JP5754699B2 - 半導体リソグラフィ用光源装置 - Google Patents
半導体リソグラフィ用光源装置 Download PDFInfo
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- JP5754699B2 JP5754699B2 JP2010222493A JP2010222493A JP5754699B2 JP 5754699 B2 JP5754699 B2 JP 5754699B2 JP 2010222493 A JP2010222493 A JP 2010222493A JP 2010222493 A JP2010222493 A JP 2010222493A JP 5754699 B2 JP5754699 B2 JP 5754699B2
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- Prior art keywords
- light source
- source device
- cavity resonator
- cavity
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 title claims description 58
- 238000001459 lithography Methods 0.000 title claims description 38
- 239000011521 glass Substances 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 3
- 230000005672 electromagnetic field Effects 0.000 description 31
- 230000003287 optical effect Effects 0.000 description 16
- 238000003780 insertion Methods 0.000 description 7
- 230000037431 insertion Effects 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 238000012546 transfer Methods 0.000 description 7
- 229910052756 noble gas Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010222493A JP5754699B2 (ja) | 2010-09-30 | 2010-09-30 | 半導体リソグラフィ用光源装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010222493A JP5754699B2 (ja) | 2010-09-30 | 2010-09-30 | 半導体リソグラフィ用光源装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012079857A JP2012079857A (ja) | 2012-04-19 |
| JP2012079857A5 JP2012079857A5 (enExample) | 2013-10-17 |
| JP5754699B2 true JP5754699B2 (ja) | 2015-07-29 |
Family
ID=46239771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010222493A Expired - Fee Related JP5754699B2 (ja) | 2010-09-30 | 2010-09-30 | 半導体リソグラフィ用光源装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5754699B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3073487B1 (ja) | 1999-02-16 | 2000-08-07 | 新東株式会社 | 隅瓦焼成用保持台 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016043313A1 (ja) * | 2014-09-19 | 2016-03-24 | 学校法人関西大学 | Ｅｕｖ光源装置 |
| JPWO2016043318A1 (ja) * | 2014-09-19 | 2017-08-10 | 学校法人 関西大学 | Ｅｕｖ光源装置およびｅｕｖ光発生方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6226752A (ja) * | 1985-07-29 | 1987-02-04 | Yoshiaki Arata | 高強度軟ｘ線発生方法 |
| US6075838A (en) * | 1998-03-18 | 2000-06-13 | Plex Llc | Z-pinch soft x-ray source using diluent gas |
| JP4578901B2 (ja) * | 2004-09-09 | 2010-11-10 | 株式会社小松製作所 | 極端紫外光源装置 |
| JP2008130230A (ja) * | 2006-11-16 | 2008-06-05 | Ushio Inc | 極端紫外光光源装置 |
| US8071963B2 (en) * | 2006-12-27 | 2011-12-06 | Asml Netherlands B.V. | Debris mitigation system and lithographic apparatus |
| JP5162365B2 (ja) * | 2008-08-05 | 2013-03-13 | 学校法人 関西大学 | 半導体リソグラフィ用光源 |
-
2010
- 2010-09-30 JP JP2010222493A patent/JP5754699B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3073487B1 (ja) | 1999-02-16 | 2000-08-07 | 新東株式会社 | 隅瓦焼成用保持台 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012079857A (ja) | 2012-04-19 |
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