TW201541322A - Capacitive touch device - Google Patents

Capacitive touch device Download PDF

Info

Publication number
TW201541322A
TW201541322A TW103115610A TW103115610A TW201541322A TW 201541322 A TW201541322 A TW 201541322A TW 103115610 A TW103115610 A TW 103115610A TW 103115610 A TW103115610 A TW 103115610A TW 201541322 A TW201541322 A TW 201541322A
Authority
TW
Taiwan
Prior art keywords
substrate
electrode
capacitive touch
touch device
microstructures
Prior art date
Application number
TW103115610A
Other languages
Chinese (zh)
Inventor
Jiann-Liang Chou
Cheng-Yen Yeh
Chun-Ming Huang
Original Assignee
Wintek Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wintek Corp filed Critical Wintek Corp
Priority to TW103115610A priority Critical patent/TW201541322A/en
Publication of TW201541322A publication Critical patent/TW201541322A/en

Links

Abstract

A capacitive touch device includes a first base material and a first electrode. The first base material has a first surface and a second surface opposite to the first surface. The first surface has a plurality of first microstructures, and each of the first microstructures includes a convex or a concave. The first electrode is disposed on the first surface of the first base material, and the first electrode at least partially covers the first microstructures. The first electrode has a non-planar surface.

Description

電容式觸控裝置 Capacitive touch device

本發明係關於一種電容式觸控裝置，尤指一種具有非平面電極之電容式觸控裝置。 The present invention relates to a capacitive touch device, and more particularly to a capacitive touch device having a non-planar electrode.

近年來，隨著觸控技術不斷地發展，許多消費性電子產品例如行動電話(mobile phone)、平板電腦(tablet PC)、衛星導航系統(GPS navigator system)、筆記型電腦(laptop PC)以及桌上型電腦(desktop PC)等均有與觸控功能結合的產品問世。目前觸控面板的技術中較常見包括電阻式、電容式以及光學式等。其中電容式觸控面板由於具有高準確率、多點觸控、高耐用性以及高觸控解析度等特點，已逐漸成為目前中高階消費性電子產品使用之主流觸控技術。然而，由於傳統的電容示觸控面板並不具有如同一般電阻式觸控面板所具有之觸覺上的觸控回饋特性，故使得傳統的電容示觸控面板在應用上受到了侷限。 In recent years, with the continuous development of touch technology, many consumer electronic products such as mobile phones, tablet PCs, GPS navigator systems, laptop PCs, and tables have been developed. Products such as a desktop PC have been combined with touch functions. Currently, touch panel technology is more commonly used in the form of resistive, capacitive, and optical. Among them, capacitive touch panels have become the mainstream touch technology used in middle and high-end consumer electronic products due to their high accuracy, multi-touch, high durability and high touch resolution. However, since the conventional capacitive touch panel does not have the tactile feedback feedback characteristics of the conventional resistive touch panel, the conventional capacitive touch panel is limited in application.

本發明之目的之一在於提供一種電容式觸控裝置，利用非平面電極達到實現多層次電容式觸控效果、提升觸控靈敏度以及降低電極圖案明顯度等目的。 One of the objectives of the present invention is to provide a capacitive touch device that utilizes a non-planar electrode to achieve a multi-layer capacitive touch effect, improve touch sensitivity, and reduce the visibility of the electrode pattern.

本發明之一實施例提供一種電容式觸控裝置，包括一第一基材以及一第一電極。第一基材具有一第一面以及一相反之第二面。第一面具有複數個第一微結構，且各第一微結構包括一凸起或一凹槽。第一電極係設置於 第一基材之第一面上，第一電極係至少部分覆蓋第一微結構，且第一電極具有一非平面表面。 One embodiment of the present invention provides a capacitive touch device including a first substrate and a first electrode. The first substrate has a first side and an opposite second side. The first surface has a plurality of first microstructures, and each of the first microstructures includes a protrusion or a groove. The first electrode system is disposed at On a first side of the first substrate, the first electrode at least partially covers the first microstructure, and the first electrode has a non-planar surface.

本發明之電容式觸控裝置之第一電極係覆蓋第一基材之第一微結構，藉此增加第一電極進行電容式觸控操作時的有效表面積，故可因此提升觸控靈敏度且實現多層次電容式觸控效果。此外，本發明之電容式觸控裝置更利用第一微結構對光線產生散射效果，藉此降低電極之圖案明顯度並提升電容式觸控裝置的外觀視效。 The first electrode of the capacitive touch device of the present invention covers the first microstructure of the first substrate, thereby increasing the effective surface area of the first electrode for capacitive touch operation, thereby improving touch sensitivity and realizing Multi-layer capacitive touch effect. In addition, the capacitive touch device of the present invention further utilizes the first microstructure to scatter light, thereby reducing the apparent visibility of the electrodes and improving the visual appearance of the capacitive touch device.

101-104‧‧‧電容式觸控裝置 101-104‧‧‧Capacitive touch device

111‧‧‧第一基材 111‧‧‧First substrate

111A‧‧‧第一面 111A‧‧‧ first side

111B‧‧‧第二面 111B‧‧‧ second side

111C‧‧‧第一底材 111C‧‧‧First substrate

111D‧‧‧第一絕緣層 111D‧‧‧First insulation

112‧‧‧第二基材 112‧‧‧Second substrate

112A‧‧‧第三面 112A‧‧‧ third side

112B‧‧‧第四面 112B‧‧‧ fourth side

112C‧‧‧第二底材 112C‧‧‧Second substrate

112D‧‧‧第二絕緣層 112D‧‧‧Second insulation

121‧‧‧第一電極 121‧‧‧First electrode

121X‧‧‧第一軸向電極 121X‧‧‧first axial electrode

122‧‧‧第二電極 122‧‧‧second electrode

122Y‧‧‧第二軸向電極 122Y‧‧‧second axial electrode

130‧‧‧覆蓋板 130‧‧‧ Covering board

130A‧‧‧第五面 130A‧‧‧The fifth side

130B‧‧‧第六面 130B‧‧‧ sixth side

131‧‧‧裝飾層 131‧‧‧Decorative layer

141‧‧‧第一黏合層 141‧‧‧First adhesive layer

142‧‧‧第二黏合層 142‧‧‧Second adhesive layer

143‧‧‧第三黏合層 143‧‧‧ third adhesive layer

150、151、850‧‧‧顯示器 150, 151, 850‧‧ display

201-202‧‧‧電容式觸控裝置 201-202‧‧‧Capacitive touch device

301‧‧‧電容式觸控裝置 301‧‧‧Capacitive touch device

401-402‧‧‧電容式觸控裝置 401-402‧‧‧Capacitive touch device

501-503‧‧‧電容式觸控裝置 501-503‧‧‧Capacitive touch device

601‧‧‧電容式觸控裝置 601‧‧‧Capacitive touch device

701‧‧‧電容式觸控裝置 701‧‧‧Capacitive touch device

801‧‧‧電容式觸控裝置 801‧‧‧Capacitive touch device

901-903‧‧‧電容式觸控裝置 901-903‧‧‧Capacitive touch device

910‧‧‧可撓式材料層 910‧‧‧Flexible material layer

911‧‧‧輔助凸起 911‧‧‧Auxiliary bulge

920‧‧‧中心結構 920‧‧‧ central structure

940‧‧‧天線結構 940‧‧‧Antenna structure

950‧‧‧按壓區 950‧‧ ‧ Pressing area

CR‧‧‧參考電容 CR‧‧‧ reference capacitor

D‧‧‧距離 D‧‧‧Distance

H‧‧‧高度 H‧‧‧ Height

M1‧‧‧第一微結構 M1‧‧‧ first microstructure

M2‧‧‧第二微結構 M2‧‧‧Second microstructure

M3‧‧‧第三微結構 M3‧‧‧ third microstructure

X‧‧‧第一方向 X‧‧‧ first direction

X1‧‧‧第一子電極 X1‧‧‧ first subelectrode

Y‧‧‧第二方向 Y‧‧‧second direction

Y1‧‧‧第二子電極 Y1‧‧‧Second subelectrode

Z‧‧‧垂直投影方向 Z‧‧‧Vertical projection direction

第1圖繪示了本發明之第一實施例之電容式觸控裝置的示意圖。 FIG. 1 is a schematic diagram of a capacitive touch device according to a first embodiment of the present invention.

第2圖繪示了本發明之第一實施例之電容式觸控裝置的按壓操作示意圖。 FIG. 2 is a schematic view showing a pressing operation of the capacitive touch device according to the first embodiment of the present invention.

第3圖繪示了本發明之第一實施例之電容式觸控裝置的立體示意圖。 FIG. 3 is a perspective view of a capacitive touch device according to a first embodiment of the present invention.

第4圖繪示了本發明之第一實施例之第一電極與第二電極之另一型態的示意圖。 Fig. 4 is a view showing another form of the first electrode and the second electrode of the first embodiment of the present invention.

第5圖繪示了本發明之第一實施例第一電極與第二電極之又一型態的示意圖。 FIG. 5 is a schematic view showing still another mode of the first electrode and the second electrode in the first embodiment of the present invention.

第6圖繪示了本發明之第二實施例之電容式觸控裝置的示意圖。 FIG. 6 is a schematic diagram of a capacitive touch device according to a second embodiment of the present invention.

第7圖繪示了本發明之第三實施例之電容式觸控裝置的示意圖。 FIG. 7 is a schematic diagram of a capacitive touch device according to a third embodiment of the present invention.

第8圖繪示了本發明之第四實施例之電容式觸控裝置的示意圖。 FIG. 8 is a schematic diagram of a capacitive touch device according to a fourth embodiment of the present invention.

第9圖繪示了本發明之第五實施例之電容式觸控裝置的示意圖。 FIG. 9 is a schematic diagram of a capacitive touch device according to a fifth embodiment of the present invention.

第10圖繪示了本發明之第六實施例之電容式觸控裝置的示意圖。 FIG. 10 is a schematic diagram of a capacitive touch device according to a sixth embodiment of the present invention.

第11圖繪示了本發明之第七實施例之電容式觸控裝置的示意圖。 FIG. 11 is a schematic view showing a capacitive touch device according to a seventh embodiment of the present invention.

第12圖繪示了本發明之第八實施例之電容式觸控裝置的示意圖。 FIG. 12 is a schematic diagram of a capacitive touch device according to an eighth embodiment of the present invention.

第13圖繪示了本發明之第九實施例之電容式觸控裝置的示意圖。 FIG. 13 is a schematic view showing a capacitive touch device according to a ninth embodiment of the present invention.

第14圖繪示了本發明之第十實施例之電容式觸控裝置的示意圖。 FIG. 14 is a schematic diagram of a capacitive touch device according to a tenth embodiment of the present invention.

第15圖繪示了本發明之第十一實施例之電容式觸控裝置的示意圖。 FIG. 15 is a schematic view showing a capacitive touch device according to an eleventh embodiment of the present invention.

第16圖繪示了本發明之第十二實施例之電容式觸控裝置的示意圖。 FIG. 16 is a schematic view showing a capacitive touch device according to a twelfth embodiment of the present invention.

第17圖繪示了本發明之第十三實施例之電容式觸控裝置的示意圖。 FIG. 17 is a schematic diagram showing a capacitive touch device according to a thirteenth embodiment of the present invention.

第18圖繪示了本發明之第十四實施例之電容式觸控裝置的示意圖。 FIG. 18 is a schematic view showing a capacitive touch device according to a fourteenth embodiment of the present invention.

第19圖繪示了本發明之第十五實施例之電容式觸控裝置的示意圖。 FIG. 19 is a schematic diagram of a capacitive touch device according to a fifteenth embodiment of the present invention.

第20圖繪示了本發明之第十六實施例之電容式觸控裝置的剖面示意圖。 FIG. 20 is a cross-sectional view showing a capacitive touch device according to a sixteenth embodiment of the present invention.

第21圖繪示了本發明之第十六實施例之電容式觸控裝置的示意圖。 FIG. 21 is a schematic view showing a capacitive touch device according to a sixteenth embodiment of the present invention.

第22圖繪示了本發明之第十七實施例之電容式觸控裝置的示意圖。 Figure 22 is a schematic view showing a capacitive touch device of a seventeenth embodiment of the present invention.

第23圖繪示了本發明之第十八實施例之電容式觸控裝置的示意圖。 FIG. 23 is a schematic diagram of a capacitive touch device according to an eighteenth embodiment of the present invention.

為使熟習本發明所屬技術領域之一般技藝者能更進一步了解本發明，下文特列舉本發明之數個較佳實施例，並配合所附圖式，詳細說明本發明的構成內容。 The present invention will be described in detail with reference to the preferred embodiments of the invention,

請參考第1圖至第3圖。第1圖繪示了本發明之第一實施例之電容式觸控裝置的示意圖。第2圖繪示了本實施例之電容式觸控裝置的按壓操作示意圖。第3圖繪示了本實施例之電容式觸控裝置的立體示意圖。為了方便說明，本發明之各圖式僅為示意以更容易了解本發明，其詳細的比例可依照設計的需求進行調整。如第1圖所示，本實施例之電容式觸控裝置101包括一第一基材111、一第二基材112、第一黏合層141、一第一電極121以及一第二電極122。第二基材112係與第一基材111相對設置，第一基材111具有一第一面111A以及一相反之第二面111B，第二基材112具有一第三面112A以及一相反之第四面112B。第一黏合層141設置於第一基材111與第二基材112之間，於本實施例中，第一黏合層141用以使第二基材112與第一基材111間相黏合固定，並且使相對設置之第一電極121與第二電極122互相電性 絕緣。第一基材111之第一面111A具有複數個第一微結構M1，且各第一微結構M1包括一凸起或一凹槽。換句話說，第一微結構M1之表面係定義為第一基材111之第一面111A的至少一部分。第一電極121係設置於第一基材111之第一面111A上，第一電極121係至少部分覆蓋第一微結構M1，故第一電極121具有一非平面表面。第二電極122可為一平面電極或一非平面電極，即第二電極122的表面可為一平整面或一不平整面。舉例來說，本實施例中第二電極122的表面為平整面，但並不以此為限。此外，本實施例中，第二電極122可設置於第二基材112之第三面112A上，且第二基材112之第三面112A係面對第一基材111之第一面111A，但並不以此為限。 Please refer to Figures 1 to 3. FIG. 1 is a schematic diagram of a capacitive touch device according to a first embodiment of the present invention. FIG. 2 is a schematic view showing the pressing operation of the capacitive touch device of the embodiment. FIG. 3 is a schematic perspective view of the capacitive touch device of the embodiment. For the convenience of description, the drawings of the present invention are only for the purpose of understanding the present invention, and the detailed proportions thereof can be adjusted according to the design requirements. As shown in FIG. 1 , the capacitive touch device 101 of the present embodiment includes a first substrate 111 , a second substrate 112 , a first adhesive layer 141 , a first electrode 121 , and a second electrode 122 . The second substrate 112 is disposed opposite to the first substrate 111. The first substrate 111 has a first surface 111A and an opposite second surface 111B. The second substrate 112 has a third surface 112A and an opposite surface. Fourth face 112B. The first adhesive layer 141 is disposed between the first substrate 111 and the second substrate 112. In this embodiment, the first adhesive layer 141 is used to bond the second substrate 112 to the first substrate 111. And electrically connecting the oppositely disposed first electrode 121 and second electrode 122 insulation. The first surface 111A of the first substrate 111 has a plurality of first microstructures M1, and each of the first microstructures M1 includes a protrusion or a groove. In other words, the surface of the first microstructure M1 is defined as at least a portion of the first side 111A of the first substrate 111. The first electrode 121 is disposed on the first surface 111A of the first substrate 111, and the first electrode 121 at least partially covers the first microstructure M1, so the first electrode 121 has a non-planar surface. The second electrode 122 can be a planar electrode or a non-planar electrode, that is, the surface of the second electrode 122 can be a flat surface or an uneven surface. For example, the surface of the second electrode 122 in this embodiment is a flat surface, but is not limited thereto. In addition, in this embodiment, the second electrode 122 can be disposed on the third surface 112A of the second substrate 112, and the third surface 112A of the second substrate 112 faces the first surface 111A of the first substrate 111. , but not limited to this.

利用一成膜製程形成一導電材料層於第一基材111之第一面111A上，可形成第一電極121。其中，可視需要選擇性地再利用一圖案化製程對此導電材料層進行圖案化，使得第一電極121具有特定圖形，例如菱形或直條狀，但不為此限。由於第一基材111的第一面111A具有高低起伏的第一微結構M1，故此導電材料層受到第一微結構M1的形狀影響而形成具有立體效果之第一電極121。第一電極121與第二電極122可分別由透明導電材料例如石墨烯、矽烯、氧化銦錫(indium tin oxide,ITO)、氧化銦鋅(indium zinc oxide,IZO)與氧化鋁鋅(aluminum zinc oxide,AZO)、金屬材料或其他適合之導電材料所形成。上述之導電材料可包括導電粒子、奈米碳管或奈米銀絲，但並不以此為限，且其型態可包括薄膜狀或網格狀，例如導電網格，但並不以此為限。上述之金屬材料可包括鋁、銅、銀、鉻、鈦、鉬之其中至少一者、上述材料之複合層或上述材料之合金，但並不以此為限，且其型態可以為網格狀，例如金屬網格。構成上述金屬網格的金屬線寬可介於0.8微米(micrometer,μm)至10微米之間，並可採用例如黃光微影、噴印、塗佈、填充金屬於壓印溝槽、…等製程方式製作而成。由於金屬材料具有反光性，為了降低其造成視覺的不良影響，於金屬材料所構成的第一電極121或第二電極122中，可以設置抗 反射層、低反射率材料層(例如金屬氧化層)或吸光層於靠近使用者的表面。另一方面，第一微結構M1可使反射光在第一電極121或第二電極122表面發生偏折，進而降低反射光的不良影響，此時，即可省略設置抗反射層、低反射率材料層或吸光層等。 The first electrode 121 can be formed by forming a conductive material layer on the first surface 111A of the first substrate 111 by a film forming process. Wherein, the conductive material layer may be patterned by selectively using a patterning process to make the first electrode 121 have a specific pattern, such as a diamond shape or a straight strip shape, but not limited thereto. Since the first surface 111A of the first substrate 111 has the first microstructure M1 with high and low undulations, the conductive material layer is affected by the shape of the first microstructure M1 to form the first electrode 121 having a stereoscopic effect. The first electrode 121 and the second electrode 122 may be respectively made of a transparent conductive material such as graphene, terpene, indium tin oxide (ITO), indium zinc oxide (IZO) and aluminum zinc oxide (aluminum zinc). Oxide, AZO), metal material or other suitable conductive material. The conductive material may include conductive particles, carbon nanotubes or nano-silver wires, but not limited thereto, and the type thereof may include a film shape or a grid shape, such as a conductive mesh, but does not Limited. The metal material may include at least one of aluminum, copper, silver, chromium, titanium, molybdenum, a composite layer of the above materials or an alloy of the above materials, but is not limited thereto, and the type may be a grid Shape, such as a metal grid. The metal line constituting the metal mesh may be between 0.8 micrometers (μm) and 10 micrometers, and may be processed by, for example, yellow lithography, printing, coating, filling metal in embossed trenches, and the like. Made. Since the metal material has a light-reflecting property, in order to reduce the adverse effect of the visual effect, an anti-resistance may be set in the first electrode 121 or the second electrode 122 composed of the metal material. The reflective layer, the low reflectivity material layer (eg, the metal oxide layer) or the light absorbing layer is adjacent to the surface of the user. On the other hand, the first microstructure M1 can deflect the reflected light on the surface of the first electrode 121 or the second electrode 122, thereby reducing the adverse effect of the reflected light. In this case, the anti-reflection layer and the low reflectivity can be omitted. Material layer or light absorbing layer, etc.

值得說明的是，在本實施例中，第一基材111與第二基材112其中至少一者包括一絕緣覆層、一硬質基板或一柔性基板。詳細而言，絕緣覆層為利用鍍膜或塗佈等方式形成之面狀膜層，其材質例如為有機絕緣材料，例如為聚亞醯胺(Polyimide)或有機絕緣光阻等。上述之硬質基板可為一硬質覆蓋板或設置於覆蓋板之下的一玻璃基板或一硬質塑膠基板。其中，顯示器之基板通常亦屬於硬質基板。上述之柔性基板可為一柔性覆蓋板或設置於覆蓋板之下的一柔性塑膠基板。柔性塑膠基板的材料例如為聚亞醯胺(Polyimide)，但不為此限。上述之硬質覆蓋板或柔性覆蓋板上可設置有一裝飾層(未圖示)。上述之顯示器之基板可包括顯示器之上基板，例如一液晶顯示器之彩色濾光基板或一有機發光顯示器之封裝蓋等。第一黏合層141可包括光學膠(optical clear adhesive,OCA)、感壓膠(pressure sensitive adhesive,PSA)、光學樹脂(optical resin)或其他適合之黏合材料。 It should be noted that, in this embodiment, at least one of the first substrate 111 and the second substrate 112 includes an insulating coating, a rigid substrate or a flexible substrate. Specifically, the insulating coating layer is a planar film layer formed by plating or coating, and the material thereof is, for example, an organic insulating material, for example, a polyimide or an organic insulating photoresist. The hard substrate may be a hard cover plate or a glass substrate or a rigid plastic substrate disposed under the cover plate. Among them, the substrate of the display usually also belongs to a hard substrate. The flexible substrate may be a flexible cover plate or a flexible plastic substrate disposed under the cover plate. The material of the flexible plastic substrate is, for example, Polyimide, but is not limited thereto. A decorative layer (not shown) may be disposed on the hard cover sheet or the flexible cover sheet. The substrate of the above display may include a substrate above the display, such as a color filter substrate of a liquid crystal display or a package cover of an organic light emitting display. The first adhesive layer 141 may include an optical clear adhesive (OCA), a pressure sensitive adhesive (PSA), an optical resin, or other suitable bonding material.

如第1圖至第3圖所示，藉由將第一電極121形成為非平面結構，第一電極121即具有一特定之立體型態以形成較大的表面積，從而增加第一電極121與第二電極122之間的電容效應(亦即實現出更多的電力線)，從而有利於基於互容式測量原理之控制器的座標運算。因此，當一觸碰物，例如手指，觸碰第一基材111之第二面111B時，可帶走更多的電力線，使得第一電極121與第二電極122之間的電容感應量的變化差異更明顯，藉此達到提升觸控操作靈敏度的效果。 As shown in FIGS. 1 to 3, by forming the first electrode 121 into a non-planar structure, the first electrode 121 has a specific solid state to form a large surface area, thereby increasing the first electrode 121 and The capacitive effect between the second electrodes 122 (ie, achieving more power lines) facilitates the coordinate operation of the controller based on the mutual capacitance measurement principle. Therefore, when a touch object, such as a finger, touches the second side 111B of the first substrate 111, more power lines can be taken away, so that the capacitance between the first electrode 121 and the second electrode 122 is induced. The difference in variation is more obvious, thereby achieving the effect of improving the sensitivity of the touch operation.

另一方面，本發明的電容式觸控裝置101還可實現多次元(或稱為多層次)之觸控操作。詳細而言，本實施例之第一基材111較佳可為柔性基板，而第二基材112可為玻璃基板、硬質塑膠基板或柔性塑膠基板，但並不以此為限。當第二基材112為柔性塑膠基板時，第二基材112可選自與第一基材111具有不同受壓變形量的材質。或者，第二基材112與第一基材111可為相同材質，但第二基材112受到下方顯示器或其他硬質基板支撐。第一黏合層141則為具有彈性的絕緣材質，使第一基材111被下壓後能夠回復，例如光學膠，但不為此限。如第1圖與第2圖所示，本實施例的電容式觸控裝置101的第一電極121與第二電極122之間相隔一可變動距離D，依據手指按壓的力道，第一基材111將產生對應的形變量，並使得第一電極121與第二電極122之間於一垂直投影方向Z上的距離D對應縮小，進而在手指的覆蓋區域中，第一電極121與第二電極122之間的電容感應量將根據距離D的縮小而有對應增加的變化。再者，藉由在電容式觸控裝置101中設置非平面電極(即第一電極121)，觸碰物對電容式觸控裝置101施加的不同力道與其所對應的電容感應變化之間的差異可被突顯出來。換言之，本實施例之電容式觸控裝置101可提高不同力道之間的分辨率，而可實現更多次元(多層次)之觸控操作。換句話說，本實施例之電容式觸控裝置101亦可被視為一按壓式電容觸控裝置。需注意的是，本實施例中雖然繪示以第一基材111的第二面111B作為使用者的操作碰觸面，但本發明不為此限。於不同的實施例中，亦可以以第二基材112的第四面112B作為使用者的操作碰觸面，此時第二基材112較佳可為柔性基板，而第一基材111可為玻璃基板、硬質塑膠基板或柔性塑膠基板。亦即，第一基材111與第二基材112的選用原則與上述相反，使得第一電極121與第二電極122之間的距離D可經受壓對應縮小，並且第二基材112被下壓後能夠回復。 On the other hand, the capacitive touch device 101 of the present invention can also implement a multi-element (or multi-level) touch operation. In detail, the first substrate 111 of the present embodiment may preferably be a flexible substrate, and the second substrate 112 may be a glass substrate, a rigid plastic substrate or a flexible plastic substrate, but is not limited thereto. When the second substrate 112 is a flexible plastic substrate, the second substrate 112 may be selected from materials having different compressive deformation amounts from the first substrate 111. Alternatively, the second substrate 112 and the first substrate 111 may be the same material, but the second substrate 112 is supported by the lower display or other rigid substrate. The first adhesive layer 141 is an elastic insulating material, so that the first substrate 111 can be recovered after being pressed down, for example, optical glue, but not limited thereto. As shown in FIG. 1 and FIG. 2 , the first electrode 121 and the second electrode 122 of the capacitive touch device 101 of the present embodiment are separated by a variable distance D, and the first substrate is pressed according to the force of the finger pressing. 111 will generate a corresponding shape variable, and make the distance D between the first electrode 121 and the second electrode 122 in a vertical projection direction Z correspondingly reduced, and in the coverage area of the finger, the first electrode 121 and the second electrode The amount of capacitance sensing between 122 will have a correspondingly increased change depending on the reduction in distance D. Moreover, by providing a non-planar electrode (ie, the first electrode 121) in the capacitive touch device 101, the difference between the different force applied by the touch object to the capacitive touch device 101 and the corresponding capacitive change thereof Can be highlighted. In other words, the capacitive touch device 101 of the present embodiment can improve the resolution between different power channels, and can realize more dimensional (multi-level) touch operations. In other words, the capacitive touch device 101 of the present embodiment can also be regarded as a push-type capacitive touch device. It should be noted that, in the embodiment, the second surface 111B of the first substrate 111 is used as the operation touch surface of the user, but the invention is not limited thereto. In a different embodiment, the fourth surface 112B of the second substrate 112 can also be used as a touch surface of the user. In this case, the second substrate 112 can be a flexible substrate, and the first substrate 111 can be It is a glass substrate, a rigid plastic substrate or a flexible plastic substrate. That is, the selection principle of the first substrate 111 and the second substrate 112 is opposite to the above, so that the distance D between the first electrode 121 and the second electrode 122 can be subjected to pressure corresponding reduction, and the second substrate 112 is Can be restored after pressing down.

本實施例之第一微結構M1為一弧面凸起，但本發明並不以此為 限，第一微結構M1亦可視需要設計為弧面凹槽、錐狀凹槽、錐狀凸起或其他適合形狀之凸起或凹槽結構，用以使得第一電極121可具有適合的立體形狀來產生所需之電性效果。第一微結構M1的形成方式可視第一基材111的材料型態而變化。舉例來說，當第一基材111為一玻璃基板或一玻璃覆蓋板時，可利用熔融壓模的方式直接形成第一微結構M1於表面；或者，第一基材111可由一第一底材111C以及一第一絕緣層111D堆疊設置所構成，且第一面111A包括第一絕緣層111D之表面，藉由對第一絕緣層111D進行黃光製程、蝕刻製程或雷射加工等方式定義出第一微結構M1的圖案。當第一基材111為一塑膠基板或一塑膠覆蓋板時，可利用熱壓、射出、壓鑄、吸塑、擠壓等方式直接形成第一微結構M1於表面。換句話說，在本發明之各實施例中均可視需要使用單一材料之第一基材111或使用由第一底材111C以及第一絕緣層111D所構成之第一基材111。第一底材111C可包括絕緣覆層、硬質基板或柔性基板。此外，當電容式觸控裝置101係用以與顯示器整合時，第一基材為透明絕緣材質，各第一微結構M1之高度H或深度較佳係大於或等於0.5微米且小於或等於1微米，各第一微結構M1之直徑與相鄰第一微結構M1的間距較佳係大於0.8微米，例如第一微結構M1之直徑與間距可為3微米，但並不以此為限。藉此，可使得不同角度的光線進入電容式觸控裝置101時的光路徑有不同的偏折程度而將光線散射開，以降低第一電極121與第二電極122之圖案的可視性。 The first microstructure M1 of this embodiment is a curved surface protrusion, but the present invention does not The first microstructure M1 can also be designed as a curved groove, a tapered groove, a tapered protrusion or other suitable shape convex or groove structure, so that the first electrode 121 can have a suitable three-dimensional shape. Shape to produce the desired electrical effect. The manner in which the first microstructures M1 are formed may vary depending on the material type of the first substrate 111. For example, when the first substrate 111 is a glass substrate or a glass cover plate, the first microstructure M1 may be directly formed on the surface by means of a melt stamper; or the first substrate 111 may be a first bottom The material 111C and a first insulating layer 111D are stacked, and the first surface 111A includes a surface of the first insulating layer 111D, which is defined by performing a yellow light process, an etching process, or a laser process on the first insulating layer 111D. A pattern of the first microstructure M1 is drawn. When the first substrate 111 is a plastic substrate or a plastic cover plate, the first microstructure M1 can be directly formed on the surface by hot pressing, injection, die casting, blistering, extrusion, or the like. In other words, in each of the embodiments of the present invention, it is possible to use the first substrate 111 of a single material or the first substrate 111 composed of the first substrate 111C and the first insulating layer 111D. The first substrate 111C may include an insulating coating, a rigid substrate, or a flexible substrate. In addition, when the capacitive touch device 101 is used to integrate with the display, the first substrate is a transparent insulating material, and the height H or depth of each of the first microstructures M1 is preferably greater than or equal to 0.5 micrometers and less than or equal to one. The diameter of each of the first microstructures M1 and the spacing of the adjacent first microstructures M1 is preferably greater than 0.8 micrometers. For example, the diameter and spacing of the first microstructures M1 may be 3 micrometers, but not limited thereto. Thereby, the light paths of the different angles of light entering the capacitive touch device 101 can be deflected by different degrees of deflection to reduce the visibility of the patterns of the first electrode 121 and the second electrode 122.

進一步而言，為了提高不同力道之間的分辨率，如第3圖所示，本實施例之第一電極121可包括複數條第一軸向電極121X沿一第一方向X延伸並彼此互相平行設置，第二電極122可包括複數條第二軸向電極122Y沿一第二方向Y延伸並彼此互相平行設置。第一方向X較佳係大體上垂直第二方向Y，但並不以此為限。第一軸向電極121X係與第二軸向電極122Y互相交錯且絕緣設置。其中，各第一軸向電極121X與對應之一第二軸向電極 122Y相互重疊的面積至少為1毫米平方。進一步地，各第二軸向電極122Y的線寬可至少為對應重疊的第一軸向電極121X的線寬的兩倍。藉由第一微結構M1之設置，可增加第一軸向電極121X之邊緣與第二軸向電極122Y之間的電力線，進而使得觸控操作時的電容變化量更為顯著，而可提升觸控靈敏度。本實施例的第一微結構M1是以固定間隔規則地排列，然而，在不同的應用中，第一微結構M1可視需求而有不同的分布形式。舉例而言，在提升觸控靈敏度的一實施例中，第一微結構M1僅對應分布於第一軸向電極121X的邊緣，更佳地，第一微結構M1僅對應分布於第一軸向電極121X的邊緣中與第二軸向電極122Y重疊的區域，亦即，第一軸向電極121X僅在邊緣的至少一部份具有立體結構而具有非平面表面，而其餘部分則為平面結構。值得說明的是，本實施例之第一電極121與第二電極122的型態並不以上述之第一軸向電極121X與第二軸向電極122Y為限，亦可視需要具有其他形狀之電極分布。 Further, in order to improve the resolution between different force paths, as shown in FIG. 3, the first electrode 121 of the embodiment may include a plurality of first axial electrodes 121X extending along a first direction X and parallel to each other. It is provided that the second electrode 122 may include a plurality of second axial electrodes 122Y extending along a second direction Y and disposed parallel to each other. The first direction X is preferably substantially perpendicular to the second direction Y, but is not limited thereto. The first axial electrode 121X and the second axial electrode 122Y are interleaved and insulated from each other. Wherein each of the first axial electrodes 121X and one of the corresponding second axial electrodes The area where 122Y overlaps is at least 1 mm square. Further, the line width of each of the second axial electrodes 122Y may be at least twice the line width of the corresponding first axial electrodes 121X. By the arrangement of the first microstructure M1, the power line between the edge of the first axial electrode 121X and the second axial electrode 122Y can be increased, thereby making the capacitance change during the touch operation more significant, and the touch can be improved. Control sensitivity. The first microstructures M1 of the present embodiment are regularly arranged at regular intervals, however, in different applications, the first microstructures M1 may have different distribution forms depending on the requirements. For example, in an embodiment in which the touch sensitivity is improved, the first microstructures M1 are only correspondingly distributed on the edges of the first axial electrodes 121X. More preferably, the first microstructures M1 are only correspondingly distributed in the first axis. The region of the edge of the electrode 121X that overlaps the second axial electrode 122Y, that is, the first axial electrode 121X has a three-dimensional structure only at least a portion of the edge and has a non-planar surface, while the remaining portion has a planar structure. It should be noted that the first electrode 121 and the second electrode 122 of the embodiment are not limited to the first axial electrode 121X and the second axial electrode 122Y, and may have other shapes as needed. distributed.

如第4圖所示，各第一軸向電極121X可包括複數個第一子電極X1沿第一方向X排列並互相電性連接，而各第二軸向電極122Y可包括複數個第二子電極Y1沿第二方向Y排列並互相電性連接。至少第一子電極X1的邊緣覆蓋第一微結構M1，用以增加第一子電極X1與第二子電極Y1之間的邊緣電力線，進而使得觸控操作時的電容變化量更為顯著，藉以提升觸控靈敏度。本實施例中，第一子電極X1與第二子電極Y1為菱形，且第一子電極X1與第二子電極Y1於垂直投影方向Z不相互重疊，但不為此限。此外，如第5圖所示，第一電極121與第二電極122亦可皆設置於第一基材111的第一面111A上而共平面且互相電性絕緣，而至少第一電極121的邊緣覆蓋第一微結構M1，用以增加第一電極121與第二電極122之間的邊緣電力線，但並不以此為限。 As shown in FIG. 4, each of the first axial electrodes 121X may include a plurality of first sub-electrodes X1 arranged in the first direction X and electrically connected to each other, and each of the second axial electrodes 122Y may include a plurality of second sub-electrodes. The electrodes Y1 are arranged in the second direction Y and electrically connected to each other. At least the edge of the first sub-electrode X1 covers the first microstructure M1 for increasing the edge power line between the first sub-electrode X1 and the second sub-electrode Y1, thereby making the capacitance change during the touch operation more significant. Improve touch sensitivity. In this embodiment, the first sub-electrode X1 and the second sub-electrode Y1 are rhombic, and the first sub-electrode X1 and the second sub-electrode Y1 do not overlap each other in the vertical projection direction Z, but are not limited thereto. In addition, as shown in FIG. 5 , the first electrode 121 and the second electrode 122 may also be disposed on the first surface 111A of the first substrate 111 to be coplanar and electrically insulated from each other, and at least the first electrode 121 The edge covers the first microstructure M1 for increasing the edge power line between the first electrode 121 and the second electrode 122, but is not limited thereto.

藉由第一電極121與第二電極122，如果有導電物體(例如手指)接近或接觸電容式觸控裝置101的表面，物體將與相靠近的第一電極121與第二電極122之間形成耦合電容，從而在物體接近或接觸區域發生電容效應的變化，以偵測物體的位置或移動等。另外，關於電容式觸控裝置的觸點座標相關測量方法可參考目前熟知的觸點座標測量方法，例如互電容測量方法，然而本發明並不受特定測量方法所限制。 By the first electrode 121 and the second electrode 122, if a conductive object (such as a finger) approaches or contacts the surface of the capacitive touch device 101, the object will form between the first electrode 121 and the second electrode 122 that are adjacent to each other. Coupling capacitors to change the capacitive effect in the approach or contact area of the object to detect the position or movement of the object. In addition, regarding the contact coordinate related measuring method of the capacitive touch device, reference may be made to a currently known contact coordinate measuring method, such as a mutual capacitance measuring method, but the present invention is not limited by a specific measuring method.

本發明之電容式觸控裝置並不以上述實施例為限。下文將依序介紹本發明之其它較佳實施例之電容式觸控裝置，且為了便於比較各實施例之相異處並簡化說明，在下文之各實施例中使用相同的符號標注相同的元件，且主要針對各實施例之相異處進行說明，而不再對重覆部分進行贅述。 The capacitive touch device of the present invention is not limited to the above embodiment. The capacitive touch device of other preferred embodiments of the present invention will be sequentially described below, and in order to facilitate the comparison of the different embodiments and simplify the description, the same symbols are used to mark the same components in the following embodiments. And the description of the differences between the embodiments is mainly made, and the repeated parts are not described again.

請參考第6圖。第6圖繪示了本發明之第二實施例之電容式觸控裝置102的示意圖。如第6圖所示，與上述第一實施例不同的地方在於，第二基材112之第三面112A係面對第一基材111之第二面111B，且電容式觸控裝置102更包括一覆蓋板130、一裝飾層131以及一第二黏合層142。覆蓋板130具有一第五面130A以及一相反之第六面130B，第一基材111與第二基材112係設置於第六面130B之一側，且第一基材111係設置於覆蓋板130與第二基材112之間。覆蓋板130係用以保護第一電極121以及第二電極122。裝飾層131係設置於覆蓋板130之第六面130B上，由於使用者係從覆蓋板130之第五面130A之一側觀看與操作，藉此可提供電容式觸控裝置102裝飾與遮蔽效果。根據裝飾層131的設置位置，電容式觸控裝置102可具有一透光區與一遮光區。裝飾層131對應遮光區。遮光區與透光區鄰接。透光區可與例如液晶顯示元件或有機發光二極體顯示元件等顯示元件對應配置，而遮光區則可與非用以顯示而需遮蔽的元件對應配置，此類元件例如為可視 的訊號導線121T。第二黏合層142係設置於覆蓋板130與第一基材111之間，用以黏合覆蓋板130與第一基材111。覆蓋板130可為硬質或柔性，其材質為透明材料，但不以此為限。舉例而言，覆蓋板130可為強化玻璃、聚甲基丙烯酸甲酯(Poly(methyl methacrylate)；PMMA)與聚碳酸酯(Polycarbonate；PC)的複合疊層、紫外線固化型樹脂(例如ORGA樹脂)或其他硬質透光材質以具備耐刮、高機械強度等保護特性。其中，若欲使電容式觸控裝置102可實現多次元(多層次)之觸控操作，覆蓋板130應選擇柔性覆蓋板。另外，覆蓋板130的第五面130A還可以選擇性地配置有例如抗眩膜或抗反射膜等膜層，上述膜層的厚度小於覆蓋板130。進一步地，覆蓋板130連接第五面130A的側表面可以具有弧面(即2.5D Cover lens)，以增加覆蓋板130的邊緣強度。裝飾層131係由抗光材質所構成，所述抗光材質定義為光通過其介面會發生損失的材質，以用於遮蔽裝置中不欲被看到的元件或光。舉例而言，裝飾層131可用以遮蔽設置於遮光區中的複數條可視的訊號導線121T。 Please refer to Figure 6. FIG. 6 is a schematic diagram of a capacitive touch device 102 according to a second embodiment of the present invention. As shown in FIG. 6, the difference from the first embodiment is that the third surface 112A of the second substrate 112 faces the second surface 111B of the first substrate 111, and the capacitive touch device 102 further A cover plate 130, a decorative layer 131 and a second adhesive layer 142 are included. The cover plate 130 has a fifth surface 130A and an opposite sixth surface 130B. The first substrate 111 and the second substrate 112 are disposed on one side of the sixth surface 130B, and the first substrate 111 is disposed on the cover. The plate 130 is interposed between the second substrate 112. The cover plate 130 is for protecting the first electrode 121 and the second electrode 122. The decorative layer 131 is disposed on the sixth surface 130B of the cover plate 130. Since the user views and operates from one side of the fifth surface 130A of the cover plate 130, the decorative and shielding effect of the capacitive touch device 102 can be provided. . The capacitive touch device 102 can have a light transmissive area and a light blocking area according to the position of the decorative layer 131. The decorative layer 131 corresponds to a light shielding area. The light shielding area is adjacent to the light transmission area. The light-transmitting region may be disposed corresponding to a display element such as a liquid crystal display element or an organic light-emitting diode display element, and the light-shielding region may be configured corresponding to an element not to be displayed for shielding, such as being visible. Signal conductor 121T. The second adhesive layer 142 is disposed between the cover plate 130 and the first substrate 111 for bonding the cover plate 130 and the first substrate 111. The cover plate 130 may be rigid or flexible, and the material is transparent, but not limited thereto. For example, the cover sheet 130 may be a tempered glass, a composite laminate of poly(methyl methacrylate); PMMA and polycarbonate (PC), and an ultraviolet curable resin (for example, ORGA resin). Or other hard light-transmissive materials with scratch resistance, high mechanical strength and other protective properties. Wherein, if the capacitive touch device 102 is to implement a multi-element (multi-level) touch operation, the cover plate 130 should select a flexible cover plate. In addition, the fifth surface 130A of the cover plate 130 may be selectively disposed with a film layer such as an anti-glare film or an anti-reflection film, and the film layer has a thickness smaller than that of the cover plate 130. Further, the side surface of the cover plate 130 connecting the fifth face 130A may have a curved surface (ie, a 2.5D cover lens) to increase the edge strength of the cover plate 130. The decorative layer 131 is composed of a light-resistant material defined as a material through which light is lost through its interface for shielding elements or light that are not to be seen in the device. For example, the decorative layer 131 can be used to shield a plurality of visible signal wires 121T disposed in the light shielding region.

值得說明的是，上述第一實施例之電容式觸控裝置亦可視需要設置如本實施例之覆蓋板130、裝飾層131以及第二黏合層142。其中，若欲使電容式觸控裝置可實現多次元(多層次)之觸控操作，覆蓋板130應選擇柔性覆蓋板，且於其他以第一基材111作為覆蓋板的實施例中，裝飾層131亦可選擇性設置於第一基材111上。此外，本實施例之電容式觸控裝置102可更包括一顯示器150以及一第三黏合層143，以構成外掛式觸控顯示裝置。第三黏合層143係設置於第二基材112與顯示器150之間，用以黏合第二基材112與顯示器150。進一步地，於一未繪示的變化實施例中，第二基材112可為顯示器150之上基板，例如彩色濾光基板，且第三黏合層143可以被省略。第二黏合層142與第三黏合層143可包括固態光學膠(optical clear adhesive,OCA)、感壓膠(pressure sensitive adhesive,PSA)、光學樹脂(optical resin)或其他適合之黏合材料。顯示器150可包括液晶顯示面板、有機發光二極體(OLED) 顯示面板、電濕潤(electro-wetting)顯示面板、電子墨水(e-ink)顯示面板、電漿(plasma)顯示面板或場發射(FED)顯示面板，但並不以此為限。值得說明的是，後續或前述之本發明其他實施例之電容式觸控裝置亦可視需要與本實施例之顯示器150結合，藉以具有觸控顯示的功能。 It should be noted that the capacitive touch device of the first embodiment may also be provided with the cover plate 130, the decorative layer 131 and the second adhesive layer 142 according to the embodiment. Wherein, if the capacitive touch device can realize the multi-element (multi-level) touch operation, the cover plate 130 should select the flexible cover plate, and in other embodiments in which the first substrate 111 is used as the cover plate, the decoration The layer 131 can also be selectively disposed on the first substrate 111. In addition, the capacitive touch device 102 of the present embodiment further includes a display 150 and a third adhesive layer 143 to form an external touch display device. The third adhesive layer 143 is disposed between the second substrate 112 and the display 150 for bonding the second substrate 112 and the display 150. Further, in a variant embodiment not shown, the second substrate 112 may be a substrate above the display 150, such as a color filter substrate, and the third adhesive layer 143 may be omitted. The second adhesive layer 142 and the third adhesive layer 143 may include an optical clear adhesive (OCA), a pressure sensitive adhesive (PSA), an optical resin, or other suitable bonding materials. The display 150 may include a liquid crystal display panel, an organic light emitting diode (OLED) A display panel, an electro-wetting display panel, an e-ink display panel, a plasma display panel, or a field emission (FED) display panel, but is not limited thereto. It is to be noted that the capacitive touch device of the other embodiments of the present invention may be combined with the display 150 of the present embodiment as needed to provide a touch display function.

請參考第7圖。第7圖繪示了本發明之第三實施例之電容式觸控裝置103的示意圖。如第7圖所示，與上述第二實施例不同的地方在於，本實施例之第二基材112之第四面112B係面對第一基材111之第一面111A，且第二基材112係設置於第一基材111與覆蓋板130之間。第二黏合層142設置於覆蓋板130與第二基材112之間。值得說明的是，本實施例之第一基材111較佳係為顯示器151之上基板。藉此，不需設置上述之第三黏合層而有利於整體裝置的輕薄化。舉例來說，當顯示器151為液晶顯示器時，第一基材111較佳可為一彩色濾光基板或一薄膜電晶體陣列基板；當顯示器151為有機發光顯示器時，第一基材111較佳可為一封裝蓋，但並不以此為限。 Please refer to Figure 7. FIG. 7 is a schematic diagram of a capacitive touch device 103 according to a third embodiment of the present invention. As shown in FIG. 7, the difference from the second embodiment is that the fourth surface 112B of the second substrate 112 of the present embodiment faces the first surface 111A of the first substrate 111, and the second base The material 112 is disposed between the first substrate 111 and the cover plate 130. The second adhesive layer 142 is disposed between the cover plate 130 and the second substrate 112. It should be noted that the first substrate 111 of the embodiment is preferably a substrate above the display 151. Thereby, it is not necessary to provide the third adhesive layer described above, which is advantageous for thinning and thinning of the entire device. For example, when the display 151 is a liquid crystal display, the first substrate 111 may preferably be a color filter substrate or a thin film transistor array substrate; when the display 151 is an organic light emitting display, the first substrate 111 is preferably It can be a package cover, but it is not limited to this.

請參考第8圖。第8圖繪示了本發明之第四實施例之電容式觸控裝置104的示意圖。如第8圖所示，與上述第三實施例不同的地方在於，本實施例之第二基材112之第三面112A具有複數個第二微結構M2，各第二微結構M2包括一凸起或一凹槽，換句話說，第二微結構M2之表面係定義為第二基材112之第三面112A的至少一部分。第二電極122係至少部分覆蓋第二微結構M2。也就是說，本實施例之第二電極122具有非平面表面。本實施例中，各第二微結構M2之凸起與各第一微結構M1之凸起相對應，但不以此為限。於一些不同的應用中，各第二微結構M2之凸起與各第一微結構M1之凸起係相互錯開。第二微結構M2的結構特徵以及形成方式係與上述第一微結構M1相似，故在此並不再贅述。 Please refer to Figure 8. FIG. 8 is a schematic diagram of a capacitive touch device 104 according to a fourth embodiment of the present invention. As shown in FIG. 8, the difference from the third embodiment is that the third surface 112A of the second substrate 112 of the embodiment has a plurality of second microstructures M2, and each of the second microstructures M2 includes a protrusion. Or a groove, in other words, the surface of the second microstructure M2 is defined as at least a portion of the third face 112A of the second substrate 112. The second electrode 122 at least partially covers the second microstructure M2. That is, the second electrode 122 of the present embodiment has a non-planar surface. In this embodiment, the protrusions of the second microstructures M2 correspond to the protrusions of the first microstructures M1, but are not limited thereto. In some different applications, the protrusions of each of the second microstructures M2 are offset from the protrusions of the first microstructures M1. The structural features and formation manner of the second microstructure M2 are similar to those of the first microstructure M1 described above, and thus are not described herein again.

請參考第9圖。第9圖繪示了本發明之第五實施例之電容式觸控裝置201的示意圖。如第9圖所示，與上述第二實施例不同的地方在於，本實施例之第二電極122係設置於第一基材111之第二面111B上，且第一基材111之第二面111B係面對覆蓋板130。也就是說，本實施例之電容式觸控裝置201可省略上述之第二基材，直接將第一電極121與第二電極122分別形成於第一基材111之第一面111A與第二面111B上，再藉由第二黏合層142黏合覆蓋板130與第一基材111而形成電容式觸控裝置201。此外，本實施例之第一微結構M1較佳係藉由直接對第一基材111進行加工而形成，但並不以此為限。需注意的是，本實施例中雖然以第一基材111之第二面111B面對覆蓋板130，但本發明不限於此。在一未繪示的變化實施例中，第一基材111之第一面111A係面對覆蓋板130，而第一電極121係設置於覆蓋板130與第二電極122之間。另外，若欲使電容式觸控裝置201可實現多次元(多層次)之觸控操作，第一基材111較佳為具有彈性的絕緣材質。 Please refer to Figure 9. FIG. 9 is a schematic diagram of a capacitive touch device 201 according to a fifth embodiment of the present invention. As shown in FIG. 9, the difference from the second embodiment is that the second electrode 122 of the embodiment is disposed on the second surface 111B of the first substrate 111, and the second substrate 111 is second. The face 111B faces the cover plate 130. In other words, the capacitive touch device 201 of the present embodiment can omit the second substrate and directly form the first electrode 121 and the second electrode 122 on the first surface 111A and the second surface of the first substrate 111, respectively. On the surface 111B, the cover plate 130 and the first substrate 111 are bonded by the second adhesive layer 142 to form the capacitive touch device 201. In addition, the first microstructure M1 of the present embodiment is preferably formed by directly processing the first substrate 111, but is not limited thereto. It should be noted that in the present embodiment, although the second surface 111B of the first substrate 111 faces the cover sheet 130, the present invention is not limited thereto. In a variant embodiment not shown, the first surface 111A of the first substrate 111 faces the cover plate 130, and the first electrode 121 is disposed between the cover plate 130 and the second electrode 122. In addition, if the capacitive touch device 201 is to implement a multi-element (multi-level) touch operation, the first substrate 111 is preferably an elastic insulating material.

請參考第10圖。第10圖繪示了本發明之第六實施例之電容式觸控裝置202的示意圖。如第10圖所示，與上述第五實施例不同的地方在於，本實施例之第一基材111的第二面111B更具有複數個第三微結構M3，各第三微結構M3包括一凸起或一凹槽。第一基材111之第一面111A係面對覆蓋板130，而第一電極121係設置於覆蓋板130與第二電極122之間。第二電極122係至少部分覆蓋第二面111B的第三微結構M3。也就是說，本實施例之第二電極122具有非平面表面。舉例而言，第二面111B的各第三微結構M3之凸起可與各第一微結構M1之凸起相對應，但不以此為限。於一些不同的應用中，第二面111B的各第三微結構M3之凸起與各第一微結構M1之凸起係相互錯開。第三微結構M3的結構特徵以及形成方式係與上述第一微結構M1相似，故在此並不再贅述。 Please refer to Figure 10. FIG. 10 is a schematic diagram of a capacitive touch device 202 according to a sixth embodiment of the present invention. As shown in FIG. 10, the difference from the fifth embodiment is that the second surface 111B of the first substrate 111 of the embodiment further has a plurality of third microstructures M3, and each of the third microstructures M3 includes one. Raised or a groove. The first surface 111A of the first substrate 111 faces the cover plate 130, and the first electrode 121 is disposed between the cover plate 130 and the second electrode 122. The second electrode 122 is at least partially covering the third microstructure M3 of the second face 111B. That is, the second electrode 122 of the present embodiment has a non-planar surface. For example, the protrusions of the third microstructures M3 of the second surface 111B may correspond to the protrusions of the first microstructures M1, but are not limited thereto. In some different applications, the protrusions of the third microstructures M3 of the second side 111B and the protrusions of the first microstructures M1 are offset from each other. The structural features and formation manner of the third microstructure M3 are similar to those of the first microstructure M1 described above, and thus are not described herein again.

請參考第11圖。第11圖繪示了本發明之第七實施例之電容式觸控裝置301的示意圖。如第11圖所示，與上述第五實施例不同的地方在於，本實施例之第一基材111可由第一底材111C以及第一絕緣層111D堆疊設置所構成，第一底材111C可為玻璃基板、硬質塑膠基板、柔性塑膠基板或顯示器之基板，且第一微結構M1係藉由對於第一絕緣層111D進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第一基材111具有表面不平整的第一面111A。本實施例中，第一微結構M1可為凹槽。第一絕緣層111D與第一底材111C的結合不需透過黏膠，其可藉由鍍膜或塗佈等方式形成於第一底材111C上，第一絕緣層111D可包括無機材料例如氮化矽(silicon nitride)、氧化矽(silicon oxide)與氮氧化矽(silicon oxynitride)、有機材料例如丙烯酸類樹脂(acrylic resin)或其它適合之絕緣材料。本實施例雖然以第一基材111之第二面111B面對覆蓋板130，但本發明不以此為限。於一未繪示的變化實施例中，第一基材111之第一面111A係面對覆蓋板130，而第一電極121係設置於覆蓋板130與第二電極122之間。另外，於另一未繪示的變化實施例中，與上述第六實施例雷同地，第一基材111之第二面111B可具有第三微結構，各第三微結構包括一凸起或一凹槽。各第三微結構的製作方式如同第一微結構M1，故在此並不再贅述。第二電極122係至少部分覆蓋第二面111B的第三微結構，使第二電極122具有非平面表面。舉例而言，第一微結構M1可為凹槽，第三微結構可為凸起，且第三微結構之凸起可與各第一微結構M1之凹槽相對應，但不以此為限。於一些不同的應用中，各第三微結構之凸起與各第一微結構M1之凹槽係相互錯開。 Please refer to Figure 11. FIG. 11 is a schematic view showing a capacitive touch device 301 according to a seventh embodiment of the present invention. As shown in FIG. 11 , the difference from the fifth embodiment is that the first substrate 111 of the embodiment may be formed by stacking the first substrate 111C and the first insulating layer 111D, and the first substrate 111C may be configured. The substrate is a glass substrate, a rigid plastic substrate, a flexible plastic substrate or a display, and the first microstructure M1 is defined by performing a yellow light process, an etching process, or a laser process on the first insulating layer 111D. The first substrate 111 has a first surface 111A whose surface is uneven. In this embodiment, the first microstructure M1 may be a groove. The bonding of the first insulating layer 111D and the first substrate 111C does not need to pass through the adhesive, and may be formed on the first substrate 111C by coating or coating, and the first insulating layer 111D may include an inorganic material such as nitriding. Silicon nitride, silicon oxide and silicon oxynitride, organic materials such as acrylic resins or other suitable insulating materials. In this embodiment, although the second surface 111B of the first substrate 111 faces the cover plate 130, the invention is not limited thereto. In a variant embodiment not shown, the first surface 111A of the first substrate 111 faces the cover plate 130, and the first electrode 121 is disposed between the cover plate 130 and the second electrode 122. In addition, in another variation embodiment not shown, the second surface 111B of the first substrate 111 may have a third microstructure, and each of the third microstructures includes a protrusion or a groove. Each of the third microstructures is fabricated in the same manner as the first microstructure M1, and thus will not be described again. The second electrode 122 at least partially covers the third microstructure of the second face 111B such that the second electrode 122 has a non-planar surface. For example, the first microstructure M1 may be a groove, the third microstructure may be a protrusion, and the protrusion of the third microstructure may correspond to the groove of each first microstructure M1, but not limit. In some different applications, the protrusions of each of the third microstructures are offset from the grooves of the first microstructures M1.

請參考第12圖。第12圖繪示了本發明之第八實施例之電容式觸控裝置401的示意圖。如第12圖所示，與上述第七實施例不同的地方在於，電容式觸控裝置401更包括第二基材112形成於第一電極121上，且第二基材112與第一電極121的結合不需藉由額外的黏合層。即，第二基材112的 第四面112B與第一電極121接觸。第一電極121與第二電極122均位於第一基材111與覆蓋板130之間。第一微結構M1係藉由對於第一基材111中的第一絕緣層111D進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第一基材111具有表面不平整的第一面111A。本實施例中，第一微結構M1為凸起。第一電極121的至少一部分係設置於表面不平整的第一面111A上，使第一電極121具有不平整表面。本實施例之第二基材112可由一第二底材112C以及一第二絕緣層112D堆疊設置所構成。第二底材112C為絕緣覆層所構成。進一步地，若欲使電容式觸控裝置401可實現多次元(多層次)之觸控操作，第二底材112C可為具有彈性的絕緣材質，使第二基材112被下壓後能夠回復，例如聚亞醯胺(Polyimide)，但不為此限。第二微結構M2係藉由對於第二絕緣層112D進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第二基材112具有表面不平整的第三面112A。第一電極121被第二底材112C所覆蓋，第二電極122的至少一部分形成於第二絕緣層112D構成的第二微結構M2上，使第二電極122具有不平整表面。其中，第二底材112C的厚度可大於第一微結構M1的高度或深度，以供設置第二絕緣層112D。第二電極122藉由第二黏合層142與覆蓋板130相黏合，以構成電容式觸控裝置401。需注意的是，於一變化實施例中，第二電極122的表面可為平整面，此時上述的第二絕緣層112D可被省略，第二基材112可平坦化第一電極121而提供一平坦表面給後續形成的第二電極122。進一步地，為了更輕薄化，在一未繪示的變化實施例中，第二電極122係設置於覆蓋板130之第六面130B上，即，將覆蓋板130作為第二基材，且形成有第二電極122之覆蓋板130與形成有第一電極121之第一基材111藉由第二黏合層142進行結合與電絕緣，而形成電容式觸控裝置。其中，第一基材111可為一塑膠基板，且第一微結構M1可藉由熱壓、射出、壓鑄、吸塑、擠壓等方式直接形成於第一基材111的表面。藉此，可省略前述第一絕緣層與第二基材，從而簡化工藝與降低厚度及重量。 Please refer to Figure 12. FIG. 12 is a schematic diagram of a capacitive touch device 401 according to an eighth embodiment of the present invention. As shown in FIG. 12 , the difference from the seventh embodiment is that the capacitive touch device 401 further includes a second substrate 112 formed on the first electrode 121 , and the second substrate 112 and the first electrode 121 . The combination does not require an additional bonding layer. That is, the second substrate 112 The fourth surface 112B is in contact with the first electrode 121. The first electrode 121 and the second electrode 122 are both located between the first substrate 111 and the cover plate 130. The first microstructure M1 is defined by performing a yellow light process, an etching process, or a laser process on the first insulating layer 111D in the first substrate 111, so that the first substrate 111 has a surface unevenness. The first side 111A. In this embodiment, the first microstructure M1 is a protrusion. At least a portion of the first electrode 121 is disposed on the first surface 111A whose surface is uneven, so that the first electrode 121 has an uneven surface. The second substrate 112 of this embodiment may be formed by stacking a second substrate 112C and a second insulating layer 112D. The second substrate 112C is composed of an insulating coating. Further, if the capacitive touch device 401 is to implement a multi-element (multi-level) touch operation, the second substrate 112C may be an elastic insulating material, so that the second substrate 112 can be restored after being pressed down. For example, Polyimide, but not limited to this. The second microstructure M2 is defined by performing a yellow light process, an etching process, or a laser process on the second insulating layer 112D, so that the second substrate 112 has a third surface 112A whose surface is uneven. The first electrode 121 is covered by the second substrate 112C, and at least a portion of the second electrode 122 is formed on the second microstructure M2 formed by the second insulating layer 112D, so that the second electrode 122 has an uneven surface. Wherein, the thickness of the second substrate 112C may be greater than the height or depth of the first microstructure M1 for providing the second insulating layer 112D. The second electrode 122 is bonded to the cover plate 130 by the second adhesive layer 142 to form the capacitive touch device 401. It should be noted that, in a variant embodiment, the surface of the second electrode 122 may be a flat surface, and the second insulating layer 112D may be omitted, and the second substrate 112 may planarize the first electrode 121 to provide A flat surface is applied to the subsequently formed second electrode 122. Further, in order to be more light and thin, in a variant embodiment not shown, the second electrode 122 is disposed on the sixth surface 130B of the cover plate 130, that is, the cover plate 130 is used as the second substrate, and is formed. The cover plate 130 having the second electrode 122 and the first substrate 111 formed with the first electrode 121 are combined and electrically insulated by the second adhesive layer 142 to form a capacitive touch device. The first substrate 111 can be a plastic substrate, and the first microstructure M1 can be directly formed on the surface of the first substrate 111 by hot pressing, injection, die casting, blistering, extrusion, or the like. Thereby, the aforementioned first insulating layer and the second substrate can be omitted, thereby simplifying the process and reducing the thickness and weight.

請參考第13圖。第13圖繪示了本發明之第九實施例之電容式觸控裝置402的示意圖。如第13圖所示，與上述第八實施例不同的地方在於，第一基材111係設置於第二基材112之第三面112A之一側。在本實施例中，第二基材112較佳係為一玻璃基板、一硬質塑膠基板、一柔性塑膠基板或一顯示器之基板。第二電極122、第一基材111、第一微結構M1以及第一電極121係依序形成於第二基材112上之第三面112A之一側，且第一底材111C係為一絕緣覆層直接形成在第二電極122與第二基材112上，即第一底材111C與第二基材112不須經由額外的黏合層相固定。即，第一基材111的第二面111B與第二電極122接觸。第一微結構M1係藉由對於第一絕緣層111D進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第一基材111具有表面不平整的第一面111A。較佳地，第一底材111C可為正型光阻有機絕緣材料，而用以形成第一微結構M1之第一絕緣層111D可為負型光阻有機絕緣材料，以良好地製作出第一微結構M1，但本發明不為所限。最後，利用第二黏合層142黏合覆蓋板130以及第二基材112上形成有第一電極121之一側，以構成電容式觸控裝置402。本實施例的第二基材112的表面平整，從而形成在第二基材112上的第二電極122的表面亦平整，但本發明不以此為限。於一未繪示的變化實施例中，第二基材112之第三面112A亦可以具有第二微結構，各第二微結構包括一凸起或一凹槽。各第二微結構的製作方式可如同上述第八實施例中的記載，故在此並不再贅述。第二電極122係至少部分覆蓋第三面112A的第二微結構，使第二電極122也具有非平面表面。舉例而言，第一基材111上的第一微結構M1與第二基材112之第三面112A的第二微結構可均為凸起，且各第二微結構之凸起可與各第一微結構M1之凸起相對應，但不以此為限。於一些不同的應用中，第二微結構之凸起與各第一微結構M1之凸起係相互錯開。進一步地，若欲使電容式觸控裝置402可實現多次元(多層次)之觸控操作，第一底材111C可為具有彈性的絕緣材質，使第一基材111 被下壓後能夠回復，例如聚亞醯胺(Polyimide)，但不為此限。 Please refer to Figure 13. FIG. 13 is a schematic diagram of a capacitive touch device 402 according to a ninth embodiment of the present invention. As shown in FIG. 13, the difference from the eighth embodiment described above is that the first base member 111 is provided on one side of the third surface 112A of the second base material 112. In this embodiment, the second substrate 112 is preferably a glass substrate, a rigid plastic substrate, a flexible plastic substrate or a display substrate. The second electrode 122, the first substrate 111, the first microstructure M1, and the first electrode 121 are sequentially formed on one side of the third surface 112A of the second substrate 112, and the first substrate 111C is one. The insulating coating is formed directly on the second electrode 122 and the second substrate 112, that is, the first substrate 111C and the second substrate 112 need not be fixed via an additional adhesive layer. That is, the second surface 111B of the first substrate 111 is in contact with the second electrode 122. The first microstructure M1 is defined by performing a yellow light process, an etching process, or a laser process on the first insulating layer 111D, so that the first substrate 111 has a first surface 111A whose surface is uneven. Preferably, the first substrate 111C may be a positive-type photoresist organic insulating material, and the first insulating layer 111D for forming the first microstructure M1 may be a negative-type photoresist organic insulating material, so as to be well-made. A microstructure M1, but the invention is not limited. Finally, one side of the first electrode 121 is formed on the cover plate 130 and the second substrate 112 by the second adhesive layer 142 to form the capacitive touch device 402. The surface of the second substrate 112 of the present embodiment is flat, so that the surface of the second electrode 122 formed on the second substrate 112 is also flat, but the invention is not limited thereto. In a variant embodiment not shown, the third surface 112A of the second substrate 112 may also have a second microstructure, and each of the second microstructures includes a protrusion or a groove. The manufacturing method of each of the second microstructures can be the same as that described in the eighth embodiment above, and thus will not be described herein. The second electrode 122 at least partially covers the second microstructure of the third face 112A such that the second electrode 122 also has a non-planar surface. For example, the second microstructures of the first microstructures M1 on the first substrate 111 and the third surface 112A of the second substrate 112 may both be convex, and the protrusions of the second microstructures may be The protrusion of the first microstructure M1 corresponds to, but is not limited to. In some different applications, the protrusions of the second microstructure are offset from the protrusions of each of the first microstructures M1. Further, if the capacitive touch device 402 is to implement a multi-element (multi-level) touch operation, the first substrate 111C may be an elastic insulating material to make the first substrate 111 It can be recovered after being pressed down, such as Polyimide, but not limited to this.

請參考第14圖。第14圖繪示了本發明之第十實施例之電容式觸控裝置501的示意圖。如第14圖所示，與上述第五實施例不同的地方在於，本實施例之第一基材111並未藉由黏合層與覆蓋板130相結合。更明確地說，本實施例之第一基材111係為一絕緣覆層，而第二電極122、第一基材111以及第一電極121較佳係依序形成於覆蓋板130上以形成電容式觸控裝置501。即，第一基材111的第二面111B與第二電極122接觸。本實施例之第一微結構M1係由直接對第一基材111加工所形成，但於本發明之其他實施例中，第一基材111可由一第一底材(第14圖未示)與一第一絕緣層(第14圖未示)所構成，第一微結構M1亦可藉由對於第一絕緣層進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第一基材111具有表面不平整的第一面111A。較佳地，第一底材可為正型光阻有機絕緣材料，而用以形成第一微結構M1之第一絕緣層可為負型光阻有機絕緣材料，以良好地製作出第一微結構M1，但本發明不為所限。 Please refer to Figure 14. FIG. 14 is a schematic diagram of a capacitive touch device 501 according to a tenth embodiment of the present invention. As shown in FIG. 14, the difference from the fifth embodiment is that the first substrate 111 of the present embodiment is not bonded to the cover sheet 130 by the adhesive layer. More specifically, the first substrate 111 of the present embodiment is an insulating coating, and the second electrode 122, the first substrate 111, and the first electrode 121 are preferably sequentially formed on the cover plate 130 to form Capacitive touch device 501. That is, the second surface 111B of the first substrate 111 is in contact with the second electrode 122. The first microstructure M1 of the present embodiment is formed by directly processing the first substrate 111. However, in other embodiments of the present invention, the first substrate 111 may be a first substrate (not shown in FIG. 14). And a first insulating layer (not shown in FIG. 14), the first microstructure M1 can also be defined by performing a yellow light process, an etching process, or a laser process on the first insulating layer. A substrate 111 has a first surface 111A whose surface is uneven. Preferably, the first substrate may be a positive photoresist organic insulating material, and the first insulating layer for forming the first microstructure M1 may be a negative photoresist organic insulating material to make the first micro well. Structure M1, but the invention is not limited.

請參考第15圖。第15圖繪示了本發明之第十一實施例之電容式觸控裝置502的示意圖。如第15圖所示，與上述第八實施例不同的地方在於，本實施例之第一基材111之第一底材111C係為覆蓋板130。本實施例中，第一微結構M1為凹槽，且第一微結構M1可藉由第一絕緣層111D進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第一基材111具有表面不平整的第一面111A，然而本發明不為所限。在一變化實施例中，當第一基材111為一玻璃覆蓋板時，第一微結構M1亦可利用熔融壓模的方式直接形成於第一基材111的表面，從而構成具有不平整表面的第一面111A；或者，當第一基材111為一塑膠基板或一塑膠覆蓋板時，可利用熱壓、射出、壓鑄、吸塑、擠壓等方式直接形成第一微結構M1於表面。本實施例之第二基材112係為 一絕緣覆層，即第二基材112並未藉由額外的黏合層與第一基材111相結合。即，第二基材112之第四面112B與第一電極121接觸。更明確地說，本實施例中，第一絕緣層111D、第一電極121、第二基材112與第二電極122係依序堆疊於第一底材111C上以形成電容式觸控裝置502。第二基材112構成一平坦表面使後續形成於其上的第二電極122亦具有平坦表面，且第二基材112更用以使第一電極121與第二電極122相互電絕緣。藉此，省略黏合步驟並且降低系統的厚度與重量。 Please refer to Figure 15. FIG. 15 is a schematic diagram of a capacitive touch device 502 according to an eleventh embodiment of the present invention. As shown in Fig. 15, the difference from the eighth embodiment described above is that the first substrate 111C of the first substrate 111 of the present embodiment is the cover sheet 130. In this embodiment, the first microstructure M1 is a recess, and the first microstructure M1 can be defined by a yellow light process, an etching process, or a laser process by using the first insulating layer 111D to make the first base. The material 111 has a first surface 111A whose surface is uneven, but the invention is not limited thereto. In a variant embodiment, when the first substrate 111 is a glass cover plate, the first microstructure M1 can also be directly formed on the surface of the first substrate 111 by means of a melt stamper, thereby forming an uneven surface. The first surface 111A; or when the first substrate 111 is a plastic substrate or a plastic cover plate, the first microstructure M1 can be directly formed on the surface by hot pressing, injection, die casting, plastic molding, extrusion, or the like. . The second substrate 112 of this embodiment is An insulating coating, i.e., the second substrate 112, is not bonded to the first substrate 111 by an additional bonding layer. That is, the fourth surface 112B of the second substrate 112 is in contact with the first electrode 121. More specifically, in this embodiment, the first insulating layer 111D, the first electrode 121, the second substrate 112, and the second electrode 122 are sequentially stacked on the first substrate 111C to form the capacitive touch device 502. . The second substrate 112 forms a flat surface such that the second electrode 122 subsequently formed thereon also has a flat surface, and the second substrate 112 is further used to electrically insulate the first electrode 121 from the second electrode 122. Thereby, the bonding step is omitted and the thickness and weight of the system are reduced.

請參考第16圖。第16圖繪示了本發明之第十二實施例之電容式觸控裝置503的示意圖。如第16圖所示，與上述第十一實施例不同的地方在於，本實施例之第一基材111為一絕緣覆層，形成在覆蓋板130上，且第一基材111的第一面111A具有複數個第一微結構M1。第二基材112之第三面112A具有複數個第二微結構M2，且第二電極122係至少部分覆蓋第二微結構M2，使第二電極122具有非平面表面。詳細而言，藉由在第二底材112C上形成一第二絕緣層112D上並利用黃光製程、蝕刻製程或雷射加工等方式定義出第二微結構M2，可使第二基材112具有不平整表面。較佳地，第二底材112C可為正型光阻有機絕緣材料，而用以形成第二微結構M2之第二絕緣層112D可為負型光阻有機絕緣材料，以良好地製作出第二微結構M2，但本發明不為所限。各第二微結構M2包括一凸起或一凹槽。舉例而言，第一微結構M1可為凹槽，而第二微結構M2可為凸起，且各第二微結構M2之凸起可與各第一微結構M1之凹槽相對應，但不以此為限。於一些不同的應用中，各第二微結構M2之凸起與各第一微結構M1之凹槽係相互錯開。 Please refer to Figure 16. FIG. 16 is a schematic diagram of a capacitive touch device 503 according to a twelfth embodiment of the present invention. As shown in FIG. 16, the difference from the eleventh embodiment is that the first substrate 111 of the present embodiment is an insulating coating formed on the cover plate 130, and the first substrate 111 is first. Face 111A has a plurality of first microstructures M1. The third face 112A of the second substrate 112 has a plurality of second microstructures M2, and the second electrode 122 at least partially covers the second microstructures M2 such that the second electrode 122 has a non-planar surface. In detail, the second substrate 112 can be formed by forming a second insulating layer 112D on the second substrate 112C and defining the second microstructure M2 by a yellow light process, an etching process, or a laser process. Has an uneven surface. Preferably, the second substrate 112C may be a positive-type photoresist organic insulating material, and the second insulating layer 112D for forming the second microstructure M2 may be a negative-type photoresist organic insulating material, so as to be well-made. The second microstructure M2, but the invention is not limited. Each of the second microstructures M2 includes a protrusion or a groove. For example, the first microstructure M1 may be a groove, and the second microstructure M2 may be a protrusion, and the protrusion of each second microstructure M2 may correspond to the groove of each first microstructure M1, but Not limited to this. In some different applications, the protrusions of each of the second microstructures M2 are offset from the grooves of the first microstructures M1.

請參考第17圖。第17圖繪示了本發明之第十三實施例之電容式觸控裝置601的示意圖。如第17圖所示，與上述第十一實施例不同的地方在於，本實施例之第二基材112較佳係為一玻璃基板、一硬質塑膠基板、一柔 性塑膠基板或一顯示器之基板。第一絕緣層111D、第一電極121係依序形成於第一基材111上，而形成有第一電極121之第一基材111係藉由第一黏合層141與形成有第二電極122之第二基材112結合且相絕緣而形成電容式觸控裝置601。本實施例之第二基材112的第三面112A具有複數個第二微結構M2，且第二電極122係至少部分覆蓋第二微結構M2，使第二電極122具有非平面表面，而與第一電極121的非平面表面對應設置。舉例而言，第二電極122的表面凸起可與第一電極121的凹下處對應。本實施例中，第二基材112可為一塑膠基板，第二微結構M2為凸起，且第二微結構M2可藉由熱壓、射出、壓鑄、吸塑、擠壓等方式直接形成於第二基材112的表面，但本發明不為此限。需注意的是，於一未繪示的變化實施例中，第二基材112的第三面112A可為平面而不具有第二微結構M2，從而第二電極122為平面結構。 Please refer to Figure 17. FIG. 17 is a schematic diagram of a capacitive touch device 601 according to a thirteenth embodiment of the present invention. As shown in FIG. 17, the difference from the eleventh embodiment is that the second substrate 112 of the embodiment is preferably a glass substrate, a rigid plastic substrate, and a soft substrate. A plastic substrate or a substrate for a display. The first insulating layer 111D and the first electrode 121 are sequentially formed on the first substrate 111, and the first substrate 111 on which the first electrode 121 is formed is formed by the first bonding layer 141 and the second electrode 122. The second substrate 112 is bonded and insulated to form a capacitive touch device 601. The third surface 112A of the second substrate 112 of the embodiment has a plurality of second microstructures M2, and the second electrode 122 at least partially covers the second microstructure M2, so that the second electrode 122 has a non-planar surface, and The non-planar surface of the first electrode 121 is correspondingly disposed. For example, the surface protrusion of the second electrode 122 may correspond to the recess of the first electrode 121. In this embodiment, the second substrate 112 can be a plastic substrate, the second microstructure M2 is a protrusion, and the second microstructure M2 can be directly formed by hot pressing, injection, die casting, plastic molding, extrusion, and the like. On the surface of the second substrate 112, the invention is not limited thereto. It should be noted that in a variant embodiment not shown, the third surface 112A of the second substrate 112 may be planar without the second microstructure M2, such that the second electrode 122 is a planar structure.

請參考第18圖。第18圖繪示了本發明之第十四實施例之電容式觸控裝置701的示意圖。如第18圖所示，與上述第十二實施例不同的地方在於，本實施例之電容式觸控裝置701係利用第一電極121進行二維平面的觸控感測操作甚至是懸浮(hover)觸控感測，也就是採用自容式觸控偵測原理來感測導電物體(例如手指)，藉此根據第一電極121與物體之間的電容效應變化而感測出物體位置。另一方面，第二電極122設置於第二基材112上，第二基材112例如為顯示器150中的彩色濾光基板，第二電極122可為顯示器150之共通電極(common electrode)，藉此可遮蔽顯示器150的訊號，避免顯示器150的訊號影響第一電極121的觸控偵測。本實施例中，第二基材112與第一電極121經由第一黏合層141相結合。第一黏合層141可為彈性的絕緣材質，用以使第一電極121與第二電極122之間相隔一可變動距離。第二電極122可用以與第一電極121之間形成一參考電容CR，隨著使用者的按壓力道漸增，第一黏合層141可被壓縮而使第二電極122與第一電極121之間的距離愈近，且參考電容CR愈大，藉此可感測施加於電容式觸控裝置701的壓 力，而可實現多次元之觸控操作。需注意的是，本實施例並不用以限制第二電極122與第二基材112。在其他變化實施例中，第二電極122亦可直接設置於顯示器150上或設置於顯示器150之外。即，第二基材112可不屬於顯示器150的一部份，而第二電極122設置於第二基材112上且位於第一電極121與顯示器150之間，第二電極122係電性接地以遮蔽顯示器150的訊號。 Please refer to Figure 18. FIG. 18 is a schematic diagram of a capacitive touch device 701 according to a fourteenth embodiment of the present invention. As shown in FIG. 18, the difference from the above-mentioned twelfth embodiment is that the capacitive touch device 701 of the present embodiment performs the touch sensing operation of the two-dimensional plane by using the first electrode 121 or even the hover (hover). Touch sensing, that is, using a self-capacitive touch detection principle to sense a conductive object (such as a finger), thereby sensing the position of the object according to a change in the capacitive effect between the first electrode 121 and the object. On the other hand, the second electrode 122 is disposed on the second substrate 112, the second substrate 112 is, for example, a color filter substrate in the display 150, and the second electrode 122 can be a common electrode of the display 150. This can shield the signal of the display 150 to prevent the signal of the display 150 from affecting the touch detection of the first electrode 121. In this embodiment, the second substrate 112 and the first electrode 121 are combined via the first adhesive layer 141. The first adhesive layer 141 can be an elastic insulating material for separating the first electrode 121 and the second electrode 122 by a variable distance. The second electrode 122 can be used to form a reference capacitance CR between the first electrode 121 and the first electrode 121. The first adhesive layer 141 can be compressed to make the second electrode 122 and the first electrode 121. The closer the distance is, and the larger the reference capacitance CR is, thereby sensing the pressure applied to the capacitive touch device 701. Force, and can achieve multiple touch operations. It should be noted that this embodiment is not intended to limit the second electrode 122 and the second substrate 112. In other variant embodiments, the second electrode 122 can also be disposed directly on the display 150 or disposed outside the display 150. That is, the second substrate 112 may not be part of the display 150, and the second electrode 122 is disposed on the second substrate 112 between the first electrode 121 and the display 150, and the second electrode 122 is electrically grounded. The signal of the display 150 is shielded.

請參考第19圖。第19圖繪示了本發明之第十五實施例之電容式觸控裝置801的示意圖。如第19圖所示，與上述第三實施例不同的地方在於，本實施例之第一底材111C為一顯示器850之上基板，第二電極122係形成在第一基材111的第二面111B，且不需要設置第二基材。詳細而言，顯示器850之上基板例如為一彩色濾光基板，且第一基材111的第二面111B設置有RGB光阻，而第二電極122係形成在具有RGB光阻的第二面111B上。第一微結構M1可藉由對於第一基材111中的第一絕緣層111D進行黃光製程、蝕刻製程或雷射加工等方式而被定義出，使第一基材111具有表面不平整的第一面111A，且第一面111A與第二面111B相對。第一電極121係至少部分覆蓋這些第一微結構M1，形成有第一電極121以及第二電極122之顯示器850可藉由第二黏合層142與覆蓋板130結合而形成電容式觸控裝置801。本實施例之顯示器850的特徵與上述第三實施例中的顯示器相似，故在此並不再贅述。 Please refer to Figure 19. FIG. 19 is a schematic diagram of a capacitive touch device 801 according to a fifteenth embodiment of the present invention. As shown in FIG. 19, the difference from the third embodiment is that the first substrate 111C of the embodiment is a substrate above the display 850, and the second electrode 122 is formed at the second substrate 111. Face 111B, and there is no need to provide a second substrate. In detail, the substrate above the display 850 is, for example, a color filter substrate, and the second surface 111B of the first substrate 111 is provided with RGB photoresist, and the second electrode 122 is formed on the second surface having RGB photoresist. On 111B. The first microstructures M1 can be defined by performing a yellow light process, an etching process, or a laser process on the first insulating layer 111D in the first substrate 111, so that the first substrate 111 has an uneven surface. The first surface 111A faces the first surface 111A and the second surface 111B. The first electrode 121 at least partially covers the first microstructures M1. The display 850 formed with the first electrodes 121 and the second electrodes 122 can be combined with the cover plate 130 to form the capacitive touch device 801. . The features of the display 850 of this embodiment are similar to those of the above-described third embodiment, and therefore will not be described again.

需注意的是，本發明並不限制第一基材與第二基材的形狀。前述的實施例的第一基材與第二基材亦可具有曲面結構，例如第20圖所示。另一方面，根據不同的需求，當本發明之電容式觸控裝置並非用以與顯示器整合使用時，電容式觸控裝置中所使用的元件，例如第一基材、第二基材、第一電極、第二電極與黏合層等可以不是選自透明材料。 It should be noted that the present invention does not limit the shapes of the first substrate and the second substrate. The first substrate and the second substrate of the foregoing embodiments may also have a curved surface structure, such as shown in FIG. On the other hand, when the capacitive touch device of the present invention is not used in combination with a display, the components used in the capacitive touch device, such as the first substrate, the second substrate, and the first The one electrode, the second electrode, the adhesive layer, and the like may not be selected from a transparent material.

請參考第20圖與第21圖。第20圖繪示了本發明之第十六實施例 之電容式觸控裝置901的剖面示意圖，第21圖繪示了本實施例之觸控裝置901的示意圖。本實施例之電容式觸控裝置901為一球形控制器。本實施例之第一基材111與第二基材112係分別為球形基材而包覆一中心結構920。其中，本實施例之外側基材(例如第二基材112)係為一柔性基材，藉此，當使用者以手掌握住電容式觸控裝置901時，可藉由電容式觸控裝置901的形變對各手指按壓電容式觸控裝置901的不同力道程度進行偵測。本實施例之中心結構920亦可視需要包括一觸控感應處理裝置、一無線發射裝置或一微陀螺儀裝置，藉以使得電容式觸控裝置901可另具有感測旋轉方向以及與其他外部裝置進行數據傳遞的功能。此外，電容式觸控裝置901亦可另包括具有複數個輔助凸起911的一可撓式材料層910。可撓式材料層910係覆蓋且包覆第一基材111與第二基材112，且輔助凸起911面向第二基材112。藉由設置輔助凸起911，可用以加強觸壓的效果，藉此提升觸控按壓感應的靈敏度，但並不以此為限。電容式觸控裝置901的第一電極121與第二電極122可佈置為例如為第3圖或第4圖的型態，但本發明不為所限。如第21圖所示，其透視出電容式觸控裝置901的第一電極121、第二電極122以及一天線結構940，第一電極121可分布於第一基材111之第一面111A上，第二電極122可分布於第二基材112之第三面112A上，第一電極121面對第二電極122，第一電極121與第二電極122之間的距離D可經受壓對應縮小，並且第二基材112被下壓後能夠回復，藉由本實施例的球形控制器，可對按壓位置與力道進行偵測判斷。藉由本實施例的球形控制器，透過偵測旋轉方向、按壓力道、手指的移動方式或手指按壓位置的不同，可提供更多元化的操作模式。各第一電極121與第二電極122可為一多邊形例如五邊形或六邊形，但並不以此為限。天線結構940則係設置於此球形控制器的表面而不受到第一電極121與第二電極122的遮蔽，藉此進行訊號的接收與傳遞。 Please refer to Figure 20 and Figure 21. Figure 20 illustrates a sixteenth embodiment of the present invention FIG. 21 is a schematic cross-sectional view of the capacitive touch device 901, and FIG. 21 is a schematic view of the touch device 901 of the present embodiment. The capacitive touch device 901 of this embodiment is a spherical controller. The first substrate 111 and the second substrate 112 of the present embodiment are respectively spherical substrates and coated with a central structure 920. The outer substrate (for example, the second substrate 112) is a flexible substrate, so that when the user grasps the capacitive touch device 901 by hand, the capacitive touch device can be used. The deformation of 901 detects the different degrees of force of each finger pressing capacitive touch device 901. The central structure 920 of the embodiment may also include a touch sensing processing device, a wireless transmitting device or a micro gyroscope device, so that the capacitive touch device 901 can further sense the rotating direction and perform with other external devices. The function of data transfer. In addition, the capacitive touch device 901 can further include a flexible material layer 910 having a plurality of auxiliary protrusions 911. The flexible material layer 910 covers and covers the first substrate 111 and the second substrate 112, and the auxiliary protrusion 911 faces the second substrate 112. By providing the auxiliary protrusion 911, the effect of the touch pressure can be enhanced, thereby improving the sensitivity of the touch pressing induction, but not limited thereto. The first electrode 121 and the second electrode 122 of the capacitive touch device 901 may be arranged, for example, in the form of FIG. 3 or FIG. 4, but the invention is not limited thereto. As shown in FIG. 21, the first electrode 121, the second electrode 122, and an antenna structure 940 of the capacitive touch device 901 are seen through, and the first electrode 121 is distributed on the first surface 111A of the first substrate 111. The second electrode 122 may be distributed on the third surface 112A of the second substrate 112. The first electrode 121 faces the second electrode 122, and the distance D between the first electrode 121 and the second electrode 122 may be subjected to pressure correspondence. The reduction and the second substrate 112 can be restored after being pressed down. With the spherical controller of the embodiment, the detection position of the pressing position and the force can be determined. With the spherical controller of the embodiment, a more diversified operation mode can be provided by detecting the rotation direction, the pressure stroke, the movement of the finger, or the position of the finger pressing. Each of the first electrodes 121 and the second electrodes 122 may be a polygon such as a pentagon or a hexagon, but is not limited thereto. The antenna structure 940 is disposed on the surface of the spherical controller without being shielded by the first electrode 121 and the second electrode 122, thereby receiving and transmitting signals.

請參考第20圖與第22圖。第22圖繪示了本發明之第十七實施例 之電容式觸控裝置902的示意圖。第20圖可視為沿第22圖中的A-A’剖線所繪示之剖面圖。如第20圖與第22圖所示，與上述第十六實施例不同的地方在於，本實施例之第一基材111與第二基材112係分別為包覆中心結構920的一柱狀基材，故本實施例之電容式觸控裝置902可被視為一柱狀的握把形控制器。此柱狀的握把控制器上可設置有複數個按壓區950，各按壓區950可設計成與不同的手指位置互相對應，用以使不同位置被按壓時的狀況可被區分，而不同按壓區950可對應不同的引發功能，藉此達到控制器的效果。 Please refer to Figure 20 and Figure 22. Figure 22 is a seventeenth embodiment of the present invention A schematic diagram of a capacitive touch device 902. Fig. 20 can be regarded as a cross-sectional view taken along the line A-A' in Fig. 22. As shown in FIG. 20 and FIG. 22, the difference from the sixteenth embodiment is that the first substrate 111 and the second substrate 112 of the present embodiment are respectively a columnar shape of the center structure 920. The capacitive touch device 902 of the present embodiment can be regarded as a columnar grip type controller. The columnar grip controller may be provided with a plurality of pressing regions 950, and each pressing region 950 may be designed to correspond to different finger positions, so that the conditions when different positions are pressed may be distinguished, and different pressing The zone 950 can correspond to different triggering functions, thereby achieving the effect of the controller.

請參考第23圖。第23圖繪示了本發明之第十八實施例之電容式觸控裝置903的示意圖。如第23圖所示，本實施例之電容式觸控裝置903可為一開關控制器，例如水龍頭的開關控制器。由於按壓時會改變第一電極121與第二電極122之間的距離D，第一電極121與第二電極122之間的電容感應量將根據距離D的縮小而有對應增加的變化。換言之，本實施例之電容式觸控裝置903可提高不同力道之間的分辨率，而可實現更多次元(多層次)之觸控操作。因此，即使當此水龍頭的開關控制器上有水滴而可能影響電容式感測的狀況，但仍可藉由按壓的方式來確認此開關被按之動作。此外，亦可藉由按壓力道來決定水流量，增加此開關控制器的穩定性與多功能性。此外，本實施例之第一電極121與第二電極122的細部結構特徵可與上述第1圖相似，也就是第一電極121可為非平面電極，使得觸碰物對電容式觸控裝置施加的不同力道所造成的電容感應變化之間的差異可被突顯出來，進而實現更多次元(多層次)之觸控操作。 Please refer to Figure 23. FIG. 23 is a schematic diagram of a capacitive touch device 903 according to an eighteenth embodiment of the present invention. As shown in FIG. 23, the capacitive touch device 903 of the present embodiment can be a switch controller, such as a switch controller of a faucet. Since the distance D between the first electrode 121 and the second electrode 122 is changed when pressed, the capacitive sensing amount between the first electrode 121 and the second electrode 122 will have a correspondingly increased change according to the reduction of the distance D. In other words, the capacitive touch device 903 of the present embodiment can improve the resolution between different power channels, and can realize more dimensional (multi-level) touch operations. Therefore, even if there is water droplets on the switch controller of the faucet that may affect the capacitive sensing condition, it is still possible to confirm that the switch is actuated by pressing. In addition, the water flow can be determined by pressing the pressure channel to increase the stability and versatility of the switch controller. In addition, the detailed structural features of the first electrode 121 and the second electrode 122 of the present embodiment may be similar to those of the first embodiment, that is, the first electrode 121 may be a non-planar electrode, so that the touch object is applied to the capacitive touch device. The difference between the capacitive sensing changes caused by the different forces can be highlighted, thereby enabling more dimensional (multi-level) touch operations.

綜上所述，本發明之電容式觸控裝置係利用覆蓋第一微結構之第一電極增加進行電容式觸控操作時的有效表面積，藉此提升觸控靈敏度且實現多層次電容式觸控效果。此外，本發明之電容式觸控裝置更利用第一微結構對光線產生散射效果，藉此降低電極之圖案明顯度並提升電容式觸控裝置的外觀視效。本發明之電容式觸控裝置除了可當作一般的觸控面板與觸控顯 示器外，亦可適用於日常生活中的按壓控制器、握把形控制器以及球形控制器等多元化應用。 In summary, the capacitive touch device of the present invention increases the effective surface area of the capacitive touch operation by covering the first electrode of the first microstructure, thereby improving touch sensitivity and realizing multi-layer capacitive touch. effect. In addition, the capacitive touch device of the present invention further utilizes the first microstructure to scatter light, thereby reducing the apparent visibility of the electrodes and improving the visual appearance of the capacitive touch device. The capacitive touch device of the present invention can be used as a general touch panel and touch display. In addition to the display, it can also be applied to a variety of applications such as pressing controllers, grip controllers and ball controllers in daily life.

以上所述僅為本發明之較佳實施例，凡依本發明申請專利範圍所做之均等變化與修飾，皆應屬本發明之涵蓋範圍。 The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.

101‧‧‧電容式觸控裝置 101‧‧‧Capacitive touch device

111‧‧‧第一基材 111‧‧‧First substrate

111A‧‧‧第一面 111A‧‧‧ first side

111B‧‧‧第二面 111B‧‧‧ second side

111C‧‧‧第一底材 111C‧‧‧First substrate

111D‧‧‧第一絕緣層 111D‧‧‧First insulation

112‧‧‧第二基材 112‧‧‧Second substrate

112A‧‧‧第三面 112A‧‧‧ third side

112B‧‧‧第四面 112B‧‧‧ fourth side

121‧‧‧第一電極 121‧‧‧First electrode

122‧‧‧第二電極 122‧‧‧second electrode

141‧‧‧第一黏合層 141‧‧‧First adhesive layer

D‧‧‧距離 D‧‧‧Distance

M1‧‧‧第一微結構 M1‧‧‧ first microstructure

Z‧‧‧垂直投影方向 Z‧‧‧Vertical projection direction

Claims (40)

一種電容式觸控裝置，包括：一第一基材，具有一第一面以及一相反之第二面，其中該第一面具有複數個第一微結構，且各該第一微結構包括一凸起或一凹槽；以及一第一電極，設置於該第一基材之該第一面上，其中該第一電極係至少部分覆蓋該等第一微結構，且該第一電極具有一非平面表面。 A capacitive touch device includes: a first substrate having a first surface and an opposite second surface, wherein the first surface has a plurality of first microstructures, and each of the first microstructures includes a first And a first electrode disposed on the first surface of the first substrate, wherein the first electrode at least partially covers the first microstructures, and the first electrode has a first electrode Non-planar surface. 如請求項1所述之電容式觸控裝置，其中該第一基材包括一絕緣覆層、一硬質基板或一柔性基板。 The capacitive touch device of claim 1, wherein the first substrate comprises an insulating coating, a rigid substrate or a flexible substrate. 如請求項1所述之電容式觸控裝置，其中該第一基材包括一第一底材以及一第一絕緣層堆疊設置，且該第一面包括該第一絕緣層之表面。 The capacitive touch device of claim 1, wherein the first substrate comprises a first substrate and a first insulating layer stacked, and the first surface comprises a surface of the first insulating layer. 如請求項1所述之電容式觸控裝置，其中該第一基材為一硬質覆蓋板、一柔性覆蓋板或一顯示器之一上基板，該硬質覆蓋板或該柔性覆蓋板上設置有一裝飾層，且該顯示器之該上基板選自一彩色濾光基板或一顯示器之封裝蓋。 The capacitive touch device of claim 1, wherein the first substrate is a hard cover plate, a flexible cover plate or a substrate on one of the displays, and the rigid cover plate or the flexible cover plate is provided with a decoration. And the upper substrate of the display is selected from a color filter substrate or a package cover of a display. 如請求項1所述之電容式觸控裝置，更包括一第二電極，與該第一電極相對設置，其中該第二電極係與該第一電極互相電性絕緣。 The capacitive touch device of claim 1, further comprising a second electrode disposed opposite the first electrode, wherein the second electrode is electrically insulated from the first electrode. 如請求項5所述之電容式觸控裝置，其中該第二電極的表面為一平整面。 The capacitive touch device of claim 5, wherein the surface of the second electrode is a flat surface. 如請求項5所述之電容式觸控裝置，其中該第二電極的表面為一不平整面。 The capacitive touch device of claim 5, wherein the surface of the second electrode is an uneven surface. 如請求項5所述之電容式觸控裝置，更包括一第二基材，與該第一基材相 對設置，其中該第二基材具有一第三面以及一相反之第四面，且該第二電極係設置於該第二基材之該第三面上。 The capacitive touch device of claim 5, further comprising a second substrate opposite to the first substrate For the arrangement, the second substrate has a third surface and an opposite fourth surface, and the second electrode is disposed on the third surface of the second substrate. 如請求項8所述之電容式觸控裝置，其中該第二基材的該第三面具有複數個第二微結構，各該第二微結構包括一凸起或一凹槽，且該第二電極係至少部分覆蓋該等第二微結構。 The capacitive touch device of claim 8, wherein the third surface of the second substrate has a plurality of second microstructures, each of the second microstructures including a protrusion or a groove, and the A second electrode system at least partially covers the second microstructures. 如請求項8所述之電容式觸控裝置，其中該第二基材包括一絕緣覆層、一硬質基板或一柔性基板。 The capacitive touch device of claim 8, wherein the second substrate comprises an insulating coating, a rigid substrate or a flexible substrate. 如請求項8所述之電容式觸控裝置，其中該第二基材包括一第二底材以及一第二絕緣層堆疊設置，且該第三面包括該第二絕緣層之表面。 The capacitive touch device of claim 8, wherein the second substrate comprises a second substrate and a second insulating layer stacked, and the third surface comprises a surface of the second insulating layer. 如請求項8所述之電容式觸控裝置，其中該第二基材為一顯示器之一上基板，該顯示器之該上基板選自一彩色濾光基板或一顯示器之封裝蓋。 The capacitive touch device of claim 8, wherein the second substrate is a substrate on one of the displays, and the upper substrate of the display is selected from a color filter substrate or a package cover of a display. 如請求項8所述之電容式觸控裝置，更包括一第一黏合層，設置於該第一基材與該第二基材之間，用以黏合該第一基材與該第二基材。 The capacitive touch device of claim 8, further comprising a first adhesive layer disposed between the first substrate and the second substrate for bonding the first substrate and the second base material. 如請求項13所述之電容式觸控裝置，其中該第一黏合層為具有彈性的絕緣材質。 The capacitive touch device of claim 13, wherein the first adhesive layer is an insulating material having elasticity. 如請求項8所述之電容式觸控裝置，其中該第二基材之該第三面係面對該第一基材之該第一面。 The capacitive touch device of claim 8, wherein the third surface of the second substrate faces the first surface of the first substrate. 如請求項8所述之電容式觸控裝置，其中該第二基材之該第三面係面對該第一基材之該第二面。 The capacitive touch device of claim 8, wherein the third surface of the second substrate faces the second surface of the first substrate. 如請求項8所述之電容式觸控裝置，其中該第二基材之該第四面係面對該第一基材之該第一面。 The capacitive touch device of claim 8, wherein the fourth surface of the second substrate faces the first surface of the first substrate. 如請求項17所述之電容式觸控裝置，更包括一覆蓋板與一第二黏合層，該第二基材係設置於該第一基材與該覆蓋板之間，該第二黏合層係設置於該覆蓋板與該第二基材之間。 The capacitive touch device of claim 17, further comprising a cover plate and a second adhesive layer disposed between the first substrate and the cover plate, the second adhesive layer The method is disposed between the cover plate and the second substrate. 如請求項8所述之電容式觸控裝置，其中該第二基材包括一具有彈性的絕緣材質，且該第二基材之該第四面與該第一電極接觸。 The capacitive touch device of claim 8, wherein the second substrate comprises an elastic insulating material, and the fourth surface of the second substrate is in contact with the first electrode. 如請求項8所述之電容式觸控裝置，其中該第一基材包括一具有彈性的絕緣材質，且該第一基材之該第二面與該第二電極接觸。 The capacitive touch device of claim 8, wherein the first substrate comprises an elastic insulating material, and the second surface of the first substrate is in contact with the second electrode. 如請求項8所述之電容式觸控裝置，其中該第一基材或該第二基材為一柔性基板，且該第一電極與該第二電極之間相隔一可變動距離。 The capacitive touch device of claim 8, wherein the first substrate or the second substrate is a flexible substrate, and the first electrode and the second electrode are separated by a variable distance. 如請求項8所述之電容式觸控裝置，其中該第一基材或該第二基材係具有曲面結構。 The capacitive touch device of claim 8, wherein the first substrate or the second substrate has a curved structure. 如請求項8所述之電容式觸控裝置，其中該第一基材與該第二基材係分別包括一柱狀基材或一球形基材。 The capacitive touch device of claim 8, wherein the first substrate and the second substrate comprise a columnar substrate or a spherical substrate, respectively. 如請求項8所述之電容式觸控裝置，其中該第一基材與該第二基材包覆一中心結構。 The capacitive touch device of claim 8, wherein the first substrate and the second substrate are coated with a central structure. 如請求項8所述之電容式觸控裝置，更包括一可撓式材料層，覆蓋該第 一基材與該第二基材，該可撓式材料層上具有複數個輔助凸起，且該等輔助凸起係設置於該可撓式材料層與該第一基材或該第二基材之間。 The capacitive touch device of claim 8, further comprising a flexible material layer covering the first a substrate and the second substrate, the flexible material layer has a plurality of auxiliary protrusions, and the auxiliary protrusions are disposed on the flexible material layer and the first substrate or the second base Between the materials. 如請求項5所述之電容式觸控裝置，其中該第二電極係設置於該第一基材之該第二面上。 The capacitive touch device of claim 5, wherein the second electrode is disposed on the second surface of the first substrate. 如請求項26所述之電容式觸控裝置，其中該第一基材之該第二面具有複數個第三微結構，各該第三微結構包括一凸起或一凹槽，且該第二電極係至少部分覆蓋該第二面之該等第三微結構。 The capacitive touch device of claim 26, wherein the second surface of the first substrate has a plurality of third microstructures, each of the third microstructures comprising a protrusion or a groove, and the The two electrodes at least partially cover the third microstructures of the second face. 如請求項5所述之電容式觸控裝置，其中該第一電極包括複數條第一軸向電極沿一第一方向延伸並彼此互相平行設置，該第二電極包括複數條第二軸向電極沿一第二方向延伸並彼此互相平行設置，且該些第一軸向電極係與該些第二軸向電極互相交錯且絕緣設置。 The capacitive touch device of claim 5, wherein the first electrode comprises a plurality of first axial electrodes extending in a first direction and disposed parallel to each other, the second electrode comprising a plurality of second axial electrodes And extending along a second direction and parallel to each other, and the first axial electrodes and the second axial electrodes are interlaced and insulated from each other. 如請求項28所述之電容式觸控裝置，其中各該第一軸向電極與對應之該第二軸向電極相互重疊的面積至少為1毫米平方，且各該第二軸向電極的線寬至少為對應重疊之該第一軸向電極的線寬的兩倍。 The capacitive touch device of claim 28, wherein each of the first axial electrodes and the corresponding second axial electrode overlap each other by an area of at least 1 mm square, and the lines of the second axial electrodes The width is at least twice the line width of the first axial electrode corresponding to the overlap. 如請求項28所述之電容式觸控裝置，其中該些第一微結構僅對應分布於該些第一軸向電極的邊緣。 The capacitive touch device of claim 28, wherein the first microstructures are only correspondingly distributed to edges of the first axial electrodes. 如請求項28所述之電容式觸控裝置，其中該些第一微結構僅對應分布於該些第一軸向電極的邊緣中與該些第二軸向電極重疊的區域。 The capacitive touch device of claim 28, wherein the first microstructures only correspond to regions of the edges of the first axial electrodes that overlap the second axial electrodes. 如請求項28所述之電容式觸控裝置，其中各該第一軸向電極包括複數個第一子電極互相電性連接，而各該第二軸向電極包括複數個第二子電極互 相電性連接，該些第一子電極與該些第二子電極不相互重疊，且至少該些第一子電極的邊緣覆蓋該些第一微結構。 The capacitive touch device of claim 28, wherein each of the first axial electrodes comprises a plurality of first sub-electrodes electrically connected to each other, and each of the second axial electrodes comprises a plurality of second sub-electrodes The first sub-electrodes and the second sub-electrodes do not overlap each other, and at least the edges of the first sub-electrodes cover the first microstructures. 如請求項5所述之電容式觸控裝置，其中該第二電極設置於該第一基材的該第一面上而與該第一電極共平面，且至少該第一電極的邊緣覆蓋該些第一微結構。 The capacitive touch device of claim 5, wherein the second electrode is disposed on the first surface of the first substrate and is coplanar with the first electrode, and at least an edge of the first electrode covers the Some first microstructures. 如請求項1所述之電容式觸控裝置，更包括一覆蓋板與一第二黏合層，該覆蓋板具有一第五面以及一相反之第六面，該第一基材係設置於該第六面之一側，該第二黏合層係設置於該覆蓋板與該第一基材之間，用以黏合該覆蓋板與該第一基材。 The capacitive touch device of claim 1, further comprising a cover plate and a second adhesive layer, the cover plate having a fifth surface and an opposite sixth surface, wherein the first substrate is disposed on the On one side of the sixth surface, the second adhesive layer is disposed between the cover plate and the first substrate for bonding the cover plate and the first substrate. 如請求項34所述之電容式觸控裝置，更包括一裝飾層，設置於該覆蓋板之該第六面上。 The capacitive touch device of claim 34, further comprising a decorative layer disposed on the sixth surface of the cover plate. 如請求項1所述之電容式觸控裝置，其中該第一基材為透明絕緣材質，且各該第一微結構之高度或深度係大於或等於0.5微米且小於或等於1微米。 The capacitive touch device of claim 1, wherein the first substrate is a transparent insulating material, and each of the first microstructures has a height or depth greater than or equal to 0.5 micrometers and less than or equal to 1 micrometer. 如請求項1所述之電容式觸控裝置，其中該第一基材為透明絕緣材質，各該第一微結構之直徑與該些第一微結構的相鄰二者的間距係大於0.8微米。 The capacitive touch device of claim 1, wherein the first substrate is a transparent insulating material, and a diameter of each of the first microstructures and a distance between adjacent ones of the first microstructures is greater than 0.8 micrometers. . 一種電容式觸控裝置，包括：一第一基材，具有一第一面以及一相反之第二面，其中該第一面具有複數個第一微結構，且各該第一微結構包括一凸起或一凹槽；一第一電極，設置於該第一基材之該第一面上，其中該第一電極係至少部 分覆蓋該等第一微結構，且該第一電極具有一非平面表面；一第二電極，與該第一電極相對設置並互相電性絕緣，其中該第一電極與該第二電極之間相隔一可變動距離；以及一具有彈性的絕緣材質，設置於該第一電極與該第二電極之間。 A capacitive touch device includes: a first substrate having a first surface and an opposite second surface, wherein the first surface has a plurality of first microstructures, and each of the first microstructures includes a first a first electrode disposed on the first surface of the first substrate, wherein the first electrode is at least partially Separating the first microstructures, and the first electrode has a non-planar surface; a second electrode is disposed opposite to the first electrode and electrically insulated from each other, wherein the first electrode and the second electrode are And a variable distance; and an elastic insulating material disposed between the first electrode and the second electrode. 如請求項38所述之電容式觸控裝置，其中該第二電極係電性接地。 The capacitive touch device of claim 38, wherein the second electrode is electrically grounded. 如請求項38所述之電容式觸控裝置，其中該第二電極為一顯示器之共通電極。 The capacitive touch device of claim 38, wherein the second electrode is a common electrode of a display.
TW103115610A 2014-04-30 2014-04-30 Capacitive touch device TW201541322A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW103115610A TW201541322A (en) 2014-04-30 2014-04-30 Capacitive touch device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103115610A TW201541322A (en) 2014-04-30 2014-04-30 Capacitive touch device

Publications (1)

Publication Number Publication Date
TW201541322A true TW201541322A (en) 2015-11-01

Family

ID=55220506

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103115610A TW201541322A (en) 2014-04-30 2014-04-30 Capacitive touch device

Country Status (1)

Country Link
TW (1) TW201541322A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI631502B (en) * 2017-01-16 2018-08-01 大陸商麥克思商務咨詢（深圳）有限公司 Display device with force sensor
TWI633370B (en) * 2016-08-12 2018-08-21 鴻海精密工業股份有限公司 In-cell touch display panel
TWI653438B (en) 2017-02-23 2019-03-11 華邦電子股份有限公司 Pressure sensor and manufacturing method thereof
TWI744319B (en) * 2016-05-06 2021-11-01 瑞士商先進矽有限公司 System, method and computer program for detecting an object approaching and touching a capacitive touch device
TWI776832B (en) * 2016-12-14 2022-09-11 南韓商三星顯示器有限公司 Touch sensor and display device including the same
TWI827913B (en) * 2018-06-01 2024-01-01 美商谷歌有限責任公司 Trackpad with capacitive force sensing and haptic feedback

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI744319B (en) * 2016-05-06 2021-11-01 瑞士商先進矽有限公司 System, method and computer program for detecting an object approaching and touching a capacitive touch device
TWI633370B (en) * 2016-08-12 2018-08-21 鴻海精密工業股份有限公司 In-cell touch display panel
TWI776832B (en) * 2016-12-14 2022-09-11 南韓商三星顯示器有限公司 Touch sensor and display device including the same
TWI631502B (en) * 2017-01-16 2018-08-01 大陸商麥克思商務咨詢（深圳）有限公司 Display device with force sensor
TWI653438B (en) 2017-02-23 2019-03-11 華邦電子股份有限公司 Pressure sensor and manufacturing method thereof
TWI827913B (en) * 2018-06-01 2024-01-01 美商谷歌有限責任公司 Trackpad with capacitive force sensing and haptic feedback

Similar Documents

Publication Publication Date Title
JP6073415B2 (en) Touch panel with fingerprint authentication function
US8933900B2 (en) Input device and method of manufacturing the same
TW201541322A (en) Capacitive touch device
US11150772B2 (en) Display device having a non-display area with a sensing portion and a non-sensing portion
KR101536236B1 (en) Touch sensitive structure of electronic device
US9419612B2 (en) Touch panel
KR101274945B1 (en) Projected capacitive touch panel and method for manufacturing the same
US9092106B2 (en) Touch panel
KR101765950B1 (en) Touch panel
TW201516815A (en) Capacitive touch panel and method of fabricating the same
TWI566148B (en) A touch panel and fabricating method thereof
TW201541299A (en) Cover substrate and touch device
CN203759668U (en) Touch control device
TWI502464B (en) The structure of the electrodes of a touch panel and the touch panel using the same
KR101142791B1 (en) Touch screen panel
KR101462147B1 (en) Method for Manufacturing Touch screen having mesh patterned electrode including sub-electrode line
KR102281616B1 (en) Touch screen panel and method of manufacturing the same
TWI474385B (en) Abstract of the disclosure
TW201335819A (en) Touch device
US20130206568A1 (en) Touch panel
TWI567613B (en) Force sensing module and force touch sensing display module
TWI462001B (en) Single lamellar projective capacitive touch panel structure and method of manufacturing the same
KR20150146066A (en) Video display unit
TWM503607U (en) Cover substrate and touch device
TW201602880A (en) Mutual capacitive touch device