JP5989173B2 - Thermosetting conductive paste, method for producing the same, and wiring board - Google Patents

Description

  The present invention relates to a conductive paste having high conductivity even at a low thermosetting temperature, and a wiring board using the same.

  Conventionally, conductive pastes composed of metal particles, resins, solvents, and the like have been widely used for electronic devices. In recent years, as electronic devices have been reduced in size, it has become necessary to miniaturize internal circuits, and therefore, conductive pastes suitable for fine wiring have been developed.

  Further, regarding the base material on which the wiring is formed, use of a substrate made of a polymer as well as a conventional substrate has been studied. However, such polymer materials generally have poor heat resistance, and conventional conductive pastes cannot withstand heat treatment (eg, baking at 250 ° C. for 1 hour in the atmosphere) necessary to ensure conductivity. is there.

  In order to solve such problems, particularly in recent years, conductive pastes using metal nanoparticles (average primary particle diameter of 1 to 200 nm) having physical properties different from those of micron order particles have been studied. By adopting such metal nanoparticles, it is said that a conductive paste particularly suitable for forming fine wiring can be provided.

  However, since metal nanoparticles have extremely high activity, most of them have a protective layer made of an organic substance on the particle surface to ensure the independence of the particles. However, although such a protective layer contributes effectively when preserving particles, it sometimes acts as an inhibiting factor when manifesting metallic properties. At this time, even if the wiring can be formed, the electrical conductivity may be low and impractical.

  Therefore, as a technique for ensuring useful conductivity even when firing at a low temperature, for example, the technique of Japanese Patent No. 3558593 has been proposed. This technology mixes fine silver particles and coarse silver particles and uses a blocked isocyanate and an epoxy resin in combination to make the paste fired film low resistance. By using it in combination, the shrinkage rate can be controlled, suggesting the possibility of forming a wiring exhibiting high conductivity even at low temperature treatment.

Japanese Patent No. 3558593

  The technique disclosed in Patent Document 1 discloses that a wiring having a low volume resistivity of 15 to 17 μΩ · cm can be obtained even by heat treatment at a relatively low temperature of 180 ° C. for 30 minutes. However, in order to further expand the substrate selectivity, it is desired to exhibit a low volume resistivity even when heat-treated at a lower temperature (for example, 150 ° C.).

  The present invention has been completed in view of such a demand. That is, the content disclosed in this specification is to propose a conductive film in which a film formed by thermal curing at a low temperature of about 150 ° C. exhibits a low volume resistivity. More specifically, it is to indicate a conductive paste capable of forming such a conductive film.

A thermosetting conductive paste that can provide a conductive film that satisfies the above requirements has the following configuration. That is, as a constitution thereof, at least an average primary particle diameter that can be measured from a TEM image is 60 nm or more and 200 nm or less, and an organic substance constituting the surface is any one of sorbic acid, butanoic acid, and lactic acid. (MA) and a metal component composed of at least two kinds of metal particles, that is, metal micron particles (MB) having an average particle diameter (D ₅₀ ) measured by a laser diffraction method of _0.5 μm to 10.0 μm, and at least an epoxy resin and hardener, further comprising a thermosetting component and a solvent containing a blocked isocyanate state, and are ratios above 0.16 wt% of active isocyanate in the paste in the blocked isocyanate, when cured at 0.99 ° C. , volume resistivity is characterized by the following der Rukoto 8.4μΩ · cm or more 34.9μΩ · cm

Blocked isocyanate is one of the thermosetting component is a thermosetting conductive paste and is formed by a blocked isocyanate monomer.

  As a more preferable form, the epoxy resin has a thermosetting conductive paste having an epoxy equivalent of 300 or less.

In the thermosetting conductive paste having the above-described configuration, the compounding ratio (MA / MB) of the metal nanoparticles (MA) and the metal micron particles (MB) is particularly a mass ratio of 90/10 to 10/90. There, and thermosetting conductive is compounding ratio of the thermosetting component (curing agent and the sum of the thermosetting resin) and the total solid component (the sum of the metal component and a thermosetting component) is from 1/100 to 15/100 It is a sex paste.

  In addition, a dispersant exhibiting the property of assisting in dispersing the metal nanoparticles in the resin or solvent is further blended, and the blending amount is 0.1 to 6 with respect to the silver nanoparticle amount. It is a thermosetting conductive paste in the range of 0.0 mass%.

  Furthermore, the wiring board is formed using a thermosetting conductive paste having the above-described configuration.

  And when forming the above-mentioned paste, the blocked isocyanate to be added is a method for producing a thermosetting conductive paste using an effective isocyanate amount of 7.0% by mass or more.

  By forming the wiring by a printing method or the like using the thermosetting conductive paste disclosed in the present invention, it is possible to form a highly conductive metal wiring even by a low-temperature heat treatment. Alternatively, the wiring can be formed on a polymer resin substrate having a low glass transition point.

It is a graph which shows the correlation of the volume resistivity at the time of 150 degreeC hardening, and the volume resistivity in 210 degreeC (In addition, the volume resistivity at the time of 150 degreeC hardening (vertical axis) is a logarithm display). It is a graph which shows the correlation of the amount of effective isocyanate contained in the paste at the time of changing the kind of blocked isocyanate in paste preparation, and the volume resistivity at the time of hardening on 150 degreeC process conditions (In addition, volume resistivity) (The vertical axis is a logarithmic display.)

<Metal nanoparticles>
The metal nanoparticles used in the present invention are those having an average primary particle diameter calculated from a transmission electron microscope (TEM) photograph of 20 to 200 nm, preferably 20 to 150 nm, and more preferably 20 to 100 nm. By using metal nanoparticles having such a particle size, a conductive film having high conductivity can be formed even when heat treatment is performed at a low temperature of about 150 ° C. The case where the metal species is silver is called silver nanoparticles.

  Evaluation of the average primary particle diameter with a transmission electron microscope was performed as follows. First, 2 parts by mass of the washed metal nanoparticles were added to a mixed solution of 96 parts by mass of cyclohexane and 2 parts by mass of oleic acid and dispersed by ultrasonic waves. The dispersion solution was dropped on a Cu microgrid with a support film and dried to obtain a TEM sample. Using the transmission electron microscope (JEM-100CXMark-II type, manufactured by JEOL Ltd.), an image obtained by observing particles in a bright field at an acceleration voltage of 100 kV was photographed at a magnification of 300,000 times. .

  In the photograph thus obtained, the particles can be directly measured with calipers or the like, but in the present invention, image analysis software (A Image-kun (registered trademark) manufactured by Asahi Kasei Engineering Co., Ltd.) was used. This image analysis software identifies individual particles based on color shading. For a 300,000-fold TEM image, the “particle brightness” is “dark”, the “noise removal filter” is “present”, “ The circular particle analysis was performed under the condition that the “circular threshold” was “20” and the “overlap degree” was “50”, and the primary particle diameter was measured for 200 or more particles, and the number average diameter was measured. In addition, when there were many condensed particles and irregular shaped particles in the TEM image, it was determined that measurement was impossible.

  The silver content in the silver nanoparticles coated with the organic coating was measured by weighing 0.5 g or more of the sample (silver fine particles coated with the organic coating) into an ashtray for ash measurement, and a muffle furnace (manufactured by Yamato Scientific Co., Ltd.). FO310) was heated to 700 ° C. at a rate of about 10 ° C./min to remove the organic coating present on the surface of the silver fine particles, and then the temperature in the furnace was reduced to 500 ° C. or less by natural cooling. It can be calculated by taking out the ashtray in stages, cooling it to room temperature in a desiccator, and comparing the weight of the sample after cooling with the weight before heat treatment. In addition, the organic substance which coat | covers the surface can be known from the gas component detected in inert atmosphere, for example using thermal analysis apparatuses, such as TG-MS.

  The silver nanoparticles used in the present invention have the above average primary particle diameter, and the surface is coated with an organic substance. As this organic substance, those having a total carbon number of 8 or less can be suitably used. In particular, those having 8 or less carbon atoms and having one or more carboxyl groups can be suitably used. Specifically, although not limited to the following substances, saturated fatty acids octanoic acid (caprylic acid), heptanoic acid (enanthic acid), hexanoic acid (caproic acid), pentanoic acid (valeric acid), butanoic acid (Butyric acid), propanoic acid (propionic acid) and the like. Examples of the dicarboxylic acid include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, and suberic acid. Examples of unsaturated fatty acids include sorbic acid and maleic acid.

  There are many unclear points about the effects of these coatings. However, since carboxylates are known as catalysts that promote dissociation of blocking agents in blocked isocyanates, like amine salt catalysts and alkali metal alkoxides, they contribute to low-temperature activation of isocyanate groups. Possible possibility.

  The substance having a carbon number of 8 or less, which is selected as the coating agent, can be removed out of the system together with the blocking agent at a relatively low temperature after acting as a catalyst. Therefore, it is considered that high conductivity can be expressed even by heat treatment at a low temperature.

Furthermore, even when a paste was prepared only with blocked isocyanate and silver nanoparticles, only a high volume resistivity was obtained. That is, in order to form a paste using silver nanoparticles and silver micron particles together as in the present invention to form a wiring exhibiting high conductivity at a low temperature, it is possible to use a blocked isocyanate and an epoxy resin in combination. Is preferred.

  Of these, if the surface of the silver nanoparticles is coated with hexanoic acid, heptanoic acid, adipic acid or sorbic acid, it can be easily produced and provided in the form of a powder. Providing in such a powder form is preferable because it facilitates blending in forming the conductive paste material as in the present invention. Furthermore, particles whose surfaces are coated with such a substance can be aggregated and easily recovered while maintaining the form of primary particles. The agglomerates at that time can be said to be 2.5 μm or more because they are at least a size that can be recovered with 5 types C of JISP-3801.

Since a clear filtrate is obtained by filtration and recovery, the above-mentioned aggregate (secondary) particle size of 2.5 μm is different from the so-called average particle size (D ₅₀ ) of silver particles. This is because the particle diameter of the above When a D ₅₀ value, is considered agglomerates passing unable filtered through filter paper increases. Therefore, the above-mentioned aggregated (secondary) particle diameter may be interpreted as an aggregate having a size of at least about 2.5 μm instead of an average value. Moreover, if drying operation at low temperature (less than 100 degreeC) is added, it can also collect | recover as dry particles.

  Among these silver nanoparticles, when the average primary particle size is 60 nm or more, organic components present on the surface of the particles are moderately suppressed. As described above, the component having a carboxyl group present on the surface of the silver nanoparticle of the present invention is considered to act as a dissociator for the blocking agent of the blocked isocyanate. However, when this component is too much more than necessary, the blocking agent is naturally dissociated from the isocyanate group in the paste, which is not preferable because the temporal stability is deteriorated.

  It is also possible to use silver nanoparticles coated with a plurality of organic substances, or to use silver nanoparticles having different average primary particle sizes in combination.

<Metallic micron particles>
As already described, the addition of micron-order silver particles in addition to the above silver nanoparticles further contributes to a reduction in volume resistivity. In the present specification, metal particles in the micron order are referred to as “metal micron particles”, and the case where the main metal is silver is referred to as “silver micron particles”. Specifically, it is preferable to use silver micron particles having an average particle size of 0.5 μm or more. At this time, the average particle diameter was calculated based on the laser diffraction method. That is, 0.3 g of a sample of silver micron particles is placed in 50 mL of isopropyl alcohol, dispersed for 5 minutes with an ultrasonic cleaner with an output of 50 W, and then laser is emitted by a microtrack particle size distribution measuring device (Honeywell-Nikkiso 9320-X100). The value of D ₅₀ (cumulative 50% by mass particle size) measured by the diffraction method was defined as the average particle size. The average particle size at this time is 0.5 to 15.0 μm, preferably 1.0 to 12.5 μm, more preferably 1.5 to 10.0 μm in combination with silver micron particles. High paste.

  The addition amount of the silver nanoparticles is 10 to 95% by mass, preferably 15 to 90% by mass with respect to the silver micron particles. By setting it as this range, when it is set as an electrically conductive film, it can be set as an electrically conductive film with high electroconductivity and small volume resistivity.

In some cases, the amount of silver per unit volume can be reduced by mixing silica, glass, graphite or the like. However, if too much is added, the conductivity deteriorates. Therefore, it is preferable to adjust the addition amount as appropriate in consideration of conductivity. The amount added depends on the type of the added substance, but is 10% by mass or less, preferably 5% by mass, based on the total weight of the paste.
The following is recommended.

<Dispersion medium>
The conductive paste according to the present invention uses silver nanoparticles dispersed in a dispersion medium. The dispersion medium used at this time is preferably a polar solvent. This is because by selecting a polar solvent, the vapor pressure is low and it is suitable for handling.

  In particular, there is no problem if one having a property compatible with the thermosetting resin is used, but an organic solvent such as ester, ether, ketone, ether ester, alcohol, hydrocarbon or amine is used. Is preferred.

  Specific examples include water, diols such as octanediol, alcohol, polyol, glycol ether, 1-methylpyrrolidinone, pyridine, terpineol, butyl carbitol, butyl carbitol acetate, texanol, phenoxypropanol, diethylene glycol monobutyl ether, diethylene glycol mono Examples include butyl ether acetate, γ-butyrolactone, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, methoxybutyl acetate, methoxypropyl acetate, diethylene glycol monoethyl ether acetate, ethyl lactate, 1-octanol and the like.

  In particular, since the conductive paste is generally used to form a circuit by printing, it is preferable to use a high boiling point solvent having low volatility during printing, and terpineol, butyl carbitol acetate, or octanediol is used. Is more preferable. A plurality of types of solvents may be used in combination. The amount of the solvent is preferably 30% by mass or less, more preferably 25% by mass or less, and most preferably 20% by mass or less based on the total amount of the thermosetting resin and the metal component.

<Dispersant component>
You may add the dispersing agent which disperse | distributes silver nanoparticle powder moderately to the electrically conductive paste concerning this invention. By using such a dispersant, independence of silver nanoparticles is ensured in the conductive paste. The property is not limited as long as it has an affinity for the surface of the silver nanoparticles and also has an affinity for the dispersion medium, and may be a commercially available one. Moreover, you may use together not only a single kind. This addition amount is 6.0% by mass or less, preferably 3.0% by mass or less, and more preferably 1.0% by mass or less, based on the addition weight of the silver nanoparticles.

Dispersants having such properties include fatty acid salts (soap), α-sulfo fatty acid ester salts (MES), alkylbenzene sulfonates (ABS), linear alkylbenzene sulfonates (LAS), alkyl sulfates (AS), Low molecular weight anionic (anionic) compounds such as alkyl ether sulfate (AES) and alkyl sulfate triethanol, fatty acid ethanolamide, polyoxyethylene alkyl ether (AE), polyoxyethylene alkyl phenyl ether (APE), sorbitol, Low molecular weight nonionic compounds such as sorbitan, low molecular weight cationic (cationic) compounds such as alkyltrimethylammonium salt, dialkyldimethylammonium chloride, alkylpyridinium chloride, Low molecular amphoteric compounds such as in, sulfobetaine, lecithin, formalin condensate of naphthalene sulfonate, polystyrene sulfonate, polyacrylate, copolymer salt of vinyl compound and carboxylic acid monomer, carboxymethyl cellulose Typical examples are polymer aqueous dispersants such as polyvinyl alcohol, polymer non-aqueous dispersants such as polyacrylic acid partial alkyl esters and polyalkylene polyamines, and polymer cationic dispersants such as polyethyleneimine and aminoalkyl methacrylate copolymers. However, as long as it can be suitably applied to the particles of the present invention, those having structures other than those illustrated here are not excluded.

  Specific examples of the dispersants are as follows. However, in the case where the dispersant has the above-mentioned properties, the use of a dispersant other than those described in this section is not excluded. For example, Sanyo Chemical Co., Ltd. Viewlite LCA-H, LCA-25H, etc., Kyoeisha Chemical Co., Ltd., Floren DOPA-15B, etc., Nippon Lubrizol Corporation Solplus AX5, Solsperse 9000, Sol Six 250, etc. EFKA4008 manufactured by Kaadditives, Ajispar PA111 manufactured by Ajinomoto Fine-Techno Co., Ltd., TEXAPHOR-UV21 manufactured by Cognics Japan Co., Ltd. Disparon 1751N, Hi-Blood ED-152, etc. Neos Co., Ltd. FTX-207S, Footage 212P etc., Toagosei Co., Ltd. AS-1100 etc., made by Kao Corporation Acera 2000, KDH-154, MX-2045L, Homogenol L-18, Rheodor SP-010V, etc., Epan U103, Cyanol DC902B, Neugen EA-167, Prisurf A219B, etc. made by Daiichi Kogyo Seiyaku Co., Ltd. Megaface F-477, Sylface SAG503A manufactured by Nissin Chemical Industry Co., Ltd., Dinol 604, SN Spurs 2180 manufactured by San Nopco Co., Ltd., SN Leveler S-906, etc. S-386 manufactured by AGC Seimi Chemical Co., Ltd. Can be illustrated.

  In addition to the dispersant, various additives for improving the stability and printability of the paste may be added. For example, a leveling agent, a viscosity modifier, a rheology control agent, an antifoaming agent, an anti-sagging agent and the like can be mentioned.

<Curing component>
In the present invention, at least three kinds of components are used in combination for thermosetting. With a thermosetting component, a thermosetting resin, an isocyanate compound, and a hardening | curing agent correspond to this. The thermosetting resin can be selected from phenol resin, epoxy resin, unsaturated polyester resin, polyurethane resin, melamine resin, urea resin, silicone resin, and the like.

(A) Epoxy resin An epoxy resin can be suitably used as the thermosetting resin of the present invention. The epoxy resin has an effect of improving the weather resistance of the coating film. Moreover, since it contributes to improving the adhesiveness of a coating film, it is essential for wiring for which adhesion to a substrate is expected. Furthermore, physical properties such as coating strength and water resistance, which are difficult to obtain with an isocyanate compound alone, can be provided.

  As the epoxy resin used in the present invention, either a monoepoxy compound, a polyvalent epoxy compound, or a mixture thereof is used. Monoepoxy compounds include butyl glycidyl ether, hexyl glycidyl ether, phenyl glycidyl ether, allyl glycidyl ether, para-tert-butylphenyl glycidyl ether, ethylene oxide, propylene oxide, paraxyl glycidyl ether, glycidyl acetate, glycidyl butyrate, glycidyl Examples include hexoate and glycidyl benzoate.

Examples of the polyvalent epoxy compound include bisphenol A, bisphenol F, bisphenol AD, bisphenol S, tetramethyl bisphenol A, tetramethyl bisphenol F, tetramethyl bisphenol AD, tetramethyl bisphenol S, tetrabromobisphenol A, and tetrachlorobisphenol A. Bisphenol type epoxy resin obtained by glycidylation of bisphenols such as tetrafluorobisphenol A; epoxy resin obtained by glycidylation of other dihydric phenols such as biphenol, dihydroxynaphthalene and 9,9-bis (4-hydroxyphenyl) fluorene; 1,1,1-tris (4-hydroxyphenyl) methane, 4,4- (1- (4- (1- (4-hydroxyphenyl) -1-methylethyl) pheny ) Ethylidene) Epoxy resin glycidylated trisphenols such as bisphenol; Epoxy resin glycidylated tetrakisphenols such as 1,1,2,2, -tetrakis (4-hydroxyphenyl) ethane; Phenol novolac, Cresol novolac , Novolak-type epoxy resins obtained by glycidylating novolaks such as bisphenol A novolak, brominated phenol novolak, brominated bisphenol A novolak, etc .; Glycidylated aliphatic ether type epoxy resin; ether ester type epoxy resin obtained by glycidylation of hydroxycarboxylic acid such as p-oxybenzoic acid and β-oxynaphthoic acid; phthalic acid, Ester-type epoxy resin obtained by glycidylation of polycarboxylic acid such as terephthalic acid; Glycidyl type such as amine-type epoxy resin such as glycidylated products of amine compounds such as 4,4-diaminodiphenylmethane and m-aminophenol and triglycidyl isocyanurate Examples include epoxy resins and alicyclic epoxides such as 3,4-epoxycyclohexylmethyl-3 ′, 4′-epoxycyclohexanecarboxylate.

  Among the above-described epoxy resins, a polyvalent epoxy compound is preferable from the viewpoint of enhancing storage stability. Among polyvalent epoxy compounds, a glycidyl type epoxy resin having an overwhelmingly high productivity is preferable, and more preferably an epoxy resin obtained by glycidylating polyhydric phenols because of excellent adhesion and heat resistance of a cured product. Is preferred. A bisphenol type epoxy resin is more preferable, and an epoxy resin obtained by glycidylating bisphenol A and an epoxy resin obtained by glycidylating bisphenol F are particularly preferable.

  The resin is preferably in the form of a liquid. The epoxy equivalent is preferably 300 or less. When the epoxy equivalent is a value larger than 300, the composition becomes solid, the resistance value becomes high, and handling is inconvenient when used, which is not preferable.

(B) Isocyanate Compound The conductive paste of the present invention is characterized by using a blocked isocyanate compound as a monomer as the isocyanate compound. Since the shrinkage ratio of the isocyanate compound contributes to an increase in the contact between the silver particles, the conductivity is improved as compared with the paste formed of the epoxy resin alone. In particular, blocked isocyanate compounds are stable at storage and have a constant viscosity during printing and coating because the isocyanate group, which is a reactive group, is coated with a blocking agent at room temperature, so that the reactivity is poor and stable. It is convenient for handling.

  Examples of the isocyanate compound include aliphatic diisocyanate, alicyclic diisocyanate, aromatic diisocyanate, aliphatic triisocyanate, and polyisocyanate. Examples of the aliphatic diisocyanate include ethylene diisocyanate, propylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, and trimethylhexamethylene diisocyanate.

Examples of alicyclic diisocyanates include isophorone diisocyanate, 4-4′-dicyclohexylmethane diisocyanate, norbornane diisocyanate, 1,4-isocyanatocyclohexane, 1,3-bis (isocyanatomethyl) -cyclohexane, 1,3-bis. (2-isocyanatopropyl-2-yl) -cyclohexane and the like can be mentioned. Examples of the aromatic diisocyanate include tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, xylene diisocyanate, 1,5-naphthalene diisocyanate, and the like. Examples of the aliphatic triisocyanate include 1,3,6-triisocyanate methylhexane, 2,6-diisocyanatohexanoic acid-2-isocyanatoethyl and the like.

As the blocking agent for the isocyanate group of the isocyanate, any one having a known constitution can be selected. For example, phenol, caprolactam-based, oxime, active methylene compounds, pyrazole, triazole, N, N 'Est - can be selected diphenylformamidine like. Depending on the dissociation temperature and stability of the blocking agent, the activation temperature and treatment atmosphere can be appropriately adjusted.

  In the present invention, it is preferable to use an isocyanate monomer, but in some cases, a polyisocyanate can also be used. In that case, an isocyanate compound and a polyol may be reacted by a known reaction to form a polyisocyanate. However, in order to increase the contraction rate of the coating film and increase the conductivity, it is preferable that the degree of polymerization is not too large.

  Examples of polyisocyanates that can be used include polymethylene polyphenyl polyisocyanate and polyisocyanates derived from the above diisocyanate compounds. Examples of the polyisocyanate derived from the diisocyanate include isocyanurate type polyisocyanate, burette type polyisocyanate, urethane type polyisocyanate, allophanate type polyisocyanate, and carbodiimide type polyisocyanate.

  The effective isocyanate content of the above-mentioned blocked isocyanate or blocked polyisocyanate is 7.0% by mass or more, preferably 10.0% by mass or more, and more preferably 12.5% by mass or more. The higher this value is, the higher the shrinkage rate of the coating film becomes, so that the conductivity increases and the volume resistivity becomes low. The upper limit is preferably about 30% by mass.

<Calculation of effective isocyanate amount>
The amount of effective isocyanate groups (NCO groups) can be measured by a known method. The calculated effective isocyanate value in the paste is preferably 0.010% by mass or more, preferably 0.015% by mass or more, and more preferably 0.030% by mass or more.

(C) Curing agent A curing agent is added to accelerate the reaction of the epoxy resin and the isocyanate resin and improve the adhesion of the coating film. Known curing agents can be used, and amine, urea, aromatic, imidazole, and acid anhydrides can be used.

  For example, examples of amine-based curing agents include compounds having primary, secondary and / or tertiary amino groups. These can be used in combination.

  Examples of the compound having a primary amino group include methylamine, ethylamine, propylamine, butylamine, ethylenediamine, propylenediamine, hexamethylenediamine, diethylenetriamine, triethylenetetramine, ethanolamine, propanolamine, cyclohexylamine, isophoronediamine, aniline, Toluidine, diaminodiphenylmethane, diaminodiphenylsulfone and the like can be mentioned.

  Examples of the compound having a secondary amino group include dimethylamine, diethylamine, dipropylamine, dibutylamine, dipentylamine, dihexylamine, dimethanolamine, diethanolamine, dipropanolamine, dicyclohexylamine, piperidine, piperidone, diphenylamine, phenyl Examples thereof include methylamine and phenylethylamine.

  Examples of the compound having a tertiary amino group include trimethylamine, triethylamine, benzyldimethylamine, triethylenediamine, 1,8-diazabicyclo (5,4,0) -undecene-7,1,5-diazabicyclo (4, Tertiary amines such as 3,0) -nonene-5; 2-dimethylaminoethanol, 1-methyl-2-dimethylaminoethanol, 1-phenoxymethyl-2-dimethylaminoethanol, 2-diethylaminoethanol, 1-butoxy Amino alcohols such as methyl-2-dimethylaminoethanol, methyldiethanolamine, triethanolamine, N-β-hydroxyethylmorpholine; 2- (dimethylaminomethyl) phenol, 2,4,6-tris (dimethylaminomethyl) phenol Aminopheno such as 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 1-aminoethyl-2-methylimidazole, 1- (2-hydroxy- 3-phenoxypropyl) -2-methylimidazole, 1- (2-hydroxy-3-phenoxypropyl) -2-ethyl-4-methylimidazole, 1- (2-hydroxy-3-butoxypropyl) -2-methylimidazole Imidazoles such as 1- (2-hydroxy-3-butoxypropyl) -2-ethyl-4-methylimidazole; 1- (2-hydroxy-3-phenoxypropyl) -2-phenylimidazoline, 1- (2- Hydroxy-3-butoxypropyl) -2-methylimidazoline, 2-methyl Tyrimidazoline, 2,4-Dimethylimidazoline, 2-Ethylimidazoline, 2-Ethyl-4-methylimidazoline, 2-Benzylimidazoline, 2-Phenylimidazoline, 2- (o-tolyl) -imidazoline, Tetramethylene-bis-imidazoline 1,1,3-trimethyl 1,4-tetramethylene bis imidazoline, 1,3,3 trimethyl 1,4-tetramethylene bis imidazoline, 1,1,3 trimethyl 1,4-tetramethylene bis 4-methyl imidazoline, Imidazolines such as 1,3,3 trimethyl 1,4-tetramethylene bis 4 methyl imidazoline, 1,2 phenylene bis imidazoline, 1,3 phenylene bis imidazoline, 1,4 phenylene bis imidazoline, 1,4 phenylene bis 4 methyl imidazoline, Dimethylaminop Pyramine, diethylaminopropylamine, dipropylaminopropylamine, dibutylaminopropylamine, dimethylaminoethylamine, diethylaminoethylamine, dipropylaminoethylamine, dibutylaminoethylamine, N-methylpiperazine, N-aminoethylpiperazine, diethylaminoethylpiperazine, etc. Secondary aminoamines; aminomercaptans such as 2-dimethylaminoethanethiol, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptopyridine, 4-mercaptopyridine; N, N-dimethylaminobenzoic acid, N, Aminocarboxylic acids such as N-dimethylglycine, nicotinic acid, isonicotinic acid, picolinic acid; N, N-dimethylglycine hydrazide, nicotinic acid hydride Disilazide, and an amino hydrazides such as isonicotinic acid hydrazide.

  As the amine compound, a compound having a tertiary amino group is preferable in order to obtain a conductive paste having excellent storage stability.

Further, the total amount of the curing agent and the thermosetting resin is a thermosetting component (total of the epoxy resin and isocyanate) is from 1 to 15 weight based on the total solid component excluding a solvent (metal component and a thermosetting component) %, Preferably 3 to 10% by mass, and more preferably 5 to 8% by mass. When thermosetting component is larger than this range, excessive since the non-conductive component increases, significantly affecting the volume resistivity and the like. On the other hand, when the amount is less than this range, the adhesion to the substrate is poor and the strength after thermosetting cannot be sufficiently secured, which is not preferable.

  Furthermore, in order to accelerate | stimulate hardening, an acidic compound and a basic compound can be included suitably. Specific examples of the acidic compound include carboxylic acids such as acetic acid, succinic acid and adipic acid, sulfonic acids such as paratoluenesulfonic acid, and acidic phosphate esters such as dioctyl phosphate.

  These acidic compounds can be reacted with an amine compound to improve storage stability. Examples of the amine compound include alkylamines such as ethylamine, diethylamine and triethylamine, and alkanolamines such as ethanolamine, diethanolamine and triethanolamine.

  Specific examples of basic compounds include amine compounds such as triethyleneamine, triethylenediamine, laurylamine, morpholine, diazabicyclocycloundecene, diazabicyclooctane, 1,4-diazabicyclooctane, and dibutyltin. Examples include organotin compounds such as dilaurate and dioctyltin dilaurate, and organic zinc compounds such as zinc octylate and zinc naphthenate metal carboxylates. The addition amount of the curing accelerator is 0.1 to 20% by mass, preferably 0.1 to 10% by mass, based on the total amount of the resin to be blended.

<Manufacture of paste>
The conductive paste according to the present invention is provided through the following production method. For example, silver nanoparticles obtained by the method described in Japanese Patent No. 4344001 are used. With the silver nanoparticles thus obtained, the above-mentioned additives and resins, and optionally a dispersant, are added to the above-mentioned polar solvent. Then, it introduce | transduces into a kneading deaerator and forms the kneaded material of this component. Thereafter, a mechanical dispersion treatment is performed in some cases to form a conductive paste.

  Any known method can be employed under the condition that the mechanical dispersion treatment is not accompanied by significant modification of particles. Specific examples include ultrasonic dispersion, disperse, triple roll mill, ball mill, bead mill, biaxial kneader, self-revolving stirrer, etc., and these can be used alone or in combination to obtain a paste. it can.

<Evaluation of conductive film>
(Calculation of volume resistivity)
Using a metal mask with a thickness of 30 μm, printing was performed on an alumina or polyethylene terephthalate film with a 10 mm □ pattern. The obtained printed circuit board is cured in the atmosphere by a firing furnace (DKM400 manufactured by Yamato Scientific Co., Ltd.). In addition, what was printed on the polyethylene terephthalate board | substrate is 150 degreeC, and what was printed on the alumina board | substrate calculates volume resistivity by hardening for 60 minutes on 210 degreeC temperature conditions.

Specifically, it is calculated as follows. The wire resistance of the wiring formed on the substrate was measured with a four-terminal type resistivity meter (Loresta GP MCP-T610 type manufactured by Mitsubishi Chemical), and the thickness of the wiring was measured with a surface roughness meter (Surfcom 1500D type manufactured by Tokyo Seimitsu Co., Ltd.). Calculated. Finally, the volume resistivity is calculated by the following equation (2).
Volume resistivity (μΩ · cm) = surface resistance (Ω / □) × film thickness (μm) × 100 (2)

(Adhesion evaluation)
Adhesion of wiring is applied so that cellophane tape (made by Nichiban Co., Ltd.) with a width of 24 mm is attached to the wiring formed on the substrate, and after applying a load of about 5 kg, air bubbles between the wiring and the cellophane tape are eliminated. The cellophane tape and the substrate are adhered to each other by removing bubbles. Then, fix the substrate, lift the cellophane tape, peel it off at a speed of about 0.6 seconds, taking care that the angle between the substrate and the tape is about 90 degrees, and there is no peeling of wiring on the tape. If there is not, it is determined that the adhesion is good, and if only part of the edge is peeled off, it is judged that the adhesion is not good, and the wire is disconnected so that the line resistance cannot be measured. It was determined that the property was poor.

  Examples of the present invention and comparative examples will be described in detail below. The metal components for Examples and Comparative Examples are shown in Table 1, the resin components are shown in Table 2, and the results of volume resistivity when cured at 150 ° C. and 210 ° C. are shown in Table 3. FIG. 1 shows the relationship between the volume resistivity at 210 ° C. and the volume resistivity at 150 ° C., and FIG. 2 shows the relationship between the effective isocyanate amount in the paste and the volume resistivity.

<Example 1>
(Synthesis of silver nanoparticles)
In a 500 mL beaker, 13.4 g of silver nitrate (manufactured by Toyo Chemical Co., Ltd.) was dissolved in 72.1 g of pure water to prepare a silver solution.

  Subsequently, 1.34 L of pure water was charged into a 5 L beaker, and nitrogen was passed through for 30 minutes to raise the temperature to 60 ° C. while removing dissolved oxygen. 17.9 g of sorbic acid (manufactured by Wako Pure Chemical Industries, Ltd.) was added. Then, 2.82 g of 28% ammonia water (manufactured by Wako Pure Chemical Industries, Ltd.) was added for pH adjustment. The reaction is started by adding this ammonia water. While stirring this, 5.96 g of hydrous hydrazine (purity 80% / manufactured by Otsuka Chemical Co., Ltd.) was added after 5 minutes from the start of the reaction.

  After 9 minutes from the start of the reaction, a silver solution was added to react. Thereafter, aging was performed for 30 minutes to form silver nanoparticles coated with sorbic acid. Thereafter, the mixture was filtered with No5C filter paper and washed with pure water to obtain silver nanoparticle aggregates. The aggregate was dried in the air at 80 ° C. for 12 hours in a vacuum dryer to obtain an aggregate of dried silver nanoparticle powder. The aggregates obtained in this manner were obtained using the same method in Examples 2 to 4 and Comparative Examples 1 and 2.

(Preparation of thermosetting conductive paste)
42.6 g of the obtained dried powder of sorbic acid-coated silver nanoparticle aggregate (average primary particle size: 100 nm), 5.6 g of terpineol (mixed structural isomers / manufactured by Wako Pure Chemical Industries, Ltd.), liquid bisphenol A type Epoxy resin (828XA (Mitsubishi Chemical Corporation / Epoxy equivalent amount: about 210)) 3.4 g, Blocked isocyanate (DURANATE (registered trademark) SBN-70D (Asahi Kasei Chemicals Corporation, active isocyanate: 10.1% by mass, active ingredient) 70% by mass, isocyanate content in terms of solid content: 14.4% by mass) 4.9 g (in terms of solid content, the same in the following examples / comparative examples), curing agent MY-24 (manufactured by Ajinomoto Fine Techno Co.) 0.7 g , 0.2 g of a polymer pigment dispersant Ajisper PA-111 (manufactured by Ajinomoto Fine Techno Co., Ltd.) was added and mixed. Mixture (confirmed a coating of oleic acid by GC-MS analysis, the average particle diameter D _50: 2.8: silver micron particles) commercially available silver-micron particles of flake shape. Was added and mixed 42.6g Note Here, “in terms of solid content” indicates the amount of resin as an active ingredient.

  The mixture thus obtained was passed five times with a triple roll (22851 Nordestedt type, manufactured by EXAKApparatebaus) to produce a conductive paste. The obtained paste is printed on a substrate and is subjected to conditions of 150 ° C. for 60 minutes (hereinafter referred to as “150 ° C. 60 minutes”) and 210 ° C. for 60 minutes (hereinafter referred to as “210 ° C. 60 minutes”). A conductive film was formed by heat treatment. The volume resistivity of the obtained conductive film was 16.1 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the resistance equivalent to that of Patent Document 1 could be achieved even by heat treatment at a low temperature of 150 ° C. In addition, the volume resistivity of 7.8 μΩ · cm was obtained in the treatment at 210 ° C. for 60 minutes.

<Example 2>
In Example 1, the blending amount was 44.5 g of sorbic acid-coated silver nanoparticle dry powder, 4.6 g of terpineol, 2.1 g of epoxy resin, 3.0 g of blocked isocyanate, 0.4 g of curing agent, and dispersant. Example 1 was repeated except 0.9 g and 44.5 g of flaky silver micron particles.

  The volume resistivity of the obtained conductive film was 9.1 μΩ · cm after treatment at 150 ° C. for 60 minutes, and a resistance lower than that of Patent Document 1 could be achieved even by heat treatment at a low temperature of 150 ° C. Further, in the treatment at 210 ° C. for 60 minutes, a volume resistivity of 8.4 μΩ · cm was obtained.

<Example 3>
In Example 2, Example 2 was repeated except that the amount of the dispersant was changed from 1.0% by mass to 0.25% by mass.

  The volume resistivity of the obtained conductive film was 8.4 μΩ · cm after treatment at 150 ° C. for 60 minutes, and a resistance lower than that of Patent Document 1 could be achieved even by heat treatment at a low temperature of 150 ° C. In addition, the volume resistivity of 4.4 μΩ · cm was obtained by treatment at 210 ° C. for 60 minutes.

  Even if the blending ratio of the dispersant is 0.25% by mass, there is no influence on the dispersibility of the particles. Rather, by reducing the dispersant, the contact point between the particles increases, so that the volume resistivity is It became low.

<Example 4>
In Example 2, commercially available silver particles obtained by making flaky silver micron particles spherical (the oleic acid coating was confirmed by GC-MS analysis: average particle diameter D ₅₀ : 1.0 μm) Were repeated and Example 2 was repeated.

  The volume resistivity of the obtained conductive film was 12.7 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the volume resistivity lower than the volume resistivity shown in Patent Document 1 was achieved even at a low temperature of 150 ° C. did it. Further, in the treatment at 210 ° C. for 60 minutes, the volume resistivity was 10.6 μΩ · cm.

  The reason why the volume resistivity of Example 4 is larger than that of Example 2 is that, when the silver micron particles are in a flake state, the contact area between the particles is large, and thus conduction is easily obtained. This is because the resistivity is decreasing. On the other hand, when the silver micron particles are in a spherical state, the contact point between the particles becomes a point, and a tendency that the volume resistivity is slightly increased is recognized.

  However, by making silver micron particles more spherical than flake powder, it is possible to reduce clogging when wiring is formed by a printing method, and it is thought that finer printing can be performed without loss. It is done.

<Example 5>
In Example 4, Example 4 was repeated except that the mixing ratio of the dispersant was changed from 1.0% by mass to 0.25% by mass.

The volume resistivity of the obtained conductive film was 12.2 μΩ · cm after the treatment at 150 ° C. for 60 minutes, and the volume resistivity lower than the volume resistivity shown in Patent Document 1 was achieved even by heat treatment at a low temperature of 150 ° C. did it. In addition, a treatment with a temperature of 210 ° C. for 60 minutes gave a volume resistivity of 6.8 μΩ · cm. Even when the treatment was performed at 150 ° C. and 210 ° C., the adhesion to the coating film was high, and a product without peeling from the substrate was obtained. Even when spherical powder was used as the silver micron particles, a decrease in volume resistivity could be confirmed by reducing the blending ratio of the dispersant.

<Example 6>
In Example 3, the silver nanoparticles to be blended were changed to dry powder of sorbic acid-coated silver nanoparticles whose average primary particle size was changed from 100 nm to 60 nm, and the blending amounts were 43.8 g of silver nanoparticles, 6.7 g of terpineol, Example 3 was repeated except that 43.8 g of flaky silver micron particles were used.

  The volume resistivity of the obtained conductive film was 18.9 μΩ · cm after treatment at 150 ° C. for 60 minutes, which is higher than that of Example 3, but equivalent to the volume resistivity shown in Patent Document 1. Can also be achieved by heat treatment at a low temperature of 150 ° C. Further, in the treatment at 210 ° C. for 60 minutes, a volume resistivity value of 9.9 μΩ · cm was obtained.

<Example 7>
A conductive paste was prepared using silver nanoparticles (average primary particle size: 200 nm) prepared by changing the organic material to be coated in the silver nanoparticle synthesis stage of Example 1 from sorbic acid to butanoic acid. Example 2 was repeated except that the blending amount was 44.3 g of butanoic acid-coated silver nanoparticle dry powder, 5.0 g of terpineol, and 44.3 g of flaky silver micron particles.

  The volume resistivity of the obtained conductive film was 17.1 μΩ · cm when treated at 150 ° C. for 60 minutes, and the volume resistivity equivalent to the volume resistivity shown in Patent Document 1 was achieved even at a low temperature of 150 ° C. did it. In addition, the volume resistivity of 11.4 μΩ · cm was obtained in the treatment at 210 ° C. for 60 minutes.

<Example 8>
A conductive paste was prepared using silver nanoparticles (average primary particle size: 200 nm) prepared by changing the organic material to be coated in the particle synthesis stage of Example 1 from sorbic acid to lactic acid. Example 2 was repeated except that the blending amount was 44.1 g of lactic acid-coated silver nanoparticle dry powder, 5.4 g of terpineol, and 44.1 g of flaky silver micron particles.

  The volume resistivity of the obtained conductive film was 16.9 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the volume resistivity equivalent to the volume resistivity shown in Patent Document 1 was achieved even at a low temperature heat treatment of 150 ° C. did it. In addition, the volume resistivity was 11.3 μΩ · cm after treatment at 210 ° C. for 60 minutes.

<Example 9>
In Example 3, Example 3 was repeated except that the effective isocyanate (mass%) in terms of solid content was changed to MF-B60X (manufactured by Asahi Kasei Chemical Co., Ltd.) having 13.3% by mass. The volume resistivity of the obtained conductive film was 18.3 μΩ · cm when treated at 150 ° C. for 60 minutes, and the volume resistivity equivalent to the volume resistivity shown in Patent Document 1 was achieved even at a low temperature of 150 ° C. did it. In addition, the volume resistivity of 11.6 μΩ · cm was obtained in the treatment at 210 ° C. for 60 minutes.

<Example 10>
In Example 3, Example 3 was repeated except that it was changed to E402-B80T (made by Asahi Kasei Chemical Co., Ltd.) whose effective isocyanate (mass%) in terms of solid content was 7.5 mass%. The volume resistivity of the obtained conductive film was 26.2 μΩ · cm after treatment at 150 ° C. for 60 minutes. In addition, the volume resistivity of 19.2 μΩ · cm was obtained in the treatment at 210 ° C. for 60 minutes.

<Example 11>
In Example 1, the addition amount of sorbic acid-coated silver nanoparticles was 44.6 g, the addition amount of flaky silver particles was 44.6 g, the epoxy resin was 1.3 g, the blocked isocyanate was 1.7 g, and other addition amounts Were obtained in the same manner as described in Table 2 to obtain a paste. The volume resistivity of the obtained conductive film is shown in Table 3.

<Examples 12 to 16>
For the paste, flaky carbon (UF-G30 manufactured by Showa Denko KK) was added as an extender for Examples 12-13, and flaky glass particles (fine flakes manufactured by Nippon Sheet Glass Co., Ltd.) were added for Examples 14-16. did. Each compounding ratio was shown according to Tables 1-2. The volume resistivity of the obtained conductive film is shown in Table 3.

<Examples 17 to 22>
Example 1 was repeated except that the blending ratio in the paste was changed as shown in Tables 1-2. The volume resistivity of the obtained conductive film is shown in Table 3.

<Comparative Example 1>
In Example 1, silver nanoparticles were not used, and only silver micron particles were used. Further, 3.3 g of terpineol, 3.5 g of epoxy resin, 5.0 g of blocked isocyanate, 0.7 g of curing agent, and 0.2 g of dispersing agent were changed. The flaky silver micron particles were 87.3 g. Except these, Example 1 was repeated.

  The volume resistivity of the obtained conductive film was 46.6 μΩ · cm after treatment at 150 ° C. for 60 minutes, confirming that the volume resistivity was high. Furthermore, the volume resistivity is 31.6 μΩ · cm in the treatment at 210 ° C. for 60 minutes, which is a high temperature treatment. However, the volume resistivity is higher than the volume resistivity shown in Patent Document 1.

<Comparative example 2>
The organic substance to be coated in the particle synthesis step of Example 1 was changed from sorbic acid to hexanoic acid, and a particularly fine particle size was selected (average primary particle size: 20 nm) to prepare a conductive paste. The blending amounts at that time were 41.0 g of hexanoic acid-coated silver nanoparticle dry powder, 12.2 g of terpineol, 1.9 g of epoxy resin, 2.7 g of blocked isocyanate, 0.4 g of curing agent, and 0 dispersant. Example 2 was repeated except that .8 g and flaky silver micron particles 41.0 g.

  The volume resistivity of the obtained conductive film was 359.0 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the conductivity was poor. Further, the treatment at 210 ° C. for 60 minutes showed a volume resistivity of 24.0 μΩ · cm and a relatively low volume resistivity, but it was higher than that of the example.

<Comparative Example 3>
In Example 1, 42.0 g of sorbic acid-coated silver nanoparticle dry powder, 3.8 g of terpineol, and a 50% diluted product of bisphenol A type epoxy resin 1001 that is solid from liquid 828XA (Japan Epoxy Resin Co., Ltd.) 6.6 g, 4.7 g of blocked isocyanate, 0.7 g of curing agent, 0.2 g of dispersant, and flaky silver micron particles 42. and 0g, was repeated a real Example 1.

  The volume resistivity of the obtained conductive film was 555.4 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the volume resistivity was 17.8 μΩ · cm after treatment at 210 ° C. for 60 minutes. By selecting a large epoxy equivalent epoxy resin, it is difficult for silver contact to occur, and even if a conductive paste is made using flake powder that is easy to ensure relatively high conductivity, volume resistivity Turned out to be expensive.

<Comparative example 4>
In Example 1, 44.4 g of sorbic acid-coated silver nanoparticle dry powder, 5.7 g of terpineol, 2.1 g of epoxy resin, and blocked isocyanate from SBN-70D to RUP-1840 (available from DIC, effective isocyanate) : 2.0% by mass, solvent-free type) Example 1 was repeated except that 2.1 g, a curing agent 0.4 g, a dispersing agent 0.9 g, and flaky silver micron particles 44.4 g were used.

  The volume resistivity of the obtained conductive film was 361.2 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the volume resistivity was 182.2 μΩ · cm after treatment at 210 ° C. for 60 minutes. If a low effective isocyanate amount is selected, the amount of effective isocyanate contained in the paste will be small, and even if a conductive paste is made using flake powder that is easy to ensure relatively high conductivity, volume resistance The rate was high. As is apparent from the present example, in the combined use of the silver nanoparticle and silver micron particle conductive paste as in the present invention, it is desirable to increase the effective isocyanate as much as possible when using the epoxy resin and the isocyanate together. Conceivable. Therefore, it can be concluded that it is difficult to obtain the effect of the present invention with a polyisoisocyanate in which an isocyanate often used in the past is reacted with a polyol.

<Comparative Example 5>
In Example 1, 44.1 g of sorbic acid-coated silver nanoparticle dry powder, 8.4 g of terpineol, 2.1 g of epoxy resin, no added blocked isocyanate, 0.4 g of curing agent, 0.9 g of dispersing agent, Example 1 was repeated except that 44.1 g of flaky silver micron particles were used.

  The volume resistivity of the obtained conductive film was 123.0 μΩ · cm after treatment at 150 ° C. for 60 minutes, and the volume resistivity was 119.0 μΩ · cm after treatment at 210 ° C. for 60 minutes. Even with epoxy resin alone, contact with silver is less likely to occur, and even if conductive paste is made using flake powdered silver micron particles that are easy to ensure relatively high conductivity, volume resistivity may be high. Recognize.

<Comparative Example 6>
Example 12 (Example 1 as operation) was repeated except that the amount of flaky carbon to be added was increased and the amounts of ingredients were shown in Tables 1-2. The volume resistivity of the obtained conductive film is shown in Table 3.

  FIG. 1 shows the relationship between the volume resistivity when cured at 210 ° C. and the volume resistivity when cured at 150 ° C. In FIG. 1, the horizontal axis represents the volume resistivity when cured at 210 ° C., and the vertical axis represents the volume resistivity when cured at 150 ° C. The vertical axis is a logarithm, and the upward direction of the axis is a small value. In the graph, white circles are examples of the present invention, and black squares are comparative examples. It can be seen that the volume resistivity at the time of curing at 210 ° C. is lower than that of the comparative example, and that the volume resistivity at 150 ° C. is remarkably reduced.

  FIG. 2 shows the relationship between the amount of effective isocyanate contained in the paste when the type of blocked isocyanate is changed in paste preparation and the volume resistivity when cured under a processing condition of 150 ° C. The vertical axis is a logarithm, and the upward direction of the axis is a small value. In the graph, white circles are examples of the present invention, and black squares are comparative examples. It can be seen that in the blocked isocyanate used in the paste, the volume resistivity decreases by an order of magnitude as the amount of effective isocyanate increases.

  The conductive paste according to the present invention is excellent in printability when forming fine wiring and adhesion to a substrate, and has a very low specific resistance value of wiring and can obtain very good conductivity. Therefore, it can be used for formation of a fine circuit of a small electronic device, electromagnetic wave shielding, and the like.

Claims (7)

A thermosetting conductive paste comprising a metal component, a thermosetting component, and a solvent, wherein the metal component has an average primary particle size of 60 nm to 200 nm, and is any one of sorbic acid, butanoic acid, and lactic acid Is composed of metal nanoparticles (MA) having an average particle size of 0.5 μm to 10.0 μm, and the thermosetting component is at least an epoxy resin and a blocked isocyanate. and it includes a curing agent state, and are ratios of the active isocyanate least 0.16 wt% of the paste in the blocked isocyanate,
When cured at 0.99 ° C., thermosetting conductive paste volume resistivity is characterized by the following der Rukoto 8.4μΩ · cm or more 34.9μΩ · cm.   The thermosetting conductive paste according to claim 1, wherein the blocked isocyanate is formed by blocking an isocyanate monomer.   The thermosetting conductive paste according to claim 1, wherein an epoxy equivalent of the epoxy resin is 300 or less. In the compounding ratio of the metal nanoparticles (MA) and the metal-micron particles (MB) (MA / MB) mass ratio is the ratio of from 90/10 10/90 and thermosetting component (curing agent and a thermosetting 4. The heat according to claim 1, wherein the mixing ratio of the functional resin and the blocked isocyanate ) to the total solid component (metal component and thermosetting component) is 1/100 to 15/100 in mass ratio. A curable conductive paste.   Furthermore, the thermosetting conductive paste in any one of Claims 1 thru | or 4 with which the dispersing agent contained 0.1-6.0 mass% with respect to the amount of metal nanoparticles. Wiring board formed using any of thermosetting conductive paste of claims 1 to 5. Sometimes work made of thermosetting conductive paste according to claim 1, blocked isocyanate added is effective isocyanate content uses not less than 7.0 mass%, the production method of the thermosetting conductive paste.