the irradiation conditions of the irradiated plasma are appropriately selected depending on the irradiation apparatus or the like.

  Here, in this embodiment, the plasma irradiation is preferably plasma irradiation under atmospheric pressure. This is because an apparatus for decompression or the like is not necessary, which can be preferable in terms of cost, manufacturing efficiency and the like. The irradiation conditions of such atmospheric pressure plasma can be as follows. For example, the power output can be the same as that used in a general atmospheric pressure plasma irradiation apparatus. At this time, the distance between the irradiated plasma electrode and the photoresist layer is preferably about 0.2 mm to 20 mm, and more preferably about 1 mm to 5 mm. Furthermore, the flow rate of the fluorine compound used as the introduction gas is preferably about 1 L / min to 100 L / min, and more preferably about 5 L / min to 50 L / min, and the substrate transport speed at this time is 0.1 m. / Min to about 10 m / min, especially about 0.5 m / min to 5 m / min is preferable.

  In this step, the presence of fluorine introduced into the photoresist layer is determined by the elemental fluorine in all elements detected from the upper surface of the photoresist layer in the analysis by an X-ray photoelectron spectrometer (XPS: ESCALAB 220i-XL). This can be confirmed by measuring the ratio. At this time, the proportion of the fluorine is preferably 10% or more.

  The liquid repellency of the liquid repellent part and the thickness of the liquid repellent part after the liquid repellent treatment in this embodiment can be the same as those described in “A. Color filter for transflective liquid crystal display device”. The description here is omitted.

(Second embodiment)
Next, a second embodiment of the liquid repellent colored layer forming step will be described. The method for forming the liquid repellent portion in this embodiment is a method for forming the liquid repellent portion using a liquid repellent photoresist.

  The photoresist is the same as that described in the section “A. Color filter for transflective liquid crystal display device”, and the description is omitted here. Moreover, about the formation method of the said photoresist layer, it can be set as the formation method similar to the formation method of the photoresist layer in a general color filter. For example, a method of forming by a coating method such as a spin coating method, a method of forming using a dry film resist, and the like can be mentioned. In this embodiment, it is particularly preferable to use a dry film resist. This is because the forming process is easier than in the coating method.

  The liquid repellency of the liquid repellent part and the thickness of the liquid repellent part in the present embodiment can be the same as those described in “A. Color filter for transflective liquid crystal display device”. Is omitted.

  Further, the transparent substrate used in this embodiment can be the same as that described in the section “(First embodiment)”, and therefore description thereof is omitted here.

(2) Exposure process This process is a process of exposing the photoresist layer.

  The exposure method is not particularly limited as long as the photoresist layer can be formed in a desired pattern. About the exposure method etc. which are used for this process, since it can be set as the method similar to the method used at the time of manufacture of a general color filter, detailed description here is abbreviate | omitted.

(3) Development Step Next, the development step in the present invention will be described. The developing step in the present invention is a step of developing the photoresist layer.

  The developing method is not particularly limited as long as unnecessary photoresist can be removed. The developing solution and developing method used in this step can be the same as the method used in the production of a general color filter, and detailed description thereof is omitted here.

(4) Concavity and convexity forming step This step is a step of forming concavities and convexities by etching the transparent substrate.

  The method for etching the transparent substrate is not particularly limited as long as it can form a transparent layer on the transparent substrate, and may be wet etching or dry etching, but usually wet etching is preferably used. It is done. This is because wet etching is advantageous in terms of cost and production efficiency, and since dissolution proceeds by a chemical reaction, it is easy to control the etching rate by selecting an etching agent. It is.

  The etching agent used for the etching is not particularly limited as long as the transparent substrate can be etched into a desired shape. For example, in the case of wet etching, hydrofluoric acid, fluorinated boronic acid, and the like are used. In the case of dry etching, boron fluoride, carbon tetrafluoride and the like are mentioned.

  The wet etching and dry etching methods in this step are the same as those used when processing a general transparent substrate, and thus description thereof is omitted here.

2. Second Aspect A method for producing a color filter for a transflective liquid crystal display device according to this aspect includes a transparent substrate on which irregularities are formed, and a colored layer formed on the transparent substrate so as to cover the transparent substrate. Then, using the concave portion of the transparent substrate and the colored layer formed on the concave portion of the transparent substrate as a region for transmitted light, the colored layer formed on the convex portion of the transparent substrate and the convex portion of the transparent substrate is reflected light. In the color filter for a transflective liquid crystal display device used as an area, the convex portion of the transparent substrate has an optical path difference adjusting function, and a light scattering portion is provided on the upper surface of the convex portion of the transparent substrate. A method for producing a color filter for a transflective liquid crystal display device, comprising: a photoresist layer forming step of forming a photoresist layer on the transparent substrate; an exposure step of exposing the photoresist layer; and the photoresist A development step for developing the pattern layer into a pattern, an irregularity forming step for etching the transparent substrate to form irregularities on the transparent substrate, a peeling step for peeling the photoresist layer, and a convexity for the transparent substrate. And a polishing step of imparting a light scattering function to the upper surface of the part by polishing.

FIG. 8 is a process diagram showing an example of a method for producing a color filter for a transflective liquid crystal display device according to this embodiment. The method for producing a color filter for a transflective liquid crystal display device according to this aspect includes a photoresist layer forming step (FIG. 8A) for forming a photoresist layer 3 ′ on the transparent substrate 1, and the photoresist layer 3 ′. An exposure step (FIG. 8B) for exposing with a photomask 5 or the like using an exposure light 6, and a development step (FIG. 8C) for developing the photoresist layer 3 ′ into a pattern, An unevenness forming step (FIG. 8 (d)) for etching the transparent substrate 1 to form convex portions of the transparent substrate, and a peeling step (FIG. 8 (e) for peeling the photoresist layer 3 ′ on the transparent substrate. )) And a polishing step (FIG. 8 (f)) for imparting a light scattering function (light scattering portion 4) to the upper surface of the convex portion of the transparent substrate 1 by polishing.
Below, each process is demonstrated.

(1) Photoresist layer formation process This process is a process of forming a photoresist layer on a transparent substrate.

  Since the photoresist used in this step can be the same as that used in a general color filter manufacturing method, description thereof is omitted here.

  The method for forming the photoresist layer is not particularly limited as long as it can be uniformly formed on the transparent substrate, and may be the same as that described in “1. First embodiment”. it can.

(2) Exposure process, development process, and unevenness formation process The exposure process of this aspect is a process of exposing the photoresist layer, the development process is a process of developing the photoresist layer, and the unevenness formation process is And etching the transparent substrate to form irregularities on the transparent substrate.

  About an exposure process, a development process, and a concavo-convex formation process, since it can be made to be the same as that of a process explained in the paragraph of "1. First aspect", explanation here is omitted.

(3) Stripping step This step is a step of stripping the photoresist layer on the transparent substrate.

  The peeling method is not particularly limited as long as the photoresist layer can be peeled off. The stripping solution, stripping method, etc. used in this step can be the same as the method used in the production of a general color filter, so detailed description thereof is omitted here.

(4) Polishing step This step is a step of imparting a light scattering function to the upper surface of the convex portion of the transparent substrate by polishing. By performing this step, it is possible to adjust the light scattering effect depending on the degree of polishing.

  The amount of polishing of the upper surface of the convex portion of the transparent substrate by polishing is not particularly limited as long as it can provide a light scattering function, but it should be thin within a range of about 0.1 μm to 4.5 μm. In particular, it is preferable to reduce the thickness within the range of about 0.3 μm to 3.5 μm, particularly within the range of about 0.5 μm to 1.5 μm. This is because when the polishing amount exceeds the above range, the optical path difference adjusting function of the convex portion of the transparent substrate may not be maintained. Further, since a very long time is required in the polishing process, there is a problem that the production efficiency is lowered. Further, when the polishing amount is less than the above range, a desired light scattering function cannot be achieved.

  The method of polishing in this step is not particularly limited as long as it can provide a desired light scattering function on the upper surface of the convex portion of the transparent substrate, but is polished by a machine using an abrasive. Is preferred. This is because it is easy to adjust the haze value of the scattering portion by adjusting the type and size of the abrasive.

  In this step, the abrasive used is not particularly limited as long as it is an abrasive capable of imparting a desired light scattering function on the upper surface of the convex portion of the transparent substrate by polishing. Examples of the polishing powder include zirconium oxide, cerium oxide, and aluminum oxide, and examples of the polishing liquid include hydrofluoric acid.

  Further, the particle size of the abrasive is not particularly limited as long as it can provide a desired light scattering function on the upper surface of the convex portion of the transparent substrate by polishing. The average particle diameter of the particles is preferably in the range of 0.1 μm to 10 μm, and in particular, it is preferable to use the one in the range of 0.2 μm to 7.0 μm, particularly in the range of 0.5 μm to 5.0 μm. .

  The concentration of the abrasive is not particularly limited as long as it can provide a desired light scattering function on the upper surface of the convex portion of the transparent substrate by polishing. It is preferably within the range of 30% by weight to 30% by weight, and more preferably within the range of 2.0% by weight to 20% by weight, and particularly within the range of 5.0% by weight to 15% by weight.

  In this step, the polishing apparatus used is not particularly limited as long as it is a general polishing machine used for polishing color filters.

  The polishing condition in this step is not particularly limited as long as it can provide a desired light scattering function on the upper surface of the convex portion of the transparent substrate, and is appropriately selected depending on the use of the color filter.

3. Other Steps The present invention may appropriately include necessary steps other than the steps described above. For example, a colored layer forming step of forming a colored layer on the transparent substrate on which the irregularities are formed, an alignment film forming step of forming an alignment film on the colored layer, a transparent electrode layer forming step of forming a transparent electrode layer, etc. . Each of these steps can be the same as the method performed in a general color filter manufacturing method.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be specifically described with reference to examples.

[Example 1]
Example 1 shows an example in which an optical path difference adjusting layer is formed by etching after forming a liquid-repellent photoresist layer by photolithography.

(Photoresist layer forming process)
A general alkali-free glass (EAGLE 2000 manufactured by Corning) was used for a color filter for a liquid crystal display device, and a negative photosensitive resin solution having the following composition was applied by a spin coating method.

<Negative photosensitive resin solution>
• Methacrylic acid-styrene-methacrylic acid copolymer: 42.0 parts by weight • Pentaerythritol pentaacrylate: 32.0 parts by weight • Epoxy resin (manufactured by Japan Epoxy Resins Co., Ltd.): 18.0 Parts by weight / Irgacure 907 (manufactured by Ciba Specialty Chemicals) ... 7.0 parts by weight / fluorine-based surfactant (F475 manufactured by Dainippon Ink Co., Ltd.) ... 1.0 parts by weight / propylene glycol monomethyl Ether acetate: 300 parts by weight

(Exposure process and development process)
After heating on an 80 ° C. hot plate for 180 seconds, exposure was performed using a predetermined photomask with a proximity exposure machine (TME-400R manufactured by Topcon Corporation). The photomask was made of quartz glass, and a photomask having a predetermined pattern drawn on the chromium oxide film on the surface was used. A high pressure mercury lamp was used as a light source, and the conditions were an exposure amount of 100 mJ / cm ² (wavelength 365 nm) and an exposure gap (distance between the transparent substrate and the photomask) of 150 μm. Development was performed using a KOH-based alkaline developer, and baking was performed in an oven at 200 ° C. for 30 minutes. A striped photoresist layer having a line width of 30 μm and a film thickness of 0.5 μm could be formed on the transparent substrate.

(Unevenness forming process)
The transparent substrate on which the liquid repellent portion was formed was treated for 120 seconds using an aqueous solution containing 20 wt% hydrofluoric acid as an etching solution to form a transparent layer. The film thickness of the optical path difference adjusting layer including the photoresist layer and the transparent layer was 2.7 μm. Also, the contact angle of the outermost photoresist layer with water was measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (30 seconds after dropping a droplet from a microsyringe) As a result, it was 23.5 °.

(Colored layer formation process)
As a negative coloring resist used for the colored layer, a photosensitive resin solution having the following composition was applied by a spin coating method.

<Photosensitive resin solution>
・ Red pigment (Chromophthal Red A2B, manufactured by Ciba Specialty Chemicals)
4.8 parts by weight, yellow pigment (Pariotor Yellow D1819, manufactured by BASF) 1.2 parts by weight, dispersant (Disperbic 161, manufactured by Big Chemie) 3.0 parts by weight, monomer ( SR 399 manufactured by Sartomer Co., Ltd.) 4.0 parts by weight, Polymer I, 5.0 parts by weight, Irgacure 907 (manufactured by Ciba Specialty Chemicals), 1.4 parts by weight, (2,2 ' Bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) ・ ・ ・ 0.6 parts by weight ・ Propylene glycol monomethyl ether acetate ・ ・ ・ 80.0 parts by weight * Polymer I is benzyl methacrylate: styrene: acrylic acid: 2-hydroxyethyl methacrylate = 15.6: 37.0: 30.5: 16.9 (molar ratio) 100 mol% copolymer On the other hand, 16.9% of 2-methacryloyloxyethyl isocyanate is added, and the weight average molecular weight is 42500.
After heating on an 80 ° C. hot plate for 180 seconds, exposure was performed using a predetermined photomask with a proximity exposure machine (TME-400R manufactured by Topcon Corporation). The photomask was made of quartz glass, and a photomask having a predetermined pattern drawn on the chromium oxide film on the surface was used. A high pressure mercury lamp was used as a light source, and the conditions were an exposure amount of 100 mJ / cm ² (wavelength 365 nm) and an exposure gap (distance between the transparent substrate and the photomask) of 150 μm.
Development was performed using a KOH-based alkaline developer, and baking was performed in an oven at 200 ° C. for 30 minutes. The thickness of the colored layer in the transmitted light region, ie, the glass etched portion, was 2.0 μm, and the thickness of the colored layer on the reflected light region, ie, the optical path difference adjusting layer, was 0.8 μm.

[Example 2]
Instead of the negative resist for the photoresist layer used in Example 1, a negative photosensitive resin solution having the following composition was used as a photoresist layer material having no liquid repellency.

<Negative photosensitive resin solution>
• Methacrylic acid-styrene-methacrylic acid copolymer: 42.0 parts by weight • Pentaerythritol pentaacrylate: 32.0 parts by weight • Epoxy resin (manufactured by Japan Epoxy Resins Co., Ltd.): 18.0 Part by weight · Irgacure 907 (Ciba Specialty Chemicals) · · · 7.0 parts by weight · Propylene glycol monomethyl ether acetate · · · 300 parts by weight

  In the photoresist layer forming step, the optical path difference adjusting layer was formed in the same manner as in Example 1 except that the negative photosensitive resin solution having the above composition was used as the material for the photoresist layer. The film thickness of the optical path difference adjusting layer including the layers was 2.7 μm. Also, the contact angle of the outermost photoresist layer with water was measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (30 seconds after dropping a droplet from a microsyringe) As a result, it was 8 °. When a colored layer was formed on this substrate in the same manner as in Example 1, the colored layer thickness in the transmitted light region was 2.0 μm, and the colored layer thickness on the reflected light region, that is, the optical path difference adjusting layer was 1. It was 3 μm.

(Evaluation of Example 1 and Example 2)
By using the convex portion formed on the transparent substrate for the optical path difference adjusting layer, the colored layer in the reflected light region of the color filter formed in Example 1 and Example 2 could have high luminance. . Further, in Example 1 in which the optical path difference adjusting layer is provided with liquid repellency by using a liquid repellent photoresist, the reflected light region is not compared to Example 2 in which the optical path difference adjusting layer does not have liquid repellency. The colored layer could be made thinner.

[Example 3]
Example 3 shows an example in which a resist is formed by photolithography, an optical path difference adjusting layer is formed by etching, and then the liquid crystal display reflection part region of the convex part is polished to give a scattering function.

(Photoresist layer forming process)
A general alkali-free glass (EAGLE 2000 manufactured by Corning) was used for a color filter for a liquid crystal display device, and a positive photosensitive resin solution having the following composition was applied and dried.

<Positive photosensitive resin solution>
・ Alkali-soluble novolak resin (MP402FPY, manufactured by Japan Epoxy Resin Co., Ltd.) 90 parts by weight-Quinonediazide group-containing benzophenone compound (NTester manufactured by Toyo Gosei Co., Ltd.)
9 parts by weight Additive (KBM-403 manufactured by Shin-Etsu Chemical Co., Ltd.) 1 part by weight Solvent (propylene glycol monomethyl ether acetate) 250 parts by weight Solvent (cyclohexanone)・ 50 parts by weight

(Exposure process and development process)
After heating on an 80 ° C. hot plate for 180 seconds, exposure was performed using a predetermined photomask with a proximity exposure machine (TME-400R manufactured by Topcon Corporation). The photomask was made of quartz glass, and a photomask having a predetermined pattern drawn on the chromium oxide film on the surface was used. A high pressure mercury lamp was used as a light source, and the conditions were an exposure amount of 100 mJ / cm ² (wavelength 365 nm) and an exposure gap (distance between the transparent substrate and the photomask) of 150 μm. Development was performed using a KOH-based alkaline developer to remove unnecessary resist portions.

(Unevenness forming process and peeling process)
Next, the transparent substrate was treated with an aqueous solution containing 20 wt% hydrofluoric acid as an etching solution for 160 seconds to form a transparent layer, and then the remaining resist portion was removed using a KOH-based stripping solution. Through the above steps, an optical path difference adjusting layer having a line width of 30 μm and a film thickness of 2.7 μm could be formed on the transparent substrate.

(Polishing process)
A scattering function was imparted by the following method on the convex portion of the transparent substrate on which the optical path difference adjusting layer was formed. When an aqueous solution containing 10 wt% of aluminum oxide having a particle diameter of 2.5 μm and 10 wt% of hydrofluoric acid was used as an abrasive, polishing was performed for 45 seconds at a rotation speed of 20 rpm using a rotary polishing apparatus. Scattering portions were formed on the surface of the difference adjustment layer. The surface roughness was measured and found to be 700 nm.

(Colored layer formation process)
The same photosensitive resin solution as in Example 1 was applied by spin coating, heated on a hot plate at 80 ° C. for 180 seconds, and then placed on a proximity exposure machine (TME-400R manufactured by Topcon Corporation). Then, exposure was performed using a predetermined photomask. The photomask was made of quartz glass, and a photomask having a predetermined pattern drawn on the chromium oxide film on the surface was used. A high pressure mercury lamp was used as a light source, and the conditions were an exposure amount of 100 mJ / cm ² (wavelength 365 nm) and an exposure gap (distance between the transparent substrate and the photomask) of 150 μm. Development was performed using a KOH-based alkaline developer, and baking was performed in an oven at 200 ° C. for 30 minutes. The thickness of the colored layer in the transmitted light region, that is, the glass etched portion, was 2.0 μm, and the thickness of the colored layer on the reflected light region, that is, the optical path difference adjusting layer, was 1.0 μm.

(Evaluation of Example 3)
When a liquid crystal display device was produced using the color filter of Example 3, it was confirmed that the rainbow interference light in the reflective display could be reduced.

It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices of this invention. It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices which has the liquid repelling part of this invention. It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices which has a light-scattering part of this invention. It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices which has a brightness improvement function part of this invention. It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices which has a thin film formation function part of this invention. It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices which has a color-mixing prevention function part of this invention. It is process drawing which shows an example of the manufacturing method of the color filter for transflective liquid crystal display devices of this invention. It is process drawing which shows the other example of the manufacturing method of the color filter for transflective liquid crystal display devices of this invention.

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 2 ... Colored layer 3 ... Liquid repellent part 3 '... Photoresist layer 4 ... Light-scattering part 5 ... Photomask 6 ... Exposure light

Claims (3)

A transparent substrate having irregularities formed thereon, and a colored layer formed on the transparent substrate so as to cover the transparent substrate, and a colored layer formed on the concave portion of the transparent substrate and the concave portion of the transparent substrate. A color filter for a transflective liquid crystal display device, which is used as a region for transmitted light, and uses a convex portion of the transparent substrate and a colored layer formed on the convex portion of the transparent substrate as a region for reflected light,
The convex part of the transparent substrate has an optical path difference adjusting function ,
A color filter for a transflective liquid crystal display device, comprising a liquid repellent portion on an upper surface of a convex portion of the transparent substrate .   The color filter for a transflective liquid crystal display device according to claim 1, wherein the height of the convex portion of the transparent substrate is in the range of 0.5 µm to 5.0 µm. A method for producing a color filter for a transflective liquid crystal display device for producing a color filter for a transflective liquid crystal display device according to claim 1 or 2 ,
A photoresist layer forming step of forming a photoresist layer made of a photoresist having transparency and liquid repellency on the transparent substrate, an exposure step of exposing the photoresist layer, and developing and patterning the photoresist layer At least a developing step for forming a concave and convex portion for etching the transparent substrate to form the concave and convex portions of the transparent substrate,
A method for producing a color filter for a transflective liquid crystal display device, wherein a liquid repellent function is imparted on the upper surface of the convex portion of the transparent layer using the photoresist layer remaining in the irregularity forming step.

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