JP5933813B2 - Metal mesh cloth and mask manufacturing method - Google Patents

Description

  The present invention specifically relates to a metal mesh cloth.

  With the rapid development of the economy, energy consumption is increasing more and more, and reserves of non-renewable resources such as coal and oil are decreasing day by day, so people are getting new energy (eg nuclear power, solar energy, wind energy). , Biomass energy, geothermal energy, marine energy, hydrogen energy, etc.). As a number of energy sources on the earth, solar energy is an important part of new energy research, and solar cells are a representative example of its application.

  Improving the conversion efficiency of solar cells is currently a major goal in solar cell research. In addition to selecting battery substrate materials and improving substrate production technology, the conversion of batteries can also be achieved by selecting an appropriate screen printing plate. Efficiency can be improved.

  With the advancement of the electronics industry and related industries, the application of precision printing and small packaging is also expanding. Precision printing and small packaging processes are generally associated with mask applications. Conventional masks include metal masks and composite masks. At present, the material of the metal mask is generally a nickel base alloy, but the structure of the composite mask is somewhat complicated, and includes a mesh and a photosensitive material applied to the mesh surface.

  Patent document 1 is disclosing the following characteristics about the manufacturing method of a large area nanosheet solar cell. That is, a single DSSC is formed in a long shape, and the long DSSC is connected in series with a corrosion-resistant connection band so as to form a large-area solar cell. A protective isolation layer or a low-resistance grid electrode made by a screen printing method is provided on both sides of the corrosion-resistant connection band, and the surface of the low-resistance grid electrode is covered with a protective film. Then, a plurality of long DSSC single bodies are connected in parallel to form a large-area solar cell using a low-resistance grid electrode covered with a protective film. An inflow tank is provided on the contact surface between one glass and the TCO in a large area solar cell. In the inflow tank at one end of the large area solar cell, the inflow tank is cut after pumping electrolyte and dye from the inflow tank. , Seal.

Patent Document 2 discloses the following features of a solar cell screen printing apparatus including a squeegee, an auxiliary squeegee, a forwarding blade, and a screen printing plate. That is, two baffle structures are mounted on the screen printing plate in close contact with both sides of the squeegee. The baffle structure is mainly composed of a baffle plate surface, a baffle plate frame, and a mounting holder. The bottom portion of the baffle plate surface and the screen surface may be in contact with each other in a separable manner, or may be bonded by a flexible material. The edges of the forwarding blade, the squeegee and the auxiliary squeegee are in contact with the baffle plate surface without any gaps. The printing machine head slides while bringing the squeegee and forwarding blade into contact with the baffle plate surface and moves the paste within the range surrounded by the baffle plate surface, squeegee and feeding blade on both sides, so that the paste does not flow to both sides. I am doing so.

  Patent Document 3 discloses the following regarding a pure silver screen plate for screen printing of a crystalline silicon solar cell. That is, including silicon, main grid lines, chamfer angles, and sub grid lines, the main grid lines and sub grid lines are provided in the silicon, the main grid lines and sub grid lines are provided vertically, and the chamfer angles are provided in the silicon. Is provided. Thereby, since the front electrode grid line can be effectively expanded on the silicon surface and the covering area can be expanded, the photocurrent can be effectively collected, so that the battery efficiency is improved.

  Patent Document 4 discloses a solar cell manufacturing process in which screen printing and grooving are combined twice, and this process is used to manufacture a solar cell on which electrodes are printed twice. Degree printing process. The groove processing step is a step of forming a groove in the electrode grid line region on the silicon surface to form an etching groove in the electrode grid line region. The two printing steps include (a) primary electrode printing in which a paste of an electrode to be printed is filled in an etching groove and dried to form a first layer electrode in the etching groove, and (b) the first layer electrode is formed. Secondary electrode printing in which electrodes are printed on the outer surface and a second layer electrode is formed in the electrode grid line region on the silicon surface.

  The mesh constituting the conventional composite mask is a weave type wire mesh, a polyester mesh, or the like. This type of mesh causes an influence on the paste loss of the mask to be finally formed due to the vertical and horizontal intersection characteristics in the weave type, for example, unevenness of paste loss. Therefore, in the actual mask manufacturing process, it is often necessary to reduce such influence on the weave mesh as much as possible by pressing the mesh in advance. However, such an operation cannot completely avoid the problems caused by the vertical and horizontal intersections.

  The present invention mainly provides a mesh for the above-described problem, and solves the above-described problem well.

Chinese Patent Publication No. CN101241956 Chinese Patent Publication No. CN102336051A Chinese utility model No. CN202058761U Chinese Patent Publication No. CN101969082A

  The present invention solves one technical problem that meshes used in conventional precision printing technology have weave-type vertical and horizontal intersections, resulting in uneven printing of the mask to be formed. The present invention provides a new metal mesh cloth having the advantages of having no intersection like a weave type, a smooth surface, and excellent printing uniformity.

  It is another technical object of the present invention to provide a mask produced using the metal mesh cloth and having an advantage of excellent printing uniformity.

In order to solve the above-described problems, the present invention uses the following technical solution. That is, in a non-weave metal mesh cloth in which mesh lines perpendicularly intersecting each other are formed smoothly and continuously, a mesh line having a first line diameter is in the first direction and the first direction. The mesh region formed by being provided so as to intersect with the perpendicular second direction, and the mesh line having a second diameter larger than the first value are the mesh direction and the second direction. A stress relaxation zone formed on the outer periphery of the mesh region, and a mesh line having a third diameter larger than the second value is formed in the first direction and And a marginal hole region formed on the outer periphery of the stress relaxation zone while intersecting with the second direction.

In the above technical scheme, the metal mesh cloth preferably further includes a pattern region formed by deleting the mesh line in the second direction while leaving the mesh line in the first direction inside the mesh region. Prepare.

In order to solve the other technical problem, the present invention uses the following technical solution. That is, mesh lines that intersect perpendicularly to each other are formed in a smooth and continuous manner, and a mesh line having a first diameter is intersected in a first direction and a second direction perpendicular to the first direction. And a mesh region formed by being provided and a mesh line having a second diameter larger than the first value are formed so as to intersect the first direction and the second direction. A stress relaxation zone provided on the outer periphery of the mesh region and a mesh line having a third diameter larger than the second value intersecting the first direction and the second direction. And a marginal hole region provided on an outer periphery of the stress relaxation zone and a defect in the mesh line in the second direction leaving the mesh line in the first direction inside the mesh region. Metal with pattern area formed by In the method of manufacturing a mask using shush cloth, a mask material is applied to a portion of the metal mesh cloth excluding the pattern region, thereby forming a mask opening at a position corresponding to the pattern region. , Smaller than the opening size of the pattern region.

  In the above technical solution, preferably, the pattern constituted by the mesh line defect in the metal mesh cloth is composed of a set of parallel lines and corresponds to the grid fine lines in the mask.

  The metal mesh cloth provided by the present invention is excellent in the following points.

  (1) The metal mesh cloth is obtained by an electroforming process, and has a characteristic that the surface is smooth and does not have vertical and horizontal intersections such as a weave type. The screen printing plate has a uniform paste drop during printing.

  (2) Since the metal mesh cloth has no mesh line in the direction of the grid fine line in the area corresponding to the grid fine line of the screen printing plate for the solar cell electrode to be adapted, Inhibition is reduced.

  Since the non-weave wire mesh has a smooth mesh surface, the mask produced thereby is not damaged due to surface irregularities during the wiping process. The mesh may be designed with another hole area ratio, a mesh wire diameter size and a mesh wire shape as necessary, and in addition to a good paste removal effect of the mesh, the mesh life can be guaranteed.

  From the above points, the solar cell electrode screen printing plate produced by the metal mesh cloth can print the electrode grid line structure of a silicon solar cell excellent in “aspect ratio”. This is advantageous for collecting and transmitting current by the solar cell, so that the conversion efficiency of the solar cell is improved.

FIG. 1 is a diagram showing the structure of a metal mesh cloth, in which I is a mesh region and II is a stress relaxation zone region. FIG. 2 is a partially enlarged view showing the wire mesh of the first embodiment. FIG. 3 is an enlarged view showing a part of the stress relaxation zone in the metal mesh cloth, of which r1 <r2 <r3. FIG. 4 is a diagram showing a metal mesh cloth having a pattern constituted by mesh line defects, among which III is a mesh region. FIG. 5 is an enlarged view of a portion III in FIG. 4, in which IV is a mesh region in which a horizontal mesh line is missing. FIG. 6 is an enlarged view of the IV part of FIG. 5, of which r1> r4> r5. FIG. 7 is a diagram showing the diameters of the mesh lines remaining in the pattern region where the mesh lines are missing, of which r1 ≧ r6. FIG. 8 is a diagram partially showing a mask in which a masking material is applied to a metal mesh cloth, of which R1 ≧ R2.

  Hereinafter, the present invention will be described in more detail using specific examples.

  As shown in FIG. 1, a mesh area is provided, and the mesh area is composed of two sets of mesh lines perpendicular to each other, and a pattern area is formed in the center area of the mesh area in the metal mesh cloth. The pattern is formed by missing a mesh line in a horizontal direction or a vertical direction by a metal mesh cloth. The metal mesh cloth does not have vertical and horizontal intersections as in the weave type, has an integrally formed structure, and has a smooth surface. That is, the mesh lines constituting the metal mesh cloth are continuous non-weave type.

  FIG. 2 is a partially enlarged view of the wire mesh, and the wire mesh includes mesh lines Ia intersecting each other. In this embodiment, the metal mesh cloth has 330 meshes, a mesh cloth wire diameter of 20 μm, and a mesh cloth thickness of 25 μm.

  FIG. 3 is an enlarged view showing a part of a stress relaxation zone in the metal mesh cloth. The wire diameter of the relaxation zone changes based on a constant change rule. In the present embodiment, as shown in FIG. 3, the rule is that the wire diameter dimension gradually increases from the center of the metal mesh cloth toward the edge. That is, r1 <r2 <r3, for example, r1 = 20 μm, r2 = 30 μm, r3 = 40 μm. As shown in FIG. 1, the outer edge having a wire diameter of 40 μm continues to the edge hole region of the mesh cloth. By designing in this way, when the mesh cloth receives a force in a stretched state, the mesh cloth can withstand a good external tension.

  The metal mesh cloth has the same basic structure as that of the first embodiment, except that the mesh cloth has 400 meshes, the mesh cloth has a wire diameter of 25 μm, and the mesh cloth has a thickness of 20 μm.

  Based on this, the structure of the metal mesh cloth is further changed as follows.

  The metal mesh cloth is provided with a pattern, and the pattern in this embodiment is composed of lines 4a parallel to each other as shown in FIG. FIG. 5 is an enlarged view of the III part of FIG. 4, 5a of FIG. 5 is a line 4a shown in FIG. 4, and a mesh line in the horizontal direction is missing at 5a.

  FIG. 6 is an enlarged view of the IV portion of FIG. 5. The wire diameter of the mesh line remaining in the pattern area where the mesh line is missing is the diameter r1 of the metal mesh cloth body> the both ends of the mesh line inside the pattern area. There is a rule that the wire diameter r4> the wire diameter r5 of the mesh line central region inside the pattern region, and the structure is smooth. Further, as shown in FIG. 7, the wire diameter of the mesh line inside the pattern region is uniform and the wire diameter of the metal mesh cloth body is the wire diameter of the mesh line remaining in the pattern region where the mesh line is missing. There may be a rule that the diameter r1 ≧ the diameter r6 of the mesh line inside the pattern region.

  FIG. 8 is a view partially showing a mask obtained by applying a masking substance to the metal mesh cloth (corresponding to the portion shown in FIG. 5). As shown in the drawing, only one-way mesh line 8a exists in the opening of the mask, and this plays a role of bridging. Comparing FIG. 5 and FIG. 8, the opening dimension R1 of the metal mesh cross mesh line defect region ≧ the opening dimension R2 of the mask pattern corresponding region. According to such a design, the coating difficulty coefficient of the masking substance in the mask is reduced, and the mesh line at the opening is limited to one direction, so that the number of cross-linking portions is reduced and the influence on the printing paste is reduced. A good paste removal effect by the mask is guaranteed.

  It is a metal mesh cloth, and the basic structure is the same as in Example 1 and Example 2, but the mesh of the metal mesh cloth is 200 to 450, the wire diameter is 15 to 30 um, and the thickness is 15 to It has been changed to 30um.

  A metal mesh cloth, the basic structure of which is the same as in Example 1 and Example 2, but the mesh, wire diameter, and thickness of the metal mesh cloth are arbitrary values within the above range of Example 3. It may be a combination.

  While embodiments of the present invention have been presented and described above, those skilled in the art will appreciate that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. it can. The scope of the invention is limited by the claims and their equivalents.

Ia Mesh line 4a Area where the horizontal mesh line is missing 5a Area where the horizontal mesh line is missing 8a Mesh bridging at the opening of the mask R1 Opening size of the metal mesh cross mesh line missing area R2 Mask pattern correspondence Opening size of region r1 Diameter of mesh line in different mesh region (wire diameter of metal mesh cloth body)
r2 Diameter size of mesh line in different mesh area r3 Diameter diameter of mesh line in different mesh area r4 Diameter of both ends of mesh line inside pattern area r5 Diameter of mesh line central area inside pattern area r6 Inside diameter of pattern area Mesh wire diameter

Claims (8)

In non-weave metal mesh cloth in which mesh lines that intersect perpendicularly with each other are formed smoothly and continuously,
A mesh region formed by providing a mesh line having a wire diameter of a first value intersecting a first direction and a second direction perpendicular to the first direction;
A stress that is formed on the outer periphery of the mesh region while a mesh line having a second diameter larger than the first value is formed so as to intersect the first direction and the second direction. Relaxation zone,
A mesh line whose wire diameter is a third value larger than the second value is formed so as to intersect the first direction and the second direction, and is provided on the outer periphery of the stress relaxation zone. Marginal hole area and
Metal mesh cloth, characterized in that it comprises a. 2. The pattern region according to claim 1, further comprising a pattern region formed by deleting the mesh line in the second direction while leaving the mesh line in the first direction inside the mesh region. Metal mesh cloth. A pattern region formed by leaving the mesh line in the first direction while leaving the mesh line in the first direction inside the mesh region, further comprising a mesh in the first direction in the pattern region The metal mesh cloth according to claim 1, wherein the wire diameter is smaller than the first value . 4. The metal mesh cloth according to claim 3, wherein the wire diameter of the mesh line in the first direction in the pattern region has a value at both ends inside the pattern region larger than a value in the center region . The metal mesh cloth according to any one of claims 1 to 4, wherein the metal mesh cloth is manufactured from a pure nickel material or a nickel-base alloy material by an electroforming process . The first value, the second value, and the third value are in the range of 10 to 100 μm, the number of meshes formed by the intersecting mesh lines is in the range of 100 to 600, and the thickness The metal mesh cloth according to claim 1 , wherein is in the range of 10 to 45 μm . The first value, the second value, and the third value are in the range of 15 to 30 μm, the number of meshes formed by the intersecting mesh lines is in the range of 200 to 450, and the thickness The metal mesh cloth according to claim 1 , wherein is in the range of 15 to 30 μm . Mesh lines that intersect perpendicularly to each other are formed smoothly and continuously, and mesh lines having a wire diameter of the first value are provided so as to intersect the first direction and the second direction perpendicular to the first direction. A mesh region formed by being formed and a mesh line having a second diameter larger than the first value are formed intersecting the first direction and the second direction, and A stress relaxation zone provided on the outer periphery of the mesh region and a mesh line having a third diameter larger than the second value are formed so as to intersect the first direction and the second direction. And removing the mesh line in the second direction leaving the mesh line in the first direction inside the edge hole region provided on the outer periphery of the stress relaxation zone and in the mesh region. Metal mesh with pattern area formed by The method of manufacturing a mask used cross,
  By applying a masking material to a portion of the metal mesh cloth excluding the pattern region, a mask opening is formed at a position corresponding to the pattern region,
  The opening size of the mask is made smaller than the opening size of the pattern region.
  A method of manufacturing a mask characterized by the above.

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