JP5786919B2 - 投影光学系、露光装置及び露光方法 - Google Patents

投影光学系、露光装置及び露光方法 Download PDF

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Publication number
JP5786919B2
JP5786919B2 JP2013223545A JP2013223545A JP5786919B2 JP 5786919 B2 JP5786919 B2 JP 5786919B2 JP 2013223545 A JP2013223545 A JP 2013223545A JP 2013223545 A JP2013223545 A JP 2013223545A JP 5786919 B2 JP5786919 B2 JP 5786919B2
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optical system
projection optical
lens
pattern
light
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JP2014056255A (ja
JP2014056255A5 (https=
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大村　泰弘
泰弘 大村
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Nikon Corp
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Nikon Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013223545A 2013-10-28 2013-10-28 投影光学系、露光装置及び露光方法 Expired - Fee Related JP5786919B2 (ja)

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JP2013223545A JP5786919B2 (ja) 2013-10-28 2013-10-28 投影光学系、露光装置及び露光方法

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JP2013223545A JP5786919B2 (ja) 2013-10-28 2013-10-28 投影光学系、露光装置及び露光方法

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JP2011252890A Division JP2012073632A (ja) 2011-11-18 2011-11-18 反射屈折投影光学系、露光装置及び露光方法

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JP2015040255A Division JP2015132843A (ja) 2015-03-02 2015-03-02 投影光学系、露光装置、露光方法、およびデバイス製造方法

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JP2014056255A JP2014056255A (ja) 2014-03-27
JP2014056255A5 JP2014056255A5 (https=) 2014-06-26
JP5786919B2 true JP5786919B2 (ja) 2015-09-30

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Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3246615B2 (ja) * 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JPH07142338A (ja) * 1993-06-14 1995-06-02 Canon Inc 像投影方法及びそれを用いた露光装置
JPH11176727A (ja) * 1997-12-11 1999-07-02 Nikon Corp 投影露光装置
WO1999049504A1 (fr) * 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
US6600608B1 (en) * 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
JP4706171B2 (ja) * 2003-10-24 2011-06-22 株式会社ニコン 反射屈折投影光学系、露光装置及び露光方法
DE602005008707D1 (de) * 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv

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