JP5847996B2 - 複合粒子の製造方法 - Google Patents

複合粒子の製造方法 Download PDF

Info

Publication number
JP5847996B2
JP5847996B2 JP2010132396A JP2010132396A JP5847996B2 JP 5847996 B2 JP5847996 B2 JP 5847996B2 JP 2010132396 A JP2010132396 A JP 2010132396A JP 2010132396 A JP2010132396 A JP 2010132396A JP 5847996 B2 JP5847996 B2 JP 5847996B2
Authority
JP
Japan
Prior art keywords
precursor
plasma
particles
gas
field zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010132396A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010284646A5 (enExample
JP2010284646A (ja
Inventor
ミッシェル クナップ アンジェラ
ミッシェル クナップ アンジェラ
エヌ．リチャード モニーク
エヌ．リチャード モニーク
ルース クラウディア
ルース クラウディア
ブラダ ティモシー
ブラダ ティモシー
フィリップス ジョナサン
フィリップス ジョナサン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UNM Rainforest Innovations
Original Assignee
STC UNM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STC UNM filed Critical STC UNM
Publication of JP2010284646A publication Critical patent/JP2010284646A/ja
Publication of JP2010284646A5 publication Critical patent/JP2010284646A5/ja
Application granted granted Critical
Publication of JP5847996B2 publication Critical patent/JP5847996B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
  • Glanulating (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2010132396A 2009-06-09 2010-06-09 複合粒子の製造方法 Active JP5847996B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/480,812 2009-06-09
US12/480,812 US8642139B2 (en) 2009-06-09 2009-06-09 Process to make structured particles

Publications (3)

Publication Number Publication Date
JP2010284646A JP2010284646A (ja) 2010-12-24
JP2010284646A5 JP2010284646A5 (enExample) 2015-11-19
JP5847996B2 true JP5847996B2 (ja) 2016-01-27

Family

ID=43300951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010132396A Active JP5847996B2 (ja) 2009-06-09 2010-06-09 複合粒子の製造方法

Country Status (2)

Country Link
US (1) US8642139B2 (enExample)
JP (1) JP5847996B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110006254A1 (en) * 2009-07-07 2011-01-13 Toyota Motor Engineering & Manufacturing North America, Inc. Process to make electrochemically active/inactive nanocomposite material
KR101933617B1 (ko) * 2011-09-23 2019-04-05 삼성전자주식회사 전극 활물질, 이를 포함한 전극, 상기 전극을 포함한 리튬 전지 및 상기 전극 활물질의 제조 방법
EP3072582A1 (en) * 2015-03-27 2016-09-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Method for encapsulating a nanostructure, coated nanostructure and use of a coated nanostructure
JP6598206B2 (ja) * 2015-12-07 2019-10-30 国立大学法人東北大学 酸化物系セラミックス−カーボン複合体の製造方法および酸化物系セラミックス−カーボン複合体
US20180025889A1 (en) * 2016-07-22 2018-01-25 Regents Of The University Of Minnesota Nonthermal plasma synthesis
US10543534B2 (en) * 2016-11-09 2020-01-28 Amastan Technologies Inc. Apparatus and method for the production of quantum particles
KR101887788B1 (ko) * 2016-12-19 2018-08-10 인하대학교 산학협력단 타이타늄 및 탄소나노섬유를 포함하는 복합 나노 분말의 제조방법 및 이를 제조하기 위한 플라즈마 장치
KR102311541B1 (ko) * 2017-12-13 2021-10-13 엘티메탈 주식회사 은-카본 나노 복합 입자, 이의 제조방법 및 상기 은-카본 나노 복합 입자를 포함하는 전기 접점 재료
CN108193107B (zh) * 2017-12-21 2020-04-10 陕西科技大学 一种有机包覆核-壳纳米复合储氢材料的制备方法
EP3992330A1 (en) 2020-10-29 2022-05-04 PartiX Powder coating method

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2916198B2 (ja) * 1989-03-29 1999-07-05 日清製粉株式会社 超微粒子で表面が被覆された粒子の製造方法
US5169558A (en) * 1989-07-21 1992-12-08 Fox Valley Systems, Inc. Two-part aerosol composition for increasing the light reflectivity of an object
US5260105A (en) * 1990-04-17 1993-11-09 Alfred University Aerosol-plasma deposition of films for electrochemical cells
US5366770A (en) * 1990-04-17 1994-11-22 Xingwu Wang Aerosol-plasma deposition of films for electronic cells
US6024915A (en) * 1993-08-12 2000-02-15 Agency Of Industrial Science & Technology Coated metal particles, a metal-base sinter and a process for producing same
JP3533459B2 (ja) * 1993-08-12 2004-05-31 独立行政法人産業技術総合研究所 被覆金属準微粒子の製造法
JP3533458B2 (ja) * 1993-08-12 2004-05-31 独立行政法人産業技術総合研究所 被覆金属微粒子の製造法
JP3545784B2 (ja) * 1993-08-12 2004-07-21 株式会社日清製粉グループ本社 被覆準微粒子の製造方法
JP3545783B2 (ja) * 1993-08-12 2004-07-21 株式会社日清製粉グループ本社 被覆粒子の製造方法
JPH0776769A (ja) * 1993-09-08 1995-03-20 Takeshi Masumoto 複合超微粒子の製造方法及び装置
US6780350B1 (en) * 1997-02-24 2004-08-24 Superior Micropowders Llc Metal-carbon composite powders, methods for producing powders and devices fabricated from same
US6338809B1 (en) * 1997-02-24 2002-01-15 Superior Micropowders Llc Aerosol method and apparatus, particulate products, and electronic devices made therefrom
US5989648A (en) * 1997-05-06 1999-11-23 The Penn State Research Foundation Plasma generation of supported metal catalysts
DE10014884A1 (de) * 2000-03-24 2001-09-27 Merck Patent Gmbh Beschichtete Lithium-Mischoxid-Partikel und ein Verfahren zu deren Herstellung
US6998574B2 (en) * 2004-03-29 2006-02-14 Linclon Global, Inc. Welding torch with plasma assist
KR100593268B1 (ko) * 2004-09-22 2006-06-26 한국기계연구원 화학기상응축법에 의한 탄화물이 코팅된 철 나노분말제조공정
CA2659298C (en) * 2006-07-31 2012-03-06 Tekna Plasma Systems Inc. Plasma surface treatment using dielectric barrier discharges

Also Published As

Publication number Publication date
US20100310784A1 (en) 2010-12-09
JP2010284646A (ja) 2010-12-24
US8642139B2 (en) 2014-02-04

Similar Documents

Publication Publication Date Title
JP5847996B2 (ja) 複合粒子の製造方法
JP2012533155A (ja) 電気化学的に活性／不活性なナノコンポジット材料を製造する方法
US8623470B2 (en) Process to make core-shell structured nanoparticles
US8419998B2 (en) Process for making hollow carbon spheres
CN100438965C (zh) 粉末材料的合成、分离和纯化方法
NL2026635B1 (en) Integrated manufacturing of core-shell particles for Li-ion batteries
Zheng et al. Plasma‐assisted approaches in inorganic nanostructure fabrication
Ostrikov et al. Plasma-aided nanofabrication: where is the cutting edge?
Aguilar-Elguezabal et al. Study of carbon nanotubes synthesis by spray pyrolysis and model of growth
Levchenko et al. Low-temperature plasmas in carbon nanostructure synthesis
US9166170B1 (en) Apparatus for producing carbon-coated nanoparticles and carbon nanospheres
Woodard et al. On the non‐thermal plasma synthesis of nickel nanoparticles
JP2010284646A5 (enExample)
US20070148962A1 (en) Single, multi-walled, functionalized and doped carbon nanotubes and composites thereof
JP2003510462A (ja) 基材上にナノチューブ層を生成する方法
CN115335319A (zh) 在碳纳米孔中量子打印纳米结构
Zhang et al. Synthesis of carbon-coated silicon nanoparticles by induction thermal plasma for lithium ion battery
US20090081454A1 (en) Carbon Nanoparticles, Production and Use Thereof
JP2002069643A (ja) カーボンナノチューブの製造方法
Gupta et al. Mechanisms of plasma-assisted catalyzed growth of carbon nanofibres: a theoretical modeling
RU2412784C2 (ru) Способ получения композитных нанопорошков
CN101151214A (zh) 纳米结构氧化锌及其制备方法
JPH0511491B2 (enExample)
KR100658113B1 (ko) 화학기상응축법에 의한 실리카 코팅 나노철분말 합성공정
CN104174860B (zh) 一种核壳结构合金纳米颗粒的制备方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130419

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20131023

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20131023

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140130

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140218

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140515

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20141216

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150416

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20150501

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150630

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20150930

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20151027

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20151126

R150 Certificate of patent or registration of utility model

Ref document number: 5847996

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250