JP5697992B2 - ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 - Google Patents

ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 Download PDF

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Publication number
JP5697992B2
JP5697992B2 JP2010544653A JP2010544653A JP5697992B2 JP 5697992 B2 JP5697992 B2 JP 5697992B2 JP 2010544653 A JP2010544653 A JP 2010544653A JP 2010544653 A JP2010544653 A JP 2010544653A JP 5697992 B2 JP5697992 B2 JP 5697992B2
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alkyl
phenyl
composition
substituted
compound
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Japanese (ja)
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JP2011514393A5 (https=
JP2011514393A (ja
Inventor
ステュデ カティア
ステュデ カティア
ディートリカー クルト
ディートリカー クルト
ユング トゥンヤ
ユング トゥンヤ
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BASF SE
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BASF SE
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Dental Preparations (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2010544653A 2008-01-28 2009-01-06 ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 Expired - Fee Related JP5697992B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08150721 2008-01-28
EP08150721.2 2008-01-28
PCT/EP2009/050066 WO2009095282A2 (en) 2008-01-28 2009-01-06 Photolatent amidine bases for redox curing of radically curable formulations

Publications (3)

Publication Number Publication Date
JP2011514393A JP2011514393A (ja) 2011-05-06
JP2011514393A5 JP2011514393A5 (https=) 2013-03-14
JP5697992B2 true JP5697992B2 (ja) 2015-04-08

Family

ID=39522044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010544653A Expired - Fee Related JP5697992B2 (ja) 2008-01-28 2009-01-06 ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基

Country Status (5)

Country Link
US (1) US20110190412A1 (https=)
EP (1) EP2238178B1 (https=)
JP (1) JP5697992B2 (https=)
CN (1) CN101925616A (https=)
WO (1) WO2009095282A2 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5809780B2 (ja) * 2010-04-02 2015-11-11 Ｄｉｃグラフィックス株式会社 紫外線硬化性コーティングニス
US9718996B2 (en) 2011-09-14 2017-08-01 Denka Company Limited Composition and method for temporarily fixing member using same
EP2882808B1 (de) 2012-08-09 2016-10-12 Basf Se Strahlungshärtbare formulierungen mit hoher haftung
JP5725515B2 (ja) * 2012-11-15 2015-05-27 学校法人東京理科大学 光塩基発生剤及び当該光塩基発生剤を含有する感光性樹脂組成物
US9650526B2 (en) * 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
EP3204434A1 (en) * 2014-10-06 2017-08-16 Dow Global Technologies Llc Using organic photoredox catalysts to achieve metal free photoregulated controlled radical polymerization
FR3030526B1 (fr) * 2014-12-18 2018-06-15 Arkema France Polymerisation radicalaire d'alcoxyamines a basse temperature
US10526440B2 (en) 2015-04-29 2020-01-07 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085546A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
JP6873417B2 (ja) * 2016-11-10 2021-05-19 学校法人東京理科大学 光反応性組成物
JP7109438B2 (ja) 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物
WO2018160667A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
WO2018160691A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
GB2567242B (en) * 2017-10-09 2021-08-11 Henkel IP & Holding GmbH Anaerobically curable compositions comprising 1, 2, 3, 4-tetrahydro benzo(h)quinolin-3-ol or derivatives thereof
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
CN111040644A (zh) * 2018-10-15 2020-04-21 烟台德邦科技有限公司 一种可光催化聚合的丙烯酸酯结构胶
JP7304900B2 (ja) * 2019-01-21 2023-07-07 三井化学株式会社 光重合開始剤、光硬化性組成物、硬化物、及び、歯科材料
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
WO2023167201A1 (ja) * 2022-03-02 2023-09-07 株式会社カネカ 活性エネルギー線硬化性組成物、及び硬化物の製造方法
JPWO2024204487A1 (https=) * 2023-03-30 2024-10-03
TWI885621B (zh) * 2023-11-30 2025-06-01 國家中山科學研究院 乙烯基酯樹脂之固化方法

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US3018266A (en) * 1960-07-29 1962-01-23 American Cyanamid Co Polymerizable elastomer-vinyl aromatic compound composition containing a catalyst promoter system and method of polymerizing same
DE3612442A1 (de) * 1986-04-12 1987-10-22 Bayer Ag Verfahren zur herstellung von uv-gehaerteten deckend pigmentierten beschichtungen
JPH1149835A (ja) * 1997-08-05 1999-02-23 Showa Highpolymer Co Ltd コンクリート構築物用プライマー組成物及びその硬化方法
EP0898202B1 (en) * 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
AU2001260325B2 (en) * 2000-05-26 2005-03-10 Akzo Nobel N.V. Photoactivatable coating composition
ATE360629T1 (de) * 2001-10-17 2007-05-15 Ciba Sc Holding Ag Photoaktivierbare stickstoffbasen
US6664357B1 (en) * 2003-01-21 2003-12-16 National Starch And Chemical Investment Holding Corporation Method for the preparation of a stable anaerobic/UV/visible light curable adhesive
WO2006008251A2 (en) * 2004-07-21 2006-01-26 Ciba Specialty Chemicals Holding Inc. Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
DE102005010327A1 (de) * 2005-03-03 2006-09-07 Basf Ag Ratikalisch härtbare Beschichtungsmassen
JP4967276B2 (ja) * 2005-08-09 2012-07-04 日立化成工業株式会社 回路接続材料並びに回路端子の接続構造体及び接続方法
WO2008037635A1 (en) * 2006-09-29 2008-04-03 Ciba Holding Inc. Photolatent bases for systems based on blocked isocyanates

Also Published As

Publication number Publication date
CN101925616A (zh) 2010-12-22
WO2009095282A3 (en) 2009-11-12
WO2009095282A4 (en) 2010-01-14
WO2009095282A2 (en) 2009-08-06
JP2011514393A (ja) 2011-05-06
US20110190412A1 (en) 2011-08-04
EP2238178B1 (en) 2014-09-10
EP2238178A2 (en) 2010-10-13

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