JP6009351B2 - 検査画像内の分類のためのシステム、方法、及びコンピュータプログラム製品 - Google Patents

検査画像内の分類のためのシステム、方法、及びコンピュータプログラム製品 Download PDF

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JP6009351B2
JP6009351B2 JP2012289418A JP2012289418A JP6009351B2 JP 6009351 B2 JP6009351 B2 JP 6009351B2 JP 2012289418 A JP2012289418 A JP 2012289418A JP 2012289418 A JP2012289418 A JP 2012289418A JP 6009351 B2 JP6009351 B2 JP 6009351B2
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inspection
segments
image
inspection image
mask
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JP2013130582A5 (enrdf_load_stackoverflow
JP2013130582A (ja
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ダッラートッレ ミシェル
ダッラートッレ ミシェル
シャバット ギル
シャバット ギル
ダフニ アディ
ダフニ アディ
バティコフ アミット
バティコフ アミット
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アプライド マテリアルズ イスラエル リミテッド
アプライド マテリアルズ イスラエル リミテッド
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9515—Objects of complex shape, e.g. examined with use of a surface follower device
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G06T2207/10061—Microscopic image from scanning electron microscope
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012289418A 2011-12-21 2012-12-21 検査画像内の分類のためのシステム、方法、及びコンピュータプログラム製品 Expired - Fee Related JP6009351B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/333,912 US9098893B2 (en) 2011-12-21 2011-12-21 System, method and computer program product for classification within inspection images
US13/333,912 2011-12-21

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JP2013130582A JP2013130582A (ja) 2013-07-04
JP2013130582A5 JP2013130582A5 (enrdf_load_stackoverflow) 2016-02-04
JP6009351B2 true JP6009351B2 (ja) 2016-10-19

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JP2012289418A Expired - Fee Related JP6009351B2 (ja) 2011-12-21 2012-12-21 検査画像内の分類のためのシステム、方法、及びコンピュータプログラム製品

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US (2) US9098893B2 (enrdf_load_stackoverflow)
JP (1) JP6009351B2 (enrdf_load_stackoverflow)
KR (1) KR101868379B1 (enrdf_load_stackoverflow)
TW (1) TWI542868B (enrdf_load_stackoverflow)

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CN110969175B (zh) * 2018-09-29 2022-04-12 长鑫存储技术有限公司 晶圆处理方法及装置、存储介质和电子设备
JP2022504937A (ja) * 2018-10-19 2022-01-13 ジェネンテック， インコーポレイテッド 畳み込みニューラルネットワークによる凍結乾燥製剤における欠陥検出
CN109351651B (zh) * 2018-10-23 2020-12-04 山东新华健康产业有限公司 平面口罩制造检测系统
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Also Published As

Publication number Publication date
TWI542868B (zh) 2016-07-21
KR101868379B1 (ko) 2018-07-19
TW201335588A (zh) 2013-09-01
US20150310600A1 (en) 2015-10-29
JP2013130582A (ja) 2013-07-04
KR20130072177A (ko) 2013-07-01
US20130163851A1 (en) 2013-06-27
US9098893B2 (en) 2015-08-04

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