CN202986317U - Silk screen and mask plate made of the silk screen - Google Patents
Silk screen and mask plate made of the silk screen Download PDFInfo
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- CN202986317U CN202986317U CN 201220146871 CN201220146871U CN202986317U CN 202986317 U CN202986317 U CN 202986317U CN 201220146871 CN201220146871 CN 201220146871 CN 201220146871 U CN201220146871 U CN 201220146871U CN 202986317 U CN202986317 U CN 202986317U
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Abstract
The utility model relates to a silk screen and mainly solves the problem that a formed mask plate is non-uniform in printing due to weaving warp and weft nodes of a silk screen in conventional precision printing. The silk screen provided in the utility model has a grid structure, and is characterized in that a pattern formed by lines (1a) arrays. The pattern main body comprises interlacing first grid lines (2b1) and second grid lines (2b2), wherein the lines (1a) comprise a set of parallel bridging lines (1a1) which are at an included angle alpha to adjacent grid area, the included angle alpha ranging from 0 to 180 degrees. The silk screen solves the above mentioned problems and is applicable to precision printing industry.
Description
Technical field
The utility model relates to the Printing screen industry, is specifically related to the mask plate of a kind of silk screen and making thereof.
Background technology
Fast development along with economy, the consumption of the energy is increasing, the storage capacity of the non-renewable resources such as coal and oil reduces day by day, and this impels people to the continuous exploration of new forms of energy (as nuclear energy, solar energy, wind energy, biomass energy, geothermal energy, ocean energy, Hydrogen Energy etc.).Wherein, as the source of many energy on the earth, solar energy has occupied consequence in the research of new forms of energy, and solar cell is exactly a core representative of Application of Solar Energy.
The transformation efficiency that improves solar cell is a main target of present solar cell research, except the improvement to the selection of cell substrate material, substrate manufacture craft, selects suitable Printing screen also can improve the transformation efficiency of battery.
Emergence along with electron trade and each relevant industries, the application of accurate printing and small-sized package is also increasingly extensive, generally can relate to the application of mask plate in the link of precision printing and small-sized package, traditional mask plate comprises metal mold mask plate, compound mask plate.The material of metal current type mask plate is generally nickel-base alloy; And compound mask plate consists of comparatively complexity, the photoactive substance that it comprises silk screen and is coated on the silk screen surface.
Chinese patent CN101241956 has reported a kind of manufacture method of large-area nano film solar battery, it is characterized in that: monomer DSSC makes strip, adopt corrosion-resistant interconnector that the monomer DSSC of strip is connected into the solar energy in large area battery, a protection interlayer is established respectively in corrosion-resistant interconnector both sides, or the low resistance grid electrode that adopts the screen cloth print process to prepare, and at low resistance grid electrode surface coverage diaphragm, then adopt the low resistance grid electrode be coated with diaphragm with the monomer DSSC of a plurality of strips and be unified into large-area solar cell, the contact-making surface of solar energy in large area battery one side glass and TCO is established a perfusion groove, and at the perfusion groove of solar energy in large area battery one end, after pumping into electrolyte and dyestuff from the perfusion groove, the perfusion groove fractures, then seal.
Chinese patent CN102336051A discloses a kind of solar cell screen cloth printing equipment, comprise printing scraper, undercutter, return blade, printing screen plate, it is characterized in that near the printing scraper both sides of edges, two baffle arrangements being installed on printing screen plate, wherein baffle arrangement mainly is comprised of baffle-panels, baffle plate framework and installing rack; The bottom of baffle-panels contacts or coheres by flexible material with screen cloth face detachable; The edge of return blade and printing scraper and undercutter contacts with baffle-panels is seamless; Print engine head drives scraper and return blade and baffle-panels contact slide, and slurry is moved in the scope that both sides baffle-panels, scraper and return blade surround, and realizes that slurry is not to two side flow.
Chinese patent CN202058761U discloses the positive silver-colored half tone of a kind of screen cloth printing crystal silicon solar energy battery, comprise: silicon chip, main grid line, chamfering, secondary grid line, described silicon chip are provided with main grid line and secondary grid line, described main grid line arranges with secondary grid line is vertical, be provided with chamfering on described silicon chip, the front electrode grid line effectively can be expanded at silicon chip surface, the increase area coverage is effectively collected photoelectric current, thereby has improved the efficient of cell piece.
Chinese patent CN101969082A discloses the solar cell fabrication process that a kind of twice screen cloth printing is combined with cutting, for the manufacture of the solar cell that prints electrode for a kind of twice, include cutting technique and twice typography, cutting technique is: in the gate electrode line zone cutting of silicon chip surface, make gate electrode line zone formation erosion groove; Twice typography is: a, first impression electrode: the electrode slurry of printing is inserted the erosion groove and dried, form the ground floor electrode in the erosion groove; B, second impression electrode: print electrode at ground floor electrode outer surface, make silicon chip surface gate electrode line zone formation second layer electrode.
The silk screen that consists of conventional composite type mask plate is Weaving type woven wire or polyester webs etc., and this type of silk screen can cause the lower slurry effect of final molding mask plate due to the characteristic of Weaving type longitude and latitude node, as: lower slurry is uneven; In the manufacturing process of actual mask plate, often need first silk screen to be extruded, thereby reduce this effect of Weaving type silk screen as far as possible.But the ill effect that had both so operated and can't avoid the longitude and latitude node to bring fully.
The utility model is mainly to propose a kind of silk screen for this problem, solves preferably the above problem.
The utility model content
One of technical problem to be solved in the utility model is in existing accurate printing technology, because silk screen used has Weaving type longitude and latitude node, cause the inhomogeneous problem of moulding mask plate printing, the utility model provides a kind of new silk screen, this screen cloth does not have the longitude and latitude node, smooth surface has advantages of that the printing uniformity is high.
Two of technical problem to be solved in the utility model is to provide a kind of mask plate that adopts above-mentioned silk screen to make, and this mask plate has the uniform advantage of printing.
For one of solving the problems of the technologies described above, the technical solution adopted in the utility model is as follows: a kind of silk screen, zone line are network, and outer rim has for the lateral opening structure of fixing described silk screen the figure that is made of lines 1a array on described network; The figure main body is interlocked by the first grid lines 2b1 and the second grid lines 2b2 and is consisted of; Lines 1a is made of one group of parallel bridging line 1a1, and the angle α of the 1a body region of described bridging line 1a1 and its formation is 0 ~ 180 °.
In technique scheme, preferred technical scheme is, consists of the wire diameter size r1 of the first grid lines 2b1, the second grid lines 2b2 of silk screen main body more than or equal to the wire diameter size r2 of the bridging line 1a1 that consists of the bargraphs zone.Described wire diameter size 10 μ m≤r2≤r1≤80 μ m.Consisting of at least one networking ruling of silk screen main body and the angle α of bridging line is 10 ~ 170 °.The first grid lines (2b1) that consists of the silk screen main body is coherent structure with the bridging line (1a1) that consists of bridging line zone (1a); The bridging line (1a1) that consists of two adjacent bridging line zones (1a) becomes mirror.The silk screen surface applies or overlays one deck photopolymer; Photopolymer is distributed on the agent structure of silk screen and lines 1a upper subregion, and zone uncoated or that overlay photopolymer forms Openworks shape.Be covered with the width dimensions R1 of the width dimensions R2 in the structure hollow out zone of photopolymer≤original lines 1a.Be parallel on the x direction of hollow out regional body, the head end of the two adjacent last bridging lines of bridging line 1a1 and the tail end of next bridging line are in same position on the x direction.Web lines wire diameter size r1, r2, opening size R1, the R1 ' of graphics field, R2, R2 ', 25 μ m≤R1(R1 ')≤300 μ m.
For solve the problems of the technologies described above two, the technical solution adopted in the utility model is as follows: a kind of mask plate that adopts above-mentioned silk screen to make, the opening size that it is characterized in that described mask plate graphics field are not more than the size in the web lines disappearance zone of corresponding figure on described metal screen cloth.
In technique scheme, preferably technical scheme is, the structure of silk screen is for one-body molded by electroforming process, and smooth surface is without the longitude and latitude node of Weaving type; Its material is pure nickel material or nickel-bass alloy material.
The silk screen that the utility model provides, it has the following advantages: 1, described silk screen is to make by electroforming process, and it has surfacing, without the characteristic of establishment type longitude and latitude node, and slurry is evenly at present in printing for the electrode of solar battery Printing screen by its making; 2, described silk screen without the grid lines on the direction of thin grid line place, has reduced the inhibition of silk screen to printing slurry in zone corresponding to the thin grid line of corresponding electrode of solar battery Printing screen.
The woven wire of non-woven type, the silk screen smooth surface, its mask plate of making can be due to the uneven damage that causes mask plate on surface in cleaning wiping process.Silk screen can design different percent openings, silk screen wire diameter size and web lines shape as required, is guaranteeing also can to guarantee the life-span of silk screen when silk screen has preferably lower slurry effect.
Based on above advantage, the electrode of solar battery Printing screen that described silk screen further makes can print " depth-width ratio " more excellent silicon solar battery electrode grid line structure, it is conducive to solar battery sheet to collection and the transmission of electric current, thereby has improved accordingly the transformation efficiency of solar battery sheet.
Description of drawings
Fig. 1 is silk screen overall structure schematic diagram.
Fig. 2 is the enlarged diagram of I part in Fig. 1.
Fig. 3 is the screen net structure schematic diagram.
Fig. 4 is the screen net structure schematic diagram.
Fig. 5 is the schematic diagram after woven wire surface coating one deck photopolymer.
Fig. 6 is for being the local enlarged diagram of hollow out zone 5a.
Fig. 7 is the structural representation after applying one deck photopolymer on structure shown in Figure 4.
In Fig. 1, I is grid regions; 1a is lines.
In Fig. 2,1a is bridging line zone (being the enlarged diagram of lines 1a in Fig. 1); 1a1 bridging line; 2b1 is that the first grid lines, 2b2 are the second grid lines; α is the angle that grid lines and bridging line form.
In Fig. 3, R1 is the opening size of graphics field.
In Fig. 4, R1 ' is the opening size of graphics field.
In Fig. 5, R2 is the width dimensions that is covered with the structure hollow out zone of photopolymer.
In Fig. 6, R2 is the width dimensions that is covered with the structure hollow out zone of photopolymer.
In Fig. 7, R2
,Width dimensions for the structure hollow out zone that is covered with photopolymer.
Below by specific embodiment, the utility model is further elaborated.
The specific embodiment
[embodiment 1]
A kind of silk screen, its overall structure as shown in Figure 1, interior zone is screen net structure, outer rim is for being used for fixing lateral opening structure.The screen net structure of described interior zone is provided with on the screen net structure of interior zone by lines 1a array and consists of the graphics field.Fig. 2 is shown the enlarged diagram of I part in Fig. 1, and the main body of silk screen is made of two groups of orthogonal first grid lines 2b1, the second grid lines 2b2 vertical interlaced.1a zone shown in Fig. 2 is the structure for amplifying of lines 1a in Fig. 1, and it is made of one group of parallel bridging line 1a1, the 1a regional body 1a angle at 45 ° of described bridging line 1a1 and its formation.
As shown in Figure 2, consist of the wire diameter size r1 of the first grid lines 2b1, the second grid lines 2b2 of silk screen main body more than or equal to the wire diameter size r2 of the bridging line 1a1 that consists of the bargraphs zone, r1=20, r2=16.
Described silk screen is the Ni-based alloy-type silk screen of electroforming.
[embodiment 2]
A kind of silk screen, its overall structure are with embodiment 1, and described bridging line 1a1 becomes the angle of 90 ° with the 1a regional body 1a of its formation.Wire diameter size r1=25, r2=18.Described silk screen is electroforming metal nickel wire net.
[embodiment 3]
A kind of silk screen, the size restriction of its size restriction and basic constituent element and silk screen shown in Figure 2 and basic constituent element and embodiment's 1 is consistent, as shown in Figure 3, the two networking rulings that consist of the silk screen main body in screen net structure become the angle of 60 °, the first grid lines 2b1 of formation silk screen main body and the bridging line 1a1 in formation 1a zone are coherent structure, and (wherein the 1a zone is the enlarged diagram of 1a linear figure in Fig. 1.Described silk screen is the Ni-based alloy-type silk screen of electroforming.
[embodiment 4]
A kind of silk screen, the size of its size restriction and basic constituent element and silk screen shown in Figure 2 limits and basic constituent element
Consistent with embodiment 1, as shown in Figure 4, in Fig. 4,1a is the enlarged diagram of 1a linear in Fig. 1, and the bridging line structure 1a1 that consists of the 1a zone arranges has two kinds of arrangement modes at least.As preferably, the bridging line 1a1 that consists of adjacent two 1a zones becomes mirror, and described silk screen is the Ni-based alloy-type silk screen of electroforming.
[embodiment 5]
A kind of silk screen, zone line are network, and outer rim has for the lateral opening structure of fixing described silk screen the figure that is made of lines 1a array on described network; The figure main body is made of two groups of orthogonal first grid lines 2b1 and the second grid lines 2b2 vertical interlaced; Lines 1a is made of one group of parallel bridging line 1a1, and the angle α of the 1a body region of described bridging line 1a1 and its formation is 75 °.
As shown in Figure 5, be schematic diagram after the above woven wire surface applies one deck photopolymer.It is corresponding to regional structure shown in Figure 3, be that structure shown in Figure 5 is to apply or overlay one deck photopolymer on the basis of structure shown in Figure 3, its photopolymer is distributed on the agent structure of silk screen and lines 1a upper subregion, the zone of uncoated photopolymer forms Openworks shape, as shown in Figure 5 the 1a zone.Be covered with the width dimensions R1 of the width dimensions R2 in the structure hollow out zone of photopolymer≤original lines 1a.
[embodiment 6]
A kind of silk screen, structure is identical with embodiment 5, the structure that overlays after one deck photopolymer has following characteristics at 1a place, hollow out zone: as shown in Figure 6, it is the local enlarged diagram of hollow out zone 1a, the bridging line 1a1 part that drops on the hollow out intra-zone is being parallel on the x direction of hollow out regional body, and the head end of the two adjacent last bridging lines of bridging line 1a1 and the tail end of next bridging line are in same position on the x direction.So design can be so that utilize the effect of this structure web plate printing slurry more even.
Require the particularly requirement of printing precision to design web lines wire diameter size r1, the r2 of concrete silk screen according to the purposes of final half tone, opening size R1, the R1 ' of graphics field, R2, R2 ', thus the percent opening of control final products is to satisfy different print requests.Pair restriction of silk screen graphics field width dimensions R1, R1 ' is separately arranged: R1=100 μ m in embodiment.
[embodiment 7]
A kind of silk screen, structure is identical with embodiment 4, and Fig. 7 is the structural representation after applying one deck photopolymer on the basis of structure shown in Figure 4, and it is identical with the concrete fit structure of Fig. 5.
Although illustrated and described embodiment of the present utility model, those having ordinary skill in the art will appreciate that: in the situation that do not break away from principle of the present utility model and aim can be carried out multiple variation, modification, replacement and modification to these embodiment, scope of the present utility model is limited by claim and equivalent thereof.
Claims (11)
1. a silk screen, be provided with network on described silk screen, it is characterized in that having the figure that is made of lines (1a) array on described network; The figure main body is by the first grid lines (2b1) and the staggered formation of the second grid lines (2b2); Lines (1a) are made of one group of parallel bridging line (1a1), and the angle α that the net region that described bridging line (1a1) is adjacent consists of is 0 ~ 180 °.
2. silk screen according to claim 1 is characterized in that consisting of the wire diameter size r1 of staggered the first grid lines (2b1), the second grid lines (2b2) of silk screen main body more than or equal to the wire diameter size r2 of the bridging line (1a1) that consists of the bargraphs zone.
3. silk screen according to claim 2, the pass that it is characterized in that described wire diameter size r1 and described wire diameter size r2 is 10 μ m≤r2≤r1≤80 μ m.
4. silk screen according to claim 1, a networking ruling (2b1) that it is characterized in that consisting of the silk screen main body is coherent structure with the bridging line (1a1) that consists of bridging line zone; The bridging line (1a1) that consists of adjacent bridging and net region becomes mirror.
5. silk screen according to claim 1 is characterized in that consisting of at least one networking ruling of silk screen main body and the angle α of bridging line is 10 ~ 170 °.
6. silk screen according to claim 1, is characterized in that silk screen surface coating or overlay one deck photopolymer; Photopolymer is distributed on the agent structure of silk screen and lines (1a) upper subregions, and zone uncoated or that overlay photopolymer forms Openworks shape.
7. silk screen according to claim 1 is characterized in that being covered with the width dimensions R1 of the width dimensions R2 in the structure hollow out zone of photopolymer≤original lines (1a).
8. silk screen according to claim 1, is characterized in that being parallel on the x direction of hollow out regional body, and the head end of the two adjacent last bridging lines of bridging line (1a1) and the tail end of next bridging line are in same position on the x direction.
9. silk screen according to claim 1, is characterized in that the opening size R1 span of graphics field is: 25 μ m≤R1≤300 μ m.
10. silk screen according to claim 1, is characterized in that the structure of described silk screen for one-body molded by electroforming process, and smooth surface is without the longitude and latitude node of Weaving type; Its material is pure nickel material or nickel-bass alloy material.
11. one kind is adopted the mask plate that in claim 1～9, any one silk screen makes, the opening size that it is characterized in that described mask plate graphics field is not more than the size in the web lines disappearance zone of corresponding figure on described silk screen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220146871 CN202986317U (en) | 2012-04-10 | 2012-04-10 | Silk screen and mask plate made of the silk screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220146871 CN202986317U (en) | 2012-04-10 | 2012-04-10 | Silk screen and mask plate made of the silk screen |
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| Publication Number | Publication Date |
|---|---|
| CN202986317U true CN202986317U (en) | 2013-06-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220146871 Expired - Fee Related CN202986317U (en) | 2012-04-10 | 2012-04-10 | Silk screen and mask plate made of the silk screen |
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| CN (1) | CN202986317U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103358668A (en) * | 2012-04-10 | 2013-10-23 | 昆山允升吉光电科技有限公司 | Silk screen |
-
2012
- 2012-04-10 CN CN 201220146871 patent/CN202986317U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103358668A (en) * | 2012-04-10 | 2013-10-23 | 昆山允升吉光电科技有限公司 | Silk screen |
| CN103358668B (en) * | 2012-04-10 | 2017-03-15 | 昆山允升吉光电科技有限公司 | Silk screen |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| PP01 | Preservation of patent right | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20190808 Granted publication date: 20130612 |
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| PD01 | Discharge of preservation of patent | ||
| PD01 | Discharge of preservation of patent |
Date of cancellation: 20220410 Granted publication date: 20130612 |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130612 Termination date: 20200410 |