JP5724438B2 - ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 - Google Patents
ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 Download PDFInfo
- Publication number
- JP5724438B2 JP5724438B2 JP2011032991A JP2011032991A JP5724438B2 JP 5724438 B2 JP5724438 B2 JP 5724438B2 JP 2011032991 A JP2011032991 A JP 2011032991A JP 2011032991 A JP2011032991 A JP 2011032991A JP 5724438 B2 JP5724438 B2 JP 5724438B2
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- JP
- Japan
- Prior art keywords
- halogen
- gas
- valve
- containing gas
- shock wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052736 halogen Inorganic materials 0.000 title claims description 80
- 150000002367 halogens Chemical class 0.000 title claims description 80
- 238000000034 method Methods 0.000 title claims description 16
- 230000035939 shock Effects 0.000 claims description 78
- 230000002265 prevention Effects 0.000 claims description 19
- 229910052731 fluorine Inorganic materials 0.000 claims description 15
- 239000011737 fluorine Substances 0.000 claims description 14
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 4
- 229910052740 iodine Inorganic materials 0.000 claims description 4
- 239000011630 iodine Substances 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 description 163
- 239000003566 sealing material Substances 0.000 description 28
- 230000000052 comparative effect Effects 0.000 description 26
- 239000000463 material Substances 0.000 description 24
- 239000010935 stainless steel Substances 0.000 description 15
- 229910001220 stainless steel Inorganic materials 0.000 description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 10
- 230000006866 deterioration Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000001629 suppression Effects 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 150000002366 halogen compounds Chemical class 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 229910000617 Mangalloy Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- -1 NF 3 Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Pipe Accessories (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011032991A JP5724438B2 (ja) | 2010-10-08 | 2011-02-18 | ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 |
| PCT/JP2011/070336 WO2012046533A1 (ja) | 2010-10-08 | 2011-09-07 | ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 |
| EP11830466.6A EP2626615A4 (en) | 2010-10-08 | 2011-09-07 | DEVICE FOR SUPPLYING HALOGEN-CONTAINING GAS AND METHOD FOR SUPPLYING HALOGEN-CONTAINING GAS |
| KR1020137010336A KR20130079553A (ko) | 2010-10-08 | 2011-09-07 | 할로겐 함유 가스 공급장치 및 할로겐 함유 가스 공급방법 |
| US13/878,292 US20130221024A1 (en) | 2010-10-08 | 2011-09-07 | Halogen-containing gas supply apparatus and halogen-containing gas supply method |
| TW100136314A TWI441998B (zh) | 2010-10-08 | 2011-10-06 | A halogen-containing gas supply device and a halogen-containing gas supply method |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010228275 | 2010-10-08 | ||
| JP2010228275 | 2010-10-08 | ||
| JP2011032991A JP5724438B2 (ja) | 2010-10-08 | 2011-02-18 | ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012097892A JP2012097892A (ja) | 2012-05-24 |
| JP2012097892A5 JP2012097892A5 (enrdf_load_stackoverflow) | 2014-04-03 |
| JP5724438B2 true JP5724438B2 (ja) | 2015-05-27 |
Family
ID=46390018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011032991A Active JP5724438B2 (ja) | 2010-10-08 | 2011-02-18 | ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5724438B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5899883B2 (ja) * | 2011-01-26 | 2016-04-06 | セントラル硝子株式会社 | 高圧ガスの供給方法、衝撃波減衰機構を有する機器及び高圧ガスの供給装置 |
| US20200203127A1 (en) * | 2018-12-20 | 2020-06-25 | L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude | Systems and methods for storage and supply of f3no-free fno gases and f3no-free fno gas mixtures for semiconductor processes |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3424503C2 (de) * | 1984-07-04 | 1986-05-07 | Drägerwerk AG, 2400 Lübeck | Druckstoß-Dämpfer in Druckgasleitungen |
| DE19531505B4 (de) * | 1995-08-26 | 2006-07-06 | Air Liquide Deutschland Gmbh | Dosiervorrichtung zur Entnahme von Gasen aus einem Druckbehälter |
| US6257000B1 (en) * | 2000-03-22 | 2001-07-10 | Luping Wang | Fluid storage and dispensing system featuring interiorly disposed and exteriorly adjustable regulator for high flow dispensing of gas |
| US20080000532A1 (en) * | 2006-06-30 | 2008-01-03 | Matthew Lincoln Wagner | Low release rate cylinder package |
-
2011
- 2011-02-18 JP JP2011032991A patent/JP5724438B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012097892A (ja) | 2012-05-24 |
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