JP5710976B2 - クラスターボロンの調製方法 - Google Patents
クラスターボロンの調製方法 Download PDFInfo
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- JP5710976B2 JP5710976B2 JP2010532074A JP2010532074A JP5710976B2 JP 5710976 B2 JP5710976 B2 JP 5710976B2 JP 2010532074 A JP2010532074 A JP 2010532074A JP 2010532074 A JP2010532074 A JP 2010532074A JP 5710976 B2 JP5710976 B2 JP 5710976B2
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- 238000002360 preparation method Methods 0.000 title description 5
- 238000000034 method Methods 0.000 claims description 36
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 33
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 28
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 27
- 239000002904 solvent Substances 0.000 claims description 25
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 17
- 238000001914 filtration Methods 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 230000002378 acidificating effect Effects 0.000 claims description 11
- 239000003456 ion exchange resin Substances 0.000 claims description 10
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 10
- 239000000047 product Substances 0.000 claims description 10
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000006227 byproduct Substances 0.000 claims description 8
- 230000002194 synthesizing effect Effects 0.000 claims description 8
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- -1 arene compounds Chemical class 0.000 claims description 6
- CBWJKNQKWLEEPG-UHFFFAOYSA-N dihydridoborate(1-) Chemical compound [BH2-] CBWJKNQKWLEEPG-UHFFFAOYSA-N 0.000 claims description 6
- 239000011541 reaction mixture Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 239000007810 chemical reaction solvent Substances 0.000 claims description 4
- 238000004090 dissolution Methods 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 2
- 239000004327 boric acid Substances 0.000 claims description 2
- 239000012046 mixed solvent Substances 0.000 claims description 2
- 229920001467 poly(styrenesulfonates) Polymers 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000005468 ion implantation Methods 0.000 description 6
- 150000001793 charged compounds Chemical class 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- AIGRXSNSLVJMEA-FQEVSTJZSA-N ethoxy-(4-nitrophenoxy)-phenyl-sulfanylidene-$l^{5}-phosphane Chemical compound O([P@@](=S)(OCC)C=1C=CC=CC=1)C1=CC=C([N+]([O-])=O)C=C1 AIGRXSNSLVJMEA-FQEVSTJZSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 3
- 229920001429 chelating resin Polymers 0.000 description 3
- 239000002274 desiccant Substances 0.000 description 3
- 238000002513 implantation Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 229910000085 borane Inorganic materials 0.000 description 2
- 150000001638 boron Chemical class 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000002198 insoluble material Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 230000000155 isotopic effect Effects 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-O oxonium Chemical class [OH3+] XLYOFNOQVPJJNP-UHFFFAOYSA-O 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- NYBWUHOMYZZKOR-UHFFFAOYSA-N tes-adt Chemical class C1=C2C(C#C[Si](CC)(CC)CC)=C(C=C3C(SC=C3)=C3)C3=C(C#C[Si](CC)(CC)CC)C2=CC2=C1SC=C2 NYBWUHOMYZZKOR-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C01B6/10—Monoborane; Diborane; Addition complexes thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/026—Higher boron hydrides, i.e. containing at least three boron atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/023—Boron
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US163307P | 2007-11-02 | 2007-11-02 | |
| US61/001,633 | 2007-11-02 | ||
| PCT/US2008/012473 WO2009058408A1 (en) | 2007-11-02 | 2008-11-03 | Methods of preparing clusterboron |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011502924A JP2011502924A (ja) | 2011-01-27 |
| JP2011502924A5 JP2011502924A5 (enExample) | 2011-12-08 |
| JP5710976B2 true JP5710976B2 (ja) | 2015-04-30 |
Family
ID=40591393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010532074A Expired - Fee Related JP5710976B2 (ja) | 2007-11-02 | 2008-11-03 | クラスターボロンの調製方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8753600B2 (enExample) |
| EP (1) | EP2205524B1 (enExample) |
| JP (1) | JP5710976B2 (enExample) |
| KR (2) | KR101586868B1 (enExample) |
| CN (1) | CN101848855B (enExample) |
| WO (1) | WO2009058408A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2789207C (en) * | 2010-02-10 | 2015-09-01 | M-I Drilling Fluids Uk Limited | Method and system for decontaminating sand |
| WO2013115889A2 (en) | 2011-11-18 | 2013-08-08 | The Curators Of The University Of Missouri | Process and device for the production of polyhedral boranes |
| CN120965735A (zh) * | 2021-08-26 | 2025-11-18 | 吉林奥来德光电材料股份有限公司 | 硼化合物、发光材料和有机电致发光器件 |
| KR102859382B1 (ko) * | 2023-03-21 | 2025-09-12 | 파미셀 주식회사 | 대용량 고순도의 dNTP 제조 방법 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3577679B2 (ja) * | 1995-03-24 | 2004-10-13 | 日本化学工業株式会社 | メソポーラスアルミノシリケートの製造方法 |
| KR100788474B1 (ko) * | 2002-06-26 | 2007-12-24 | 세미이큅, 인코포레이티드 | 자기 요크 어셈블리 |
| WO2005060602A2 (en) * | 2003-12-12 | 2005-07-07 | Semequip, Inc. | Controlling the flow of vapors sublimated from solids |
| TWI375660B (en) * | 2004-01-22 | 2012-11-01 | Semequip Inc | Isotopically-enriched boranes and methods of preparing them |
| JP5025633B2 (ja) * | 2004-02-02 | 2012-09-12 | エスイーエム・エクイップ インコーポレイテッド | Ｂ１０ｈ１０２−アンモニウム塩の製造方法及びｂ１８ｈ２２の製造方法 |
| US8623309B2 (en) * | 2007-11-02 | 2014-01-07 | Semequip, Inc. | Methods of preparing clusterboron |
| JP5710975B2 (ja) * | 2007-11-02 | 2015-04-30 | セメクイップ， インコーポレイテッド | クラスターボロンの調製方法 |
-
2008
- 2008-11-03 JP JP2010532074A patent/JP5710976B2/ja not_active Expired - Fee Related
- 2008-11-03 WO PCT/US2008/012473 patent/WO2009058408A1/en not_active Ceased
- 2008-11-03 KR KR1020107010911A patent/KR101586868B1/ko not_active Expired - Fee Related
- 2008-11-03 KR KR1020157025455A patent/KR20150108947A/ko not_active Ceased
- 2008-11-03 CN CN200880114573.XA patent/CN101848855B/zh not_active Expired - Fee Related
- 2008-11-03 EP EP08844999.6A patent/EP2205524B1/en not_active Not-in-force
-
2011
- 2011-01-18 US US13/008,724 patent/US8753600B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP2205524B1 (en) | 2017-06-14 |
| US20130236384A1 (en) | 2013-09-12 |
| EP2205524A4 (en) | 2011-06-08 |
| US8753600B2 (en) | 2014-06-17 |
| WO2009058408A1 (en) | 2009-05-07 |
| CN101848855A (zh) | 2010-09-29 |
| KR20150108947A (ko) | 2015-09-30 |
| KR101586868B1 (ko) | 2016-01-19 |
| EP2205524A1 (en) | 2010-07-14 |
| JP2011502924A (ja) | 2011-01-27 |
| CN101848855B (zh) | 2016-10-12 |
| KR20100099126A (ko) | 2010-09-10 |
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