JP5979143B2 - 光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他 - Google Patents

光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他 Download PDF

Info

Publication number
JP5979143B2
JP5979143B2 JP2013522537A JP2013522537A JP5979143B2 JP 5979143 B2 JP5979143 B2 JP 5979143B2 JP 2013522537 A JP2013522537 A JP 2013522537A JP 2013522537 A JP2013522537 A JP 2013522537A JP 5979143 B2 JP5979143 B2 JP 5979143B2
Authority
JP
Japan
Prior art keywords
film thickness
optical film
interference
optical
laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013522537A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2013001955A1 (ja
Inventor
泉谷　直幹
直幹 泉谷
治 柏崎
治 柏崎
新　勇一
勇一 新
忠宣 関矢
忠宣 関矢
由佳 吉原
由佳 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP2013522537A priority Critical patent/JP5979143B2/ja
Publication of JPWO2013001955A1 publication Critical patent/JPWO2013001955A1/ja
Application granted granted Critical
Publication of JP5979143B2 publication Critical patent/JP5979143B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N2021/7769—Measurement method of reaction-produced change in sensor
    • G01N2021/7779—Measurement method of reaction-produced change in sensor interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2013522537A 2011-06-27 2012-05-28 光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他 Expired - Fee Related JP5979143B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013522537A JP5979143B2 (ja) 2011-06-27 2012-05-28 光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2011141348 2011-06-27
JP2011141348 2011-06-27
JP2012001095 2012-01-06
JP2012001095 2012-01-06
PCT/JP2012/063588 WO2013001955A1 (fr) 2011-06-27 2012-05-28 Procédé, système et programme de mesure de l'épaisseur d'un film optique, et ainsi de suite
JP2013522537A JP5979143B2 (ja) 2011-06-27 2012-05-28 光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他

Publications (2)

Publication Number Publication Date
JPWO2013001955A1 JPWO2013001955A1 (ja) 2015-02-23
JP5979143B2 true JP5979143B2 (ja) 2016-08-24

Family

ID=47423856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013522537A Expired - Fee Related JP5979143B2 (ja) 2011-06-27 2012-05-28 光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他

Country Status (2)

Country Link
JP (1) JP5979143B2 (fr)
WO (1) WO2013001955A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2028497B1 (en) * 2021-06-21 2022-12-29 Delmic Ip B V Method and apparatus for micromachining a sample using a Focused Ion Beam

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3786073B2 (ja) * 2002-10-10 2006-06-14 株式会社日立製作所 生化学センサ用キットおよび測定装置
JP4622564B2 (ja) * 2005-02-10 2011-02-02 凸版印刷株式会社 膜厚測定方法
WO2010013325A1 (fr) * 2008-07-30 2010-02-04 株式会社ニレコ Spectrophotomètre
EP2546632B1 (fr) * 2010-03-12 2016-11-16 Konica Minolta Opto, Inc. Procédé et dispositif de détection d'interactions moléculaires utilisant la spectroscopie interférentielle à réflexion
US20130267034A1 (en) * 2010-12-15 2013-10-10 Naoki Izumiya Intermolecular interaction measurement method, measurement system for use in the method, and program

Also Published As

Publication number Publication date
JPWO2013001955A1 (ja) 2015-02-23
WO2013001955A1 (fr) 2013-01-03

Similar Documents

Publication Publication Date Title
JP5890398B2 (ja) 改良されたセンサ測定方法
JP5704163B2 (ja) 分子間相互作用の検出方法およびその検出装置
JP5146311B2 (ja) 表面プラズモン共鳴センサ用チップおよび表面プラズモン共鳴センサ
WO2012081445A1 (fr) Procédé de mesure d'interaction intermoléculaire, système de mesure à utiliser dans le procédé, et programme
RU2519505C2 (ru) Сенсорное устройство для определения целевого вещества
WO2006135309A9 (fr) Procede et systeme d'analyse par affinite
WO2014061408A1 (fr) Procédé permettant de mesurer l'épaisseur d'une pellicule optique, système permettant de mesurer l'épaisseur d'une pellicule optique et programme permettant de mesurer l'épaisseur d'une pellicule optique
JP5683606B2 (ja) 相互作用の分析のための方法及びシステム
JP5714023B2 (ja) 結合の挙動の分析のための方法及びシステム
JP5979143B2 (ja) 光学膜厚測定方法、光学膜厚測定システム及び光学膜厚測定プログラム他
de Souza Filho et al. Smartphone based, portable optical biosensor utilizing surface plasmon resonance
CN111033234B (zh) 测量装置及测量方法
WO2014046156A1 (fr) Procédé de mesure d'interaction intermoléculaire, procédé de mesure d'épaisseur de film optique, système de mesure et programme de mesure
CN101660997B (zh) 一种降低背景干扰的表面等离子共振传感器及其检测方法
JP4173746B2 (ja) 測定装置
JP2012150076A (ja) 分子間相互作用の測定システム、分子間相互作用の測定プログラム、及び、分子間相互作用の測定方法
Sharma Model of a plasmonic phase interrogation probe for optical sensing of hemoglobin in blood samples
Ling et al. Thin film thickness variation measurement using dual LEDs and reflectometric interference spectroscopy model in biosensor
CN203405410U (zh) 角度调制与波长调制spr共用系统
WO2013146249A1 (fr) Procédé de mesure du point isoélectrique et puce de détection, dispositif de mesure, système de mesure et programme à cet effet
Chinowsky et al. Data analysis and calibration for a bulk-refractive-index-compensated surface plasmon resonance affinity sensor
Piliarik et al. Compact multi-channel high-sensitivity biosensor based on spectroscopy of surface plasmons
Wan Ahamad et al. Modular surface plasmon resonance (spr) biosensor based on wavelength modulation
WO2022061220A1 (fr) Procédés optiques réflectométriques insensibles à l'arrière-plan et systèmes les utilisant
RO137472A2 (ro) Metodă de creştere a sensibilităţii analizelor care utilizează ghiduri optice de undă

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150311

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160405

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160603

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160628

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160711

R150 Certificate of patent or registration of utility model

Ref document number: 5979143

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees