TW201530399A - Touch device - Google Patents

Touch device Download PDF

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Publication number
TW201530399A
TW201530399A TW103102175A TW103102175A TW201530399A TW 201530399 A TW201530399 A TW 201530399A TW 103102175 A TW103102175 A TW 103102175A TW 103102175 A TW103102175 A TW 103102175A TW 201530399 A TW201530399 A TW 201530399A
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TW
Taiwan
Prior art keywords
touch
substrate
touch device
disposed
layer
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TW103102175A
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Chinese (zh)
Inventor
Chien-Chung Chen
Hen-Ta Kang
Wen-Chun Wang
Original Assignee
Wintek Corp
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Publication date
Application filed by Wintek Corp filed Critical Wintek Corp
Priority to TW103102175A priority Critical patent/TW201530399A/en
Priority to CN201420108258.9U priority patent/CN203759668U/en
Priority to CN201410087473.XA priority patent/CN104793778A/en
Publication of TW201530399A publication Critical patent/TW201530399A/en

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Abstract

A touch device includes a first substrate, a structure layer and a touch unit. The first substrate has a first surface and a second surface opposite to the first surface. The structure layer is disposed on the first surface of the first substrate. The structure layer has a rough surface opposite to the first substrate. The rough surface includes a plurality of nanostructures. The touch unit at least partially overlaps the nanostructures along a vertical projective direction perpendicular to the first substrate.

Description

觸控裝置 Touch device

本發明係關於一種觸控裝置,尤指一種利用於結構層上形成奈米微結構來降低觸控元件可視程度之觸控裝置。 The present invention relates to a touch device, and more particularly to a touch device for forming a nano microstructure on a structural layer to reduce the visibility of the touch component.

觸控面板的技術發展非常多樣化,目前較常見的技術包括電阻式、電容式以及光學式等。其中電容式觸控面板由於具有高準確率、多點觸控、高耐用性以及高觸控解析度等特點,已成為目前中高階消費性電子產品使用之主流觸控技術。電容式觸控面板的操作原理係使用感應電極來偵測觸控點位的電容變化,並利用不同方向軸上連結各個電極的連結線將訊號傳回而完成定位。其中,連接線一般係以電阻率較低的金屬材料所形成。然而,金屬材料所形成之連接線因為較容易反射光線,故使得連接線容易被識別出而造成觸控面板在視覺效果上的不良影響。此外,目前相關領域亦有開發出以金屬線路交織而成的金屬網格(metal mesh)來取代透明導電材料形成感應電極之設計來提升反應速度。然而金屬網格所使用之金屬材料亦較容易反射光線,故也會造成觸控面板在視覺效果上的不良影響。 The technology development of touch panels is very diverse, and the more common technologies include resistive, capacitive, and optical. Among them, capacitive touch panels have become the mainstream touch technology used in middle and high-end consumer electronic products due to their high accuracy, multi-touch, high durability and high touch resolution. The operation principle of the capacitive touch panel is to use the sensing electrode to detect the change of the capacitance of the touch point, and to use the connecting line connecting the electrodes on different axes to transmit the signal back to complete the positioning. Among them, the connecting wires are generally formed of a metal material having a low electrical resistivity. However, since the connecting line formed of the metal material is relatively easy to reflect light, the connecting line is easily recognized and causes a visual effect of the touch panel. In addition, in the related field, a metal mesh interwoven with metal wires has been developed to replace the transparent conductive material to form a sensing electrode to improve the reaction speed. However, the metal materials used in the metal grid are also more likely to reflect light, which may also cause adverse effects on the visual effect of the touch panel.

本發明之主要目的之一在於提供一種觸控裝置,利用於與觸控元件重疊之結構層上形成奈米微結構,藉由奈米微結構對觸控元件可能產生之反射光形成散射或形成抑制反射光射出的效果,進而達到改善觸控裝置之外觀品質的目的。 One of the main purposes of the present invention is to provide a touch device for forming a nano-structure on a structure layer overlapping the touch element, and scattering or suppressing the reflected light that may be generated by the touch element by the nano-structure. The effect of the reflected light is emitted, thereby achieving the purpose of improving the appearance quality of the touch device.

為達上述目的,本發明之一實施例提供一種觸控裝置,包括一第一基板、一結構層以及一觸控元件。第一基板具有一第一面以及一第二面,且第一面係與第二面相對。結構層係設置於第一基板之第一面上。結構層具有一粗化面,粗化面係背對第一基板,且粗化面包括複數個奈米微結構。觸控元件係與奈米微結構於一垂直第一基板之垂直投影方向上至少部分重疊。 To achieve the above objective, an embodiment of the present invention provides a touch device including a first substrate, a structural layer, and a touch element. The first substrate has a first surface and a second surface, and the first surface is opposite to the second surface. The structural layer is disposed on the first surface of the first substrate. The structural layer has a roughened surface, the roughened surface is opposite the first substrate, and the roughened surface includes a plurality of nano microstructures. The touch element is at least partially overlapped with the nano-structure in a vertical projection direction of a vertical first substrate.

本發明之另一實施例提供一種觸控裝置,其中兩相鄰之奈米微結構之頂點間的距離係介於90奈米至900奈米之間。 Another embodiment of the present invention provides a touch device in which the distance between the vertices of two adjacent nanostructures is between 90 nm and 900 nm.

本發明之另一實施例提供一種觸控裝置,其中兩相鄰之奈米微結構相連之處具有一連接點,兩相鄰之奈米微結構其中之一者的最高點與連接點之間具有一高度,且高度係介於90奈米至900奈米之間。 Another embodiment of the present invention provides a touch device in which two adjacent nano microstructures are connected to each other with a connection point between the highest point and the connection point of one of the two adjacent nano microstructures. It has a height and a height between 90 nm and 900 nm.

本發明之另一實施例提供一種觸控裝置,其中奈米微結構之最高點與最低點於垂直投影方向上之距離係介於90奈米至900奈米之間。 Another embodiment of the present invention provides a touch device in which a distance between a highest point and a lowest point of a nano microstructure in a vertical projection direction is between 90 nm and 900 nm.

本發明之另一實施例提供一種觸控裝置,其中奈米微結構係彼此相連設置。 Another embodiment of the present invention provides a touch device in which nano microstructures are disposed in connection with each other.

本發明之另一實施例提供一種觸控裝置,其中結構層包括有機材料、無機材料或有機-無機複合材料。 Another embodiment of the present invention provides a touch device in which a structural layer includes an organic material, an inorganic material, or an organic-inorganic composite material.

本發明之另一實施例提供一種觸控裝置,其中結構層之折射率係介於1.35至2之間。 Another embodiment of the present invention provides a touch device in which a structural layer has a refractive index of between 1.35 and 2.

本發明之另一實施例提供一種觸控裝置,其中觸控元件係設置於結構層之粗化面上。 Another embodiment of the present invention provides a touch device in which a touch element is disposed on a roughened surface of a structural layer.

本發明之另一實施例提供一種觸控裝置,更包括一裝飾層,設置於第一基板上,且第一基板為一透光覆蓋板。 Another embodiment of the present invention provides a touch device, further comprising a decorative layer disposed on the first substrate, and the first substrate is a light transmissive cover plate.

本發明之另一實施例提供一種觸控裝置,其中裝飾層之厚度係小於結構層之厚度。 Another embodiment of the present invention provides a touch device in which the thickness of the decorative layer is less than the thickness of the structural layer.

本發明之另一實施例提供一種觸控裝置,其中裝飾層之厚度係大於結構層之厚度。 Another embodiment of the present invention provides a touch device in which the thickness of the decorative layer is greater than the thickness of the structural layer.

本發明之另一實施例提供一種觸控裝置,其中裝飾層係設置於第一基板之第一面上。 Another embodiment of the present invention provides a touch device in which a decorative layer is disposed on a first surface of a first substrate.

本發明之另一實施例提供一種觸控裝置,其中裝飾層係至少部分設置於結構層與第一基板之間。 Another embodiment of the present invention provides a touch device in which a decorative layer is at least partially disposed between a structural layer and a first substrate.

本發明之另一實施例提供一種觸控裝置,更包括一第二基板,與第一基板相對設置,其中第二基板具有一第三面以及一第四面,第三面係與第四面相對,第三面係面對第一基板之第一面,且觸控元件係至少部分設置在第二基板之第三面上。 Another embodiment of the present invention provides a touch device, further comprising a second substrate disposed opposite to the first substrate, wherein the second substrate has a third surface and a fourth surface, and the third surface and the fourth surface In contrast, the third surface faces the first surface of the first substrate, and the touch component is at least partially disposed on the third surface of the second substrate.

本發明之另一實施例提供一種觸控裝置,其中觸控元件係設置於第一基板之第一面上,且觸控元件係設置於結構層與第一基板之間。 Another embodiment of the present invention provides a touch device in which a touch component is disposed on a first surface of a first substrate, and a touch component is disposed between the structural layer and the first substrate.

本發明之另一實施例提供一種觸控裝置,更包括一透光覆蓋板,與第一基板相對設置,其中結構層係設置於第一基板與透光覆蓋板之間。 Another embodiment of the present invention provides a touch device, further comprising a light transmissive cover plate disposed opposite to the first substrate, wherein the structural layer is disposed between the first substrate and the light transmissive cover plate.

本發明之另一實施例提供一種觸控裝置,更包括一裝飾層,設置於透光覆蓋板上。 Another embodiment of the present invention provides a touch device, further comprising a decorative layer disposed on the transparent cover plate.

本發明之另一實施例提供一種觸控裝置,更包括一遮光層,至少部分設置於觸控元件與結構層之間。 Another embodiment of the present invention provides a touch device, further comprising a light shielding layer disposed at least partially between the touch element and the structural layer.

本發明之另一實施例提供一種觸控裝置,其中觸控元件包括至少一金屬層或至少一金屬網格,其中金屬網格具有一線寬,且線寬係介於0.1微米至10微米之間。 Another embodiment of the present invention provides a touch device, wherein the touch element includes at least one metal layer or at least one metal mesh, wherein the metal mesh has a line width and the line width is between 0.1 micrometer and 10 micrometers. .

本發明之另一實施例提供一種觸控裝置,其中觸控元件包括複數個觸控電極彼此互相電性絕緣設置。 Another embodiment of the present invention provides a touch device in which a touch element includes a plurality of touch electrodes electrically insulated from each other.

本發明之另一實施例提供一種觸控裝置,其中觸控電極包括至少一觸控訊號驅動電極以及至少一觸控訊號接收電極。 Another embodiment of the present invention provides a touch device, wherein the touch electrode includes at least one touch signal driving electrode and at least one touch signal receiving electrode.

本發明之另一實施例提供一種觸控裝置,其中觸控元件包括至少一條第一軸向電極以及至少一條第二軸向電極。第一軸向電極係沿一第一方向延伸設置,第二軸向電極係沿一第二方向延伸設置。第二軸向電極係與第一軸向電極電性絕緣。 Another embodiment of the present invention provides a touch device in which a touch element includes at least one first axial electrode and at least one second axial electrode. The first axial electrode extends in a first direction, and the second axial electrode extends in a second direction. The second axial electrode is electrically insulated from the first axial electrode.

本發明之另一實施例提供一種觸控裝置,其中第一軸向電極包括複數個第一子電極以及至少一第一連接線設置於兩相鄰之第一子電極之間,第一連接線電性連接兩相鄰之第一子電極,第二軸向電極包括複數個第二子電極以及至少一第二連接線設置於兩相鄰之第二子電極之間,第二連接線電性連接兩相鄰之第二子電極。 Another embodiment of the present invention provides a touch device, wherein the first axial electrode includes a plurality of first sub-electrodes and at least one first connecting line is disposed between two adjacent first sub-electrodes, the first connecting line Electrically connecting two adjacent first sub-electrodes, the second axial electrode includes a plurality of second sub-electrodes, and at least one second connecting line is disposed between two adjacent second sub-electrodes, and the second connecting line is electrically Connecting two adjacent second sub-electrodes.

本發明之另一實施例提供一種觸控裝置,其中第一基板包括一玻璃基板、一塑膠基板、一玻璃膜片、一塑膠膜片、一透光覆蓋板或一顯示器的基板。 Another embodiment of the present invention provides a touch device, wherein the first substrate comprises a glass substrate, a plastic substrate, a glass film, a plastic film, a light-transmissive cover plate or a display substrate.

本發明之另一實施例提供一種觸控裝置,其中結構層之厚度係介於200奈米至10微米之間。 Another embodiment of the present invention provides a touch device in which the thickness of the structural layer is between 200 nm and 10 microns.

101-105、200-201、300、400-404‧‧‧觸控裝置 101-105, 200-201, 300, 400-404‧‧‧ touch devices

111‧‧‧第一基板 111‧‧‧First substrate

111A‧‧‧第一面 111A‧‧‧ first side

111B‧‧‧第二面 111B‧‧‧ second side

112‧‧‧第二基板 112‧‧‧second substrate

112A‧‧‧第三面 112A‧‧‧ third side

112B‧‧‧第四面 112B‧‧‧ fourth side

113‧‧‧透光覆蓋板 113‧‧‧Light cover plate

113A‧‧‧第五面 113A‧‧‧The fifth side

113B‧‧‧第六面 113B‧‧‧ sixth side

120‧‧‧裝飾層 120‧‧‧decorative layer

130‧‧‧結構層 130‧‧‧Structural layer

130S‧‧‧粗化面 130S‧‧‧ rough surface

140‧‧‧觸控元件 140‧‧‧Touch components

140C‧‧‧走線 140C‧‧‧Wiring

140M‧‧‧網格圖案 140M‧‧‧ grid pattern

140R‧‧‧觸控訊號接收電極 140R‧‧‧ touch signal receiving electrode

140S‧‧‧觸控電極 140S‧‧‧ touch electrode

140T‧‧‧觸控訊號驅動電極 140T‧‧‧ touch signal drive electrode

140X‧‧‧第一軸向電極 140X‧‧‧first axial electrode

140Y‧‧‧第二軸向電極 140Y‧‧‧second axial electrode

150‧‧‧絕緣構件 150‧‧‧Insulating components

159‧‧‧保護層 159‧‧‧Protective layer

160‧‧‧遮光層 160‧‧‧Lighting layer

161‧‧‧第一遮光層 161‧‧‧ first light shielding layer

162‧‧‧第二遮光層 162‧‧‧ second light shielding layer

170‧‧‧黏合層 170‧‧‧Adhesive layer

490‧‧‧顯示器 490‧‧‧ display

491‧‧‧顯示下基板 491‧‧‧ shows the lower substrate

492‧‧‧顯示介質 492‧‧‧ Display media

B‧‧‧底部 B‧‧‧ bottom

C‧‧‧連接點 C‧‧‧ connection point

D1、D2、D3‧‧‧距離 D1, D2, D3‧‧‧ distance

D4‧‧‧深度 D4‧‧ depth

H‧‧‧高度 H‧‧‧ Height

M‧‧‧奈米微結構 M‧‧ nm nanostructure

P1‧‧‧六邊形網格單元 P1‧‧‧ hexagonal grid unit

P2‧‧‧四邊形網格單元 P2‧‧‧ quadrilateral mesh unit

T‧‧‧頂點 T‧‧‧ vertex

X‧‧‧第一方向 X‧‧‧ first direction

X1‧‧‧第一子電極 X1‧‧‧ first subelectrode

X2‧‧‧第一連接線 X2‧‧‧ first cable

Y‧‧‧第二方向 Y‧‧‧second direction

Y1‧‧‧第二子電極 Y1‧‧‧Second subelectrode

Y2‧‧‧第二連接線 Y2‧‧‧second cable

Z‧‧‧垂直投影方向 Z‧‧‧Vertical projection direction

第1圖繪示了本發明第一實施例之觸控裝置的示意圖。 FIG. 1 is a schematic view of a touch device according to a first embodiment of the present invention.

第2圖繪示了本發明第一實施例之奈米微結構的示意圖。 Fig. 2 is a schematic view showing the nanostructure of the first embodiment of the present invention.

第3圖繪示了本發明第一實施例之不規則排列之奈米微結構的示意圖。 Fig. 3 is a schematic view showing the irregularly arranged nanostructures of the first embodiment of the present invention.

第4圖繪示了本發明第一實施例之互相分開排列之奈米微結構的示意圖。 Fig. 4 is a schematic view showing the nanostructures of the first embodiment of the present invention which are arranged separately from each other.

第5圖繪示了本發明第一實施例之自電容式觸控元件的示意圖。 FIG. 5 is a schematic diagram of a self-capacitive touch element according to a first embodiment of the present invention.

第6圖繪示了本發明第一實施例之觸控元件之六邊形網格圖案的示意圖。 FIG. 6 is a schematic view showing a hexagonal grid pattern of the touch element according to the first embodiment of the present invention.

第7圖繪示了本發明第一實施例之觸控元件之四邊形網格圖案的示意圖。 FIG. 7 is a schematic view showing a quadrilateral mesh pattern of the touch element according to the first embodiment of the present invention.

第8圖為沿第7圖中A-A’剖線所繪示之剖面示意圖。 Fig. 8 is a schematic cross-sectional view taken along line A-A' in Fig. 7.

第9圖繪示了本發明第一實施例之互電容式觸控元件的示意圖。 FIG. 9 is a schematic diagram showing a mutual capacitive touch element according to a first embodiment of the present invention.

第10圖繪示了本發明第一實施例之另一互電容式觸控元件的示意圖。 FIG. 10 is a schematic diagram of another mutual capacitive touch element according to the first embodiment of the present invention.

第11圖繪示了本發明第一實施例之另一互電容式觸控元件的示意圖。 FIG. 11 is a schematic view showing another mutual capacitive touch element according to the first embodiment of the present invention.

第12圖為沿第11圖中B-B’剖線所繪示之剖面示意圖。 Fig. 12 is a schematic cross-sectional view taken along line B-B' in Fig. 11.

第13圖繪示了本發明第二實施例之觸控裝置的示意圖。 FIG. 13 is a schematic view showing a touch device according to a second embodiment of the present invention.

第14圖繪示了本發明第三實施例之觸控裝置的示意圖。 FIG. 14 is a schematic view showing a touch device according to a third embodiment of the present invention.

第15圖繪示了本發明第四實施例之觸控裝置的示意圖。 FIG. 15 is a schematic view showing a touch device according to a fourth embodiment of the present invention.

第16圖繪示了本發明第五實施例之觸控裝置的示意圖。 FIG. 16 is a schematic diagram of a touch device according to a fifth embodiment of the present invention.

第17圖繪示了本發明第六實施例之觸控裝置的示意圖。 FIG. 17 is a schematic diagram of a touch device according to a sixth embodiment of the present invention.

第18圖繪示了本發明第七實施例之觸控裝置的示意圖。 FIG. 18 is a schematic diagram of a touch device according to a seventh embodiment of the present invention.

第19圖繪示了本發明第八實施例之觸控裝置的示意圖。 FIG. 19 is a schematic diagram of a touch device according to an eighth embodiment of the present invention.

第20圖繪示了本發明第九實施例之觸控裝置的示意圖。 FIG. 20 is a schematic diagram of a touch device according to a ninth embodiment of the present invention.

第21圖繪示了本發明第十實施例之觸控裝置的示意圖。 21 is a schematic view of a touch device according to a tenth embodiment of the present invention.

第22圖繪示了本發明第十一實施例之觸控裝置的示意圖。 Figure 22 is a schematic view showing a touch device according to an eleventh embodiment of the present invention.

第23圖繪示了本發明第十二實施例之觸控裝置的示意圖。 FIG. 23 is a schematic view showing a touch device according to a twelfth embodiment of the present invention.

第24圖繪示了本發明第十三實施例之觸控裝置的示意圖。 Figure 24 is a schematic view showing a touch device of a thirteenth embodiment of the present invention.

為使熟習本發明所屬技術領域之一般技藝者能更進一步了解本發明,下文特列舉本發明之數個較佳實施例,並配合所附圖式,詳細說明本發明的構成內容。 The present invention will be described in detail with reference to the preferred embodiments of the invention,

請參考第1圖至第4圖。第1圖繪示了本發明第一實施例之觸控裝置的示意圖。第2圖至第4圖繪示了本實施例之奈米微結構的示意圖。為了方便說明,本發明之各圖式僅為示意以更容易了解本發明,其詳細的比例可依照設計的需求進行調整。如第1圖所示,本實施例提供一種觸控裝置101,包括一第一基板111、一結構層130以及一觸控元件140。第一基板111具有一第一面111A以及一第二面111B,且第一面111A係與第二面111B相對。第一基板111可包括一玻璃基板、一塑膠基板、一玻璃膜片、一塑膠膜片、一透光覆蓋板或一顯示器的基板。其中,在上述透光覆蓋板至少在一側可設置有一裝飾層120,且透光覆蓋板可包括玻璃覆蓋板、塑膠覆蓋板或其他具有高機械強度材質所形成具有保護(例如防刮)、覆蓋或是美化其對應裝置之透光覆蓋板,透光覆蓋板的厚度可介於0.02毫米至2毫米之間。透光覆蓋板可為平面形狀或曲面形狀,或前述之組合,例如為2.5D玻璃,但並不以此為限,透光覆蓋板係具有85%以上的透光度。另外,也可以選擇在透光覆蓋板面向使用者進行操作之一側設置一防污鍍膜(Anti-Smudge Coating)。另 外,若第一基板111為上述顯示器的基板,則第一基板111可為一彩色濾光基板、一主動陣列基板或一有機發光顯示器的封裝蓋板,但並不以此為限。 Please refer to Figures 1 to 4. FIG. 1 is a schematic view of a touch device according to a first embodiment of the present invention. 2 to 4 are schematic views showing the nanostructure of the present embodiment. For the convenience of description, the drawings of the present invention are only for the purpose of understanding the present invention, and the detailed proportions thereof can be adjusted according to the design requirements. As shown in FIG. 1 , the touch device 101 includes a first substrate 111 , a structural layer 130 , and a touch element 140 . The first substrate 111 has a first surface 111A and a second surface 111B, and the first surface 111A is opposite to the second surface 111B. The first substrate 111 may include a glass substrate, a plastic substrate, a glass film, a plastic film, a light-transmissive cover plate or a display substrate. Wherein, the light-transmitting cover plate may be provided with a decorative layer 120 on at least one side thereof, and the light-transmitting cover plate may include a glass cover plate, a plastic cover plate or other materials with high mechanical strength to form protection (for example, scratch resistance), Covering or beautifying the light-transmitting cover plate of the corresponding device, the thickness of the transparent cover plate may be between 0.02 mm and 2 mm. The light-transmitting cover plate may have a planar shape or a curved shape, or a combination thereof, for example, 2.5D glass, but not limited thereto, and the light-transmitting cover plate has a transmittance of 85% or more. Alternatively, an anti-smudge coating may be provided on one side of the light-transmitting cover plate facing the user. another The first substrate 111 may be a color filter substrate, an active array substrate, or a package cover of an organic light emitting display, but is not limited thereto.

結構層130係設置於第一基板111之一側,例如設置於第一基板111之第一面111A上。結構層130具有一粗化面130S,粗化面130S係背對第一基板111,且粗化面130S包括複數個奈米微結構M。本實施例之結構層130可包括有機材料、無機材料或有機與無機複合材料。上述之有機材料可包括丙烯酸類樹脂(acrylic resin)、聚胺酯甲酸基(Polyurethane,PU)、環氧樹脂、酚醛樹脂或其他適合之有機材料,而上述之無機材料可包括氮化矽(silicon nitride)、氧化矽(silicon oxide)、氮氧化矽(silicon oxynitride)或其它適合之無機材料,而上述之有機與無機複合材料可包括有機與無機混合之溶凝膠(sol-gel)材料。此外,結構層130之材料亦較佳可具有紫外光固化或熱固化特性,但並不以此為限。結構層130上構成粗化面130S之奈米微結構M較佳可用電漿表面處理或奈米壓印等方式形成,但本發明並不以此為限。在本發明之其他實施例中亦可視結構層130的材質與製程考量以其他適合的方式形成奈米微結構M。 The structural layer 130 is disposed on one side of the first substrate 111, for example, on the first surface 111A of the first substrate 111. The structural layer 130 has a roughened surface 130S, the roughened surface 130S is opposite to the first substrate 111, and the roughened surface 130S includes a plurality of nano microstructures M. The structural layer 130 of the present embodiment may include an organic material, an inorganic material, or an organic and inorganic composite material. The above organic material may include an acrylic resin, a polyurethane (PU), an epoxy resin, a phenol resin or other suitable organic materials, and the above inorganic material may include silicon nitride. , silicon oxide, silicon oxynitride or other suitable inorganic materials, and the above organic and inorganic composite materials may include organic-inorganic mixed sol-gel materials. In addition, the material of the structural layer 130 preferably also has ultraviolet curing or heat curing characteristics, but is not limited thereto. The nanostructures M constituting the roughened surface 130S on the structural layer 130 are preferably formed by plasma surface treatment or nanoimprinting, but the invention is not limited thereto. In other embodiments of the present invention, the nanostructures M are formed in other suitable manners depending on the material and process considerations of the structural layer 130.

觸控元件140係與奈米微結構M於一垂直第一基板111之垂直投影方向Z上至少部分重疊;或者,若觸控元件140中有包括易產生光反射之金屬材料,則由金屬構成的觸控元件140部分係與奈米微結構M於垂直投影方向Z上重疊。因此,如第1圖所示,當光線依序穿過第一基板111、結構層130而到達易產生光反射之金屬構成的觸控元件140時,結構層130上的奈米微結構M可用以對此反射光產生散射效果。換句話說,本實施例之觸控元件140係設置於結構層130之粗化面130S上,故奈米微結構M亦可用以增加觸控元件140中金屬表面電漿的強度,增加光線的吸收因而降低金屬表面的反射。因此,本實施例之奈米微結構M可用以降低觸控元件140於第一 基板111之第二面111B上觀看時的可識別程度,進而達到改善觸控裝置101之外觀視效的目的。 The touch component 140 is at least partially overlapped with the nano microstructure M in a vertical projection direction Z of the vertical first substrate 111. Alternatively, if the touch component 140 includes a metal material that is easy to generate light reflection, the metal component is made of metal. The portion of the touch element 140 overlaps with the nano-microstructure M in the vertical projection direction Z. Therefore, as shown in FIG. 1 , when the light sequentially passes through the first substrate 111 and the structural layer 130 to reach the touch element 140 composed of a metal that is easy to generate light reflection, the nano microstructure M on the structural layer 130 can be used. A scattering effect is produced on this reflected light. In other words, the touch element 140 of the present embodiment is disposed on the roughened surface 130S of the structural layer 130. Therefore, the nano microstructure M can also be used to increase the intensity of the metal surface plasma in the touch element 140 and increase the light. Absorption thus reduces the reflection of the metal surface. Therefore, the nano microstructure M of the embodiment can be used to lower the touch element 140 in the first The identifiable degree of viewing on the second surface 111B of the substrate 111 further improves the visual effect of the touch device 101.

如第1圖與第2圖所示,結構層130較佳可全面覆蓋第一基板111,且結構層130之厚度較佳係介於200奈米至10微米之間,且結構層130之折射率較佳係介於1.35至2之間,用以形成所需之光學效果,但並不以此為限。本實施例之裝飾層120係設置於第一基板111之第一面111A上,裝飾層120可由單層或多層堆疊之裝飾材料例如油墨或有色光阻等材料所構成,且裝飾層120可更包括一遮光層設置於上述之裝飾材料上,但並不以此為限。本實施例之結構層130的厚度可以厚於裝飾層120的厚度並覆蓋裝飾層120,也就是說裝飾層120可設置於結構層130與第一基板111之間,但並不以此為限。例如,本發明之其他實施例中之結構層130的厚度也可以小於裝飾層120的厚度,如此,觸控元件140可於垂直投影方向Z上與裝飾層120部分重疊,而結構層130之設置可用以減緩因為設置裝飾層120所形成之高度差異,減少可能因此而發生之產品缺陷。此外,本實施例之觸控裝置101亦可選擇性地於裝飾層120與第一基板111之間以及於結構層130與第一基板111之間設置一底層(例如氮化矽層,圖未示),但並不以此為限。 As shown in FIG. 1 and FIG. 2, the structural layer 130 preferably covers the first substrate 111 in a comprehensive manner, and the thickness of the structural layer 130 is preferably between 200 nm and 10 μm, and the refraction of the structural layer 130. The ratio is preferably between 1.35 and 2 to form the desired optical effect, but is not limited thereto. The decorative layer 120 of the embodiment is disposed on the first surface 111A of the first substrate 111, and the decorative layer 120 may be composed of a single layer or a plurality of layers of decorative materials such as ink or colored photoresist, and the decorative layer 120 may be further A light shielding layer is disposed on the decorative material, but is not limited thereto. The thickness of the structural layer 130 of the present embodiment may be thicker than the thickness of the decorative layer 120 and cover the decorative layer 120, that is, the decorative layer 120 may be disposed between the structural layer 130 and the first substrate 111, but not limited thereto. . For example, the thickness of the structural layer 130 in other embodiments of the present invention may also be smaller than the thickness of the decorative layer 120. Thus, the touch element 140 may partially overlap the decorative layer 120 in the vertical projection direction Z, and the structural layer 130 is disposed. It can be used to alleviate the product defects that may occur as a result of the height difference formed by the provision of the decorative layer 120. In addition, the touch device 101 of the present embodiment can also selectively provide a bottom layer (for example, a tantalum nitride layer) between the decorative layer 120 and the first substrate 111 and between the structural layer 130 and the first substrate 111. Show), but not limited to this.

如第2圖所示,本實施例之奈米微結構M可藉由上述之奈米壓印的方式形成而呈現規則的形狀與排列,且奈米微結構M可彼此相連設置,但並不以此為限。值得說明的是,結構層130上由奈米微結構M所構成之粗化面130S之表面粗度(surface roughness,Ra)較佳係介於90奈米至900奈米之間,可用以增加光線的吸收及散射,但不侷限於此。當表面粗度增加到900-奈米至5微米時,光線之散射會更為增加,某一特定角度的金屬表面反射也會明顯降低,可用以形成所需之光散射效果,但亦不以此為限。更明確地說,奈米微結構M可為一凸起結構或一凹陷結構,兩相鄰之奈米微結構M之頂 點T之間的距離D1較佳係介於90奈米至900奈米之間,而各奈米微結構之高度H較佳係介於90奈米至900奈米之間,但並不以此為限。進一步說明,兩相鄰之奈米微結構M相連之處可具有一連接點C,兩相鄰之奈米微結構M其中之一者的最高點與連接點C之間具有此高度H,且高度H係介於90奈米至900奈米之間。 As shown in FIG. 2, the nano microstructures M of the present embodiment can be formed by the above-described nanoimprinting method to exhibit a regular shape and arrangement, and the nano microstructures M can be connected to each other, but not This is limited to this. It should be noted that the surface roughness (Ra) of the roughened surface 130S composed of the nano microstructure M on the structural layer 130 is preferably between 90 nm and 900 nm, which can be used to increase the light. Absorption and scattering, but not limited to this. When the surface roughness is increased to 900-nano to 5 microns, the scattering of light will increase more, and the reflection of the metal surface at a certain angle will be significantly reduced, which can be used to form the desired light scattering effect, but not This is limited. More specifically, the nano microstructure M can be a convex structure or a concave structure, and the top of two adjacent nano microstructures M The distance D1 between the points T is preferably between 90 nm and 900 nm, and the height H of each nano microstructure is preferably between 90 nm and 900 nm, but not This is limited. Further, the two adjacent nano microstructures M may have a connection point C, and the highest point of one of the two adjacent nano microstructures M and the connection point C have the height H, and The height H is between 90 nm and 900 nm.

此外,如第3圖所示,本實施例之奈米微結構M亦可藉由上述之電漿表面處理的方式形成而呈現較不規則的形狀與排列,而兩相鄰之奈米微結構M之頂點T之間的距離D1較佳係介於90奈米至900奈米之間,且奈米微結構M之最高點與最低點於垂直投影方向Z上之距離D2較佳係介於90奈米至900奈米之間,但並不以此為限,例如,也可以比較兩相鄰之奈米微結構M之最高點與最低點於垂直投影方向Z上之距離,此一距離較佳亦係介於90奈米至900奈米之間。此外,上述之奈米微結構M之最高點與最低點之間的距離D2的取樣方式可於一預定面積範圍內進行量測,例如可在一邊長為0.1毫米之正方形面積範圍下對奈米微結構M進行量測,但並不以此為限。 In addition, as shown in FIG. 3, the nano microstructures M of the present embodiment can also be formed by the above-mentioned plasma surface treatment to exhibit a relatively irregular shape and arrangement, and two adjacent nano microstructures. The distance D1 between the vertices T of M is preferably between 90 nm and 900 nm, and the distance D2 between the highest point and the lowest point of the nano microstructure M in the vertical projection direction Z is preferably between Between 90 nm and 900 nm, but not limited to this, for example, it is also possible to compare the distance between the highest point and the lowest point of two adjacent nanostructures M in the vertical projection direction Z, this distance Preferably, it is between 90 nm and 900 nm. In addition, the sampling method of the distance D2 between the highest point and the lowest point of the nano microstructure M described above can be measured within a predetermined area, for example, a square area having a side length of 0.1 mm can be used for the nanometer. The microstructure M is measured, but is not limited thereto.

此外,如第4圖所示,各奈米微結構M亦可分開排列,且當奈米微結構M為一凹陷結構時,兩相鄰之奈米微結構M之底部B之間的距離D3較佳係介於90奈米至900奈米之間,而奈米微結構M之深度D4較佳係介於90奈米至900奈米之間,但並不以此為限。換句話說,本發明之構成粗化面130S的奈米微結構M之形狀與排列方式並不以上述之第2圖至第4圖的狀況為限,而可視其他設計需要進行調整用以產生所需之光學效果。 In addition, as shown in FIG. 4, each nano microstructure M can also be arranged separately, and when the nano microstructure M is a concave structure, the distance D3 between the bottom B of two adjacent nano microstructures M Preferably, the system is between 90 nm and 900 nm, and the depth D4 of the nano microstructure M is preferably between 90 nm and 900 nm, but is not limited thereto. In other words, the shape and arrangement of the nano-structures M constituting the roughened surface 130S of the present invention are not limited to the conditions of the above-mentioned FIGS. 2 to 4, and may be adjusted to be generated by other design requirements. The required optical effect.

關於本實施例之觸控元件140的進一步說明,請參考第5圖至第12圖。第5圖繪示了本實施例之自電容式觸控元件的示意圖,第6圖與第7 圖繪示了本實施例之觸控元件之網格圖案的示意圖。第8圖為沿第7圖中A-A’剖線所繪示之剖面示意圖。第9圖至第11圖繪示了本實施例之不同型態之互電容式觸控元件的示意圖。第12圖為沿第11圖中B-B’剖線所繪示之剖面示意圖。 For further explanation of the touch element 140 of the present embodiment, please refer to FIGS. 5 to 12. FIG. 5 is a schematic diagram of the self-capacitive touch element of the embodiment, FIG. 6 and the seventh The figure shows a schematic diagram of a grid pattern of the touch element of the embodiment. Fig. 8 is a schematic cross-sectional view taken along line A-A' in Fig. 7. 9 to 11 are schematic views of different types of mutual capacitive touch elements of the present embodiment. Fig. 12 is a schematic cross-sectional view taken along line B-B' in Fig. 11.

如第5圖所示,本實施例之觸控元件140可包括複數個觸控電極140S以及複數條走線140C。各走線140C係與對應之觸控電極140S電性連接。各觸控電極140S係彼此互相電性絕緣設置,用以進行一自電容式(self-capacitance)觸控偵測,即計算觸碰物體(例如手指或觸控筆)與電極140S之間的電容變化來進行觸控偵測,但並不以此為限。各觸控電極140S的形狀可為矩形、菱形、三角形或其他適合之幾何形狀。 As shown in FIG. 5, the touch element 140 of the present embodiment may include a plurality of touch electrodes 140S and a plurality of traces 140C. Each of the traces 140C is electrically connected to the corresponding touch electrode 140S. Each of the touch electrodes 140S is electrically insulated from each other for performing a self-capacitance touch detection, that is, calculating a capacitance between a touch object (such as a finger or a stylus) and the electrode 140S. Change for touch detection, but not limited to this. The shape of each touch electrode 140S may be a rectangle, a diamond, a triangle or other suitable geometric shape.

在本實施例中,觸控電極140S或/及走線140C可由一金屬層或一金屬網格所形成。換句話說,觸控元件140可包括至少一金屬層或至少一金屬網格,但並不以此為限。此外,觸控電極140S或/及走線140C可包括一網格狀圖案或一塊狀圖案,也就是說觸控電極140S或/及走線140C可由網格狀圖案或塊狀圖案所構成,但並不以此為限。舉例來說,如第6圖與第7圖所示,觸控元件140可包括一網格圖案140M,而網格狀圖案140M可包括由規則排列之多邊形網格單元(如第6圖所示之六邊形網格單元P1、第7圖所示之四邊形網格單元P2)或圓形網格單元、不規則排列之不規則多邊形網格單元或圓形網格單元、或其他適合之規則或不規則形狀的網格單元所構成。上述之網格圖案140M之材料可包括金屬材料例如鋁(Al)、銅(Cu)、銀(Ag)、鉻(Cr)、鈦(Ti)、鉬(Mo)、釹(Nd)之其中至少一者、上述材料之複合層(例如Mo/Al/Mo疊層、Mo/AlNd/Mo疊層)、上述材料之合金(例如AlNd或Mo/AlNd/Mo疊層),但並不以此為限。金屬網格可具有一線寬介於0.1微米至20微米之間,且較佳之寬度可介於1微米至10微米之間,但並不以此為限。因此,本實施例之 觸控元件140可至少部分由金屬層或金屬網格所形成用以提升相關的電性表現,而結構層上的奈米微結構可用以改善觸控元件140中金屬材料所形成的光反射現象,故可在提升觸控裝置效能的同時改善其外觀品質。 In this embodiment, the touch electrodes 140S or/and the traces 140C may be formed by a metal layer or a metal grid. In other words, the touch element 140 can include at least one metal layer or at least one metal mesh, but is not limited thereto. In addition, the touch electrodes 140S or/and the traces 140C may include a grid pattern or a block pattern, that is, the touch electrodes 140S or/and the traces 140C may be formed by a grid pattern or a block pattern. But it is not limited to this. For example, as shown in FIGS. 6 and 7, the touch element 140 may include a grid pattern 140M, and the grid pattern 140M may include a polygonal grid unit arranged by rules (as shown in FIG. 6). Hexagonal grid cells P1, quadrilateral mesh cells P2) shown in Fig. 7 or circular grid cells, irregularly arranged irregular polygon mesh cells or circular mesh cells, or other suitable rules Or an irregularly shaped grid unit. The material of the mesh pattern 140M may include at least one of a metal material such as aluminum (Al), copper (Cu), silver (Ag), chromium (Cr), titanium (Ti), molybdenum (Mo), and niobium (Nd). a composite layer of the above materials (for example, a Mo/Al/Mo laminate, a Mo/AlNd/Mo laminate), an alloy of the above materials (for example, an AlNd or a Mo/AlNd/Mo laminate), but not limit. The metal mesh may have a line width of between 0.1 micrometers and 20 micrometers, and preferably a width of between 1 micrometer and 10 micrometers, but is not limited thereto. Therefore, the embodiment The touch element 140 can be formed at least partially by a metal layer or a metal grid to enhance the related electrical performance, and the nano microstructure on the structural layer can be used to improve the light reflection phenomenon of the metal material in the touch element 140. Therefore, the appearance quality of the touch device can be improved while improving the appearance of the touch device.

另外,如第8圖所示,觸控裝置101可更包括一遮光層160至少部分設置於觸控元件140與結構層130之間,用以更進一步降低觸控元件140自第一基板111之第二面111B上觀看時的圖案明顯度,特別是當觸控元件140係由金屬材料所形成之網格圖案140M所構成時。此外,觸控裝置101可更包括一保護層159設置於觸控元件140上,用以對觸控元件140形成保護效果,保護層159可包括無機材料例如氮化矽、氧化矽與氮氧化矽、有機材料例如丙烯酸類樹脂或其它適合之保護材料。 In addition, as shown in FIG. 8 , the touch device 101 further includes a light shielding layer 160 at least partially disposed between the touch component 140 and the structural layer 130 to further reduce the touch component 140 from the first substrate 111 . The pattern visibility when viewed on the second side 111B, particularly when the touch element 140 is formed of a grid pattern 140M formed of a metal material. In addition, the touch device 101 may further include a protective layer 159 disposed on the touch component 140 for forming a protective effect on the touch component 140. The protective layer 159 may include an inorganic material such as tantalum nitride, hafnium oxide, and hafnium oxynitride. An organic material such as an acrylic resin or other suitable protective material.

如第9圖所示,觸控電極140S可包括至少一觸控訊號驅動電極140T以及至少一觸控訊號接收電極140R彼此互相分離設置,用以進行一互電容式(mutual capacitance)觸控偵測,即計算觸控訊號驅動電極140T以及觸控訊號接收電極140R之間的電容變化來進行觸控偵測,但並不以此為限。 As shown in FIG. 9 , the touch electrode 140S may include at least one touch signal driving electrode 140T and at least one touch signal receiving electrode 140R are disposed apart from each other for performing mutual capacitance touch detection. That is, the capacitance change between the touch signal driving electrode 140T and the touch signal receiving electrode 140R is calculated to perform touch detection, but is not limited thereto.

如第10圖所示,觸控元件140亦可包括複數條第一軸向電極140X以及複數條第二軸向電極140Y。第一軸向電極140X係沿一第一方向X延伸設置,第二軸向電極140Y係沿一第二方向Y延伸設置,第一軸向電極140X係與第二軸向電極140Y於垂直投影方向Z上至少部分互相重疊,且第二軸向電極140Y係與第一軸向電極140X彼此電性絕緣。第一方向X較佳係大體上與第二方向Y互相垂直,但並不以此為限。第一軸向電極140X與第二軸向電極140Y可分別為一觸控訊號驅動電極或一觸控訊號接收電極,用以互相搭配進行互電容式觸控偵測,但並不以此為限。一絕緣構件150可設置於第一軸向電極140X與第二軸向電極140Y之間,用以電性隔離第一軸向電極 140X與第二軸向電極140Y,但本發明並不以此為限。絕緣構件150可以是玻璃基板、塑膠基板或絕緣材料(如有機或無機絕緣材料),其中的玻璃基板與塑膠基板可以是一薄基板,其厚度可大體上小於或等於0.25毫米,但並不以此為限。 As shown in FIG. 10, the touch element 140 can also include a plurality of first axial electrodes 140X and a plurality of second axial electrodes 140Y. The first axial electrode 140X extends along a first direction X, and the second axial electrode 140Y extends along a second direction Y. The first axial electrode 140X and the second axial electrode 140Y are vertically projected. Z at least partially overlap each other, and the second axial electrode 140Y is electrically insulated from the first axial electrode 140X from each other. The first direction X is preferably substantially perpendicular to the second direction Y, but is not limited thereto. The first axial electrode 140X and the second axial electrode 140Y are respectively a touch signal driving electrode or a touch signal receiving electrode, which are used for mutual capacitive touch detection, but are not limited thereto. . An insulating member 150 may be disposed between the first axial electrode 140X and the second axial electrode 140Y for electrically isolating the first axial electrode 140X and the second axial electrode 140Y, but the invention is not limited thereto. The insulating member 150 may be a glass substrate, a plastic substrate or an insulating material (such as an organic or inorganic insulating material), wherein the glass substrate and the plastic substrate may be a thin substrate, and the thickness thereof may be substantially less than or equal to 0.25 mm, but not This is limited.

如第11圖所示,第一軸向電極140X亦可包括複數個第一子電極X1以及至少一第一連接線X2設置於兩相鄰之第一子電極X1之間,且第一連接線X2電性連接兩相鄰之第一子電極X1。第二軸向電極140Y可包括複數個第二子電極Y1以及至少一第二連接線Y2設置於兩相鄰之第二子電極Y1之間,且第二連接線Y2電性連接兩相鄰之第二子電極Y1。此外,絕緣構件150可部分設置於第一連接線X2與第二連接線Y2之間,用以電性隔離第一軸向電極140X與第二軸向電極140Y,但並不以此為限。絕緣構件150可包括無機材料例如氮化矽、氧化矽與氮氧化矽、有機材料例如丙烯酸類樹脂或其它適合之材料。上述之觸控電極140S、走線140C、第一軸向電極140X、第二軸向電極140Y、第一子電極X1、第一連接線X2、第二子電極Y1以及第二連接線Y2可分別由透明導電材料例如氧化銦錫、氧化銦鋅與氧化鋁鋅、金屬或其他適合之導電材料所形成。上述之金屬材料可例如為金、鋁、銅、銀、鉻、鈦、鉬、釹之其中至少一者、上述材料之合金、上述材料之複合層或上述材料與上述材料之合金之複合層,但並不以此為限,而可使用其他導電材料。再者,以上所述的複合層可以例如是由鉬、鋁-釹合金及鉬組成的三層堆疊結構,但亦不以此為限,只要能達到導電效果的堆疊結構亦在本發明的保護範圍內。在本實施例中,上述之觸控電極140S、走線140C、第一軸向電極140X、第二軸向電極140Y、第一子電極X1、第一連接線X2、第二子電極Y1以及第二連接線Y2可為金屬網格,其中金屬網格可具有一線寬介於0.1微米至20微米之間,而較佳之寬度介於1微米至10微米之間。上述之導電材料可包括導電粒子、奈米碳管或奈米銀絲,但並不以此為限,且其 型態可以為網格狀,例如導電網格。舉例來說,本實施例之第一子電極X1、第二子電極Y1以及第二連接線Y2可由氧化銦錫所形成,而第一連接線X2可由金屬導電材料所形成,但並不以此為限。 As shown in FIG. 11 , the first axial electrode 140X may further include a plurality of first sub-electrodes X1 and at least one first connection line X2 disposed between two adjacent first sub-electrodes X1, and the first connection line X2 is electrically connected to two adjacent first sub-electrodes X1. The second axial electrode 140Y may include a plurality of second sub-electrodes Y1 and at least one second connecting line Y2 disposed between two adjacent second sub-electrodes Y1, and the second connecting line Y2 is electrically connected to two adjacent ones. The second sub-electrode Y1. In addition, the insulating member 150 is partially disposed between the first connecting line X2 and the second connecting line Y2 for electrically isolating the first axial electrode 140X and the second axial electrode 140Y, but is not limited thereto. The insulating member 150 may include an inorganic material such as tantalum nitride, tantalum oxide and niobium oxynitride, an organic material such as an acrylic resin, or other suitable materials. The touch electrode 140S, the trace 140C, the first axial electrode 140X, the second axial electrode 140Y, the first sub-electrode X1, the first connection line X2, the second sub-electrode Y1, and the second connection line Y2 are respectively respectively It is formed of a transparent conductive material such as indium tin oxide, indium zinc oxide and aluminum zinc oxide, metal or other suitable conductive material. The metal material may be, for example, at least one of gold, aluminum, copper, silver, chromium, titanium, molybdenum, niobium, an alloy of the above materials, a composite layer of the above materials, or a composite layer of the above materials and an alloy of the above materials. However, it is not limited thereto, and other conductive materials may be used. Furthermore, the composite layer described above may be, for example, a three-layer stacked structure composed of molybdenum, an aluminum-niobium alloy, and molybdenum, but is not limited thereto, as long as the stacked structure capable of achieving a conductive effect is also protected by the present invention. Within the scope. In this embodiment, the touch electrode 140S, the trace 140C, the first axial electrode 140X, the second axial electrode 140Y, the first sub-electrode X1, the first connection line X2, the second sub-electrode Y1, and the first The two connection lines Y2 may be metal meshes, wherein the metal mesh may have a line width between 0.1 micrometers and 20 micrometers, and preferably a width between 1 micrometer and 10 micrometers. The conductive material may include conductive particles, carbon nanotubes or nano-silver, but not limited thereto, and The pattern can be grid-like, such as a conductive grid. For example, the first sub-electrode X1, the second sub-electrode Y1, and the second connection line Y2 of the embodiment may be formed of indium tin oxide, and the first connection line X2 may be formed of a metal conductive material, but Limited.

如第12圖所示,當第一連接線X2由塊狀金屬或金屬網格所構成時,結構層130上的奈米微結構M可用以降低第一連接線X2所可能形成的光反射現象,使得以金屬材料形成之第一連接線X2自第一基板111之第二面111B上觀看時的圖案明顯度降低,進而達到提升觸控裝置之外觀品質的目的。此外,值得說明的是,本實施例之觸控元件140可直接接觸奈米微結構M,而位於觸控元件140下方之以金屬材料形成之第一連接線X2係直接形成於奈米微結構M上,故可因此增加第一連接線X2與奈米微結構M間之接觸表面的電漿強度,使得至少部分的反射光可被侷限而不出光,藉此達到減少特定角度之反射光的效果。另請注意,本實施例之第一子電極X1、第一連接線X2、第二子電極Y1以及第二連接線Y2亦可視需要均由金屬網格所構成,但並不以此為限。此外,本發明之觸控元件140並不以上述第5圖至第12圖所示之型態為限,而上述第5圖至第12圖所示之各種觸控元件140的型態亦可視需要應用於後述本發明之其他實施例中。 As shown in FIG. 12, when the first connection line X2 is composed of a bulk metal or a metal mesh, the nano microstructure M on the structural layer 130 can be used to reduce the light reflection phenomenon that may be formed by the first connection line X2. Therefore, the pattern of the first connecting line X2 formed of the metal material when viewed from the second surface 111B of the first substrate 111 is significantly reduced, thereby achieving the purpose of improving the appearance quality of the touch device. In addition, it should be noted that the touch component 140 of the present embodiment can directly contact the nano microstructure M, and the first connection line X2 formed of a metal material under the touch component 140 is directly formed on the nano microstructure. M, so that the plasma strength of the contact surface between the first connecting line X2 and the nano-microstructure M can be increased, so that at least part of the reflected light can be confined without light, thereby reducing the reflected light at a specific angle. effect. It should be noted that the first sub-electrode X1, the first connection line X2, the second sub-electrode Y1, and the second connection line Y2 of the embodiment may be formed by a metal mesh as needed, but are not limited thereto. In addition, the touch element 140 of the present invention is not limited to the type shown in FIG. 5 to FIG. 12, and the types of the touch elements 140 shown in the fifth to twelfth figures are also visible. It needs to be applied to other embodiments of the present invention to be described later.

下文將針對本發明之觸控裝置的不同實施例進行說明,且為簡化說明,以下說明主要針對各實施例不同之處進行詳述,而不再對相同之處作重覆贅述。此外,本發明之各實施例中相同之元件係以相同之標號進行標示,以利於各實施例間互相對照。 The different embodiments of the touch device of the present invention are described below, and the following description is mainly for the sake of simplification of the description of the embodiments, and the details are not repeated. In addition, the same elements in the embodiments of the present invention are denoted by the same reference numerals to facilitate the comparison between the embodiments.

請參考第13圖,第13圖繪示了本發明第二實施例之觸控裝置102的示意圖。如第13圖所示,本實施例之觸控裝置102與上述第一實施例不同的地方在於,觸控裝置102更包括一遮光層160至少部分設置於觸控元件140 與結構層130之間,用以更進一步降低觸控元件140於自第一基板111之第二面111B上觀看時的圖案明顯度。舉例來說,當第一連接線X2係由金屬材料所形成時,遮光層160可設置於第一連接線X2與結構層130之間,但本發明並不以此為限。當第一子電極X1亦為金屬材料例如金屬網格所形成時,遮光層160亦可延伸至第一子電極X1與結構層130之間來形成遮蔽效果。本實施例之遮光層160可包括金屬氧化物、黑色樹脂、低反射之金屬例如鉻、低反射之合金例如鎳鉻(Ni-Cr)合金或其他適合之遮光材料。值得說明的是,遮光層160可與第一連接線X2以同一成膜製程或/及圖案化製程(例如微影蝕刻製程)一起形成,藉以確保遮光層160覆蓋第一連接線X2的狀況,且可同時達到簡化製程之目的。舉例來說,第一連接線X2如果是用銅作為材料,則可以在同一成膜製程或是採分開的成膜製程形成氧化銅或是銅合金氧化物作為遮光層160;或是可以採分開的成膜製程如氧化鉻堆疊在第一連接線X2之前或之後作為遮光層160,此外也可以有其他的實施方式,並不以此為限。 Please refer to FIG. 13 , which illustrates a schematic diagram of a touch device 102 according to a second embodiment of the present invention. As shown in FIG. 13 , the touch device 102 of the present embodiment is different from the first embodiment in that the touch device 102 further includes a light shielding layer 160 at least partially disposed on the touch component 140. The structure layer 130 is used to further reduce the visibility of the touch element 140 when viewed from the second surface 111B of the first substrate 111. For example, when the first connecting line X2 is formed of a metal material, the light shielding layer 160 may be disposed between the first connecting line X2 and the structural layer 130, but the invention is not limited thereto. When the first sub-electrode X1 is also formed of a metal material such as a metal mesh, the light shielding layer 160 may also extend between the first sub-electrode X1 and the structural layer 130 to form a shielding effect. The light shielding layer 160 of the present embodiment may include a metal oxide, a black resin, a low reflection metal such as chromium, a low reflection alloy such as a nickel-chromium (Ni-Cr) alloy or other suitable light-shielding material. It should be noted that the light shielding layer 160 may be formed together with the first bonding line X2 by the same film forming process or/and a patterning process (for example, a photolithography process), thereby ensuring that the light shielding layer 160 covers the condition of the first connection line X2. And can achieve the purpose of simplifying the process at the same time. For example, if the first connecting line X2 is made of copper, the copper oxide or the copper alloy oxide may be formed as the light shielding layer 160 in the same film forming process or a separate film forming process; or may be separated. The film-forming process, such as chrome oxide, is stacked as the light-shielding layer 160 before or after the first connection line X2, and other embodiments are also possible, and are not limited thereto.

請參考第14圖,第14圖繪示了本發明第三實施例之觸控裝置103的示意圖。如第14圖所示,本實施例之觸控裝置103與上述第二實施例不同的地方在於,本實施例之遮光層160可包括一第一遮光層161與一第二遮光層162。第一遮光層161係設置於第一連接線X2與結構層130之間,且第一遮光層161之圖形與第一連接線X2相似。第二遮光層162係至少部分設置於第一子電極X1與結構層130之間以及至少部分設置於第二軸向電極140Y與結構層130之間,用以對第一子電極X1以及第二軸向電極140Y產生遮蔽效果。第二遮光層161亦可視需要與第一子電極X1以及第二軸向電極140Y以同一成膜製程或/及圖案化製程一起形成,藉以確保第二遮光層161覆蓋第一子電極X1以及第二軸向電極140Y的狀況,且可同時達到簡化製程之目的。 Please refer to FIG. 14 , which illustrates a schematic diagram of a touch device 103 according to a third embodiment of the present invention. As shown in FIG. 14 , the touch device 103 of the present embodiment is different from the second embodiment in that the light shielding layer 160 of the embodiment may include a first light shielding layer 161 and a second light shielding layer 162 . The first light shielding layer 161 is disposed between the first connection line X2 and the structural layer 130, and the pattern of the first light shielding layer 161 is similar to the first connection line X2. The second light shielding layer 162 is at least partially disposed between the first sub-electrode X1 and the structural layer 130 and at least partially disposed between the second axial electrode 140Y and the structural layer 130 for the first sub-electrode X1 and the second The axial electrode 140Y produces a shielding effect. The second light shielding layer 161 may also be formed together with the first sub-electrode X1 and the second axial electrode 140Y by the same film forming process or/and a patterning process, thereby ensuring that the second light shielding layer 161 covers the first sub-electrode X1 and the first The condition of the two-axis electrode 140Y can simultaneously achieve the purpose of simplifying the process.

請參考第15圖,第15圖繪示了本發明第四實施例之觸控裝置104 的示意圖。如第15圖所示,本實施例之觸控裝置104與上述第一實施例不同的地方在於,本實施例之第一連接線X2亦可視需要設置於絕緣構件150上,且第一連接線X2可跨過絕緣構件140用以電性連接兩相鄰之第一子電極X1。在本實施例中,由於第一子電極X1以及第二軸向電極140Y係直接形成於奈米微結構M上,故當第一子電極X1以及第二軸向電極140Y係以金屬網格構成時,可藉由奈米微結構M來達到降低圖案明顯度的效果。此外,觸控裝置104亦可更包括一遮光層160設置於第一連接線X2與絕緣構件150之間,用以加強遮蔽第一連接線X2之效果。此外,當第一子電極X1以及第二軸向電極140Y亦係以金屬材料構成時,亦可選擇性地於當第一子電極X1以及第二軸向電極140Y與結構層130之間設置遮光層(圖未示),藉以加強遮蔽效果。 Please refer to FIG. 15 , which illustrates a touch device 104 according to a fourth embodiment of the present invention. Schematic diagram. As shown in FIG. 15 , the touch device 104 of the present embodiment is different from the first embodiment in that the first connection line X2 of the embodiment is also disposed on the insulating member 150 as needed, and the first connection line is X2 can span the insulating member 140 for electrically connecting the two adjacent first sub-electrodes X1. In this embodiment, since the first sub-electrode X1 and the second axial electrode 140Y are directly formed on the nano microstructure M, the first sub-electrode X1 and the second axial electrode 140Y are formed by a metal mesh. At the same time, the effect of reducing the apparentness of the pattern can be achieved by the nano microstructure M. In addition, the touch device 104 may further include a light shielding layer 160 disposed between the first connection line X2 and the insulating member 150 for enhancing the effect of shielding the first connection line X2. In addition, when the first sub-electrode X1 and the second axial electrode 140Y are also made of a metal material, it is also possible to selectively provide a light shielding between the first sub-electrode X1 and the second axial electrode 140Y and the structural layer 130. Layer (not shown) to enhance the shadowing effect.

請參考第16圖,第16圖繪示了本發明第五實施例之觸控裝置105的示意圖。如第16圖所示,本實施例之觸控裝置105與上述第一實施例不同的地方在於,本實施例之絕緣構件150係為一整面絕緣膜層設置於第一軸向電極140X與第二軸向電極140Y之間,用以電性隔離第一軸向電極140X與第二軸向電極140Y。此外,觸控裝置105可更包括一遮光層160以及一保護層159。遮光層160係設置於第一軸向電極140X與結構層130之間,而保護層159係設置於第二軸向電極140Y之上。 Please refer to FIG. 16, which is a schematic diagram of a touch device 105 according to a fifth embodiment of the present invention. As shown in FIG. 16 , the touch device 105 of the present embodiment is different from the first embodiment in that the insulating member 150 of the present embodiment is provided with a full-face insulating film layer disposed on the first axial electrode 140X and Between the second axial electrodes 140Y, the first axial electrode 140X and the second axial electrode 140Y are electrically isolated. In addition, the touch device 105 can further include a light shielding layer 160 and a protective layer 159. The light shielding layer 160 is disposed between the first axial electrode 140X and the structural layer 130, and the protective layer 159 is disposed above the second axial electrode 140Y.

請參考第17圖,第17圖繪示了本發明第六實施例之觸控裝置200的示意圖。如第17圖所示,本實施例之觸控裝置200與上述第一實施例不同的地方在於,本實施例之結構層130可於垂直投影方向Z上未覆蓋裝飾層120,藉此減少結構層130的厚度以及觸控裝置200的整體厚度,但觸控元件140仍可藉由與奈米微結構M重疊而獲得降低圖案明顯度的效果。 Please refer to FIG. 17, which is a schematic diagram of a touch device 200 according to a sixth embodiment of the present invention. As shown in FIG. 17, the touch device 200 of the present embodiment is different from the first embodiment in that the structural layer 130 of the present embodiment can cover the decorative layer 120 in the vertical projection direction Z, thereby reducing the structure. The thickness of the layer 130 and the overall thickness of the touch device 200, but the touch element 140 can still achieve the effect of reducing the apparentness of the pattern by overlapping with the nano-micro structure M.

請參考第18圖,第18圖繪示了本發明第七實施例之觸控裝置201的示意圖。如第18圖所示,本實施例之觸控裝置201與上述第六實施例不同的地方在於,本實施例之裝飾層120之厚度較佳係大於結構層130之厚度。也就是說,本實施例之結構層130的厚度可相對較薄,藉此達到減少觸控裝置201整體厚度的效果。此外,本實施例之結構層130之設置亦可用以減緩因為設置裝飾層120所形成之地形高度差異,減少可能因此而發生之產品缺陷。 Please refer to FIG. 18, which illustrates a schematic diagram of a touch device 201 according to a seventh embodiment of the present invention. As shown in FIG. 18, the touch device 201 of the present embodiment is different from the sixth embodiment in that the thickness of the decorative layer 120 of the present embodiment is preferably greater than the thickness of the structural layer 130. That is to say, the thickness of the structural layer 130 of the present embodiment can be relatively thin, thereby achieving the effect of reducing the overall thickness of the touch device 201. In addition, the arrangement of the structural layer 130 of the present embodiment can also be used to reduce the difference in terrain height formed by the provision of the decorative layer 120, and to reduce product defects that may occur thereby.

請參考第19圖,第19圖繪示了本發明第八實施例之觸控裝置300的示意圖。如第19圖所示,本實施例之觸控裝置300與上述第一實施例不同的地方在於,觸控裝置300更包括一第二基板112以及一黏合層170。第二基板112係與第一基板111相對設置。第二基板112具有一第三面112A以及一第四面112B,第三面112A係與第四面112B相對,第三面112A係面對第一基板111之第一面111A,且觸控元件140係至少部分設置在第二基板112之第三面112A上。黏合層170係設置於第一基板111與第二基板112之間,用以黏合設置有結構層130之第一基板111以及設置有觸控元件140之第二基板112。黏合層170可包括固態光學膠(optical clear adhesive,OCA)、感壓膠(pressure sensitive adhesive,PSA)、液態光學膠(liquid optical clear adhesive,LOCA)或其他適合之黏合材料。本實施例之第一基板111與前述實施例相同較佳係為一透光覆蓋板,而第二基板112可包括一玻璃基板、一塑膠基板、一玻璃膜片、一塑膠膜片、一顯示器的基板或其他適合之基板,例如,也可以是一薄基板(GFG)且具有厚度小於或等於0.25毫米。值得說明的是,在本發明之其他實施例中,觸控元件140亦可選擇性地設置於第二基板112之第四面112B上,或是將觸控元件140部分設置於第二基板112之第三面112A上而部分設置於第二基板112之第四面112B上,或者觸控元件140亦可部分設置於第一基板111上且部分設置於第二基板112上。 Referring to FIG. 19, FIG. 19 is a schematic diagram of a touch device 300 according to an eighth embodiment of the present invention. As shown in FIG. 19, the touch device 300 of the present embodiment is different from the first embodiment in that the touch device 300 further includes a second substrate 112 and an adhesive layer 170. The second substrate 112 is disposed opposite to the first substrate 111. The second substrate 112 has a third surface 112A and a fourth surface 112B. The third surface 112A is opposite to the fourth surface 112B. The third surface 112A faces the first surface 111A of the first substrate 111, and the touch component The 140 series is at least partially disposed on the third surface 112A of the second substrate 112. The adhesive layer 170 is disposed between the first substrate 111 and the second substrate 112 for bonding the first substrate 111 provided with the structural layer 130 and the second substrate 112 provided with the touch element 140. The adhesive layer 170 may comprise an optical clear adhesive (OCA), a pressure sensitive adhesive (PSA), a liquid optical clear adhesive (LOCA) or other suitable bonding material. The first substrate 111 of the present embodiment is preferably a light-transmitting cover plate, and the second substrate 112 may include a glass substrate, a plastic substrate, a glass film, a plastic film, and a display. The substrate or other suitable substrate, for example, may also be a thin substrate (GFG) and have a thickness of less than or equal to 0.25 mm. It should be noted that, in other embodiments of the present invention, the touch component 140 may be selectively disposed on the fourth surface 112B of the second substrate 112 or the touch component 140 may be partially disposed on the second substrate 112. The third surface 112A is partially disposed on the fourth surface 112B of the second substrate 112, or the touch element 140 may be partially disposed on the first substrate 111 and partially disposed on the second substrate 112.

請參考第20圖,第20圖繪示了本發明第九實施例之觸控裝置400的示意圖。如第20圖所示,本實施例之觸控裝置400與上述第一實施例不同的地方在於,本實施例之觸控元件140係設置於第一基板111之第一面111A上,且觸控元件140係設置於結構層130與第一基板111之間。此外,觸控裝置400可更包括一透光覆蓋板113以及一黏合層170。透光覆蓋板113與第一基板111相對設置。透光覆蓋板113具有一第五面113A以及一第六面113B,第五面113A係與第六面113B相對,第五面113A係面對第一基板111之第一面111A。此外,本實施例之裝飾層120可設置於透光覆蓋板113上,黏合層170係設置於第一基板111與透光覆蓋板113之間,用以黏合設置有觸控元件140與結構層130之第一基板111以及設置有裝飾層120之透光覆蓋板113。本實施例之結構層130係設置於第一基板111與透光覆蓋板113之間,且具有奈米微結構M之結構層130係於垂直投影方向Z上位於觸控元件140與透光覆蓋板113之間。因此,當光線穿過透光覆蓋板113與結構層130而射入觸控元件140時,若觸控元件140中有包括易產生光反射之金屬材料,則結構層130上的奈米微結構M可用以對此反射光產生散射效果,降低觸控元件140於透光覆蓋板113之第六面113B上觀看的圖案明顯度,進而達到改善觸控裝置400之外觀視效的目的。 Please refer to FIG. 20, which illustrates a schematic diagram of a touch device 400 according to a ninth embodiment of the present invention. As shown in FIG. 20, the touch device 400 of the present embodiment is different from the first embodiment in that the touch device 140 of the present embodiment is disposed on the first surface 111A of the first substrate 111 and is in contact with The control element 140 is disposed between the structural layer 130 and the first substrate 111. In addition, the touch device 400 further includes a light-transmitting cover plate 113 and an adhesive layer 170. The light-transmitting cover plate 113 is disposed opposite to the first substrate 111. The light-transmitting cover plate 113 has a fifth surface 113A and a sixth surface 113B. The fifth surface 113A is opposite to the sixth surface 113B, and the fifth surface 113A faces the first surface 111A of the first substrate 111. In addition, the decorative layer 120 of the embodiment may be disposed on the transparent cover plate 113, and the adhesive layer 170 is disposed between the first substrate 111 and the transparent cover plate 113 for bonding the touch element 140 and the structural layer. The first substrate 111 of 130 and the light-transmitting cover plate 113 provided with the decorative layer 120. The structural layer 130 of the present embodiment is disposed between the first substrate 111 and the transparent cover plate 113, and the structural layer 130 having the nano microstructure M is located in the vertical projection direction Z at the touch element 140 and the transparent cover. Between the plates 113. Therefore, when the light passes through the transparent cover plate 113 and the structural layer 130 and enters the touch element 140, if the touch element 140 includes a metal material that is easy to generate light reflection, the nano microstructure on the structural layer 130. The M can be used to reduce the apparent visibility of the touch device 140 on the sixth surface 113B of the transparent cover plate 113, thereby improving the visual effect of the touch device 400.

請參考第21圖,第21圖繪示了本發明第十實施例之觸控裝置401的示意圖。如第21圖所示,本實施例之觸控裝置401與上述第四實施例不同的地方在於,本實施例之觸控元件140係設置於第一基板111之第一面111A上,且觸控元件140係設置於結構層130與第一基板111之間。此外,觸控裝置401可更包括一透光覆蓋板113以及一黏合層170。透光覆蓋板113與第一基板111相對設置。黏合層170係設置於第一基板111與透光覆蓋板113之間,用以黏合設置有觸控元件140與底層結構層130之第一基板111以及 透光覆蓋板113。當本實施例之第一連接線X2為金屬材料所構成時,由於奈米微結構M係與第一連接線X2重疊,故可用以降低第一連接線X2於透光覆蓋板113之第六面113B上觀看的圖案明顯度。此外,值得說明的是,本實施例之結構層130亦可利用一般設置於觸控元件140上之保護層來形成,藉此達到簡化結構與製程的效果。 Please refer to FIG. 21, which shows a schematic diagram of a touch device 401 according to a tenth embodiment of the present invention. As shown in FIG. 21, the touch device 401 of the present embodiment is different from the fourth embodiment in that the touch element 140 of the present embodiment is disposed on the first surface 111A of the first substrate 111, and is touched. The control element 140 is disposed between the structural layer 130 and the first substrate 111. In addition, the touch device 401 further includes a transparent cover plate 113 and an adhesive layer 170. The light-transmitting cover plate 113 is disposed opposite to the first substrate 111. The adhesive layer 170 is disposed between the first substrate 111 and the transparent cover plate 113 for bonding the first substrate 111 provided with the touch element 140 and the underlying structure layer 130, and Light transmissive cover plate 113. When the first connection line X2 of the embodiment is made of a metal material, since the nano microstructure M is overlapped with the first connection line X2, the first connection line X2 can be lowered to the sixth of the transparent cover plate 113. The pattern viewed on the face 113B is noticeable. In addition, it should be noted that the structural layer 130 of the present embodiment can also be formed by using a protective layer generally disposed on the touch element 140, thereby achieving the effect of simplifying the structure and the process.

請參考第22圖,第22圖繪示了本發明第十一實施例之觸控裝置402的示意圖。如第22圖所示,本實施例之觸控裝置402與上述第九實施例不同的地方在於,本實施例之第一基板111可為一顯示器490之基板。顯示器490可包括液晶顯示器、有機發光二極體(OLED)顯示器、電濕潤(electro-wetting)顯示器、電子墨水(e-ink)顯示器、電漿(plasma)顯示器、場發射(FED)顯示器或其他適合之顯示器。第一基板111可包括一彩色濾光基板、一主動陣列基板、一封裝蓋板或其他顯示器中適合之基板。因此,本實施例之觸控裝置402可被視為一on-cell觸控顯示裝置,但並不以此為限。 Please refer to FIG. 22, which shows a schematic diagram of a touch device 402 according to an eleventh embodiment of the present invention. As shown in FIG. 22, the touch device 402 of the present embodiment is different from the ninth embodiment in that the first substrate 111 of the present embodiment can be a substrate of a display 490. Display 490 can include a liquid crystal display, an organic light emitting diode (OLED) display, an electro-wetting display, an electronic ink (e-ink) display, a plasma display, a field emission (FED) display, or the like. Suitable for the display. The first substrate 111 may include a color filter substrate, an active array substrate, a package cover or other suitable substrate. Therefore, the touch device 402 of the present embodiment can be regarded as an on-cell touch display device, but is not limited thereto.

請參考第23圖,第23圖繪示了本發明第十二實施例之觸控裝置403的示意圖。如第23圖所示,本實施例之觸控裝置403與上述第十一實施例不同的地方在於,觸控裝置403更包括一顯示下基板491以及一顯示介質492。顯示下機板491係與第一基板111相對設置,而顯示介質492係設置於顯示下基板491與第一基板111之間。本實施例之觸控裝置403可被視為一內嵌式(in-cell)觸控顯示裝置,而第一基板111可為顯示器之基板例如彩色濾光基板、主動陣列基板或封裝蓋板,但並不以此為限。 Referring to FIG. 23, FIG. 23 is a schematic diagram of a touch device 403 according to a twelfth embodiment of the present invention. As shown in FIG. 23, the touch device 403 of the present embodiment is different from the eleventh embodiment in that the touch device 403 further includes a display lower substrate 491 and a display medium 492. The display lower plate 491 is disposed opposite to the first substrate 111, and the display medium 492 is disposed between the display lower substrate 491 and the first substrate 111. The touch device 403 of the present embodiment can be regarded as an in-cell touch display device, and the first substrate 111 can be a substrate of the display, such as a color filter substrate, an active array substrate or a package cover. But it is not limited to this.

請參考第24圖,第24圖繪示了本發明第十三實施例之觸控裝置404的示意圖。如第24圖所示,本實施例之觸控裝置404與上述第一實施例不同的地方在於,本實施例之奈米微結構M可僅對應觸控元件140中的部分 元件設置。舉例來說,當第一連接線X2以金屬材料所形成而第一子電極X1與第二軸向電極140Y係以透明導電材料所形成時,奈米微結構M可僅對應第一連接線X2。也就是說,奈米微結構M可僅在結構層130的部分表面上形成,而觸控元件140可至少部分未與奈米微結構M於垂直投影方向Z上重疊。藉由本實施例的設計可僅在需要的區域形成奈米微結構M,降低奈米微結構M於其他透光區域所造成之影響。換句話說,至少部分之觸控元件140亦可視需要未與奈米微結構M於垂直投影方向Z上重疊,而上述之未與奈米微結構M重疊之觸控元件140的部分較佳係並非以金屬等反光性高之材料所形成之部分,但並不以此為限。因此,本發明之奈米微結構M可僅在結構層130的部分表面上形成,且各形成有奈米微結構M之區域係彼此互相分離。 Please refer to FIG. 24, which shows a schematic diagram of a touch device 404 according to a thirteenth embodiment of the present invention. As shown in FIG. 24, the touch device 404 of the present embodiment is different from the first embodiment in that the nano-micro structure M of the embodiment can only correspond to a portion of the touch element 140. Component settings. For example, when the first connection line X2 is formed of a metal material and the first sub-electrode X1 and the second axial electrode 140Y are formed of a transparent conductive material, the nano-micro structure M may correspond to only the first connection line X2. . That is, the nano-microstructures M may be formed only on a portion of the surface of the structural layer 130, and the touch element 140 may at least partially not overlap the nano-microstructures M in the vertical projection direction Z. With the design of the present embodiment, the nano microstructures M can be formed only in the required regions, and the influence of the nano microstructures M on other light-transmitting regions can be reduced. In other words, at least part of the touch element 140 may not overlap with the nano-micro structure M in the vertical projection direction Z as needed, and the portion of the touch element 140 that is not overlapped with the nano-micro structure M is preferably It is not part of a material with high reflectivity such as metal, but it is not limited to this. Therefore, the nanostructures M of the present invention can be formed only on a part of the surface of the structural layer 130, and the regions each formed with the nanostructures M are separated from each other.

綜上所述,本發明之觸控裝置係利用於與觸控元件重疊之結構層上形成奈米微結構,藉由奈米微結構對觸控元件可能產生之反射光形成散射或形成抑制出光的效果,進而達到改善觸控裝置之外觀品質的目的。此外,本發明更利用遮光層與奈米微結構搭配,達到更進一步降低觸控元件之圖案明顯度的效果。 In summary, the touch device of the present invention is configured to form a nano-structure on a structure layer overlapping the touch element, and the nano-structure can scatter or suppress the light generated by the touch element. The effect is to achieve the purpose of improving the appearance quality of the touch device. In addition, the present invention further utilizes the light shielding layer and the nano microstructure to achieve the effect of further reducing the pattern visibility of the touch element.

以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.

101‧‧‧觸控裝置 101‧‧‧ touch device

111‧‧‧第一基板 111‧‧‧First substrate

111A‧‧‧第一面 111A‧‧‧ first side

111B‧‧‧第二面 111B‧‧‧ second side

120‧‧‧裝飾層 120‧‧‧decorative layer

130‧‧‧結構層 130‧‧‧Structural layer

130S‧‧‧粗化面 130S‧‧‧ rough surface

140‧‧‧觸控元件 140‧‧‧Touch components

M‧‧‧奈米微結構 M‧‧ nm nanostructure

Z‧‧‧垂直投影方向 Z‧‧‧Vertical projection direction

Claims (26)

一種觸控裝置,包括:一第一基板,具有一第一面以及一第二面,其中該第一面係與該第二面相對;一結構層,設置於該第一基板之該第一面上,其中該結構層具有一粗化面,該粗化面係背對該第一基板,且該粗化面包括複數個奈米微結構;以及一觸控元件,其中該觸控元件係與該等奈米微結構於一垂直該第一基板之垂直投影方向上至少部分重疊。 A touch device includes: a first substrate having a first surface and a second surface, wherein the first surface is opposite to the second surface; and a structural layer is disposed on the first surface of the first substrate The surface layer has a roughened surface, the roughened surface is opposite to the first substrate, and the roughened surface includes a plurality of nano microstructures; and a touch component, wherein the touch component is And at least partially overlapping the nano microstructures in a vertical projection direction perpendicular to the first substrate. 如請求項1所述之觸控裝置,其中兩相鄰之該等奈米微結構之頂點間的距離係介於90奈米至900奈米之間。 The touch device of claim 1, wherein a distance between two adjacent apexes of the nano microstructures is between 90 nm and 900 nm. 如請求項1所述之觸控裝置,其中兩相鄰之該等奈米微結構相連之處具有一連接點,兩相鄰之該等奈米微結構其中之一者的最高點與該連接點之間具有一高度,且該高度係介於90奈米至900奈米之間。 The touch device of claim 1, wherein two adjacent nano microstructures have a connection point, and a highest point of one of the adjacent nano microstructures is connected to the connection point There is a height between the points, and the height is between 90 nm and 900 nm. 如請求項1所述之觸控裝置,其中該等奈米微結構之最高點與最低點於該垂直投影方向上之距離係介於90奈米至900奈米之間。 The touch device of claim 1, wherein the distance between the highest point and the lowest point of the nano microstructures in the vertical projection direction is between 90 nm and 900 nm. 如請求項1所述之觸控裝置,其中該等奈米微結構係彼此相連設置。 The touch device of claim 1, wherein the nano microstructures are disposed in connection with each other. 如請求項1所述之觸控裝置,其中該結構層包括有機材料、無機材料或有機-無機複合材料。 The touch device of claim 1, wherein the structural layer comprises an organic material, an inorganic material or an organic-inorganic composite material. 如請求項1所述之觸控裝置,其中該結構層之折射率係介於1.35至2之間。 The touch device of claim 1, wherein the structural layer has a refractive index between 1.35 and 2. 如請求項1所述之觸控裝置,其中該觸控元件係設置於該結構層之該粗化面上。 The touch device of claim 1, wherein the touch element is disposed on the roughened surface of the structural layer. 如請求項1所述之觸控裝置,更包括一裝飾層,設置於該第一基板上,該第一基板為一透光覆蓋板。 The touch device of claim 1, further comprising a decorative layer disposed on the first substrate, the first substrate being a transparent cover plate. 如請求項9所述之觸控裝置,其中該裝飾層之厚度係小於該結構層之厚 度。 The touch device of claim 9, wherein the thickness of the decorative layer is less than the thickness of the structural layer degree. 如請求項9所述之觸控裝置,其中該裝飾層之厚度係大於該結構層之厚度。 The touch device of claim 9, wherein the decorative layer has a thickness greater than a thickness of the structural layer. 如請求項9所述之觸控裝置,其中該裝飾層係設置於該第一基板之該第一面上。 The touch device of claim 9, wherein the decorative layer is disposed on the first surface of the first substrate. 如請求項12所述之觸控裝置,其中該裝飾層係至少部分設置於該結構層與該第一基板之間。 The touch device of claim 12, wherein the decorative layer is at least partially disposed between the structural layer and the first substrate. 如請求項1所述之觸控裝置,更包括一第二基板,與該第一基板相對設置,其中該第二基板具有一第三面以及一第四面,該第三面係與該第四面相對,該第三面係面對該第一基板之該第一面,且該觸控元件係至少部分設置在該第二基板之該第三面上。 The touch device of claim 1, further comprising a second substrate disposed opposite to the first substrate, wherein the second substrate has a third surface and a fourth surface, the third surface and the third surface The third surface faces the first surface of the first substrate, and the touch component is at least partially disposed on the third surface of the second substrate. 如請求項1所述之觸控裝置,其中該觸控元件係設置於該第一基板之該第一面上,且該觸控元件係設置於該結構層與該第一基板之間。 The touch device of claim 1 , wherein the touch component is disposed on the first surface of the first substrate, and the touch component is disposed between the structural layer and the first substrate. 如請求項15所述之觸控裝置,更包括一透光覆蓋板,與該第一基板相對設置,其中該結構層係設置於該第一基板與該透光覆蓋板之間。 The touch device of claim 15 further comprising a light-transmitting cover plate disposed opposite the first substrate, wherein the structural layer is disposed between the first substrate and the light-transmitting cover plate. 如請求項16所述之觸控裝置,更包括一裝飾層,設置於該透光覆蓋板上。 The touch device of claim 16, further comprising a decorative layer disposed on the transparent cover plate. 如請求項1所述之觸控裝置,更包括一遮光層,至少部分設置於該觸控元件與該結構層之間。 The touch device of claim 1 further comprising a light shielding layer disposed at least partially between the touch element and the structural layer. 如請求項1所述之觸控裝置,其中該觸控元件包括至少一金屬層或至少一金屬網格,其中該金屬網格具有一線寬,且該線寬係介於0.1微米至10微米之間。 The touch device of claim 1, wherein the touch element comprises at least one metal layer or at least one metal grid, wherein the metal grid has a line width, and the line width is between 0.1 micrometer and 10 micrometers. between. 如請求項1所述之觸控裝置,其中該觸控元件包括複數個觸控電極彼此互相電性絕緣設置。 The touch device of claim 1, wherein the touch element comprises a plurality of touch electrodes electrically insulated from each other. 如請求項20所述之觸控裝置,其中該等觸控電極包括至少一觸控訊號驅動電極以及至少一觸控訊號接收電極。 The touch device of claim 20, wherein the touch electrodes comprise at least one touch signal driving electrode and at least one touch signal receiving electrode. 如請求項1所述之觸控裝置,其中該觸控元件包括: 至少一條第一軸向電極,沿一第一方向延伸設置;以及至少一條第二軸向電極,沿一第二方向延伸設置,其中該第二軸向電極係與該第一軸向電極電性絕緣。 The touch device of claim 1, wherein the touch component comprises: At least one first axial electrode extending along a first direction; and at least one second axial electrode extending along a second direction, wherein the second axial electrode is electrically connected to the first axial electrode insulation. 如請求項22所述之觸控裝置,其中該第一軸向電極包括複數個第一子電極以及至少一第一連接線設置於兩相鄰之該等第一子電極之間,該第一連接線電性連接兩相鄰之該等第一子電極,該第二軸向電極包括複數個第二子電極以及至少一第二連接線設置於兩相鄰之該等第二子電極之間,該第二連接線電性連接兩相鄰之該等第二子電極。 The touch device of claim 22, wherein the first axial electrode comprises a plurality of first sub-electrodes and at least one first connecting line is disposed between the two adjacent first sub-electrodes, the first The connecting line electrically connects the two adjacent first sub-electrodes, the second axial electrode includes a plurality of second sub-electrodes, and the at least one second connecting line is disposed between the two adjacent second sub-electrodes The second connecting line is electrically connected to the two adjacent second sub-electrodes. 如請求項1所述之觸控裝置,其中該第一基板包括一玻璃基板、一塑膠基板、一玻璃膜片、一塑膠膜片、一透光覆蓋板或一顯示器的基板。 The touch device of claim 1, wherein the first substrate comprises a glass substrate, a plastic substrate, a glass film, a plastic film, a light-transmissive cover plate or a display substrate. 如請求項1所述之觸控裝置,其中該結構層之厚度係介於200奈米至10微米之間。 The touch device of claim 1, wherein the structural layer has a thickness between 200 nm and 10 microns. 如請求項1所述之觸控裝置,其中至少部分之該觸控元件係未與該等奈米微結構於該垂直投影方向上重疊。 The touch device of claim 1, wherein at least a portion of the touch elements are not overlapped with the nano microstructures in the vertical projection direction.
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