JP5723731B2 - 機能性フィルムおよび機能性フィルムの製造方法 - Google Patents

機能性フィルムおよび機能性フィルムの製造方法 Download PDF

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JP5723731B2
JP5723731B2 JP2011197393A JP2011197393A JP5723731B2 JP 5723731 B2 JP5723731 B2 JP 5723731B2 JP 2011197393 A JP2011197393 A JP 2011197393A JP 2011197393 A JP2011197393 A JP 2011197393A JP 5723731 B2 JP5723731 B2 JP 5723731B2
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Prior art keywords
film
region
support
inorganic
inorganic film
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JP2011197393A
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English (en)
Japanese (ja)
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JP2013056513A (ja
JP2013056513A5 (enExample
Inventor
藤縄　淳
淳 藤縄
望月　佳彦
佳彦 望月
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2011197393A priority Critical patent/JP5723731B2/ja
Priority to PCT/JP2012/072432 priority patent/WO2013035683A1/ja
Publication of JP2013056513A publication Critical patent/JP2013056513A/ja
Publication of JP2013056513A5 publication Critical patent/JP2013056513A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Packages (AREA)
  • Laminated Bodies (AREA)
JP2011197393A 2011-09-09 2011-09-09 機能性フィルムおよび機能性フィルムの製造方法 Active JP5723731B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011197393A JP5723731B2 (ja) 2011-09-09 2011-09-09 機能性フィルムおよび機能性フィルムの製造方法
PCT/JP2012/072432 WO2013035683A1 (ja) 2011-09-09 2012-09-04 機能性フィルムおよび機能性フィルムの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011197393A JP5723731B2 (ja) 2011-09-09 2011-09-09 機能性フィルムおよび機能性フィルムの製造方法

Publications (3)

Publication Number Publication Date
JP2013056513A JP2013056513A (ja) 2013-03-28
JP2013056513A5 JP2013056513A5 (enExample) 2014-02-27
JP5723731B2 true JP5723731B2 (ja) 2015-05-27

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JP2011197393A Active JP5723731B2 (ja) 2011-09-09 2011-09-09 機能性フィルムおよび機能性フィルムの製造方法

Country Status (2)

Country Link
JP (1) JP5723731B2 (enExample)
WO (1) WO2013035683A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12069934B2 (en) 2021-01-27 2024-08-20 Samsung Display Co., Ltd. Display device and method of manufacturing the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6355012B2 (ja) * 2013-11-22 2018-07-11 大日本印刷株式会社 フィルムセンサ、フィルムセンサの製造方法、タッチ位置検出機能付き表示装置、およびフィルムセンサを作製するための積層体
JP2017147191A (ja) 2016-02-19 2017-08-24 株式会社ジャパンディスプレイ 表示装置、及び表示装置の製造方法
JP6754491B2 (ja) * 2017-03-31 2020-09-09 富士フイルム株式会社 ガスバリアフィルムおよび成膜方法
JP2019084715A (ja) * 2017-11-02 2019-06-06 イビデン株式会社 透光板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8652625B2 (en) * 2004-09-21 2014-02-18 Konica Minolta Holdings, Inc. Transparent gas barrier film
JP2007190844A (ja) * 2006-01-20 2007-08-02 Konica Minolta Holdings Inc ガスバリア性樹脂基材および有機エレクトロルミネッセンスデバイス
US20100009147A1 (en) * 2007-02-05 2010-01-14 Kazuhiro Fukuda Transparent gas barrier film
JP2009274251A (ja) * 2008-05-13 2009-11-26 Toppan Printing Co Ltd 透明バリアフィルムおよびその製造方法
WO2010100971A1 (ja) * 2009-03-04 2010-09-10 コニカミノルタホールディングス株式会社 薄膜を有する基材
JP5319342B2 (ja) * 2009-03-17 2013-10-16 富士フイルム株式会社 ガスバリア膜の製造方法、太陽電池用ガスバリアフィルム、および、ディスプレイ用ガスバリアフィルム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12069934B2 (en) 2021-01-27 2024-08-20 Samsung Display Co., Ltd. Display device and method of manufacturing the same

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WO2013035683A1 (ja) 2013-03-14
JP2013056513A (ja) 2013-03-28

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