JP2012097892A5 - - Google Patents

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Publication number
JP2012097892A5
JP2012097892A5 JP2011032991A JP2011032991A JP2012097892A5 JP 2012097892 A5 JP2012097892 A5 JP 2012097892A5 JP 2011032991 A JP2011032991 A JP 2011032991A JP 2011032991 A JP2011032991 A JP 2011032991A JP 2012097892 A5 JP2012097892 A5 JP 2012097892A5
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JP
Japan
Prior art keywords
halogen
containing gas
gas supply
shock wave
external device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011032991A
Other languages
English (en)
Japanese (ja)
Other versions
JP5724438B2 (ja
JP2012097892A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2011032991A external-priority patent/JP5724438B2/ja
Priority to JP2011032991A priority Critical patent/JP5724438B2/ja
Priority to US13/878,292 priority patent/US20130221024A1/en
Priority to EP11830466.6A priority patent/EP2626615A4/en
Priority to KR1020137010336A priority patent/KR20130079553A/ko
Priority to PCT/JP2011/070336 priority patent/WO2012046533A1/ja
Priority to TW100136314A priority patent/TWI441998B/zh
Publication of JP2012097892A publication Critical patent/JP2012097892A/ja
Publication of JP2012097892A5 publication Critical patent/JP2012097892A5/ja
Publication of JP5724438B2 publication Critical patent/JP5724438B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011032991A 2010-10-08 2011-02-18 ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法 Active JP5724438B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011032991A JP5724438B2 (ja) 2010-10-08 2011-02-18 ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法
PCT/JP2011/070336 WO2012046533A1 (ja) 2010-10-08 2011-09-07 ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法
EP11830466.6A EP2626615A4 (en) 2010-10-08 2011-09-07 DEVICE FOR SUPPLYING HALOGEN-CONTAINING GAS AND METHOD FOR SUPPLYING HALOGEN-CONTAINING GAS
KR1020137010336A KR20130079553A (ko) 2010-10-08 2011-09-07 할로겐 함유 가스 공급장치 및 할로겐 함유 가스 공급방법
US13/878,292 US20130221024A1 (en) 2010-10-08 2011-09-07 Halogen-containing gas supply apparatus and halogen-containing gas supply method
TW100136314A TWI441998B (zh) 2010-10-08 2011-10-06 A halogen-containing gas supply device and a halogen-containing gas supply method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010228275 2010-10-08
JP2010228275 2010-10-08
JP2011032991A JP5724438B2 (ja) 2010-10-08 2011-02-18 ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法

Publications (3)

Publication Number Publication Date
JP2012097892A JP2012097892A (ja) 2012-05-24
JP2012097892A5 true JP2012097892A5 (enrdf_load_stackoverflow) 2014-04-03
JP5724438B2 JP5724438B2 (ja) 2015-05-27

Family

ID=46390018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011032991A Active JP5724438B2 (ja) 2010-10-08 2011-02-18 ハロゲン含有ガス供給装置及びハロゲン含有ガス供給方法

Country Status (1)

Country Link
JP (1) JP5724438B2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5899883B2 (ja) * 2011-01-26 2016-04-06 セントラル硝子株式会社 高圧ガスの供給方法、衝撃波減衰機構を有する機器及び高圧ガスの供給装置
US20200203127A1 (en) * 2018-12-20 2020-06-25 L'Air Liquide, Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude Systems and methods for storage and supply of f3no-free fno gases and f3no-free fno gas mixtures for semiconductor processes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3424503C2 (de) * 1984-07-04 1986-05-07 Drägerwerk AG, 2400 Lübeck Druckstoß-Dämpfer in Druckgasleitungen
DE19531505B4 (de) * 1995-08-26 2006-07-06 Air Liquide Deutschland Gmbh Dosiervorrichtung zur Entnahme von Gasen aus einem Druckbehälter
US6257000B1 (en) * 2000-03-22 2001-07-10 Luping Wang Fluid storage and dispensing system featuring interiorly disposed and exteriorly adjustable regulator for high flow dispensing of gas
US20080000532A1 (en) * 2006-06-30 2008-01-03 Matthew Lincoln Wagner Low release rate cylinder package

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