JP5597502B2 - Adsorption member, adsorption apparatus using the same, light irradiation apparatus, and charged particle beam apparatus - Google Patents

Description

  The present invention relates to a suction member, a suction device using the same, a light irradiation device, and a charged particle beam device.

In a semiconductor element manufacturing process, a sample (object) such as a semiconductor wafer made of silicon is held while being adsorbed on an adsorption table of a semiconductor manufacturing apparatus and a semiconductor inspection apparatus. Examples of the process of holding the object on the suction table include a process of polishing the object to a mirror surface, a process of partially exposing a photosensitive material called a resist formed on the object with light or an electron beam, There are a step of removing the resist, a step of inspecting an object, and the like. In addition, a gas such as air, nitrogen, or oxygen is present around the adsorption table that holds the object. The pressure of this gas ranges from about 1 × 10 ⁵ Pa which is atmospheric pressure to about 1 × 10 ⁻⁷ Pa which is called high vacuum. For example, Patent Document 1 describes a configuration in which an object is sucked and held on a suction stand while being supported by a plurality of minute protrusions.

  Semiconductor wafers are becoming larger in area while miniaturizing wiring. In recent years, large-sized wafers having outer diameters of 200 mm and 300 mm are mainly used.

  On the other hand, in recent years, when manufacturing a substrate used for an application such as an optical disk or LED using a semiconductor laser, a manufacturing apparatus similar to that for manufacturing a semiconductor element is used. As the material of the wafer for manufacturing this substrate, a compound semiconductor such as GaN or InGaN, sapphire, SiC or the like is selected. The outer diameter of the wafer for this application may be as small as about 100 mm or less compared to the semiconductor wafer.

JP-A-9-283605

  Many manufacturing processes including, for example, an exposure process are common in the case of manufacturing a semiconductor element and in the case of manufacturing a substrate used for an application such as an optical disk or LED. Therefore, if the same semiconductor manufacturing apparatus can be used for a semiconductor wafer having an increased area and a relatively small wafer used for an application such as an optical disk or LED, introduction of a different semiconductor manufacturing apparatus according to the application, or Since it is not necessary to modify the semiconductor manufacturing apparatus, the manufacturing cost can be reduced. For this reason, the suction stand which can hold | maintain the target object from which a magnitude | size differs is calculated | required.

  However, the suction table is provided with a plurality of suction holes according to the size of the object to be sucked (the suction hole forming region is referred to as the suction hole formation region in this way. When an object having a size smaller than the assumed size is placed, a part of the suction hole is exposed without being covered by the object. Then, in the case of adsorption | suction, the malfunction that external air will be attracted | sucked by the exposed suction hole will arise. In this case, it is difficult to stably adsorb and hold the object.

Therefore, it is required to stably hold an object having a size smaller than the suction hole forming region of the suction table.

An adsorption member according to an aspect of the present invention is an adsorption member that is placed on an adsorption table provided with a plurality of suction holes and adsorbs an object by suction of a gas through the suction holes. A cover member having a base member placed thereon and an opening, and detachably placed on the base member, wherein the object is placed inside the opening. And at least one abutting portion provided on the inner peripheral edge of the cover member, on which the object abuts, and pressing the object provided on the cover member against the abutting portion, A holding member that holds the object with respect to the abutting portion, and the base member has a plurality of suction regions that allow suction by the suction hole and suck the object, and the cover member At least of the plurality of adsorption regions One is located inside of the opening, is placed on the base member on such other of the suction region is covered with the cover member, the retaining member is in contact with a contact portion in contact with the object A plurality of fixing portions fixed to the base member at positions on both sides of the contact portion in a direction orthogonal to the direction in which the object is pressed against the contact portion, and the contact portions and the plurality of fixing portions. Are connected to each other, and when the cover member is viewed in plan, the inner peripheral edge is connected to the contact portion. A plurality of linear portions, and a plurality of arc-shaped portions positioned along the circumference of a predetermined circle, the plurality of linear portions being formed from the first linear portion and the first linear portion. And a short second straight portion, and the predetermined A line connecting the center point of the first straight line portion and the center point of the first straight line portion and a line connecting the center point of the predetermined circle and the center point of the second straight line portion form a right angle, An angle formed by a line connecting the center point of one straight line portion and the center point of the predetermined circle and a line connecting the center point of the predetermined circle and the contact portion of the holding member is the second angle It is larger than an angle formed by a line connecting the center point of the straight line portion and the center point of the predetermined circle and a line connecting the center point of the predetermined circle and the contact portion of the holding member .

  An adsorption device according to an aspect of the present invention includes the adsorption member and an adsorption table provided with a plurality of suction holes.

  A charged particle beam apparatus according to an aspect of the present invention includes the adsorption device, and a charged particle beam source that irradiates a charged particle beam to an object placed and adsorbed on the adsorption device.

  A light irradiation apparatus according to an aspect of the present invention includes the suction device and a light source that irradiates light onto an object placed on the suction device and sucked.

  According to the adsorbing member and the adsorbing device according to one aspect of the present invention, it is possible to stably hold an object having a size smaller than the suction hole forming region of the adsorption table.

  According to the charged particle beam apparatus and the light irradiation apparatus according to one aspect of the present invention, it is possible to accurately irradiate a charged particle beam or light to an object having a size smaller than the suction hole forming region of the suction platform.

(A) is a top view which shows the state which mounted the adsorption | suction member based on one Embodiment of this invention on the adsorption | suction stand, and adsorb | sucked the target object to the adsorption | suction member, (b) is XIB- of (a). It is sectional drawing in a XIB line part. It is the perspective view shown in the state which respectively separated the adsorption | suction stand, the target object, and the member for adsorption | suction which concerns on one Embodiment of this invention. (A) is a top view which shows the state which mounted the member for adsorption | suction which concerns on one Embodiment of this invention on an adsorption | suction stand, and adsorb | sucked the target object to the member for adsorption, (b) is XIIIB- of (a). Sectional drawing in a XIIIB line part, (c) is the elements on larger scale of the area | region XIIIC enclosed with the broken line of (b). It is the perspective view shown in the state which respectively separated the adsorption | suction stand, the target object, and the member for adsorption | suction which concerns on one Embodiment of this invention. (A), (b) is a top view which shows the state which mounted the member for adsorption | suction which concerns on one Embodiment of this invention on the adsorption | suction stand, and adsorb | sucked the target object to the member for adsorption | suction. The front view of the board | substrate which comprises the member for adsorption | suction which concerns on one Embodiment of this invention, (b) is sectional drawing in the XVIB-XVIB line position of (a), (c) is the part in the XVIC-XVIC line of (a) An expanded sectional view and (d) are partial expanded sectional views in the XVID-XVID line of (a). (A) is a front view of the cover member which comprises the member for adsorption | suction which concerns on one Embodiment of this invention, (b) is sectional drawing in a XVIID-XVIID line part. (A) is a front view of the holding member attached to the cover member which comprises the member for adsorption | suction which concerns on one Embodiment of this invention, (b) is a side view (lower side view) seen from the arrow IVB direction of (a) (C) is a side view (right side view) when viewed from the direction of arrow IVC in (a). (A) is a top view which shows the other structural example of a holding member, (b) is a bottom view, (c) is a right view. (A) is a top view which shows the other structural example of a holding member, (b) is a bottom view, (c) is a right view. (A), (b) is a top view for demonstrating the detailed structure of a holding member. (A), (b) is sectional drawing which shows the positional relationship of the contact part of the edge part of a target object, and the target object of a holding member. It is a top view which shows the other structural example of a holding member. It is a figure which shows typically the structure of the light irradiation apparatus and charged particle beam apparatus which concern on one Embodiment of this invention. It is a flowchart which shows an example of the method of exposing a target object using the member for adsorption | suction which concerns on one Embodiment of this invention.

Hereinafter, embodiments of the present invention will be described in detail.
(First embodiment)
The adsorbing member 1B is used when adsorbing an object T such as a semiconductor wafer on the adsorption table 2. As shown in FIGS. 1 and 2, the suction member 1 </ b> B includes a base member 43 placed on the suction stand 2 and a cover member 44 placed detachably on the base member 43. . The cover member 44 has an opening 45. An object T is disposed inside the opening 45.

  The adsorption stand 2 has a suction hole 2a for sucking gas. These suction holes 2a are provided in accordance with the size of the object that is supposed to be sucked on the suction stand 2 without using the suction member 1B. Thus, the area | region in which the several suction hole 2a is provided in the suction stand 2 is also called "suction hole formation area."

  The base member 43 sucks the suction areas 46a and 46b that enable suction by the suction holes 2a (simply referred to as the suction area 46 when these suction areas are not distinguished) from the suction holes 2a. And a non-adsorption region 48 that disables suction by the holes 2a. The base member 43 has the through hole 10 in the adsorption regions 46 a and 46 b and does not have the through hole 10 in the non-adsorption region 48. The adsorption region 46a is circular, and the adsorption region 46b and the non-adsorption region 48 are annular. As shown in FIG. 2, a non-adsorption region 48 is provided on the outer periphery of the central adsorption region 46 a, and an adsorption region 46 b is provided on the outer periphery of the non-adsorption region 48.

  As described above, the base member 43 has the plurality of through holes 10 in the suction region 46. When the target object T is placed on the suction region 6, the target object T passes through the base member 43 by sucking the gas through the suction holes 2 a and the through holes 10 provided in the suction table 2. It is adsorbed on the adsorption table 2. When this suction is stopped, the target T is released from the suction, and the target T can be removed from the suction base 2 and the base member 43.

  The base member 43 is adsorbed onto the adsorption table 2 by sucking gas through the suction holes 2a provided in the adsorption table 2, and released from the adsorption when the suction is stopped. Thus, the base member 43 can be attached to and detached from the suction table 2 by applying and releasing the suction force. Note that when the gas is sucked through the suction hole 2 a and the through hole 10, the object T and the base member 43 can be simultaneously sucked onto the suction table 2.

The cover member 44 has an opening 45. The cover member 44 is placed on the base member 43 so that the inner peripheral edge 54 in contact with the opening 45 is positioned on the non-adsorption region 48 when viewed in plan. The cover member 44 covers the suction area 46b outside the suction area 46a. And the target object T is adsorbed on the adsorption stand 2 via the adsorption | suction area | region 46a.

  As described above, the base member 43 having the plurality of suction regions 6 and the non-suction regions 48 is placed on the suction platform 2, and the opening 45 corresponding to the size of the target T is further provided on the base member 43. If the cover member 44 is placed, the cover member 44 and the object T can be adsorbed on the base member 43 with the non-adsorption region 48 therebetween.

  As described above, when the object T is sucked onto the suction stand 2, the base member 43 having the plurality of suction areas 46 is placed, and at least one of the plurality of suction areas 46 is placed on the base member 43. When the cover member 44 is placed so that the other suction region 46 is covered with the cover member 44 and located inside the opening 45, the object T is placed on the suction region 46 inside the opening 45. Then, the object T can be stably adsorbed and held. That is, when the suction member 1B according to the present embodiment is used, the object T having a size smaller than the suction hole forming region of the suction stand 2 can be stably sucked and held.

  It is also possible to remove the cover member 44, place the target T so as to cover all the plurality of suction regions 46 of the base member 43, and suck and hold it. Therefore, by using the adsorption member 1B, it is possible to stably adsorb and hold the objects T having different sizes.

  The base member 43 has at least two convex positioning members 51 a used for positioning the plurality of cover members 44 with respect to the base member 43. Further, the plurality of cover members 44 have through holes 51b corresponding to the positioning members 51a. The cover member 44 in FIG. 2 has two through holes 51b. The positioning member 51 a provided in the base member 43 is inserted into the through hole 51 b of the cover member 44. Thereby, the relative position of the base member 43 and the cover member 44 can be fixed. The number of the positioning members 51a and the through holes 51b is not limited to two as shown in the figure, and it is sufficient that there are at least one. However, for more accurate positioning of the base member 43 and the cover member 44, it is preferable that there are two or more. In addition, when the number of the positioning member 51a and the through-hole 51b is one, it is preferable that those shapes are prismatic shapes, for example so that the positioning member 51a may not rotate within the through-hole 51b. Further, the hole provided in the base member 43 and into which the positioning member 51a is inserted is not limited to the through hole, and may be a hole including a recess into which the positioning member 51a is inserted.

  The cover member 44 has contact portions 55 a and 55 b provided on the inner peripheral edge 54 with which the object T contacts. Specifically, since the opening 45 is a through-hole, the inner peripheral edge 54 corresponds to the side wall surface of the through-hole, and the contact portions 55a and 55b are flat portions provided on a part of the side wall surface. is there. The adsorbing member 1B includes a holding member 28 that presses the object T against the contact portions 55a and 55b. The cover member 44 has a concave portion 49 on the surface thereof. In the holding member 28, the fixing portion 28 b is fixed to the side wall of the concave portion 49. The holding member 28 presses the object T against the contact portions 55a and 55b, and holds the object T between the holding member 28 and the contact portions 55a and 55b, thereby opening the opening 45 of the cover member 44. The object T is fixed inside. The holding member 28 fixes the object T by pressing the outer peripheral surface of the object T against the contact portions 55a and 55b. Since the fixing of the object T can be performed relatively easily, even when the object T is repeatedly attached to and detached from the suction table 2, the complexity is reduced. Note that at least one contact portion 55 is sufficient.

The holding member 28 is preferably made of a material having a hardness lower than that of the object T so as not to damage the object T. The hardness is, for example, Vickers hardness. Vickers hardness is JIS
Measured based on (Japanese Industrial Standard) Z 2244: 2009.

  The material of the holding member 28 may be a semiconductor material, and may be a resin or a zirconium oxide ceramic. When the material of the holding member 28 is a semiconductor material, the holding member 28 can release static electricity. This is particularly useful when there is a possibility of transporting the holding member 28 into the exposure apparatus. Further, when the material of the holding member 28 is resin or zirconium oxide ceramics, when the object T is a silicon wafer, even if the holding member 28 is worn by contact with the object T, the wear debris is not metal. The adverse effect on the object T can be suppressed. In particular, since zirconium oxide ceramics are less likely to wear, it is possible to suppress wear debris from adhering to the object T. Furthermore, the holding member 28 is preferably made of a material having good thermal conductivity.

  When the object T is a silicon wafer, examples of the material that satisfies the above conditions include polycarbonate resin when the object T is a silicon wafer.

  The opening 45 is formed in accordance with the shape of the object T. For example, when the object T is circular, the shape of the opening 45 is circular. However, as shown in FIG. 2, when the object T is, for example, a silicon wafer, there is an orientation flat (hereinafter abbreviated as “orientation flat”) indicating the direction. In this case, a straight line portion corresponding to the orientation flat may also exist on the inner peripheral edge of the opening 45.

  The base member 43 may have an annular sealing portion 64 in the non-adsorption region 48. The annular sealing portion 64 is, for example, an annular wall, and includes an annular convex portion (referred to as “inner convex portion” in the present embodiment). In this case, the outer peripheral edge of the object T and the inner peripheral edge 54 of the cover member 44 are placed on the inner convex portion. Further, in this case, the annular wall 35 is also provided on the outer peripheral portion of the base member 43. The annular wall 35 is an annular convex portion (referred to as an “outer convex portion” in the present embodiment). And the outer periphery of the cover member 44 is mounted in this outer side convex part. In such a configuration, the gas existing in the space surrounded by the inner convex portion, the surface of the base member 43, and the surface of the object T (the surface facing the base member 43) is sucked into the suction holes 2a and the through holes 10. The object T can be sucked onto the suction table 2 through the base member 43 by sucking through the base member 43. In addition, the gas existing in the space surrounded by the inner and outer protrusions, the surface of the base member 43 and the surface of the cover member 44 (the surface facing the base member 43) is removed from the suction holes 2a and the through holes 10. The cover member 44 can be sucked onto the suction stand 2 by suctioning through the suction pad. Here, in order to support the cover member 44 and the object T flatly, it is preferable that the inner convex portion and the outer convex portion have the same height.

  The through hole 2b provided in the suction table 2 is a hole through which a push-up pin comes out when the base member 43 or the object T is placed. For example, when the base member 43 is placed on the adsorption platform 2, the base member 43 is temporarily placed on a push-up pin protruding from the through hole 2a. Thereafter, the push-up pin is automatically or controlled to be moved downward and stored in the through hole 2b. Thereby, the base member 43 is placed on the suction stand 2.

  The adsorption table 2 is usually installed in a semiconductor device. When the base member 43 or the like is placed on the suction table 2, the base member 43 is carried to the suction table 2 by a transfer jig such as an arm that automatically moves. Since it is difficult to place the base member 43 directly on the suction stand 2 without causing any damage by this arm, the base member 43 is temporarily placed on the push-up pin and then the push-up pin is sunk, whereby the base member 43 43 is placed on the suction table 2.

Moreover, the annular wall 2c provided in the outer peripheral part of the adsorption stand 2 suppresses gas from leaking to the outside when the base member 43 is placed on the adsorption stand 2 to perform adsorption. In the present embodiment, a closed space surrounded by the annular wall 2c, the suction table 2 and the surface of the base member 43 (surface facing the suction table 2) can be formed. The base member 43 can be adsorbed onto the adsorption table 2 by sucking the gas existing in the space through the suction holes 2 a and the through holes 10 provided in the adsorption table 2.

(Second Embodiment)
Next, the adsorbing member according to the second embodiment of the present invention will be described. The suction member 1 </ b> C according to the present embodiment is more preferably used when selecting and sucking any one of a plurality of objects T having different sizes on the suction stand 2. In addition, the same code | symbol is attached | subjected to the structure same as 1st Embodiment. Since the effect of these structures is the same, description may be abbreviate | omitted.

  As shown in FIGS. 3 to 6, the suction member 1 </ b> C includes a base member 43 placed on the suction stand 2 and a plurality of cover members 44 a, 44 b, 44 c corresponding to a plurality of objects T (these When the cover members are not distinguished, they are simply referred to as the cover member 44). The plurality of cover members 44a, 44b, 44c are detachably mounted on the base member 43, respectively. The plurality of cover members 44a, 44b, and 44c have openings 45 having different sizes.

  The shapes of the object T and the opening 45 are circular. However, as shown in FIG. 4, when the object T is a silicon wafer, for example, there is an orientation flat indicating the direction. In this case, a straight line portion corresponding to the orientation flat also exists on the inner peripheral edge of the opening 45.

  The base member 43 blocks suction areas 46a, 46b, 46c, and 46d that enable suction through the suction holes 2a (when these suction areas are not distinguished, they are simply referred to as suction areas 46) and suction through the suction holes 2a. Thus, there are non-adsorption regions 48a, 48b, and 48c that disable suction (when these non-adsorption regions are not distinguished, they are simply referred to as non-adsorption regions 48) (see FIGS. 4 and 6). . The base member 43 has the through hole 10 in the adsorption regions 46 a and 46 b and does not have the through hole 10 in the non-adsorption region 48. The adsorption region 46a is circular, and the adsorption regions 46b, 46c, 46d and the non-adsorption regions 48a, 48b, 48c are annular. As shown in FIGS. 4 and 6, the suction region 46 and the non-suction region 48 are alternately present from the inside toward the outside when the base member 43 is viewed in plan. Specifically, a non-adsorption region 48a is provided on the outer periphery of the central adsorption region 46a, and an annular adsorption region 46b is provided on the outer periphery of the non-adsorption region 48a. Thereafter, the adsorption region 46 and the non-adsorption region 48 are arranged in the order of the non-adsorption region 48b, the adsorption region 46c, the non-adsorption region 48c, and the adsorption region 46d from the center side to the outer peripheral side of the base member 43.

  The base member 43 has a plurality of through holes 10 in the suction region 46. When the target object T is placed on the suction region 46, the target object T passes through the base member 43 by sucking the gas through the suction holes 2 a and the through holes 10 provided in the suction table 2. It is adsorbed on the adsorption table 2. When this suction is stopped, the target T is released from the suction, and the target T can be removed from the suction base 2 and the base member 43.

  Further, the base member 43 is adsorbed to the adsorption table 2 by sucking gas through the suction hole 2a provided in the adsorption table 2, and released from the adsorption when the suction is stopped. Thus, the base member 43 is configured to be detachable from the suction table 2 by applying and releasing the suction force. Note that when the gas is sucked through the suction hole 2 a and the through hole 10, the object T and the base member 43 can be simultaneously sucked onto the suction table 2.

The cover members 44a, 44b, and 44c are placed on the base member 43 so that the inner peripheral edge 54 that is in contact with the opening 45 is positioned on the non-adsorption regions 48a, 48b, and 48c. The cover member 44b shown in FIGS. 3 and 4 is placed on the base member 43 so that the inner peripheral edge 54 of the opening 45 is positioned on the non-adsorption region 48b.

  The cover members 44 are prepared in the same number as the number of suction areas excluding the outermost suction area 46 in the base member 43. For example, in the suction member 1C according to the present embodiment, three types of cover members 44a, 44b, and 44c corresponding to the suction regions 46a, 46b, and 46c excluding the outermost suction region 46d are prepared. By combining these three types of cover members 44a, 44b and 44c with the case where the cover members 44a, 44b and 44c are not used, four types of objects T having different sizes can be adsorbed by the adsorption table 2. Become. Further, the cover members 44a, 44b, and 44c are placed on the base member 43 so as to cover all the suction regions 46 located outside the non-suction regions 48a, 48b, and 48c, respectively.

  For example, in FIG. 3, the suction areas 46c and 46d are covered with the cover member 44b, and the object T is sucked by the suction areas 46a and 46b. In FIG. 5A, the suction areas 46b, 46c, and 46d are covered with the cover member 44a, and the object T is sucked into the suction area 46a. In FIG. 5B, the suction region 46d is covered with the cover member 44c, and the object T is sucked by the suction regions 46a, 46b, and 46c.

  As described above, when the object T is adsorbed on the adsorption table 2, the base member 43 having the adsorption region 46 and the non-adsorption region 48 is placed on the adsorption table 2, and the object is further formed on the base member 43. If the cover member 44 having the opening 45 corresponding to the size of T is placed, the cover member 44 and the object T can be adsorbed on the base member 43 through the non-adsorption region 48, respectively.

  According to the suction member 1 </ b> C according to the present embodiment, similarly to the suction member 1 </ b> B, the target T having a size smaller than the suction hole forming region of the suction stand 2 can be stably sucked and held. In addition, by attaching and detaching the cover member 44 and replacing the cover members 44a, 44b, and 44c having different sizes of the opening 45, the four types of objects T having different sizes are stably adsorbed on the adsorption table 2, respectively. Can be held.

  As shown in FIG. 3C and FIG. 6, the base member 43 has a plurality of protrusions 12 in a plurality of suction regions 46, respectively. Further, the base member 43 has annular sealing portions 64 in the plurality of non-adsorption regions 48, respectively. For example, the base member 43b has an annular sealing portion 64 in the non-adsorption region 48, as shown in FIGS. 3 (c) and 6 (c). The annular sealing portion 64 has a pair of annular walls 64a and 64b and a region 64c surrounded by the annular walls 64a and 64b. The pair of annular walls 64a and 64b are double annular walls, and the annular wall 64b is provided outside the annular wall 64a. The region 64c is formed between the annular walls 64a and 64b. The through hole 10 is not provided in the region 64c unlike the suction region 46, and the object cannot be sucked onto the region 64c. That is, the region 64c cannot be sucked by the suction hole 2a.

  Preferably, the heights of the annular wall 64a and the annular wall 64b are the same, and the heights thereof are the same as the heights of the plurality of protrusions 12. When the annular walls 64 a and 64 b have the same height as the plurality of protrusions 12, the flatness of the target T can be maintained with high accuracy when the target T is adsorbed on the base member 43.

  An annular wall 65 is also provided on the outer periphery of the base member 43. Preferably, the height of the annular wall 65 is the same as the height of the annular walls 64 a and 64 b and the protrusion 12.

Here, when the cover member 44b is placed on the base member 43, the cover member 44 contacts the annular wall 64b closer to the suction region 46c, and the object T contacts the annular wall 64a closer to the suction region 46b. In this state, when gas is sucked through the suction hole 2a of the suction table 2 and the through hole 10 of the base member 43, the cover member 44 is vacuum-sucked outside the region 64c with the region 64c as a boundary, and from the region 64c. The object T is vacuum-sucked inside.

  Specifically, the adsorption table 2 is provided with a gas present in a closed space surrounded by the annular wall 64a, the surface of the base member 43, and the surface of the object T (the surface facing the base member 43). By sucking through the suction holes 2 a and the through holes 10, the object T can be sucked onto the suction table 2. Further, in a space surrounded by the annular wall 64b of the non-adsorption region 48c, the annular wall 65 located on the outer periphery of the base member 43, the surface of the base member 43, and the surface of the cover member 44 (surface facing the base member 43). The cover member 44 can be adsorbed onto the base member 43 and the adsorption table 2 by exhausting (suctioning) the gas existing in the adsorption table 2 through the suction holes 2 a and the through holes 10 provided in the adsorption table 2.

  The configuration of the non-adsorption region 48b described above is similarly applied to the non-adsorption regions 48a and 48c. Further, the annular sealing portion 64 is not limited to the above-described configuration, and may be any configuration as long as it has an annular convex portion. That is, the annular sealing portion 64 may have the double annular walls 64a and 64b as described above, but may also be a single annular wall. If the double annular walls 64a and 64b are used, the object T and the cover member 44 can be placed on different annular walls, and the object T and the cover member 44 are more reliably and stably annular. It can be placed on the sealing portion 64. The convex portions provided in the non-adsorption region 48 support the outer peripheral portion of the object T and the inner peripheral edge 54 of the opening 45. In addition, that the convex part is supporting the outer peripheral part of the target object T includes the case where the convex part is contacting the outer periphery of the target object T, or the vicinity of an outer peripheral edge. Further, the fact that the convex portion supports the inner peripheral edge 54 of the opening 45 is not only when the convex portion is in contact with the inner peripheral edge 54 of the opening 45 but also in the vicinity of the inner peripheral edge 54. Including cases.

  Further, the annular wall 65 provided on the outer peripheral portion of the base member 43 is not limited to the above-described configuration, and may be any configuration as long as it has an annular convex portion. The convex portion in this case supports the outer peripheral portion of the cover member 44.

  The base member 43 has at least two convex positioning members 51a used for positioning the plurality of cover members 44 with respect to the base member 43, and the plurality of cover members 44 have through holes 51b corresponding to the positioning members 51a, respectively. Have. The cover member 44 in FIG. 4 has two through holes 51b. The positioning member 51 a provided in the base member 43 is inserted into the through hole 51 b of the cover member 44. Thereby, the relative position of the base member 43 and the cover member 44 can be fixed. A cross section of the positioning member 51a is shown in FIG. The positioning member 51a is fixed to the base member 43 with an adhesive or the like, and has a structure in which the relative positional relationship does not change. The positioning member 51a typically has a cylindrical shape. Around the positioning member 51a, an annular wall 64d surrounding the periphery of the positioning member 51a and an annular wall 64e surrounding the periphery of the annular wall 64d are formed. The heights of the top portions of the annular walls 64d and 64e are the same as those of the plurality of protrusions 12 and the annular walls 64a and 64b.

  The number of the positioning members 51a and the through holes 51b is not limited to two as shown in the figure, and it is sufficient that there are at least one. However, for more accurate positioning of the base member 43 and the cover member 44, it is preferable that there are two or more. Moreover, it is preferable that the outer diameter of the positioning member 51a and the inner diameter of the through-hole 51b have a fitting tolerance. It is more preferable to make one of the through holes 51b a long hole (see FIGS. 5 and 7), since it is not necessary to tighten the relative positioning dimension tolerance between the plurality of positioning members 51a.

The plurality of cover members 44 are abutting portions 55a provided on the inner peripheral edge 54 against which the object T abuts.
, 55b and a holding member 28 that presses the object T against the contact portions 55a, 55b. The holding member 28 presses the object T against the contact portions 55a and 55b, and fixes the position of the object T. Since the fixing of the object T can be performed relatively easily, even when the object T is repeatedly attached to and detached from the suction table 2, the complexity is reduced. Note that at least one contact portion 55 is sufficient.

  Here, the configuration of the cover member 44 will be described in more detail. As shown in FIG. 7, when the cover member 44 is viewed in plan, the inner peripheral edge 54 of the opening 45 is along a different direction from the first straight portion 56 a that becomes the contact portion 55 a and the first straight portion 56 a. And a second linear portion 56b that becomes the contact portion 55b. If a region formed by extending a contact portion 28a (described later) of the holding member 28 virtually linearly toward the opening 45 along the expansion / contraction direction of the expansion / contraction portion 28b (described later) is defined as a virtual straight region. The intersection between the straight region and the inner peripheral edge 54 is located between the first straight portion 56a and the second straight portion 56b. In this case, when the object T is pressed by the contact portion 28a, the object T is pressed by the first straight portion 56a and the second straight portion 56b, and the target T is more stably arranged on the inner side of the opening 45. can do.

  Moreover, the following structures may be sufficient. As shown in FIG. 7, when the cover member 44 is viewed in plan, the inner peripheral edge 54 of the opening 45 has a plurality of linear portions 56 a and 56 b that become contact portions 55 a and 55 b with the object T, and a predetermined circle. And a plurality of arc-shaped portions 57a, 57b, and 57c located along the circumference of the. The plurality of straight line portions 56a and 56b have a first straight line portion 56a and a second straight line portion 56b shorter than the first straight line portion 56a. A line connecting the center point C0 of the predetermined circle and the center point C1 of the first straight line portion 56a and a line connecting the center point C0 of the predetermined circle and the center point C2 of the second straight line portion 56b are perpendicular to each other. There is no.

  Further, a line connecting the center point C1 of the first straight line portion 56a and the center point C0 of the predetermined circle, and a contact part where the center point C0 of the predetermined circle and the contact portion 28a of the holding member 28 contact the object T. The angle formed by a line connecting (described later) with the line connecting the center point C2 of the second straight line portion 56b and the center point C0 of the predetermined circle, and the center point C0 of the predetermined circle and the holding member 28 It is larger than an angle formed by a line connecting the contact portion of the contact portion 28a. Thereby, since the force applied to the first straight portion 56a that is longer than the second straight portion 56b is increased, the object T can be arranged more stably inside the opening 45. As a result, even if the object T is repeatedly brought into contact with the contact portions 55a and 55b using the holding member 28, the relative position between the object T and the cover member 44 is unlikely to change.

  In the above description, the configuration when the cover member 44 is viewed in plan is described. However, the cover member 44 actually becomes the contact portions 55a and 55b on the side wall surface of the through hole serving as the opening 54. It has a plurality of flat portions and a curved surface portion provided between the plurality of flat portions and having an arcuate curved surface. And the outer peripheral surface (side surface) of the target T is arrange | positioned so that the side wall surface of the opening 54 of the cover member 44 may be contact | abutted. Further, the contact surface 28a of the holding member 28 has a contact surface (see FIGS. 8B, 9B, and 10B) that is in contact with the outer peripheral surface of the object T. Here, since the object T is disk-shaped and the lower side surface, which is the contact surface of the contact portion 28a of the holding member 28, is a flat surface, the contact surface of the contact portion 28a of the holding member 28 and the object T It contacts with an outer peripheral surface at one point when planarly viewed. Therefore, when the cover member 44 is viewed in plan, the contact portion where the contact portion 28a of the holding member 28 contacts the object T can be regarded as one point.

The holding members 28A, 28A ′, 28B, and 28B ′ (the holding members 28A, 28A ′, 28B, and 28B ′ shown in FIG. 8 to FIG. 11 and FIG. 13 are simply referred to as “holding member 28”. ) Refers to the Y direction in FIGS. 11 and 12, which is also referred to as a “contacting direction” (hereinafter referred to as “pressing direction”).
) In a direction orthogonal to (X direction), a plurality of fixed portions 28b located on both sides of the contact portion 28a, and a plurality of expansion and contractions that connect the contact portion 28a and the plurality of fixed portions 28b respectively and can be expanded and contracted in the pressing direction. Part 28c.

  Note that the holding member 28A ′ in FIG. 9 is a part where the object T can contact the contact portion 28a so that the object T more reliably contacts the contact portion 28a as compared to the holding member 28A in FIG. That is, the case where the area of the side surface (see FIG. 9B) when the contact portion 28a is viewed from the VB direction is further increased is shown.

  Further, the holding members 28A and 28A ′ shown in FIGS. 8 and 9 have the pulling portion 28d (described later) positioned outside the fixing portion 28b in the Y direction, whereas the holding members 28A and 28A ′ shown in FIG. In the member 28B, the pulled portion 28d is located at the same position as the fixed portion 28b or inside the fixed portion 28b in the Y direction.

  Hereinafter, the configuration of the holding member 28B will be described in detail with reference to FIG. The description will be given with respect to the holding member 28B, but the same description applies to the holding member 28A and the holding member 28A 'shown in FIGS.

  As shown in FIG. 11, in the holding member 28B, the contact portion 28a has a rectangular shape whose longitudinal direction is the X direction, and the contact portion 28a is at an equal distance from the two fixed portions 28b. The elastic part 28c connects the end part in the longitudinal direction of the contact part 28a and the fixed part 28b. The expansion / contraction part 28c has a site | part bent between the fixing | fixed part 28b and the contact part 28a, and can be expanded-contracted along a pressing direction (Y direction). Specifically, the expansion / contraction part 28c extends along a direction (X direction) orthogonal to the pressing direction from an end part (hereinafter also referred to as “first end part”) connected to the fixing part 28b. It is bent into a U-shape and extends along the X direction again. If this is a U-shaped part, the U-shaped part has an end (hereinafter also referred to as “second end”) different from the end connected to the fixing portion 28b extending along the Y direction. It connects with the edge part of the contact part 28a via the existing site | part (henceforth "connection part"). Thereby, the expansion / contraction part 28c acts like a spring that expands and contracts in the Y direction. In the following description, a portion extending in the X direction from the first end portion to the bent portion is referred to as “first extending portion”, and a portion extending in the X direction from the bent portion to the second end portion is referred to as “first extension portion”. It is also called “2 extension part”.

  The fixing portion 28b is fixed to the cover member 44, specifically, the inner wall of the concave portion 49. The contact portion 28a can be displaced in the pressing direction.

  Further, the holding member 28B has a pulling portion 28d connected to the contact portion 28a in order to move the contact portion 28a in the Y direction. The pulling portion 28d is connected to the contact portion 28a between the two fixing portions 28b in the X direction. Here, in the holding member 28A shown in FIGS. 8 and 9, the tension portion 28d is positioned outside the fixed portion 28b in the Y direction. In this case, the pulling portion 28d can be easily pulled along the Y direction. On the other hand, in the holding member 28B, the contact portion 28a is the same as the fixed portion 28b or inside the fixed portion in the Y direction, and does not protrude outward from the fixed portion 28b. In this case, the holding member 28 can be made smaller. Note that the tension portion 28d is located outside the fixed portion 28b in the Y direction means that the outer edge of the tension portion 28d is located outside the outer edge of the fixed portion 28b in the Y direction. In addition, the tension portion 28d is in the same position as the fixing portion 28b in the Y direction or inside the fixing portion 28b. The outer edge of the tension portion 28d is in the same position as the outer edge of the fixing portion 28b in the Y direction. It means being inside the outer edge of the fixed portion 28b.

Further, the pulling portion 28 d of the holding member 28 </ b> B has a hole portion 29. For example, when the tip of a pin-shaped hook member is inserted into the hole 29 and the pulling portion 28 d is pulled in the Y direction, the contact portion 28 a can be displaced outward along the Y direction so as to be separated from the suction region 6. it can. Further, when the force applied to the pulling portion 28 d is reduced or removed, the pulling portion 28 d and the contact portion 28 a can be displaced inward along the Y direction so as to approach the suction region 46. In addition, as for the tension | pulling part 28d, in the Y direction, it is more preferable to be located in the same position as the fixing | fixed part 28b, or an inner side rather than the fixing | fixed part 28b. In this case, the holding member 28 can be further downsized. In addition, the holding member 28A can be easily configured so that the hooking member is hooked, for example, by bending the tip of the pulling portion 28d because the pulling portion 28d is positioned outside the fixing portion 28b in the Y direction. . Therefore, the hole 29 is not necessarily provided.

  Next, the operation of the holding member 28 will be described. First, force is applied to displace the pulling portion 28 d outward along the Y direction so as to leave the suction region 6, and the target T is positioned in the suction region 6. Thereafter, the force applied to the pulling portion 28 d is reduced or removed, and the pulling portion 28 d and the contact portion 28 a are displaced inward along the Y direction so as to approach the suction region 6. As a result, the object T is pressed against the contact portions 55a and 55b using the force with which the stretchable portion 28c attempts to return to the original position. That is, the holding member 28 acts like a spring that expands and contracts in the Y direction. The holding member 28 preferably has a hinge shape that can be displaced in the X direction.

  It is preferable that the center of the hole 29 is located along the Y direction at the same position as the outer edge of the second extending part on the first extending part side or from the outer edge to the contact part 28a side. When the hole 29 is provided in such a position, when the tip of the hook member is inserted into the hole 29 and the contact portion 28a is pulled outward in the Y direction, the contact portion 28a is floated, that is, in the X direction and It is possible to effectively suppress movement in a direction perpendicular to the Y direction (Z direction). More preferably, the hole 29 may be provided in the contact portion 28a, or may be provided in a position closer to the contact portion 28a along the Y direction in the pulling portion 28d. If provided at such a position, when the tip of the hook member is inserted into the hole 29 and the contact portion 28a is pulled outward in the Y direction, the contact portion 28a can be more effectively suppressed from floating. it can. However, since the contact portion 28a is a part that contacts the object T, it may be possible to reduce the distance (width) in the Y direction due to problems such as rigidity. In that case, since it is difficult to provide the hole 29 in the contact portion 28a, it may be provided in the pulling portion 28d. Also, the tension portion 28d may have to have a small width in the X direction at a portion close to the contact portion 28a due to the above-described problems such as rigidity. In that case, the pulling portion 28d may be provided in a portion where there is no problem in the operation of the holding member 28 even if the hole portion 29 is provided.

  Further, as shown in FIG. 11B, the holding member 28B has a length of the contact portion 28a of L and a distance (width) in the Y direction of the contact portion of W, for example, W / L is 0.05. It is preferable that it is above 0.07. With this relationship, when a force is applied to the pulling portion 28d in the Y direction, the contact portion 28a easily follows the pulling portion 28d and is displaced in the Y direction.

  In addition, if W / L is too small, the pressing force acting on the object T by the contact portion 28a becomes small and it becomes difficult to hold the object T accurately. If W / L is too large, the contact portion 28a. As a result, the pressing force acting on the object T increases, and the object T may be deformed or broken. Therefore, W / L is preferably 0.05 or more and 0.07 or less.

Further, when the width of the connecting portion of the stretchable portion 28c is B, W / B is preferably 0.5 or more and 2 or less. If W / B is too small, the displacement amount of the contact portion 28a becomes small, and the pressing force acting on the object T by the contact portion 28a becomes small, so that it becomes difficult to hold the object T with high accuracy. Moreover, if W / B is too large, the deformation of the expansion / contraction part 28c becomes too large, and the expansion / contraction part 28c is shaken in a direction other than the Y direction, and a pressing force is applied to the object T along the Y direction. It becomes difficult. As a result, it becomes difficult to hold the object T with high accuracy. Therefore, W / B is preferably 0.5 or more and 2 or less.

  The contact portion 28a has a contact surface S that contacts the object T. As shown in FIG. 10B, the contact surface S is a surface when the contact portion 28a is viewed from below along the Y direction. This contact surface S is perpendicular to the pressing direction (Y direction), for example, as shown in FIG.

  Further, the contact surface S may be inclined along a direction (Z direction) perpendicular to both the pressing direction (Y direction) and the direction perpendicular to the pressing direction (X direction). For example, the contact surface S shown in FIG. 12B is the surface of the suction stand 2 in the direction (Z direction) perpendicular to both the pressing direction (Y direction) and the X direction perpendicular to the pressing direction. As it leaves, it inclines so that it may protrude to the target object T side. When the contact surface S is inclined in this way, the contact surface S is positioned so as to cover the end portion of the object T, so that the object T is prevented from floating away from the suction table 2. The object T can be positioned with high accuracy. Moreover, it can suppress that the target object T remove | deviates from the base member 43. FIG. On the other hand, if the inclination angle of the contact surface S becomes too large, the pressing force in the Y direction from the contact surface S to the object T becomes difficult to be transmitted, so the inclination angle M is greater than 0 degree and 30 degrees or less. More preferably.

  Further, if the contact surface S is curved along the shape of the outer peripheral surface of the object T as in the holding member 28B ′ shown in FIG. 13, the object T can be pressed over the entire surface, and the accuracy is increased. The object T can be held more reliably and reliably. In addition, when holding member 28B 'of FIG. 13 is used, the site | part which the outer peripheral surface of the disk-shaped target object T and the contact surface of the contact part 28a of the holding member 28 contact will become a curve when planarly viewed. . In this case, the center point of the curve may be a contact portion where the holding member 28 contacts the object T.

  As described above, according to the above-described configuration using the holding member 28 and the contact portion 15, even if the radial dimension of the object T varies, the object T can be held by the holding member 28 and the contact portions 55 a, It is stably fixed by 55b, and it is suppressed that it rotates along the inner periphery 54 of the opening part 45. FIG. Therefore, according to the said structure, the target object T can be located in the opening part 45 with high positional accuracy.

  Further, according to the holding member 28, the object T can be held or removed simply by moving the contact portion 28a of the holding member 28 in the Y direction. Is relatively easy.

  As described above, according to the suction member 1C according to the present embodiment, the objects T having different sizes can be sucked onto the suction stand 2 with high positioning accuracy.

  The suction members 1B and 1C according to the first or second embodiment described above and the suction table 2 on which the suction members 1B and 1C are placed constitute a suction device. The suction device may further include a vacuum pump (not shown) for decompressing the inside of the through hole 2a of the suction table 2.

In addition, as for the base member 43, it is preferable that the mounting surface of the side mounted on the adsorption stand 2 has warped in concave shape. In this case, when the base member 43 is to be placed on the suction stand 2 by lowering the push-up pin, the outer peripheral portion of the base member 43 is moved faster by the annular wall 2c of the suction stand 2 than when the base member 43 is flat. Can be contacted. Thereby, since the suction of the gas in the space surrounded by the annular wall 2c, the suction table 2 and the surface of the base member 43 (the surface facing the suction table 2) can be started earlier, It is possible to shorten the time required for the cycle of placing, adsorbing and removing the adsorbing member 1A. As a result, the throughput of processing when performing processing such as exposure by replacing a large number of base members 43 can be increased. In addition, it is preferable that the said concave warp is 20 micrometers-200 micrometers, for example. If the amount of warping is too large, the adsorption itself of the adsorption member 1A takes a long time, so that the merit of starting the adsorption early is reduced. If the warpage amount is 200 μm or less, the processing throughput can be kept high. In order to form the warp in this way, the mounting surface on which the object T is mounted is blasted, while the mounting surface on the side mounted on the suction table 2 is mirror-finished. What is necessary is just to make a difference in the stress inherent in the mounting surface and the mounting surface. Thereby, if the stress inherent in the mounting surface is made higher than the stress inherent in the mounting surface, the base member 43 has a shape in which the mounting surface warps in a concave shape.

  By the way, it is preferable that the material for forming the base member 43 and the cover member 44 of the adsorption member according to the first or second embodiment is ceramic, and further, an alumina sintered body or a silicon carbide sintered material is used. It is preferable to form the body.

  The alumina sintered body can be a part having high rigidity, high strength and high hardness. That is, the base member 43 and the cover member 44 can each have a Young's modulus of 280 to 400 GPa, a three-point bending strength of 250 to 500 MPa, and a Vickers hardness (Hv1) of 12 to 18 GPa. The member 44 can have a small distortion and is hardly damaged.

  In addition, even when the base member 43 and the cover member 44 are formed using a silicon carbide sintered body, the base member 43 and the cover member 44 are highly rigid as in the case where they are formed using an alumina sintered body. In addition, the strength can be increased. Therefore, the base member 43 and the cover member 44 can be made to be less distorted and less likely to be scratched, and since the heat dissipation effect is higher, distortion and deformation can be further reduced. The Young's modulus of the base member 43 and the cover member 44 is 350 to 500 GPa, the three-point bending strength is 450 to 600 MPa, the Vickers hardness (Hv1) is 20 to 23 GPa, and the thermal conductivity is 60 to 200 W / (m · K). Each can be obtained.

  In particular, when the base member 43 and the cover member 44 are formed using a silicon carbide sintered body and the thermal conductivity at room temperature can be 180 W / (m · K) or more, the base member 43 and the cover member 44 are locally applied to the object T. Even when heat is applied, heat dissipation is excellent, distortion of the target T due to thermal expansion hardly occurs, and deterioration in accuracy due to heat generated by exposure can be reduced in the semiconductor manufacturing process.

  Next, a method for manufacturing the base member 43 and the cover member 44 when the base member 43 and the cover member 44 described above are made of ceramics will be described.

(1) Molding and firing of ceramic raw material powder When the base member 43 and the cover member 44 are made of alumina, a desired sintering aid is added to the alumina powder which is the main component, wet mixed, and spray dried. To obtain alumina powder. This alumina powder is molded by a known molding method such as powder press molding using CIP and a mold at a molding pressure of 78 MPa to 120 MPa. The obtained molded body is cut into a desired shape approximate to the base member 43 and the cover member 44. The molded body is fired at 1500 to 1700 ° C. in an air atmosphere.

When the base member 43 and the cover member 44 are made of silicon carbide, a raw material powder is obtained by adding at least a boron compound powder and a carbon compound powder as additives to a silicon carbide powder as a main component. This raw material powder is molded using a known molding method to obtain a molded body. The molded body is fired in an inert atmosphere such as Ar. The molded body obtained as described above can be sintered at 1900-2100 ° C. in vacuum or in an inert atmosphere such as Ar, and further subjected to HIP treatment for the purpose of reducing voids.

(2) Processing of sintered body The sintered body manufactured as described above is processed. The thickness direction of the base member 43 and the cover member 44 is ground to a predetermined thickness. Next, the end surfaces on the outer diameter side of the base member 43 and the cover member 44 are processed.

  When the cover member 44 is manufactured, the sintered body whose end face is processed is subjected to hole processing for forming the opening 45 and the through hole 51b. Moreover, when producing the base member 3, the hole processing which forms the through-hole 10 is given.

  Further, when the base member 3 is manufactured, the projection 12 and the surface on which the annular sealing portions 35 and 64 are formed in the sintered body whose end face is processed are blasted, and a plurality of pins (projections) 12 and The annular sealing portions 35 and 64 are formed. Here, before the blasting process, a mask (non-processed region) for preventing the blasting process is provided in advance on the portions to be the protrusions 12 and the annular sealing portions 34 and 64. Further, when the cover member 44 is manufactured, the concave portion 49 is formed by blasting the surface on which the concave portion 49 is to be formed. Here, before the blasting process, a mask for preventing the blasting process is provided in advance in a part other than the part to be the concave portion 49.

  Normally, the heights of the plurality of protrusions 12 and the annular sealing portions 35 and 64 are uneven. Therefore, after blasting, the heights of the plurality of protrusions 12 and the heights of the annular sealing portions 35 and 64 are the same. Lapping is performed.

(3) Joining of convex member and holding member Finally, the convex member 51a and the holding member 28 are joined to the base member 43 and the cover member 44, respectively. These may be manufactured in the steps (1) and (2) and then joined to the cover member 44. The base member 43 and the base member 43 may be joined through the steps (1) and (2). And may be formed integrally.

(Third embodiment)
Next, a third embodiment of the adsorption member of the present invention will be described. As shown in FIG. 14, a charged particle beam device according to an embodiment of the present invention is placed on an adsorption device 69 using the adsorption member according to the first or second embodiment, and the adsorption device 69. And a charged particle beam source 71 for irradiating the charged particle beam 70 to the object T that has been absorbed. As the charged particle beam 70, an electron beam, an ion beam, or the like can be selected. When the charged particle beam apparatus is an exposure apparatus, for example, the charged particle beam 70 is an electron beam.

  Moreover, the charged particle beam apparatus has a vacuum chamber 72 having an emission port of a charged particle beam source 71 that emits charged particles and an adsorption device 69 inside.

  Next, an example of how to use the adsorption members 1B and 1C will be described with reference to the flowchart of FIG. Here, a case where the object T is exposed in the exposure apparatus will be described. First, the cover member 44 is placed on the base member 43. At that time, the convex positioning member 51 a provided on the base member 43 is inserted into the through hole 51 b of the cover member 4. Thereby, the relative position shift of the cover member 44 mounted on the base member 43 can be suppressed. The inner peripheral edge 54 of the cover member 44 is placed on the non-adsorption region 48 of the base member 43.

  The object T is fitted into the opening 45 of the cover member 44 placed on the base member 43. At that time, by pulling the pulling portion 28d of the holding member 28, the contact portion 28a of the holding member 28 is displaced away from the object T along the Y direction, and the object T is fitted into the opening 45. Can do. Thereafter, the pulled portion 28d is returned, and the object T is brought into contact with the first and second linear portions (contact portions) 56a and 56b provided on the inner peripheral edge 54 of the cover member 44. At this time, the relative position between the cover member 44 placed on the base member 43 and the object T is fixed.

  The suction member 1 on which the object T is placed is placed, for example, on a target take-in port (not shown) of the exposure apparatus, and the suction members 1B and 1C are further moved from the take-in port using a conveying jig or the like. It is placed on the suction table 2 in the exposure apparatus. When the outside air is sucked through the suction hole 2 a of the suction table 2, the gas is sucked from the through hole 10 provided in the base member 43. As a result, the air pressure in the suction region 46 surrounded by the annular sealing portions 35 and 64 is reduced, and the object T and the cover member 44 are sucked. Thereafter, an alignment mark (position detection mark) stamped on the object T is detected to accurately detect the position of the object T, and then the object T is exposed by irradiating the object T with an electron beam. be able to.

  In the case of a light irradiation apparatus that irradiates the object T with light such as ultraviolet light even in the same exposure apparatus, the charged particle beam source 71 is replaced with a light source, and the object T is irradiated with light instead of an electron beam. .

  In this case, the base member 43 preferably has a low reflectance with respect to the irradiation light 70. If the reflectance is small, it is possible to suppress the irradiation light 70 from further reflecting on the surface of the base member 43 through the object T even when the object T has light transparency such as a sapphire substrate. . For this reason, the light reflected by the surface of the base member 43 is again irradiated on the back surface of the object T (the surface of the object T on the base member 43 side), and as a result, the back surface of the object T is prevented from being processed. can do. For example, when the wavelength of the charged particle beam 70 is ultraviolet light, the base member 43 is made of black alumina having a brightness value of 60 or less.

T: Object 1B, 1C: Suction member 2: Suction table 2a: Suction hole 2c: Annular wall 10: Through hole (for suction)
12: Protrusions 28A, 28A ′, 28B, 28B ′, 28C: Holding member 28a: Contact portion 28b: Fixing portion 28c: Stretching portion 28d: Pulling portion 35: Ring wall 43: Substrate 44: Cover member 45: Openings 46, 46a , 46b, 46c, 46d: suction regions 48, 48a, 48b, 48c: non-suction region 51a: positioning member 51b: through hole (for positioning member insertion)
54: inner peripheral edges 55a, 55b: contact portions 56a, 56b: linear portions 64: annular sealing portions 64a, 64b, 64d: annular walls 64c: regions

Claims (15)

A suction member that is placed on a suction table provided with a plurality of suction holes and sucks an object by suction of gas through the suction holes,
A base member placed on the adsorption table;
A cover member that has an opening and is detachably mounted on the base member, and the cover member on which the object is mounted inside the opening ;
At least one abutting portion provided on the inner peripheral edge of the cover member and against which the object contacts, and the abutting portion provided on the cover member by pressing the object against the abutting portion. A holding member for holding the object between the two parts ,
The base member has a plurality of suction areas that allow suction by the suction holes and suck the object.
The cover member is placed on the base member so that at least one of the plurality of suction regions is located inside the opening, and the other suction regions are covered by the cover member ,
The holding member is fixed to the base member at positions on both sides of the contact portion in a direction orthogonal to a contact portion having a contact portion that contacts the object and a direction in which the object is pressed against the contact portion. A plurality of fixed portions, and a plurality of expandable portions that connect the contact portions and the plurality of fixed portions, respectively, and can be expanded and contracted in a direction of pressing the object against the contact portion,
When the cover member is viewed in plan, the inner peripheral edge has a plurality of linear portions serving as the contact portions and a plurality of arc-shaped portions positioned along a circumference of a predetermined circle, The plurality of straight line portions have a first straight line portion and a second straight line portion shorter than the first straight line portion, and the center point of the predetermined circle and the center point of the first straight line portion are A connecting line and a line connecting the center point of the predetermined circle and the center point of the second straight line portion form a right angle, and the center point of the first straight line portion and the center point of the predetermined circle point And an angle formed by a line connecting the center point of the predetermined circle and the contact portion of the holding member is an angle between the center point of the second straight line portion and the center point of the predetermined circle. A member for suction larger than an angle formed by a line connecting and a line connecting a center point of the predetermined circle and the contact portion of the holding member. The base member has one or more annular non-adsorption regions that block suction by the plurality of suction holes,
The suction member according to claim 1, wherein the cover member is placed on the base member such that an inner peripheral edge in contact with the opening is positioned on the non-suction region.   The adsorption member according to claim 2, wherein the plurality of adsorption regions and the at least one non-adsorption region are alternately arranged from the inside to the outside of the base member when the base member is viewed in plan. .   The said base member has the cyclic | annular convex part which supports the outer peripheral part of the said target object, and supports the said inner periphery of the said opening part in the said non-adsorption area | region. Element.   In the non-adsorption region, the base member has an annular first convex portion that supports the outer peripheral portion of the object, and an annular shape that is provided outside the first convex portion and supports the inner peripheral edge of the opening. The adsorbing member according to claim 2, further comprising: a second convex portion.   The adsorbing member according to claim 5, further comprising an annular third convex portion that supports the outer peripheral portion of the cover member on the outer peripheral portion of the base member.   The said base member has a some protrusion which supports the said target object in an adsorption | suction area | region, The height of this some protrusion is equal to the height of a said 1st convex part. Adsorption member.   The adsorption member according to claim 1, wherein the base member is detachably mounted on the adsorption table.   The adsorbing member according to claim 8, wherein the mounting surface of the base member on the side of the adsorbing table is warped in a concave shape.   The base member has at least one convex positioning member used for positioning the cover member with respect to the base member, and the cover member has a through hole into which the positioning member is inserted. Item 10. The adsorption member according to any one of Items 9. A plurality of the cover members;
The plurality of cover members have different sizes of the openings, and when each of the cover members is placed on the base member, the number of the adsorption regions located inside the openings is different. 1 0 adsorbing member according to any one of. The base member has a plurality of annular non-adsorption regions that block suction by the suction holes, and the plurality of cover members are in contact with the opening when each is placed on the base member. suction member according to claim 1 1, the peripheral edge is located in different said unadsorbed region. A suction table having a plurality of suction holes are provided, the suction device having a suction member according to any one of claims 1 to 1 2. Light irradiation device having a light source for irradiating light to the adsorption apparatus and the object which has been adsorbed is placed on the adsorption apparatus according to claim 1 3. Adsorbers and, a charged particle beam device having a charged particle beam source for irradiating a charged particle beam to an object that is adsorbed is placed on the adsorption apparatus according to claim 1 3.

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