JP6019141B2 - ゼオライト被覆作製装置およびその操業方法 - Google Patents
ゼオライト被覆作製装置およびその操業方法 Download PDFInfo
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- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3234—Inorganic material layers
- B01J20/3238—Inorganic material layers containing any type of zeolite
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1212—Zeolites, glasses
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1287—Process of deposition of the inorganic material with flow inducing means, e.g. ultrasonic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/085—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy creating magnetic fields
Description
反応が行われ、好ましくは頂部に蓋をされた容器である、少なくとも1つの反応炉(2)と、
反応炉(2)内に充填され、ゼオライト被覆を作製するのに用いられる反応物を含んでいる合成溶液(3)と、
合成溶液(3)に浸されており、好ましくは平板の形態である、少なくとも1つの基体(4)と、
コイル(6)に電流を流すことにより発生する磁場が反応炉(2)内で基体(4)に作用することができる距離を置いて位置するように、反応炉(2)の外側に位置し、反応炉(2)の近傍に位置する、少なくとも1つの誘導装置(5)と、
合成溶液(3)の一部を反応炉(2)の外側に保持する、容器の形態である少なくとも1つの供給タンク(7)と、
直接的または間接的に供給タンク(7)と接触しており、供給タンク(7)内の合成溶液(3)の温度を変化させる、少なくとも1つの熱交換器(8)と、
供給タンク(7)と反応炉(2)との間にある接続ライン(10)を介して、合成溶液(3)の循環を可能にする、少なくとも1つのポンプ(9)と、を含む。
反応炉(2)を決定し(determine)し、準備する工程と、
合成溶液(3)を作製し、それを反応炉(2)内に充填する工程と、
適切な方法で基体(4)を洗浄し、それを反応炉(2)内に充填された溶液(3)内に配置する工程と、
誘導装置(5)のコイル(6)の近傍に、反応炉(2)を配置する工程と、
所望の基体(4)の温度を提供するように、コイル(6)と反応炉(2)との間の距離および/または誘導装置(5)の出力を調整する工程と、
反応炉(2)内の合成溶液(3)を、ポンプ(9)の助力により、水浴(S)と反応炉(2)の間で循環させる工程と、
反応炉(2)内の合成溶液(3)の温度を、基体(4)の温度よりも低い所望の値に保持するように、水浴(S)の温度を調整する工程と、
誘導装置(5)を操作することにより磁場を作り出す工程と、
所望の温度および時間で合成を行う工程と、
溶液(3)から基体(4)を取除く工程と
水により被覆を洗浄する工程と、
最終生成物を得る工程と、を含む。
・グラフ1
・グラフ2
2:反応炉
3:合成溶液
4:基体
5:誘導装置
6:コイル
7:供給タンク
8:熱交換器
9:ポンプ
10:接続ライン
S:水浴
Claims (6)
- 反応が行われ、合成溶液(3)の循環を伴う誘導加熱が行われ、頂部に蓋をされた容器であり、その壁上にゼオライトが形成するのを防止するように、かつ合成溶液(3)を加熱するのを防止するように、低い導電率を有する材料から作られた、少なくとも1つの反応炉(2)と、
前記反応炉(2)内に充填され、ゼオライト被覆を作製するのに用いられる反応物を含んでおり、前記被覆の質を向上させるように稀薄に作られ、装置(1)の全体にわたって循環する合成溶液(3)と、
前記合成溶液(3)内に浸されており、離れたところから、前記合成溶液(3)の温度よりも高い温度まで誘導加熱される、導電性材料から作られた少なくとも1つの基体(4)と、
前記反応炉(2)の外側に位置し、前記反応炉(2)の近傍に位置する、少なくとも1つの誘導装置(5)であって、前記誘導装置のコイル(6)に電流を流すことにより発生する磁場が、前記反応炉(2)の内側で基体(4)を加熱することができる距離にある、少なくとも1つの誘導装置(5)と、
前記反応炉(2)の外側の水浴(S)内に配置され、前記合成溶液(3)の温度が前記基体(4)の温度よりも低温に維持されるように、前記合成溶液(3)が通って循環する、容器の形態である少なくとも1つの供給タンク(7)と、
前記水浴(S)内に配置されており、かつ前記水浴(S)の温度を変化させて、前記水浴(S)内に浸された前記供給タンク(7)内の合成溶液(3)の温度を、前記反応炉(2)内の合成溶液(3)の温度が前記基体(4)の温度よりも低い状態を保持できるような値に維持する、少なくとも1つの熱交換器(8)と、
前記供給タンク(7)と前記反応炉(2)との間にある接続ライン(10)を介して、前記合成溶液(3)の循環を可能にする、少なくとも1つのポンプ(9)と、を含むことを特徴とするゼオライト被覆作製装置(1)。 - 前記誘導装置(5)により発生した磁場による被覆形成の効果を促進するように、基体(4)が強磁性材料から作られていることを特徴とする、請求項1に記載のゼオライト被覆作製装置(1)。
- 被覆の安定性を向上させるように、基体(4)が前記反応炉(2)内の前記合成溶液(3)内に垂直に浸されていることを特徴とする、請求項1または2に記載のゼオライト被覆作製装置(1)。
- 低い導電率を有する材料から作られた前記反応炉(2)を準備する工程と、
前記溶液(3)を稀薄に作製し、前記反応炉(2)に充填する工程と、
導電性の基体(4)を洗浄し、それを前記反応炉(2)内に充填された前記溶液(3)内に配置する工程と、
前記誘導装置(5)の前記コイル(6)の近傍に、前記反応炉(2)を配置する工程と、
所望の基体(4)の温度を提供するように、前記コイル(6)と前記反応炉(2)との間の距離および/または前記誘導装置(5)の出力を調整する工程と、
前記水浴(S)内に浸された前記供給タンク(7)と前記反応炉(2)との間にある接続ライン(10)を介して、ポンプ(9)の助力によって、前記反応炉(2)内の前記合成溶液(3)を循環させる工程と、
前記反応炉(2)内の前記合成溶液(3)の温度が、前記基体(4)の温度よりも低い所望の値で維持されることを確実にする値に、前記供給タンク(7)内の前記合成溶液(3)の温度を保持するように、前記熱交換器(8)の助力により前記水浴(S)の温度を調整する工程と、
前記誘導装置(5)を操作することにより磁場を形成する工程と、
所望の基体(4)および溶液(3)の温度および時間で合成を行う工程と、
前記溶液(3)から前記基体(4)を取除く工程と
前記被覆を水により洗浄する工程と、
最終生成物を得る工程と、を含むことを特徴とする、請求項1に記載の装置(1)を用いて行われる、ゼオライト被覆作製方法。 - 前記誘導装置(5)により発生した磁場による被覆形成の効果を促進するように、強磁性材料から作られた基体(4)を用いることを特徴とする、請求項4に記載の方法。
- 被覆の安定性を向上するように、前記反応炉(2)内の前記合成溶液(3)内に垂直に浸された基体(4)を用いることを特徴とする、請求項4または5に記載の方法。
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TR2012/02254 | 2012-02-28 | ||
TR201202254 | 2012-02-28 | ||
PCT/IB2013/051515 WO2013128366A2 (en) | 2012-02-28 | 2013-02-25 | A zeolite coating preparation assembly and operation method |
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JP2015518084A JP2015518084A (ja) | 2015-06-25 |
JP6019141B2 true JP6019141B2 (ja) | 2016-11-02 |
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US (1) | US9180429B2 (ja) |
EP (1) | EP2820170B1 (ja) |
JP (1) | JP6019141B2 (ja) |
CN (1) | CN104428446B (ja) |
ES (1) | ES2573280T3 (ja) |
WO (1) | WO2013128366A2 (ja) |
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ES2869868T3 (es) * | 2012-09-20 | 2021-10-26 | Ecole Polytechnique Fed Lausanne Epfl | Procedimiento de endurecimiento de un recubrimiento de un elemento de colector solar |
US20150325831A1 (en) * | 2014-05-07 | 2015-11-12 | E I Du Pont De Nemours And Company | Polyimide web separator for use in an electrochemical cell |
CN105413603B (zh) | 2015-11-09 | 2017-12-05 | 陕西科技大学 | 有效改善复合材料界面结合的复合材料制备系统及方法 |
US10307726B1 (en) | 2016-11-15 | 2019-06-04 | Rodolfo Palombo | Magnetic chemical reactor |
WO2020122826A1 (en) | 2018-12-13 | 2020-06-18 | Inventram Fikri Mulkiyet Haklari Yonetim Ticaret Ve Yatirim Anonim Sirketi | A zeolite coating preparation assembly and method for operating the same |
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EP0437480B1 (en) * | 1988-10-10 | 1994-10-19 | Commonwealth Scientific And Industrial Research Organisation | Method and apparatus for continuous chemical reactions |
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JP4588868B2 (ja) * | 2000-11-29 | 2010-12-01 | 株式会社フルヤ金属 | ガラス溶融処理用金属材料及びその製造方法 |
CN100429150C (zh) * | 2003-08-06 | 2008-10-29 | 三菱化学株式会社 | 沸石膜的制法和制造装置及由该法得到的沸石管状分离膜 |
CN1622283A (zh) * | 2004-12-15 | 2005-06-01 | 贺平 | 复合氧化物半导体纳米材料的制备方法 |
JP2006256066A (ja) | 2005-03-16 | 2006-09-28 | Toyota Industries Corp | 基材の表面に樹脂シートを被覆する方法および被覆部材 |
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US8354294B2 (en) | 2006-01-24 | 2013-01-15 | De Rochemont L Pierre | Liquid chemical deposition apparatus and process and products therefrom |
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US20100119736A1 (en) | 2008-10-07 | 2010-05-13 | The Regents Of The University Of California | Ambient pressure synthesis of zeolite films and their application as corrosion resistant coatings |
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WO2013128366A3 (en) | 2014-04-17 |
CN104428446B (zh) | 2016-08-24 |
JP2015518084A (ja) | 2015-06-25 |
US9180429B2 (en) | 2015-11-10 |
US20150024924A1 (en) | 2015-01-22 |
CN104428446A (zh) | 2015-03-18 |
ES2573280T3 (es) | 2016-06-07 |
WO2013128366A2 (en) | 2013-09-06 |
EP2820170A2 (en) | 2015-01-07 |
EP2820170B1 (en) | 2016-03-23 |
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