JP5774599B2 - ジチエノベンゾ−チエノ［３，２−ｂ］チオフェン−コポリマーとその溶液加工可能な高機能性半導電性ポリマーとしての利用 - Google Patents

ジチエノベンゾ−チエノ［３，２−ｂ］チオフェン−コポリマーとその溶液加工可能な高機能性半導電性ポリマーとしての利用 Download PDF

Info

Publication number
JP5774599B2
JP5774599B2 JP2012541429A JP2012541429A JP5774599B2 JP 5774599 B2 JP5774599 B2 JP 5774599B2 JP 2012541429 A JP2012541429 A JP 2012541429A JP 2012541429 A JP2012541429 A JP 2012541429A JP 5774599 B2 JP5774599 B2 JP 5774599B2
Authority
JP
Japan
Prior art keywords
group
alkyl
aryl
divalent
independently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012541429A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013512975A5 (enExample
JP2013512975A (ja
Inventor
カストラー，マルセル
ケーラー，ズィルケ，アニカ
ミュレン，クラウス
リーガー，ラルフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JP2013512975A publication Critical patent/JP2013512975A/ja
Publication of JP2013512975A5 publication Critical patent/JP2013512975A5/ja
Application granted granted Critical
Publication of JP5774599B2 publication Critical patent/JP5774599B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
    • C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
    • C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/151—Copolymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/12—Copolymers
    • C08G2261/124—Copolymers alternating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/32—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
    • C08G2261/322—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed
    • C08G2261/3223—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain non-condensed containing one or more sulfur atoms as the only heteroatom, e.g. thiophene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/32—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
    • C08G2261/324—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed
    • C08G2261/3243—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed containing one or more sulfur atoms as the only heteroatom, e.g. benzothiophene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/40—Polymerisation processes
    • C08G2261/41—Organometallic coupling reactions
    • C08G2261/414—Stille reactions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/90—Applications
    • C08G2261/92—TFT applications
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Paints Or Removers (AREA)
JP2012541429A 2009-12-02 2010-11-29 ジチエノベンゾ−チエノ［３，２−ｂ］チオフェン−コポリマーとその溶液加工可能な高機能性半導電性ポリマーとしての利用 Expired - Fee Related JP5774599B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26577809P 2009-12-02 2009-12-02
US61/265,778 2009-12-02
PCT/EP2010/068365 WO2011067192A2 (en) 2009-12-02 2010-11-29 Dithienobenzo-thieno[3,2-b]thiophene-copolymer and its use as high performance solution processable semiconducting polymer

Publications (3)

Publication Number Publication Date
JP2013512975A JP2013512975A (ja) 2013-04-18
JP2013512975A5 JP2013512975A5 (enExample) 2014-01-09
JP5774599B2 true JP5774599B2 (ja) 2015-09-09

Family

ID=43912750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012541429A Expired - Fee Related JP5774599B2 (ja) 2009-12-02 2010-11-29 ジチエノベンゾ−チエノ［３，２−ｂ］チオフェン−コポリマーとその溶液加工可能な高機能性半導電性ポリマーとしての利用

Country Status (6)

Country Link
US (1) US8389670B2 (enExample)
EP (1) EP2507286B1 (enExample)
JP (1) JP5774599B2 (enExample)
KR (1) KR101780083B1 (enExample)
CN (1) CN102639591B (enExample)
WO (1) WO2011067192A2 (enExample)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010008672A1 (en) 2008-07-18 2010-01-21 University Of Chicago Semiconducting polymers
KR101545429B1 (ko) 2011-04-15 2015-08-18 더 유니버시티 오브 시카고 반도체 폴리머
JP5742494B2 (ja) * 2011-06-10 2015-07-01 住友化学株式会社 高分子化合物及びそれを用いた電子素子
EP2809706A4 (en) 2012-02-03 2016-01-13 Univ Chicago SEMICONDUCTOR POLYMERS
US20130247992A1 (en) * 2012-03-22 2013-09-26 Polyera Corporation Polymeric Blends and Related Optoelectronic Devices
US20150295193A1 (en) * 2012-11-22 2015-10-15 University of Seoul Industry Cooperation Foundatio n Semiconductor device using paper as a substrate and method of manufacturing the same
CN104854111A (zh) * 2012-12-03 2015-08-19 巴斯夫欧洲公司 用于有机电子器件的杂并苯化合物
KR102088685B1 (ko) 2012-12-19 2020-03-13 바스프 에스이 적어도 하나의 물체를 광학적으로 검출하기 위한 검출기
CN104119502A (zh) * 2013-04-25 2014-10-29 海洋王照明科技股份有限公司 含噻吩并噻吩-二噻吩并苯并噁二唑-苯并噻二唑类共轭聚合物及其制备方法与应用
CN104119503A (zh) * 2013-04-25 2014-10-29 海洋王照明科技股份有限公司 含噻吩并噻吩-二噻吩并苯并三唑-苯并噻二唑类共轭聚合物及其制备方法与应用
CN104119501A (zh) * 2013-04-25 2014-10-29 海洋王照明科技股份有限公司 含噻吩并噻吩-二噻吩并苯并噻二唑-苯并噻二唑类共轭聚合物及其制备方法与应用
CN104211921A (zh) * 2013-05-29 2014-12-17 海洋王照明科技股份有限公司 共轭聚合物及其制备方法与应用
CN104211915A (zh) * 2013-05-29 2014-12-17 海洋王照明科技股份有限公司 共轭聚合物及其制备方法与应用
CN104211913A (zh) * 2013-05-29 2014-12-17 海洋王照明科技股份有限公司 共轭聚合物及其制备方法与应用
CN104211912A (zh) * 2013-05-29 2014-12-17 海洋王照明科技股份有限公司 共轭聚合物及其制备方法与应用
KR20160019067A (ko) 2013-06-13 2016-02-18 바스프 에스이 적어도 하나의 물체의 배향을 광학적으로 검출하기 위한 검출기
WO2014198625A1 (en) 2013-06-13 2014-12-18 Basf Se Optical detector and method for manufacturing the same
US9989623B2 (en) 2013-06-13 2018-06-05 Basf Se Detector for determining a longitudinal coordinate of an object via an intensity distribution of illuminated pixels
CN103408733B (zh) * 2013-08-13 2015-09-30 武汉理工大学 二硒吩并苯并二茚类共轭聚合物半导体材料及其应用
WO2015024870A1 (en) 2013-08-19 2015-02-26 Basf Se Detector for determining a position of at least one object
KR102191139B1 (ko) 2013-08-19 2020-12-15 바스프 에스이 광학 검출기
WO2015097078A2 (en) 2013-12-24 2015-07-02 Solvay Sa Small molecule heteroacenes as semiconductors
JP2015141912A (ja) * 2014-01-27 2015-08-03 富士フイルム株式会社 有機薄膜トランジスタ、有機半導体薄膜および有機半導体材料
KR102397527B1 (ko) 2014-07-08 2022-05-13 바스프 에스이 하나 이상의 물체의 위치를 결정하기 위한 검출기
WO2016009890A1 (ja) * 2014-07-18 2016-01-21 富士フイルム株式会社 有機半導体膜形成用組成物、並びに、有機半導体素子及びその製造方法
CN106716059B (zh) 2014-09-29 2020-03-13 巴斯夫欧洲公司 用于光学确定至少一个对象的位置的检测器
KR102497704B1 (ko) 2014-12-09 2023-02-09 바스프 에스이 광 검출기
US10775505B2 (en) 2015-01-30 2020-09-15 Trinamix Gmbh Detector for an optical detection of at least one object
WO2017012986A1 (en) 2015-07-17 2017-01-26 Trinamix Gmbh Detector for optically detecting at least one object
EP3350988B1 (en) 2015-09-14 2019-08-07 trinamiX GmbH 3d camera
US11211513B2 (en) 2016-07-29 2021-12-28 Trinamix Gmbh Optical sensor and detector for an optical detection
JP7241684B2 (ja) 2016-10-25 2023-03-17 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 少なくとも１個の対象物の光学的な検出のための検出器
EP3532796B1 (en) 2016-10-25 2026-04-15 trinamiX GmbH Infrared optical detector with integrated filter
WO2018091640A2 (en) 2016-11-17 2018-05-24 Trinamix Gmbh Detector for optically detecting at least one object
US11860292B2 (en) 2016-11-17 2024-01-02 Trinamix Gmbh Detector and methods for authenticating at least one object
JP7204667B2 (ja) 2017-04-20 2023-01-16 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 光検出器
WO2019002199A1 (en) 2017-06-26 2019-01-03 Trinamix Gmbh DETECTOR FOR DETERMINING A POSITION OF AT LEAST ONE OBJECT
JP7046395B2 (ja) 2018-03-07 2022-04-04 クラップ カンパニー リミテッド トップゲート・ボトムコンタクト有機電界効果トランジスタを製造するためのパターニング方法
CN112074963A (zh) 2018-03-08 2020-12-11 Clap有限公司 半导体性单壁碳纳米管及包括有机半导体材料的有机场效应晶体管
EP3735430B1 (en) 2018-06-26 2023-09-13 Clap Co., Ltd. Vinylether-based polymer as dielectric

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198153A (en) 1989-05-26 1993-03-30 International Business Machines Corporation Electrically conductive polymeric
JP3224829B2 (ja) 1991-08-15 2001-11-05 株式会社東芝 有機電界効果型素子
WO1996021659A1 (en) 1995-01-10 1996-07-18 University Of Technology, Sydney Organic semiconductor
EP1017735B1 (en) * 1997-09-05 2003-11-19 Cambridge Display Technology Limited Compounds for electronic devices
DE602004017550D1 (de) * 2003-08-28 2008-12-18 Merck Patent Gmbh Mono-, Oligo- und Polythienoi2,3-b thiophene
DE602004024629D1 (de) 2003-10-15 2010-01-28 Merck Patent Gmbh Polybenzodithiophene
KR20070112791A (ko) 2005-03-11 2007-11-27 메르크 파텐트 게엠베하 티오펜 및 셀레노펜 함유 단량체, 올리고머 및 중합체
CN101193899A (zh) 2005-06-09 2008-06-04 默克专利股份有限公司 噻吩并(3,4-d)噻唑的单体、低聚物和聚合物
CN101415715B (zh) 2006-03-10 2012-10-10 住友化学株式会社 稠环化合物及其制造方法、聚合物、含有它们的有机薄膜，有机薄膜元件及有机薄膜晶体管
JP5164134B2 (ja) * 2006-03-10 2013-03-13 住友化学株式会社 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ
WO2008026602A1 (en) * 2006-08-28 2008-03-06 Tosoh Corporation Heteroacene derivative, tetrahaloterphenyl derivative, and their production methods
US7820782B2 (en) * 2006-10-25 2010-10-26 Xerox Corporation Poly(dithienylbenzo[1,2-b:4,5-b′]dithiophene) polymers
JP5472874B2 (ja) 2006-10-25 2014-04-16 三星電子株式会社 電子デバイス
KR101314998B1 (ko) 2006-12-13 2013-10-04 삼성전자주식회사 헤테로아센 화합물, 이를 포함하는 유기 박막 및 당해 박막을 포함하는 전자 소자
JP5138422B2 (ja) * 2008-02-29 2013-02-06 株式会社リコー ベンゾチエノ［３，２−ｂ］ベンゾチオフェン構造を含む重合体
TWI471328B (zh) 2008-07-02 2015-02-01 巴地斯顏料化工廠 以二噻吩并〔２，３－ｄ：２’，３’－ｄ’〕苯并〔１，２－ｂ：４，５－ｂ’〕二噻吩為主之高效能溶液可加工之半導體
WO2010000669A1 (en) 2008-07-02 2010-01-07 Basf Se Poly(5,5'bis(thiophen-2-yl)-benzo[2,1-b;3,4-b']dithiophene) and its use as high performance solution processable semiconducting polymer
WO2010018081A1 (en) 2008-08-11 2010-02-18 Basf Se Polybenzothiophene polymers and process for their preparation

Also Published As

Publication number Publication date
KR101780083B1 (ko) 2017-10-10
EP2507286B1 (en) 2017-07-05
CN102639591B (zh) 2015-05-13
US20120289672A1 (en) 2012-11-15
WO2011067192A2 (en) 2011-06-09
JP2013512975A (ja) 2013-04-18
US8389670B2 (en) 2013-03-05
KR20120116427A (ko) 2012-10-22
EP2507286A2 (en) 2012-10-10
WO2011067192A3 (en) 2011-09-15
CN102639591A (zh) 2012-08-15

Similar Documents

Publication Publication Date Title
US8389670B2 (en) Dithienobenzo-thieno[3,2-B]thiophene-copolymer and its use as high performance solution processable semiconducting polymer
JP5735418B2 (ja) ポリ（５，５’−ビス（チオフェン−２−イル）−ベンゾ［２，１−ｂ；３，４−ｂ’］ジチオフェン）、及び半導体ポリマーを加工可能な高機能溶液としてのその使用方法
CN102083838B (zh) 基于二噻吩并[2，3-d:2′，3′-d′]苯并[1，2-b:4，5-b′]二噻吩的高性能可溶液加工半导体
KR101561322B1 (ko) 교대 도너 억셉터 공중합체를 주성분으로 하는 고성능 용액 가공성 반도체 중합체
JP5728003B2 (ja) 縮合ビチオフェンビニレンコポリマー
JP2011530635A (ja) ポリベンゾチオフェンポリマー及びその製造方法
CA2713083A1 (en) Semiconductor materials prepared from rylene-(.pi.-acceptor) copolymers
JP2010535270A (ja) 共役モノマー及びポリマー並びにそれらの製造及び用途
CN103635505B (zh) 二噻吩并邻苯二甲酰亚胺半导体聚合物
KR20130040830A (ko) 어닐링된 디티오펜 공중합체
KR20130069446A (ko) 신규한 다이케토피롤로피롤 중합체 및 이를 이용한 유기 전자 소자
KR101838232B1 (ko) 유기반도체 화합물 및 그를 포함하는 유기전자소자

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131113

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131113

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140310

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140422

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140722

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140729

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140819

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140826

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140916

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150203

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150227

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150609

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150701

R150 Certificate of patent or registration of utility model

Ref document number: 5774599

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees