KR20140052272A - Heat treatment device for annealing process - Google Patents

Heat treatment device for annealing process Download PDF

Info

Publication number
KR20140052272A
KR20140052272A KR1020120118197A KR20120118197A KR20140052272A KR 20140052272 A KR20140052272 A KR 20140052272A KR 1020120118197 A KR1020120118197 A KR 1020120118197A KR 20120118197 A KR20120118197 A KR 20120118197A KR 20140052272 A KR20140052272 A KR 20140052272A
Authority
KR
South Korea
Prior art keywords
coil
base plate
heat treatment
annealing process
lower portion
Prior art date
Application number
KR1020120118197A
Other languages
Korean (ko)
Inventor
이상원
김준형
박정훈
Original Assignee
주식회사 포스코
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 포스코 filed Critical 주식회사 포스코
Priority to KR1020120118197A priority Critical patent/KR20140052272A/en
Publication of KR20140052272A publication Critical patent/KR20140052272A/en

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
    • C21D9/54—Furnaces for treating strips or wire
    • C21D9/663—Bell-type furnaces
    • C21D9/677—Arrangements of heating devices

Abstract

The present invention is to provide a heat treatment device for an annealing process, capable of reducing temperature deviation on the lower part of a coil and the upper part of the coil by installing an electric heating wire on a base plate, and reducing deformation on the lower part of the coil by forming the base plate with a ceramic material. The heat treatment device for an annealing process of the present invention comprises a base plate, a lower brick radially arranged under the base plate, a coil, and a cover surrounding the base plate and the lower brick. The base plate comprises an electric heating wire to heat the lower part of the coil and is based on a ceramic material in order to prevent the coil from sagging.

Description

HEAT TREATMENT DEVICE FOR ANNEALING PROCESS [0002]

The present invention relates to a heat treatment apparatus for an annealing process, and more particularly, to a heat treatment apparatus for an annealing process capable of reducing temperature variation in a coil by uniformly transferring heat to an upper portion and a lower portion of the coil.

In order to make the electric steel sheet oriented during the electric steel sheet manufacturing process, the coil is subjected to a COF (Continuous Open Frame Furnace) process in which the coil is maintained at a high temperature of about 1200 ° C. for a certain period of time and then cooled.

FIG. 1 is a schematic view of a heat treatment apparatus used in a conventional COF process, wherein the heat treatment apparatus includes a base plate 10 on which a coil is placed, a lower knife 30 radially disposed on a lower portion of the base plate 10, And a cover 80 surrounding the coil C, the base plate 10, and the lower knob 30.

FIG. 2 is a schematic view of another heat treatment apparatus used in a conventional COF process, wherein the heat treatment apparatus includes a base plate 10, a lower supporter 20 in which a heat transfer space portion through which radiative heat transfer is transmitted, And a cover 80 surrounding the base plate 10.

The heat treatment apparatus used in the conventional COF process heats the coil C in the radiating heat transfer path cover 80 through the cover 80 heated by the burner (not shown).

Due to the heating method, the characteristics of radiation heat transfer, and the structural characteristics of the heat treatment apparatus, the upper and outer portions of the coil C are heated with high efficiency, and the lower portion and the inner portion of the coil C are heated with relatively low efficiency A temperature variation in the coil C occurs.

Since the lower portion of the coil C is obstructed by the lower structure supporting the coil C and the radiant heat transferred to the lower structure is transmitted to the lower portion of the coil C by the heat conduction, The heating time of the lower portion of the coil C takes longer than the time, and the temperature difference between the upper portion and the lower portion of the coil C is generated.

This temperature variation in the coil C increases the magnetic deviation of the coil C, causing a drop in the magnetic quality of the coil C. [

Generally, during high-temperature annealing, since the coil C is placed in a high temperature and annealed, a load is concentrated on the lower end of the coil C, and an edge-flare phenomenon occurs in which the lower portion of the coil C is deformed . A significant portion of the edge-flare phenomenon must be trimmed to reduce the final product slip rate of the coil C. [

SUMMARY OF THE INVENTION It is an object of the present invention to provide a heat treatment apparatus for an annealing process capable of reducing a temperature deviation between an upper portion and a lower portion of a coil and reducing a coil deformation phenomenon.

The present invention provides a heat treatment apparatus for an annealing process, which includes a base plate on which a coil is placed, a lower softener disposed radially below the base plate, and a cover surrounding the coil, the base plate and the lower softener, A base plate is provided with a heating wire for heating a lower portion of the coil, and a heat treatment apparatus for annealing process is formed of a ceramic material to prevent the coil from sagging.

At this time, the heating wire may be disposed in a groove provided in the base plate.

The present invention also provides a heat treatment apparatus for an annealing process comprising a base plate on which a coil is placed, a lower supporter radially disposed on a lower portion of the base plate, and a cover surrounding the coil and the base plate, Discloses a heat treatment apparatus for an annealing process, which comprises a heating wire for heating a lower portion of the coil, and is formed of a ceramic material to prevent the coil from sagging.

At this time, the heating wire may be disposed in a groove provided in the base plate.

According to the present invention, the temperature difference between the upper portion and the lower portion of the coil can be reduced by directly heating the lower portion of the coil having low radiative heat transfer efficiency by providing the heating wire on the base plate.

Further, the base plate may be formed of a ceramic material to prevent deformation of the lower portion of the coil.

1 is a schematic view of the prior art.
2 is a schematic view of the prior art.
3A is a schematic view according to the first embodiment of the present invention.
3B is a schematic view according to a second embodiment of the present invention.
4 is a schematic view of a base plate on which heating wires of the first and second embodiments of the present invention are disposed.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of a heat treatment apparatus for annealing process according to the present invention will be described in detail with reference to the accompanying drawings.

For a term such as device or element orientation (for example, "front", "after", "above", "below", "above", "lower", "left", "right", " The expressions and predicates used herein are used merely to simplify the description of the present invention and do not indicate or imply that the associated device or element should have a particular orientation.

3A is a schematic view of a first embodiment of a heat treatment apparatus for an annealing process according to the present invention.

Referring to FIG. 3A, a heat treatment apparatus for an annealing process according to the first embodiment of the present invention includes a ceramic base plate having an electric heating line 400.

Specifically, the base plate 100 has a predetermined thickness and is disk-shaped, and the coil C is seated on the base plate 100.

A circular opening having a predetermined diameter is formed at the center of the base plate 100 to form an inner circumferential surface of the base plate 100 and a gas injection tube is positioned inside the opening of the base plate 100.

Below the base plate 100, a plurality of lower knees 300 are arranged radially.

The lower knee joint 300 is disposed at a predetermined distance below the base plate 100 to form a space corresponding to the circular opening of the base plate 100, and a gas injection pipe is located in the space.

The cover 800 is fixed to the sealing member 610 such as sand of the bottom 600 by covering the lower flame 300, the base plate 100 and the coil C so as to cover the outer burner combustion gas and the inner atmosphere gas Thereby preventing direct contact between the two.

The base plate 100 is provided with a heating wire.

The heating wire is preferably a material suitable for electric resistance heating such as nichrome wire.

The heating wire 400 is connected to the power supply unit 900 and heats the lower portion of the coil C by electric resistance heating.

The temperature difference between the upper portion of the coil C and the lower portion of the coil C is reduced by improving the heat input amount under the coil C by electric resistance heating under the coil C. [

Referring to FIG. 4, the heating wires 400 may be annularly disposed at regular intervals in the base plate 100.

At this time, it is preferable that the heating wires 400 are closely arranged in order to increase the amount of heat input to the lower portion of the coil C.

The heating wire 400 may be disposed inside a guide groove (not shown) provided in the base plate 100.

The base plate 100 may be formed of a ceramic material.

The ceramic base plate 100 prevents sagging of the base plate 100 due to creep deformation and reduces edge-flare, which is a deformation phenomenon under the coil C .

In addition, the ceramic having a low thermal conductivity improves the heat insulating effect of the base plate 100, and the heat due to electrical resistance can be efficiently transmitted to the lower portion of the coil C.

3B is a schematic view of a second embodiment of a heat treatment apparatus for an annealing process according to the present invention.

The heat treatment apparatus for the annealing process according to the second embodiment of the present invention has the same configuration as that of the first embodiment except for the configuration of the lower supporter 200 and the arrangement of the cover 800, I'll give you an explanation.

A plurality of lower supporters (200) are arranged radially below the base plate (100).

The lower supporter 200 supports the base plate 100.

The lower supporter 200 is disposed below the base plate 100 so as to define a space corresponding to the circular opening of the base plate 100, and a gas injection pipe is disposed in the space.

The cover 800 covers the base plate 100 and the coil C and is fixed to the sealing member 110 such as sand of the base plate 100 to prevent direct contact between the burner combustion gas and the inner atmosphere gas do.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, Various modifications can be made.

C: coil 100: base plate 110, 610: sealing member
200: Lower supporter 300: Lower knee and 400:
600: bottom 700: gas supply part
800: Cover 900: Power supply

Claims (3)

A heat treatment apparatus for an annealing process, comprising: a base plate on which a coil is placed; a lower softener disposed radially below the base plate; and a cover surrounding the coil, the base plate and the lower softener,
Wherein the base plate is provided with a heating wire for heating a lower portion of the coil and is formed of a ceramic material to prevent deflection of the coil. A heat treatment apparatus for an annealing process comprising a base plate on which a coil is placed, a lower supporter radially disposed on a lower portion of the base plate, and a cover surrounding the coil and the base plate,
Wherein the base plate is provided with a heating wire for heating a lower portion of the coil and is formed of a ceramic material to prevent deflection of the coil. 3. The method according to claim 1 or 2,
Wherein the heating wire is disposed in a guide groove provided in the base plate.
KR1020120118197A 2012-10-24 2012-10-24 Heat treatment device for annealing process KR20140052272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020120118197A KR20140052272A (en) 2012-10-24 2012-10-24 Heat treatment device for annealing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120118197A KR20140052272A (en) 2012-10-24 2012-10-24 Heat treatment device for annealing process

Publications (1)

Publication Number Publication Date
KR20140052272A true KR20140052272A (en) 2014-05-07

Family

ID=50885533

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120118197A KR20140052272A (en) 2012-10-24 2012-10-24 Heat treatment device for annealing process

Country Status (1)

Country Link
KR (1) KR20140052272A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180075365A (en) * 2016-12-26 2018-07-04 주식회사 포스코 Annealing furnace and apparatus for heating coil an annealing furnace and this power supply system
WO2018124530A1 (en) * 2016-12-26 2018-07-05 주식회사 포스코 Annealing furnace, apparatus for heating coils of annealing furnace, and power supply system of heating apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180075365A (en) * 2016-12-26 2018-07-04 주식회사 포스코 Annealing furnace and apparatus for heating coil an annealing furnace and this power supply system
WO2018124530A1 (en) * 2016-12-26 2018-07-05 주식회사 포스코 Annealing furnace, apparatus for heating coils of annealing furnace, and power supply system of heating apparatus
CN110114480A (en) * 2016-12-26 2019-08-09 Posco公司 The power supply system of annealing furnace, annealing furnace steel coil heating device and the heating device
JP2020514559A (en) * 2016-12-26 2020-05-21 ポスコＰｏｓｃｏ Annealing furnace, annealing furnace coil heating device, and power supply system for the heating device

Similar Documents

Publication Publication Date Title
CN106392235B (en) A kind of polynary heating means of diffusion in vacuum soldering oven
KR20140052272A (en) Heat treatment device for annealing process
CN104112638B (en) A kind of plasma-reaction-chamber and its electrostatic chuck
KR101434552B1 (en) Heat treatment device for annealing process
JP3307924B2 (en) Heat treatment equipment
CN104775012A (en) Broad-width induction heating method and device used for uniform heating of strip steel
JP5687359B2 (en) Heat treatment equipment for annealing process
KR20150129918A (en) Heater for heat treatment of substrate and substrate heat tretment apparatus using it
US20130175251A1 (en) Compensating Heating Element Arrangement for a Vacuum Heat Treating Furnace
KR200441974Y1 (en) Heater is composed of wire heating element and using heating-pipe for anealing furnac
KR101434556B1 (en) Heat treatment device for annealing process
CN208440677U (en) A kind of Large Diameter Pipeline thin-wall tube post weld heat treatment device
KR20160007282A (en) Heater for heat treatment of substrate and substrate heat tretment apparatus using it
CN202181317U (en) Heating device of annealing furnace
JP4907222B2 (en) Semiconductor wafer heating device
JP2005226104A (en) Apparatus and method for annealing metal strip coil
JP2014162936A (en) Heat treatment method and heating furnace
CN207313429U (en) Glass oven
CN206441705U (en) A kind of susceptor heating mechanism for vacuum equipment
CN214977175U (en) Titanium alloy deep-drawing piece thermal forming die
JP2644819B2 (en) heating furnace
CN206977738U (en) Large-sized end enclosure inner wall overlaying electromagnetic induction heater
KR20140073598A (en) Radiant heater for manufacturing process of steel plate
KR101329808B1 (en) Tube heater for manufacturing process of galvanized sheet iron
KR101365519B1 (en) Heat-treatment apparatus of grain-oriented electrical sheets

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application