JP5828664B2 - ソフトリソグラフィ装置および方法 - Google Patents
ソフトリソグラフィ装置および方法 Download PDFInfo
- Publication number
- JP5828664B2 JP5828664B2 JP2011096328A JP2011096328A JP5828664B2 JP 5828664 B2 JP5828664 B2 JP 5828664B2 JP 2011096328 A JP2011096328 A JP 2011096328A JP 2011096328 A JP2011096328 A JP 2011096328A JP 5828664 B2 JP5828664 B2 JP 5828664B2
- Authority
- JP
- Japan
- Prior art keywords
- stamp
- substrate
- layer
- flexible stamp
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000002174 soft lithography Methods 0.000 title claims description 18
- 238000000034 method Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims description 63
- 230000005291 magnetic effect Effects 0.000 claims description 62
- 239000002245 particle Substances 0.000 claims description 38
- 230000005294 ferromagnetic effect Effects 0.000 claims description 25
- 238000003825 pressing Methods 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 17
- 230000008859 change Effects 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 12
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 10
- 239000000806 elastomer Substances 0.000 claims description 9
- 229920001971 elastomer Polymers 0.000 claims description 9
- 239000003302 ferromagnetic material Substances 0.000 claims description 6
- -1 polydimethylsiloxane Polymers 0.000 claims description 4
- 230000000977 initiatory effect Effects 0.000 claims 1
- 239000003990 capacitor Substances 0.000 description 8
- 238000007639 printing Methods 0.000 description 6
- 239000002086 nanomaterial Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 230000000638 stimulation Effects 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- VAWNDNOTGRTLLU-UHFFFAOYSA-N iron molybdenum nickel Chemical compound [Fe].[Ni].[Mo] VAWNDNOTGRTLLU-UHFFFAOYSA-N 0.000 description 1
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 1
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910000815 supermalloy Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1053176 | 2010-04-26 | ||
| FR1053176A FR2959162B3 (fr) | 2010-04-26 | 2010-04-26 | Dispositif et procede de lithographie douce |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011251526A JP2011251526A (ja) | 2011-12-15 |
| JP2011251526A5 JP2011251526A5 (https=) | 2015-07-09 |
| JP5828664B2 true JP5828664B2 (ja) | 2015-12-09 |
Family
ID=43216269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011096328A Expired - Fee Related JP5828664B2 (ja) | 2010-04-26 | 2011-04-22 | ソフトリソグラフィ装置および方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20110259223A1 (https=) |
| EP (1) | EP2381307A1 (https=) |
| JP (1) | JP5828664B2 (https=) |
| CA (1) | CA2737791A1 (https=) |
| FR (1) | FR2959162B3 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CZ2011555A3 (cs) * | 2011-09-06 | 2013-03-13 | Active Optix S.R.O. | Zpusob vytvárení výrobku s funkcním reliéfním povrchem s vysokým rozlisením |
| TWI659475B (zh) | 2014-07-20 | 2019-05-11 | 愛爾蘭商艾克斯瑟樂普林特有限公司 | 用於微轉貼印刷之裝置及方法 |
| US10620532B2 (en) | 2014-11-11 | 2020-04-14 | Canon Kabushiki Kaisha | Imprint method, imprint apparatus, mold, and article manufacturing method |
| JP6659104B2 (ja) * | 2014-11-11 | 2020-03-04 | キヤノン株式会社 | インプリント方法、インプリント装置、型、および物品の製造方法 |
| US9704821B2 (en) | 2015-08-11 | 2017-07-11 | X-Celeprint Limited | Stamp with structured posts |
| US10310374B2 (en) * | 2016-08-18 | 2019-06-04 | International Business Machines Corporation | Repatternable nanoimprint lithography stamp |
| US10748793B1 (en) | 2019-02-13 | 2020-08-18 | X Display Company Technology Limited | Printing component arrays with different orientations |
| US11062936B1 (en) | 2019-12-19 | 2021-07-13 | X Display Company Technology Limited | Transfer stamps with multiple separate pedestals |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080217813A1 (en) * | 1995-11-15 | 2008-09-11 | Chou Stephen Y | Release surfaces, particularly for use in nanoimprint lithography |
| US6920825B1 (en) * | 1999-12-17 | 2005-07-26 | Brent Alan Baxter | Magnetic stamp printing device |
| JP2001338445A (ja) | 2000-05-25 | 2001-12-07 | Nippon Columbia Co Ltd | スタンパ製造方法、光記録媒体製造方法及び支持板 |
| US7338613B2 (en) * | 2001-09-10 | 2008-03-04 | Surface Logix, Inc. | System and process for automated microcontact printing |
| CN1678443B (zh) * | 2002-05-24 | 2012-12-19 | 斯蒂文·Y·周 | 感应场压的压印光刻的方法和设备 |
| US6792856B2 (en) * | 2002-07-16 | 2004-09-21 | International Business Machines Corporation | Method and apparatus for accurate, micro-contact printing |
| EP1731290A1 (en) * | 2004-03-30 | 2006-12-13 | Pioneer Corporation | Pattern transfer device and pattern transfer method |
| KR101222946B1 (ko) * | 2005-06-24 | 2013-01-17 | 엘지디스플레이 주식회사 | 백 프레인이 부착된 소프트 몰드의 제조방법 |
| US20070202304A1 (en) * | 2006-02-27 | 2007-08-30 | Cambridge University Technical Services Limited, | Nanoparticle colloid, method for its production and its use in the growth of carbon nanotubes |
| JP4745177B2 (ja) * | 2006-09-05 | 2011-08-10 | 株式会社ナノテック | マイクロコンタクトプリントにおけるプリント圧力検出方法及び装置 |
| US7735419B2 (en) * | 2006-11-16 | 2010-06-15 | Labrador Research, Llc | System for soft lithography |
| US20080271625A1 (en) * | 2007-01-22 | 2008-11-06 | Nano Terra Inc. | High-Throughput Apparatus for Patterning Flexible Substrates and Method of Using the Same |
| FR2921002B1 (fr) | 2007-09-13 | 2010-11-12 | Innopsys | Procede de depot simultane d'un ensemble de motifs sur un substrat par un macro timbre |
| EP2300207A4 (en) * | 2008-06-26 | 2012-05-09 | Harvard College | MANUFACTURED VERSATILE NANOSTRUCTURED MATERIALS MANUFACTURED BY REPLICATION |
| KR101037903B1 (ko) * | 2010-12-09 | 2011-05-30 | 한국기계연구원 | 롤프린팅/롤임프린팅용 롤 제조방법 |
-
2010
- 2010-04-26 FR FR1053176A patent/FR2959162B3/fr not_active Expired - Lifetime
-
2011
- 2011-03-08 US US13/042,974 patent/US20110259223A1/en not_active Abandoned
- 2011-04-20 CA CA2737791A patent/CA2737791A1/en not_active Abandoned
- 2011-04-22 JP JP2011096328A patent/JP5828664B2/ja not_active Expired - Fee Related
- 2011-04-22 EP EP11163591A patent/EP2381307A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| FR2959162B3 (fr) | 2012-03-23 |
| CA2737791A1 (en) | 2011-10-26 |
| JP2011251526A (ja) | 2011-12-15 |
| FR2959162A3 (fr) | 2011-10-28 |
| US20110259223A1 (en) | 2011-10-27 |
| EP2381307A1 (fr) | 2011-10-26 |
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