JP5615531B2 - Method for generating charged particle beam drawing data - Google Patents

Description

  The present invention relates to a method for generating drawing data used in a charged particle beam drawing apparatus.

  A data conversion device is used to use the electron beam drawing apparatus. The data converter generates a drawing data file from the layout data file. When the drawing data file is taken into the electron beam drawing apparatus, the electron beam drawing apparatus performs a photoresist exposure process in accordance with the electron beam irradiation. The layout data file is generated by a so-called CAD system. In the layout data file, the layout of the circuit pattern of the semiconductor element is written for each arbitrary region.

  For example, Patent Document 1 discloses a generation method for efficiently generating a drawing data file. In this generation method, first, a margin area is set for each arbitrary area of each layout data file. The margin width of the margin area is set to a predetermined value. In accordance with the set margin width value, the position of an arbitrary area of the drawing data file corresponding to the area of the layout data file is shifted to the margin area side. Thereafter, the data in the layout data file area corresponding to the shifted drawing data file area is read out. The read layout is converted for drawing data. Thus, a drawing data file is generated for each area shifted from the area of the layout data file.

  Further, for example, Patent Document 2 similarly discloses a generation method for efficiently generating a drawing data file. According to this generation method, a drawing data file is generated in the electron beam drawing apparatus. In generation, the layout data file is sequentially transferred toward the first storage device of the electron beam drawing apparatus. The layout data file is stored in the first storage device. At the same time, the layout data file is sequentially read from the first storage device, and the first data processing is performed. At this time, the data file transfer process and the first data process are implemented by pipeline processing. The drawing data generated by the data processing is stored in the second storage device. A second data process is performed on the drawing data stored in the second storage device. The second data processing is performed by transfer processing, first data processing, and pipeline processing. Therefore, it is possible to greatly reduce the time for transfer processing and data processing.

JP 2008-181944 A JP 2008-34439 A

  The drawing data file is created in parallel by distributed processing. At this time, each distributed processing circuit is in charge of processing one layout data file. For example, in the case where one drawing data file is generated from two layout data files, the other distributed processing circuit performs the drawing until writing of drawing data from one distributed processing circuit to the drawing data file is completed. You must suspend writing data to the data file. Such “waiting time” increases the processing time in generating the drawing data file.

  The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for generating charged particle beam writing data that can significantly reduce the processing time required to generate writing data.

In order to achieve the above object, a method for generating charged particle beam drawing data includes:
A first graphic group arranged in a first divided frame among a plurality of divided frames generated by dividing a formation region for forming a circuit pattern based on a layout specified according to a plane coordinate system; and the plane coordinates Obtaining first layout data for specifying a second graphic group arranged in a second divided frame adjacent to the first divided frame based on a layout specified according to a system;
A third graphic group arranged in the second divided frame based on the layout specified according to the planar coordinate system, and a third group adjacent to the second divided frame based on the layout specified according to the planar coordinate system . Obtaining second layout data for specifying a fourth graphic group arranged in each of the divided frames ;
The second the second figure group disposed in the divided frame out can the first layout data or al disconnect, and generating a first rendering data,
The second the third graphic group disposed in the divided frame out come the second layout data or al disconnect, and a step of generating a second drawing data.

  As described above, according to the disclosed drawing data file generation method, the processing time required to generate drawing data can be significantly shortened.

1 is a diagram schematically illustrating a configuration of a charged particle beam drawing system. It is a conceptual diagram which shows the concept of the layout data of a mask. It is a conceptual diagram which shows roughly the process of producing | generating layout data. It is a conceptual diagram which shows roughly the distribution criteria of a figure. It is a flowchart which shows the flow of a process of a control circuit. It is a flowchart which shows the flow of a process of a data processing circuit. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 1st Embodiment of this invention. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 1st Embodiment of this invention. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 1st Embodiment of this invention. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 1st Embodiment of this invention. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 1st Embodiment of this invention. It is a conceptual diagram which shows roughly the distribution criteria of a figure. It is a conceptual diagram which shows roughly the process of producing | generating shot data. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing which concerns on 2nd Embodiment of this invention. It is a conceptual diagram which shows roughly the process of producing | generating shot data. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 3rd Embodiment of this invention. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 3rd Embodiment of this invention. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing concerning 3rd Embodiment of this invention. It is a conceptual diagram which shows roughly the process of producing | generating shot data. It is a conceptual diagram which shows the difference in distribution criteria roughly. It is a conceptual diagram which shows roughly the production | generation method of the data for drawing which concerns on 4th Embodiment of this invention. It is a conceptual diagram which shows roughly the process of producing | generating shot data.

  Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings.

  FIG. 1 is a diagram schematically showing a configuration of a specific example of a charged particle beam drawing system, that is, an electron beam (EB) drawing system 11. The EB drawing system 11 includes a charged particle beam drawing device, that is, an EB drawing device 12, and a data conversion device 13 connected to the EB drawing device 12. A CAD (Computer Aided Design) system 14 is connected to the data converter 13. In the present embodiment, the EB drawing apparatus 12 constitutes a variable shaping type EB drawing apparatus, for example. In addition to the electron beam, the charged particle beam includes a beam using a charged particle beam such as an ion beam.

  First, the configuration of the EB drawing device 12 will be described. The EB drawing apparatus 12 includes a drawing unit 16 and a control unit 17 connected to the drawing unit 16. The drawing unit 16 includes a drawing chamber 18 and an electron beam column 19 connected to the upper end of the drawing chamber 18. An XY stage 21 is disposed in the drawing chamber 18. The XY stage 21 moves within a horizontal plane, for example. A sample 22 is disposed on the XY stage 21. The sample 22 constitutes, for example, a mask master for manufacturing semiconductor devices. The master includes a glass substrate and a metal film laminated on the glass substrate. For example, Cr (chromium) is used for the metal film. For example, a resin resist film is formed on the metal film.

  The drawing unit 16 includes an electron gun 23 disposed at the upper end of the electron beam column 19. The electron gun 23 can emit an electron beam toward the drawing chamber 18 in the vertical direction, for example. The drawing unit 16 includes a first deflector 24, an illumination lens 25, a first aperture plate 26, a second deflector 27, a projection lens 28, a second aperture plate 29, and a third deflector disposed in the electron beam column 19. Electron optical system parts such as a container 31 and an objective lens 32 are further provided. Due to the function of these components, the electron beam emitted from the electron gun 23 in the vertical direction is formed into a predetermined cross-sectional shape and a predetermined dimension. As a result, the electron beam is irradiated to a predetermined position of the sample 22 with a predetermined cross-sectional shape and a predetermined size.

  Specifically, the first to third deflectors 24, 27, and 31 can change the direction of the electron beam. The driving of the first deflector 24 is controlled by the blanking control unit 33 of the control unit 17. The driving of the second deflector 27 is controlled by the variable shaped beam control unit 34. The driving of the third deflector 31 is controlled by the deflection controller 35. For example, rectangular openings are formed in the first and second aperture plates 26 and 29. The aperture allows the passage of the electron beam. The drive of the XY stage 21 is controlled by the stage drive control unit 36. The control units 33 to 36 are controlled based on a control signal supplied from the control circuit 37 of the control unit 17. Based on the control signal, each of the control units 33 to 36 outputs a drive signal.

  For example, two storage devices, that is, hard disk drive devices (HDDs) 38 a and 38 b are connected to the control circuit 37. The HDDs 38a and 38b store predetermined software programs (not shown). The control circuit 37 executes various arithmetic processes based on a software program temporarily stored in the memory 39. Note that the software program may be loaded into the HDD 38a, 38b from, for example, an FD (flexible disk), CD-ROM, or other portable recording medium, or loaded into the HDD 38a, 38b from a computer network such as a LAN (Local Area Network) or the Internet. May be. The control circuit 37, the HDDs 38a and 38b, the memory 39, and the control units 33 to 36 are connected to each other by a bus, for example. An interface 41 is connected to the bus.

  The control circuit 37 refers to predetermined shot data when controlling the drawing unit 16. The shot data is stored in, for example, the HDD 38b. The shot data specifies, for example, a plurality of figures to be irradiated with an electron beam on one sample 22, for example. Based on these figures, the irradiation position of the electron beam on the sample 22 is specified. At the same time, the shot data relates the horizontal movement of the XY stage 21 to the driving amounts of the first to third deflectors 24, 27, and 31 for each figure. Based on this association, the electron beam is irradiated to a predetermined position on the sample 22 with a predetermined cross-sectional shape and a predetermined size.

  A data processing circuit group 42 is used for generating shot data. The data processing circuit group 42 includes a plurality of data processing circuits 43. Each data processing circuit 43 executes various arithmetic processes based on the aforementioned software program stored in the HDDs 38a and 38b. When the control circuit 37 instructs each data processing circuit 43 to generate shot data, the drawing data file stored in the HDD 38 a is input to the data processing circuit 43. As will be described later, for example, a plurality of drawing data files are generated for each predetermined region on the sample 22. The drawing data file specifies the position and shape of the figure. Each data processing circuit 43 that has fetched each drawing data file converts the drawing data file into shot data in parallel by distributed processing. The converted shot data is stored in the HDD 38b. Details of the shot data and drawing data file will be described later.

  Next, the operation of the drawing unit 16 will be described. The control circuit 37 supplies a control signal to each of the control units 33 to 36 based on the shot data. The XY stage 21, that is, the sample 22 is positioned at a predetermined position based on horizontal movement. The first deflector 24 changes the direction of the electron beam either inside or outside the opening of the first aperture plate 26. The electron beam is set off based on irradiation outside the aperture. The electron beam is set on based on the irradiation into the aperture. Thus, on / off of the electron beam is controlled. The cross-sectional shape of the electron beam that has passed through the opening of the first aperture plate 26 is formed into, for example, a rectangle based on the shape of the opening. Thereafter, when the direction of the electron beam is changed by the action of the second deflector 27, the electron beam passes through the opening of the second aperture plate 29. The cross-sectional shape of the electron beam is formed by the overlapping state of the first and second aperture plates 26 and 29. The electron beam is irradiated to a predetermined position of the sample 22 with a predetermined size by the action of the third deflector 31 and the objective lens 32.

  For the electron beam irradiation, the drawing unit 16 employs, for example, a vector scanning method. Therefore, the electron beam scans only the position to be irradiated on the sample 22. At this time, the position of the electron beam moves for each shot. When the irradiation to the predetermined area is completed, the irradiation position of the electron beam is changed based on the horizontal movement of the XY stage 21. An electron beam scan is performed again. In this way, scanning of the electron beam and horizontal movement of the XY stage 21 are repeated. The resist film of the sample 22 is irradiated with an electron beam on all the figures specified by the shot data. As a result, the exposure process for the resist film is completed. Thus, the operation of the drawing unit 16 is completed.

  When the operation of the drawing unit 16 is completed, the sample 22 is taken out from the drawing chamber 18 of the drawing unit 16. The sample 22 taken out from the drawing chamber 18 is developed. In the development process, the sample 22 is immersed in, for example, a developer. Based on the development process, the resist film remains in a predetermined pattern on the metal film of the sample 22. The metal film is exposed outside the contour of the remaining resist film. Etching is performed on the metal film. For example, a wet etching process is performed as the etching process. Based on such an etching process, the metal film is removed outside the resist film. Thereafter, when the resist film is removed, a mask for manufacturing a semiconductor chip is manufactured.

  Next, the configuration of the data converter 13 will be described. The data conversion device 13 includes a control circuit 44. For example, two storage devices, that is, HDDs 45 a and 45 b and a memory 46 are connected to the control circuit 44. A predetermined software program (not shown) is stored in the HDDs 45a and 45b. The control circuit 44 executes various arithmetic processes based on a software program temporarily stored in the memory 46. The software program may be imported into the HDDs 45a and 45b from, for example, an FD, CD-ROM, or other portable recording medium, or may be imported into the HDDs 45a and 45b from a computer network such as a LAN or the Internet. The control circuit 44, the HDDs 45a and 45b, and the memory 46 are connected to each other by a bus, for example. An interface 47 is connected to the bus. This interface 47 is connected to the interface 41 of the EB drawing apparatus 12.

  A data processing circuit group 48 is connected to the control circuit 44 via a bus. The data processing circuit group 48 includes a plurality of data processing circuits 49. The data processing circuit 49 generates the drawing data file described above in parallel by distributed processing. The control circuit 44 instructs each data processing circuit 49 to generate a drawing data file. The data processing circuit 49 takes in a layout data file stored in the HDD 45a. A plurality of layout data files are generated for each formation region on the sample 22. The generation of the layout data file is executed by the CAD system 14. The layout data file specifies the positions and shapes of figures arranged in, for example, a plurality of divided areas specified for each of the above-described formation areas. The generated drawing data file is stored in the HDD 45b. Details of the layout data file will be described later.

  Next, the configuration of the CAD system 14 will be described. The CAD system 14 includes a central processing unit (CPU) 51 and a storage device connected to the CPU 51, that is, an HDD 52. For example, a software program (not shown) is stored in the HDD 52. The CPU 51 executes various arithmetic processes based on, for example, a software program temporarily stored in a memory (not shown). Here, the CAD system 14 generates a layout data file specifying the layout of a mask for manufacturing a semiconductor device, that is, a semiconductor chip. The CPU 51 and the HDD 52 are connected to each other by a bus, for example. An interface 53 is connected to the bus. The interface 53 is connected to the interface 47 of the data converter 13.

  FIG. 2 is a diagram showing a concept of layout data of the semiconductor chip manufacturing mask 54. The mask 54 has, for example, a rectangular outline. For example, first to third formation regions 55, 56, and 57 in which a circuit pattern is to be formed are specified on the mask 54. For example, the first to third formation regions 55 to 57 are divided into three equal parts in the height h direction into first to third divided regions 58, 59, and 61. The divided areas adjacent to each other are divided by a dividing line 62. The positions of the formation regions 55 to 57 are specified by, for example, coordinate values in the xy plane coordinate system. Here, the positions of the formation regions 55 to 57 are specified based on the coordinate value of the origin O closest to the origin OM defined at the corner of the mask 54. At the same time, the shapes of the formation regions 55 to 57 are specified by the height h and the width w. The positions of the divided areas 58 to 61 are specified by the xy plane coordinate values of the origins of the divided areas 58 to 61 with respect to the origins of the formation areas 55 to 57.

  As shown in FIG. 3, for example, a plurality of figures 63 indicating the outline of the circuit pattern are arranged in the first formation region 55. The figure 63 has a rectangular outline, for example. The rectangle includes, for example, a square, a rectangle, and a trapezoid. The position of the figure 63 is specified by the coordinate value of the origin of the figure 63 with respect to the origin of each divided area 58-61. The origin of the figure 63 may be defined at the corner closest to the origin of the first formation region 55, for example. For example, the figure 63 arranged in the first formation area 55 is distributed to the first to third divided areas 58 to 61 based on a predetermined distribution standard. Details of the distribution criteria will be described later. In addition, the graphics 63 arranged in the second and third formation regions 56 and 57 are distributed to the respective divided regions 58 to 61 based on the same distribution standard as that of the first formation region 55.

  The CAD system 14 generates one layout data file 64, 65, 66 for each of the first to third divided regions 58 to 61 based on the arithmetic processing of the CPU 51. In each of the layout data files 64 to 66, the positions and shapes of the first to third divided regions 58 to 61 in the first formation region 55 are written as header information, for example. As described above, the position is specified by the position of the origin of the divided areas 58 to 61 with respect to the origin O of the first formation area 55 in the XY plane coordinate system. The shapes of the divided regions 58 to 61 include, for example, a height h and a width w. In the second and third formation regions 56 and 57, a layout data file is similarly generated for each of the first to third divided regions 58 to 61. The generated layout data files 64 to 66 are stored in the HDD 52.

  Next, the distribution criteria for the figure 63 will be described. As shown in FIG. 4, when distributing the figure 63, for example, a margin area 67 that protrudes from the dividing line 62 in the y-axis direction with a predetermined width w is defined below the second and third divided areas 59 and 61. The The allowable value of the width w of the margin area 67 is set in advance by the CAD system 14. Here, for the sake of convenience, the distribution criteria will be described in the margin area 67 of the second divided area 59. As a principle of the distribution standard, the figure 63 completely included in each divided area 58 to 61 is distributed to each divided area 58 to 61, respectively. Subsequently, the distribution of the figure 63 that protrudes into the adjacent divided region across the divided line 62 is executed.

  First, the figures 63a and 63b straddling the dividing line 62 are extracted. Subsequently, it is determined whether or not the figures 63 a and 62 b straddle the outer edge 67 a of the margin area 67. Since the figure 63a does not straddle the outer edge 67a, the position of the origin of the figure 63a is specified. Since the origin of the figure 63 a is located in the margin area 67, the figure 63 a is distributed to the second figure group of the second divided area 59. On the other hand, since the figure 63b straddles the outer edge 67a, the position of the origin of the figure 63b is specified. Since the origin of the figure 63 b is located in the first divided area 58, the figure 63 b is distributed to the first figure group of the first divided area 58. In this way, all the figures 63 in the first formation region 55 are distributed to any one of the first to third figure groups. According to such distribution, generation of the minute figure 63 in each divided area 58 to 61 is avoided.

  Next, a drawing data file generation method according to the first embodiment of the present invention will be described. The control circuit 44 of the data conversion device 13 acquires layout data files 64 to 66 stored in the HDD 52 of the CAD system 14. For the acquisition, a transfer processing circuit (not shown) in the data converter 13 is used. The HDD 45a stores layout data files 64-66. In step S1 of FIG. 5, the control circuit 44 acquires the layout data file header information and the drawing data file generation condition data file. The condition data file is stored in advance in the memory 46, for example. In the condition data file, data relating to the position and shape of divided frames, which will be described later, generated by dividing the formation area, and data relating to the figure distribution criteria are specified. In step S2, the control circuit 44 specifies a drawing data file to be generated based on the reference of the layout data file and the condition data file.

  Thereafter, the control circuit 44 instructs the data processing circuit 49 to generate the specified drawing data file in step S3. When instructing, the control circuit 44 inputs to the data processing circuit 49 a drawing data file to be written in which drawing data is to be written. Drawing data is not yet written in this drawing data file. In step S4, the control circuit 44 monitors the generation of the drawing data file in the data processing circuit 49. If the completion of generation of all drawing data files in the data processing circuit 49 is not confirmed, the process returns to step S3. On the other hand, when the control circuit 44 confirms the completion of generation of all the drawing data files in the data processing circuit 49, the processing of the control circuit 44 ends.

  On the other hand, the data processing circuit 49 that has received the drawing data file generation instruction opens the drawing data file to be written in step P1 of FIG. Subsequently, in step P2, the data processing circuit 49 acquires one layout data file from the HDD 45a. Subsequently, in step P3, the data processing circuit 49 converts the data in the layout data file into data for the drawing data file. Thereafter, in step P4, the data processing circuit 49 writes the converted data into the drawing data file to be written. In this way, each data processing circuit 49 generates a drawing data file. In step P5, the data processing circuit 49 closes the generated drawing data file. The drawing data file generated in this way is stored in the HDD 45b.

  Next, drawing data generation processing of the data processing circuit 49 will be described in detail. As shown in FIG. 7, the data processing circuit 49 divides, for example, the first formation area 55 into first to seventh divided frames 71 to 77 based on the condition data file. A predetermined height h is set for each of the divided frames 71 to 77. Here, the height h of each divided frame 71 to 77 is set smaller than the height h of each of the first to third divided regions 58 to 61. The width w of each divided frame 71 to 77 matches the width w of the first formation region 55. The divided frames adjacent to each other are divided by a dividing line 78. The positions of the divided frames 71 to 77 in the first forming area 55 are specified by the positions of the origins of the divided frames 71 to 77 with respect to the origin O of the first forming area 55.

  The data processing circuit 49 distributes the graphic 63 of the first formation area 55 to the first to seventh divided frames 71 to 77. Here, for example, a layout data file 64 is input to the first data processing circuit 49. The first divided area 58 is included in the first to third divided frames 71 to 73. Therefore, referring also to FIG. 8, the first graphic group including the graphic 63 of the first divided region 58 is distributed to the first to third divided frames 71 to 73, respectively. In this way, the drawing data files 81, 82, 83 are generated corresponding to the first to third divided frames 71-73. Since the third divided frame 73 extends over the second divided area 59, the first figure group including the figure 63 of the area corresponding to the first divided area 58 is extracted from the third divided frame 73. A region corresponding to the first divided region 58 is partitioned by a dividing line 62.

  On the other hand, for example, a layout data file 65 is input to the second data processing circuit 49. The second divided area 59 is included in the third to fifth divided frames 73 to 75. Therefore, the second graphic group including the graphic 63 of the second divided region 59 is distributed to the third to fifth divided frames 73 to 75. Referring also to FIG. 9, drawing data files 84, 85, 86 are generated corresponding to the third to fifth divided frames 73-75. Since the third divided frame 73 straddles the first divided area 58, the second figure group including the figure 63 of the area corresponding to the second divided area 59 is extracted from the third divided frame 73. Similarly, a third graphic group including the graphic 63 in the area corresponding to the third divided area 61 is extracted from the fifth divided frame 75. The area corresponding to the first divided area 58 and the area corresponding to the third divided area 61 are each partitioned by a dividing line 62.

  Similarly, for example, a layout data file 66 is input to the third data processing circuit 49. The third divided region 61 is included in three fifth to seventh divided frames 75 to 77. Therefore, the figure 63 in the third divided region 61 is distributed to the fifth to seventh divided frames 75 to 77. Referring also to FIG. 10, drawing data files 87, 88, 89 are generated corresponding to the fifth to seventh divided frames 75-77. Since the fifth divided frame 75 extends over the second divided region 59, the third graphic group of the graphic 63 in the region corresponding to the third divided region 61 is extracted from the fifth divided frame 75. A region corresponding to the second divided region 59 is partitioned by a dividing line 62.

  Here, a predetermined standard is established according to the conditions specified in the condition data file. As shown in FIG. 11, a drawing data file 83 is generated from the layout data file 64. At this time, the first graphic group is extracted from the first divided area 58 in the drawing data file 83. Similarly, a drawing data file 84 is generated from the layout data file 65. At this time, the second graphic group is extracted from the second divided area 59 in the drawing data file 84. When the drawing data files 83 and 84 generated in this way are overlaid, the figure 63 to be arranged in the third divided frame 73 is specified.

  Next, the distribution criteria for the figure 63 will be described. As shown in FIG. 12, when distributing the graphic 63, for example, a margin area 91 extending in both divided frames is defined on the dividing line 78. The allowable value of the width w of the margin area 91 is set in advance by the data converter 13. Here, for the sake of convenience, the distribution criteria will be described in the margin area 91 that straddles the first and second divided areas 71 and 72. The sorting criteria are specified in the generated data file. When distributing, in principle, the figure 63 completely arranged in each of the divided frames 71 to 77 is distributed to the respective divided frames 71 to 77.

  Subsequently, the figures 63c, 63d, 63e, and 63g straddling the dividing line 78 are extracted. At this time, it is determined whether or not the graphic 63 straddles at least one of the outer edges 91a of the margin area 78. Here, the figure 63c does not straddle any outer edge 91a. With respect to the figure 63 that does not straddle any of the outer edges 91a, it is determined on which divided frame the center point of the figure 63 is located based on the sorting criteria. The center point of the figure 63 is specified by the intersection of the diagonal lines of the figure 63. Here, since the center point of the figure 63 c is located in the first divided frame 71, the figure 63 c is distributed to the figure group of the first divided frame 71.

  On the other hand, the figure 63 d straddles only one outer edge 91 a defined in the first divided frame 71. Similarly, the figure 63e straddles only the other outer edge 91a defined in the second divided frame 72. The figure 63 straddling any one of the outer edges 91a is determined to belong to the divided frame to which the straddling outer edge 91a belongs, based on the sorting standard. Here, since the outer edge 91 a across which the figure 63 d straddles is located in the first divided frame 71, the figure 63 d is distributed to the figure group of the first divided frame 71. On the other hand, since the outer edge 91a over which the figure 63e straddles is located in the second divided frame 72, the figure 63e is distributed to the figure group of the second divided frame 72.

  On the other hand, the figure 63f straddles both outer edges 91a. In this case, it is determined that the graphic 63 f protrudes excessively from the first divided frame 71 into the second divided frame 72 and from the second divided frame 72 into the first divided frame 71. As a result, the figure 63f is divided into a figure 63g on the first divided frame 71 side and a figure 63h on the second divided frame 72 side with the dividing line 78 as a boundary. At this time, since the figure 63g is located in the first divided frame 71, the figure 63g is distributed to the figure group of the first divided frame 71. On the other hand, since the figure 63 h is located in the second divided frame 72, the figure 63 h is distributed to the figure group of the second divided frame 72. In this way, all the figures 63 in the first formation area 55 are distributed to the first to ninth figure groups of the drawing data files 81 to 89.

  Next, a method for generating shot data will be described. Prior to the generation of shot data, the control circuit 37 acquires the drawing data files 81 to 89 from the data converter 13 via the interfaces 47 and 41. The acquired drawing data files 81 to 89 are stored in the HDD 38a. The control circuit 37 instructs each data processing circuit 43 to generate shot data. The drawing data files 81 to 89 are individually input to each data processing circuit 43. Each data processing circuit 43 converts the position of the graphic 63 specified by the drawing data file into the layout position of the mask 54.

  As shown in FIG. 13, the graphic group of the drawing data file 83 and the graphic group of the drawing data file 84 are arranged in the same third divided frame 73. Similarly, the graphic group of the drawing data file 86 and the graphic group of the drawing data file 87 are arranged in the same fifth divided frame 75. At this time, the drawing data files 81 to 89 are arranged in one first formation region 55. In this way, the drawing data files 81, 82, 85, 88 and 89 are associated with the drawing data files 83, 84, 86 and 87 in common. Note that the second and third formation regions 56 and 57 are processed in the same manner as the first formation region 55. Thus, shot data is generated. The generated shot data is stored in the HDD 38b.

  Here, the correspondence between the claims and the first embodiment will be described. The first embodiment corresponds to the invention described in claims 1 and 2. In the first embodiment, the first and second layout data in the claims correspond to the layout data files 64 and 65, respectively. The first to fourth drawing data correspond to the drawing data files 83, 84, 82, and 85, respectively. In the first embodiment, the first to fourth graphic groups that respectively satisfy the first to fourth conditions are extracted from the layout data files 64 and 65 to the drawing data files 83, 84, 82, and 85, respectively. In other words, the layout data file 64 specifies the first and second graphic groups. The layout data file 65 specifies the third and fourth graphic groups.

  In the first embodiment, both the second and third graphic groups are extracted based on the criteria specified according to the second and third conditions. The first graphic group is extracted based on the criteria specified according to the condition including the first condition. The fourth graphic group is extracted based on the criteria specified according to the condition including the fourth condition. These first to fourth conditions and criteria are specified in the above-described condition data file. As is apparent from the first embodiment, the first to fourth conditions are different from each other. Instead of the correspondence relationship, the first and second layout data in the claims may correspond to the layout data files 65 and 66, respectively. At this time, the first to fourth drawing data correspond to the drawing data files 86, 87, 85, and 88, respectively.

  According to the above configuration, for example, the data processing circuit 49 can simultaneously generate, for example, three drawing data files 81 to 83 from one layout data file 64. In other words, all the drawing data files 81 to 89 are generated by one writing process. At this time, for example, two drawing data files 83 and 84 corresponding to the third divided frame 73 are generated in parallel. Therefore, unlike the prior art, there is no waiting for the writing process when generating one drawing data file. The processing time for generating the drawing data files 81 to 89 can be greatly reduced. In addition, when generating shot data, it is only necessary that the graphic groups to be arranged in the same divided frame are arranged in the same divided frame. Processing is not complicated when generating shot data.

  Next, a drawing data file generation method according to the second embodiment of the present invention will be described. In this generation method, layout data files 64 to 66 are generated as in the first embodiment. Thereafter, as shown in FIG. 14, each data processing circuit 49 generates seven drawing data files from one layout data file. That is, seven drawing data files 81 to 83 and 91 to 94 corresponding to the first to seventh divided frames 71 to 77 are generated from the first divided region 58. The drawing data files 81 to 83 are generated in the same manner as described above. On the other hand, since the fourth to seventh divided frames 74 to 77 correspond to areas completely deviated from the first divided area 57, the figure 63 is not distributed to the drawing data files 91 to 94. That is, the drawing data files 91 to 94 constitute an empty data file having no data.

  Similarly, seven drawing data files 84 to 86 and drawing data files 95 to 98 corresponding to the first to seventh divided frames 71 to 77 are generated from the second divided region 59. Since the first and second divided frames 71 and 72 and the sixth and seventh divided frames 76 and 77 correspond to areas completely deviated from the second divided area 59, the drawing data files 95 to 98 have no data. Constructs an empty data file. Similarly, seven drawing data files 87 to 89 and drawing data files 99, 101, 102, and 103 are generated from the third divided region 61 corresponding to the first to seventh divided frames 71 to 77. Since the first to fourth divided frames 71 to 74 correspond to areas completely deviated from the third divided area 61, the drawing data files 99 to 103 constitute empty data files having no data.

  The drawing data files 81 to 89 and the drawing data files 91 to 103 generated in this way are distributed to the first to third file groups 104, 105, and 106 as shown in FIG. Here, among the drawing data files 81 to 89 having data, the drawing data files 83 and 86 including the dividing line 62 among the drawing data files 83, 86 and 89 arranged on the uppermost side are included in the third file group 106. Sorted. Similarly, among the drawing data files 81, 84, 87 arranged at the lowermost side, the drawing data files 84, 87 including the dividing line 62 are distributed to the first data group 104. Similarly, other drawing data files 81, 82, 85, 88, 89 that do not include the dividing line 62 are distributed to the second file group 105. Thus, for example, the drawing data files 83, 84, 86, 87 are individually associated with at least one of the other drawing data files 81, 82, 85, 88, 89.

  The empty drawing data files 91 to 103 are appropriately distributed to areas where the drawing data files 81 to 89 having data are not distributed. The above-described shot data may be generated from the first to third file groups 104 to 106 thus generated. In the generation, when the first to third file groups 104 to 106 are merged, the graphic group of the drawing data file 83 and the graphic group of the drawing data file 84 are the same in the third divided frame as in FIG. 73 is merged. Similarly, the graphic group of the drawing data file 86 and the graphic group of the drawing data file 87 are arranged in the same fifth divided frame 75. According to such a generation method, the same effects as those of the first embodiment described above are realized. The second embodiment corresponds to the inventions described in claims 1 and 3.

  Next, a drawing data file generation method according to the third embodiment of the present invention will be described. In this generation method, layout data files 64 to 66 are generated as in the first embodiment. Each data processing circuit 49 refers to the condition data file when generating the drawing data file. As illustrated in FIG. 16, the first formation region 55 is divided into, for example, three first to third divided frames 111 to 113 adjacent in the y-axis direction. The height h and width w of the first to third divided frames 111 to 113 coincide with the height h and width w of the first to third divided regions 58 to 61, respectively. The positions of the first to third divided frames 111 to 113 in the first forming area 57 are specified by the positions of the origins of the first to third divided frames 111 to 113 with respect to the origin of the first forming area 57.

  The data processing circuit 49 distributes the graphic 63 of the first formation area 58 to the first to third divided frames 111 to 113. Two drawing data files 121 and 122 are generated corresponding to the first and second divided frames 111 and 112 from the first divided area 58. As described above, the distribution criteria for the graphic 63 of the graphic 63 are different between when the layout data file is generated and when the drawing data file is generated. Accordingly, referring also to FIG. 17, the graphic group of the graphic 63 to be distributed to the first divided frame 111 in the first divided region 58 is distributed to the drawing data file 121 based on the distribution standard when the drawing data file is generated. It is done. At the same time, the graphic group of the graphic 63 to be distributed to the second divided frame 112 in the first divided area 58 is distributed to the drawing data file 121.

  Similarly, drawing data files 123 to 125 are generated from the second divided region 59 corresponding to the first to third divided frames 111 to 113. Referring also to FIG. 18, in the drawing data file 123, the graphic group of the graphic 63 to be distributed to the first divided frame 111 in the second divided region 59 is distributed. The graphic group of the graphic 63 to be distributed to the second divided frame 112 in the second divided region 59 is distributed to the fourth drawing data file 124. Similarly, the graphic group of the graphic 63 to be distributed to the third divided frame 113 in the second divided region 59 is distributed to the drawing data file 125.

  Similarly, drawing data files 126 and 127 are generated from the third divided region 61 corresponding to the second and third divided frames 112 and 113. The graphic group of the graphic 63 to be distributed to the second divided frame 112 in the third divided region 61 is distributed to the drawing data file 126. Similarly, the graphic group of the graphic 63 to be distributed to the third divided frame 113 in the third divided area 61 is distributed to the drawing data file 127. In generating the drawing data files 121 to 127, the distribution standard for the figure 63 is set to the same distribution standard as in the first embodiment.

  Shot data is generated based on the generated drawing data files 121-127. Here, as shown in FIG. 19, the graphic group of the drawing data file 121 and the graphic group of the drawing data file 123 are arranged in the same first divided frame 111. The graphic group of the second drawing data file 122, the graphic group of the drawing data file 124, and the graphic group of the drawing data file 126 are arranged in the same second divided frame 73. Similarly, the graphics group of the drawing data file 125 and the graphics group of the drawing data file 127 are arranged in the same third divided frame 113. Thus, shot data is generated. According to such a generation method, the same operational effects as those of the first embodiment described above are realized.

  Next, details of the distribution of the figure 63 will be described. As shown in FIG. 20, for example, when a layout data file is generated, a figure 63j straddling the dividing line 62 is distributed to the second divided region 59 based on the position of the origin. Similarly, the figure 63k is distributed to the second divided region 59 based on the position of the origin. On the other hand, the graphic 63k straddles both outer edges 91a and 91a of the margin area 91 when the drawing data file is generated. As a result, the figure 63j is divided by the dividing line 78 into a figure 63m and a figure 63n. The figure 63m is distributed to the first divided frame 111. The figure 63n is distributed to the second divided frame 112. On the other hand, when the drawing data is generated, since the center point of the figure 63k is located in the first divided frame 111, the figure 63k is distributed to the first divided frame 111. Thus, for example, the area to which the graphic 63 should be distributed changes based on the difference in the distribution standard of the graphic 63.

  Here, as in the first embodiment, the correspondence between the claims and the third embodiment will be described. The third embodiment corresponds to the invention described in claims 1 and 4. The first to third layout data in the claims correspond to the layout data files 64, 65 and 66, respectively. The first to sixth drawing data correspond to the drawing data files 122, 124, 126, 121, 123, 127, respectively. In the second embodiment, the first to sixth graphic groups satisfying the first to sixth conditions are extracted from the layout data files 64 to 66 to the drawing data files 121, 122, 124, 123, 126, and 127, respectively. . In other words, the layout data file 64 specifies the first and second graphic groups. The layout data file 65 specifies the third and fourth graphic groups. The layout data file 66 specifies the fifth and sixth graphic groups.

  In the third embodiment, the second, third, and fifth graphic groups are all extracted based on the criteria specified according to the second, third, and fifth conditions. The first graphic group is extracted based on the criteria specified according to the condition including the first condition. The fourth graphic group is extracted based on the criteria specified according to the condition including the fourth condition. The sixth graphic group is extracted based on the criteria specified according to the condition including the sixth condition. These first to sixth conditions and criteria are specified in the above-described condition data file. That is, the first to sixth conditions and criteria include division frame positions and shapes, and graphic distribution criteria. As is apparent from the third embodiment, the first to sixth conditions are different from each other.

  Next, a drawing data file generation method according to the fourth embodiment of the present invention will be described. In this generation method, as shown in FIG. 21, each data processing circuit 49 generates three drawing data files from one layout data file. That is, three drawing data files 121, 122, 131 corresponding to the first to third divided frames 111 to 113 are generated from the first divided area 58. The drawing data files 121 and 122 are generated in the same manner as in the third embodiment described above. On the other hand, since the third divided frame 113 corresponds to an area completely deviated from the first divided area 57, the graphic 63 is not allocated to the drawing data file 131. That is, the drawing data file 131 constitutes an empty data file that has no data.

  Three drawing data files 123 to 125 are generated from the second divided region 59 corresponding to the first to third divided frames 111 to 113. Similarly, three drawing data files 132, 126, and 127 are generated from the third divided region 61 corresponding to the first to third divided frames 111 to 113. Since the first divided frame 111 corresponds to an area completely deviated from the third divided area 61, the drawing data file 132 forms an empty data file having no data.

  The drawing data files 121 to 127 and the empty drawing data files 131 and 132 having the data thus generated are distributed to the first to third file groups 133, 134, and 135 as shown in FIG. Here, the drawing data files 121, 122, 131 generated from the first divided frame 111 are distributed to the first file group 133. The drawing data files 123 to 125 generated from the second divided frame 112 are distributed to the second file group 134. The drawing data files 132, 126, 127 generated from the third divided frame 113 are distributed to the third file group 135. In this way, the drawing data files 121, 122, and 124 are individually associated with at least one of the drawing data files 123, 126, and 127. The above-described shot data may be generated from the generated first to third file groups 133 to 135. The fourth embodiment corresponds to the inventions described in claims 1 and 5.

  64 First layout data, 65 Second layout data (first layout data), 66 Third layout data (second layout data), 82 Third drawing data, 83 First drawing data, 84 Second drawing data, 85 4 drawing data, 3rd drawing data, 86 1st drawing data, 87 2nd drawing data, 88 4th drawing data, 121 4th drawing data, 122 1st drawing data, 123 5th drawing data, 124 2nd drawing data 126 third drawing data, 127 sixth drawing data.

Claims (5)

A first graphic group arranged in a first divided frame among a plurality of divided frames generated by dividing a formation region for forming a circuit pattern based on a layout specified according to a plane coordinate system; and the plane coordinates Obtaining first layout data for specifying a second graphic group arranged in a second divided frame adjacent to the first divided frame based on a layout specified according to a system;
A third graphic group arranged in the second divided frame based on the layout specified according to the planar coordinate system, and a third group adjacent to the second divided frame based on the layout specified according to the planar coordinate system . Obtaining second layout data for specifying a fourth graphic group arranged in each of the divided frames ;
The second the second figure group disposed in the divided frame out can the first layout data or al disconnect, and generating a first rendering data,
The second the third graphic group disposed in the divided frame out come the second layout data or al disconnect, and generating a second drawing data,
A method for generating charged particle beam drawing data, comprising: In the creation method of the charged particle beam drawing data according to claim 1,
The first the first figure group disposed in the divided frame out can the first layout data or al disconnect, and generating a third drawing data,
It said third and fourth graphic group disposed in the divided frame out come the second layout data or al disconnect, further comprising the step of generating the fourth rendering data,
The charged particle beam drawing data generation method, wherein the first drawing data and the second drawing data are associated with the third drawing data and the fourth drawing data in common. In the creation method of the charged particle beam drawing data according to claim 1,
The first the first figure group disposed in the divided frame out can the first layout data or al disconnect, and generating a third drawing data,
It said third and fourth graphic group disposed in the divided frame out come the second layout data or al disconnect, further comprising the step of generating the fourth rendering data,
The charged particle beam drawing data generation method, wherein the first drawing data and the second drawing data are individually associated with at least one of the third drawing data and the fourth drawing data. In the creation method of the charged particle beam drawing data according to claim 1,
The second layout data specifies a fifth graphic group arranged in a fourth divided frame adjacent to the third divided frame based on a layout specified according to the planar coordinate system,
A sixth graphic group arranged in the fourth divided frame based on the layout specified according to the planar coordinate system, and a fifth adjacent to the fourth divided frame based on the layout specified according to the planar coordinate system . Obtaining third layout data for specifying a seventh graphic group arranged in each of the divided frames ;
It said fourth fifth graphic group disposed in the divided frame out come the second layout data or al disconnect, and generating a fifth drawing data,
The fourth the sixth figure group disposed in the divided frame out can the third layout data or al disconnect, further comprising the step of generating a sixth drawing data,
The charged particle beam drawing characterized in that the first drawing data, the second drawing data, and the third drawing data are commonly associated with the fourth drawing data, the fifth drawing data, and the sixth drawing data. To create data. In the creation method of the charged particle beam drawing data according to claim 1,
The second layout data specifies a fifth graphic group arranged in a fourth divided frame adjacent to the third divided frame based on a layout specified according to the planar coordinate system,
A sixth graphic group arranged in the fourth divided frame and a seventh graphic group arranged in a fifth divided frame adjacent to the fourth divided frame based on a layout specified according to the planar coordinate system Obtaining third layout data for identifying
It said fourth fifth graphic group disposed in the divided frame out come the second layout data or al disconnect, and generating a fifth drawing data,
The fourth the sixth figure group disposed in the divided frame out can the third layout data or al disconnect, further comprising the step of generating a sixth drawing data,
The first drawing data, the second drawing data, and the third drawing data are individually associated with at least one of the fourth drawing data, the fifth drawing data, and the sixth drawing data. A method of creating charged particle beam drawing data.

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