JP5845332B1 - Light transmissive conductive film and evaluation method thereof - Google Patents

Abstract

The present invention provides a light transmissive conductive film having a pattern portion and an etching portion, in which the pattern appearance phenomenon is suppressed, and a method for evaluating the pattern appearance phenomenon in the film. A support layer; and a light-transmitting conductive layer patterned by an etching process, wherein the light-transmitting conductive layer is directly or on one or more other surfaces of the support layer. A light transmissive conductive film disposed through a layer, wherein at least one surface on which the light transmissive conductive layer is disposed satisfies the following requirements: : The image clarity measured under the conditions of 45? Reflection of the pattern portion where the light-transmitting conductive layer is present and the comb width is 0.25 mm is less than 85%, and the step difference between the pattern portion and the etched portion is less than 1 μm. . [Selection figure] None

Description

  The present invention relates to a light transmissive conductive film and an evaluation method thereof.

  As a conductive film mounted on a touch panel, there are many light transmissive conductive films obtained by laminating a light transmissive conductive layer made of indium tin oxide (ITO) or the like on a light transmissive support layer made of plastic. It is used.

  These light-transmitting conductive films are usually mounted on a touch panel after further patterning the light-transmitting conductive layer by further etching. In the light transmissive conductive film in which the light transmissive conductive layer is patterned in this manner, the pattern of the light transmissive conductive layer is visually recognized on the film surface (so-called pattern visibility phenomenon). Are known.

  Patent Document 1 and Patent Document 2 are laminated films having a polyester film, an easy-adhesion layer, and a cured product layer, and have an internal haze of about 1 to 2% and a light transmittance of about 88%. The conductive conductive film is described, and it is described that the interference fringes are eliminated by reducing the difference in refractive index between the polyester film of the substrate and the cured product layer. However, these documents do not mention the pattern appearance phenomenon.

  In recent years, it has also been reported that the step of the pattern portion of the light-transmitting conductive film is increased by heat treatment, and as a result, the appearance is deteriorated (Patent Document 3). However, only a visual method has been reported as such a step evaluation method.

JP 2010-269504 A Japanese Patent Laid-Open No. 11-291382 JP 2012-128629 A

  The present invention provides a light-transmitting conductive film having a pattern portion and an etching portion as described above, wherein the pattern appearance phenomenon is suppressed, and a method for evaluating the pattern appearance phenomenon in the film. The issue is to provide.

The inventors of the present invention have intensively studied to solve the above problems and have completed the present invention. The present invention solves the above-mentioned problems, and is as follows.
Item 1.
A support layer; and a light-transmitting conductive layer patterned by an etching process,
The light-transmitting conductive layer is a light-transmitting conductive film disposed on at least one surface of the support layer directly or via one or more other layers, and the light-transmitting conductive layer is A light-transmitting conductive film characterized in that at least one surface disposed satisfies the following requirements:
The image clarity measured under the conditions of 45 ° reflection of the pattern portion where the light-transmitting conductive layer exists and a comb width of 0.25 mm is less than 85%, and the step difference between the pattern portion and the etched portion is less than 1 μm.
Item 2.
Item 2. The light transmissive conductive film according to Item 1, which is further subjected to heat treatment after etching,
A light-transmitting conductive film, wherein the deformation after heat treatment in the direction perpendicular to the plane is less than 1 μm.
Item 3.
Item 3. A touch panel comprising the light transmissive conductive film according to item 1 or 2.
Item 4.
A support layer; and a light transmissive conductive layer;
In the light transmissive conductive film, the light transmissive conductive layer is etched on at least one surface of the support layer directly or via one or more other layers. It is a method for evaluating the pattern appearance phenomenon when patterning by
(1) measuring the image clarity of the surface on the light-transmissive conductive layer side before patterning;
(2-1) Patterning the light-transmitting conductive layer by an etching process to form a pattern portion and an etching portion; and (3) Steps of the pattern portion and the etching portion formed in the step (2-1). Including the process of measuring,
A method for evaluating based on the image clarity measured in step (1) and the level difference measured in step (3).
Item 5.
The image clarity measured in step (1) is less than 85% under conditions of 45 ° reflection and a comb width of 0.25 mm, and
When the step measured in step (3) is less than 1 μm,
Item 5. The method according to Item 4, wherein the method is determined to be favorable in terms of difficulty in generating a pattern appearance phenomenon.
Item 6.
further,
(2-2) The method of claim | item 4 or 5 including the process of using for the heat processing the light-transmitting conductive film by which the light-transmitting conductive layer was patterned by the process (2-1).

  According to the present invention, a film in which a pattern appearance phenomenon is suppressed can be provided. Further, the pattern appearance phenomenon can be quantitatively evaluated by using the pattern appearance phenomenon evaluation method of the present invention.

It is sectional drawing which shows the transparent conductive film of this invention by which the transparent conductive layer is arrange | positioned adjacent to the single side | surface of a transparent support layer. It is sectional drawing which shows the light transmissive conductive film of this invention by which the light transmissive conductive layer is arrange | positioned adjacent to both surfaces of a light transmissive support layer. It is sectional drawing which shows the light-transmitting conductive film of this invention by which an undercoat layer and a light-transmitting conductive layer are arrange | positioned adjacent to each other in this order on the single side | surface of a light-transmitting support layer. It is sectional drawing which shows the light transmissive conductive film of this invention by which an undercoat layer and a light transmissive conductive layer are arrange | positioned adjacent to each other in this order on both surfaces of the light transmissive support layer. It is sectional drawing which shows the light-transmitting conductive film of this invention by which a hard-coat layer, an undercoat layer, and a light-transmitting conductive layer are arrange | positioned adjacent to each other in this order on the single side | surface of a light-transmitting support layer. A hard coat layer, an undercoat layer, and a light transmissive conductive layer are arranged adjacent to each other in this order on one surface of the light transmissive support layer, and another hard coat layer is directly disposed on the other surface. It is sectional drawing which shows the transparent conductive film of this invention which is. It is sectional drawing which shows the light transmissive conductive film of this invention by which a hard-coat layer, an undercoat layer, and a light transmissive conductive layer are arrange | positioned adjacent to each other in this order on both surfaces of the light transmissive support layer.

1. Light transmissive conductive film The light transmissive conductive film of the present invention is
A support layer; and a light-transmitting conductive layer patterned by an etching process,
The light-transmitting conductive layer is a light-transmitting conductive film disposed on at least one surface of the support layer directly or via one or more other layers, and the light-transmitting conductive layer is A light-transmitting conductive film characterized in that at least one surface disposed satisfies the following requirements:
The image clarity measured under the conditions of 45 ° reflection of the pattern portion where the light-transmitting conductive layer exists and a comb width of 0.25 mm is less than 85%, and the step difference between the pattern portion and the etched portion is less than 1 μm.

  In FIG. 1, the one aspect | mode of the transparent electroconductive film of this invention is shown. In this embodiment, the light transmissive conductive layers are disposed adjacent to each other on one side of the light transmissive support layer.

  FIG. 2 shows another embodiment of the light transmissive conductive film of the present invention. In this aspect, the light transmissive conductive layers are disposed adjacent to each other on both surfaces of the light transmissive support layer.

1.1 Support layer The support layer refers to a light-transmitting conductive film containing a light-transmitting conductive layer that plays a role of supporting a layer including the light-transmitting conductive layer. Although it does not specifically limit as a support layer, For example, in the transparent conductive film for touchscreens, what is normally used as a transparent support layer can be used.

  Although the raw material of a support layer is not specifically limited, For example, various organic polymers etc. can be mentioned. The organic polymer is not particularly limited. For example, polyester resin, acetate resin, polyether resin, polycarbonate resin, polyacrylic resin, polymethacrylic resin, polystyrene resin, polyolefin resin, polyimide resin, etc. Examples thereof include resins, polyamide resins, polyvinyl chloride resins, polyacetal resins, polyvinylidene chloride resins, and polyphenylene sulfide resins. Although it does not specifically limit as polyester-type resin, For example, a polyethylene terephthalate (PET), a polyethylene naphthalate (PEN), etc. are mentioned. The material of the light transmissive support layer is preferably a polyester resin, and particularly preferably PET. The support layer may be composed of any one of these, or may be composed of a plurality of types.

  Although the thickness of a support layer is not specifically limited, For example, the range of 2-300 micrometers is mentioned.

1.2 Light-transmissive conductive layer In the present invention, the light-transmissive conductive layer means a layer that conducts electricity and transmits visible light. Although it does not specifically limit as a light transmissive conductive layer, For example, what is normally used as a light transmissive conductive layer in the light transmissive conductive film for touch panels can be used.

  The material for the light transmissive conductive layer is not particularly limited, and examples thereof include indium oxide, zinc oxide, tin oxide, and titanium oxide. The light-transmitting conductive layer is preferably a light-transmitting conductive layer containing indium oxide doped with a dopant in terms of achieving both light transmittance and conductivity. The light transmissive conductive layer may be a light transmissive conductive layer made of indium oxide doped with a dopant. Although it does not specifically limit as a dopant, For example, a tin oxide, a zinc oxide, those mixtures, etc. are mentioned.

In the case where a material in which indium oxide is doped with tin oxide is used as the material for the light transmissive conductive layer, indium oxide (III) (In ₂ O ₃ ) is doped with tin oxide (IV) (SnO ₂ ) (tin− Doped indium oxide (ITO) is preferred. In this case, the addition amount of SnO ₂ is not particularly limited, and examples thereof include 1 to 15% by weight, preferably 2 to 10% by weight, and more preferably 3 to 8% by weight. In addition, a material in which another dopant is further added to indium tin oxide may be used as a material for the light-transmitting conductive layer so long as the total amount of dopant does not exceed the numerical range shown on the left. Although it does not specifically limit as another dopant in the left, For example, selenium etc. are mentioned.

  The light transmissive conductive layer may be composed of any one of the various materials described above, or may be composed of a plurality of types.

  The light-transmitting conductive layer is not particularly limited, but may be a crystalline body, an amorphous body, or a mixture thereof.

  The thickness of the light transmissive conductive layer is preferably 10 nm or more and 30 nm or less. If it is 10 nm or more, necessary conductivity is obtained, and if it is 30 nm or less, the bone appearance phenomenon is alleviated.

  The method for disposing the light transmissive conductive layer may be either wet or dry, and is not particularly limited. Specific examples of the method for disposing the light transmissive conductive layer include, for example, a sputtering method, a vacuum deposition method, an ion plating method, a CVD method, and a pulse laser deposition method.

1.3 The method of patterning the pattern part and the etching part is not particularly limited, but can be performed as follows, for example. First, a resist (a protective film for protecting the layer from the etching solution) is applied to the region to be left on the light-transmitting conductive layer. The application means may be performed by screen printing depending on the type of the resist. If a photoresist is used, it is performed as follows. Apply the photoresist to the area you want to leave on the light-transmitting conductive layer using a spin coater or slit coater, etc., and partially irradiate light or an electron beam to change the solubility of the photoresist only in that area. Thereafter, the portion having relatively low solubility is removed (this is called development). In this way, the resist is present only in the region to be left on the light-transmitting conductive layer. Subsequently, an etching solution is allowed to act on the light-transmitting conductive layer to selectively dissolve a region of the light-transmitting conductive layer that is not protected by the resist, and finally, the dissolved matter is removed to thereby remove the pattern. Form.

  In the present invention, the light-transmitting conductive film to be evaluated may be subjected to heat treatment after patterning. The heat treatment is mainly performed for the purpose of crystallizing the light-transmitting conductive layer. The heat treatment causes wavy undulations in the light-transmitting conductive film, which may cause the cross-sectional shape of the pattern portion to be a convex arc shape and the cross-sectional shape of the etched portion to be a convex arc shape. Although it does not specifically limit as conditions for heat processing, For example, temperature can be 120-160 degreeC and processing time can be 0.25-2 hours. The conditions for the heat treatment can be appropriately selected from the above range as necessary, but the treatment time may be set to the long time side when processing at the low temperature side, and the processing time may be set to the short time side when processing at the high temperature side. .

  The striped pattern composed of the pattern portion and the etched portion is not particularly limited, but usually the width (pitch) of the pattern portion in the direction orthogonal to the longitudinal direction of the striped pattern is 0.01 mm to 5 mm, and the etched portion The width (pitch) in the same direction is 0.01 mm to 5 mm.

The light-transmitting conductive film of the present invention has an image clarity of less than 85% measured under conditions of 45 ° reflection of the pattern portion and a comb width of 0.25 mm, and the step difference between the pattern portion and the etched portion is less than 1 μm It has the characteristic of being. When the image clarity of the pattern part is within the above range, the reflected light can be effectively shaken, and the boundary between the pattern part and the etching part can be made inconspicuous. Moreover, when the step between the pattern portion and the etching portion is within the above range, the disturbance of the reflected image at the boundary can be effectively suppressed.

1.4 Pattern part image clarity The light-transmitting conductive film of the present invention is characterized in that the pattern part image clarity is within the above range, but the image clarity is measured after the pattern part is formed. In addition, since the image clarity of the pattern portion does not usually change during the process of forming the pattern by etching, for convenience, the image clarity measured in the state before forming the pattern portion is referred to as the image clarity of the pattern portion. To do.

  The image clarity is measured as follows.

  The light-transmitting conductive layer side of the heat-transmitting light-transmitting conductive film (4 cm square) on which the light-transmitting conductive layer is arranged using OCA (Optical Clear Adhesive) is gorilla glass (50 mm × 80 mm × 0.7 mm). Paste to. This sample is called a GF sample. Using the glass surface as the incident surface, a 45 ° reflection image property is measured using a image clarity measuring device (ICM-1T manufactured by Suga Test Instruments Co., Ltd. or equivalent), and a value corresponding to an optical comb width of 0.25 mm is obtained. The process from setting the sample to measurement is performed three times, and the average value is defined as image clarity.

  If the image clarity of the pattern portion is too low, the reflected light is too scattered and the image on the opposite side is difficult to see, so it may be in an appropriate range depending on the application.

1.5 Level difference between pattern part and etching part The light-transmitting conductive film of the present invention is characterized in that the level difference between the pattern part and the etching part is less than 1 μm.

  The level difference means a level difference in the direction perpendicular to the plane.

  Although the said level | step difference is not specifically limited, For example, it can measure using a laser microscope.

  Specifically, the level difference using the laser microscope is measured as follows.

  The light transmissive conductive layer side of the heat transmissive conductive film (4 cm square) on which the electrode pattern in the X direction for smartphones is formed using OCA is attached to gorilla glass (50 mm × 80 mm × 0.7 mm). . Further, the light transmissive conductive layer side of the heat-treated light transmissive conductive film (4 cm square) on which the electrode pattern in the Y direction for smartphones is formed using OCA is the light transmissive conductive film on which the electrode pattern in the X direction is formed. Affixed to the back of the protective film. This sample is called a GFF sample.

  As the laser microscope, an ultra-deep color 3D shape measurement microscope VK-9500 manufactured by Keyence Corporation or an equivalent thereof is used. With the glass surface as the incident surface, the boundary line between the pattern portion of the X-direction electrode and the etching portion is projected at the center of the screen at a magnification of 200 times. The stage moving step is set to 1 μm and a range in which the amount of reflected laser light is reduced is set. At this time, the etched portion side is the lower limit (L level), and the pattern portion side is the upper limit (H level). The stage moving step is set to 0.01 μm and scanning is performed from the L level to the H level.

  Using an analysis software, calculate a height profile on a straight line orthogonal to the boundary line between the pattern part of the X direction electrode and the etching part, and obtain a step at the boundary line between the pattern part and the etching part after correcting the inclination. . This operation is performed at five points on the screen, and the average value is set as a step.

  When the light-transmitting conductive film of the present invention is heat-treated after etching, the step reflects the amount of deformation after the heat treatment in the direction perpendicular to the surface.

  The light-transmitting conductive film of the present invention preferably has a step difference of less than 1 μm between the pattern portion and the etching portion when the pattern width is 600 μm. At this time, the light-transmitting conductive film of the present invention may be any pattern as long as the step becomes less than 1 μm when the pattern portion and the etching portion are formed so that the pattern width is 600 μm. Those in which the pattern portion and the etching portion are not formed so as to have a width of 600 μm are also included.

1.6 Other Configurations The light-transmitting conductive film of the present invention further includes an undercoat layer, and at least one light-transmitting conductive layer is provided on the surface of the light-transmitting support layer via at least the undercoat layer. May be arranged.

  The light transmissive conductive layer may be disposed adjacent to the undercoat layer.

  In FIG. 3, the one aspect | mode of the single-sided transparent electroconductive film of this invention is shown. In this embodiment, the undercoat layer and the light transmissive conductive layer are disposed adjacent to each other in this order on one surface of the light transmissive support layer.

  In FIG. 4, the one aspect | mode of the double-sided transparent electroconductive film of this invention is shown. In this embodiment, the undercoat layer and the light transmissive conductive layer are disposed adjacent to each other in this order on both sides of the light transmissive support layer.

  Although the material of an undercoat layer is not specifically limited, For example, you may have a dielectric property. The material of the undercoat layer is not particularly limited. For example, silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, silicon alkoxide, alkylsiloxane and its condensate, polysiloxane, silsesquioxane, polysilazane, oxidation Niobium (V) and the like. The undercoat layer may be composed of any one of these, or may be composed of a plurality of types.

As the undercoat layer, a layer containing SiO _x (x = 1.0 to 2.0) is preferable. The undercoat layer may be a layer made of SiO _x (x = 1.0 to 2.0).

One layer of the undercoat layer may be disposed. Alternatively, two or more layers may be arranged adjacent to each other or separated from each other via other layers. Two or more undercoat layers are preferably arranged adjacent to each other. For example, when three layers are arranged adjacent to each other, an undercoat layer made of SiO ₂ is arranged in the middle, and an undercoat layer made of SiO _x (x = 1.0 to 2.0) is arranged so as to sandwich it. It is preferable to do so.

  Although it does not specifically limit as thickness per one layer of an undercoat layer, For example, 5-50 nm etc. are mentioned. When two or more layers are disposed adjacent to each other, the total thickness of all the undercoat layers adjacent to each other may be within the above range.

  The refractive index of the undercoat layer is not particularly limited as long as the light-transmitting conductive film of the present invention can be used as a light-transmitting conductive film for a touch panel. For example, 1.4 to 1.5 is preferable.

  The method for disposing the undercoat layer may be either wet or dry, and is not particularly limited. Examples of the wet include a sol-gel method, a fine particle dispersion, and a method of applying a colloidal solution.

  As a method for disposing the undercoat layer, as a dry method, for example, a sputtering method, an ion plating method, a vacuum evaporation method, a chemical vapor deposition method, a method of laminating on an adjacent layer by a pulse laser deposition method, or the like can be given. It is done.

  The light transmissive conductive film of the present invention may further contain a hard coat layer.

  When the light transmissive conductive film of the present invention contains a hard coat layer, at least one light transmissive conductive layer is disposed on the surface of the light transmissive support layer via at least the hard coat layer.

  One layer of the hard coat layer may be disposed. Alternatively, two or more layers may be arranged adjacent to each other or separated from each other via other layers.

  The hard coat layer may be disposed on both surfaces of the light transmissive support layer.

  In FIG. 5, the one aspect | mode of the single-sided transparent electroconductive film of this invention containing a hard-coat layer is shown. In this embodiment, the hard coat layer, the undercoat layer, and the light transmissive conductive layer are arranged adjacent to each other in this order on one surface of the light transmissive support layer.

  FIG. 6 shows another embodiment of the single-sided light-transmitting conductive film of the present invention containing a hard coat layer. In this embodiment, the hard coat layer, the undercoat layer, and the light transmissive conductive layer are arranged adjacent to each other in this order on one surface of the light transmissive support layer, and on the other surface of the light transmissive support layer. Another hard coat layer is placed directly.

  In FIG. 7, the one aspect | mode of the double-sided transparent electroconductive film of this invention containing a hard-coat layer is shown. In this embodiment, the hard coat layer, the undercoat layer, and the light transmissive conductive layer are arranged adjacent to each other in this order on both sides of the light transmissive support layer.

  In the present invention, the hard coat layer refers to a layer that plays a role of preventing scratches on the surface of the light-transmitting support layer. Although it does not specifically limit as a hard-coat layer, For example, what is normally used as a hard-coat layer in the transparent conductive film for touchscreens can be used.

  The material for the hard coat layer is not particularly limited, and examples thereof include acrylic resins, silicone resins, urethane resins, melamine resins, and alkyd resins. Examples of the material for the hard coat layer further include those obtained by dispersing colloidal particles such as silica, zirconia, titania and alumina in the resin. The hard coat layer may be composed of any one of these, or may be composed of a plurality of types. As the hard coat layer, an acrylic resin in which zirconia particles are dispersed is preferable.

  The thickness of the hard coat layer (the total thickness of the two layers when two layers are arranged adjacent to each other) (μm) is 0.5 μm to 10 μm.

  The method of disposing the hard coat layer is not particularly limited, and examples thereof include a method of applying to a film and curing with heat, a method of curing with active energy rays such as ultraviolet rays and electron beams, and the like. From the viewpoint of productivity, a method of curing with ultraviolet rays is preferable.

  The light-transmitting conductive film of the present invention is used for manufacturing a touch panel. Details of the touch panel are as described below.

  The touch panel of the present invention includes the light-transmitting conductive film of the present invention, and further includes other members as necessary.

Specific examples of the configuration of the capacitive touch panel according to the present invention include the following configurations. The protective layer (1) side is used so that the operation screen side faces, and the glass (5) side faces the side opposite to the operation screen.
(1) Protective layer (2) Light transmissive conductive film of the present invention (Y-axis direction)
(3) Insulating layer (4) Light transmissive conductive film of the present invention (X-axis direction)
(5) Glass Although the touch panel of this invention is not specifically limited, For example, it can manufacture by combining said (1)-(5) and another member according to a normal method as needed.

2. Method for Evaluating Pattern Appearance Phenomenon The method for evaluating the pattern appearance phenomenon of the present invention is as follows.
A support layer; and a light transmissive conductive layer;
In the light transmissive conductive film, the light transmissive conductive layer is etched on at least one surface of the support layer directly or via one or more other layers. It is a method for evaluating the pattern appearance phenomenon when patterning by
(1) measuring the image clarity of the surface on the light-transmissive conductive layer side before patterning;
(2-1) Patterning the light-transmitting conductive layer by an etching process to form a pattern portion and an etching portion; and (3) Steps of the pattern portion and the etching portion formed in the step (2-1). Including the process of measuring,
In this method, evaluation is performed based on the image clarity measured in step (1) and the level difference measured in step (3).

  The method for measuring the image clarity and the step is as described above.

  The measurement conditions for image clarity are not particularly limited. As described above, the image clarity measured under conditions of 45 ° reflection and a comb width of 0.25 mm can also be evaluated as an index, but this is only an example as an index, and the measurement method is particularly It is not limited to this.

The evaluation method of the present invention further includes:
(2-2) A method including a step of subjecting the light-transmitting conductive film in which the light-transmitting conductive layer is patterned in the step (2-1) to heat treatment may be used.

  At this time, as described above, the step reflects the amount of deformation after the heat treatment in the direction perpendicular to the surface.

  The conditions for the heat treatment are as described above.

  Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.

(Example 1)
As the light-transmitting support layer, 50 μm PET was used. An acrylic hard coat resin in which nano-sized zirconia particles were dispersed was applied to the PET surface and cured with ultraviolet rays to obtain a hard coat layer having a thickness of 1 μm. This hard coat resin was made slightly softer than the comparative example (0.7 GPa in hardness with a nanoindenter).

A layer made of SiO _{2 with a} thickness of 20 nm as an optical interference layer was formed on the hard coat layer, and a layer made of indium tin oxide with a thickness of 20 nm was further formed thereon as a light-transmitting conductive layer. Subsequently, it heat-processed at 150 degreeC for 1 hour. The following samples were produced with respect to the obtained light transmissive transparent conductive film.

  A GF sample was prepared and image clarity was measured.

  A GFF sample was prepared and a laser microscope step was measured.

The visual step evaluation method is as follows. The GFF sample was arranged so that the glass surface was on the upper side, and whether or not the pattern portion and the etched portion could be distinguished was evaluated according to the following criteria. The viewing distance was 20 cm, and the viewing angle was 45 ° from the sample surface.
○: Difficult to distinguish between patterning part and non-patterning part.
(Triangle | delta): A patterning part and a non-patterning part can be discriminate | determined slightly.
X: A patterning part and a non-patterning part can be distinguished clearly.

(Example 2)
A light-transmitting transparent conductive film was produced in the same manner as in Example 1 except that styrene resin fine particles having a particle diameter of 1 μm were dispersed in the hard coat coating solution and the thickness of the hard coat layer was changed to 0.7 μm.

(Example 3)
A light transmissive transparent conductive film was prepared in the same manner as in Example 1 except that the hardness of the hard coat resin was changed to 0.6 GPa by changing the ultraviolet curing conditions.

(Comparative Example 1)
A light transmissive transparent conductive film was produced in the same manner as in Example 1 except that the hardness of the hard coat resin was changed to 0.95 GPa by changing the ultraviolet curing conditions.

(Comparative Example 2)
A light transmissive transparent conductive film was produced in the same manner as in Example 1 except that the hardness of the hard coat resin was changed to 1.1 GPa by changing the ultraviolet curing conditions.

  The results are shown in Table 1. It can be seen that the pattern appearance becomes inconspicuous when the step of the laser microscope cuts 1 μm and the mapping of 45 ° reflection at 0.25 mm comb is less than 85%.

DESCRIPTION OF SYMBOLS 1 Light transmissive conductive film 11 Light transmissive support layer 12 Light transmissive conductive layer 13 Undercoat layer 14 Hard coat layer

Claims (5)

A support layer; and a light-transmitting conductive layer patterned by an etching process,
The light-transmitting conductive layer is a light-transmitting conductive film disposed on at least one surface of the support layer directly or via one or more other layers, and the light-transmitting conductive layer is A light-transmitting conductive film characterized in that at least one surface disposed satisfies the following requirements:
The image clarity measured under the conditions of 45 ° reflection of the pattern portion where the light-transmitting conductive layer exists and a comb width of 0.25 mm is less than 85%, and the step difference between the pattern portion and the etched portion is less than 1 μm. A touch panel comprising the light transmissive conductive film according to claim 1 . A support layer; and a light transmissive conductive layer;
In the light transmissive conductive film, the light transmissive conductive layer is etched on at least one surface of the support layer directly or via one or more other layers. It is a method for evaluating the pattern appearance phenomenon when patterning by
(1) measuring the image clarity of the surface on the light-transmissive conductive layer side before patterning;
(2-1) Patterning the light-transmitting conductive layer by an etching process to form a pattern portion and an etching portion; and (3) Steps of the pattern portion and the etching portion formed in the step (2-1). Including the process of measuring,
A method for evaluating based on the image clarity measured in step (1) and the level difference measured in step (3). The image clarity measured in step (1) is less than 85% under conditions of 45 ° reflection and a comb width of 0.25 mm, and
When the step measured in step (3) is less than 1 μm,
The method according to claim 3 , wherein the method is determined to be favorable in terms of difficulty in generating a pattern appearance phenomenon. further,
(2-2) The method of Claim 3 or 4 including the process of using for the heat processing the light-transmitting conductive film by which the light-transmitting conductive layer was patterned by the process (2-1).

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