CA2737791A1 - Soft lithography device and process - Google Patents
Soft lithography device and process Download PDFInfo
- Publication number
- CA2737791A1 CA2737791A1 CA2737791A CA2737791A CA2737791A1 CA 2737791 A1 CA2737791 A1 CA 2737791A1 CA 2737791 A CA2737791 A CA 2737791A CA 2737791 A CA2737791 A CA 2737791A CA 2737791 A1 CA2737791 A1 CA 2737791A1
- Authority
- CA
- Canada
- Prior art keywords
- stamp
- substrate
- magnetic field
- field generator
- flexible stamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 30
- 238000002174 soft lithography Methods 0.000 title claims abstract description 23
- 230000008569 process Effects 0.000 title claims abstract description 20
- 230000005291 magnetic effect Effects 0.000 claims abstract description 118
- 239000000758 substrate Substances 0.000 claims abstract description 111
- 238000000813 microcontact printing Methods 0.000 claims abstract description 36
- 239000003302 ferromagnetic material Substances 0.000 claims description 36
- 239000000806 elastomer Substances 0.000 claims description 34
- 229920001971 elastomer Polymers 0.000 claims description 34
- 239000000126 substance Substances 0.000 claims description 27
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 15
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 8
- -1 polydimethylsiloxane Polymers 0.000 claims description 7
- 238000003825 pressing Methods 0.000 claims description 7
- 230000000717 retained effect Effects 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 19
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 18
- 239000002245 particle Substances 0.000 abstract description 15
- 239000011521 glass Substances 0.000 abstract description 6
- 230000008859 change Effects 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 58
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 238000000018 DNA microarray Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 108090000623 proteins and genes Proteins 0.000 description 4
- 102000004169 proteins and genes Human genes 0.000 description 4
- 239000012620 biological material Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000004113 cell culture Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002632 lipids Chemical class 0.000 description 2
- 238000007431 microscopic evaluation Methods 0.000 description 2
- 229910001172 neodymium magnet Inorganic materials 0.000 description 2
- 102000039446 nucleic acids Human genes 0.000 description 2
- 108020004707 nucleic acids Proteins 0.000 description 2
- 150000007523 nucleic acids Chemical class 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229920000936 Agarose Polymers 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002633 Kraton (polymer) Polymers 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 240000004808 Saccharomyces cerevisiae Species 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003124 biologic agent Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000000803 convective self-assembly Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000013536 elastomeric material Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000000017 hydrogel Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- VAWNDNOTGRTLLU-UHFFFAOYSA-N iron molybdenum nickel Chemical compound [Fe].[Ni].[Mo] VAWNDNOTGRTLLU-UHFFFAOYSA-N 0.000 description 1
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 1
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000344 molecularly imprinted polymer Polymers 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000008363 phosphate buffer Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910000815 supermalloy Inorganic materials 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000003053 toxin Substances 0.000 description 1
- 231100000765 toxin Toxicity 0.000 description 1
- 108700012359 toxins Proteins 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000012855 volatile organic compound Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1053176 | 2010-04-26 | ||
| FR1053176A FR2959162B3 (fr) | 2010-04-26 | 2010-04-26 | Dispositif et procede de lithographie douce |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2737791A1 true CA2737791A1 (en) | 2011-10-26 |
Family
ID=43216269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2737791A Abandoned CA2737791A1 (en) | 2010-04-26 | 2011-04-20 | Soft lithography device and process |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20110259223A1 (https=) |
| EP (1) | EP2381307A1 (https=) |
| JP (1) | JP5828664B2 (https=) |
| CA (1) | CA2737791A1 (https=) |
| FR (1) | FR2959162B3 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CZ2011555A3 (cs) * | 2011-09-06 | 2013-03-13 | Active Optix S.R.O. | Zpusob vytvárení výrobku s funkcním reliéfním povrchem s vysokým rozlisením |
| TWI659475B (zh) | 2014-07-20 | 2019-05-11 | 愛爾蘭商艾克斯瑟樂普林特有限公司 | 用於微轉貼印刷之裝置及方法 |
| US10620532B2 (en) | 2014-11-11 | 2020-04-14 | Canon Kabushiki Kaisha | Imprint method, imprint apparatus, mold, and article manufacturing method |
| JP6659104B2 (ja) * | 2014-11-11 | 2020-03-04 | キヤノン株式会社 | インプリント方法、インプリント装置、型、および物品の製造方法 |
| US9704821B2 (en) | 2015-08-11 | 2017-07-11 | X-Celeprint Limited | Stamp with structured posts |
| US10310374B2 (en) * | 2016-08-18 | 2019-06-04 | International Business Machines Corporation | Repatternable nanoimprint lithography stamp |
| US10748793B1 (en) | 2019-02-13 | 2020-08-18 | X Display Company Technology Limited | Printing component arrays with different orientations |
| US11062936B1 (en) | 2019-12-19 | 2021-07-13 | X Display Company Technology Limited | Transfer stamps with multiple separate pedestals |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080217813A1 (en) * | 1995-11-15 | 2008-09-11 | Chou Stephen Y | Release surfaces, particularly for use in nanoimprint lithography |
| US6920825B1 (en) * | 1999-12-17 | 2005-07-26 | Brent Alan Baxter | Magnetic stamp printing device |
| JP2001338445A (ja) | 2000-05-25 | 2001-12-07 | Nippon Columbia Co Ltd | スタンパ製造方法、光記録媒体製造方法及び支持板 |
| US7338613B2 (en) * | 2001-09-10 | 2008-03-04 | Surface Logix, Inc. | System and process for automated microcontact printing |
| CN1678443B (zh) * | 2002-05-24 | 2012-12-19 | 斯蒂文·Y·周 | 感应场压的压印光刻的方法和设备 |
| US6792856B2 (en) * | 2002-07-16 | 2004-09-21 | International Business Machines Corporation | Method and apparatus for accurate, micro-contact printing |
| EP1731290A1 (en) * | 2004-03-30 | 2006-12-13 | Pioneer Corporation | Pattern transfer device and pattern transfer method |
| KR101222946B1 (ko) * | 2005-06-24 | 2013-01-17 | 엘지디스플레이 주식회사 | 백 프레인이 부착된 소프트 몰드의 제조방법 |
| US20070202304A1 (en) * | 2006-02-27 | 2007-08-30 | Cambridge University Technical Services Limited, | Nanoparticle colloid, method for its production and its use in the growth of carbon nanotubes |
| JP4745177B2 (ja) * | 2006-09-05 | 2011-08-10 | 株式会社ナノテック | マイクロコンタクトプリントにおけるプリント圧力検出方法及び装置 |
| US7735419B2 (en) * | 2006-11-16 | 2010-06-15 | Labrador Research, Llc | System for soft lithography |
| US20080271625A1 (en) * | 2007-01-22 | 2008-11-06 | Nano Terra Inc. | High-Throughput Apparatus for Patterning Flexible Substrates and Method of Using the Same |
| FR2921002B1 (fr) | 2007-09-13 | 2010-11-12 | Innopsys | Procede de depot simultane d'un ensemble de motifs sur un substrat par un macro timbre |
| EP2300207A4 (en) * | 2008-06-26 | 2012-05-09 | Harvard College | MANUFACTURED VERSATILE NANOSTRUCTURED MATERIALS MANUFACTURED BY REPLICATION |
| KR101037903B1 (ko) * | 2010-12-09 | 2011-05-30 | 한국기계연구원 | 롤프린팅/롤임프린팅용 롤 제조방법 |
-
2010
- 2010-04-26 FR FR1053176A patent/FR2959162B3/fr not_active Expired - Lifetime
-
2011
- 2011-03-08 US US13/042,974 patent/US20110259223A1/en not_active Abandoned
- 2011-04-20 CA CA2737791A patent/CA2737791A1/en not_active Abandoned
- 2011-04-22 JP JP2011096328A patent/JP5828664B2/ja not_active Expired - Fee Related
- 2011-04-22 EP EP11163591A patent/EP2381307A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| FR2959162B3 (fr) | 2012-03-23 |
| JP2011251526A (ja) | 2011-12-15 |
| FR2959162A3 (fr) | 2011-10-28 |
| JP5828664B2 (ja) | 2015-12-09 |
| US20110259223A1 (en) | 2011-10-27 |
| EP2381307A1 (fr) | 2011-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request |
Effective date: 20160401 |
|
| FZDE | Discontinued |
Effective date: 20180420 |