JP6002364B2 - 発光素子 - Google Patents
発光素子 Download PDFInfo
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- JP6002364B2 JP6002364B2 JP2011015170A JP2011015170A JP6002364B2 JP 6002364 B2 JP6002364 B2 JP 6002364B2 JP 2011015170 A JP2011015170 A JP 2011015170A JP 2011015170 A JP2011015170 A JP 2011015170A JP 6002364 B2 JP6002364 B2 JP 6002364B2
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- light emitting
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- 239000004065 semiconductor Substances 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910002601 GaN Inorganic materials 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052594 sapphire Inorganic materials 0.000 claims description 2
- 239000010980 sapphire Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- 238000000034 method Methods 0.000 description 23
- 230000008569 process Effects 0.000 description 22
- 230000004907 flux Effects 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 9
- 238000000407 epitaxy Methods 0.000 description 8
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 6
- 238000011161 development Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 3
- NWAIGJYBQQYSPW-UHFFFAOYSA-N azanylidyneindigane Chemical compound [In]#N NWAIGJYBQQYSPW-UHFFFAOYSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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Description
TC=[((T2の場合の正規化光束密度)-(T1の場合の正規化光束密度))/(T2-T1)]/( T1の場合の正規化光束密度)=((f2/f1)-1)/( T2-T1) ……数式1
11 第一導電型半導体層
12 発光構造
13 第二導電型半導体層
100、200、300 エピタキシ構造
100a 第一活性層
100b 第二活性層
400 バックライトモジュール装置
410、510 光源装置
420 光学装置
430、520 電源供給システム
500 照明装置
530 制御素子
Claims (4)
- 発光素子であって、
基板と、
該基板上に位置する第一導電型半導体層と、
該第一導電型半導体層上に位置する発光構造と、を含み、
該発光構造は、複数の第一活性層と、複数の第二活性層と、前記発光構造上に位置する第二導電型半導体層とを含み、
各第一活性層は、量子井戸構造を有し、かつ第一発光波長の光を発することができ、
各第二活性層は、量子井戸構造を有し、かつ第二発光波長の光を発することができ、
前記第一活性層と前記第二活性層は交互に積み重なり、かつ第一発光波長は第二発光波長より大きく、
前記発光構造において、前記第一導電型半導体層に最も接近するものは前記第一活性層である
前記第一活性層と前記第二活性層の層数の総和は23nであり、隣接する第一活性層の間にd層の第二活性層を挿入し、かつ4n≦d≦10nである(nは0より大きい整数)ことを特徴とする発光素子。 - 前記基板の材料は、ヒ化ガリウム、サファイア、炭化ケイ素、窒化ガリウム、窒化アルミニウム、ケイ素及びゲルマニウムで構成される群から選択される少なくとも1つを含むことを特徴とする請求項1記載の発光素子。
- 前記第一発光波長と前記第二発光波長の差異は10nmより大きくないことを特徴とする請求項1記載の発光素子。
- 前記第一活性層と前記第二活性層は交互に積み重なることを特徴とする請求項1記載の発光素子。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011015170A JP6002364B2 (ja) | 2011-01-27 | 2011-01-27 | 発光素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011015170A JP6002364B2 (ja) | 2011-01-27 | 2011-01-27 | 発光素子 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012156359A JP2012156359A (ja) | 2012-08-16 |
JP2012156359A5 JP2012156359A5 (ja) | 2014-03-13 |
JP6002364B2 true JP6002364B2 (ja) | 2016-10-05 |
Family
ID=46837765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011015170A Active JP6002364B2 (ja) | 2011-01-27 | 2011-01-27 | 発光素子 |
Country Status (1)
Country | Link |
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JP (1) | JP6002364B2 (ja) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002176198A (ja) * | 2000-12-11 | 2002-06-21 | Mitsubishi Cable Ind Ltd | 多波長発光素子 |
KR100691444B1 (ko) * | 2005-11-19 | 2007-03-09 | 삼성전기주식회사 | 질화물 반도체 발광소자 |
JP5196160B2 (ja) * | 2008-10-17 | 2013-05-15 | 日亜化学工業株式会社 | 半導体発光素子 |
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2011
- 2011-01-27 JP JP2011015170A patent/JP6002364B2/ja active Active
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JP2012156359A (ja) | 2012-08-16 |
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