JP5600128B2 - カタディオプトリック投影対物系 - Google Patents
カタディオプトリック投影対物系 Download PDFInfo
- Publication number
- JP5600128B2 JP5600128B2 JP2012023476A JP2012023476A JP5600128B2 JP 5600128 B2 JP5600128 B2 JP 5600128B2 JP 2012023476 A JP2012023476 A JP 2012023476A JP 2012023476 A JP2012023476 A JP 2012023476A JP 5600128 B2 JP5600128 B2 JP 5600128B2
- Authority
- JP
- Japan
- Prior art keywords
- objective
- image
- intermediate image
- plane
- objective part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 claims description 79
- 210000001747 pupil Anatomy 0.000 claims description 47
- 238000003384 imaging method Methods 0.000 claims description 43
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 238000001393 microlithography Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000005286 illumination Methods 0.000 claims description 2
- 238000012937 correction Methods 0.000 description 33
- 230000004075 alteration Effects 0.000 description 30
- 206010010071 Coma Diseases 0.000 description 19
- 238000011144 upstream manufacturing Methods 0.000 description 14
- 238000007654 immersion Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 230000009467 reduction Effects 0.000 description 8
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 6
- 208000001644 thecoma Diseases 0.000 description 6
- 201000009310 astigmatism Diseases 0.000 description 5
- 238000000671 immersion lithography Methods 0.000 description 5
- 230000005499 meniscus Effects 0.000 description 5
- 238000010276 construction Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000003702 image correction Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
Images
Landscapes
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58750404P | 2004-07-14 | 2004-07-14 | |
US60/587,504 | 2004-07-14 | ||
US59177504P | 2004-07-27 | 2004-07-27 | |
US60/591,775 | 2004-07-27 | ||
US61282304P | 2004-09-24 | 2004-09-24 | |
US60/612,823 | 2004-09-24 | ||
US61767404P | 2004-10-13 | 2004-10-13 | |
US60/617,674 | 2004-10-13 | ||
US11/035,103 US7385756B2 (en) | 2004-01-14 | 2005-01-14 | Catadioptric projection objective |
US11/035,103 | 2005-01-14 | ||
US65495005P | 2005-02-23 | 2005-02-23 | |
US60/654,950 | 2005-02-23 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007520725A Division JP4954067B2 (ja) | 2004-07-14 | 2005-07-08 | カタディオプトリック投影対物レンズ |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013243793A Division JP2014059579A (ja) | 2004-07-14 | 2013-11-26 | カタディオプトリック投影対物系 |
JP2014129379A Division JP2014199461A (ja) | 2004-07-14 | 2014-06-24 | カタディオプトリック投影対物系 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012108540A JP2012108540A (ja) | 2012-06-07 |
JP5600128B2 true JP5600128B2 (ja) | 2014-10-01 |
Family
ID=46494126
Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012023476A Expired - Fee Related JP5600128B2 (ja) | 2004-07-14 | 2012-01-19 | カタディオプトリック投影対物系 |
JP2013243793A Withdrawn JP2014059579A (ja) | 2004-07-14 | 2013-11-26 | カタディオプトリック投影対物系 |
JP2014129379A Withdrawn JP2014199461A (ja) | 2004-07-14 | 2014-06-24 | カタディオプトリック投影対物系 |
JP2015028386A Withdrawn JP2015121815A (ja) | 2004-07-14 | 2015-02-17 | カタディオプトリック投影対物系 |
JP2015195718A Withdrawn JP2016021076A (ja) | 2004-07-14 | 2015-10-01 | カタディオプトリック投影対物系 |
JP2016171601A Withdrawn JP2016224460A (ja) | 2004-07-14 | 2016-09-02 | カタディオプトリック投影対物系 |
Family Applications After (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013243793A Withdrawn JP2014059579A (ja) | 2004-07-14 | 2013-11-26 | カタディオプトリック投影対物系 |
JP2014129379A Withdrawn JP2014199461A (ja) | 2004-07-14 | 2014-06-24 | カタディオプトリック投影対物系 |
JP2015028386A Withdrawn JP2015121815A (ja) | 2004-07-14 | 2015-02-17 | カタディオプトリック投影対物系 |
JP2015195718A Withdrawn JP2016021076A (ja) | 2004-07-14 | 2015-10-01 | カタディオプトリック投影対物系 |
JP2016171601A Withdrawn JP2016224460A (ja) | 2004-07-14 | 2016-09-02 | カタディオプトリック投影対物系 |
Country Status (1)
Country | Link |
---|---|
JP (6) | JP5600128B2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014199461A (ja) * | 2004-07-14 | 2014-10-23 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3654083B1 (en) | 2017-07-10 | 2024-10-09 | Sony Group Corporation | Image display device and projection optical system |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000058436A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影露光装置及び露光方法 |
US6600608B1 (en) * | 1999-11-05 | 2003-07-29 | Carl-Zeiss-Stiftung | Catadioptric objective comprising two intermediate images |
JP2005233979A (ja) * | 2000-02-09 | 2005-09-02 | Nikon Corp | 反射屈折光学系 |
JP4245286B2 (ja) * | 2000-10-23 | 2009-03-25 | 株式会社ニコン | 反射屈折光学系および該光学系を備えた露光装置 |
JP4292497B2 (ja) * | 2002-04-17 | 2009-07-08 | 株式会社ニコン | 投影光学系、露光装置および露光方法 |
US7362508B2 (en) * | 2002-08-23 | 2008-04-22 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
KR101383984B1 (ko) * | 2003-05-06 | 2014-04-10 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
JP5600128B2 (ja) * | 2004-07-14 | 2014-10-01 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
-
2012
- 2012-01-19 JP JP2012023476A patent/JP5600128B2/ja not_active Expired - Fee Related
-
2013
- 2013-11-26 JP JP2013243793A patent/JP2014059579A/ja not_active Withdrawn
-
2014
- 2014-06-24 JP JP2014129379A patent/JP2014199461A/ja not_active Withdrawn
-
2015
- 2015-02-17 JP JP2015028386A patent/JP2015121815A/ja not_active Withdrawn
- 2015-10-01 JP JP2015195718A patent/JP2016021076A/ja not_active Withdrawn
-
2016
- 2016-09-02 JP JP2016171601A patent/JP2016224460A/ja not_active Withdrawn
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014199461A (ja) * | 2004-07-14 | 2014-10-23 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
JP2015121815A (ja) * | 2004-07-14 | 2015-07-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
JP2016021076A (ja) * | 2004-07-14 | 2016-02-04 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
JP2016224460A (ja) * | 2004-07-14 | 2016-12-28 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
Also Published As
Publication number | Publication date |
---|---|
JP2016021076A (ja) | 2016-02-04 |
JP2012108540A (ja) | 2012-06-07 |
JP2016224460A (ja) | 2016-12-28 |
JP2015121815A (ja) | 2015-07-02 |
JP2014059579A (ja) | 2014-04-03 |
JP2014199461A (ja) | 2014-10-23 |
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