CN202986318U - Honeycomb wire mesh - Google Patents
Honeycomb wire mesh Download PDFInfo
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- CN202986318U CN202986318U CN 201220146897 CN201220146897U CN202986318U CN 202986318 U CN202986318 U CN 202986318U CN 201220146897 CN201220146897 CN 201220146897 CN 201220146897 U CN201220146897 U CN 201220146897U CN 202986318 U CN202986318 U CN 202986318U
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- regular hexagon
- cellulated wiremesh
- wire diameter
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- wiremesh
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Abstract
The utility model relate to a honeycomb wire mesh which mainly solves the problem that in modern precise printing technology, a wire mesh used is instable in structure, and low in mechanical strength. The honeycomb wire mesh is characterized by a honeycomb structure formed by polygonal arrays which are interconnected and form a specific pattern. One of the preferable solutions is that the polygons of the honeycomb structure are regular hexagons, and the regular hexagon arrays are connected by non-regular hexagons. The edges of the non-regular hexagons serve as bridge lines for connecting the angular points of the regular hexagons. The honeycomb wire mesh solves the above mentioned problem and is applicable to precise printing industry.
Description
Technical field
The utility model relates to the Printing screen industry, and the utility model is specifically related to a kind of Cellulated wiremesh.
Background technology
Fast development along with economy, the consumption of the energy is increasing, the storage capacity of the non-renewable resources such as coal and oil reduces day by day, and this impels people to the continuous exploration of new forms of energy (as nuclear energy, solar energy, wind energy, biomass energy, geothermal energy, ocean energy, Hydrogen Energy etc.).Wherein, as the source of many energy on the earth, solar energy has occupied consequence in the research of new forms of energy, and solar cell is exactly a core representative of Application of Solar Energy.
The transformation efficiency that improves solar cell is a main target of present solar cell research, except the improvement to the selection of cell substrate material, substrate manufacture craft, selects suitable Printing screen also can improve the transformation efficiency of battery.
Emergence along with electron trade and each relevant industries, the application of accurate printing and small-sized package is also increasingly extensive, generally can relate to the application of mask plate in the link of precision printing and small-sized package, traditional mask plate comprises metal mold mask plate, compound mask plate.The material of metal current type mask plate is generally nickel-base alloy; And compound mask plate consists of comparatively complexity, the photoactive substance that it comprises silk screen and is coated on the silk screen surface.
Chinese patent CN101241956 has reported a kind of manufacture method of large-area nano film solar battery, it is characterized in that: monomer DSSC makes strip, adopt corrosion-resistant interconnector that the monomer DSSC of strip is connected into the solar energy in large area battery, the protection interlayer is established respectively in corrosion-resistant interconnector both sides, or the low resistance grid electrode that adopts the screen cloth print process to prepare, and at low resistance grid electrode surface coverage diaphragm, then adopt the low resistance grid electrode be coated with diaphragm with the monomer DSSC of a plurality of strips and be unified into large-area solar cell, the contact-making surface of solar energy in large area battery one side glass and TCO is established a perfusion groove, and at the perfusion groove of solar energy in large area battery one end, after pumping into electrolyte and dyestuff from the perfusion groove, the perfusion groove fractures, then seal.
Chinese patent CN102336051A discloses a kind of solar cell screen cloth printing equipment, comprise printing scraper, undercutter, return blade, printing screen plate, it is characterized in that near the printing scraper both sides of edges, two baffle arrangements being installed on printing screen plate, wherein baffle arrangement mainly is comprised of baffle-panels, baffle plate framework and installing rack; The bottom of baffle-panels contacts or coheres by flexible material with screen cloth face detachable; The edge of return blade and printing scraper and undercutter contacts with baffle-panels is seamless; Print engine head drives scraper and return blade and baffle-panels contact slide, and slurry is moved in the scope that both sides baffle-panels, scraper and return blade surround, and realizes that slurry is not to two side flow.
Chinese patent CN202058761U discloses the positive silver-colored half tone of a kind of screen cloth printing crystal silicon solar energy battery, comprise: silicon chip, main grid line, chamfering, secondary grid line, described silicon chip are provided with main grid line and secondary grid line, described main grid line arranges with secondary grid line is vertical, be provided with chamfering on described silicon chip, the front electrode grid line effectively can be expanded at silicon chip surface, the increase area coverage is effectively collected photoelectric current, thereby has improved the efficient of cell piece.
Chinese patent CN101969082A discloses the solar cell fabrication process that a kind of twice screen cloth printing is combined with cutting, for the manufacture of the solar cell that prints electrode for a kind of twice, include cutting technique and twice typography, cutting technique is: in the gate electrode line zone cutting of silicon chip surface, make gate electrode line zone formation erosion groove; Twice typography is: a, first impression electrode: the electrode slurry of printing is inserted the erosion groove and dried, form the ground floor electrode in the erosion groove; B, second impression electrode: print electrode at ground floor electrode outer surface, make silicon chip surface gate electrode line zone formation second layer electrode.
The silk screen that consists of conventional composite type mask plate is Weaving type woven wire or polyester webs etc., and this type of silk screen can cause the lower slurry effect of final molding mask plate due to the characteristic of Weaving type longitude and latitude node, as: lower slurry is uneven; In the manufacturing process of actual mask plate, often need first silk screen to be extruded, thereby reduce this effect of Weaving type silk screen as far as possible.But the ill effect that had both so operated and can't avoid the longitude and latitude node to bring fully.
The utility model is mainly to propose a kind of silk screen for this problem, solves preferably the above problem.
The utility model content
Technical problem to be solved in the utility model is in existing accurate printing technology, screen net structure used is unstable, the problem that the mechanical strength of silk screen is low, and the utility model provides a kind of new Cellulated wiremesh, this silk screen has Stability Analysis of Structures, the advantage that mechanical strength is higher.
For solving the problems of the technologies described above, the technical solution adopted in the utility model is as follows: a kind of Cellulated wiremesh, it is characterized in that described silk screen is the alveolate texture that the polygon array is interconnected to constitute, the polygon that consists of described silk screen alveolate texture is positive six polygons.
In technique scheme, preferred technical scheme is, be provided with non-regular hexagon array region on it, described non-regular hexagon array region consists of specific pattern on described positive six polygon arrays, be connected by non-regular hexagon between the regular hexagon array, non-orthohexagonal limit connects orthohexagonal angle point as the bridge line.
In technique scheme, preferred technical scheme is, the wire diameter r1 of described bridge line is 10 μ m≤r1≤r2≤80 μ m with the wire diameter r2 size range of the web lines that consists of described regular hexagon zone; The order number in formation regular hexagon zone is 100～800 orders.The wire diameter r1 of bridge line (51) is 15 μ m≤r1≤r2≤40 μ m with the wire diameter r2 size range of the web lines (52) that consists of described regular hexagon zone; The order number in formation regular hexagon zone is 200～400 orders.
The web lines wire diameter that consists of described Cellulated wiremesh graphics field is even; Described Cellulated wiremesh line is for linking up without Weaving type.On Cellulated wiremesh, the web lines wire diameter of graphics field is not more than the web lines wire diameter of non-graphics field; On described Cellulated wiremesh, the even or two of the remaining web lines wire diameter in graphics field is thin in the middle of thick.The structure of described Cellulated wiremesh is formed in one, and smooth surface is without the longitude and latitude node of Weaving type; Described Cellulated wiremesh is to make by electroforming process, and its material is pure nickel material or nickel-bass alloy material.
In technique scheme, preferred technical scheme is, the grid lines wire diameter that consists of described Cellulated wiremesh graphics field is even; The outer lateral opening band that is arranged with stressed buffer strip and is connected with buffer strip in non-grid regions; Described Cellulated wiremesh web lines is for linking up without Weaving type.Described Cellulated wiremesh order number is 200～450 orders, and wire diameter is of a size of 15～30 μ m, and thickness is 15～30 μ m; On Cellulated wiremesh, the remaining web lines wire diameter in graphics field is not more than the web lines wire diameter of non-graphics field; On described Cellulated wiremesh, the even or two of the remaining web lines wire diameter in graphics field is large thin in the middle of thick.Preferably technical scheme is, the structure of described Cellulated wiremesh is formed in one, and smooth surface is without the longitude and latitude node of Weaving type.Described Cellulated wiremesh is to make by electroforming process, and its material is pure nickel material or nickel-bass alloy material.
The utility model also comprises a kind of mask plate that adopts above-mentioned Cellulated wiremesh to make, and the opening size that it is characterized in that described mask plate graphics field is not more than the size in the web lines disappearance zone of corresponding figure on described Cellulated wiremesh.
In technique scheme, preferably technical scheme is, the figure that the described disappearance grid lines of Cellulated wiremesh consists of is one group of lines that are parallel to each other, and its thin grid line with mask plate is corresponding.
The Cellulated wiremesh that the utility model provides, it has the following advantages: 1, described Cellulated wiremesh is to make by electroforming process, it has surfacing, without the characteristic of establishment type longitude and latitude node, slurry is evenly at present in printing for the electrode of solar battery Printing screen by its making; 2, described Cellulated wiremesh without the grid lines on the direction of thin grid line place, has reduced the inhibition of Cellulated wiremesh to printing slurry in zone corresponding to the thin grid line of corresponding electrode of solar battery Printing screen.
The woven wire of non-woven type, the silk screen smooth surface, its mask plate of making can be due to the uneven damage that causes mask plate on surface in cleaning wiping process.Silk screen can design different percent openings, silk screen wire diameter size and web lines shape as required, is guaranteeing also can to guarantee the life-span of silk screen when silk screen has preferably lower slurry effect.
Based on above advantage, the electrode of solar battery Printing screen that described Cellulated wiremesh further makes can print " depth-width ratio " more excellent silicon solar battery electrode grid line structure, it is conducive to solar battery sheet to collection and the transmission of electric current, thereby has improved accordingly the transformation efficiency of solar battery sheet.
Description of drawings
Fig. 1 is Cellulated wiremesh overall structure schematic diagram.
Fig. 2 is the local enlarged diagram of woven wire in Fig. 1.
Fig. 3 is the silk screen overall structure schematic diagram that is provided with the special grid structure.
Fig. 4 is the local enlarged diagram that the silk screen of default figure is arranged.
Fig. 5 is local enlarged diagram in Fig. 4.
Fig. 6 is the structural representation of Cellulated wiremesh.
Fig. 7 is the structural representation of Cellulated wiremesh.
Fig. 8 is the structural representation of Cellulated wiremesh.
Fig. 9 is the structural representation of Cellulated wiremesh.
Figure 10 is the schematic diagram after silk screen surface coating one deck photopolymer.
In Fig. 1, I is grid regions; II is non-grid regions.
In Fig. 3, III is the regional area of the silk screen of default figure; 31 is lines.
In Fig. 4,41 is non-regular hexagon zone; 42 is the figure regional area.
In Fig. 5,41 is non-regular hexagon zone; 51 are bridging; 52 is the web lines in regular hexagon zone;
In Fig. 7, R1 is the width dimensions in non-regular hexagon zone.
In Figure 10, R1 is the width dimensions in non-regular hexagon zone; R2 is the rectangular opening size of hollow out.
Below by specific embodiment, the utility model is further elaborated.
The specific embodiment
[embodiment 1]
A kind of Cellulated wiremesh, as shown in Figure 1, described silk screen is the alveolate texture that the polygon array consists of.Figure 1 shows that a kind of overall structure schematic diagram of described silk screen, Figure 2 shows that the enlarged diagram of I part in Fig. 1 (being that the silk screen main body is local), the polygon that consists of described silk screen alveolate texture is positive six polygons, and so project organization is stable, makes the mechanical strength of silk screen large.
Figure 3 shows that the another kind of silk screen overall structure schematic diagram that is provided with the special grid structure on the basis of the above silk screen, described special network consists of figure on described silk screen main body, as shown in Figure 3, a kind of described figure is some groups of linears, and namely figure is obtained by lines 31 arrays.
Figure 4 shows that the described local enlarged diagram that the silk screen of default figure is arranged, the III part in its corresponding and Fig. 3, non-regular hexagon shown in figure zone 41 is corresponding to the lines 31 in Fig. 3.Non-regular hexagon zone 41 is by the graphic array of at least one group of other form.Part 42 in Fig. 4 further amplified be Fig. 5, as shown in Figure 5, non-regular hexagon zone 41 arrange according to certain rules by one group and with two adjacent regular hexagon joint areas get up bridging 51 and part orthohexagonal border consist of.Further, as shown in Figure 5, described bridging 51 is one group of equidistant parallel bridging, and as preferably, the head and the tail of bridging 51 are connected with orthohexagonal angle point.
The wire diameter r1 of bridging 51 and the wire diameter r2 of the web lines 52 that consists of described regular hexagon zone are of a size of: r1=13, and r2=80, the order number that consists of the regular hexagon zone is 200 orders.
[embodiment 2]
A kind of Cellulated wiremesh is the alveolate texture that the polygon array is interconnected to constitute, and the polygon that consists of described silk screen alveolate texture is positive six polygons.Other structures are identical with embodiment 1.
The wire diameter r1 of bridging 51 and the wire diameter r2 of the web lines 52 that consists of described regular hexagon zone are of a size of: r1=15, and r2=40, the order number that consists of the regular hexagon zone is 400 orders.Adjust the wire diameter size and meshcount can be controlled the mechanical strength of rational percent opening and silk screen by cooperation, thereby satisfy the different size requirement of its next step purposes.
[embodiment 3]
A kind of Cellulated wiremesh is the alveolate texture that the polygon array is interconnected to constitute, and the polygon that consists of described silk screen alveolate texture is positive six polygons.Its agent structure and embodiment 1 are basically identical, as shown in Figure 6, the structural representation of described Cellulated wiremesh, difference is: the relative position in the two adjacent regular hexagon zones that bridging is different from hexagonal link position maybe to be needed to connect is different.
Described Cellulated wiremesh is the planar metal template body of electrotyping forming, and its material is nickel-bass alloy material; The regular hexagon zone of the outer rim of described silk screen, the wire diameter size of the relative zone line of its web lines wire diameter size is large, is useful on fixing lateral opening structure with the regular hexagon side edge.
[embodiment 4]
A kind of Cellulated wiremesh is the alveolate texture that the polygon array is interconnected to constitute, and the polygon that consists of described silk screen alveolate texture is positive six polygons.Its agent structure and embodiment 1 are basically identical, as shown in Figure 7, the structural representation of described Cellulated wiremesh, difference is: the relative position in the two adjacent regular hexagon zones that bridging is different from hexagonal link position maybe to be needed to connect is different.
[embodiment 5]
A kind of Cellulated wiremesh is the alveolate texture that the polygon array is interconnected to constitute, and the polygon that consists of described silk screen alveolate texture is positive six polygons.Fig. 8 is the structural representation of described Cellulated wiremesh, and its agent structure and embodiment 1 are basically identical, and its difference is: the bridging and the regular hexagon regional body that consist of non-regular hexagon zone are non-perpendicular relation.
Described Cellulated wiremesh is the planar metal template body of electrotyping forming, and its material is the nickel metal material.The regular hexagon zone of the outer rim of described silk screen, the wire diameter size of the relative zone line of its web lines wire diameter size is large, is useful on fixing lateral opening structure with the regular hexagon side edge.
[embodiment 6]
A kind of Cellulated wiremesh is the alveolate texture that the polygon array is interconnected to constitute, and the polygon that consists of described silk screen alveolate texture is positive six polygons.Fig. 9 is the structural representation of described Cellulated wiremesh, and its agent structure and embodiment 1 are basically identical, and its difference is: the bridging and the regular hexagon regional body that consist of non-regular hexagon zone are non-perpendicular relation.Described Cellulated wiremesh is the planar metal template body of electrotyping forming, and its material is the nickel metal material.The regular hexagon zone of the outer rim of described silk screen, the wire diameter size of the relative zone line of its web lines wire diameter size is large, is useful on fixing lateral opening structure with the regular hexagon side edge.
[embodiment 7]
A kind of Cellulated wiremesh, its structure is substantially the same manner as Example 4, as shown in figure 10, the schematic diagram after described silk screen surface coating one deck photopolymer.It is corresponding to regional structure shown in Figure 7, be that structure shown in Figure 10 is to apply or overlay one deck photopolymer on the basis of structure shown in Figure 7, its photopolymer is distributed on the regular hexagon zone and the non-regular hexagon of part zone of silk screen, zone uncoated or that overlay photopolymer forms the strip opening with bridging, relation has as shown in Figure 10: the width dimensions R1 in the non-regular hexagon zone of the rectangular opening size R2 of hollow out≤its correspondence, R2=20 μ m, R1=300 μ m.
[embodiment 8]
A kind of Cellulated wiremesh, its structure is substantially the same manner as Example 5, the schematic diagram after described silk screen surface coating one deck photopolymer.It is corresponding to regional structure shown in Figure 8, namely to overlay one deck photopolymer on the basis of structure shown in Figure 8, its photopolymer is distributed on the regular hexagon zone and the non-regular hexagon of part zone of silk screen, zone uncoated or that overlay photopolymer forms the strip opening with bridging, relation has as shown in Figure 10: the width dimensions R1 in the non-regular hexagon zone of the rectangular opening size R2 of hollow out≤its correspondence, R2=30 μ m, R1=150 μ m.
[embodiment 9]
A kind of Cellulated wiremesh, its structure is substantially the same manner as Example 9, the schematic diagram after described silk screen surface coating one deck photopolymer.It is corresponding to regional structure shown in Figure 9, namely to overlay one deck photopolymer on the basis of structure shown in Figure 9, its photopolymer is distributed on the regular hexagon zone and the non-regular hexagon of part zone of silk screen, zone uncoated or that overlay photopolymer forms the strip opening with bridging, the illustrated dimension relation has: the width dimensions R1 in the non-regular hexagon zone of the rectangular opening size R2 of hollow out≤its correspondence, be R2=30 μ m, R1=150 μ m.
[embodiment 10]
Comprise grid regions, non-grid regions, described grid regions is connected with non-grid regions, described non-grid regions is arranged on the periphery of grid regions, described grid regions is made of two groups of orthogonal grid lines groups, the grid regions zone line of described Cellulated wiremesh is provided with area of the pattern, and described pattern is to be made of along the disappearance that laterally or vertically goes up web lines Cellulated wiremesh; Described Cellulated wiremesh is without the longitude and latitude node of Weaving type, and its structure is formed in one, and smooth surface namely consists of described Cellulated wiremesh line for linking up without Weaving type.
Fig. 2 is the local enlarged diagram of described woven wire, and it is made of interlaced web lines Ia, and the order number of Cellulated wiremesh described in the present embodiment is 330 orders, and the screen cloth wire diameter is 20 μ m, and the thickness of screen cloth is 25 μ m.
Figure 3 shows that the local enlarged diagram of the stressed buffer strip of described Cellulated wiremesh, the wire diameter size of described buffer strip is by changing by certain Changing Pattern, the described rule of the present embodiment as shown in Figure 3, progressively increased by the wire diameter size to the edge in the middle of Cellulated wiremesh, be r1＜r2＜r3, as: r1=20 μ m, r2=30 μ m, r3=40 μ m.As shown in Figure 1, wire diameter is that the outside of 40 μ m is connected with the lateral opening zone of screen cloth.So design can make screen cloth can better bear the pulling force that the external world provides when stressed tightening.
[embodiment 11]
A kind of Cellulated wiremesh, its basic framework is identical with embodiment 1, and the part of its conversion is as follows: the order number of screen cloth is 400 orders, and the screen cloth wire diameter is 25 μ m, and the thickness of screen cloth is 20 μ m.
On this basis, described Cellulated wiremesh also has following structural modification:
Be provided with pattern on described Cellulated wiremesh, the described pattern of the present embodiment is one group of lines 4a that is parallel to each other, as shown in Figure 4.Figure 5 shows that the enlarged diagram of the part of III in Fig. 4, the 5a in Fig. 5 is the 4a of lines shown in Fig. 4, and the 5a place lacks horizontal grid lines.
Figure 6 shows that the enlarged diagram of the part of IV in Fig. 5, in the remaining web lines wire diameter in graphics field of disappearance grid lines, following rule is arranged: Cellulated wiremesh main body wire diameter r1 the two ends wire diameter r4 of the inner web lines in graphics field the wire diameter r5 of the inner web lines zone line in graphics field; The remaining web lines wire diameter in the graphics field of described disappearance grid lines is can be following rule: as shown in Figure 7, and the web lines wire diameter size uniform of inside, graphics field, and the wire diameter r6 of the inner web lines of Cellulated wiremesh main body wire diameter r1 〉=graphics field is arranged.
Shown in Figure 8 is the mask plate partial schematic diagram (corresponding with part shown in Figure 5) after coating one layer mask material on this Cellulated wiremesh, only there is as shown in the figure the web lines 8a of a direction in the opening of described mask plate, it plays the effect of bridging, and comparison diagram 5, Fig. 8 have: the opening size of the opening size R1 in Cellulated wiremesh line disappearance zone 〉=mask plate figure corresponding region.So design, can reduce the coating degree-of-difficulty factor of the mask material of mask plate, and because the opening part web lines only has on a direction, relatively less bridging has reduced the impact on printing slurry, can guarantee that the blanking of mask plate is effective.
Although illustrated and described embodiment of the present utility model, those having ordinary skill in the art will appreciate that: in the situation that do not break away from principle of the present utility model and aim can be carried out multiple variation, modification, replacement and modification to these embodiment, scope of the present utility model is limited by claim and equivalent thereof.
Claims (8)
1. a Cellulated wiremesh, is characterized in that described silk screen is the alveolate texture that the polygon array is interconnected to constitute, and the polygon that consists of described silk screen alveolate texture is regular hexagon.
2. Cellulated wiremesh according to claim 1, it is characterized in that, also be provided with non-regular hexagon array region on described Cellulated wiremesh, described non-regular hexagon array region consists of specific pattern on described regular hexagon array, be connected by non-regular hexagon between the regular hexagon array, non-orthohexagonal limit connects orthohexagonal angle point as the bridge line.
3. Cellulated wiremesh according to claim 1, the wire diameter r1 that it is characterized in that described bridge line is 10 μ m≤r1≤r2≤80 μ m with the wire diameter r2 size range of the web lines that consists of described regular hexagon zone; The order number in formation regular hexagon zone is 100～800 orders.
4. Cellulated wiremesh according to claim 1, the wire diameter r1 that it is characterized in that bridge line (51) is 15 μ m≤r1≤r2≤40 μ m with the wire diameter r2 size range of the web lines (52) that consists of described regular hexagon zone; The order number in formation regular hexagon zone is 200～400 orders.
5. Cellulated wiremesh according to claim 1, the web lines wire diameter that it is characterized in that consisting of described Cellulated wiremesh graphics field is even; Described Cellulated wiremesh line is for linking up without Weaving type.
6. Cellulated wiremesh according to claim 2, is characterized in that the web lines wire diameter of graphics field on Cellulated wiremesh is not more than the web lines wire diameter of non-graphics field; On described Cellulated wiremesh, the even or two of the remaining web lines wire diameter in graphics field is thin in the middle of thick.
7. Cellulated wiremesh according to claim 1, is characterized in that the structure of described Cellulated wiremesh is formed in one, and smooth surface is without the longitude and latitude node of Weaving type.
8. Cellulated wiremesh according to claim 7, is characterized in that described Cellulated wiremesh is to make by electroforming process, and its material is pure nickel material or nickel-bass alloy material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220146897 CN202986318U (en) | 2012-04-10 | 2012-04-10 | Honeycomb wire mesh |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220146897 CN202986318U (en) | 2012-04-10 | 2012-04-10 | Honeycomb wire mesh |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202986318U true CN202986318U (en) | 2013-06-12 |
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ID=48557532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220146897 Withdrawn - After Issue CN202986318U (en) | 2012-04-10 | 2012-04-10 | Honeycomb wire mesh |
Country Status (1)
| Country | Link |
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| CN (1) | CN202986318U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013152693A1 (en) * | 2012-04-10 | 2013-10-17 | 昆山允升吉光电科技有限公司 | Honeycomb-shaped metal wire mesh |
| CN104290433A (en) * | 2014-09-03 | 2015-01-21 | 安徽省大富光电科技有限公司 | Printing mesh component and manufacturing method thereof |
-
2012
- 2012-04-10 CN CN 201220146897 patent/CN202986318U/en not_active Withdrawn - After Issue
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013152693A1 (en) * | 2012-04-10 | 2013-10-17 | 昆山允升吉光电科技有限公司 | Honeycomb-shaped metal wire mesh |
| CN103358671A (en) * | 2012-04-10 | 2013-10-23 | 昆山允升吉光电科技有限公司 | Honeycomb metal wire mesh |
| CN103358671B (en) * | 2012-04-10 | 2017-06-06 | 昆山允升吉光电科技有限公司 | Cellulated wiremesh |
| CN104290433A (en) * | 2014-09-03 | 2015-01-21 | 安徽省大富光电科技有限公司 | Printing mesh component and manufacturing method thereof |
| CN104290433B (en) * | 2014-09-03 | 2020-04-10 | 安徽省大富光电科技有限公司 | Screen unit for printing and method for manufacturing the same |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20130612 Effective date of abandoning: 20170606 |