JP5839076B2 - 照明光学系、露光装置、およびデバイス製造方法 - Google Patents

照明光学系、露光装置、およびデバイス製造方法 Download PDF

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JP5839076B2
JP5839076B2 JP2014091352A JP2014091352A JP5839076B2 JP 5839076 B2 JP5839076 B2 JP 5839076B2 JP 2014091352 A JP2014091352 A JP 2014091352A JP 2014091352 A JP2014091352 A JP 2014091352A JP 5839076 B2 JP5839076 B2 JP 5839076B2
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optical system
illumination
light
optical
polarization
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JP2014170955A5 (OSRAM
JP2014170955A (ja
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重松　幸二
幸二 重松
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Nikon Corp
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Nikon Corp
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  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014091352A 2014-04-25 2014-04-25 照明光学系、露光装置、およびデバイス製造方法 Active JP5839076B2 (ja)

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JP2014091352A JP5839076B2 (ja) 2014-04-25 2014-04-25 照明光学系、露光装置、およびデバイス製造方法

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JP2014091352A JP5839076B2 (ja) 2014-04-25 2014-04-25 照明光学系、露光装置、およびデバイス製造方法

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JP2013173480A Division JP5534276B2 (ja) 2013-08-23 2013-08-23 照明光学系、露光装置、およびデバイス製造方法

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JP2014170955A JP2014170955A (ja) 2014-09-18
JP2014170955A5 JP2014170955A5 (OSRAM) 2014-10-30
JP5839076B2 true JP5839076B2 (ja) 2016-01-06

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201713740D0 (en) 2017-08-25 2017-10-11 Nkt Photonics As Depolarizing homogenizer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4936499B2 (ja) * 2004-06-21 2012-05-23 株式会社ニコン 露光装置および露光方法
TWI423301B (zh) * 2005-01-21 2014-01-11 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
JP2007048871A (ja) * 2005-08-09 2007-02-22 Nikon Corp 照明光学装置、露光装置及びマイクロデバイスの製造方法
JP2007048996A (ja) * 2005-08-11 2007-02-22 Nikon Corp 照明光学装置の調整方法、照明光学装置、露光装置、およびデバイスの製造方法
JP4185102B2 (ja) * 2006-02-14 2008-11-26 株式会社東芝 露光装置
JP2008016516A (ja) * 2006-07-03 2008-01-24 Canon Inc 露光装置
JP2009033045A (ja) * 2007-07-30 2009-02-12 Canon Inc 調整方法、露光方法、デバイス製造方法及び露光装置
JP4952801B2 (ja) * 2010-01-12 2012-06-13 株式会社ニコン 照明光学系、露光装置および露光方法

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