JP5612598B2 - ポリ(ビニルヒドロキシアリールカルボン酸エステル)を含有する輻射線感受性組成物及び要素 - Google Patents

ポリ(ビニルヒドロキシアリールカルボン酸エステル)を含有する輻射線感受性組成物及び要素 Download PDF

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Publication number
JP5612598B2
JP5612598B2 JP2011542123A JP2011542123A JP5612598B2 JP 5612598 B2 JP5612598 B2 JP 5612598B2 JP 2011542123 A JP2011542123 A JP 2011542123A JP 2011542123 A JP2011542123 A JP 2011542123A JP 5612598 B2 JP5612598 B2 JP 5612598B2
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Japan
Prior art keywords
imageable
mol
substituted
group
groups
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Expired - Fee Related
Application number
JP2011542123A
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English (en)
Japanese (ja)
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JP2012513039A5 (OSRAM
JP2012513039A (ja
Inventor
レバノン モシェ
レバノン モシェ
ビリナ ジョージー
ビリナ ジョージー
カンペル ウラジミール
カンペル ウラジミール
ポステル ラリサ
ポステル ラリサ
ルビン マリナ
ルビン マリナ
クルトサー タニア
クルトサー タニア
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of JP2012513039A publication Critical patent/JP2012513039A/ja
Publication of JP2012513039A5 publication Critical patent/JP2012513039A5/ja
Application granted granted Critical
Publication of JP5612598B2 publication Critical patent/JP5612598B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262Phenolic condensation polymers, e.g. novolacs, resols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2011542123A 2008-12-19 2009-12-14 ポリ(ビニルヒドロキシアリールカルボン酸エステル)を含有する輻射線感受性組成物及び要素 Expired - Fee Related JP5612598B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/339,469 2008-12-19
US12/339,469 US8048609B2 (en) 2008-12-19 2008-12-19 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
PCT/US2009/006533 WO2010080102A2 (en) 2008-12-19 2009-12-14 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s

Publications (3)

Publication Number Publication Date
JP2012513039A JP2012513039A (ja) 2012-06-07
JP2012513039A5 JP2012513039A5 (OSRAM) 2013-02-07
JP5612598B2 true JP5612598B2 (ja) 2014-10-22

Family

ID=42102646

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011542123A Expired - Fee Related JP5612598B2 (ja) 2008-12-19 2009-12-14 ポリ(ビニルヒドロキシアリールカルボン酸エステル)を含有する輻射線感受性組成物及び要素

Country Status (5)

Country Link
US (1) US8048609B2 (OSRAM)
EP (1) EP2376286B1 (OSRAM)
JP (1) JP5612598B2 (OSRAM)
CN (1) CN102256792B (OSRAM)
WO (1) WO2010080102A2 (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US20120189770A1 (en) * 2011-01-20 2012-07-26 Moshe Nakash Preparing lithographic printing plates by ablation imaging
JP6125965B2 (ja) * 2013-09-27 2017-05-10 上野製薬株式会社 p‐ヒドロキシ安息香酸アリルポリマーの製造方法
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
CN106292183A (zh) * 2016-08-24 2017-01-04 青岛蓝帆新材料有限公司 一种阳图热敏平版印刷版版材

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS508658B1 (OSRAM) 1970-06-19 1975-04-05
JPS508658A (OSRAM) * 1973-05-30 1975-01-29
JP3272150B2 (ja) * 1994-06-06 2002-04-08 富士写真フイルム株式会社 感光性平版印刷版および感光性組成物
US6255033B1 (en) 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
DE10239505B4 (de) 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
WO2004081662A2 (en) 2003-03-14 2004-09-23 Creo Inc. Development enhancement of radiation-sensitive elements
JP4391285B2 (ja) 2004-03-26 2009-12-24 富士フイルム株式会社 感光性平版印刷版
JP4340601B2 (ja) * 2004-08-16 2009-10-07 富士フイルム株式会社 平版印刷版原版
ATE389900T1 (de) * 2004-08-24 2008-04-15 Fujifilm Corp Verfahren zur herstellung einer lithographischen druckplatte
JP2006154099A (ja) * 2004-11-26 2006-06-15 Fuji Photo Film Co Ltd 平版印刷版原版
US7544462B2 (en) 2007-02-22 2009-06-09 Eastman Kodak Company Radiation-sensitive composition and elements with basic development enhancers

Also Published As

Publication number Publication date
WO2010080102A2 (en) 2010-07-15
EP2376286A2 (en) 2011-10-19
WO2010080102A3 (en) 2010-10-07
US8048609B2 (en) 2011-11-01
CN102256792A (zh) 2011-11-23
US20100159390A1 (en) 2010-06-24
EP2376286B1 (en) 2014-08-27
CN102256792B (zh) 2014-08-20
JP2012513039A (ja) 2012-06-07

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