JP5650386B2 - 積層構造物及びその製造方法 - Google Patents
積層構造物及びその製造方法 Download PDFInfo
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- JP5650386B2 JP5650386B2 JP2009186662A JP2009186662A JP5650386B2 JP 5650386 B2 JP5650386 B2 JP 5650386B2 JP 2009186662 A JP2009186662 A JP 2009186662A JP 2009186662 A JP2009186662 A JP 2009186662A JP 5650386 B2 JP5650386 B2 JP 5650386B2
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- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
塗膜の形成は、必要に応じて有機溶剤などの希釈剤を添加して粘度を調整した後、スクリーン印刷法、カーテンコーティング法、ロールコーティング法、ディップコーティング法、及びスピンコーティング法などの適宜の塗布方法により所望の基板上に塗布し、例えば約60〜120℃の温度で仮乾燥することで組成物中に含まれる有機溶剤を除去し、塗膜を形成する。
パターン露光は、塗膜の上に所定の露光ネガパターンを形成したフォトマスク(図1:c)を用いて、選択的に光を照射して露光する。あるいは、パターン通りにレーザー光線等により直接描画して露光する。照射光源としては、低圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノンランプ、メタルハライドランプや、各種レーザー光線などが適当である。その他、電子線、α線、β線、γ線、X線、中性子線なども利用可能である。
なお、塗布、露光、現像の各工程を繰り返して所望の高さの接着剤パターンを形成することもできる。接着剤パターンとしては、所望の用途に応じて、点、線、面などの模様を構成する要素が任意の距離を隔てて配置されている模様、例えば縞状、斑点状、網目状などの種々の模様とすることができる。上記現像に用いる有機溶剤としては、硬化前の塗膜が可溶であればよく、本発明の組成物に含まれる有機溶剤が使用できる。現像方式はディップ現像、パドル現像、スプレー現像などの公知の方法を用いることができる。
これにより、非接着部材と接着剤パターンと接着部材からなる構造体(図1:f)が得られる。なお、圧着の圧力は、形成された接着剤パターンが崩れない程度の圧力であればよく、露光、現像後の接着剤パターンの硬度に応じて任意に設定できる。
これらの被接着部材や接着部材は、穴あけ加工等の機械加工が施されたものであってもよい。なお、これらの被接着部材及び接着部材は、熱硬化処理の温度に耐えられるものとする必要がある。
表1に従って1〜7の各成分を配合、攪拌して溶解した後、8の光酸発生剤を添加、攪拌してそれぞれ、組成物を作製した。表中の数字は、質量部を示す。
2.エポキシ化合物1:jER1001(ジャパンエポキシレジン製)ビスフェノールA型2官能エポキシ化合物(常温で固体)
3.エポキシ化合物2:jER1004(ジャパンエポキシレジン製)ビスフェノールA型2官能エポキシ化合物(常温で固体)
4.エポキシ化合物3:jER828(ジャパンエポキシレジン製)ビスフェノールA型2官能エポキシ化合物(常温で液体)
5.エポキシ化合物4:EHPE3150(ダイセル化学工業製)多官能脂環式エポキシ化合物(常温で固体)
6.有機溶剤:プロピレングリコールモノメチルエーテルアセテート
7.レベリング剤:BYK−361N(ビックケミー・ジャパン製)
8.光酸発生剤:SP−152(ADEKA製)
このようにして作製した接着剤パターンのパターニング性について評価を行った。その結果を表2に示す。
このようにして得られた積層構造物について、接着部材と被接着部材を手で引っ張り、接着面でのはがれを観察して接着性を評価した。その結果を表2に併せて示す。
(パターニング性)
○・・・パターニングできたもの
×・・・パターニングできなかったもの
(接着性)
○・・・接着面ではがれたもの
×・・・接着面ではがれなかったもの
b・・・塗膜
c・・・フォトマスク
d・・・接着剤パターン
e・・・接着部材
f・・・構造体
Claims (3)
- 1分子中に複数のオキセタニル基を有する常温で固体の多官能オキセタン化合物と常温で固体のグリシジル型エポキシ化合物と光酸発生剤と有機溶剤とを含み、前記常温で固体の多官能オキセタン化合物と前記常温で固体のグリシジル型エポキシ化合物との質量比率が99:1〜70:30である接着剤を被接着部材表面に塗布する工程と、
被接着部材表面に塗布された前記接着剤を活性エネルギー線によりパターン露光する工程と、
パターン露光した接着剤の未露光部を現像にて除去することによって接着剤パターンを形成する工程と、
接合すべき接着部材を前記接着剤パターンに圧着させる工程と、
前記接着剤パターンを熱硬化させる工程とを含むことを特徴とする積層構造物の製造方法。 - 1分子中に複数のオキセタニル基を有する常温で固体の多官能オキセタン化合物と常温で固体のグリシジル型エポキシ化合物と光酸発生剤と有機溶剤とを含み、前記常温で固体の多官能オキセタン化合物と前記常温で固体のグリシジル型エポキシ化合物との質量比率が99:1〜70:30である接着剤を被接着部材表面に塗布する工程と、
被接着部材表面に塗布された前記接着剤を活性エネルギー線によりパターン露光して光カチオン重合させる工程と、
パターン露光した接着剤の未露光部を現像にて除去することによって接着剤パターンを形成する工程と、
接合すべき接着部材を前記接着剤パターンに圧着させる工程と、
前記接着剤パターンを加熱して、前記常温で固体のグリシジル型エポキシ化合物を熱硬化させる工程とを含むことを特徴とする積層構造物の製造方法。 - 請求項1又は2に記載の製造方法により、被接着部材と接着部材が接合されたことを特徴とする積層構造物。
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