WO2013001955A1 - Procédé, système et programme de mesure de l'épaisseur d'un film optique, et ainsi de suite - Google Patents

Procédé, système et programme de mesure de l'épaisseur d'un film optique, et ainsi de suite Download PDF

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Publication number
WO2013001955A1
WO2013001955A1 PCT/JP2012/063588 JP2012063588W WO2013001955A1 WO 2013001955 A1 WO2013001955 A1 WO 2013001955A1 JP 2012063588 W JP2012063588 W JP 2012063588W WO 2013001955 A1 WO2013001955 A1 WO 2013001955A1
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Prior art keywords
film thickness
optical film
interference
laminate
optical
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PCT/JP2012/063588
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English (en)
Japanese (ja)
Inventor
泉谷　直幹
治 柏崎
新　勇一
忠宣 関矢
由佳 吉原
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コニカミノルタアドバンストレイヤー株式会社
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Priority to JP2013522537A priority Critical patent/JP5979143B2/ja
Publication of WO2013001955A1 publication Critical patent/WO2013001955A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N2021/7769—Measurement method of reaction-produced change in sensor
    • G01N2021/7779—Measurement method of reaction-produced change in sensor interferometric

Definitions

  • the present invention relates to an optical film thickness measurement method, an optical film thickness measurement system, and an optical film thickness measurement program using reflection interference spectroscopy.
  • a substrate 102 provided with an optical thin film 104 is used.
  • the spectral intensity of the white light itself is represented by a solid line 106 as shown in a typical example of FIG. Is represented by a solid line 108.
  • a reflection spectrum 110 having a bottom peak (minimum portion in the spectrum curve) represented by a solid line is obtained as shown in FIG.
  • the ligand 120 is provided on the optical thin film 104 as shown in FIG. 12B.
  • the optical thickness 112 at the site where the ligand 120 is provided changes, the optical path length changes, and the interference wavelength also changes due to the reflection interference effect. That is, the peak position of the spectral intensity distribution of the reflected light is shifted, and as a result, the reflected spectrum 110 is shifted to the reflected spectrum 122 (see the dotted line portion) as shown in FIG.
  • the sample solution is allowed to flow on the optical thin film 104, the ligand 120 and the analyte 130 in the sample solution are bonded as shown in FIG. 12C.
  • the optical thickness 112 at the site where the analyte 130 is bonded further changes.
  • the analyte 130 partially adheres to the ligand 120 to generate a heterogeneous layer.
  • This macroscopic layer is macroscopically determined to have a predetermined optical thickness corresponding to the amount of the analyte 130 deposited. It is replaced with a homogeneous layer having a thickness. Accordingly, the optical thickness of the homogeneous layer through which incident light passes changes depending on the amount of the analyte 130 attached. As a result, as shown in FIG. 14, the reflection spectrum 122 is shifted to the reflection spectrum 132 (see the chain line).
  • the presence or absence of the intermolecular interaction can be detected. Further, by detecting the amount of change in the bottom peak wavelength of the reflection spectrum 132 with respect to the bottom peak wavelength of the reflection spectrum 122, the progress of the intermolecular interaction can be detected.
  • the change in the bottom peak wavelength due to the ligand 120 can be confirmed at the time point 140, which is the first shoulder portion on the curve, as shown in FIG.
  • the time 142 which is the second shoulder portion above, a change in the bottom peak wavelength due to the binding between the ligand 120 and the analyte 130 can be confirmed.
  • the method of observing the transition of the change in bottom peak wavelength over time has a limit in measurement accuracy due to the measurement principle, and the progress of intermolecular interaction is more accurately determined.
  • the overall rate of binding Increases uniformly, that is, the progress of intermolecular interaction increases with time as shown in FIG. 16A.
  • the data that is actually output by the detection device that detects the spectral intensity of the reflected light repeats minute fluctuations, such as reflectance data 151 shown in FIG. 17, for example.
  • An operation such as fitting the approximate curve 152 to the reflectance data 151 to calculate the approximate curve 152 and obtaining the minimum value of the approximate curve as the above-described bottom peak position is required.
  • the change in reflectance is small near the bottom peak, the method of determining the bottom peak position using the approximate curve as described above tends to make the bottom peak position inaccurate in principle. This is disadvantageous when it is required to calculate the progress of the interaction with higher accuracy.
  • the change amount ⁇ of the bottom peak wavelength may change differently from the progress of the intermolecular interaction, as shown in FIG. 16B. In such a case, the change amount ⁇ of the bottom peak wavelength. Is not suitable as a value for accurately determining the progress of intermolecular interaction.
  • the method of tracking the change amount ⁇ of the bottom peak wavelength tracks only one point on the graph of the spectral characteristic of the reflected light, does not capture the overall shift of the graph, and accurately changes There is a limit to catching it.
  • a high-performance calculation device or a complicated calculation is required, or the calculation cannot catch up in a case where the intermolecular interaction proceeds rapidly. There is also a concern.
  • the present inventors have focused on the extreme value of the spectral characteristics of the detected light, and found that this extreme value shows a certain change tendency according to the thickness of the interference film.
  • the present inventors have found a method for measuring the optical path length of the interference film, that is, the optical film thickness of the interference film. According to this method, it is possible to measure the optical film thickness as well as the film formed by the intermolecular interaction, and if there is a change in the optical film thickness over time like the intermolecular interaction, It is also possible to detect and measure the changed optical film thickness. That is, in the measurement of the intermolecular interaction, when the ligand and the analyte are bonded, the amount of change in the optical film thickness at the site where the analyte is bonded can be measured.
  • the present invention measures the optical film thickness of the interference film by reflection interference spectroscopy, and if there is a change in the optical film thickness of the interference film, the optical film that can measure the changed optical film thickness It is an object to provide a thickness measurement method, an optical film thickness measurement system, and an optical film thickness measurement program.
  • the invention according to claim 1 for solving the above-described problems is an optical film thickness in which an optical film thickness of an interference film in a laminate in which one or two or more interference films are laminated on a substrate is measured by reflection interference spectroscopy.
  • a measuring method In advance, a relationship between the optical film thickness and the wavelength that gives the extreme value of the spectral reflectance in the laminate with the known optical film thickness of the interference film is created for different optical film thicknesses, Measured by identifying the optical film thickness that approximates the wavelength that gives the extreme value by applying the wavelength that gives the extreme value of the spectral reflectance in the laminate to be measured obtained by reflection interference spectroscopy to the above relationship. It is an optical film thickness measuring method for obtaining an optical film thickness in the target laminate.
  • the optical film thickness of the molecules adsorbed on the interference film is reduced by the intermolecular interaction performed on the interference film of the laminate in which one or more interference films are laminated on the substrate.
  • An optical film thickness measuring method for measuring by reflection interference spectroscopy In advance, Spectral reflectance in the first laminate in which the first interference film having a known optical thickness is laminated; Spectral reflectance in a second laminate in which a second interference film having a known optical thickness is laminated on the interference film of the first laminate, and The relationship between the wavelength that gives the extreme value of the amount of change in the spectral reflectance of the second laminate relative to the spectral reflectance of the first laminate and the optical thickness of the second interference film is different from the optical thickness of the second interference film.
  • Spectral reflectance before the start of intermolecular interaction of the laminate to be measured is obtained by reflection interference spectroscopy, and spectral reflectance after initiation of intermolecular interaction of the laminate to be measured by reflection interference spectroscopy And applying the wavelength that gives the extreme value of the change amount before the start to the relationship, and identifying the optical film thickness of the second interference film that approximates the wavelength that gives the extreme value,
  • the invention according to claim 3 is that when a maximum value and a minimum value appear as the extreme value in a predetermined wavelength band, the maximum value and the minimum value, and when there are a plurality of the maximum values, the plurality of maximum values. 2, when there are a plurality of the minimum values, the relationship is created for the plurality of minimum values, and the identification is performed by obtaining each of the extreme values from the laminate to be measured by reflection interference spectroscopy.
  • the invention according to claim 4 is the optical film thickness measuring method according to any one of claims 1 to 3, wherein the relationship is created by a function.
  • the invention according to claim 5 is the optical film thickness measuring method according to claim 4, wherein the function is a quadratic function, and the quadratic function is created for each extreme value.
  • the identification is performed by specifying an optical film thickness that approximates the wavelength that gives the extreme value, and the optical film thickness to be obtained is estimated from the optical film thickness that is most approximated.
  • the optical film thickness measuring method according to any one of claims 1 to 5.
  • the spectral reflectance of the reflected light from the laminate is obtained by irradiating the laminate to be measured with white light by reflection interference spectroscopy. It is an optical film thickness measuring method as described in any one.
  • Invention of Claim 8 is the optical film thickness measuring method as described in any one of Claim 1-7 which measures in the state which the liquid layer covers on the said interference film
  • the invention according to claim 10 is directed to the molecular film thickness obtained by the optical film thickness measurement method according to claim 2 and the optical dimension in the specific direction for a molecule whose optical size in the specific direction is known. Is a molecular direction estimation method for estimating the direction of molecules adsorbed on the interference film by the intermolecular interaction with respect to the interference film.
  • the invention according to claim 11 compares the film thickness of the molecule determined by the film thickness measurement method according to claim 9 and the size in the specific direction for molecules whose size in the specific direction is known.
  • This is a molecular direction estimation method for estimating the direction of molecules adsorbed on an interference film by intermolecular interaction with respect to the interference film.
  • the invention described in claim 12 is obtained by the optical film thickness measuring method according to claim 2 for each different time point when environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment where the molecule is placed have changed.
  • This is an optical film thickness measurement method that records the environmental variable in association with the optical film thickness of the molecule.
  • the invention according to claim 13 is a molecule obtained by the film thickness measurement method according to claim 9 for each different time point when environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment where the molecule is placed have changed.
  • the film thickness measurement method records the environmental variable in association with the film thickness.
  • the invention according to claim 14 is an optical film thickness measurement system for measuring an optical film thickness of an interference film in a laminate in which one or more interference films are laminated on a substrate by reflection interference spectroscopy.
  • a light source Irradiating means for irradiating the laminate with light from the light source;
  • a light receiving means for receiving reflected light from the laminate;
  • Spectral detection means for detecting spectral characteristics of reflected light received by the light receiving means;
  • Pre-store data composed by creating a relationship between the optical film thickness and the wavelength that gives the extreme value of the spectral reflectance in the laminate having a known optical film thickness of the interference film for the different optical film thicknesses.
  • Storage means for Based on the spectral characteristics detected by the spectral detection means, for the spectral reflectance in the laminate to be measured, the wavelength that gives the extreme value of the spectral reflectance is specified and applied to the data stored in the storage means Calculating the optical film thickness in the laminate to be measured by identifying the optical film thickness that approximates the wavelength giving the extreme value; and Is an optical film thickness measurement system.
  • the invention according to claim 15 is the optical film thickness of the molecules adsorbed on the interference film by the intermolecular interaction performed on the interference film of the laminate in which one or more interference films are laminated on the substrate.
  • An optical film thickness measurement system for measuring by reflection interference spectroscopy, A light source; Irradiating means for irradiating the laminate with light from the light source; A light receiving means for receiving reflected light from the laminate; Spectral detection means for detecting spectral characteristics of reflected light received by the light receiving means; The spectral reflectance in the first laminated body in which the first interference film having a known optical film thickness is laminated in advance, and the second interference film in which the second optical film having a known optical film thickness is laminated on the interference film of the first laminated body.
  • the relationship between the wavelength that gives the extreme value of the amount of change in the spectral reflectance of the second laminated body relative to the spectral reflectance of the first laminated body and the optical film thickness of the second interference film Is stored in advance for the optical film thicknesses of different second interference films, and based on the spectral characteristics detected by the spectral detection means, the molecules of the laminate to be measured
  • the wavelength that gives the extreme value of the amount of change in the spectral reflectance after the start of the intermolecular interaction of the laminate to be measured with respect to the spectral reflectance before the start of the intermolecular interaction is specified and stored in the storage means Applied to the above data Calculation means for determining the optical film thickness of the molecules adsorbed on the interference film by the intermolecular interaction in the laminate to be measured by identifying the optical film thickness of the second interference film whose wavelength giving the extreme value approximates When, Is an optical film thickness measurement system.
  • the invention according to claim 17 is the optical film thickness measurement system according to any one of claims 14 to 16, wherein the light source is a light source that emits white light.
  • a member that forms a flow path on the interference film and a liquid that includes molecules that interact with the molecules connected to the flow path and provided on the interference film are supplied to the flow path.
  • the invention according to claim 19 includes the optical film thickness measurement system according to claim 15, and the molecular film thickness obtained by the optical film thickness measurement system according to claim 15 is calculated for a molecule having a known refractive index. It is a film thickness measuring system further comprising a film thickness calculating means for obtaining the film thickness of the molecule by dividing by the refractive index of the molecule.
  • the invention according to claim 20 includes the optical film thickness measurement system according to claim 15, and the molecules obtained by the optical film thickness measurement system according to claim 15 for molecules whose optical size in a specific direction is known.
  • Molecular direction further comprising molecular direction estimation means for estimating the direction of molecules adsorbed on the interference film by intermolecular interaction with respect to the interference film by comparing the optical film thickness of the film with the optical size in the specific direction It is an estimation system.
  • the invention according to claim 21 includes the film thickness measurement system according to claim 19, and the molecular film thickness obtained by the film thickness measurement system according to claim 19 is determined for a molecule whose size in a specific direction is known.
  • the molecular direction estimation system further comprising molecular direction estimation means for estimating the direction of molecules adsorbed on the interference film by intermolecular interaction with respect to the interference film by comparing with the size of the specific direction.
  • the invention according to claim 22 includes the molecular optical film thickness obtained by the calculation means at different time points when environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment where the molecule is placed are changed.
  • the invention according to claim 23 is the molecular thickness obtained by the film thickness calculating means at different time points when environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment where the molecule is placed are changed.
  • an optical film thickness for causing a computer to execute a process of measuring an optical film thickness of an interference film in a laminate in which one or two or more interference films are stacked on a substrate by reflection interference spectroscopy.
  • a measurement program Read out the data constructed by creating the relationship between the optical film thickness and the wavelength giving the extreme value of the spectral reflectance in the laminate with the known optical film thickness of the interference film in advance.
  • a calculation process for obtaining an optical film thickness in the laminate to be measured Is an optical film thickness measurement program for causing the computer to execute.
  • the optical film thickness of the molecules adsorbed on the interference film is reduced by the intermolecular interaction performed on the interference film of the laminate in which one or more interference films are laminated on the substrate.
  • An optical film thickness measurement program for causing a computer to execute processing to be measured by reflection interference spectroscopy, In advance, Spectral reflectance in the first laminate in which the first interference film having a known optical thickness is laminated; Spectral reflectance in a second laminate in which a second interference film having a known optical thickness is laminated on the interference film of the first laminate, and The relationship between the wavelength that gives the extreme value of the amount of change in the spectral reflectance of the second laminate relative to the spectral reflectance of the first laminate and the optical thickness of the second interference film is different from the optical thickness of the second interference film.
  • a process of reading out data configured by creating in advance; Spectral reflectance before the start of intermolecular interaction of the laminate to be measured is obtained by reflection interference spectroscopy, and spectral reflectance after initiation of intermolecular interaction of the laminate to be measured by reflection interference spectroscopy And identifying the optical film thickness of the second interference film that approximates the wavelength that gives the extreme value by specifying the wavelength that gives the extreme value of the change amount before the start, A calculation process for obtaining the optical film thickness of the molecules adsorbed on the interference film by the intermolecular interaction in the laminate of Is an optical film thickness measurement program for causing the computer to execute.
  • the invention according to claim 26 comprises the optical film thickness measurement program according to claim 25, and for molecules having a known refractive index, the molecules obtained by the computer based on the optical film thickness measurement program according to claim 25. It is a film thickness measurement program for causing the computer to further execute a film thickness calculation process for obtaining the film thickness of the molecule by dividing the optical film thickness by the refractive index of the molecule.
  • the invention according to claim 27 comprises the optical film thickness measurement program according to claim 25, and the molecule having a known optical size in a specific direction is based on the optical film thickness measurement program according to claim 25.
  • Molecular direction estimation processing for estimating the direction of molecules adsorbed on the interference film by intermolecular interaction by comparing the optical film thickness of the molecule obtained by the computer and the optical size in the specific direction. Is a molecular direction estimation program for causing the computer to execute.
  • the invention according to claim 28 is provided with the film thickness measurement program according to claim 26, and the computer obtains a molecule whose size in a specific direction is known based on the film thickness measurement program according to claim 26. By comparing the film thickness of the molecule and the size of the specific direction, the computer further executes a molecular direction estimation process for estimating the direction of the molecule adsorbed on the interference film by the intermolecular interaction with respect to the interference film. Is a molecular orientation estimation program.
  • the invention according to claim 29 is the optical film thickness of the molecules obtained by the computer by the arithmetic processing at different time points when environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment where the molecules are placed are changed. 26.
  • the invention according to claim 30 is the molecular film obtained by the computer by the film thickness calculation process at different time points when environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment in which the molecule is placed are changed. 27.
  • the optical film thickness of the interference film can be measured.
  • the inventions according to claims 2, 15, and 25 there is a change in the optical film thickness of the interference film due to intermolecular interaction.
  • the optical film thickness corresponding to the change can be measured.
  • standard film thickness It is a graph which shows the relationship between the sample film thickness d obtained by simulation, and the extreme value position wavelength of the spectral reflectance R.
  • FIG. 9 is a graph created from the graph of FIG. 8 by converting the horizontal axis to optical path length (optical film thickness) nd and the vertical axis to 1000 / ⁇ . It is a graph which shows the relationship between the sample film thickness d obtained by simulation, and the extreme position wavelength of spectral reflectance change amount (DELTA) R.
  • 11 is a graph created from the graph of FIG.
  • intermolecular interaction measurement system 1 which is an embodiment for carrying out the optical film thickness measurement system of the present invention.
  • the intermolecular interaction measurement system 1 executes the optical film thickness measurement method of the present invention, and the computer included in the system configuration executes a program reflecting the optical film thickness measurement program of the present invention. It is remembered as possible.
  • the case of measuring the intermolecular interaction will be described as an example, but the application of the present invention is not limited to the measurement of the intermolecular interaction.
  • the intermolecular interaction measurement system 1 is usually configured to output various measurement values, but only the measurement of the optical film thickness of the interference film according to the implementation of the present invention will be described below.
  • the intermolecular interaction measurement system 1 includes a measurement device 80 that includes a measurement member 10 that holds a sample to be measured, a measurement mechanism including a light source and a spectroscope, which will be described later,
  • the control arithmetic device 50 is a computer connected to the device 80, and a display 91 and an input / output device 92 connected to the control arithmetic device 50.
  • the control arithmetic device 50 includes a control unit for a measurement mechanism such as a light source and a spectroscope built in the measurement device 80, a calculation unit for detection information, and an input / output unit for inputting / outputting control commands and detection information. Functions as (interface).
  • the measuring device 80 includes a lower housing 82 and an upper housing 81 that is rotatably attached to the lower housing 82.
  • the lower housing 82 is provided with a table 83 for holding the measuring member 10.
  • a connection portion 84 having an injection port 85 and a suction port 87 for connecting the measurement member 10 and circulating a sample and a detection window 86 is provided inside the upper housing 81.
  • a white light source 20, a spectroscope 30, and optical fibers 40 and 41 are provided in the upper housing 81, and light is emitted from the detection window 86 and from the detection window 86. It is configured to receive incident light.
  • the upper casing 81 When performing measurement, first, the upper casing 81 is rotated upward to open the table 83 on the lower casing 82, and the measuring member 10 is set on the table 83. Thereafter, the upper casing 81 is turned downward and closed, whereby the injection port 85 and the suction port 87 are connected to the measurement member 10 and the detection window 86 faces the measurement member 10 to complete the measurement preparation.
  • the measurement member 10 includes a sensor chip 12 provided with an optical thin film and a flow cell 14 that forms a flow path together with the sensor chip 12.
  • the sensor chip 12 has a silicon substrate 12a.
  • a SiN film 12b (silicon nitride) is deposited on the silicon substrate 12a.
  • the SiN film 12b is an example of an optical thin film.
  • the flow cell 14 is a transparent member made of silicone rubber.
  • a groove 14 a is formed in the flow cell 14. When the flow cell 14 is brought into close contact with the sensor chip 12, a sealed flow path 14b is formed as shown in FIG. Both ends of the groove 14a are exposed from the surface of the flow cell 14, and one end functions as a sample solution inlet 14c and the other end functions as an outlet 14d.
  • the ligand 16 is previously bonded to the bottom of the groove 14a (see FIG. 3).
  • the flow cell 14 can be replaced with the sensor chip 12, and the flow cell 14 can be used in a disposable manner.
  • the surface of the sensor chip 12 may be modified with a silane coupling agent or the like. In this case, the flow cell 14 can be easily replaced.
  • the upper casing 81 is rotated downward and closed, so that the detection window 86 faces the flow cell 14 as shown in FIG.
  • the optical fiber 40 is installed above the path 14b.
  • the white light source 20 is connected to one end of the optical fiber 40.
  • a halogen light source is used as the white light source 20.
  • a pseudo white light source having a plurality of spectral intensity peaks in the visible light wavelength region, such as an LED light source, may be used.
  • the other end of the optical fiber 40 faces the detection window 86.
  • the spectroscope 30 is connected to one end of the optical fiber 41, and the other end faces the detection window 86.
  • the white light source 20 When the white light source 20 is turned on, the light is applied to the sealed flow path 14 b through the optical fiber 40, and the reflected light is detected by the spectrometer 30 through the optical fiber 41.
  • the white light source 20 and the spectroscope 30 are connected to a control arithmetic device 50, and the control arithmetic device 50 controls the operation of these modules.
  • the control arithmetic device 50 executes data stored in a storage device 503 (see FIG. 4) described later, and stores data representing the spectral characteristics of reflected light through the interface at a predetermined timing linked to detection operation control. While obtaining an input, it functions as a calculation means for calculating the value of the optical film thickness based on the input data.
  • FIG. 4 is a schematic circuit block diagram of the measurement system 1.
  • the control arithmetic device 50 includes a CPU 500, a ROM 501, a RAM 502, a storage device 503 such as a hard disk, a communication device 504, a reader / writer 505 of a storage medium such as a memory card, and each part and display of the measurement device 80.
  • An interface 506 is provided for exchanging signals with the input device.
  • a program for measuring the optical film thickness in the intermolecular interaction and other programs for measurement are stored in the storage device 503, and the CPU 500 is controlled by this program to execute various operations.
  • the sample solution 60 containing the analyte 62 is circulated from the inlet 14c to the outlet 14d through the sealed channel 14b.
  • the control arithmetic device 50 controls the liquid feeding device 35 (see FIG. 4) for feeding the sample solution 60.
  • the analyte 62 is a substance that specifically binds to the ligand 16 and is a target molecule to be detected.
  • biomolecules such as proteins, nucleic acids, lipids, and sugars, and foreign substances that bind to biomolecules such as drug substances and endocrine confusion chemical substances are used.
  • the control arithmetic device 50 turns on the white light source 20 at a timing before the sample solution 60 flows into the measuring member 10, and the reflected light of the optical thin film (SiN film 12 b) before the start of the intermolecular interaction from the spectroscope 30.
  • An input of spectral characteristic data including data indicating the intensity of light is obtained.
  • the control arithmetic device 50 turns on the white light source 20 while the sample solution 60 is circulating in the closed flow path 14b.
  • the white light passes through the flow cell 14 and is irradiated to the sensor chip 12, and the reflected light is detected by the spectroscope 30.
  • the spectral characteristic of the reflected light detected by the spectroscope 30 is transmitted to the control arithmetic device 50.
  • the control arithmetic device 50 obtains from the spectroscope 30 input of spectral characteristic data including data indicating the intensity of reflected light during or after the progress of the intermolecular interaction.
  • spectral characteristic data necessary for measuring the optical film thickness of the interference film is input to the control arithmetic unit 50.
  • the sensor chip 12 is a laminate in which one or more interference films (SiN film 12b) are laminated on a substrate (silicon substrate 12a).
  • the measurement system 1 can measure the optical film thickness (such as the optical film thickness 70) of the interference film in the laminate by reflection interference spectroscopy.
  • the optical fiber 40 receives irradiation light that irradiates light from the light source (white light source 20) to the laminate (sensor chip 12), and the optical fiber 41 receives reflected light from the laminate (sensor chip 12).
  • the spectroscope 30 corresponds to a spectroscopic detector that detects the spectral characteristics of the reflected light.
  • the RAM 502 functions as a data storage unit that is referred to when the control arithmetic device 50 calculates the optical film thickness.
  • the data can be read from any of a storage device 503, a server connected via the communication device 504, an external storage device connected via the interface 506, a memory card read by the reader / writer 505, and the like. Good.
  • a hardware configuration in which another computer that has received spectral characteristic data necessary for measuring the optical film thickness of the interference film via the communication device 504 performs calculations for measuring the optical film thickness of the interference film. Does not matter.
  • the other computer is a computer in which the optical film thickness measurement system of the present invention is incorporated and the optical film thickness measurement program of the present invention is installed.
  • the flow cell 14 corresponds to a member that forms a flow path on the interference film. As described above, the flow cell 14 is connected to the flow path formed by the flow cell 14 in the measuring device 80 and is provided on the interference film. A liquid feeding means for flowing a liquid containing molecules that interact with the molecules through the flow path is configured.
  • the measurement principle 1 will be described as follows.
  • the data to be referred to when calculating the optical film thickness is the wavelength that gives the extreme value of the spectral reflectance in a laminate with a known optical film thickness of the interference film and the optical film thickness. This data is constructed by creating a relationship with the above for different optical film thicknesses. This will be described in detail below.
  • FIG. 6 is a schematic model diagram for explaining the principle of reflection interference spectroscopy.
  • the laminated body is composed of a substrate a1 and an interference film a2 having a film thickness d laminated thereon, and the liquid layer a3 covers the interference film a2.
  • the liquid layer a3, the interference film a2, and the substrate a1 have refractive indexes n1, n2, and n3, respectively.
  • light a4 having a wavelength ⁇ 0 as shown in FIG. 6 is incident thereon, reflected light a5 reflected from the surface of the interference film a2 and reflected light a6 passing through the interference film a2 and reflected from the interface with the substrate a1. Interfere as shown by part a7.
  • the optical path of the reflected light a6 is longer than the reflected light a5 by 2n2d.
  • the optical path difference 2n2d causes a half-wavelength shift between the reflected light a5 and the reflected light a6, it interferes so as to weaken the reflection intensity most, as shown by a7.
  • the reflection intensity varies depending on the wavelength of the light to be irradiated.
  • the optical film thickness n2d of the interference film a2 can be specified by analyzing the spectral characteristics of the reflected light. This is the basic principle of the present invention using reflection interference spectroscopy. The following description will clarify how the reflected light is analyzed to determine the optical film thickness.
  • the silicon substrate 12a described above corresponds to the substrate a1
  • the SiN film 12b corresponds to the interference film a2.
  • the portion corresponding to the optical film thickness 70 is added to the SiN film 12b. It corresponds to a2.
  • the curve of the spectral reflectance and the amount of change due to reflection interference changes as if it moves in the long wavelength direction as the thickness of the interference film increases.
  • An example is shown in FIG.
  • the spectral reflectance change amount curves b1, b2, b3, and b4 shown in FIG. 7 are obtained from the curve b2, the curve b2, the curve b3, and the curve b4 having a thicker interference film than the curve b1. It is.
  • the spectral reflectance change amount ⁇ R is a change amount based on the spectral reflectance in an interference film having a certain film thickness. As shown in FIG. 7, the peak position moves to the long wavelength side in the order of curve b1, curve b2, curve b3, and curve b4.
  • This change characteristic depends on the optical film thickness of the interference film. Therefore, by extracting features from the spectral reflectance curve and its variation curve, focusing on the wavelength that gives the extreme value, the optical properties depending on the optical film thickness of the interference film are extracted regardless of the physical properties of the interference film. be able to. And it can expand
  • Curves of spectral reflectance R are calculated for samples having different film thicknesses by simulation, the wavelength ⁇ at the extreme position is obtained from the curve, and the relationship between the sample film thickness d and the extreme position wavelength ⁇ is shown in the graph of FIG. .
  • This is obtained by examining the substrate a1 as a silicon substrate and changing the SiN film as the interference film a2 thereon in the range of 66.5 nm to 2000 nm.
  • the solid line indicates the wavelength at the maximum value position with respect to the sample film thickness
  • the broken line indicates the wavelength at the minimum value position with respect to the sample film thickness.
  • each of the curves B1 to P24 is approximated by a quadratic function, and the approximate quadratic function is expressed by a mathematical expression.
  • the coefficients a and b and the constant c corresponding to each of the curve B1 to the curve P24 are shown in Table 1 below.
  • the above function data refers to data that is referred to when calculating the optical film thickness according to the present measurement principle, that is, the wavelength ⁇ that gives the extreme value of the spectral reflectance in a laminate in which the optical film thickness of the interference film is known in advance. It is data configured by creating a relationship with the optical film thickness for different optical film thicknesses. Such function data is stored so that it can be used by a computer (control arithmetic unit 50) for calculating the optical film thickness.
  • Optical film thickness identification calculation In the measurement system 1, based on the spectral characteristic data input from the spectroscope 30 by the control arithmetic device 50, first, for the spectral reflectance in the laminate to be measured, the wavelength that gives the extreme value of the spectral reflectance is determined. Identify. The extreme value is specified including the maximum value and the minimum value. In the graph of FIG. 9, when a line parallel to the vertical axis y is drawn at an arbitrary value of the optical film thickness (horizontal axis x), it intersects one of the curves B1 to P24. The y coordinate of the intersection is a value of 1000 / ⁇ giving an extreme value to the spectral reflectance curve at the optical film thickness.
  • the control arithmetic unit 50 converts the wavelength ⁇ giving the extreme value of the spectral reflectance obtained from the object to be measured into 1000 / ⁇ to obtain the y value, and distinguishes between the maximum value and the minimum value.
  • the common solution x that is, the optical film thickness nd value is identified.
  • the control arithmetic unit 50 estimates and outputs the optical film thickness of the interference film in the measurement target laminate from the identified optical film thickness nd value.
  • the identification is performed by specifying those that approximate each other in the narrowest range. Then, for example, the average value of the distributed solution x is output as an estimated measurement value.
  • the reliability of the measurement is ensured to be constant by providing a threshold value of the approximation that may be output as a measurement value and the approximation that is output as a measurement error. The degree of approximation may also be output. Possible fitting patterns are SP1, SP2,...
  • the measurement system 1 measures the optical film thickness of the interference film a2 according to the measurement principle 1.
  • the measurement system 1 is based on the measurement principle 1, regardless of whether or not the interference film a2 includes a layer formed by intermolecular interaction, by using reflection interference spectroscopy. Can be measured.
  • the measurement principle 2 will be described as follows.
  • the data to be referred to when calculating the optical film thickness includes the spectral reflectance in the first laminated body in which the first interference film having a known optical film thickness is previously laminated, and the first Spectral reflectance in the second laminate in which a second interference film having a known optical film thickness is laminated on the interference film of the laminate, and spectral reflection in the second laminate relative to the spectral reflectance in the first laminate.
  • This measurement principle also presupposes the matters with reference to FIGS. 6 and 7 in the above measurement principle 1.
  • the curve of the change amount ⁇ R of the spectral reflectance with respect to the wavelength shows the change in peak movement and increase as the interference film becomes thicker as described above.
  • the curve of the spectral reflectance change amount ⁇ R is calculated for samples having different film thicknesses by simulation, the wavelength ⁇ at the extreme position is obtained in the curve, and the relationship between the sample film thickness d and the extreme position wavelength is shown in the graph of FIG. Described.
  • the substrate a1 is a silicon substrate
  • the first interference film laminated thereon is a 66.5 nm SiN film.
  • the second interference film laminated on the first interference film is BK7, and the second interference film (BK7) is examined by changing in the range of 0 nm to 1000 nm.
  • the sample film thickness d on the horizontal axis in the graph of FIG. 10 is for the second interference film (BK7).
  • BK7 is a virtual sample for simulation in which properties such as a refractive index are specified, corresponds to a typical kind of glass, and has a refractive index close to that of a biomaterial or a polymer material.
  • the solid line indicates the wavelength at the maximum value position with respect to the sample film thickness
  • the broken line indicates the wavelength at the minimum value position with respect to the sample film thickness.
  • FIG. 10 is a graph created by converting the sample film thickness d on the horizontal axis to the optical path length (optical film thickness) nd by multiplying by the refractive index n, and converting the wavelength ⁇ on the vertical axis to 1000 / ⁇ . It is shown in FIG. In the graph of FIG. 11, a curve indicating the wavelength at the local maximum position appears on the leftmost side. This is a curve P1. When going to the right from the curve P1, a curve showing the wavelength of the minimum value position appears. This is a curve B1. When going further to the right from the curve B1, a curve indicating the wavelength at the maximum value position and a curve indicating the wavelength at the minimum value position appear alternately. These are sequentially designated as curves P2, B2, P3, B3...
  • the above function data refers to data that is referred to when calculating the optical film thickness according to the present measurement principle, that is, the spectral reflectance in the first laminated body in which the first interference film having a known optical film thickness is previously laminated, Spectral reflectance in the second laminate in which a second interference film having a known optical thickness is laminated on the interference film of the first laminate, and in the second laminate relative to the spectral reflectance in the first laminate
  • This is data configured by creating in advance the relationship between the wavelength that gives the extreme value of the change amount of the spectral reflectance and the optical film thickness of the second interference film for the different optical film thicknesses of the second interference film.
  • Such function data is stored so that it can be used by a computer (control arithmetic unit 50) for calculating the optical film thickness.
  • the control arithmetic device 50 receives the input from the spectroscope 30 before the start of the intermolecular interaction. Spectral reflectance is obtained. After the start of the intermolecular interaction, the control arithmetic unit 50 obtains the spectral reflectance after the start of the intermolecular interaction in the measurement target laminate based on the spectral characteristic data input from the spectroscope 30.
  • the control arithmetic device 50 compares the spectral reflectance before the start of the intermolecular interaction of the laminate to be measured with respect to the spectral reflectance after the start of the intermolecular interaction of the laminate to be measured.
  • the wavelength giving the extreme value of the change amount ⁇ R of the spectral reflectance is specified.
  • the extreme value is specified including the maximum value and the minimum value. In the graph of FIG. 11, when a line parallel to the vertical axis y is drawn at an arbitrary value of the optical film thickness (horizontal axis x), it intersects one of the curves P1, B1,.
  • the y coordinate of the intersection is a value of 1000 / ⁇ that gives an extreme value to the spectral reflectance change amount curve at the optical film thickness. If the intersection intersects the curves P1-P8, the extreme value is the maximum value, and the curve B1- If it crosses B7, the extreme value is a minimum value. Using this in a reverse calculation, the control arithmetic device 50 obtains the y value by converting the wavelength ⁇ giving the extreme value of the change amount of the spectral reflectance obtained from the measurement object into 1000 / ⁇ , and the maximum value and the minimum value.
  • common X that is, the optical film thickness nd value is identified.
  • the control arithmetic device 50 estimates and outputs the optical film thickness of the interference film in the laminate to be measured from the identified optical film thickness nd value.
  • the measurement system 1 can measure the optical film thickness increased by the intermolecular interaction of the interference film a2 according to the measurement principle 2. That is, the measurement system 1 can measure the optical film thickness corresponding to the analyte 62 bound to the ligand 16 as shown in FIG. Due to the progress of the intermolecular interaction, the ligand 16 to which the analyte 62 is bound gradually increases. Even if the analyte 62 is combined even partly, there is a change in the wavelength of reflection interference, so that a curve of the spectral reflectance change amount can be obtained even in the initial stage of the intermolecular interaction.
  • the wavelength that gives the extreme value of the spectral reflectance change amount even at the initial stage of the intermolecular interaction is set. Can be identified. That is, the extreme value of the change amount of the spectral reflectance specified at the initial stage of the intermolecular interaction is not different from that specified thereafter. Therefore, the measurement system 1 can calculate and output the measured value of the optical film thickness from the stage where the wavelength that gives the extreme value of the spectral reflectance change amount can be specified first, and can notify the user at an early stage.
  • the sample solution 60 includes a plurality of types of molecules, each molecule has a unique size.
  • the present invention is applied and the optical film thickness that changes due to the intermolecular interaction of the target molecule (analyte 62) is known, the known optical film thickness Compare the measured value with the measured optical film thickness value. If they match, it can be determined that there was an intermolecular interaction of the target molecule, and if it does not match, it can be determined that there was no intermolecular interaction of the target molecule. The presence or absence of intermolecular interaction of the target molecule can be detected.
  • the optical film thickness corresponding to the analyte 62 bound to the ligand 16 is measured, but the film thickness can be obtained for molecules having a known refractive index.
  • the control arithmetic device 50 stores the refractive index of the molecule (analyte 62) in advance in the RAM 502 and obtains it as described above.
  • the film thickness of the molecule is determined by dividing the optical film thickness of the molecule by the refractive index of the molecule.
  • Molecular direction estimation Furthermore, if the size or optical size of a specific direction of a molecule is known, the direction of the molecule relative to the interference film can be estimated. As shown in FIG. 18A, a molecule having a size d1 in one direction and a size d2 in a different direction may be adsorbed on the interference film with the size d1 as the stacking direction as shown in FIG. 18B. As shown in 18C, when there is a possibility that the size d2 is adsorbed to the interference film as the stacking direction, the control arithmetic unit 50 functions as a molecular direction estimation unit and constitutes a molecular direction estimation system.
  • the size d1 and the size d2 are optical sizes, that is, values obtained by multiplying the actual size by the refractive index
  • the control arithmetic unit 50 stores and holds these optical sizes in the RAM 502 in advance.
  • the direction of the molecules adsorbed on the interference film by the intermolecular interaction with respect to the interference film is estimated by comparing the optical film thicknesses of the molecules obtained as described above with these optical sizes. Even when the size or optical size in only one direction is known and stored in the RAM 502, it can be estimated whether or not the suction is performed in that direction.
  • the measurement environment control device includes a device that controls one or more of environmental variables such as temperature, pressure, pH, and salt concentration of the measurement environment.
  • the detection unit of the measurement environment control device detects the value of the controlled environment variable.
  • the control arithmetic unit 50 gives an instruction to the measurement environment control device based on the program to change the environment variable, and calculates the optical film thickness or film thickness of the molecule obtained as described above for each different time point when the environment variable changes. It is stored in the RAM 502 in association with the environment variable at the same time. Further, when there is no need to provide the environmental change cause from the measurement system 1 such as when the cause of the environmental change is on the measurement target side, for example, as the measurement environment detection device, the environment such as the temperature, pressure, pH, salt concentration, etc. of the measurement environment One that detects any one or more of the variables is provided.
  • the control arithmetic unit 50 stores in the RAM 502 the optical film thickness or film thickness of the molecules obtained as described above for each different time point when the environmental variable changes in association with the environmental variable detected by the measurement environment detection device at the same time. To do. In either case, the measurement system 1 further draws a graph based on the recorded information and displays it on the display 91.
  • the above program can be updated to the latest one through the communication device 504 connected to a public line such as the Internet through a LAN or the like.
  • the present invention can be used for measurement of bonds such as intermolecular interactions between biomolecules such as antigen-antibody reaction and intermolecular interactions between organic polymers.
  • Measurement System 10 Measurement Member 12 Sensor Chip (Laminate) 12a Silicon substrate 12b SiN film 14 Flow cell 14a Groove 14b Sealed flow path 14c Inlet 14d Outlet 16 Ligand 20
  • White light source 30 Spectroscope 40, 41 Optical fiber 50 Control arithmetic device 60 Sample solution 62 Analyte 80 Measuring device R Spectral reflectance ⁇ R Amount of change in spectral reflectance a1 Substrate a2 Interference film a3 Liquid layer

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Abstract

La présente invention traite le problème de la mesure de l'épaisseur de film optique d'un film d'interférence par spectroscopie interférentielle à réflexion et, en cas de changement de l'épaisseur de film optique du film d'interférence, la mesure de la quantité de changement de ladite épaisseur. Dans la mesure de l'épaisseur de film optique d'un film d'interférence dans un stratifié où le film d'interférence est stratifié sur un substrat par spectroscopie interférentielle à réflexion, l'attention est portée sur le fait que, étant donné que l'épaisseur de film optique du film d'interférence augmente, la position de pic de la répartition spectrale de la réflectivité spectrale (ou sa quantité de changement) se déplace vers le côté à grande longueur d'onde, par exemple, selon l'ordre d'une courbe (b1), d'une courbe (b2), d'une courbe (b3) et d'une courbe (b4), et le nombre de pics de celle-ci augmente, la relation entre une longueur d'onde à laquelle l'épaisseur de film optique du film d'interférence fournit la valeur extrême de réflectivité spectrale (ou quantité de changement) dans un stratifié connu et l'épaisseur de film optique est créée à l'avance pour chaque épaisseur différente de film optique, et l'épaisseur de film optique qui fournit une valeur extrême à une longueur d'onde approximative est identifiée par l'application, à la relation mentionnée ci-dessus, d'une longueur d'onde à laquelle la valeur extrême de la réflectivité spectrale (ou quantité de changement) dans le stratifié à mesurer par spectroscopie interférentielle à réflexion est fournie, ce qui permet de trouver l'épaisseur de film optique du film d'interférence devant être mesuré.
PCT/JP2012/063588 2011-06-27 2012-05-28 Procédé, système et programme de mesure de l'épaisseur d'un film optique, et ainsi de suite WO2013001955A1 (fr)

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Cited By (1)

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WO2022271016A1 (fr) * 2021-06-21 2022-12-29 Delmic Ip B.V. Procédé et appareil pour micro-usinage d'un échantillon à l'aide d'un faisceau d'ions focalisé

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JP3786073B2 (ja) * 2002-10-10 2006-06-14 株式会社日立製作所 生化学センサ用キットおよび測定装置
JP2006220525A (ja) * 2005-02-10 2006-08-24 Toppan Printing Co Ltd 膜厚測定方法および膜厚測定プログラム
WO2010013429A1 (fr) * 2008-07-30 2010-02-04 株式会社ニレコ Dispositif de mesure d'épaisseur de film et procédé de mesure d'épaisseur de film
WO2011111466A1 (fr) * 2010-03-12 2011-09-15 コニカミノルタオプト株式会社 Procédé et dispositif de détection d'interactions moléculaires
WO2012081445A1 (fr) * 2010-12-15 2012-06-21 コニカミノルタオプト株式会社 Procédé de mesure d'interaction intermoléculaire, système de mesure à utiliser dans le procédé, et programme

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Publication number Priority date Publication date Assignee Title
JP3786073B2 (ja) * 2002-10-10 2006-06-14 株式会社日立製作所 生化学センサ用キットおよび測定装置
JP2006220525A (ja) * 2005-02-10 2006-08-24 Toppan Printing Co Ltd 膜厚測定方法および膜厚測定プログラム
WO2010013429A1 (fr) * 2008-07-30 2010-02-04 株式会社ニレコ Dispositif de mesure d'épaisseur de film et procédé de mesure d'épaisseur de film
WO2011111466A1 (fr) * 2010-03-12 2011-09-15 コニカミノルタオプト株式会社 Procédé et dispositif de détection d'interactions moléculaires
WO2012081445A1 (fr) * 2010-12-15 2012-06-21 コニカミノルタオプト株式会社 Procédé de mesure d'interaction intermoléculaire, système de mesure à utiliser dans le procédé, et programme

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022271016A1 (fr) * 2021-06-21 2022-12-29 Delmic Ip B.V. Procédé et appareil pour micro-usinage d'un échantillon à l'aide d'un faisceau d'ions focalisé
NL2028497B1 (en) * 2021-06-21 2022-12-29 Delmic Ip B V Method and apparatus for micromachining a sample using a Focused Ion Beam

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