TWM462880U - Metal net and mask plate using the metal net made - Google Patents

Abstract

A metal net and a maskplate using said metal net made may be used in industrial production forprecision printing. The metal net has a grid area, in the middle area of whichthere is a pattern area, which is composed of two sets of mutually vertical netlines. A pattern in the pattern area is composed of longitudinal and transversenet lines in the metal net. The mesh number is 100 to 600 meshes, the threaddiameter is 10 to 100 um, and the thickness is 10 to 45 um for the metal net,such that the problem of uneven printing of the molded mask plate due to thescreen with interweaved nodes used in the conventional precision printingtechnology may be solved effectively.

Description

Metal mesh and a mask made of the metal mesh

The present invention relates to a metal mesh cloth and a mask made of the metal mesh cloth, and more particularly to a metal mesh cloth which can be used in industrial production of precision printing and the use of the metal mesh cloth. Mask version.

With the rapid development of the economy, the consumption of energy is increasing, and the storage of non-renewable resources such as coal and oil is decreasing. This has prompted people to focus on new energy sources such as nuclear energy, solar energy, wind energy, biomass energy and geothermal energy. , ocean energy, hydrogen energy, etc.) continue to explore. Among them, as a source of many energy on the earth, solar energy plays an important role in the research of new energy. Solar cells are a core representative of solar energy applications.

Improving the conversion efficiency of solar cells is a major goal of solar cell research. In addition to the selection of battery substrate materials and the improvement of substrate fabrication technology, selecting a suitable printing stencil can also improve the conversion efficiency of the battery.

With the rise of the electronics industry and related industries, precision printing and small-size packaging should It is also widely used. In the process of precision printing and small-size packaging, the application of mask is generally involved. The traditional mask includes metal mask and composite mask. At present, the material of the metal type mask is generally a nickel-based alloy; and the material of the composite type mask is relatively complicated, and includes a screen and a photosensitive material coated on the surface of the screen.

Chinese patent CN101241956 describes a method for manufacturing a large-area nano-film solar cell, which is mainly characterized in that a single DSSC is made into a strip shape, and a strip-shaped single DSSC is connected in series into a large-area solar cell by using a corrosion-resistant interconnect strip. A corrosion-resistant interconnecting strip is provided on each side of the corrosion-resistant interconnecting strip, or a low-resistance grid electrode prepared by a mesh printing method, and a protective film is coated on the surface of the low-resistance grid electrode, and then a low-resistance grid covered with a protective film is used. The electrode connects a plurality of strip-shaped single-cell DSSCs into a large-area solar cell, a large-area solar cell side glass and a TCO contact surface are provided with a filling tank, and a large-area solar cell end of the infusion tank, from the perfusion tank pump After the electrolyte and dye are introduced, the infusion tank is broken and then sealed.

Chinese patent CN102336051A discloses a solar cell mesh printing device, which comprises a printing blade, an auxiliary blade, a returning knife and a printing screen. The feature is that two baffle structures are mounted on the printing screen on both sides of the edge of the printing blade. The baffle structure is mainly composed of a baffle surface, a baffle frame and a mounting frame; the bottom of the baffle surface and the mesh surface can be separated or bonded by a flexible material; the edge of the returning knife and the printing scraper and the auxiliary scraper are blocked. The surface of the board is seamlessly contacted; the printing head drives the scraper and the returning knife to slide in contact with the baffle surface, so that the slurry moves in the range enclosed by the baffle surfaces, the scraper and the returning knife on both sides, so that the slurry does not move to the two Side flow.

Chinese patent CN202058761U discloses a screen printing crystal 矽 solar cell positive silver screen, comprising: a ruthenium, a main grid line, a chamfer, a sub-gate line, the ruthlet is provided with a main grid line and a pair a gate line, the main gate line and the sub-gate line are vertically disposed, and a chamfer is provided on the cymbal sheet, so that the front electrode gate line can be effectively expanded on the surface of the cymbal, the coverage area is increased, and the photocurrent is increased. Efficient collection is performed to improve the efficiency of the cell.

Chinese patent CN101969082A discloses a solar cell manufacturing technology combining two mesh printing and engraving, which is used for manufacturing a solar cell with two printing electrodes, which includes engraving technology and two printing technologies, and the engraving technology system is: The groove is formed in the electrode grid line region on the surface of the cymbal to form an etched groove in the electrode grid line region; the two printing techniques are: a, the first printing electrode: filling the printed electrode slurry into the etching groove and drying Forming a first layer of electrodes in the etching groove; b, printing the second time electrode: printing the electrode on the outer surface of the first layer electrode to form a second layer electrode on the surface of the electrode surface of the chip.

The screens constituting the conventional composite mask are woven wire mesh or polyester mesh, etc., such meshes may cause the sizing effect of the final forming mask due to the characteristics of the woven warp and weft joints, such as: sizing Unevenness; in the production process of the actual mask, it is often necessary to first press the screen to minimize the effect of the braided screen. However, this operation does not completely avoid the adverse effects of the warp and weft nodes.

In view of this, the purpose of the present invention is to provide a metal mesh cloth which can be used to solve the problem of uneven printing of the molding mask due to the woven type nodes of the screen used in the conventional precision printing technology.

Another object of the present invention is to provide a mask made of a metal mesh cloth, which has the advantage of uniform printing.

In order to achieve the above and other objects, the present invention provides a metal mesh provided with a mesh area composed of two sets of mutually perpendicular wire mesh lines, and the mesh area of the metal mesh is provided a pattern region, wherein the pattern of the pattern region is formed by a transverse or/and longitudinal web line on the metal mesh; the mesh of the metal mesh is between 100 and 600 mesh, the screen The wire diameter of the wire is between 10 and 100 um, and the thickness of the metal mesh is between 10 and 45 um.

In an embodiment of the present invention, the wire diameter of the mesh line of the above-mentioned mesh area is uniform. The periphery of the mesh area is provided with a force buffering strip and a side hole strip connected to the buffer strip. The metal mesh is integrally formed and has a structure with a smooth surface and a non-woven type node; the metal mesh forms a continuous non-woven mesh fabric with a wire mesh. The metal mesh number is between 200 and 450 mesh, the wire diameter of the wire is between 15 and 30 um, and the thickness of the metal mesh is between 15 and 30 um. The wire diameter of the wire mesh of the pattern area on the metal mesh is not larger than the wire diameter of the wire of the non-pattern area. The wire diameter of the wire of the pattern area on the metal mesh is uniform, or the wire diameter of the two ends of the wire of the pattern area on the metal mesh is larger than the wire diameter of the middle part. The metal mesh is obtained by electroforming technology and is made of pure nickel material or nickel-based alloy material.

The present invention provides a mask made by using the above metal mesh, wherein the pattern opening area of the mask has a mesh opening size not larger than a mesh opening size of the corresponding pattern on the metal mesh.

In one embodiment of the present invention, the pattern of the wire mesh of the metal mesh described above is a set of mutually parallel lines corresponding to the gate lines of the mask.

Based on the above, the metal mesh provided by the present invention is produced by electroforming technology, which has The characteristics of the surface smoothing and non-woven type warp and weft joints, the solar cell electrode printing screen made by the same is uniform in sizing during printing; in addition, the metal mesh is in the corresponding area of the grid line of the corresponding solar cell electrode printing screen The screen line in the direction without the grid line reduces the barrier effect of the metal mesh on the printing paste.

Non-woven wire mesh, the surface of the wire mesh is smooth, and the mask plate made by the mask is not damaged by the unevenness of the surface during the cleaning and wiping process. The screen can be designed according to the needs of different opening ratio, wire mesh diameter and wire mesh shape to ensure the good sizing effect of the wire mesh while ensuring the life of the wire mesh.

Based on the above advantages, the solar cell electrode printing screen plate further prepared by the metal mesh cloth can print the “high aspect ratio” superior solar cell electrode grid line structure, which is beneficial to the collection and transmission of current by the solar cell sheet. Therefore, the conversion efficiency of the solar cell sheet is correspondingly improved.

In order to make the above features and advantages of the present invention more comprehensible, the following embodiments are described in detail with reference to the accompanying drawings.

I‧‧‧ is the grid area

II‧‧‧ is the force buffer zone

Ia‧‧‧ is a wire mesh

R1, r2, r3‧‧‧ are the wire diameters of different mesh areas; the wire diameter from the middle to the edge of the metal mesh is gradually increased, that is, r1 is smaller than r2 and smaller than r3

III‧‧‧ is the grid area

4a‧‧‧ is the area lacking horizontal wire mesh

IV‧‧‧ is the grid area lacking horizontal screen lines

5a‧‧‧ is the area lacking horizontal screen lines

R1‧‧‧ is the opening size of the missing area of the wire mesh wire

R1‧‧‧ is the mesh wire diameter of the metal mesh body

R4‧‧‧ is the wire diameter of the two ends of the wire mesh in the pattern area

R5‧‧‧ is the wire diameter of the middle part of the wire mesh inside the pattern area; the wire mesh body wire diameter r1> the inner diameter of the wire mesh inside the pattern area r4> the middle area of the inner wire mesh of the pattern area Wire diameter r5

R1‧‧‧ is the mesh wire diameter of the metal mesh body

R6‧‧‧ is the wire diameter of the wire mesh inside the pattern area; the wire diameter of the wire inside the pattern area is uniform, and the wire mesh diameter r1 of the metal mesh body Wire diameter r6 of the wire mesh inside the pattern area

8a‧‧‧ is the bridge line at the opening of the mask

R2‧‧‧ is the mesh opening size of the mask pattern area; the metal mesh screen corresponds to the opening size R1 of the pattern area of the mask version Grid opening size of the pattern area of the mask

[Fig. 1] is a schematic view showing the structure of a metal mesh; [Fig. 2] is a partially enlarged schematic view showing the wire mesh of the first embodiment; [Fig. 3] is a partially enlarged schematic view showing the force buffer zone of the metal mesh. [Fig. 4] shows a schematic view of a metal mesh having a pattern of screen lines; [Fig. 5] is an enlarged schematic view showing a portion III in Fig. 4; [Fig. 6] is an enlarged view showing a portion IV of Fig. 5; [Fig. 7] is a screen showing a pattern area of a wire mesh line. The wire diameter; and [Fig. 8] shows a partial schematic view of the mask after coating a mask material on the metal mesh.

The embodiments of the present invention are described below by way of specific embodiments, and those skilled in the art can readily appreciate other advantages and functions of the present invention from the disclosure of the present disclosure. The present invention can also be implemented or applied by various other specific embodiments. The details of the present specification can also be modified and changed without departing from the spirit and scope of the present invention.

It should be noted that the structures, proportions, sizes, etc., which are illustrated in the drawings are only used to cope with the contents disclosed in the specification for understanding and reading by those skilled in the art, and are not intended to limit the creation. The qualifications of the implementation are not technically meaningful, and any modification of the structure, change of the proportional relationship or adjustment of the size shall remain in the interests of the creation and the purpose of the creation. The technical content disclosed in this creation can be covered. In the meantime, the terms "upper, lower", "one" and "bottom" as used in this specification are for convenience of description only, and are not intended to limit the scope of the creation of the creation. Changes or adjustments are considered to be within the scope of this creation if there is no material change in the material.

[Example 1]

The present embodiment provides a metal mesh, as shown in FIG. 1 , on which a mesh area is disposed, the mesh area is composed of two sets of mutually perpendicular wire mesh groups, and the mesh area of the metal mesh Intermediate area Provided with a pattern area, the pattern of the pattern area is composed of a wire mesh in a lateral or/and longitudinal direction; the metal mesh has no weaving type of warp and weft nodes, and the structure is integrally formed and has a smooth surface That is, the metal mesh wire mesh system is formed into a continuous non-woven type.

2 is a partially enlarged schematic view of the wire mesh, that is, an enlarged view of I in FIG. 1 , which is composed of mutually interlaced wire lines Ia, and the mesh number of the metal mesh in this embodiment The line is 330 mesh, the wire diameter of the wire is 20 um, and the thickness of the metal mesh is 25 um.

FIG. 3 is a partially enlarged schematic view showing the force-carrying buffer belt of the metal mesh cloth, that is, an enlarged view of the second portion of FIG. 1 , wherein the diameter of the buffer belt is changed according to a certain change rule. As shown in FIG. 3, the rule of the wire mesh diameter from the middle to the edge of the metal mesh is gradually increased, that is, r1 is smaller than r2 and smaller than r3, such as: r1=20um, r2=30um, r3=40um. As shown in Fig. 1, the wire mesh has a wire diameter of 40 um and is connected to the edge region of the mesh. This design allows the mesh to withstand the tension provided by the outside when it is stressed.

[Example 2]

The embodiment provides a metal mesh, the basic structure of which is the same as that of the first embodiment, and the transformed part is as follows: the mesh number of the mesh is 400 mesh, and the wire diameter of the wire mesh of the metal mesh is 25um, the thickness of the metal mesh is 20um.

On this basis, the metal mesh has the following structural changes:

The metal mesh is provided with a pattern, and the pattern described in this embodiment is a set of mutually parallel lines 4a, as shown in FIG. Figure 5 is an enlarged view of the portion III in Figure 4, and the area shown by 5a in Figure 5 is the line 4a shown in Figure 4, and the area shown by 5a lacks the transverse wire. cable.

Figure 6 is an enlarged schematic view of the portion IV in Figure 5, in the pattern area of the IV portion, the wire diameter of the wire mesh has the following rule: the wire diameter of the wire mesh of the main body of the metal mesh cloth r1> the inner wire mesh of the pattern area The wire diameter r4 of the two ends is the wire diameter r5 of the middle portion of the wire mesh inside the pattern region, which is a rounded structure; the wire diameter of the wire of the pattern portion of the wire portion of the IV portion may also be the following rule : As shown in Fig. 7, the wire diameter of the wire mesh inside the pattern area is uniform, and the wire diameter r1 of the wire mesh of the metal mesh body is uniform. The wire diameter r6 of the wire mesh inside the pattern area.

Figure 8 is a partial schematic view of a mask after coating a masking material on the metal mesh (corresponding to the portion shown in Figure 5), as shown in the opening of the mask There is only one direction of the screen wire 8a, which acts as a bridge line. Comparing FIG. 5 and FIG. 8 is: the grid opening size of the pattern area of the mask is not larger than the metal mesh. Corresponding mesh opening size of the pattern, the metal mesh screen corresponds to the opening size R1 of the pattern area of the mask The mesh opening size R2 of the pattern area of the mask. The design makes it possible to reduce the coating difficulty factor of the mask material of the mask, and since the screen line in the opening has only one direction, relatively few bridge lines reduce the influence on the printing paste, and the mask version can be guaranteed. The cutting effect is good.

[Example 3]

The present embodiment provides a metal mesh, the basic structure of which is similar to that of Embodiment 1 and Embodiment 2. The transformed part is as follows: the mesh number of the metal mesh is between 200 and 450 mesh, and the wire diameter of the wire mesh line The size is between 15 and 30 um, and the thickness of the metal mesh is between 15 and 30 um.

[Embodiment 4]

The embodiment provides a metal mesh, the basic structure of which is similar to that of the first embodiment and the second embodiment, and the transformed portion is as follows: the mesh size, the wire diameter, and the thickness of the metal mesh may be the numerical interval described in the third embodiment. Any combination of values.

In summary, in the metal mesh provided by the present invention and the mask made by using the metal mesh, the metal mesh is provided with a grid area, and the grid area is composed of two sets of mutually perpendicular screen lines. The intermediate portion of the mesh area of the metal mesh is provided with a pattern area, and the pattern of the pattern area is composed of a metal mesh cloth in a horizontal or/and longitudinal direction; the metal mesh number is 100~600 mesh, the wire diameter of the wire mesh is 10~100um, and the thickness of the metal mesh is 10~45um. This creation effectively solves the problem that the wire mesh has been woven in the conventional precision printing technology. The type of node causes a problem of uneven printing of the molding mask. Therefore, this creation effectively overcomes various shortcomings in the prior art and has a high industrial utilization value.

The above embodiments are intended to illustrate the principles of the present invention and its effects, and are not intended to limit the present invention. Anyone who is familiar with the art may modify the above embodiments without departing from the spirit and scope of the creation. Therefore, the scope of protection of this creation should be as listed in the scope of patent application described later.

I‧‧‧Grid Area

II‧‧‧ Force buffer zone

Claims (10)

A metal mesh provided with a mesh area, the mesh area being composed of two sets of mutually perpendicular mesh wire groups, wherein the mesh area of the metal mesh is provided with a pattern area, and the pattern of the pattern area is The wire mesh of the metal mesh in the transverse direction and/or the longitudinal direction; the mesh size of the metal mesh is between 100 and 600 mesh, and the wire diameter of the wire mesh is between 10 and 100 μm. The thickness of the metal mesh is between 10 and 45 um. The metal mesh of claim 1, wherein the wire mesh of the mesh area has a uniform wire diameter. The metal mesh of claim 1, wherein: the periphery of the mesh area is provided with a force buffering strip and a side hole strip connected to the force buffering strip. The metal mesh of claim 1, wherein the metal mesh is integrally formed and has a smooth surface and a structure of a non-woven node; the metal mesh wire system is a continuous non-woven type. Mesh. The metal mesh of claim 1, wherein the metal mesh number is between 200 and 450 mesh, and the wire diameter of the wire is between 15 and 30 um. The thickness of the metal mesh is between 15 and 30 um. The metal mesh of claim 1, wherein the wire diameter of the wire mesh of the pattern area on the metal mesh is not larger than the wire diameter of the wire of the non-pattern area. The metal mesh of claim 1, wherein: the metal mesh is as shown above The wire diameter of the wire mesh of the case area is uniform, or the wire diameter of the two ends of the wire mesh of the pattern area on the metal mesh is larger than the wire diameter of the middle part. The metal mesh according to claim 1, wherein the metal mesh is obtained by electroforming, and is a metal mesh made of pure nickel material or nickel-based alloy material. A mask made of a metal mesh of any one of the first to eighth aspects of the invention, wherein a pattern opening area of the mask has a mesh opening size not greater than a corresponding pattern on the metal mesh The mesh opening size. The mask of claim 9, wherein the wire mesh of the metal mesh is a set of mutually parallel lines corresponding to the gate lines of the mask.