JP5848263B2 - ナノインプリントのためのプロセスガス閉じ込め - Google Patents

ナノインプリントのためのプロセスガス閉じ込め Download PDF

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Publication number
JP5848263B2
JP5848263B2 JP2012551980A JP2012551980A JP5848263B2 JP 5848263 B2 JP5848263 B2 JP 5848263B2 JP 2012551980 A JP2012551980 A JP 2012551980A JP 2012551980 A JP2012551980 A JP 2012551980A JP 5848263 B2 JP5848263 B2 JP 5848263B2
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Prior art keywords
barrier
substrate
chuck
imprint head
template
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JP2012551980A
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Japanese (ja)
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JP2013519228A5 (https=
JP2013519228A (ja
Inventor
ジェーン，アンクール
シャックルトン，スティーヴン，シイ
チョイ，ビュン−ジン
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モレキュラー・インプリンツ・インコーポレーテッド
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Physical Vapour Deposition (AREA)
JP2012551980A 2010-02-09 2011-02-08 ナノインプリントのためのプロセスガス閉じ込め Active JP5848263B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30273810P 2010-02-09 2010-02-09
US61/302,738 2010-02-09
PCT/US2011/000227 WO2011100050A2 (en) 2010-02-09 2011-02-08 Process gas confinement for nano-imprinting

Publications (3)

Publication Number Publication Date
JP2013519228A JP2013519228A (ja) 2013-05-23
JP2013519228A5 JP2013519228A5 (https=) 2014-03-20
JP5848263B2 true JP5848263B2 (ja) 2016-01-27

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ID=44353067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012551980A Active JP5848263B2 (ja) 2010-02-09 2011-02-08 ナノインプリントのためのプロセスガス閉じ込め

Country Status (5)

Country Link
US (1) US20110193251A1 (https=)
EP (1) EP2534536A2 (https=)
JP (1) JP5848263B2 (https=)
TW (1) TWI620982B (https=)
WO (1) WO2011100050A2 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722801B2 (ja) 1987-03-18 1995-03-15 石川島播磨重工業株式会社 中空管の鍛造方法
JP3333115B2 (ja) 1997-07-22 2002-10-07 株式会社神戸製鋼所 大径リングの鍛造装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787691B2 (ja) * 2011-09-21 2015-09-30 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
WO2013048577A1 (en) * 2011-09-26 2013-04-04 Solarity, Inc. Substrate and superstrate design and process for nano-imprinting lithography of light and carrier collection management devices
JP6064466B2 (ja) * 2012-09-11 2017-01-25 大日本印刷株式会社 インプリント方法およびそれを実施するためのインプリント装置
JP6230041B2 (ja) * 2013-04-18 2017-11-15 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP2015056548A (ja) * 2013-09-12 2015-03-23 大日本印刷株式会社 インプリント装置及びインプリント方法
CN103758153A (zh) * 2014-01-17 2014-04-30 国家电网公司 一种具有警示功能的井盖
JP6525567B2 (ja) 2014-12-02 2019-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法
JP7064310B2 (ja) * 2017-10-24 2022-05-10 キヤノン株式会社 インプリント装置、および物品製造方法
JP7210155B2 (ja) * 2018-04-16 2023-01-23 キヤノン株式会社 装置、方法、および物品製造方法
US11590687B2 (en) 2020-06-30 2023-02-28 Canon Kabushiki Kaisha Systems and methods for reducing pressure while shaping a film

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
US6764386B2 (en) * 2002-01-11 2004-07-20 Applied Materials, Inc. Air bearing-sealed micro-processing chamber
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7316554B2 (en) * 2005-09-21 2008-01-08 Molecular Imprints, Inc. System to control an atmosphere between a body and a substrate
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
ATE513625T1 (de) * 2006-04-03 2011-07-15 Molecular Imprints Inc Lithographiedrucksystem
US20090056575A1 (en) * 2007-08-31 2009-03-05 Bartman Jon A Pattern transfer apparatus
NL2005435A (en) * 2009-11-30 2011-05-31 Asml Netherlands Bv Imprint lithography apparatus and method.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722801B2 (ja) 1987-03-18 1995-03-15 石川島播磨重工業株式会社 中空管の鍛造方法
JP3333115B2 (ja) 1997-07-22 2002-10-07 株式会社神戸製鋼所 大径リングの鍛造装置

Also Published As

Publication number Publication date
TWI620982B (zh) 2018-04-11
EP2534536A2 (en) 2012-12-19
TW201144951A (en) 2011-12-16
US20110193251A1 (en) 2011-08-11
WO2011100050A3 (en) 2011-11-10
WO2011100050A2 (en) 2011-08-18
JP2013519228A (ja) 2013-05-23

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