JP5630774B1 - Transparent sheet and transparent touch panel - Google Patents

Abstract

A transparent planar body and a transparent touch panel capable of improving visibility are provided. A transparent planar body 1, 2 having transparent conductive film layers 12, 22 patterned on at least one surface side of transparent substrates 11, 21, between the transparent substrate and the transparent conductive film layer. The first thin film layers 13, 23, the second thin film layers 14, 24, and the hard coat layers 15, 25 are laminated from the transparent conductive film layer side, and the transparent conductive film layer, the first thin film layer, Each of the second thin film layer and the hard coat layer has a film thickness and a light refractive index defined for each, and the wavelength 380 is related to a difference in reflectance of light irradiated between the pattern formation region and the non-pattern formation region. The absolute value of the difference between the first reflectance average value that is the average value of each reflectance difference at ˜400 nm and the second reflectance average value that is the average value of each reflectance difference at wavelengths of 500 to 800 nm is 0.7. The following. [Selection] Figure 1

Description

  The present invention relates to a transparent sheet and a transparent touch panel.

  Various configurations of a touch panel for detecting an input position have been conventionally studied. As an example, a capacitive touch panel is known. For example, the touch panel disclosed in Patent Document 1 is configured by interposing a dielectric layer between a pair of transparent planar bodies each having a transparent conductive film layer having a predetermined pattern shape. When the operation surface is touched, the touch position can be detected by utilizing the change in capacitance caused by being grounded via the human body.

JP2003-173238A (FIGS. 1 and 5)

  The touch panel described above is used by being mounted on the surface of a liquid crystal display device, a CRT or the like, but the pattern shape of the transparent conductive film layer formed on the transparent sheet is conspicuous, leading to a decrease in visibility.

  Then, an object of this invention is to provide the transparent planar body and transparent touch panel which can improve visibility.

The object of the present invention is a transparent planar body having a transparent conductive film layer patterned on at least one surface side of a transparent substrate, wherein the transparent conductive film is interposed between the transparent substrate and the transparent conductive film layer. A first thin film layer, a second thin film layer, and a hard coat layer are laminated from the layer side, and the film thickness of the second thin film layer is formed to be larger than the film thickness of the first thin film layer. The transparent conductive film layer has a thickness of 15 nm to 38 nm and a photorefractive index of 1.9 to 2.3, and the first thin film layer has a thickness of 2 nm to 25 nm, photorefractive. The second thin film layer has a film thickness of 38 nm or more and 75 nm or less, an optical refractive index of 1.6 or more and 1.9 or less, and the hard coat layer is The film thickness is 1 μm or more and 7 μm or less, and the optical refractive index is 1.6 or more and 1.8. It is the following, The reflectance for every wavelength of the light irradiated to the pattern formation area in which the said transparent conductive film layer is formed from the one surface side of the said transparent substrate, and the said transparent conductive material from the one surface side of the said transparent substrate The first reflectance average value, which is the average value of each reflectance difference at wavelengths from 380 nm to 400 nm, and the wavelength of 500 nm with respect to the difference in reflectance for each wavelength of light irradiated to the non-pattern forming region where the film layer is not formed To 800 nm, the absolute value of the difference from the second reflectance average value, which is the average value of each reflectance difference, is 0.7 or less.

  Moreover, in this transparent sheet, the light refractive index of the hard coat layer is preferably lower than the light refractive index of the second thin film layer.

  The first thin film layer is preferably made of silicon oxide.

  The hard coat layer is preferably formed of a resin composition to which inorganic fine particles are added.

  Moreover, the said objective is achieved by a transparent touch panel provided with the said transparent planar body.

  ADVANTAGE OF THE INVENTION According to this invention, the transparent planar body and transparent touch panel which can improve visibility can be provided.

It is a schematic sectional drawing of the transparent touch panel which concerns on one Embodiment of this invention. It is a top view which shows a part of transparent touch panel shown in FIG. It is a top view which shows a part of other transparent touch panel shown in FIG. It is a top view which shows a part of modification of the transparent touch panel shown in FIG. It is a top view which shows another part of the modification of the transparent touch panel shown in FIG. It is a schematic structure sectional drawing of the transparent planar body which comprises the transparent touch panel shown in FIG. It is a figure which shows the example of a reflectance simulation result for every wavelength by the presence or absence of a transparent conductive film layer.

  Hereinafter, actual forms of the present invention will be described with reference to the accompanying drawings. Each drawing is partially enlarged or reduced to facilitate understanding of the configuration, not the actual size ratio.

  FIG. 1 is a schematic cross-sectional view of a transparent touch panel according to an embodiment of the present invention. The transparent touch panel 101 is a capacitive touch panel and includes a first transparent planar body 1 and a second transparent planar body 2. The first transparent planar body 1 includes a transparent substrate 11 and a transparent conductive film layer 12 patterned on one surface side of the transparent substrate 11. Further, a first thin film layer 13, a second thin film layer 14, and a hard coat layer 15 are laminated in this order from the transparent conductive film layer 12 side between the transparent substrate 11 and the transparent conductive film layer 12. The transparent conductive film layer 12 is formed on the first thin film layer 13, and the hard coat layer 15 is formed on the transparent substrate 11. The second transparent planar body 2 has the same configuration as the first transparent planar state 1, and includes a transparent substrate 21 and a transparent conductive film layer 22 patterned on one surface side of the transparent substrate 21. Yes. A first thin film layer 23, a second thin film layer 24, and a hard coat layer 25 are stacked between the transparent substrate 21 and the transparent conductive film layer 22 in order from the transparent conductive film layer 22 side. The transparent conductive film layer 22 is formed on the first thin film layer 23, and the hard coat layer 25 is formed on the transparent substrate 21.

  As shown in FIG. 1, the first transparent planar body 1 and the second transparent planar body 2 are the other surface of the transparent substrate 11 in the first transparent planar body 1 (a surface on which the hard coat layer 15 is not formed). And the transparent conductive film layer 22 in the second transparent planar body 2 are pasted through the adhesive layer 4 so as to face each other while being separated from each other. In addition, a protective layer 3 for protecting the transparent conductive film layer 12 is provided on the transparent conductive film layer 12 in the first transparent planar body 1 via an adhesive layer 5. As the protective layer 3, various sheets that have been subjected to a surface treatment for improving scratch resistance, abrasion resistance, fingerprint resistance, non-glare property, and the like can be suitably used.

  The transparent substrates 11 and 21 are dielectric substrates that constitute an insulating layer, and are preferably made of a highly transparent material. Specifically, for example, polyethylene terephthalate (PET), polyimide (PI), polyethylene naphthalate (PEN), polyethersulfone (PES), polyetheretherketone (PEEK), polycarbonate (PC), polypropylene (PP) Made of synthetic resin such as polystyrene (PS), polyamide (PA), polyacryl (PAC), acrylic, amorphous polyolefin resin, cyclic polyolefin resin, aliphatic cyclic polyolefin, norbornene thermoplastic transparent resin It is formed of a flexible film, a laminate of two or more of these, or a glass plate such as soda glass, alkali-free glass, borosilicate glass, or quartz glass. The thickness of the transparent substrates 11 and 21 is not particularly limited. For example, when the transparent substrates 11 and 21 are formed of a synthetic resin flexible film, the thickness is preferably about 10 μm to 500 μm, and 20 μm to 200 μm. More preferably, it is about. In addition, when the transparent substrates 11 and 21 are formed of glass plates, it is preferable to set the thickness to about 20 μm to 1000 μm. Moreover, it is preferable to set the optical refractive index of the transparent substrates 11 and 21 in the range of 1.4 or more and 1.7 or less.

  Moreover, when forming the transparent substrates 11 and 21 from the material which has flexibility, in order to provide rigidity to the said transparent substrates 11 and 21, you may stick a support body. Examples of the support include a glass plate and a resin material having a hardness equivalent to glass, and the thickness is preferably 100 μm or more, and more preferably 0.2 mm to 10 mm.

The hard coat layers 15 and 25 respectively formed on one surface of the transparent substrates 11 and 21 are, for example, resin compositions such as acrylic UV curable resin, epoxy resin, siloxane resin, and silicone thermosetting resin. It is formed by. The thickness of the hard coat layers 15 and 25 is configured to be in a range of 1 μm or more and 7 μm or less. Further, the optical refractive indexes of the hard coat layers 15 and 25 are configured to be in the range of 1.6 to 1.8. Moreover, it is preferable to set the light refractive index of the hard coat layers 15 and 25 to be lower than the light refractive index of the second thin film layers 14 and 24 described later. The difference in optical refractive index between the hard coat layers 15 and 25 and the second thin film layers 14 and 24 is preferably about 0.03 to 0.20. In order to form the hard coat layers 15 and 25 having a relatively high light refractive index (the hard coat layers 15 and 25 having a light refractive index of 1.65 or more), an acrylic UV is used so that inorganic fine particles are dispersed or combined. What is necessary is just to add to resin compositions, such as curable resin. Examples of the inorganic fine particles include SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ having a particle diameter of 1 nm to 200 nm. Here, the hard coat layers 15 and 25 may be formed by a coating method, or may be formed by sticking a film-like one on the transparent substrates 11 and 21.

The second thin film layers 14 and 24 laminated on the hard coat layers 15 and 25 have an optical refractive index in the range of 1.6 to 1.9, more preferably 1.65 to 1.85. It is configured. The second thin film layers 14 and 24 are made of, for example, aluminum oxide (Al ₂ O ₃ ), zirconium dioxide (ZrO ₂ ), silicon nitride (SiN), zinc sulfide (ZnS), zinc selenide (ZnSe), cerium oxide (iv) ) (CeO ₂ ) and the like, and silicon-tin oxide can be preferably used. When silicon tin oxide is used, the optical refractive index can be adjusted as appropriate by changing the component ratio of silicon and tin. The film thickness of the second thin film layers 14 and 24 is configured to be in the range of 38 nm to 75 nm, more preferably 40 nm to 65 nm. The second thin film layers 14 and 24 can be formed by various methods such as a sputtering method and a coating method.

The first thin film layers 13 and 23 laminated on the second thin film layers 14 and 24 have a light refractive index in the range of 1.3 to 1.55, more preferably 1.4 to 1.5. It is configured as follows. The first thin film layers 13 and 23 are made of, for example, silicon oxide (SiO _x ), magnesium fluoride (MgF ₂ ), yttrium fluoride (YF ₃ ), calcium fluoride (CaF ₃ ), barium fluoride (BaF ₂ ), It is a film formed of cerium fluoride (CeF ₃ ), cerium oxide (iii) (Ce ₂ O ₃ ), etc. The film thickness is in the range of 2 nm to 25 nm, more preferably 5 nm to 25 nm. It is configured. The first thin film layers 13 and 23 can be formed by a PVD method such as a sputtering method, a vacuum deposition method, or an ion plating method, a CVD method, or the like. Here, the optical refractive index of the first thin film layers 13 and 23 is lower than the optical refractive index of the second thin film layers 14 and 24 described above. By comprising in this way, it becomes possible to improve the visibility of the transparent planar bodies 1 and 2 further.

  The materials of the transparent conductive film layers 12 and 22 formed by laminating the first thin film layers 13 and 23 are indium tin oxide (ITO), indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum Transparent conductive materials such as added zinc oxide, potassium added zinc oxide, silicon added zinc oxide, zinc oxide-tin oxide system, indium oxide-tin oxide system, zinc oxide-indium oxide-magnesium oxide system, zinc oxide, tin oxide film Alternatively, metal materials such as tin, copper, aluminum, nickel, chromium, and metal oxide materials can be exemplified, and two or more of these materials may be formed in combination.

  Examples of the method for forming the transparent conductive layers 12 and 22 include PVD methods such as sputtering, vacuum deposition, and ion plating, CVD, coating, and printing. The thickness of the transparent conductive film layers 12 and 22 is preferably set in the range of 15 nm or more and 38 nm or less. The optical refractive index of the transparent conductive film layers 12 and 22 is set to be in the range of 1.9 to 2.3, more preferably 1.9 to 2.1.

  As shown in FIGS. 2 and 3, the transparent conductive film layers 12 and 22 are each formed as an aggregate of a plurality of strip-shaped conductive portions 12 a and 22 a extending in parallel, and the strips of the transparent conductive film layers 12 and 22 are formed. The conductive portions 12a and 22a are arranged so as to be orthogonal to each other. The transparent conductive film layers 12 and 22 are connected to an external drive circuit (not shown) through a routing circuit (not shown) made of conductive ink, a metal thin film, or the like. The pattern shape of the transparent conductive film layers 12 and 22 is not limited to that of the present embodiment, and may be any shape as long as a contact point such as a finger can be detected. For example, as shown in FIGS. 4 and 5, the transparent conductive film layers 12 and 22 are configured such that a plurality of rhombus-shaped conductive portions 12 b and 22 b are linearly connected, and the rhombus in each transparent conductive film layer 12 and 22 is formed. The connecting directions of the shape conductive portions 12b and 22b may be orthogonal to each other, and the upper and lower rhomboid conductive portions 12b and 22b may not be overlapped in plan view. As for the operation performance such as the resolution of the transparent touch panel 101, a configuration is adopted in which when the first transparent planar body 1 and the second transparent planar body 2 are overlapped, the area where no conductive portion exists is reduced. Is better. From this point of view, the pattern shape of the transparent conductive film layers 12 and 22 is preferably a configuration in which a plurality of rhombus-shaped conductive portions 12b and 22b are connected in a straight line rather than a rectangular configuration.

  The patterning of the transparent conductive film layers 12 and 22 is performed by forming a mask portion having a desired pattern shape on the surfaces of the transparent conductive film layers 12 and 22 formed on the first thin film layers 13 and 23, respectively. After etching away with an acid solution or the like, the mask portion can be dissolved with an alkali solution or the like.

  The pressure-sensitive adhesive layers 4 and 5 can be made of a general transparent adhesive or pressure-sensitive adhesive such as epoxy or acrylic, and may include a core made of a norbornene-based resin transparent film. Moreover, the adhesive layer 4 may be formed by superimposing a plurality of sheet-like adhesive materials, and may be formed by superposing a plurality of different sheet-like adhesive materials. The thickness of the pressure-sensitive adhesive layer 4 is not particularly specified, but is practically preferably 200 μm or less, and particularly preferably 10 μm to 100 μm. Moreover, it is preferable that the photorefractive index of an adhesion layer is the range of 1.4 or more and 1.7 or less. When the optical refractive index of the adhesive layer 4 is brought close to (higher) the optical refractive index of the transparent conductive film layer 22, the difference in refractive index at the interface is reduced and the effect of making the pattern shape inconspicuous increases. In order to increase the refractive index, it is necessary to add fine particles of a high refractive material, and there is a problem that the light transmittance of the entire transparent planar body is lowered.

  In the transparent touch panel 101 having the above configuration, the touch position detection method is the same as that of a conventional capacitive touch panel, and when an arbitrary position on the surface side of the first transparent planar body 1 is touched with a finger or the like. The transparent conductive film layers 12 and 22 are grounded through the capacitance of the human body at the contact positions, and the coordinates of the contact positions are calculated by detecting the current value flowing through the transparent conductive film layers 12 and 22.

Here, as shown in the schematic cross-sectional view of the transparent planar body 1 in FIG. 6, the reflected light of the light applied to the pattern formation region where the transparent conductive film layer 12 is formed from one side of the transparent substrate 11. Regarding the reflectance for each wavelength in L1 and the difference in reflectance for each wavelength in the reflected light L2 of light irradiated from one side of the transparent substrate 11 to the non-pattern forming region where the transparent conductive film layer 12 is not formed The absolute value of the difference between the first reflectance average value that is the average value of each reflectance difference at wavelengths from 380 nm to 400 nm and the second reflectance average value that is the average value of each reflectance difference at wavelengths from 500 nm to 800 nm is , 0.7 or less is preferable. That is, it is preferable to satisfy the following relational expression.
| First Reflectance Average Value−Second Reflectance Average Value | ≦ 0.7
Thus, when the absolute value of the difference between the first reflectance average value and the second reflectance average value is 0.7 or less, the pattern shape of the transparent conductive film layer 12 can be made inconspicuous. Visibility can be improved.

  The inventors create a sample for the transparent planar body 1, and in the reflected light L <b> 1 of light irradiated from the one surface side of the transparent substrate 11 to the pattern formation region where the transparent conductive film layer 12 is formed. Regarding the reflectance for each wavelength, and the difference in reflectance for each wavelength in the reflected light L2 of the light irradiated to the non-pattern forming region where the transparent conductive film layer 12 is not formed from one side of the transparent substrate 11, the wavelength An absolute value of a difference between a first reflectance average value that is an average value of each reflectance difference from 380 nm to 400 nm and a second reflectance average value that is an average value of each reflectance difference from a wavelength of 500 nm to 800 nm is calculated. At the same time, a sensory test was performed to determine whether the pattern shape of the transparent conductive film layer 12 was not noticeable.

  The created samples are 12 types (sample 1 to sample 12), and each sample has the structure shown in FIG. Sample 1 was configured such that the first thin film layer 13 was formed on the hard coat layer 15 without providing the second thin film layer 14. The transparent substrate 11 was formed of polyethylene terephthalate (PET) having a thickness of 100 μm, and the second thin film layer 14 was formed of silicon tin oxide. The first thin film layer 13 was formed of silicon oxide, and the transparent conductive film layer 12 was formed of indium tin oxide (ITO). The transparent conductive film layer 12, the first thin film layer 13, and the second thin film layer 14 were formed by sputtering. On the transparent conductive film layer 12, an adhesive layer 5 (acrylic adhesive, refractive index 1.5) having a thickness of 50 μm and a protective film 3 (here, a separate film (PET film, thickness 15 μm) of the adhesive layer 5) are provided. Arranged. As for the hard coat layer 15, the sample 8 is an acrylic UV curable resin (Opstar manufactured by JSR Corporation), and the sample other than the sample 8 is an acrylic UV curable resin (Ryoduras TVZ series manufactured by Toyo Ink Manufacturing Co., Ltd.). It was formed by coating.

  In addition, the thicknesses and photorefractive indexes of the transparent substrate 11, the hard coat layer 15, the second thin film layer 14, the first thin film layer 13, the transparent conductive film layer 12, and the adhesive layer 5 in each sample are shown in Tables 1a and 1b below. Shown in The optical measurement was performed from the transparent substrate 11 side.

  Moreover, the absolute value calculation of the difference of the 1st reflectance average value and the 2nd reflectance average value was performed by the simulation using Cybernet System Co., Ltd. thin film design software (OPTAS-FILM). Specifically, first, with respect to each sample, the reflectance for each wavelength (pattern formation) in the reflected light L1 of the light irradiated to the pattern formation region where the transparent conductive film layer 12 is formed from one side of the transparent substrate 11. Area reflectance), and the reflectance for each wavelength (non-pattern forming area) in the reflected light L2 of light irradiated from one side of the transparent substrate 11 to the non-pattern forming area where the transparent conductive film layer 12 is not formed. (Reflectance) is obtained (for example, data as shown in FIG. 7; the data shown in FIG. 7 is data relating to the sample 3). Thereafter, the difference between the pattern formation region reflectance and the non-pattern formation region reflectance for each wavelength is calculated. From the data regarding the difference between the calculated pattern formation region reflectance and the non-pattern formation region reflectance, a first reflectance average value that is an average value of each reflectance difference at wavelengths from 380 nm to 400 nm is obtained, and wavelengths from 500 nm to 800 nm are obtained. The second reflectance average value, which is the average value of the respective reflectance differences, was obtained, and the absolute value of the difference between them (| first reflectance average value−second reflectance average value |) was calculated. In addition, since the transparent substrate 11 is a member having an extremely large thickness compared to the transparent conductive film layer 12, the first thin film layer 13, the second thin film layer 14, and the hard coat layer 15, the thickness of the transparent substrate 11 is reduced. The simulation was performed as ∞ (infinity). Further, the protective film 3 (PET film, thickness 15 μm) has a small influence on optical design, and is not added to the calculation.

  Tables 2 to 6 show the absolute value (Δ average value) of the difference between the first reflectance average value and the second reflectance average value and the sensory test results for each sample. The test was evaluated by irradiating a three-wavelength fluorescent lamp (27 W) in a black background booth and setting the distance between this sample and the eyes to 20 cm. In addition, in the sensory test results of Tables 2 to 5, when the pattern shape of the transparent conductive film layer 12 is not visible at all, it is ◎, and it can be seen that there is a different part of the color, but when the pattern shape is not known, ○ did. In addition, a pattern that can be confirmed but the boundary is blurred and cannot be seen is indicated by Δ, and a pattern shape that can be confirmed (boundary) is indicated by ×.

  Here, Table 2 shows the first reflectivity when only the thickness of the second thin film layer 14 is variously changed to 0 nm (sample 1), 45 nm (sample 2), 60 nm (sample 3), and 80 nm (sample 4). The absolute value (Δ average value) of the difference between the average value and the second reflectance average value and the sensory test results are shown. Table 3 shows the first reflectance average value and the second reflectance average value when only the thickness of the transparent conductive film layer 12 (ITO film) is changed to 20 nm (sample 5) and 25 nm (sample 3). The absolute value of the difference (Δ average value) and the sensory test results are shown. Table 4 shows the first reflectance average when the thickness of only the first thin film layer 13 is variously changed to 10 nm (sample 3), 20 nm (sample 6), 45 nm (sample 7), and 80 nm (sample 4). The absolute value (Δ average value) of the difference between the value and the second reflectance average value and the sensory test results are shown. Table 5 shows the first reflectance average value and the second reflectance average value when only the optical refractive index of the hard coat layer 15 is changed to 1.52 (sample 8) and 1.65 (sample 3). The absolute value of the difference (Δ average value) and the sensory test results are shown. Finally, Table 6 shows that the optical refractive index of the hard coat layer 15 is increased to 1.75, and only the thickness of the transparent conductive film layer 12 (ITO film) is 25 nm (sample 9), 35 nm (sample 10), and 40 nm. (Sample 11), absolute value (Δ average value) of difference between first reflectance average value and second reflectance average value when variously changed to 45 nm (sample 12) and sensory test results are shown. .

  From Table 2 to Table 6, it can be seen that Sample 2, Sample 3, Sample 5, Sample 6, Sample 9, and Sample 10 have excellent visibility because the pattern shape of the transparent conductive film layer 12 is not noticeable. . Further, in Sample 4 in which the absolute value of the difference between the first reflectance average value and the second reflectance average value is about 0.726, the pattern shape of the transparent conductive film layer 12 was slightly confirmed. Regarding Sample 2, Sample 3, Sample 5, Sample 6, Sample 9, and Sample 10 in which the absolute value of the difference between the reflectance average value and the second reflectance average value is 0.7 or less, the transparent conductive film layer 12 The pattern shape could not be confirmed. That is, it is recognized that the inconspicuousness of the pattern shape of the transparent conductive film layer 12 has a correlation with the absolute value of the difference between the first reflectance average value and the second reflectance average value. When the absolute value of the difference between the reflectance average value and the second reflectance average value is 0.7 or less, the pattern shape of the transparent conductive film layer 12 can be made inconspicuous, and visibility is improved. You can see that

  In addition, as one of the measures for making the pattern shape of the transparent conductive film layer 12 inconspicuous, there is a concept that the thickness of the transparent conductive film layer 12 is reduced as much as possible (for example, formed to a thickness of less than 15 nm). is there. In the case of such a measure, there is a problem that the electric resistance value of the transparent conductive film layer 12 is greatly increased. However, the transparent planar shape according to Sample 2, Sample 3, Sample 5, Sample 6, Sample 9, and Sample 10 In the case of the body 1, the transparent conductive film layer 12 (ITO film) has a relatively large thickness of 20 nm or more, but the pattern shape of the transparent conductive film layer 12 is inconspicuous, and the transparent planar body 1 according to the present invention. According to this, it can be seen that it is possible to achieve improved visibility in a thickness range in which the electrical resistance value of the transparent conductive film layer 12 does not increase (the thickness of the transparent conductive film layer 12 is 15 nm or more).

  Further, from Table 2, when Sample 1, Sample 2, Sample 3 and Sample 4 in which only the thickness of the second thin film layer 14 is different are compared, for the sample 4 in which the thickness of the second thin film layer 14 is 80 nm, the sensory test is performed. The result is Δ, and the sensory test result is good (◯ or ◎) for Sample 2 where the thickness of the second thin film layer 14 is 45 nm and Sample 3 where the thickness is 60 nm. From this point of view, it is considered preferable to set the thickness of the second thin film layer 14 to be in the range of 75 nm or less from the viewpoint of improving the visibility. Further, the sensory test result is x for sample 1 in which the second thin film layer 14 is not formed, and the sensory test result is ○ for sample 2 in which the thickness of the second thin film layer 14 is 45 nm. Therefore, from the viewpoint of improving visibility, it is considered preferable to set the thickness of the second thin film layer 14 to be in a range of 38 nm or more.

  Also, from Table 3, comparing sample 5 and sample 3 in which only the thickness of the transparent conductive film layer 12 (ITO film) is different, the thinner one (sample 5) of the transparent conductive film layer 12 (ITO film). It can be seen that the absolute value (Δ average value) of the difference between the first reflectance average value and the second reflectance average value becomes small. From the viewpoint of improving the visibility, the transparent conductive film layer 12 (ITO film) It can be seen that a thinner thickness is preferable.

  Also, from Table 4, comparing Sample 3, Sample 6 and Sample 7 in which only the thickness of the first thin film layer 13 is different, the sensory test result is × for Sample 7 where the thickness of the first thin film layer 13 is 45 nm. As for the sample 3 in which the thickness of the first thin film layer 13 is 10 nm and the sample 6 in which the thickness is 20 nm, the sensory test result is good (或 い は or ○). From this point of view, it is considered preferable to set the thickness of the first thin film layer 13 to be in a range of 25 nm or less from the viewpoint of improving the visibility.

  Also, from Table 5, comparing sample 8 and sample 3 in which only the optical refractive index of the hard coat layer 15 is different, sample 8 with an optical refractive index of 1.52 has an x result of sensory test. In the sample 32 having a light refractive index of 1.65, the sensory test result is “◎”, so that it is understood that the light refractive index of the hard coat layer 15 is preferably 1.6 or more.

  Also, from Table 6, comparing Sample 9, Sample 10, Sample 11, and Sample 12 that differ only in the thickness of the transparent conductive film layer 12 (ITO film), the thickness of the transparent conductive film layer 12 (ITO film) is 25 nm. Regarding the sample 9 and the sample 10 which is 35 nm, the sensory test result is good (◎ or ◯), and the thickness of the transparent conductive film layer 12 (ITO film) is 40 nm or more. Since the sensory test result is x, from the viewpoint of improving visibility, it is considered preferable to set the thickness of the transparent conductive film layer 12 (ITO film) to be in a range of 38 nm or less. In addition, since the optical refractive index of the hard coat layer 15 is 1.75 in all of the sample 9, the sample 10, the sample 11, and the sample 12, the thickness of the transparent conductive film layer 12 (ITO film) is in the range of 38 nm or less. In the case of setting to 1, the pattern shape of the transparent conductive layer 12 can be made inconspicuous even if the optical refractive index of the hard coat layer 15 is set to 1.8 or less.

  As mentioned above, although one Embodiment of this invention was described, the specific aspect of this invention is not limited to the said embodiment. For example, in the said embodiment, the 1st transparent planar body 1 and the 2nd transparent planar body 2 are the other surfaces (hard-coat layer) of the transparent substrate 11 in the 1st transparent planar body 1 as shown in FIG. 15) and the transparent conductive film layer 22 in the second transparent planar body 2 are attached to each other with the adhesive layer 4 interposed therebetween so as to face each other. The configuration is not particularly limited. For example, the transparent conductive film layer 12 in the first transparent planar body 1 and the transparent conductive film layer 22 in the second transparent planar body 2 are spaced apart from each other so as to face each other. The second transparent dihedral body 2 may be attached via the adhesive layer 4. Moreover, you may provide the transparent conductive film layers 12 and 22 in the both sides of one transparent planar body, respectively. Moreover, you may form the transparent conductive film layers 12 and 22 as one layer in the one surface side of one transparent planar body. Thus, when forming the transparent conductive film layers 12 and 22 as one layer, for example, as disclosed in Japanese Patent Application Laid-Open No. 60-75927, an intersection between the strip-shaped conductive portion 12a and the strip-shaped conductive portion 22a. In FIG. 5, one band-shaped conductive portion 12a (22a) and the other band-shaped conductive portion 22a (12a) are stacked with an insulating film interposed therebetween.

DESCRIPTION OF SYMBOLS 101 Transparent touch panel 1 1st transparent planar body 2 2nd transparent planar body 11,21 Transparent substrate 12,22 Transparent electrically conductive layer 13,23 1st thin film layer 14,24 2nd thin film layer 15,25 Hard coat layer 3 Protective layer 4, 5 Adhesive layer

Claims (5)

A transparent planar body having a transparent conductive film layer patterned on at least one surface side of a transparent substrate,
Between the transparent substrate and the transparent conductive film layer, a first thin film layer, a second thin film layer and a hard coat layer are laminated from the transparent conductive film layer side,
The film thickness of the second thin film layer is formed to be larger than the film thickness of the first thin film layer,
The transparent conductive film layer has a film thickness of 15 nm or more and 38 nm or less, and a light refractive index of 1.9 or more and 2.3 or less,
The first thin film layer has a film thickness of 2 nm or more and 25 nm or less, a light refractive index of 1.3 or more and 1.55 or less,
The second thin film layer has a film thickness of 38 nm to 75 nm and an optical refractive index of 1.6 to 1.9,
The hard coat layer has a film thickness of 1 μm or more and 7 μm or less, and a light refractive index of 1.6 or more and 1.8 or less,
The reflectance for each wavelength of light irradiated to the pattern formation region where the transparent conductive film layer is formed from one side of the transparent substrate, and the transparent conductive layer formed from one side of the transparent substrate The first reflectance average value, which is the average value of each reflectance difference in the wavelength range from 380 nm to 400 nm, and each in the wavelength range from 500 nm to 800 nm, regarding the difference in reflectance for each wavelength of the light irradiated to the non-pattern forming region that has not been performed An absolute value of a difference from a second reflectance average value, which is an average value of the reflectance difference, is 0.7 or less.   The transparent planar body according to claim 1, wherein the light refractive index of the hard coat layer is lower than the light refractive index of the second thin film layer.   The transparent planar body according to claim 1, wherein the first thin film layer is made of silicon oxide.   The transparent sheet according to any one of claims 1 to 3, wherein the hard coat layer is formed of a resin composition to which inorganic fine particles are added. A transparent touch panel provided with the transparent planar body in any one of Claim 1 to 4.

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