JP5687359B2 - Heat treatment equipment for annealing process - Google Patents

Heat treatment equipment for annealing process Download PDF

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JP5687359B2
JP5687359B2 JP2013547316A JP2013547316A JP5687359B2 JP 5687359 B2 JP5687359 B2 JP 5687359B2 JP 2013547316 A JP2013547316 A JP 2013547316A JP 2013547316 A JP2013547316 A JP 2013547316A JP 5687359 B2 JP5687359 B2 JP 5687359B2
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base plate
coil
support piece
annealing process
heat treatment
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JP2014505792A (en
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サン ウォン リー
サン ウォン リー
ジン テク オウ
ジン テク オウ
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Posco Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/34Methods of heating
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/26Methods of annealing
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
    • C21D9/54Furnaces for treating strips or wire
    • C21D9/663Bell-type furnaces
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
    • C21D9/54Furnaces for treating strips or wire
    • C21D9/663Bell-type furnaces
    • C21D9/677Arrangements of heating devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B11/00Bell-type furnaces

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
  • Manufacturing Of Steel Electrode Plates (AREA)
  • Furnace Details (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Heat Treatment Of Strip Materials And Filament Materials (AREA)

Description

本発明は、焼鈍工程用の熱処理装置に関するもので、より詳しくは、コイルの上部だけでなく下部にも熱伝達が均一になされるようにしてコイル内の温度偏差を減少させることができる焼鈍工程用の熱処理装置に関する。   The present invention relates to a heat treatment apparatus for an annealing process, and more specifically, an annealing process capable of reducing temperature deviation in a coil by making heat transfer uniform not only at the upper part but also at the lower part of the coil. The present invention relates to a heat treatment apparatus.

電磁鋼板の製造工程中に電磁鋼板が方向性を持つようにするために、コイルを一定期間1000℃程度の高温で維持した後に冷却させるCOF(Continuous Open frame Furnace)工程を経る。   In order to make the magnetic steel sheet have directionality during the manufacturing process of the magnetic steel sheet, a COF (Continuous Open Frame Furnace) process is performed in which the coil is cooled after being maintained at a high temperature of about 1000 ° C. for a certain period.

図1ないし図2に示されたように、従来のCOF工程で使用される熱処理装置は、コイル50が置かれる円形板10と、耐火物で構成されて円形板10の撓み現象を防ぐ上部サポート20と、上部サポート20の下部に放射形に配置される下部サポート30と、これら円形板10、上部サポート20及び下部サポート30を覆って床60の砂61に固定されて外部雰囲気ガスであるバーナー燃焼雰囲気と内部雰囲気ガスである水素雰囲気ガス間の直接的な接触を遮断するカバー40で構成される。   As shown in FIGS. 1 and 2, the heat treatment apparatus used in the conventional COF process includes a circular plate 10 on which a coil 50 is placed, and an upper support that is formed of a refractory and prevents the circular plate 10 from being bent. 20, a lower support 30 arranged radially at the lower part of the upper support 20, and a burner which is fixed to the sand 61 of the floor 60 and covers the circular plate 10, the upper support 20 and the lower support 30 and is an external atmosphere gas The cover 40 is configured to block direct contact between the combustion atmosphere and the hydrogen atmosphere gas which is the internal atmosphere gas.

しかし、このような従来技術の場合、カバーが外部加熱源による輻射熱伝達により加熱されたり、外部冷却源による対流熱伝達がされて冷却すれば、該当熱はカバー内部のコイルに伝達されることになるが、この時、コイルの上部はカバーの熱によって加熱/冷却されるが、コイルの下部はカバーの熱によって加熱/冷却された円形板を介して加熱/冷却されるため、コイルの上部と下部に伝達される熱温度に差が発生して温度偏差が発生していた。   However, in the case of such a conventional technique, if the cover is heated by radiant heat transfer from an external heating source or cooled by convective heat transfer from an external cooling source, the corresponding heat is transferred to the coil inside the cover. At this time, the upper part of the coil is heated / cooled by the heat of the cover, but the lower part of the coil is heated / cooled through a circular plate heated / cooled by the heat of the cover. There was a difference in the heat temperature transmitted to the lower part, resulting in a temperature deviation.

特に、上部サポートの材質が耐火物で構成されることにより、円形板の熱伝達効率を減少させてコイル内の温度偏差を深化させ、このように深化したコイル内の温度偏差は、コイルの磁性偏差を増加させてコイルの磁性品質の低下を引き起こしている。   In particular, the material of the upper support is made of a refractory material, which reduces the heat transfer efficiency of the circular plate and deepens the temperature deviation in the coil. The deviation is increased and the magnetic quality of the coil is reduced.

そこで、コイルの上部だけでなく下部にも外部熱が効率的に伝達されてコイル内の温度偏差を減らすことができる技術が要求されている。   Thus, there is a demand for a technique that can efficiently transfer external heat not only to the upper part of the coil but also to the lower part to reduce the temperature deviation in the coil.

このような問題点を解決するための本発明の目的は、コイルの下部に流入する熱量を増加させて、熱処理時にコイル内の温度偏差を減少させることができる焼鈍工程用の熱処理装置を提供することである。   SUMMARY OF THE INVENTION An object of the present invention to solve such problems is to provide a heat treatment apparatus for an annealing process that can increase the amount of heat flowing into the lower part of the coil and reduce the temperature deviation in the coil during heat treatment. That is.

前記の目的を達成するための本発明による焼鈍工程用の熱処理装置は、焼鈍工程で外部熱源から熱伝達がなされる焼鈍工程用の熱処理装置であって、コイルが置かれるベースプレートと、前記コイルを囲むように下部が開放され、開放された下側開放部が前記ベースプレートの縁にシーリングされるカバーと、前記ベースプレートの下部に外部熱源による輻射熱伝達が伝達される熱伝達空間部が形成されるように前記ベースプレートの下部を支持するサポートユニットを含む。   In order to achieve the above object, a heat treatment apparatus for an annealing process according to the present invention is a heat treatment apparatus for an annealing process in which heat is transferred from an external heat source in the annealing process, and includes a base plate on which a coil is placed, and the coil. A lower portion is opened so as to surround the cover, and a lower open portion that is opened is sealed to an edge of the base plate, and a heat transfer space portion that transmits radiant heat transfer from an external heat source is formed below the base plate. Includes a support unit for supporting a lower portion of the base plate.

好ましくは、前記ベースプレートの縁にはシーリング部材が充填されるシーリング溝部が形成されて、前記下側開放部が前記シーリング部材に挿入される。   Preferably, a sealing groove portion filled with a sealing member is formed at an edge of the base plate, and the lower open portion is inserted into the sealing member.

好ましくは、前記ベースプレートは、熱伝達に優れた特徴を有するスチール材質で構成され、前記熱伝達空間部を介して伝達された熱源を前記コイルの下部に伝達する。   Preferably, the base plate is made of a steel material having a feature excellent in heat transfer, and transmits a heat source transmitted through the heat transfer space to the lower portion of the coil.

好ましくは、前記サポートユニットは、前記ベースプレートの中心下側面に配置される中心サポート片と、前記ベースプレートの下側面に放射状に配置される複数の展開サポート片を含む。   Preferably, the support unit includes a central support piece disposed on a lower central side surface of the base plate, and a plurality of deployment support pieces radially disposed on the lower lateral surface of the base plate.

好ましくは、前記複数の展開サポート片は、前記中心サポート片に向かって長く延長形成される第1サポート片と、前記第1サポート片より短く延長形成される第2サポート片で構成される。   Preferably, each of the plurality of deployment support pieces includes a first support piece that extends longer toward the center support piece and a second support piece that extends shorter than the first support piece.

本発明によれば、コイルが置かれるベースプレートを外部熱源に直接露出させることにより、コイルの加熱/冷却速度を著しく改善し、COF工程でコイルの磁性品質に大きな影響を及ぼすコイル内の温度偏差を著しく減らすことができるという利点がある。   According to the present invention, by directly exposing the base plate on which the coil is placed to an external heat source, the heating / cooling rate of the coil is significantly improved, and the temperature deviation in the coil that greatly affects the magnetic quality of the coil in the COF process is reduced. There is an advantage that it can be significantly reduced.

従来技術による焼鈍工程用の熱処理処置を示した側面図である。It is the side view which showed the heat processing for the annealing process by a prior art. 図1のA部を拡大して示した拡大斜視図である。It is the expansion perspective view which expanded and showed the A section of FIG. 本発明による焼鈍工程用の熱処理処置を示した側面図である。It is the side view which showed the heat processing for the annealing process by this invention. 図3のB部を拡大して示した拡大斜視図である。It is the expansion perspective view which expanded and showed the B section of FIG. 本発明による焼鈍工程用の熱処理装置のコイル内の温度分布差を示したグラフである。It is the graph which showed the temperature distribution difference in the coil of the heat processing apparatus for annealing processes by this invention.

まず各図面の構成要素に参照符号を付けるにおいて、同一の構成要素については、他の図面上に表示されたとしても可能な限り同一の符号を有するようにしていることに留意しなければならない。また、本発明を説明するにおいて、関連する公知の構成または機能についての具体的な説明が本発明の要旨をばかす恐れがあると判断される場合には、その詳細な説明は省略することにする。   First, in assigning reference numerals to the constituent elements of each drawing, it should be noted that the same constituent elements have the same reference numerals as much as possible even if they are displayed on other drawings. Further, in the description of the present invention, when it is determined that a specific description of a related well-known configuration or function may detract from the gist of the present invention, a detailed description thereof will be omitted. To do.

添付された図面に基づいて本発明の実施例を詳しく説明することにする。   Embodiments of the present invention will be described in detail with reference to the accompanying drawings.

図3ないし図4に示されたように、本発明による焼鈍工程用の熱処理装置は、カバー200を介した輻射熱伝達と、ベースプレートを介した熱伝導によって、焼鈍工程でコイル400に対する効率的な加熱/冷却を具現し、コイル400内の温度偏差を減らすようにする。本実施例では、輻射熱伝達により加熱される外部加熱源と、対流熱伝達される外部冷却源を通称して外部熱源と定義する。   As shown in FIGS. 3 to 4, the heat treatment apparatus for the annealing process according to the present invention efficiently heats the coil 400 in the annealing process by radiant heat transfer through the cover 200 and heat conduction through the base plate. / Cooling is implemented to reduce the temperature deviation in the coil 400. In this embodiment, an external heating source that is heated by radiant heat transfer and an external cooling source that is convective heat transferred are collectively referred to as an external heat source.

これを具現するための熱処理装置は、コイル400が置かれるベースプレート100と、コイル400を囲むようにベースプレート100の縁にシーリングされるカバー200と、ベースプレート100の下側に熱伝達空間部520が形成されるようにベースプレート100の下部を支持するサポートユニット300を含んで構成される。   The heat treatment apparatus for realizing this includes a base plate 100 on which the coil 400 is placed, a cover 200 that is sealed to the edge of the base plate 100 so as to surround the coil 400, and a heat transfer space 520 formed on the lower side of the base plate 100. As shown, the support unit 300 supporting the lower part of the base plate 100 is included.

ベースプレート100は、コイル400が置かれる円形のプレート形状で、該当下側に熱伝達空間部520が形成されて外部熱源に直接露出するように構成される。このために、ベースプレート100は、熱伝導率に優れた材質で構成されるが、本実施例では、外部熱源をコイル400側に効果的に伝達することができるスチール(steal)材料が使用された。   The base plate 100 has a circular plate shape on which the coil 400 is placed, and a heat transfer space 520 is formed on the lower side of the base plate 100 and is directly exposed to an external heat source. For this reason, the base plate 100 is made of a material having excellent thermal conductivity. However, in this embodiment, a steel material that can effectively transmit an external heat source to the coil 400 side is used. .

ベースプレート100は、熱伝達に優れた特徴を有するスチールstee1材質で構成され、このベースプレート100にはコイル400を囲むカバー200が結合される。この時、これらの間に効果的なシーリング効果を具現するために、ベースプレート100の縁にはシーリング部材510が充填されるシーリング溝部1l0が形成され、シーリング溝部110内のシーリング部材510には、カバー200の下側開放部210がシーリングされるように挿入される。   The base plate 100 is made of a steel steel 1 material having excellent heat transfer characteristics, and a cover 200 surrounding the coil 400 is coupled to the base plate 100. At this time, in order to realize an effective sealing effect therebetween, a sealing groove portion 110 is filled in the edge of the base plate 100 and the sealing member 510 in the sealing groove portion 110 is covered with a cover. The lower opening 210 of the 200 is inserted so as to be sealed.

カバー200は、コイル400を囲むように下部が開放される構造で、開放される下側開放部210がベースプレート100のシーリング溝部110にシーリングされるように結合される。このカバー200は、外部雰囲気ガスとカバー200内の内部雰囲気ガスを遮断するが、カバー200内部の加熱/冷却のための1次加熱/冷却源として作用し、カバー200による間接加熱/冷却によってコイル400の上部が2次加熱/冷却される。   The cover 200 has a structure in which a lower part is opened so as to surround the coil 400, and the lower opening 210 to be opened is coupled to the sealing groove 110 of the base plate 100. The cover 200 blocks the external atmospheric gas and the internal atmospheric gas in the cover 200, but acts as a primary heating / cooling source for heating / cooling inside the cover 200, and the coil is indirectly heated / cooled by the cover 200. The top of 400 is secondary heated / cooled.

特に、従来技術の場合、コイルが置かれる円形板が上部サポート及び下部サポートに支持され、これらの構成がカバーによって囲まれる構造であるため、カバーを介してコイルの上部に主に熱伝達がなされる反面、本発明の場合、カバー200がベースプレート100のみを囲み、ベースプレート100の下側に熱伝達空間部520が形成される構造であるため、カバー200を介してコイル400の上部は勿論、ベースプレート100を介してコイル400の下部で熱伝達がなされることができる。   In particular, in the case of the prior art, the circular plate on which the coil is placed is supported by the upper support and the lower support, and these structures are surrounded by the cover, so that heat is mainly transferred to the upper part of the coil through the cover. On the other hand, in the present invention, the cover 200 surrounds only the base plate 100 and the heat transfer space 520 is formed on the lower side of the base plate 100. Heat can be transferred to the lower part of the coil 400 through 100.

このように、ベースプレート100の上部と下部を外部雰囲気ガスの熱源に露出させることにより、コイル400の上部及び下部に対する熱伝達効率が極大化することができ、コイル400の上部と下部間の加熱/冷却の時間差をなくし、コイル400内の温度偏差を最小化することができる。   As described above, by exposing the upper and lower portions of the base plate 100 to the heat source of the external atmospheric gas, the heat transfer efficiency with respect to the upper and lower portions of the coil 400 can be maximized. The time difference of cooling can be eliminated and the temperature deviation in the coil 400 can be minimized.

ベースプレート100の下部には、サポートユニット300が設けられる。サポートユニット300は、ベースプレート100の下部に熱伝達空間部520が形成されるようにベースプレート100の下部を支持するが、好ましくは、クリープ(creep)の変形によるベースプレート100の撓みを防止するために耐火物材質で構成される。   A support unit 300 is provided below the base plate 100. The support unit 300 supports the lower part of the base plate 100 so that the heat transfer space 520 is formed in the lower part of the base plate 100. Preferably, the support unit 300 is refractory to prevent the base plate 100 from being bent due to creep deformation. Consists of material.

このようなサポートユニット300は、熱伝達空間部520を間に置いて離隔配置される中心サポート片310と、展開サポート片320で構成される。中心サポート片310は、ベースプレート100の中心下側面を支持する円形のサポート片で構成され、展開サポート片320は、ベースプレート100の下側面で中心サポート片310を中心に放射状に配置される第1サポート片321と第2サポート片322が交互に配置されて構成される。ここで、第2サポート片322は、第1サポート片321より短く延長形成されるため、サポート片の効率的な配置設計を具現し、ベースプレート100の下側に十分な熱伝達空間を確保することができる。   The support unit 300 includes a center support piece 310 and a deployment support piece 320 that are spaced apart from each other with the heat transfer space 520 interposed therebetween. The center support piece 310 is formed of a circular support piece that supports the lower central side surface of the base plate 100, and the deployment support piece 320 is a first support that is radially arranged around the central support piece 310 on the lower side surface of the base plate 100. The pieces 321 and the second support pieces 322 are alternately arranged. Here, since the second support piece 322 is formed to be shorter than the first support piece 321, an efficient layout design of the support piece is realized, and a sufficient heat transfer space is secured under the base plate 100. Can do.

図5に示されたように、本発明の熱処理装置は、従来技術に比べて熱処理時にヒートサイクルに付いていく速度がさらに早く、コイル400内の最高温度部と最低温度部間の温度差が従来技術に比べて加熱帯で100℃減少するものと確認された。また、カバー200によるコイル400の上部加熱/冷却は、従来技術と同じ効率を示しているが、ベースプレート100によるコイル400の下部加熱/冷却は、従来技術に比べて著しく改善したことが示された。   As shown in FIG. 5, the heat treatment apparatus of the present invention has a higher rate of heat cycle during heat treatment than the prior art, and the temperature difference between the highest temperature part and the lowest temperature part in the coil 400 is higher. It was confirmed that the temperature decreased by 100 ° C. in the heating zone compared to the prior art. In addition, although the upper heating / cooling of the coil 400 by the cover 200 shows the same efficiency as the prior art, it has been shown that the lower heating / cooling of the coil 400 by the base plate 100 is significantly improved compared to the prior art. .

上述したように、本発明は、コイル400が置かれるベースプレート100を外部熱源に直接露出させることにより、コイル400の上・下部に対する加熱/冷却速度を著しく改善して、コイル400内の温度偏差を減少させ、COF工程でコイル400の磁性品質を向上させることができる。   As described above, the present invention significantly improves the heating / cooling rate for the upper and lower portions of the coil 400 by directly exposing the base plate 100 on which the coil 400 is placed to an external heat source, thereby reducing the temperature deviation in the coil 400. The magnetic quality of the coil 400 can be improved in the COF process.

前記で、本発明を、望ましい実施例を使用して詳しく説明したが、本発明の範囲は、特徴実施例に限定されるのではなく、添付された特許請求の範囲によって解釈されるべきものである。また、この技術分野で通常の知識を習得した者であれば、本発明の範囲から外れずとも多くの修正と変形が可能であることを理解すべきものである。   Although the present invention has been described in detail using preferred embodiments, the scope of the present invention should not be limited to the feature embodiments, but should be construed in accordance with the appended claims. is there. Moreover, it should be understood by those skilled in the art that many modifications and variations can be made without departing from the scope of the present invention.

100 ベースプレート
200 カバー
300 サポートユニット
400 コイル
510 シーリング部材
520 熱伝達空間部
100 Base Plate 200 Cover 300 Support Unit 400 Coil 510 Sealing Member 520 Heat Transfer Space

Claims (5)

焼鈍工程で外部熱源から熱伝達がなされる焼鈍工程用の熱処理装置であって、
コイルが置かれるベースプレートと、
前記コイルを囲むように下部が開放され、下側開放部が前記ベースプレートの縁にシーリングされるカバーと、
前記ベースプレートの下部に外部熱源による輻射熱伝達が伝達される熱伝達空間部が形成されるように前記ベースプレートの下部を支持するサポートユニットと、を有し、
前記サポートユニットは、前記ベースプレートの中心下側面に配置される中心サポート片と、前記ベースプレートの下側面に放射状に配置される複数の展開サポート片と、を備え、
前記複数の展開サポート片は、前記中心サポート片に向かって長く延長形成される第1サポート片と、前記第1サポート片より短く延長形成される第2サポート片と、を備え、
前記第2サポート片は、前記第1サポート片と前記第2サポート片が交替で反復して配置されるように前記第1サポート片の間に位置することを特徴とする焼鈍工程用の熱処理装置。
A heat treatment apparatus for an annealing process in which heat is transferred from an external heat source in the annealing process,
A base plate on which the coil is placed;
A cover whose lower part is opened so as to surround the coil, and whose lower open part is sealed to an edge of the base plate;
Have a, a support unit for supporting the lower portion of the base plate so that the heat transfer space to a lower radiant heat transfer by external heat source is transferred is formed of the base plate,
The support unit includes a center support piece disposed on the lower center side surface of the base plate, and a plurality of deployment support pieces radially disposed on the lower side surface of the base plate,
The plurality of deployment support pieces include: a first support piece that extends longer toward the center support piece; and a second support piece that extends shorter than the first support piece.
It said second support piece, heat treatment for annealing the second support piece and the first support piece characterized that you located between the first support piece to be placed repeatedly in rotation apparatus.
前記ベースプレートの縁には、シーリング部材が充填されるシーリング溝部が形成されて、前記下側開放部が前記シーリング部材に挿入されることを特徴とする請求項1記載の焼鈍工程用の熱処理装置。   The heat treatment apparatus for an annealing process according to claim 1, wherein a sealing groove portion filled with a sealing member is formed at an edge of the base plate, and the lower open portion is inserted into the sealing member. 前記ベースプレートは、熱伝達に優れた特徴を有するスチール材質で構成され、前記熱伝達空間部を介して伝達された熱源を前記コイルの下部に伝達することを特徴とする請求項1記載の焼鈍工程用の熱処理装置。   2. The annealing process according to claim 1, wherein the base plate is made of a steel material having a feature excellent in heat transfer, and transmits a heat source transmitted through the heat transfer space to a lower portion of the coil. Heat treatment equipment. 前記ベースプレートは、コイルが置かれることができるよう円形のプレート形状からなることを特徴とする請求項1記載の焼鈍工程用の熱処理装置。   The heat treatment apparatus for an annealing process according to claim 1, wherein the base plate has a circular plate shape so that a coil can be placed thereon. 前記サポートユニットは、クリープの変形によるベースプレートの撓みを防止するために耐火物材質からなることを特徴とする請求項1記載の焼鈍工程用の熱処理装置。   2. The heat treatment apparatus for an annealing process according to claim 1, wherein the support unit is made of a refractory material in order to prevent the base plate from bending due to creep deformation. 3.
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